JPS6350878U - - Google Patents
Info
- Publication number
- JPS6350878U JPS6350878U JP14414986U JP14414986U JPS6350878U JP S6350878 U JPS6350878 U JP S6350878U JP 14414986 U JP14414986 U JP 14414986U JP 14414986 U JP14414986 U JP 14414986U JP S6350878 U JPS6350878 U JP S6350878U
- Authority
- JP
- Japan
- Prior art keywords
- metal plate
- gas
- plate
- electrode
- power source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims 3
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Description
第１図は従来例のガス噴出プレート部分の正面
図、第２図は本案電極の１例の截断側面図、第３
図はその正面図である。
１……電源本体、２……高周波電源、３……膨
大する頭部、４……ガス通路、５……ガス室、６
……ガス噴出プレート。
Fig. 1 is a front view of the gas ejection plate portion of the conventional example, Fig. 2 is a cutaway side view of an example of the electrode of the present invention, and Fig. 3
The figure is its front view. 1... Power source body, 2... High frequency power source, 3... Enormous head, 4... Gas passage, 5... Gas chamber, 6
...Gas spout plate.
Claims (1)
大する頭部内を、該本体内を介してのびるガス通
路に連なるガス室に形成させると共に、その前面
の開口にガス噴出プレートを施すものにおいて、
該プレートを焼結金属板、発泡金属板その他の多
孔質金属板で構成させて成るガス噴出式高周波電
極。 The inside of the huge head of the tip of the electrode body connected to a high-frequency power source is formed into a gas chamber connected to a gas passage extending through the body, and a gas ejection plate is provided at the front opening of the body,
A gas injection type high frequency electrode in which the plate is constructed of a sintered metal plate, a foamed metal plate, or other porous metal plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986144149U JPH0336520Y2 (en) | 1986-09-22 | 1986-09-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986144149U JPH0336520Y2 (en) | 1986-09-22 | 1986-09-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6350878U true JPS6350878U (en) | 1988-04-06 |
| JPH0336520Y2 JPH0336520Y2 (en) | 1991-08-02 |
Family
ID=31054492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986144149U Expired JPH0336520Y2 (en) | 1986-09-22 | 1986-09-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0336520Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5741367A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Chemical vapor deposition device |
| JPS58163432A (en) * | 1982-03-24 | 1983-09-28 | Fujitsu Ltd | Plasma chemical vapor deposition apparatus |
-
1986
- 1986-09-22 JP JP1986144149U patent/JPH0336520Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5741367A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Chemical vapor deposition device |
| JPS58163432A (en) * | 1982-03-24 | 1983-09-28 | Fujitsu Ltd | Plasma chemical vapor deposition apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0336520Y2 (en) | 1991-08-02 |