JPS6352600B2 - - Google Patents
Info
- Publication number
- JPS6352600B2 JPS6352600B2 JP57051753A JP5175382A JPS6352600B2 JP S6352600 B2 JPS6352600 B2 JP S6352600B2 JP 57051753 A JP57051753 A JP 57051753A JP 5175382 A JP5175382 A JP 5175382A JP S6352600 B2 JPS6352600 B2 JP S6352600B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- plate
- desensitizing
- acid
- sodium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 41
- 239000003945 anionic surfactant Substances 0.000 claims description 19
- 239000004375 Dextrin Substances 0.000 claims description 12
- 229920001353 Dextrin Polymers 0.000 claims description 12
- 235000019425 dextrin Nutrition 0.000 claims description 12
- 239000002736 nonionic surfactant Substances 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 10
- 150000008049 diazo compounds Chemical class 0.000 claims description 7
- -1 fatty acid salts Chemical class 0.000 description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 23
- 239000000243 solution Substances 0.000 description 22
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 17
- 238000012545 processing Methods 0.000 description 15
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 14
- 238000005406 washing Methods 0.000 description 13
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 9
- 238000000586 desensitisation Methods 0.000 description 9
- 238000011161 development Methods 0.000 description 9
- 206010012442 Dermatitis contact Diseases 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 7
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical group [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 235000014113 dietary fatty acids Nutrition 0.000 description 5
- 239000000194 fatty acid Substances 0.000 description 5
- 229930195729 fatty acid Natural products 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 229920003169 water-soluble polymer Polymers 0.000 description 4
- 239000000080 wetting agent Substances 0.000 description 4
- FUWHCTSQIAULAK-UHFFFAOYSA-N 4-(2-hydroxyethyl)benzoic acid Chemical compound OCCC1=CC=C(C(O)=O)C=C1 FUWHCTSQIAULAK-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000001804 emulsifying effect Effects 0.000 description 3
- 229910017053 inorganic salt Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 238000010186 staining Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 2
- 229920000084 Gum arabic Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 235000010489 acacia gum Nutrition 0.000 description 2
- 239000000205 acacia gum Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- UDHMTPILEWBIQI-UHFFFAOYSA-N butyl naphthalene-1-sulfonate;sodium Chemical compound [Na].C1=CC=C2C(S(=O)(=O)OCCCC)=CC=CC2=C1 UDHMTPILEWBIQI-UHFFFAOYSA-N 0.000 description 2
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 2
- 239000003975 dentin desensitizing agent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003871 sulfonates Chemical class 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- BMRVLXHIZWDOOK-UHFFFAOYSA-N 2-butylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(CCCC)=CC=C21 BMRVLXHIZWDOOK-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-M 4-hydroxybenzoate Chemical compound OC1=CC=C(C([O-])=O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-M 0.000 description 1
- XXYMSQQCBUKFHE-UHFFFAOYSA-N 4-nitro-n-phenylaniline Chemical compound C1=CC([N+](=O)[O-])=CC=C1NC1=CC=CC=C1 XXYMSQQCBUKFHE-UHFFFAOYSA-N 0.000 description 1
- 244000171897 Acacia nilotica subsp nilotica Species 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- 239000004135 Bone phosphate Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920001214 Polysorbate 60 Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- BFFNRYZJGLNYOJ-UHFFFAOYSA-N [O-]B(O)O.N.[Na+] Chemical compound [O-]B(O)O.N.[Na+] BFFNRYZJGLNYOJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229940105329 carboxymethylcellulose Drugs 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 229940111685 dibasic potassium phosphate Drugs 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- JMGZBMRVDHKMKB-UHFFFAOYSA-L disodium;2-sulfobutanedioate Chemical compound [Na+].[Na+].OS(=O)(=O)C(C([O-])=O)CC([O-])=O JMGZBMRVDHKMKB-UHFFFAOYSA-L 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- LRMHFDNWKCSEQU-UHFFFAOYSA-N ethoxyethane;phenol Chemical compound CCOCC.OC1=CC=CC=C1 LRMHFDNWKCSEQU-UHFFFAOYSA-N 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- NVVZQXQBYZPMLJ-UHFFFAOYSA-N formaldehyde;naphthalene-1-sulfonic acid Chemical compound O=C.C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 NVVZQXQBYZPMLJ-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000010893 paper waste Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000007686 potassium Nutrition 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229940083542 sodium Drugs 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 239000011684 sodium molybdate Substances 0.000 description 1
- 235000015393 sodium molybdate Nutrition 0.000 description 1
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 235000019830 sodium polyphosphate Nutrition 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- LGORLCOUTMVEAC-UHFFFAOYSA-M sodium;2-nonylphenolate Chemical compound [Na+].CCCCCCCCCC1=CC=CC=C1[O-] LGORLCOUTMVEAC-UHFFFAOYSA-M 0.000 description 1
- HIEHAIZHJZLEPQ-UHFFFAOYSA-M sodium;naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 HIEHAIZHJZLEPQ-UHFFFAOYSA-M 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
【発明の詳細な説明】
本発明は支持体上にジアゾ化合物を含む感光層
を有するネガ型の感光性平版印刷版(Pre−
Sensitized Plateと呼ばれる。以下PS版と略す。)
から平版印刷版を得るための製版方法に関するも
のであり、特に水を主溶媒とするアルカリ性現像
液による現像後、水溶液の不感脂化液で不感脂化
処理する製版方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a negative photosensitive lithographic printing plate (Pre-
It is called a sensitized plate. Hereafter abbreviated as PS version. )
The present invention relates to a plate-making method for obtaining a lithographic printing plate from a lithographic printing plate, and particularly relates to a plate-making method in which, after development with an alkaline developer containing water as a main solvent, desensitization treatment is performed with an aqueous desensitizing solution.
従来、ジアゾ化合物を含む感光層を有するネガ
型PS版の製版方法は水を主溶媒とするアルカリ
性溶液による現像、水洗および不感脂化の工程を
この順に行なうことよりなつており、水洗工程で
は多量の水を使用し、その廃液はそのまま棄てら
れていた。 Conventionally, the plate-making method for negative-tone PS plates having a photosensitive layer containing a diazo compound has consisted of developing with an alkaline solution containing water as the main solvent, washing with water, and desensitizing in this order. water was used, and the waste liquid was simply discarded.
近年、公害防止等の観点から、かかる製版方法
の改良方法として水洗廃液をそのままでは排出し
ない方法、例えば全く水洗工程を含まない方法、
および水洗水を循環して使用し製版後に循環水洗
水を処理する方法が行なわれている。 In recent years, from the perspective of pollution prevention, methods have been developed to improve such plate-making methods, such as methods that do not directly discharge the washing waste liquid, such as methods that do not include a washing step at all.
Another method is to circulate and use washing water and to treat the circulating washing water after plate making.
一方、不感脂化液としては乳化型のものおよび
非乳化型、即ち水溶液のものが知られているが、
乳化型不感脂化液は製造法が複雑であり製造コス
トが高く、また水不溶性の親油成分、水不溶性の
有機溶剤等を含むため使用済みの廃液処理に対す
る負荷が大きいと言う欠点を有するため水溶液の
ものが好ましい。 On the other hand, emulsifying type and non-emulsifying type, that is, aqueous solutions are known as desensitizing liquids.
Emulsified desensitizing liquids have the drawbacks of complicated manufacturing methods, high manufacturing costs, and high burden on used waste liquid treatment because they contain water-insoluble lipophilic components, water-insoluble organic solvents, etc. Aqueous solutions are preferred.
