JPS6344313A - Production of magnetic disk substrate - Google Patents
Production of magnetic disk substrateInfo
- Publication number
- JPS6344313A JPS6344313A JP18806786A JP18806786A JPS6344313A JP S6344313 A JPS6344313 A JP S6344313A JP 18806786 A JP18806786 A JP 18806786A JP 18806786 A JP18806786 A JP 18806786A JP S6344313 A JPS6344313 A JP S6344313A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- magnetic disk
- resin
- disk substrate
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 22
- 239000003822 epoxy resin Substances 0.000 claims abstract description 14
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 14
- 229920006015 heat resistant resin Polymers 0.000 claims abstract description 9
- 239000011342 resin composition Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 16
- 239000004697 Polyetherimide Substances 0.000 claims description 3
- 229920006393 polyether sulfone Polymers 0.000 claims description 3
- 229920001601 polyetherimide Polymers 0.000 claims description 3
- 229920001665 Poly-4-vinylphenol Polymers 0.000 claims description 2
- 238000003475 lamination Methods 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims 1
- 238000001746 injection moulding Methods 0.000 abstract description 6
- 238000010030 laminating Methods 0.000 abstract description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 239000005011 phenolic resin Substances 0.000 abstract 1
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 239000000835 fiber Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- -1 bisphenol A type Chemical compound 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920003043 Cellulose fiber Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 241001122767 Theaceae Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920004747 ULTEM® 1000 Polymers 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- DBIWHDFLQHGOCS-UHFFFAOYSA-N piperidine;trifluoroborane Chemical compound FB(F)F.C1CCNCC1 DBIWHDFLQHGOCS-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 150000003900 succinic acid esters Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
零発11 #−i表面が平滑な樹脂製の磁気ディスク基
板の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] Zero-Hatsu 11 #-i This invention relates to a method of manufacturing a magnetic disk substrate made of resin and having a smooth surface.
従来、磁気ディスク基板は、高速回転に##える強度及
び剛性や超精密加工性、耐熱性等が要求されるため、ア
ルミニウム合金か使用されている。しかし、表面精度(
平滑性)を得るには研削、Fif摩による仕上げ工程が
心外であり、生産性が低かった。又アルミニウム合金製
の基板は重量が重いので、駆動モーターの負荷、発熱等
の問題があり、磁気ディスク装立を小型化することがで
きなかった。Conventionally, aluminum alloys have been used for magnetic disk substrates because they are required to have strength and rigidity that can withstand high-speed rotation, ultra-precision machinability, heat resistance, and the like. However, surface accuracy (
In order to obtain smoothness, the finishing process by grinding and polishing was unnecessary, resulting in low productivity. Furthermore, since aluminum alloy substrates are heavy, there are problems such as load on the drive motor and heat generation, making it impossible to downsize the magnetic disk unit.
最近、上記欠点を解消するため、合成樹脂を射出成形し
た基板が従来されているが、射出成形され九基板の表面
は平滑性が小さいという欠点を存していた。表面平滑性
を付与するために、たとえd特公昭52−36684号
公報には射出成形した基板を平滑な金属製加圧板で加熱
しながら加圧し、さらに平滑度がα1μ以下のガラス製
平滑板で加圧しながら加圧成形することが提案されてお
り、特開昭59−135133号公報には射出成形の金
型表面に架橋性材料を塗布しておき、その中に合成樹脂
を射出成形することが提案されている。Recently, in order to solve the above-mentioned drawbacks, a substrate made of injection molded synthetic resin has been conventionally used, but the surface of the injection molded substrate has a drawback of low smoothness. In order to impart surface smoothness, for example, in Japanese Patent Publication No. 52-36684, the injection molded substrate is heated and pressed with a smooth metal pressure plate, and then a glass smooth plate with a smoothness of α1μ or less is used. It has been proposed to perform pressure molding while applying pressure, and JP-A-59-135133 discloses a method in which a crosslinkable material is applied to the surface of an injection mold, and a synthetic resin is injection molded into the crosslinkable material. is proposed.
