JPS6351209U - - Google Patents
Info
- Publication number
- JPS6351209U JPS6351209U JP14548986U JP14548986U JPS6351209U JP S6351209 U JPS6351209 U JP S6351209U JP 14548986 U JP14548986 U JP 14548986U JP 14548986 U JP14548986 U JP 14548986U JP S6351209 U JPS6351209 U JP S6351209U
- Authority
- JP
- Japan
- Prior art keywords
- ultrasonic
- focused
- sample
- thickness gauge
- detection element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims 2
- 238000002604 ultrasonography Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 1
- MUJOIMFVNIBMKC-UHFFFAOYSA-N fludioxonil Chemical compound C=12OC(F)(F)OC2=CC=CC=1C1=CNC=C1C#N MUJOIMFVNIBMKC-UHFFFAOYSA-N 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
Landscapes
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Description
第１図は反射型超音波顕微鏡の原理を示す図、
第２図は反射型超音波顕微鏡による音速又は厚さ
測定の原理を示す図、第３図は第２図の測定原理
によつて得られる干渉曲線、第４図は従来の反射
型超音波顕微鏡に用いられている集束超音波変換
素子の構造を示す図、第５図は特願昭５１―１２
７４９８記載の凹面集束超音波変換素子の構造図
、第６図は本考案にかかわる集束超音波変換素子
の構造図、第７図は本考案の１実施例、第８図は
集束超音波変換素子を試料表面から離して測定す
る場合の構成図、第９図はサフアイアを被測定試
料として得られた干渉曲線の１例、第１０図は音
響ホーンを用いた集束超音波発生・検出素子の構
成例である。
１…高周波パルス発振器、２…方向性結合器、
３…集束超音波発生・検出素子、４…液体カプラ
、５…被測定試料保持台、６…被測定試料、７…
二次元走査を行うためのＸＹ方向移動装置、８…
走査制御回路、９…超音波顕微鏡像を表示するた
めの表示装置、１０…固体超音波伝搬媒体、１１
…超音波トランスジユーサ、１２…整合層、１３
…集束超音波の放射面、１４…本考案にかかる凹
面集束超音波変換素子、１５…本考案の実施例に
おける被測定試料のＺ方向位置を調整するための
微動器、１６…被測定試料面に対する超音波ビー
ム軸調整のための二軸ゴニオメータ、１７…高周
波掃引発振器、１８…高周波パルス変調器、１９
…受信回路、２０…ＸＹレコーダー、２１…信号
記憶処理装置、２２…音響ホーン。
Figure 1 is a diagram showing the principle of a reflection ultrasound microscope.
Figure 2 is a diagram showing the principle of sound velocity or thickness measurement using a reflection type ultrasound microscope, Figure 3 is an interference curve obtained by the measurement principle in Figure 2, and Figure 4 is a diagram showing a conventional reflection type ultrasound microscope. Figure 5 is a diagram showing the structure of a focused ultrasound transducer used in
6 is a structural diagram of a concave focused ultrasound transducer according to No. 7498, FIG. 6 is a structural diagram of a focused ultrasound transducer according to the present invention, FIG. 7 is an embodiment of the present invention, and FIG. 8 is a focused ultrasound transducer. Figure 9 is an example of an interference curve obtained using saphire as the sample to be measured. Figure 10 is the configuration of a focused ultrasonic generation/detection element using an acoustic horn. This is an example. 1...High frequency pulse oscillator, 2...Directional coupler,
3...Focused ultrasound generation/detection element, 4...Liquid coupler, 5...Measurement sample holding stand, 6...Measurement sample, 7...
XY direction moving device for performing two-dimensional scanning, 8...