上述の水洗廃液をそのままでは排出しない方法
を用いたジアゾ化合物を含む感光層を有するネガ
型感光性平版印刷版の製版方法において、上記の
利点を有する水溶液の不感脂化液を用いる方法が
特開昭54−8002号公報に開示されている。 In a plate-making method for a negative photosensitive lithographic printing plate having a photosensitive layer containing a diazo compound using a method in which the washing waste liquid is not directly discharged, a method using an aqueous desensitizing liquid having the above-mentioned advantages has been disclosed. It is disclosed in Publication No. 54-8002.
しかしながら、この製版方法により得られる平
版印刷版を印刷に供した場合、印刷開始後正常な
印刷状態に達するまでにかなり無駄な紙(やれ
紙)を費すといつた欠点があり、満足できるもの
ではない。 However, when the lithographic printing plate obtained by this plate-making method is used for printing, it has the disadvantage that a considerable amount of paper (wasted paper) is wasted until the normal printing state is reached after printing starts, so it is not satisfactory. isn't it.
従つて本発明の目的は、ジアゾ化合物を含む感
光層を有するネガ型PS版の現像工程と不感脂化
工程との間の水洗排水をそのままでは排出しない
製版方法であり、かつ不感脂化液として非乳化型
のものを用いる製版方法における前記従来技術の
欠点を改良することである。 Therefore, an object of the present invention is to provide a plate-making method that does not directly discharge the washing water between the development step and desensitization step of a negative PS plate having a photosensitive layer containing a diazo compound, and which uses it as a desensitization liquid. The object of the present invention is to improve the drawbacks of the prior art in the plate making method using a non-emulsifying type.
本発明の別の目的は、製造法が簡便で製造コス
トが低い不感脂化液で処理できる上記ネガPS版
の製版方法を提供することである。 Another object of the present invention is to provide a method for making the above-mentioned negative PS plate that can be processed with a desensitizing solution, which is simple and inexpensive to produce.
本発明の更に別の目的は、やれ紙が少ない優れ
た平版印刷版を得ることのできる上記ネガPS版
の製版方法を提供することである。 Still another object of the present invention is to provide a method for making the above-mentioned negative PS plate, which makes it possible to obtain an excellent lithographic printing plate with less waste paper.
本発明者等は種々検討を重ねた結果以下の製版
方法により本発明の目的が達成されることを見い
出した。即ち本発明は、支持体上にジアゾ化合物
を含む感光層を有するネガ型感光性平版印刷版を
画像露光し、アルカリ性現像液で現像して非画線
部を除去した後、不感脂化処理する製版方法にお
いて、上記不感脂化処理に用いる不感脂化液がデ
キストリン、酸、アニオン界面活性剤および該ア
ニオン界面活性剤に対して150〜1重量%のノニ
オン界面活性剤を含む水溶液であることを特徴と
する製版方法である。 As a result of various studies, the present inventors have found that the object of the present invention can be achieved by the following plate-making method. That is, in the present invention, a negative photosensitive lithographic printing plate having a photosensitive layer containing a diazo compound on a support is imagewise exposed, developed with an alkaline developer to remove non-image areas, and then desensitized. In the plate-making method, the desensitizing liquid used in the desensitizing treatment is an aqueous solution containing dextrin, an acid, an anionic surfactant, and a nonionic surfactant in an amount of 150 to 1% by weight based on the anionic surfactant. This is a distinctive plate-making method.
本発明に用いられる不感脂化液は(1)デキストリ
ン、(2)酸、(3)アニオン型界面活性剤および(4)ノニ
オン型界面活性剤を含む水溶液である。 The desensitizing liquid used in the present invention is an aqueous solution containing (1) dextrin, (2) acid, (3) anionic surfactant, and (4) nonionic surfactant.
デキストリンは平版印刷版の表面を保護する主
成分となるものであり、種々のものが知られてい
るが、水に対する溶解度が高いものが好ましい。 Dextrin is a main component that protects the surface of a lithographic printing plate, and various types are known, but those with high solubility in water are preferred.
20℃の水に対する可溶分を70%以上含むものが
好ましく90%以上含むものが特に好ましい。又
種々の変性方法によるデキストリンが知られてい
るが、特に酵素変性デキストリンが不感脂化液の
調製時の操作性、印刷時における不感脂化剤の除
去性等の点で特に有利である。不感脂化液中に含
まれるデキストリンの量は5〜30重量%の範囲が
好ましく、特に8〜25重量%の範囲が好ましい。 Those containing 70% or more of the soluble content in water at 20°C are preferred, and those containing 90% or more are particularly preferred. Although dextrins produced by various modification methods are known, enzyme-modified dextrins are particularly advantageous in terms of operability during the preparation of a desensitizing solution, removability of the desensitizing agent during printing, and the like. The amount of dextrin contained in the desensitizing liquid is preferably in the range of 5 to 30% by weight, particularly preferably in the range of 8 to 25% by weight.
不感脂化液中に含有される酸は、使用前の不感
脂化液のPHを酸性域、好ましくは1〜5、より好
ましくは2〜3の範囲に調整することを主目的と
して用いられるものである。例えば燐酸、ピロ燐
酸、ポリ燐酸、第一燐酸ナトリウム、硼酸、塩
酸、硫酸、硝酸等の無機酸、例えばこはく酸、蓚
酸、くえん酸、マレイン酸、乳酸、p−トルエン
スルホン酸、ベンゼンスルホン酸等の有機酸が使
用でき、これらは単独又は2以上組合わせて使用
することができる。これらの中でも特に燐酸およ
びこはく酸が好ましい。酸の使用量は不感脂化液
のPHが酸性域となるような量で使用するが、大略
0.01〜5重量%である。 The acid contained in the desensitizing liquid is used primarily for the purpose of adjusting the pH of the desensitizing liquid before use to an acidic range, preferably in the range of 1 to 5, more preferably in the range of 2 to 3. It is. For example, inorganic acids such as phosphoric acid, pyrophosphoric acid, polyphosphoric acid, monosodium phosphate, boric acid, hydrochloric acid, sulfuric acid, nitric acid, etc., such as succinic acid, oxalic acid, citric acid, maleic acid, lactic acid, p-toluenesulfonic acid, benzenesulfonic acid, etc. These organic acids can be used alone or in combination of two or more. Among these, phosphoric acid and succinic acid are particularly preferred. The amount of acid used is such that the PH of the desensitizing solution is in the acidic range, but approximately
It is 0.01 to 5% by weight.
本発明に用いられる不感脂化液中にはアニオン
型界面活性剤及びノニオン型界面活性剤が共に存
在することが必須である。アニオン型界面活性剤
を含まないものは現像液が持込まれた場合、例え
ば現像工程および不感脂化工程を連続的に行なう
自動現像機、または現像工程、循環水洗工程、お
よび不感脂化工程を連続的に行なう自動現像機に
おいて不感脂化液を循環して繰返し使用する場合
に不溶物が生成しやすく、これが版面に付着する
のが原因と推測されるが印刷時に汚れが生じる。
またノニオン界面活性剤を含まないものは画線部
の感脂性に劣りやれ紙が多くなり、また、アニオ
ン界面活性剤の種類によつては均一な水溶液とな
らない場合がある。アニオン型界面活性剤および
ノニオン型界面活性剤を含むことにより、現像液
混入時の不溶物の発生がなく、画線部の感脂性を
良好にすることができ、且つ均一な水溶液とする
ことができる。 It is essential that both an anionic surfactant and a nonionic surfactant exist in the desensitizing liquid used in the present invention. Products that do not contain anionic surfactants are used when a developer is brought in, such as an automatic developing machine that continuously performs the development process and desensitization process, or a continuous development process, circulating water washing process, and desensitization process. When a desensitizing liquid is circulated and used repeatedly in an automatic processor used for printing, insoluble matter is likely to be generated, and this is presumed to be caused by the insoluble matter adhering to the plate surface, which causes stains during printing.