しかしながら、前者の方法では、特殊な平滑な加圧板を
2組必要とし、射出FL形後後基板2徴
度加熱加圧しなければならず、又前者の方法では平滑度
のすぐれた金型を必要とし、かつ射出lit形する際に
いちいち金型内部に架橋性材料を塗布する必要があるの
で、両者の方法とも製造が困難であり、生産性が低く、
生産コストが高くつくという欠点を有していた。However, the former method requires two sets of special smooth pressure plates, and the substrate must be heated and pressed twice after the injection FL shape, and the former method requires a mold with excellent smoothness. In addition, it is necessary to apply a crosslinking material to the inside of the mold each time the injection mold is formed, so both methods are difficult to manufacture and have low productivity.
It had the disadvantage of high production costs.
r発明が解決しようとする問題点〕
本発明の目的は、上記欠点に鑑み、表面精度、@熱性、
強度、耐久性等がすぐれた、軽量々磁気ディスク基板を
生産性よくかつ低コストで製造しうる方法を提供するこ
とにある。rProblems to be Solved by the Invention] In view of the above-mentioned drawbacks, the purpose of the present invention is to improve surface precision, @thermal property,
It is an object of the present invention to provide a method for manufacturing a lightweight magnetic disk substrate with excellent strength, durability, etc., with high productivity and at low cost.
本発明で使用する耐熱性樹脂は、熱変形温度が180℃
以上であって射出成形可能なものでちり、たとえばポリ
エーテルイミド、ポリエーテルサルフオン等があげられ
る。The heat-resistant resin used in the present invention has a heat distortion temperature of 180°C.
Examples of the above materials that can be injection molded include polyetherimide, polyether sulfon, and the like.
本発明においては、上記耐熱性樹脂よりなる基板表面に
熱硬化性樹脂組成物を積層し、硬化せしめるし、又得ら
れた磁気ディスク基板から磁気ディスクを得るには基板
表面にクロム、ロジウム等の金属を蒸着、スパッタリン
グ等を行うのであるから、これらの工程において加熱さ
れた基板の寸法安定性がすぐれ表面精度が低下しないの
が好ましいので、耐熱性樹脂の熱変形温度Fi180℃
以上に限定される。In the present invention, a thermosetting resin composition is laminated on the surface of a substrate made of the heat-resistant resin and cured, and in order to obtain a magnetic disk from the obtained magnetic disk substrate, chromium, rhodium, etc. are added to the substrate surface. Since metal is vapor-deposited, sputtered, etc., it is preferable that the dimensional stability of the substrate heated in these processes is excellent and that the surface precision does not deteriorate.
limited to the above.
上記基板は射出成形によって成形されているのであり、
射出成形は従来公知の任意の方法が採用されてよいが、
基板の表面は平滑なほうが好ましいので表面が平滑な金
型を用いて射出成形されるのが好ましい。The above board is molded by injection molding,
Any conventionally known method may be used for injection molding, but
Since the surface of the substrate is preferably smooth, injection molding is preferably performed using a mold with a smooth surface.
又基板に強度、寸法安定性、it熱性等を付与するため
に、耐熱性樹脂に充填材を添加してもよい。Further, a filler may be added to the heat-resistant resin in order to impart strength, dimensional stability, heat resistance, etc. to the substrate.
上記充填材としては、たとえばカーボン、アルミナ、二
酸化ケイ素、マイカ、タルク、ケイ酸カルシウム、炭化
ケイ素、炭酸カルシウム、チタン酸カルンウム、硫酸カ
ルシウム等の粉末、チタン酸カルシウム繊維、炭素繊維
、アラミドta維、セルロース繊維等の繊維などがあげ
られ、臘
粉末及び繊維の直径や長が大きくなると基体の表面平滑
性が低下するので直径は1μ以下、長さは100μ以下
が好ましい。又充填材の添加量は少量では効果がないし
、多くなると表面平滑性が低下するので耐熱性樹脂10
0重量部に対し、5〜100ffiit部添加されるの
が好ましい。Examples of the filler include powders such as carbon, alumina, silicon dioxide, mica, talc, calcium silicate, silicon carbide, calcium carbonate, carunium titanate, calcium sulfate, calcium titanate fiber, carbon fiber, aramid TA fiber, Examples include fibers such as cellulose fibers, and as the diameter and length of the wax powder and fibers increase, the surface smoothness of the substrate deteriorates, so the diameter is preferably 1 μm or less and the length is preferably 100 μm or less. Also, if the amount of filler added is small, it will not be effective, and if it is large, the surface smoothness will decrease, so heat resistant resin 10
It is preferable to add 5 to 100 parts by weight per 0 parts by weight.
