JPS6341189A - Information recording medium - Google Patents
Information recording mediumInfo
- Publication number
- JPS6341189A JPS6341189A JP61184630A JP18463086A JPS6341189A JP S6341189 A JPS6341189 A JP S6341189A JP 61184630 A JP61184630 A JP 61184630A JP 18463086 A JP18463086 A JP 18463086A JP S6341189 A JPS6341189 A JP S6341189A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- information recording
- intermediate layer
- unsaturated hydrocarbon
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 48
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 29
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims abstract description 28
- 229920000642 polymer Polymers 0.000 claims abstract description 19
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 239000000178 monomer Substances 0.000 claims abstract description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229920001577 copolymer Polymers 0.000 claims abstract description 8
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims abstract description 6
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims abstract description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims abstract description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 5
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims abstract description 4
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 claims abstract description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims abstract description 3
- 239000011976 maleic acid Substances 0.000 claims abstract description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims abstract description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 9
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- 150000002009 diols Chemical class 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 106
- 239000000463 material Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 20
- -1 polyethylene Polymers 0.000 description 15
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 7
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 5
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical compound CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 4
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 125000005395 methacrylic acid group Chemical group 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 229920001220 nitrocellulos Polymers 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- GRWFGVWFFZKLTI-IUCAKERBSA-N (-)-α-pinene Chemical compound CC1=CC[C@@H]2C(C)(C)[C@H]1C2 GRWFGVWFFZKLTI-IUCAKERBSA-N 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- XNMQEEKYCVKGBD-UHFFFAOYSA-N dimethylacetylene Natural products CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- WTARULDDTDQWMU-RKDXNWHRSA-N (+)-β-pinene Chemical compound C1[C@H]2C(C)(C)[C@@H]1CCC2=C WTARULDDTDQWMU-RKDXNWHRSA-N 0.000 description 1