In addition, those containing no nonionic surfactant have poor oil sensitivity in the image area, resulting in a lot of paper loss, and depending on the type of anionic surfactant, a uniform aqueous solution may not be obtained. By containing an anionic surfactant and a nonionic surfactant, no insoluble matter is generated when the developer is mixed in, the oil sensitivity of the image area can be improved, and a uniform aqueous solution can be obtained. can.
本発明に用いられるアニオン型界面活性剤とし
ては脂肪酸塩、アルキル硫酸エステル塩、アルキ
ルベンゼンスルホン酸塩、アルキルナフタレンス
ルホン酸塩、アルキルスルホコハク酸塩、アルキ
ルリン酸塩、ポリオキシアルキル硫酸エステル
塩、ポリオキシアルキルフエノールエーテル硫酸
塩、ナフタレンスルホン酸ホルマリン縮合物等が
挙げられるが、例えばジ(2−エチルヘキシル)
スルホコハク酸ナトリウム等のアルキルスルホコ
ハク酸塩、例えばポリオキシエチレン(エチレン
オキサイドモル数が20)オレイルエーテル硫酸ナ
トリウム等のポリオキシエチレンアルキルエーテ
ル塩、例えばポリオキシエチレン(エチレンオキ
サイドモル数が19)ノニルフエノールエーテル硫
酸ナトリウム等のポリオキシエチレンアルキルフ
エノールエーテル硫酸塩、ナフタレンスルホン酸
塩ホルマリン縮合物、アルキルナフタレンスルホ
ン酸塩等が好ましく、ポリエチレンオキサイドア
ルキルフエノールエーテル硫酸塩が特に好まし
い。アニオン型界面活性剤の含有量は不感脂化液
の総重量に対して好ましくは0.001〜2重量%で
あり、0.05〜1重量%の範囲が特に好ましい。 Examples of anionic surfactants used in the present invention include fatty acid salts, alkyl sulfates, alkylbenzenesulfonates, alkylnaphthalenesulfonates, alkylsulfosuccinates, alkyl phosphates, polyoxyalkyl sulfates, and polyoxyalkyl sulfates. Examples include alkyl phenol ether sulfate, naphthalene sulfonic acid formalin condensate, etc. For example, di(2-ethylhexyl)
Alkyl sulfosuccinates such as sodium sulfosuccinate, e.g. polyoxyethylene (20 moles of ethylene oxide) polyoxyethylene alkyl ether salts such as sodium oleyl ether sulfate, e.g. polyoxyethylene (19 moles of ethylene oxide) nonylphenol ether Polyoxyethylene alkyl phenol ether sulfates such as sodium sulfate, naphthalene sulfonate formalin condensates, alkylnaphthalene sulfonates, and the like are preferred, and polyethylene oxide alkyl phenol ether sulfates are particularly preferred. The content of the anionic surfactant is preferably 0.001 to 2% by weight, particularly preferably 0.05 to 1% by weight, based on the total weight of the desensitizing liquid.
本発明に用いられるノニオン型界面活性剤に
は、ポリオキシエチレンアルキルエーテル、ポリ
オキシエチレンアルキルフエノールエーテル、ポ
リオキシエチレンソルビタン脂肪酸エステル、ポ
リオキシエチレン脂肪酸エステル、グリセリン脂
肪酸エステル、オキシエチレンオキシプロピレン
ブロツクポリマ−等があるが、不感脂化液を水溶
液となすには親水性と親油性のバランスを表現す
るHLB値が約12以上であることが好ましく、
HLB値が13〜18であることが特に好ましい。か
かるHLBを有するもののうちポリオキシエチレ
ン(エチレンオキサイドモル数が約10〜30)ノニ
ルフエノールエーテル等のポリオキシエチレンア
ルキルフエノールエーテルが特に好ましい。不感
脂化液中に含有されるノニオン型界面活性剤の量
はアニオン型界面活性剤の150〜1重量%が好ま
しく、特に100〜10重量%が好ましい。 Nonionic surfactants used in the present invention include polyoxyethylene alkyl ether, polyoxyethylene alkyl phenol ether, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene fatty acid ester, glycerin fatty acid ester, and oxyethylene oxypropylene block polymer. However, in order to make the desensitizing liquid into an aqueous solution, it is preferable that the HLB value, which expresses the balance between hydrophilicity and lipophilicity, is about 12 or more.
It is particularly preferred that the HLB value is 13-18. Among those having such HLB, polyoxyethylene alkyl phenol ethers such as polyoxyethylene (the number of moles of ethylene oxide is about 10 to 30) nonyl phenol ether are particularly preferred. The amount of nonionic surfactant contained in the desensitizing liquid is preferably 150 to 1% by weight, particularly preferably 100 to 10% by weight of the anionic surfactant.
本発明に用いられる不感脂化液中には上記の成
分の他、皮膜形成性等を向上させる目的で種々の
水溶性高分子化合物を含むことができる。水溶性
高分子化合物としては従来不感脂化液に使用し得
るとされているものであれば好適に使用できる。
例えばメチルセルロース、エチルセルロース、ヒ
ドロキシプロピルセルロース、カルボキシメチル
セルロース等のセルロースエーテル類、アルギン
酸ナトリウムのようなアルギン酸塩、ポルビニル
アルコール、ポリアクリルアミド、ビニルメチル
エーテルと無水マレイン酸との共重合体等の合成
高分子化合物、アラビアガム等が挙げられる。こ
れらのうちに特に好ましいのはカルボキシメチル
セルロースナトリウム塩(一般にCMCと呼ばれ
る)である。これらの水溶性高分子化合物は単独
又は2種以上組合せて使用できる。これらの水溶
性高分子化合物の量はデキストリンの重量に対し
て50重量%以下が好ましく、更に30重量%以下が
特に好ましい。 In addition to the above-mentioned components, the desensitizing liquid used in the present invention can contain various water-soluble polymer compounds for the purpose of improving film-forming properties and the like. As the water-soluble polymer compound, any compound that has been conventionally considered to be usable in a desensitizing solution can be suitably used.
For example, cellulose ethers such as methylcellulose, ethylcellulose, hydroxypropylcellulose, and carboxymethylcellulose, alginates such as sodium alginate, synthetic polymer compounds such as porvinyl alcohol, polyacrylamide, and copolymers of vinyl methyl ether and maleic anhydride. , gum arabic, etc. Particularly preferred among these is carboxymethylcellulose sodium salt (commonly referred to as CMC). These water-soluble polymer compounds can be used alone or in combination of two or more. The amount of these water-soluble polymer compounds is preferably 50% by weight or less, more preferably 30% by weight or less, based on the weight of the dextrin.
不感脂化液中には更に水溶性塩を含有させてお
くことができる。好適な水溶性塩としてはアルカ
リ金属塩、アンモニウム塩があり、酢酸アンモニ
ウム、酢酸ナトリウム、酢酸カリウム、モリブデ
ン酸ナトリウム、モリブデン酸カリウム、硼酸ナ
トリウム、硼酸アンモニウム、硝酸リチウム、硝
酸ナトリウム、硝酸カリウム、第二燐酸ナトリウ
ム、第三燐酸ナトリウム、第二燐酸カリウム、第
三燐酸カリウム、第三燐酸アンモニウム、ポリ燐
酸ナトリウム等が例示できる。上記の内、特に好
ましいものはモリブデン酸ナトリウム(カリウ
ム)、硫酸カリウム及び硼酸ナトリウム(アンモ
ニウム)である。かかる水溶性塩は単独又は2種
以上組合せて使用することができ、不感脂化液の
総重量に対して0.01〜5重量%、より好ましくは
0.1〜1重量%の範囲で使用される。 The desensitizing liquid may further contain a water-soluble salt. Suitable water-soluble salts include alkali metal salts, ammonium salts, such as ammonium acetate, sodium acetate, potassium acetate, sodium molybdate, potassium molybdate, sodium borate, ammonium borate, lithium nitrate, sodium nitrate, potassium nitrate, diphosphoric acid. Examples include sodium, tribasic sodium phosphate, dibasic potassium phosphate, tribasic potassium phosphate, tribasic ammonium phosphate, and sodium polyphosphate. Among the above, particularly preferred are sodium (potassium) molybdate, potassium sulfate and sodium (ammonium) borate. Such water-soluble salts can be used alone or in combination of two or more, and are preferably 0.01 to 5% by weight based on the total weight of the desensitizing liquid.
