JPS6351432U - - Google Patents
Info
- Publication number
- JPS6351432U JPS6351432U JP14611486U JP14611486U JPS6351432U JP S6351432 U JPS6351432 U JP S6351432U JP 14611486 U JP14611486 U JP 14611486U JP 14611486 U JP14611486 U JP 14611486U JP S6351432 U JPS6351432 U JP S6351432U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- lid member
- susceptor
- reaction
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012495 reaction gas Substances 0.000 claims description 4
- 238000001947 vapour-phase growth Methods 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14611486U JPH058672Y2 (sv) | 1986-09-24 | 1986-09-24 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14611486U JPH058672Y2 (sv) | 1986-09-24 | 1986-09-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6351432U true JPS6351432U (sv) | 1988-04-07 |
JPH058672Y2 JPH058672Y2 (sv) | 1993-03-04 |
Family
ID=31058281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14611486U Expired - Lifetime JPH058672Y2 (sv) | 1986-09-24 | 1986-09-24 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH058672Y2 (sv) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015138897A (ja) * | 2014-01-23 | 2015-07-30 | 信越半導体株式会社 | 気相成長装置の清掃又は点検方法 |
JP2016039174A (ja) * | 2014-08-05 | 2016-03-22 | 住友化学株式会社 | 反応容器の密閉構造、および基板処理装置 |
-
1986
- 1986-09-24 JP JP14611486U patent/JPH058672Y2/ja not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015138897A (ja) * | 2014-01-23 | 2015-07-30 | 信越半導体株式会社 | 気相成長装置の清掃又は点検方法 |
JP2016039174A (ja) * | 2014-08-05 | 2016-03-22 | 住友化学株式会社 | 反応容器の密閉構造、および基板処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH058672Y2 (sv) | 1993-03-04 |