- WTARULDDTDQWMU-IUCAKERBSA-N (-)-Nopinene Natural products C1[C@@H]2C(C)(C)[C@H]1CCC2=C WTARULDDTDQWMU-IUCAKERBSA-N 0.000 description 1
- POTYORUTRLSAGZ-UHFFFAOYSA-N (3-chloro-2-hydroxypropyl) prop-2-enoate Chemical compound ClCC(O)COC(=O)C=C POTYORUTRLSAGZ-UHFFFAOYSA-N 0.000 description 1
- MRIKSZXJKCQQFT-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) prop-2-enoate Chemical compound OCC(C)(C)COC(=O)C=C MRIKSZXJKCQQFT-UHFFFAOYSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- MPUZDPBYKVEHNH-BQYQJAHWSA-N (e)-2-methyl-3-phenylprop-2-enamide Chemical compound NC(=O)C(/C)=C/C1=CC=CC=C1 MPUZDPBYKVEHNH-BQYQJAHWSA-N 0.000 description 1
- IRFHAESXJQAGRH-UHFFFAOYSA-N 1,3-dichloro-4-(2,4-dichloro-3-ethenylphenoxy)-2-ethenylbenzene Chemical compound ClC1=C(C=C)C(Cl)=CC=C1OC1=CC=C(Cl)C(C=C)=C1Cl IRFHAESXJQAGRH-UHFFFAOYSA-N 0.000 description 1
- ILBBNQMSDGAAPF-UHFFFAOYSA-N 1-(6-hydroxy-6-methylcyclohexa-2,4-dien-1-yl)propan-1-one Chemical compound CCC(=O)C1C=CC=CC1(C)O ILBBNQMSDGAAPF-UHFFFAOYSA-N 0.000 description 1
- HNKNCTHACSPOPO-UHFFFAOYSA-N 1-(azepan-1-yl)prop-2-en-1-one Chemical compound C=CC(=O)N1CCCCCC1 HNKNCTHACSPOPO-UHFFFAOYSA-N 0.000 description 1
- RPWJXFPSRAUGLN-UHFFFAOYSA-N 1-chloro-2-ethenoxybenzene Chemical compound ClC1=CC=CC=C1OC=C RPWJXFPSRAUGLN-UHFFFAOYSA-N 0.000 description 1
- DNJRKFKAFWSXSE-UHFFFAOYSA-N 1-chloro-2-ethenoxyethane Chemical compound ClCCOC=C DNJRKFKAFWSXSE-UHFFFAOYSA-N 0.000 description 1
- HWCLMKDWXUGDKL-UHFFFAOYSA-N 1-ethenoxy-2-ethoxyethane Chemical compound CCOCCOC=C HWCLMKDWXUGDKL-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- NSOAQRMLVFRWIT-UHFFFAOYSA-N 1-ethenoxydecane Chemical compound CCCCCCCCCCOC=C NSOAQRMLVFRWIT-UHFFFAOYSA-N 0.000 description 1
- YAOJJEJGPZRYJF-UHFFFAOYSA-N 1-ethenoxyhexane Chemical compound CCCCCCOC=C YAOJJEJGPZRYJF-UHFFFAOYSA-N 0.000 description 1
- OHSFPBQPZFLOKE-UHFFFAOYSA-N 1-ethenoxynaphthalene Chemical compound C1=CC=C2C(OC=C)=CC=CC2=C1 OHSFPBQPZFLOKE-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- RESPXSHDJQUNTN-UHFFFAOYSA-N 1-piperidin-1-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCCCC1 RESPXSHDJQUNTN-UHFFFAOYSA-N 0.000 description 1
- IBTLFDCPAJLATQ-UHFFFAOYSA-N 1-prop-2-enoxybutane Chemical compound CCCCOCC=C IBTLFDCPAJLATQ-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- HGOUNPXIJSDIKV-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butyl 2-methylprop-2-enoate Chemical compound CCC(CO)(CO)COC(=O)C(C)=C HGOUNPXIJSDIKV-UHFFFAOYSA-N 0.000 description 1
- SYENVBKSVVOOPS-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butyl prop-2-enoate Chemical compound CCC(CO)(CO)COC(=O)C=C SYENVBKSVVOOPS-UHFFFAOYSA-N 0.000 description 1
- CWWYEELVMRNKHZ-UHFFFAOYSA-N 2,3-dimethylbut-2-enamide Chemical compound CC(C)=C(C)C(N)=O CWWYEELVMRNKHZ-UHFFFAOYSA-N 0.000 description 1
- QJUCCGSXGKTYBT-UHFFFAOYSA-N 2,4,4-trimethylpent-2-enamide Chemical compound NC(=O)C(C)=CC(C)(C)C QJUCCGSXGKTYBT-UHFFFAOYSA-N 0.000 description 1