It is used in a range of 0.1 to 1% by weight.
不感脂化液中には更に湿潤剤を含有させておく
ことができる。かかる湿潤剤としてはエチレング
リコール、ジエチレングリコール、トリエチレン
グリコール、プロピレングリコール、ポリエチレ
ングリコール、グリセリン等の多価アルコールが
好適に使用される。 The desensitizing liquid may further contain a wetting agent. As such wetting agents, polyhydric alcohols such as ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, polyethylene glycol, and glycerin are preferably used.
湿潤剤は不感脂化液の総重量に対して約0.01〜
1重量%、より好ましくは0.1〜0.5重量%の範囲
で使用できる。 The amount of wetting agent is approximately 0.01~ based on the total weight of the desensitizing liquid.
It can be used in an amount of 1% by weight, more preferably 0.1 to 0.5% by weight.
不感脂化液には更に染料のような着色剤を含有
させておいてもよい。 The desensitizing liquid may further contain a coloring agent such as a dye.
不感脂化処理された版面上のPHは印刷時の汚れ
発生の点から9以下であることが好ましく、更に
7以下であることが特に好ましい。 The pH on the desensitized printing plate is preferably 9 or less, more preferably 7 or less, from the viewpoint of staining during printing.
本発明の製版方法における不感脂化液の塗布量
は乾燥塗布重量にして0.1g/m2から1.5g/m2が
好ましく、特に0.2〜0.8g/m2の範囲が好まし
い。 The coating amount of the desensitizing liquid in the plate making method of the present invention is preferably from 0.1 g/m 2 to 1.5 g/m 2 in terms of dry coating weight, particularly preferably from 0.2 to 0.8 g/m 2 .
本発明に使用されるPS版の支持体としては従
来知られているものが使用でき、例えば紙、プラ
スチツクラミネートされた紙、アルミニウム、亜
鉛、銅等の金属板、ポリエチレンテレフタレー
ト、ポリプロピレン、三酢酸セルロースなどのプ
ラスチツクフイルム、およびクロム、ニツケル等
の金属を表面に有する金属板、紙、プラスチツク
等が挙げられる。これらの支持体のうちアルミニ
ウム板は寸度安定性に優れており、且安価である
ため、特に好ましく使用される。 Conventionally known supports for the PS plate used in the present invention can be used, such as paper, plastic laminated paper, metal plates such as aluminum, zinc, and copper, polyethylene terephthalate, polypropylene, and cellulose triacetate. Examples include plastic films such as, metal plates having metals such as chromium and nickel on the surface, paper, and plastic. Among these supports, aluminum plates are particularly preferably used because they have excellent dimensional stability and are inexpensive.
これら支持体の表面は、親水化するため、さら
にはその上に層として設ける感光性組成物との有
害な反応を防ぎ、かつ感光層との密着性を向上さ
せるための加工処理を施すことが好ましい。例え
ばアルミニウム板の場合には、機械的、化学的ま
たは電気化学的な研磨を行つた後、珪酸ソーダ、
弗化ジルコニウム酸カリウム、燐酸塩等の水溶液
への浸漬処理あるいは陽極酸化処理を施すことが
好ましい。 The surface of these supports can be processed to make them hydrophilic, to prevent harmful reactions with the photosensitive composition provided as a layer thereon, and to improve adhesion with the photosensitive layer. preferable. For example, in the case of an aluminum plate, after mechanical, chemical or electrochemical polishing, sodium silicate,
It is preferable to perform immersion treatment in an aqueous solution of potassium fluorozirconate, phosphate, etc. or anodization treatment.
支持体上に設けられる感光層に感光成分として
含まれるネガ型のジアゾ化合物としては水不溶性
で、有機溶媒に可溶性のものが好ましい。代表的
なものとしてはジアゾニウム塩及び又はp−ジア
ゾジフエニルアミンとホルムアルデヒドの縮合物
であるジアゾ樹脂、特公昭52−7364号公報に記載
されているp−ジアゾジフエニルアミンのフエノ
ール塩またはフルオロカプリン酸塩等、特公昭49
−48001号公報に記載されている3−メトキシジ
フエニルアミン−4−ジアゾニウムクロライドと
4−ニトロジフエニルアミンのパラホルムアルデ
ヒド共縮合物の有機溶媒可溶性塩からなるジアゾ
樹脂、p−ジアゾジフエニルアミンとホルムアル
デヒドとの縮合物の2−メトキシ−4−ヒドロキ
シ−5−ベンゾイルベンゼンスルホン酸塩等が挙
げられる。これら縮合物の中ではp−ジアゾジフ
エニルアミンとホルムアルデヒドとの縮合物のヘ
キサフルオロリン酸塩または2−メトキシ−4−
ヒドロキシ−5−ベンゾイルベンゼンスルホン酸
塩、特に前者のものが好適である。 The negative type diazo compound contained as a photosensitive component in the photosensitive layer provided on the support is preferably one that is insoluble in water and soluble in an organic solvent. Typical examples include diazonium salts and/or diazo resins which are condensates of p-diazodiphenylamine and formaldehyde, and phenol salts of p-diazodiphenylamine or fluorocaprin described in Japanese Patent Publication No. 7364/1983. Acids, etc., Special Publication 1977
A diazo resin consisting of an organic solvent-soluble salt of a paraformaldehyde cocondensate of 3-methoxydiphenylamine-4-diazonium chloride and 4-nitrodiphenylamine described in Publication No. 48001, p-diazodiphenylamine and Examples include 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonate, which is a condensate with formaldehyde. Among these condensates, hexafluorophosphate, a condensate of p-diazodiphenylamine and formaldehyde, or 2-methoxy-4-
Hydroxy-5-benzoylbenzene sulfonates are preferred, especially the former.
これらのジアゾ化合物は単独で使用できるが、
感光層の物性を向上させるため、種々の樹脂と混
合して用いることが好ましい。かかる樹脂として
は、シエラツク、ポリビニルアルコールの誘導体
等のほか特開昭50−118802号公報中に記載されて
いる側鎖にアルコール性水酸基を有する共重合
体、特開昭55−155355号公報中に記載されている
フエノール性水酸基を側鎖に持つ共重合体が挙げ
られる。 Although these diazo compounds can be used alone,
In order to improve the physical properties of the photosensitive layer, it is preferable to use it in combination with various resins. Examples of such resins include derivatives of polyvinyl alcohol, copolymers having an alcoholic hydroxyl group in the side chain described in JP-A-50-118802, and copolymers having an alcoholic hydroxyl group in the side chain described in JP-A-55-155355. Examples include copolymers having a phenolic hydroxyl group in a side chain.