本発明においては、上記基板の表面に熱硬化性樹脂組成
物を8!層するのであるが、該樹脂層は上記基体との密
着性がすぐれ、該樹脂層の表面にクロム、ロジウム等を
蒸着又はスパッタリングすることができ、かつ表面精度
のよいことが要求されるので、エポキシ樹脂とポリバラ
ビニルフェノール樹脂よりなる熱硬化性樹脂組成物が使
用される、
上記エポキシ樹脂としてはビスフェノールA型、ノボラ
ック型、ビスフェノールF型等のグリシジルエーテル系
エポキシ樹脂が好適1こ使用される。In the present invention, a thermosetting resin composition is applied to the surface of the substrate. The resin layer is required to have excellent adhesion to the substrate, to be able to deposit or sputter chromium, rhodium, etc. on the surface of the resin layer, and to have good surface precision. A thermosetting resin composition consisting of an epoxy resin and a polyvarabinylphenol resin is used. As the epoxy resin, glycidyl ether type epoxy resins such as bisphenol A type, novolac type, and bisphenol F type are preferably used. .
上記ポリバラビニルフェノール樹脂とはパラビニルフェ
ノール、パラプロペニルフェノール等が重合されたもの
であって、たとえば丸善石油株式会社製、商品名レジン
Mがあげられる。The above-mentioned polyvinylphenol resin is one obtained by polymerizing paravinylphenol, parapropenylphenol, etc., and includes, for example, the product name Resin M manufactured by Maruzen Sekiyu Co., Ltd.
上記エポキシ樹脂とポリバラビニルフェノール樹脂の比
率はエポキシ樹脂の比率が大きくなると耐熱性が低下し
、ポリバラビニルフェノール樹脂の比率が大きくなると
もろくなり、基板への密着性や表面平滑性が低下するの
で、重量比でlO:1〜10:12であるのが好ましく
、エポキシ基と水酸基が略当量になるように添加される
のが好ましい。Regarding the ratio of the above epoxy resin and polyvarabinylphenol resin, as the ratio of epoxy resin increases, the heat resistance decreases, and as the ratio of polyvarabinylphenol resin increases, it becomes brittle, and the adhesion to the substrate and surface smoothness decrease. Therefore, it is preferable that the weight ratio is lO:1 to 10:12, and it is preferable that the epoxy group and the hydroxyl group are added in approximately equivalent amounts.
上記熱硬化性樹脂組成物には、硬化時間の調整、基板に
対する密着性、耐熱性、表面精度を向上させるために硬
化促進剤や表面張力を低下させる界面活性剤を添加する
のが好ましい。It is preferable to add a curing accelerator and a surfactant that lowers surface tension to the thermosetting resin composition in order to adjust the curing time and improve adhesion to the substrate, heat resistance, and surface precision.
上記硬化促進剤としては、一般にエポキシ樹脂の硬化促
進剤として使用されているイミダゾール類、アミン類、
アミド類、ホウ素化合物等があげられ、トリス(ジメチ
ルアミノメチル)フェノール、ジメチルアミノメチルフ
ェノール尋の三級アミン及び三フッ化ホウ素ピペリジン
錯塩、三フッ化ホウ素ジシクロヘキシルアミン給塩等の
三フッ化ホウ素錯塩が好ましい。硬化促進剤の添加量は
所望の硬化速度、硬化温度等により適宜決定されればよ
いが、一般にエポキシ樹脂100重量部に対し、0.5
〜3重量部添加される。Examples of the curing accelerator include imidazoles, amines, which are generally used as curing accelerators for epoxy resins,
Amides, boron compounds, etc., including tertiary amines such as tris(dimethylaminomethyl)phenol, dimethylaminomethylphenol, and boron trifluoride complex salts such as boron trifluoride piperidine complex salts and boron trifluoride dicyclohexylamine salts. is preferred. The amount of the curing accelerator to be added may be appropriately determined depending on the desired curing speed, curing temperature, etc., but generally 0.5 parts by weight per 100 parts by weight of the epoxy resin.
~3 parts by weight is added.