- BCQHHYHGZQLDLH-UHFFFAOYSA-N 2-(2-cyanoacetyl)oxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC(=O)CC#N BCQHHYHGZQLDLH-UHFFFAOYSA-N 0.000 description 1
- WULAHPYSGCVQHM-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)ethanol Chemical compound OCCOCCOC=C WULAHPYSGCVQHM-UHFFFAOYSA-N 0.000 description 1
- OLQFXOWPTQTLDP-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCO OLQFXOWPTQTLDP-UHFFFAOYSA-N 0.000 description 1
- RWXMAAYKJDQVTF-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl prop-2-enoate Chemical compound OCCOCCOC(=O)C=C RWXMAAYKJDQVTF-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- JJRUAPNVLBABCN-UHFFFAOYSA-N 2-(ethenoxymethyl)oxirane Chemical compound C=COCC1CO1 JJRUAPNVLBABCN-UHFFFAOYSA-N 0.000 description 1
- UIUSRIAANRCPGF-UHFFFAOYSA-N 2-(ethenoxymethyl)oxolane Chemical compound C=COCC1CCCO1 UIUSRIAANRCPGF-UHFFFAOYSA-N 0.000 description 1
- WTBIHKZYDZQMQA-UHFFFAOYSA-N 2-(n-ethylanilino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN(CC)C1=CC=CC=C1 WTBIHKZYDZQMQA-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- RCSBILYQLVXLJG-UHFFFAOYSA-N 2-Propenyl hexanoate Chemical compound CCCCCC(=O)OCC=C RCSBILYQLVXLJG-UHFFFAOYSA-N 0.000 description 1
- PZGMUSDNQDCNAG-UHFFFAOYSA-N 2-Propenyl octanoate Chemical compound CCCCCCCC(=O)OCC=C PZGMUSDNQDCNAG-UHFFFAOYSA-N 0.000 description 1
- ZKTSQAORJKMIIC-UHFFFAOYSA-N 2-benzylbut-2-enamide Chemical compound CC=C(C(N)=O)CC1=CC=CC=C1 ZKTSQAORJKMIIC-UHFFFAOYSA-N 0.000 description 1
- ICGLGDINCXDWJB-UHFFFAOYSA-N 2-benzylprop-2-enamide Chemical compound NC(=O)C(=C)CC1=CC=CC=C1 ICGLGDINCXDWJB-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- AEPWOCLBLLCOGZ-UHFFFAOYSA-N 2-cyanoethyl prop-2-enoate Chemical compound C=CC(=O)OCCC#N AEPWOCLBLLCOGZ-UHFFFAOYSA-N 0.000 description 1
- XUOKWZRAWBZOQM-UHFFFAOYSA-N 2-cyclohexylprop-2-enamide Chemical compound NC(=O)C(=C)C1CCCCC1 XUOKWZRAWBZOQM-UHFFFAOYSA-N 0.000 description 1
- PLWQJHWLGRXAMP-UHFFFAOYSA-N 2-ethenoxy-n,n-diethylethanamine Chemical compound CCN(CC)CCOC=C PLWQJHWLGRXAMP-UHFFFAOYSA-N 0.000 description 1
- JWCDUUFOAZFFMX-UHFFFAOYSA-N 2-ethenoxy-n,n-dimethylethanamine Chemical compound CN(C)CCOC=C JWCDUUFOAZFFMX-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- KSQSCTJOZZMRLG-UHFFFAOYSA-N 2-methyl-3-propylhex-2-enamide Chemical compound CCCC(CCC)=C(C)C(N)=O KSQSCTJOZZMRLG-UHFFFAOYSA-N 0.000 description 1
- AEBNPEXFDZBTIB-UHFFFAOYSA-N 2-methyl-4-phenylbut-2-enamide Chemical compound NC(=O)C(C)=CCC1=CC=CC=C1 AEBNPEXFDZBTIB-UHFFFAOYSA-N 0.000 description 1
- WPFTVIVHDBZTSZ-UHFFFAOYSA-N 2-methyl-n-(2,4,4-trimethylpentan-2-yl)prop-2-enamide Chemical compound CC(=C)C(=O)NC(C)(C)CC(C)(C)C WPFTVIVHDBZTSZ-UHFFFAOYSA-N 0.000 description 1
- KFTHUBZIEMOORC-UHFFFAOYSA-N 2-methylbut-2-enamide Chemical compound CC=C(C)C(N)=O KFTHUBZIEMOORC-UHFFFAOYSA-N 0.000 description 1
- BKOOMYPCSUNDGP-UHFFFAOYSA-N 2-methylbut-2-ene Chemical compound CC=C(C)C BKOOMYPCSUNDGP-UHFFFAOYSA-N 0.000 description 1