これらの中でも:下記一般式で示される構造
単位を少なくとも50重量%含む共重合体、
一般式
(式中、R1は水素原子または、メチル基を示
し、R2は水素原子、メチル基、エチル基または
クロルメチル基を示し、nは1〜10の整数であ
る。)
および:芳香族性水酸基を有する単量体単位
を1〜80モル%、ならびにアクリル酸エステルお
よび/またはメタクリル酸エステル単量体単位を
5〜90モル%有し、10〜200の酸価を持つ高分子
化合物が好ましく、特に後者が好ましい。 Among these: copolymers containing at least 50% by weight of structural units represented by the general formula: (In the formula, R 1 represents a hydrogen atom or a methyl group, R 2 represents a hydrogen atom, a methyl group, an ethyl group, or a chloromethyl group, and n is an integer of 1 to 10.) and: aromatic hydroxyl group Preferably, a polymer compound having 1 to 80 mol% of a monomer unit having 1 to 80 mol% and 5 to 90 mol% of an acrylic ester and/or methacrylic ester monomer unit and having an acid value of 10 to 200, The latter is particularly preferred.
本発明に使用されるPS版の感光層には更に、
染料、可塑剤、プリントアウト性能を与える成分
等の添加剤を加えることができる。 The photosensitive layer of the PS plate used in the present invention further includes:
Additives such as dyes, plasticizers, components that provide printout performance, etc. can be added.
かかる組成を有する感光層は適当な溶剤の溶液
を使用して支持体上に塗布される。 A photosensitive layer having such a composition is coated onto a support using a solution in a suitable solvent.
支持体上に設けられる上記感光層の塗布量は
0.1〜7g/m2が好ましく、より好ましくは0.5〜
3g/m2である。 The coating amount of the photosensitive layer provided on the support is
0.1-7g/ m2 is preferable, more preferably 0.5-7g/m2
It is 3g/ m2 .
かくして得られたPS版は透明原図を通してカ
ーボンアーク灯、水銀灯、メタルハライドラン
プ、タングステンランプ等の活性光線豊富な光源
により露光され、次いで湿式処理による現像処理
工程にて現像される。 The thus obtained PS plate is exposed through a transparent original to a light source rich in actinic rays such as a carbon arc lamp, mercury lamp, metal halide lamp, or tungsten lamp, and then developed in a wet processing process.
上記現像処理工程に際して使用される現像液は
水を主溶媒とするアルカリ性溶液であり、アルカ
リ剤の必要に応じて有機溶剤、アニオン界面活性
剤、無機塩等を含むものが用いられる。 The developing solution used in the above development process is an alkaline solution containing water as a main solvent, and an alkaline agent containing an organic solvent, an anionic surfactant, an inorganic salt, etc. as required is used.
アルカリ剤としてはケイ酸ナトリウム、ケイ酸
カリウム、水酸化カリウム、水酸化ナトリウム、
水酸化リチウム、第三リン酸ナトリウム、重炭酸
ナトリウム、炭酸ナトリウム、炭酸カリウム、炭
酸アンモニウム等の無機アルカリ剤、又はモノ、
ジもしくはトリエタノールアミンあるいはプロパ
ノールアミンのような有機アルカリ剤が有利に使
用される。アルカリ剤の現像液中における含有量
は0.05〜4重量%が好ましく、0.1〜2重量%の
範囲がより好ましい。 Alkaline agents include sodium silicate, potassium silicate, potassium hydroxide, sodium hydroxide,
Inorganic alkaline agents such as lithium hydroxide, tribasic sodium phosphate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, or mono,
Organic alkaline agents such as di- or triethanolamine or propanolamine are advantageously used. The content of the alkaline agent in the developer is preferably 0.05 to 4% by weight, more preferably 0.1 to 2% by weight.
有機溶剤としてはn−プロピルアルコール、ベ
ンジルアルコールの如きアルコール類、およびフ
エニルセロソルブの如きグリコールエーテルが有
用である。有機溶剤の現像液中における含有量と
しては0.5〜15重量%が好ましく、1〜5重量%
の範囲がより好ましい。 Useful organic solvents include alcohols such as n-propyl alcohol and benzyl alcohol, and glycol ethers such as phenyl cellosolve. The content of the organic solvent in the developer is preferably 0.5 to 15% by weight, and 1 to 5% by weight.
The range is more preferable.
アニオン界面活性剤としては、例えばラウリル
硫酸ナトリウム等のアルキル硫酸エステル塩、例
えばドデシルベンゼンスルホン酸等のアルキルア
リルスルホン酸塩、例えばジ(2−エチルヘキシ
ル)スルホコハク酸ナトリウム等の二塩基性脂肪
酸エステルのスルホン酸塩、例えばn−ブチルナ
フタレンスルホン酸ナトリウム等のアルキルナフ
タレンスルホン酸塩、ポリオキシエチレンアルキ
ル(フエノール)エーテル硫酸塩等が挙げられる
が、これらの中でn−ブチルナフタレンスルホン
酸等のアルキルナフタレンスルホン酸塩が好適に
使用される。アニオン型界面活性剤の現像液中に
おける含有量は0.1〜5重量%が好適であり、0.5
〜1.5重量%の範囲がより好ましい。 Examples of anionic surfactants include alkyl sulfate salts such as sodium lauryl sulfate, alkylaryl sulfonates such as dodecylbenzenesulfonic acid, and sulfonates of dibasic fatty acid esters such as sodium di(2-ethylhexyl)sulfosuccinate. Examples of acid salts include alkylnaphthalenesulfonates such as sodium n-butylnaphthalenesulfonate, polyoxyethylene alkyl (phenol) ether sulfates, etc. Among these, alkylnaphthalenesulfones such as n-butylnaphthalenesulfonic acid Acid acids are preferably used. The content of the anionic surfactant in the developer is preferably 0.1 to 5% by weight, and 0.5% by weight.
A range of 1.5% by weight is more preferred.
無機塩としては、リン酸、ケイ酸、炭酸、亜硫
酸等のアルカリまたはアルカリ土類の水溶性塩が
用いられるが、特にアルカリまたはアルカリ土類
亜硫酸塩が好適に用いられる。無機塩の現像液中
における好ましい含有量は0.05〜5重量%の範囲
でありより好ましくは0.1〜1重量%の範囲であ
る。 As the inorganic salt, alkali or alkaline earth water-soluble salts such as phosphoric acid, silicic acid, carbonic acid, sulfite, etc. are used, and alkali or alkaline earth sulfites are particularly preferably used. The content of the inorganic salt in the developer is preferably in the range of 0.05 to 5% by weight, more preferably in the range of 0.1 to 1% by weight.
現像液中には必要に応じて更に消泡剤、湿潤剤
等を含有させておくことも有用である。 It is also useful to further contain an antifoaming agent, a wetting agent, etc. in the developing solution, if necessary.
上記のような現像液で画像露光させたPS版を
現像する方法としては従来公知の種々の方法が可
能である。具体的には、画像露光されたPS版を
現像液中に浸漬する方法、PS版の感光層に対し
て多数のノズルから現像液を噴射する方法、現像
液で湿潤されたスポンジでPS版の感光層を拭う
方法、PS版の感光層の表面に現像液をローラ塗
布する方法などが挙げられる。また、このように
してPS版の感光層に現像液が施されさ後、感光
層の表面をブラシなどで軽く擦ることもできる。 Various conventionally known methods can be used to develop the PS plate which has been imagewise exposed with the developer as described above. Specifically, methods include immersing the image-exposed PS plate in a developer, spraying the developer onto the photosensitive layer of the PS plate from multiple nozzles, and using a sponge moistened with the developer to remove the PS plate. Examples include a method of wiping the photosensitive layer, and a method of applying a developer to the surface of the photosensitive layer of the PS plate using a roller. Further, after the developer is applied to the photosensitive layer of the PS plate in this manner, the surface of the photosensitive layer can be lightly rubbed with a brush or the like.
現像条件については、上記の現像方法に応じて
当業者が適宜決定することができる。 Development conditions can be appropriately determined by those skilled in the art depending on the above-mentioned development method.