Scanning control circuit, 9...Display device for displaying an ultrasound microscope image, 10...Solid ultrasound propagation medium, 11
...Ultrasonic transducer, 12...Matching layer, 13
... Emission surface of focused ultrasound, 14... Concave focused ultrasound conversion element according to the present invention, 15... Fine mover for adjusting the Z-direction position of the sample to be measured in the embodiment of the present invention, 16... Surface of the sample to be measured two-axis goniometer for ultrasound beam axis adjustment, 17...high frequency sweep oscillator, 18...high frequency pulse modulator, 19
...receiving circuit, 20...XY recorder, 21...signal storage processing device, 22...acoustic horn.
Claims (1)
表面の微小面積部分に接触あるいは薄い液体層を
介して接触させ、その被測定試料中に高周波超音
波ビームを放射し、その被測定試料の表裏両面で
の多重反射により干渉波を起こさせ、その干渉波
の周波数依存性を解析することによりその被測定
試料の厚さを計測する干渉型超音波厚さ計におい
て、超音波発生・検出素子として、集束超音波発
生・検出素子を使用し、かつ、その超音波放射部
が微小平面であることを特徴とする超音波厚さ計
。 (2) 上記記載の干渉型超音波厚さ計において、
凸面部と平面部とを対向させた形状の超音波固体
伝搬基体の凸面部に圧電膜を形成させて凹面超音
波トランスジユーサとなし、対向する平面部を超
音波放射面とし、その超音波放射面の近傍あるい
は僅か外側に焦点を結ぶように凸面部と平面部と
を配置した構成で、かつその平面部としては集束
超音波ビームが通過する中心軸付近の微小平面部
分だけを残して他の部分を斜めに切り取つた形状
の集束超音波発生・検出素子を使用することを特
徴とする超音波厚さ計。 (3) 上記記載の干渉型超音波厚さ計において用
いる集束超音波発生・検出素子として、高周波超
音波を音響ホーンによつて細いビームに絞り、そ
の放射端面が平面でかつ、その直径が１波長以下
の小さな寸法であることを特徴とする超音波厚さ
計。[Scope of Claim for Utility Model Registration] (1) A high-frequency ultrasonic wave generation/detection element is brought into contact with a minute area of the surface of a sample to be measured or through a thin liquid layer, and a high-frequency ultrasonic beam is transmitted into the sample to be measured. An interferometric ultrasonic thickness gauge that measures the thickness of a sample by emitting radiation, causing interference waves through multiple reflections on both the front and back surfaces of the sample, and analyzing the frequency dependence of the interference waves. An ultrasonic thickness gauge characterized in that a focused ultrasonic wave generation/detection element is used as the ultrasonic wave generation/detection element, and the ultrasonic wave emission part is a microscopic plane. (2) In the interferometric ultrasonic thickness gauge described above,
A piezoelectric film is formed on the convex part of an ultrasonic solid propagation base having a shape in which a convex part and a flat part face each other to form a concave ultrasonic transducer. It has a configuration in which a convex surface part and a flat part are arranged so as to focus near or slightly outside the radiation surface, and as the flat part, only a minute flat part near the central axis through which the focused ultrasonic beam passes is left. An ultrasonic thickness gauge characterized by using a focused ultrasonic wave generating/detecting element having a shape cut out diagonally. (3) As the focused ultrasonic generation/detection element used in the interferometric ultrasonic thickness gauge described above, high-frequency ultrasonic waves are focused into a narrow beam using an acoustic horn, and the emission end face is flat and the diameter is 1 An ultrasonic thickness gage characterized by small dimensions below the wavelength.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14548986U JPS6351209U (en) | 1986-09-23 | 1986-09-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14548986U JPS6351209U (en) | 1986-09-23 | 1986-09-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6351209U true JPS6351209U (en) | 1988-04-06 |
Family
ID=31057077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14548986U Pending JPS6351209U (en) | 1986-09-23 | 1986-09-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6351209U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003512680A (en) * | 1999-10-19 | 2003-04-02 | メランゾ テルジェ | Method for hidden coding of objects and reading method |
-
1986
- 1986-09-23 JP JP14548986U patent/JPS6351209U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003512680A (en) * | 1999-10-19 | 2003-04-02 | メランゾ テルジェ | Method for hidden coding of objects and reading method |
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