- IIAJCBWFSHEUAC-UHFFFAOYSA-N 2-methylidene-4-phenylmethoxybutanamide Chemical compound NC(=O)C(=C)CCOCC1=CC=CC=C1 IIAJCBWFSHEUAC-UHFFFAOYSA-N 0.000 description 1
- LPNSCOVIJFIXTJ-UHFFFAOYSA-N 2-methylidenebutanamide Chemical compound CCC(=C)C(N)=O LPNSCOVIJFIXTJ-UHFFFAOYSA-N 0.000 description 1
- GASMGDMKGYYAHY-UHFFFAOYSA-N 2-methylidenehexanamide Chemical compound CCCCC(=C)C(N)=O GASMGDMKGYYAHY-UHFFFAOYSA-N 0.000 description 1
- YICILWNDMQTUIY-UHFFFAOYSA-N 2-methylidenepentanamide Chemical compound CCCC(=C)C(N)=O YICILWNDMQTUIY-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- IMOLAGKJZFODRK-UHFFFAOYSA-N 2-phenylprop-2-enamide Chemical compound NC(=O)C(=C)C1=CC=CC=C1 IMOLAGKJZFODRK-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- ORNUPNRNNSVZTC-UHFFFAOYSA-N 2-vinylthiophene Chemical compound C=CC1=CC=CS1 ORNUPNRNNSVZTC-UHFFFAOYSA-N 0.000 description 1
- XKWFZGCWEYYGSK-UHFFFAOYSA-N 3,3,5,5-tetramethyl-2-methylidenehexanamide Chemical compound CC(C)(C)CC(C)(C)C(=C)C(N)=O XKWFZGCWEYYGSK-UHFFFAOYSA-N 0.000 description 1
- ZAWQXWZJKKICSZ-UHFFFAOYSA-N 3,3-dimethyl-2-methylidenebutanamide Chemical compound CC(C)(C)C(=C)C(N)=O ZAWQXWZJKKICSZ-UHFFFAOYSA-N 0.000 description 1
- YJBYJBXZLXFOCG-UHFFFAOYSA-N 3-(2-ethylbutoxymethyl)pentane Chemical compound CCC(CC)COCC(CC)CC YJBYJBXZLXFOCG-UHFFFAOYSA-N 0.000 description 1
- KFNGWPXYNSJXOP-UHFFFAOYSA-N 3-(2-methylprop-2-enoyloxy)propane-1-sulfonic acid Chemical compound CC(=C)C(=O)OCCCS(O)(=O)=O KFNGWPXYNSJXOP-UHFFFAOYSA-N 0.000 description 1
- JBTDFRNUVWFUGL-UHFFFAOYSA-N 3-aminopropyl carbamimidothioate;dihydrobromide Chemical compound Br.Br.NCCCSC(N)=N JBTDFRNUVWFUGL-UHFFFAOYSA-N 0.000 description 1
- FWLGYSGTHHKRMZ-UHFFFAOYSA-N 3-ethenoxy-2,2-dimethylbutane Chemical compound CC(C)(C)C(C)OC=C FWLGYSGTHHKRMZ-UHFFFAOYSA-N 0.000 description 1
- BJOWTLCTYPKRRU-UHFFFAOYSA-N 3-ethenoxyoctane Chemical compound CCCCCC(CC)OC=C BJOWTLCTYPKRRU-UHFFFAOYSA-N 0.000 description 1
- XHULUQRDNLRXPF-UHFFFAOYSA-N 3-ethenyl-1,3-oxazolidin-2-id-4-one Chemical compound C(=C)N1[CH-]OCC1=O XHULUQRDNLRXPF-UHFFFAOYSA-N 0.000 description 1
- ZXWNFKKVGPYFRR-UHFFFAOYSA-N 3-ethenyl-2-methylpyridine Chemical compound CC1=NC=CC=C1C=C ZXWNFKKVGPYFRR-UHFFFAOYSA-N 0.000 description 1
- SDNHWPVAYKOIGU-UHFFFAOYSA-N 3-ethyl-2-methylpent-2-enamide Chemical compound CCC(CC)=C(C)C(N)=O SDNHWPVAYKOIGU-UHFFFAOYSA-N 0.000 description 1
- UVRCNEIYXSRHNT-UHFFFAOYSA-N 3-ethylpent-2-enamide Chemical compound CCC(CC)=CC(N)=O UVRCNEIYXSRHNT-UHFFFAOYSA-N 0.000 description 1
- SWBPHQKGPHEFLH-UHFFFAOYSA-N 3-hydroxy-2-phenylprop-2-enamide Chemical compound NC(=O)C(=CO)C1=CC=CC=C1 SWBPHQKGPHEFLH-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- WHNPOQXWAMXPTA-UHFFFAOYSA-N 3-methylbut-2-enamide Chemical compound CC(C)=CC(N)=O WHNPOQXWAMXPTA-UHFFFAOYSA-N 0.000 description 1
- LZHLUTZGFZAYCH-UHFFFAOYSA-N 4-cyano-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCC#N LZHLUTZGFZAYCH-UHFFFAOYSA-N 0.000 description 1