又上記界面活性剤は熱硬化性樹脂組成物の表面張力を低
下させるものであればよく、たとえばフッ素系界面活性
剤、シリコン茶界ml活性剤等があげられ、添加量はエ
ポキシ樹脂100重量部に対し、一般に2重量部以下で
ある、本発明においては、上記熱硬化性樹脂組成物は基
板の表面に積層され硬化されるのであるが、該組成物が
基板表面に均一にかつ薄く塗布され、硬化後の表面平滑
性がすぐれたものになるよう、有礪溶剤で固形分20〜
50重盆チ、粘度(20℃)、20〜200 cpsに
希釈されるのが好ましい。The above-mentioned surfactant may be one that lowers the surface tension of the thermosetting resin composition, and includes, for example, a fluorine-based surfactant, a silicone tea activator, etc., and the amount added is 100 parts by weight of the epoxy resin. In the present invention, the thermosetting resin composition is laminated and cured on the surface of the substrate, but it is generally not more than 2 parts by weight. , so that the surface smoothness after curing is excellent, the solid content is 20 ~ 20 with a solid solvent.
Preferably, it is diluted to 50 gb, viscosity (20°C), 20-200 cps.
上記有鏝溶剤としては、たとえばメチルエチルケトン、
メチルイソブチルケトン、ジアセトンアルコール、エチ
ルセロソルブ、エチルセロリルブアセテート、酢酸グリ
コールエーテル、コハク酸エステル、トルエン、キシレ
ン等カアげられる。Examples of the above-mentioned troweled solvents include methyl ethyl ketone,
Methyl isobutyl ketone, diacetone alcohol, ethyl cellosolve, ethyl cellolyl acetate, acetic acid glycol ether, succinic acid ester, toluene, xylene, etc.
又熱硬化性ts!脂組成物の積層方法は任意の方法が採
用されてよく、たとえばリバースロールコート法、ナイ
フコート法、スプレーコート法、スピンコード法、ディ
ッピング法等があげられ、均一な膜厚、高い表面精度を
得るにはスピンコード法が好ましい。Also thermosetting TS! Any method may be used to layer the fat composition, such as reverse roll coating, knife coating, spray coating, spin coding, dipping, etc., to ensure uniform film thickness and high surface precision. The spin code method is preferable for obtaining this.
スピンコード法は基板を回転しながら熱硬化性樹脂組成
物を滴下するか、熱硬化性樹脂組成物を基板上に滴下し
た後基板を回転すればよい。In the spin cord method, the thermosetting resin composition may be dropped while rotating the substrate, or the thermosetting resin composition may be dropped onto the substrate and then the substrate may be rotated.
回転数及び回転時間は積層する樹脂組成物の粘度、層の
厚み等によって適宜決定されればよいが、一般に回転数
は100〜2000回転であり、回転時間は20秒〜3
分であり、好ましくは100〜300 rpm程度の低
速で回転している基板上に外周側から内周方向にむけて
熱硬化性樹脂組成物を滴下し、10〜30秒回転させて
基板表面全体に樹脂組成物と分散した後、500 rp
m以上の高速で20〜60秒回転して余分な樹脂組成物
をはねとばして熱硬化性樹脂組成物層を形成する。The rotation speed and rotation time may be appropriately determined depending on the viscosity of the resin composition to be laminated, the thickness of the layer, etc., but generally the rotation speed is 100 to 2000 rotations, and the rotation time is 20 seconds to 3.
The thermosetting resin composition is dripped onto a substrate rotating at a low speed of about 100 to 300 rpm from the outer circumference toward the inner circumference, and rotated for 10 to 30 seconds to coat the entire substrate surface. After dispersing with the resin composition, 500 rp
The thermosetting resin composition layer is formed by rotating at a high speed of m or higher for 20 to 60 seconds to remove excess resin composition.
又熱硬化性樹脂組成物は積層後硬化させるのであるが、
硬化は溶剤を揮発せしめた後行うのが好ましく、即ちた
とえば80〜150℃に加熱して溶剤を焚発した後15
0℃以上であって基体の熱変形温度以下の温度で加熱し
て硬化せしめるのが好ましい。In addition, thermosetting resin compositions are cured after lamination.
Curing is preferably carried out after the solvent has volatilized, that is, for example, after heating to 80 to 150°C to ignite the solvent,
It is preferable to heat and harden at a temperature of 0° C. or higher and lower than the heat deformation temperature of the substrate.
上記熱硬化性樹脂組成物のには厚くなると基体との密着
性が低下し、ピンホールや気泡ができやすくなり、逆に
薄くなると表面精度が向上しなくなるので2〜2o11
であるのが好ましい。When the above-mentioned thermosetting resin composition becomes thick, the adhesion with the substrate decreases and pinholes and bubbles are likely to form.On the other hand, when the thermosetting resin composition becomes thin, the surface precision cannot be improved.