本発明においては、PS版は上記の如く現像さ
れた後、不感脂化処理されるが、現像後は、まず
スクイズして版面上の現像液の量を少なくするこ
とが好ましい。本発明ではスクイズされた版面を
直接不感脂化処理してもよいし、循環して使用さ
れる水により水洗した後もう一度スクイズして不
感脂化処理してもよい。 In the present invention, after the PS plate is developed as described above, it is desensitized, but after development, it is preferable to first squeeze the plate to reduce the amount of developer on the plate surface. In the present invention, the squeezed printing plate may be desensitized directly, or it may be washed with circulating water and then squeezed again to be desensitized.
不感脂化液中への、感光層を溶解した現像液の
混入をより少なくするよう十分スクイズすること
が好ましい。 It is preferable to sufficiently squeeze the desensitizing solution so as to reduce the amount of the developer in which the photosensitive layer is dissolved to be mixed into the desensitizing solution.
不感脂化処理される版面上の液の残存量は版面
1m2当り10ml以下にすることが好ましく、更に5
ml以下にすることが好ましい。 The amount of liquid remaining on the plate surface to be desensitized is preferably 10 ml or less per 1 m 2 of the plate surface, and
It is preferable to make it less than ml.
スクイズする方法としては、例えばゴムのよう
な弾性部材をローラー表面に被覆した弾性ローラ
ー対の間に平版印刷版を通してそのニツプ圧によ
り版面の現像液あるいは循環水洗水を除去する方
法、或いは表面の滑らかな弾性プラスチツク材を
平版印刷版の搬送路に沿わせた状態で配設し、そ
の版面と摺接させることにより版面の現像液また
は循環水洗水を掻き取る方法、エアーナイフによ
り版面上の液を掻き取る方法等を採用することが
できる。このうち、装置の簡便さ等よりローラー
対を用いる方法が好適に用いられる。 Squeezing methods include, for example, passing a lithographic printing plate between a pair of elastic rollers whose surfaces are coated with an elastic member such as rubber, and using the nip pressure to remove the developing solution or circulating washing water from the plate surface; or A method in which a flexible elastic plastic material is placed along the transport path of a lithographic printing plate and scraped off developer solution or circulating washing water from the plate surface by sliding it in contact with the plate surface. A method such as scraping can be adopted. Among these methods, a method using a pair of rollers is preferably used because of the simplicity of the device.
不感脂化処理工程には不感化剤で湿潤したスポ
ンジ等で版面を擦りその後乾燥させる方法、ある
いは平版印刷版上に不感脂液を過剰に供給し、ロ
ーラー対等の間に通してスクイズし、その後乾燥
させる方法等があるが、本発明では後者の場合が
有効であり、更に上記不感脂化液を循環して使用
する場合に特に有効である。 The desensitizing process involves rubbing the plate surface with a sponge moistened with a desensitizing agent and then drying it, or supplying an excess of desensitizing liquid onto the lithographic printing plate and squeezing it by passing it between a pair of rollers, and then Although there are methods such as drying, the latter method is effective in the present invention, and is particularly effective when the desensitizing solution is used in circulation.
本発明を実施するのに用いられる装置の一実施
例の構成図を第1図に示す。 A block diagram of one embodiment of the apparatus used to carry out the present invention is shown in FIG.
図中、1は現像処理槽、2は循環水洗槽、3は
不感脂化処理槽である。4,5および6は、それ
ぞれ上記1,2および3の処理液を後記のスプレ
ーパイプに送るための搬送管、また7,8および
9は、それぞれ上記液送管に設けられたポンプで
ある。そして10A,10Bおよび10Cはいず
れも印刷版面に槽1からの処理液をスプレーする
ための処理液スプレーパイプで、11は槽2から
の、また12は槽3からの処理液をそれぞれ印刷
版面にスプレーするための処理液スプレーパイプ
である。 In the figure, 1 is a developing treatment tank, 2 is a circulation washing tank, and 3 is a desensitization treatment tank. Reference numerals 4, 5 and 6 are transport pipes for sending the treatment liquids 1, 2 and 3 above to spray pipes described later, respectively, and 7, 8 and 9 are pumps provided in the liquid transport pipes, respectively. 10A, 10B and 10C are processing liquid spray pipes for spraying the processing liquid from tank 1 onto the printing plate surface; 11 and 12 are processing liquid spray pipes for spraying the processing liquid from tank 2 and tank 3 onto the printing plate surface, respectively. This is a treatment liquid spray pipe for spraying.
13はガイドローラー、14および15は搬送
ローラーであり、16は受け台、17はブラシロ
ーラーである。そして18,19,20,21お
よび22はいずれもスクイズローラーである。2
3は露光済のPS版、24は不感脂化処理後のPS
版である。 13 is a guide roller, 14 and 15 are conveyance rollers, 16 is a pedestal, and 17 is a brush roller. And 18, 19, 20, 21 and 22 are all squeeze rollers. 2
3 is the exposed PS plate, 24 is the PS after desensitization treatment
It is a version.
以下、実施例により本発明を更に詳細に説明す
るが本発明はこれらにより限定されるものではな
い。 EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto.
実施例 1
厚さ0.24mmの砂目立てしたアルミニウム板を硫
酸中で陽極酸化し、約2g/m2の酸化皮膜をつく
り、よく洗浄した後、珪酸ナトリウム水溶液に浸
漬し、充分水洗後、乾燥し、下記組成の感光液を
塗布した。Example 1 A grained aluminum plate with a thickness of 0.24 mm was anodized in sulfuric acid to form an oxide film of approximately 2 g/m 2 , which was thoroughly washed, immersed in a sodium silicate aqueous solution, thoroughly washed with water, and then dried. A photosensitive solution having the following composition was applied.
〔パラヒドロキシフエニルメタクリルアミド、
アクリロニトリル、エチルアクリレート、及びメ
タアクリル酸の共重合体(モル比は上記の順に、
8.5:24:60.5:7) 5.0重量部
P−ジアゾジフエニルアミンとパラホルムアル
デヒドの縮合物のヘキサフルオロリン酸塩
0.5重量部
ビクトリアピユアーブルーBOH(保土ケ谷化学
工業(株)製) 0.1重量部
メチルセロソルブ 100重量部〕
乾燥後の塗布量は、1.8g/m2であつた。この
ようにして得られたネガ型PS版を800mm×1003mm
の大きさに裁断したものを多数枚用意し、これら
に透明陰画を通して80cmの距離から2Kwのメタ
ルハライドランプを用いて50秒間露光した。 [Para-hydroxyphenyl methacrylamide,
Copolymer of acrylonitrile, ethyl acrylate, and methacrylic acid (molar ratios are in the above order)
8.5:24:60.5:7) 5.0 parts by weight Hexafluorophosphate of condensate of P-diazodiphenylamine and paraformaldehyde
0.5 parts by weight Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Industry Co., Ltd.) 0.1 parts by weight Methyl cellosolve 100 parts by weight] The coating amount after drying was 1.8 g/m 2 . The negative PS plate obtained in this way is 800mm x 1003mm.
A large number of sheets were cut to the size of , and a transparent negative was passed through them and exposed for 50 seconds from a distance of 80 cm using a 2Kw metal halide lamp.
一方第1図に示された自動現像機の現像槽に下
記組成の現像液を16満たし、現像槽の次の処理
槽に水を16満たし、その次の処理槽に下記組成
の不感脂化液を4満たした。 On the other hand, the developing tank of the automatic processor shown in Figure 1 is filled 16 times with a developer having the composition shown below, the processing tank next to the developing tank is filled 16 times with water, and the next processing tank is filled with a desensitizing solution having the composition shown below. Satisfied 4.