- SBVKVAIECGDBTC-UHFFFAOYSA-N 4-hydroxy-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCO SBVKVAIECGDBTC-UHFFFAOYSA-N 0.000 description 1
- YKXAYLPDMSGWEV-UHFFFAOYSA-N 4-hydroxybutyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCO YKXAYLPDMSGWEV-UHFFFAOYSA-N 0.000 description 1
- PIRPEUWCTMKABH-UHFFFAOYSA-N 4-methoxy-2-methylidenebutanamide Chemical compound COCCC(=C)C(N)=O PIRPEUWCTMKABH-UHFFFAOYSA-N 0.000 description 1
- YGTVWCBFJAVSMS-UHFFFAOYSA-N 5-hydroxypentyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCO YGTVWCBFJAVSMS-UHFFFAOYSA-N 0.000 description 1
- INRQKLGGIVSJRR-UHFFFAOYSA-N 5-hydroxypentyl prop-2-enoate Chemical compound OCCCCCOC(=O)C=C INRQKLGGIVSJRR-UHFFFAOYSA-N 0.000 description 1
- KLOTUCJTKMEYRV-UHFFFAOYSA-N 5-methyl-3-(2-methylpropyl)hex-2-enamide Chemical compound C(C(C)C)C(=CC(=O)N)CC(C)C KLOTUCJTKMEYRV-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- LYJHVEDILOKZCG-UHFFFAOYSA-N Allyl benzoate Chemical compound C=CCOC(=O)C1=CC=CC=C1 LYJHVEDILOKZCG-UHFFFAOYSA-N 0.000 description 1
- HBJICDINPBNEPK-UHFFFAOYSA-N CNC(=O)C(C)=CCCO Chemical compound CNC(=O)C(C)=CCCO HBJICDINPBNEPK-UHFFFAOYSA-N 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- LZCXCXDOGAEFQX-UHFFFAOYSA-N N-Acryloylglycine Chemical compound OC(=O)CNC(=O)C=C LZCXCXDOGAEFQX-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- WTARULDDTDQWMU-UHFFFAOYSA-N Pseudopinene Natural products C1C2C(C)(C)C1CCC2=C WTARULDDTDQWMU-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- LKOIPYBSUJWJSM-UHFFFAOYSA-N [2-(dimethylamino)-2-phenoxyethyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(N(C)C)OC1=CC=CC=C1 LKOIPYBSUJWJSM-UHFFFAOYSA-N 0.000 description 1
- APZPSKFMSWZPKL-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)CO APZPSKFMSWZPKL-UHFFFAOYSA-N 0.000 description 1
- ZCZFEIZSYJAXKS-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] prop-2-enoate Chemical compound OCC(CO)(CO)COC(=O)C=C ZCZFEIZSYJAXKS-UHFFFAOYSA-N 0.000 description 1
- DQVUUGHMHQPVSI-UHFFFAOYSA-N [chloro(phenyl)methyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(Cl)C1=CC=CC=C1 DQVUUGHMHQPVSI-UHFFFAOYSA-N 0.000 description 1
- CXSXCWXUCMJUGI-UHFFFAOYSA-N [methoxy(phenyl)methyl] prop-2-enoate Chemical compound C=CC(=O)OC(OC)C1=CC=CC=C1 CXSXCWXUCMJUGI-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- XCPQUQHBVVXMRQ-UHFFFAOYSA-N alpha-Fenchene Natural products C1CC2C(=C)CC1C2(C)C XCPQUQHBVVXMRQ-UHFFFAOYSA-N 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- MVNCAPSFBDBCGF-UHFFFAOYSA-N alpha-pinene Natural products CC1=CCC23C1CC2C3(C)C MVNCAPSFBDBCGF-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 229930006722 beta-pinene Natural products 0.000 description 1