It is preferable that
本発明の磁気ディスク基板の製造方法の構成は上述の通
りであり、射出成形された基体表面に熱硬化性樹脂組成
物を積層、硬化するのであるから、容易かつ生産性よく
製造することができる。又得られた磁気ディスク基板は
、基板が熱変形温度が180’C以上の耐熱性樹脂がら
なり、表面に積!シされた熱硬化性樹脂組成物の層がエ
ポキシ樹脂とポリバラビニルフェノール樹脂よりなるの
であるから、基体とlII成物の層は強固に密着してお
り、耐熱性、強度、耐久性等がすぐれ、表面精度(平滑
性)がすぐれているのである。The structure of the method for manufacturing a magnetic disk substrate of the present invention is as described above, and since a thermosetting resin composition is laminated and cured on the surface of an injection-molded substrate, it can be manufactured easily and with high productivity. . In addition, the obtained magnetic disk substrate is made of a heat-resistant resin with a heat deformation temperature of 180'C or more, and the substrate is made of a heat-resistant resin with a heat deformation temperature of 180'C or higher, and the surface of the substrate is laminated! Since the layer of the cured thermosetting resin composition is made of epoxy resin and polybarabinylphenol resin, the substrate and the layer of III compound are tightly adhered, and the heat resistance, strength, durability, etc. It has excellent surface precision (smoothness).
従って本発明で得られた磁気ディスク基板のh硬化性樹
脂組成物層上にクロム、ロジウム等の金属を蒸着、スパ
ッタリング等によって積層すること番とよって高密度化
に対応しつる磁気ディスクを容易に製造することができ
ろう〔実施例〕
次に本発明の詳細な説明する。Therefore, by laminating metals such as chromium, rhodium, etc. by vapor deposition, sputtering, etc. on the hardenable resin composition layer of the magnetic disk substrate obtained in the present invention, it is possible to easily produce a magnetic disk that can handle high density. [Example] Next, the present invention will be described in detail.
実施例1〜5
第1表に示した所定量のポリエーテルサルフォン、ポリ
エーテルイミド及びチタン酸カリウム繊維(直径0.2
〜0.5μ、長さ10〜20μ)を均一に混合し、ペレ
ットを作成し、得られたベレットを射出成形機に供給し
て射出成形を行い、外径130M、内径40m+、厚さ
1.9mの5+1基板を得た。得られた基板の表面平滑
性をJIS B 0601−1970 に従って触
針型表面粗さ計で測定し、平均の表面粗さRa及び最大
値Rmaxを第1表に示した。Examples 1 to 5 Predetermined amounts of polyethersulfone, polyetherimide and potassium titanate fibers (diameter 0.2
~0.5μ, length 10~20μ) to create pellets, and the resulting pellets were fed to an injection molding machine to perform injection molding to form pellets with an outer diameter of 130M, an inner diameter of 40M+, and a thickness of 1.5μ. A 9m 5+1 board was obtained. The surface smoothness of the obtained substrate was measured using a stylus type surface roughness meter according to JIS B 0601-1970, and the average surface roughness Ra and maximum value Rmax are shown in Table 1.
得られた基板を充分に脱脂洗浄し、乾燥した後、スピン
コード機に供給し、第1表に示した配合の熱硬化性樹脂
組成物10Fを基板上に滴下し、初期回転数20 Or
pmで20秒間基板を回転し、続いて1000 rpm
で30秒間回転してスピンコードした。次に120℃で
1時間乾燥した後170℃で2時間硬化せしめて磁気デ
ィスク基板を得た。尚、熱硬化性樹脂組成物の粘度と、
該樹脂組成物の層の厚みを第1表に示した。After the obtained substrate was thoroughly degreased and washed and dried, it was fed to a spin cord machine, and thermosetting resin composition 10F having the composition shown in Table 1 was dropped onto the substrate, and the initial rotation speed was 20 Or
Rotate the substrate for 20 seconds at pm followed by 1000 rpm
It was rotated for 30 seconds and spin coded. Next, it was dried at 120°C for 1 hour and then cured at 170°C for 2 hours to obtain a magnetic disk substrate. In addition, the viscosity of the thermosetting resin composition and
Table 1 shows the thickness of the layer of the resin composition.