現像液
フエニルセロソルブ 40重量部
ジエタノールアミン 10重量部
n−ブチルナフタレンスルホン酸ナトリウム
12重量部
消泡剤(商品名SM−5512東レシリコーン(株)社
製) 0.05重量部
水 937重量部
不感脂化液
デキストリン(商品名PENON JE−66(日澱
化学(株)製)) 9重量部
カルボキシメチルセルロースナトリウム塩
0.45重量部
リン酸 0.2重量部
ナフタレンスルホン酸ナトリウムホルマリン縮
合物(商品名デモールN(花王アトラスK,K
製)) 0.5重量部
ポリエチレンオキサイド(エチレンオキサイド
平均付加モル数15)ノニルフエノールエーテル
(商品名NP−15(日本サーフアクタントK,K
製)) 0.1重量部
p−ヒドロキシエチルベンゾエート0.05重量部
水 90重量部
次に上記のようにして得られた露光済みPS版
を上記の自動現像機で多数枚処理した。なお不感
脂化処理槽より搬出されたPS版は熱風により乾
燥した。また、水洗槽および不感脂化槽の処理液
は循環して使用した。このようにして露光済み
PS版を300枚処理したが、この時不感脂化液中に
は不溶物の発生は見られなかつた。また300枚目
の版で印刷を行なつたところ刷出し後約5枚で正
常な印刷物が得られ画線部の感脂性に優れた版で
あり、10万枚印刷を行なつたが汚れの発生はみら
れなかつた。比較として上記不感脂化液の代わり
に上記不感脂化液よりアニオン界面活性剤である
デモールNのみを除いたもの(A)、ノニオン界面活
性剤であるNP−15のみを除いたもの(B)、並びに
アニオン型活性剤及びノニオン型界面活性剤を除
いたもの(C)を使用した他は上記と同様の処理を行
なつたところ(A)及び(C)を用いた場合は露光済み
PS版を150枚処理した時点で不感脂化液中に不溶
物を生じ印刷時には汚れが生じた。Developer: Phenyl cellosolve 40 parts by weight Diethanolamine 10 parts by weight Sodium n-butylnaphthalenesulfonate
12 parts by weight Antifoaming agent (trade name SM-5512 manufactured by Toray Silicone Co., Ltd.) 0.05 parts by weight Water 937 parts by weight Desensitizing liquid Dextrin (trade name PENON JE-66 (manufactured by Nippon Deka Chemical Co., Ltd.)) 9 Parts by weight Carboxymethyl cellulose sodium salt
0.45 parts by weight Phosphoric acid 0.2 parts by weight Sodium naphthalene sulfonate formalin condensate (trade name Demol N (Kao Atlas K, K
)) 0.5 parts by weight Polyethylene oxide (average number of added moles of ethylene oxide 15) Nonylphenol ether (trade name NP-15 (Japan Surf Actant K, K
)) 0.1 part by weight p-hydroxyethylbenzoate 0.05 part by weight Water 90 parts by weight Next, a large number of the exposed PS plates obtained as described above were processed in the above-mentioned automatic processor. Note that the PS plate taken out from the desensitization treatment tank was dried with hot air. Furthermore, the treatment liquids in the washing tank and the desensitizing tank were circulated and used. Exposed like this
Although 300 PS plates were processed, no insoluble matter was observed in the desensitizing solution. In addition, when printing was carried out using the 300th plate, normal prints were obtained in about 5 pages after printing, and it was a plate with excellent oil sensitivity in the image area. No outbreak was observed. For comparison, instead of the above desensitizing liquid, the above desensitizing liquid was prepared by removing only the anionic surfactant Demol N (A), and by removing only the nonionic surfactant NP-15 (B) , and the same treatment as above except for using (C) excluding the anionic surfactant and nonionic surfactant, and when using (A) and (C), it was exposed.
After processing 150 PS plates, insoluble matter was formed in the desensitizing solution, causing stains during printing.
また、(B)を用いた場合は不溶物の発生はなかつ
たが、印刷時において、正常な印刷物を得るまで
の枚数が約8枚であり画線部の感脂性に劣つてい
た。 Further, when (B) was used, no insoluble matter was generated, but during printing, it took about 8 sheets to obtain a normal print, and the oil sensitivity of the printed area was poor.
実施例 2
不感脂化液として下記組成のものを用いた他
は、実施例1と同様な処理を行なつた。Example 2 The same treatment as in Example 1 was carried out, except that a desensitizing liquid having the following composition was used.
デキストリン(実施例1と同じもの)10重量部
カルボキシメチルセルロースナトリウム塩
0.45重量部
リン酸 0.25重量部
ジ(2−エチルヘキシル)スルホコハク酸ナト
リウム 0.14重量部
ポリエチレンオキサイド(エチレンオキサイド
平均付加モル数20)ノニルフエノールエーテル
0.1重量部
p−ヒドロキシエチルベンゾエート0.05重量部
水 90重量部
試験結果は、露光済みPS版を400枚処理した時
点でも不感脂化液中に不溶物の発生はなく、400
枚目の印刷版で印刷したところ画線部は感脂性に
優れており、10万枚印刷したが汚れの発生はな
く、鮮明な印刷物が得られた。一方上記不感脂化
液よりアニオン界面活性剤を除いたもの(D)及びノ
ニオン界面活性剤を除いたもの(E)を用いた他は同
様の処理を行なつたところ(D)を用いた場合は130
枚処理したところ不感脂化液中に不溶物が発生
し、印刷時には汚れを生じた。また(E)を用いた場
合は印刷時における初期の画線部の感脂性が劣つ
ていた。 Dextrin (same as Example 1) 10 parts by weight Carboxymethyl cellulose sodium salt
0.45 parts by weight Phosphoric acid 0.25 parts by weight Sodium di(2-ethylhexyl)sulfosuccinate 0.14 parts by weight Polyethylene oxide (average number of added moles of ethylene oxide 20) Nonylphenol ether
0.1 part by weight p-hydroxyethylbenzoate 0.05 part by weight Water 90 parts by weight The test results showed that no insoluble matter was generated in the desensitizing solution even after processing 400 exposed PS plates.
When printed with the second printing plate, the image area was excellent in oil sensitivity, and even after 100,000 copies were printed, there was no staining and clear prints were obtained. On the other hand, when the same treatment was carried out except that the above desensitizing liquid with the anionic surfactant removed (D) and the nonionic surfactant removed (E) were used, (D) was used. is 130
When the sheets were processed, insoluble matter was generated in the desensitizing solution, causing stains during printing. Furthermore, when (E) was used, the oil sensitivity of the initial image area during printing was poor.
実施例 3
不感脂化液として下記組成のものを用い、現像
液の使用量を25とした他は実施例1と同様な処
理を行なつた。Example 3 The same treatment as in Example 1 was carried out, except that a desensitizing solution having the following composition was used and the amount of developer used was 25.
デキストリン(実施例1と同じもの)8重量部
カルボキシメチルセルロースナトリウム塩
0.45重量部
リン酸 0.2重量部
ポリエチレンオキサイド(エチレンオキサイド
平均付加モル数19)ノニルフエノールエーテル硫
酸ナトリウム 0.5重量部
ポリエチレンオキサイド(エチレンオキサイド
平均付加モル数20)ノニルフエノールエーテル
0.08重量部
アラビアガム 0.3重量部
p−ヒドロキシエチルベンゾエート0.05重量部
水 90重量部
試験結果は、露光済みPS版を600枚処理した時
点でも不感脂化液中に不溶物の発生はなかつた。
また印刷を行なつたところ画像部の感脂性は良好
であり10万枚印刷しても汚れの発生はなかつた。 Dextrin (same as Example 1) 8 parts by weight Carboxymethyl cellulose sodium salt
0.45 parts by weight Phosphoric acid 0.2 parts by weight Polyethylene oxide (average number of added moles of ethylene oxide 19) Nonylphenol ether sodium sulfate 0.5 parts by weight Polyethylene oxide (average number of added moles of ethylene oxide 20) Nonylphenol ether
0.08 parts by weight Gum arabic 0.3 parts by weight p-hydroxyethylbenzoate 0.05 parts by weight Water 90 parts by weight The test results showed that no insoluble matter was generated in the desensitizing solution even after processing 600 exposed PS plates.