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- FCSHDIVRCWTZOX-DVTGEIKXSA-N clobetasol Chemical compound C1CC2=CC(=O)C=C[C@]2(C)[C@]2(F)[C@@H]1[C@@H]1C[C@H](C)[C@@](C(=O)CCl)(O)[C@@]1(C)C[C@@H]2O FCSHDIVRCWTZOX-DVTGEIKXSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical class C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical compound C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 1
- ZBCLTORTGNOIGM-UHFFFAOYSA-N ethenyl 2,2-dichloroacetate Chemical compound ClC(Cl)C(=O)OC=C ZBCLTORTGNOIGM-UHFFFAOYSA-N 0.000 description 1
- YMQHXFNDANLQTI-UHFFFAOYSA-N ethenyl 2,3,4,5-tetrachlorobenzoate Chemical compound ClC1=CC(C(=O)OC=C)=C(Cl)C(Cl)=C1Cl YMQHXFNDANLQTI-UHFFFAOYSA-N 0.000 description 1
- ZJIHUSWGELHYBJ-UHFFFAOYSA-N ethenyl 2-chlorobenzoate Chemical compound ClC1=CC=CC=C1C(=O)OC=C ZJIHUSWGELHYBJ-UHFFFAOYSA-N 0.000 description 1
- CMXXMZYAYIHTBU-UHFFFAOYSA-N ethenyl 2-hydroxybenzoate Chemical compound OC1=CC=CC=C1C(=O)OC=C CMXXMZYAYIHTBU-UHFFFAOYSA-N 0.000 description 1
- MPOGZNTVZCEKSW-UHFFFAOYSA-N ethenyl 2-hydroxypropanoate Chemical compound CC(O)C(=O)OC=C MPOGZNTVZCEKSW-UHFFFAOYSA-N 0.000 description 1
- AFIQVBFAKUPHOA-UHFFFAOYSA-N ethenyl 2-methoxyacetate Chemical compound COCC(=O)OC=C AFIQVBFAKUPHOA-UHFFFAOYSA-N 0.000 description 1
- WNMORWGTPVWAIB-UHFFFAOYSA-N ethenyl 2-methylpropanoate Chemical compound CC(C)C(=O)OC=C WNMORWGTPVWAIB-UHFFFAOYSA-N 0.000 description 1
- ZEYMDLYHRCTNEE-UHFFFAOYSA-N ethenyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OC=C ZEYMDLYHRCTNEE-UHFFFAOYSA-N 0.000 description 1
- VYATZCPFHGSBPG-UHFFFAOYSA-N ethenyl 3-phenylbutanoate Chemical compound C=COC(=O)CC(C)C1=CC=CC=C1 VYATZCPFHGSBPG-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- JZRGFKQYQJKGAK-UHFFFAOYSA-N ethenyl cyclohexanecarboxylate Chemical compound C=COC(=O)C1CCCCC1 JZRGFKQYQJKGAK-UHFFFAOYSA-N 0.000 description 1
- LZWYWAIOTBEZFN-UHFFFAOYSA-N ethenyl hexanoate Chemical compound CCCCCC(=O)OC=C LZWYWAIOTBEZFN-UHFFFAOYSA-N 0.000 description 1
- BLZSRIYYOIZLJL-UHFFFAOYSA-N ethenyl pentanoate Chemical compound CCCCC(=O)OC=C BLZSRIYYOIZLJL-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- XWNVSPGTJSGNPU-UHFFFAOYSA-N ethyl 4-chloro-1h-indole-2-carboxylate Chemical compound C1=CC=C2NC(C(=O)OCC)=CC2=C1Cl XWNVSPGTJSGNPU-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 125000002534 ethynyl group Chemical class [H]C#C* 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- DWXAVNJYFLGAEF-UHFFFAOYSA-N furan-2-ylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CO1 DWXAVNJYFLGAEF-UHFFFAOYSA-N 0.000 description 1
- LCWMKIHBLJLORW-UHFFFAOYSA-N gamma-carene Natural products C1CC(=C)CC2C(C)(C)C21 LCWMKIHBLJLORW-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- 229920002681 hypalon Polymers 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N methylene hexane Natural products CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LGCYBCHJTSUDRE-UHFFFAOYSA-N n,2-dimethyl-n-phenylprop-2-enamide Chemical compound CC(=C)C(=O)N(C)C1=CC=CC=C1 LGCYBCHJTSUDRE-UHFFFAOYSA-N 0.000 description 1