得られた磁気ディスク基板の表面平滑性と、基板と樹脂
組成物の層との密着性を測定して結果と第1表に示した
。密着性はJIS D 0202に従ってゴバン目テ
ープ剥離試厭力で測定した。The surface smoothness of the obtained magnetic disk substrate and the adhesion between the substrate and the resin composition layer were measured and the results are shown in Table 1. Adhesion was measured according to JIS D 0202 using a cross-cut tape peeling force.
又得られた磁気ディスク基板の耐熱性をみるために得ら
れた磁気ディスク基板を160℃で6時間耐熱試験した
後表面平滑性及び密着性を測定し、結果を第1表に示し
た。又外観もなんら変化なかった。Further, in order to check the heat resistance of the obtained magnetic disk substrate, the obtained magnetic disk substrate was subjected to a heat resistance test at 160° C. for 6 hours, and the surface smoothness and adhesion were measured. The results are shown in Table 1. There was also no change in appearance.
(以下余白)
第1表
(1) 住良化学社製、商品名ピクトレックス360
0G(り エンジニアリングプラスチック社製商品名
ウルテム1000
(3) ビスフェノール型エポキシ樹脂、油化シェル
社製、商品名エピコート828、エポキシ当fi190
(4) ノボラック型エポキシ樹脂、油化シェル社製
、商品名エピコート154、エポキシ当1(6)丸善石
油化学社製、商品名レジンM1水酸基当j1120
(6) 住良スリーエム社製、商品名フロラードC−
430(Left below) Table 1 (1) Manufactured by Sumira Chemical Co., Ltd., trade name Pictrex 360
0G (ri) Manufactured by Engineering Plastic Co., Ltd., product name: Ultem 1000 (3) Bisphenol-type epoxy resin, manufactured by Yuka Shell Co., Ltd., product name: Epicoat 828, epoxy fi190 (4) Novolac-type epoxy resin, manufactured by Yuka Shell Co., Ltd., product name: Epicoat 154, Epoxy 1 (6) Manufactured by Maruzen Petrochemical Co., Ltd., trade name Resin M1 hydroxyl group j1120 (6) Manufactured by Sumira 3M Co., Ltd., product name Florado C-
430
Claims (1)
性樹脂よりなる基板の表面に、エポキシ樹脂とポリバラ
ビニルフェノール樹脂よりなる熱硬化性樹脂組成物を積
層し、硬化せしめることを特徴とする磁気ディスク基板
の製造方法。 2、耐熱性樹脂がポリエーテルイミドもしくはポリエー
テルサルフオンである特許請求の範囲第1項記載の磁気
ディスク基板の製造方法。 3、エポキシ樹脂とポリバラビニルフェノール樹脂の比
率が重量比で10:1〜10:12である特許請求の範
囲第1項又は第2項記載の磁気ディスク基板の製造方法
。 4、積層法がスピンコート法である特許請求の範囲第1
項、第2項又は第3項記載の磁気ディスク基板の製造方
法。[Claims] 1. A thermosetting resin composition made of an epoxy resin and a polyvinylphenol resin is laminated on the surface of an injection-molded substrate made of a heat-resistant resin with a heat distortion temperature of 180°C or higher. A method of manufacturing a magnetic disk substrate, which comprises curing the substrate. 2. The method for manufacturing a magnetic disk substrate according to claim 1, wherein the heat-resistant resin is polyetherimide or polyethersulfon. 3. The method for manufacturing a magnetic disk substrate according to claim 1 or 2, wherein the ratio of the epoxy resin to the polyvarabinylphenol resin is 10:1 to 10:12 by weight. 4. Claim 1 in which the lamination method is a spin coating method
3. A method for manufacturing a magnetic disk substrate according to item 2, item 2, or item 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18806786A JPS6344313A (en) | 1986-08-11 | 1986-08-11 | Production of magnetic disk substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18806786A JPS6344313A (en) | 1986-08-11 | 1986-08-11 | Production of magnetic disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6344313A true JPS6344313A (en) | 1988-02-25 |
Family
ID=16217125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18806786A Pending JPS6344313A (en) | 1986-08-11 | 1986-08-11 | Production of magnetic disk substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6344313A (en) |
-
1986
- 1986-08-11 JP JP18806786A patent/JPS6344313A/en active Pending
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