Furthermore, when printing was carried out, the oil sensitivity of the image area was good, and no staining occurred even after printing 100,000 sheets.
実施例 4
実施例1で使用した自現機の現像槽の次の槽に
下記組成の不感脂化液16満たし、その次の槽の
ローラーは取りはずし、処理液も使用しなかつ
た。Example 4 The tank next to the developing tank of the automatic processing machine used in Example 1 was filled with desensitizing liquid 16 having the following composition, the roller of the next tank was removed, and no processing liquid was used.
実施例1で用いたと同じ現像液16を現像槽に
満たし、実施例1で用いたと同様の露光済PS版
を処理した。 The developer tank was filled with the same developer 16 as used in Example 1, and the exposed PS plate similar to that used in Example 1 was processed.
デキストリン(実施例1と同じ) 7.5重量部
カルボキシメチルセルロースナトリウム塩
0.45重量部
リン酸 0.15重量部
ポリエチレンオキサイド(エチレンオキサイド
平均付加モル数19)ノニルフエノールエーテル硫
酸ナトリウム 0.5重量部
ポリエチレンオキサイド(エチレンオキサイド
平均付加モル数15)ノニルフエノール0.05重量部
p−ヒドロキシベンゾエート 0.04重量部
水 90重量部
試験結果は、露光済みPS版を150枚処理した時
点でも不感脂化液中に不溶物の発生はみられず、
印刷したところ画線部の感脂性は良好であり、10
万枚印刷しても汚れの発生はみられなかつた。上
記不感脂化液からノニオン界面活性剤を除いたも
のを用いた処理では画線部の感脂性が劣り、また
アニオン界面活性剤を除いたものを用いた処理で
は80枚目に不感脂化液中に不溶物が発生し印刷時
に汚れが発生した。 Dextrin (same as Example 1) 7.5 parts by weight Carboxymethyl cellulose sodium salt
0.45 parts by weight Phosphoric acid 0.15 parts by weight Polyethylene oxide (average number of added moles of ethylene oxide 19) Sodium nonylphenol ether sulfate 0.5 parts by weight Polyethylene oxide (average number of added moles of ethylene oxide 15) Nonylphenol 0.05 parts by weight p-hydroxybenzoate 0.04 parts by weight Water 90 parts by weight The test results show that no insoluble matter was observed in the desensitizing solution even after processing 150 exposed PS plates.
When printed, the oil sensitivity of the printed area was good, with a rating of 10
Even after printing 10,000 sheets, no stains were observed. In the treatment using the above desensitizing liquid without the nonionic surfactant, the greasensitivity of the printed area was poor, and in the treatment using the desensitizing liquid without the anionic surfactant, the desensitizing liquid was removed after the 80th sheet. Insoluble matter was generated inside the paper, causing stains during printing.
第1図は、本発明に係わる現像処理装置の構成
を示す概念図である。
1…現像処理槽、2…循環水洗槽、3…不感脂
化処理槽、7,8および9…ポンプ、10A,1
0B,10C,11および12…処理液スプレー
パイプ、18,19,20,21および22…ス
クイズローラー、23および24…平版印刷版。
FIG. 1 is a conceptual diagram showing the configuration of a developing processing apparatus according to the present invention. 1... Development treatment tank, 2... Circulating water washing tank, 3... Desensitization treatment tank, 7, 8 and 9... Pump, 10A, 1
0B, 10C, 11 and 12... Processing liquid spray pipe, 18, 19, 20, 21 and 22... Squeeze roller, 23 and 24... Lithographic printing plate.
Claims (1)
ネガ型感光性平版印刷版を画像露光し、アルカリ
性現像液で現像して非画線部を除去し後、不感脂
化処理する製版方法において、上記不感脂化処理
に用いる不感脂化液がデキストリン、酸、アニオ
ン界面活性剤および該アニオン界面活性剤に対し
て150〜1重量%のノニオン界面活性剤を含む水
溶液であることを特徴とする製版方法。 In a plate-making method in which a negative photosensitive lithographic printing plate having a photosensitive layer containing a diazo compound on a support is imagewise exposed, developed with an alkaline developer to remove non-image areas, and then desensitized, A plate-making method characterized in that the desensitizing liquid used for desensitizing treatment is an aqueous solution containing dextrin, an acid, an anionic surfactant, and a nonionic surfactant in an amount of 150 to 1% by weight based on the anionic surfactant. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5175382A JPS58175695A (en) | 1982-03-29 | 1982-03-29 | Preparation of printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5175382A JPS58175695A (en) | 1982-03-29 | 1982-03-29 | Preparation of printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58175695A JPS58175695A (en) | 1983-10-14 |
JPS6352600B2 true JPS6352600B2 (en) | 1988-10-19 |
Family
ID=12895691
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5175382A Granted JPS58175695A (en) | 1982-03-29 | 1982-03-29 | Preparation of printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58175695A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0726498A1 (en) | 1995-02-10 | 1996-08-14 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
EP1972438A1 (en) | 2007-03-20 | 2008-09-24 | FUJIFILM Corporation | Lithographic printing plate precursor and method of preparing lithographic printing plate |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61261095A (en) * | 1985-05-15 | 1986-11-19 | Fuji Photo Film Co Ltd | Surface cleaning agent for planographic plate |
JPS6283194A (en) * | 1985-10-09 | 1987-04-16 | Fuji Photo Film Co Ltd | Plate surface protective agent for planographic printing plate |
JP2009083106A (en) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | Lithographic printing plate surface protective agent and plate making method for lithographic printing plate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5036207A (en) * | 1973-08-03 | 1975-04-05 | ||
JPS548002A (en) * | 1977-06-17 | 1979-01-22 | Fuji Photo Film Co Ltd | Method of developing flat printing plate |
JPS5525027A (en) * | 1978-08-09 | 1980-02-22 | Fuji Photo Film Co Ltd | Processing method |
JPS5630196A (en) * | 1979-08-17 | 1981-03-26 | Wurlitzer Co | Digital waveform generator for electronic musical instrument |
JPS5630854A (en) * | 1979-08-21 | 1981-03-28 | Dainippon Trading | Nonnslip packing vessel |
-
1982
- 1982-03-29 JP JP5175382A patent/JPS58175695A/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5036207A (en) * | 1973-08-03 | 1975-04-05 | ||
JPS548002A (en) * | 1977-06-17 | 1979-01-22 | Fuji Photo Film Co Ltd | Method of developing flat printing plate |
JPS5525027A (en) * | 1978-08-09 | 1980-02-22 | Fuji Photo Film Co Ltd | Processing method |
JPS5630196A (en) * | 1979-08-17 | 1981-03-26 | Wurlitzer Co | Digital waveform generator for electronic musical instrument |
JPS5630854A (en) * | 1979-08-21 | 1981-03-28 | Dainippon Trading | Nonnslip packing vessel |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0726498A1 (en) | 1995-02-10 | 1996-08-14 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
EP1972438A1 (en) | 2007-03-20 | 2008-09-24 | FUJIFILM Corporation | Lithographic printing plate precursor and method of preparing lithographic printing plate |
Also Published As
Publication number | Publication date |
---|---|
JPS58175695A (en) | 1983-10-14 |
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