- ICRMQJKSNVCQBG-UHFFFAOYSA-N n-(2-acetamidoethyl)-n-acetylprop-2-enamide Chemical compound CC(=O)NCCN(C(C)=O)C(=O)C=C ICRMQJKSNVCQBG-UHFFFAOYSA-N 0.000 description 1
- IPUPLVNNJOGFHX-UHFFFAOYSA-N n-(2-ethenoxyethyl)butan-1-amine Chemical compound CCCCNCCOC=C IPUPLVNNJOGFHX-UHFFFAOYSA-N 0.000 description 1
- VYHUMZYFJVMWRC-UHFFFAOYSA-N n-(2-hydroxyethyl)-n-methylprop-2-enamide Chemical compound OCCN(C)C(=O)C=C VYHUMZYFJVMWRC-UHFFFAOYSA-N 0.000 description 1
- XWCUDBBUDRNSKP-UHFFFAOYSA-N n-(2-morpholin-4-ylethyl)prop-2-enamide Chemical compound C=CC(=O)NCCN1CCOCC1 XWCUDBBUDRNSKP-UHFFFAOYSA-N 0.000 description 1
- YFMYOSBYZFFEEP-UHFFFAOYSA-N n-(4-hydroxy-2-methylpentan-2-yl)prop-2-enamide Chemical compound CC(O)CC(C)(C)NC(=O)C=C YFMYOSBYZFFEEP-UHFFFAOYSA-N 0.000 description 1
- DSGQWDHZUIZVCR-UHFFFAOYSA-N n-but-3-enylacetamide Chemical compound CC(=O)NCCC=C DSGQWDHZUIZVCR-UHFFFAOYSA-N 0.000 description 1
- JBLADNFGVOKFSU-UHFFFAOYSA-N n-cyclohexyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1CCCCC1 JBLADNFGVOKFSU-UHFFFAOYSA-N 0.000 description 1
- NIRIUIGSENVXCN-UHFFFAOYSA-N n-ethyl-2-methyl-n-phenylprop-2-enamide Chemical compound CC(=C)C(=O)N(CC)C1=CC=CC=C1 NIRIUIGSENVXCN-UHFFFAOYSA-N 0.000 description 1
- RCLLINSDAJVOHP-UHFFFAOYSA-N n-ethyl-n',n'-dimethylprop-2-enehydrazide Chemical compound CCN(N(C)C)C(=O)C=C RCLLINSDAJVOHP-UHFFFAOYSA-N 0.000 description 1
- ABUMECXPQVMMIN-UHFFFAOYSA-N n-heptylprop-2-enamide Chemical compound CCCCCCCNC(=O)C=C ABUMECXPQVMMIN-UHFFFAOYSA-N 0.000 description 1
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- PKCKEGFHGRMLNH-UHFFFAOYSA-N octan-2-yl prop-2-enoate Chemical compound CCCCCCC(C)OC(=O)C=C PKCKEGFHGRMLNH-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N piperylene Natural products CC=CC=C PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920000379 polypropylene carbonate Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- POSICDHOUBKJKP-UHFFFAOYSA-N prop-2-enoxybenzene Chemical compound C=CCOC1=CC=CC=C1 POSICDHOUBKJKP-UHFFFAOYSA-N 0.000 description 1
- CYFIHPJVHCCGTF-UHFFFAOYSA-N prop-2-enyl 2-hydroxypropanoate Chemical compound CC(O)C(=O)OCC=C CYFIHPJVHCCGTF-UHFFFAOYSA-N 0.000 description 1
- AXLMPTNTPOWPLT-UHFFFAOYSA-N prop-2-enyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC=C AXLMPTNTPOWPLT-UHFFFAOYSA-N 0.000 description 1
- ZQMAPKVSTSACQB-UHFFFAOYSA-N prop-2-enyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCC=C ZQMAPKVSTSACQB-UHFFFAOYSA-N 0.000 description 1
- HPCIWDZYMSZAEZ-UHFFFAOYSA-N prop-2-enyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC=C HPCIWDZYMSZAEZ-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- GRWFGVWFFZKLTI-UHFFFAOYSA-N rac-alpha-Pinene Natural products CC1=CCC2C(C)(C)C1C2 GRWFGVWFFZKLTI-UHFFFAOYSA-N 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】 [発明の分野] 本発明は、ヒートモート記録媒体に関するものである。[Detailed description of the invention] [Field of invention] The present invention relates to a heat moat recording medium.
さらに詳しくは本発明は、高エネルギー密度のレーザー
ビームな用いて情報の書き込みおよび/または読み取り
ができる情報記録媒体に関するものである。More specifically, the present invention relates to an information recording medium on which information can be written and/or read using a high energy density laser beam.
[発明の技術的背景および従来技術]
近年、レーザービームを高パワー密度のスポットに集束
させて記録媒体を照射し、記録媒体の一部を選択的に融
解、蒸発、除去、および/または変形させて情報の記録
を行なうヒートモードのレーザー記録方式は多くの優れ
た特徴を有する新しい記録方式として注目を浴びている
。[Technical Background of the Invention and Prior Art] In recent years, laser beams have been focused into a high power density spot to irradiate a recording medium to selectively melt, evaporate, remove, and/or deform portions of the recording medium. The heat-mode laser recording method, which records information using a laser beam, is attracting attention as a new recording method with many excellent features.
上記の記録方式は、特に加熱現像、定着などの後処理お
よび処理液を必要としないリアルタイムの記録方式であ
ること、極めて高解像の高コントラストの画像を形成し
得ること、記録媒体は室内光には感光せず、暗室操作か
不要であること、伝送されてくる時系列信号などの7!
を匁信号の記録ζこ適していること、後からの情報の追
加、即ちアドオンか可使であることなどの利点を有する
ところから、たとえば、ビデオディスク、オーディオデ
ィスクなどの光ディスク、更には大容量静止画像ファイ
ル、大容量コンピュータ用ディスク・メモリー、マイク
ロ画像記録媒体、超マイクロ画像記!媒体、COM、マ
イクロファクシミリ、写真植字用原板等として使用され
、あるいは使用か検討されている。The recording method described above is a real-time recording method that does not require post-processing such as heat development and fixing, or processing liquid, can form extremely high-resolution and high-contrast images, and the recording medium is indoor light. 7! It is not exposed to light, does not require darkroom operation, and is transmitted with time-series signals.
Since it is suitable for recording the momme signal and has the advantage of being able to add information later, that is, it can be used as an add-on, for example, optical discs such as video discs, audio discs, and even large-capacity discs. Still image files, large-capacity computer disk memory, micro image recording media, super micro image records! It is used or is being considered for use as a medium, COM, micro facsimile, original plate for phototypesetting, etc.
上記の記録方式に用いられる記録媒体は、基本構造とし
てプラスチック、ガラス等からなる透明基板と、この上
に設けられたBi、Sn、In、Te他の金属または半
金属、あるいは色素などからなる記録層とを有する。ま
た、通常の記録媒体は、基板と記録層との間に、それら
各層間の接着性の向上、記録感度の向上、記録層の汚染
防止などの機渣を有する中間層(あるいは下塗層)を備
えている。The recording medium used in the above recording method has a basic structure consisting of a transparent substrate made of plastic, glass, etc., and a recording material made of Bi, Sn, In, Te, other metals or semimetals, or pigments provided on this substrate. It has a layer. In addition, normal recording media have an intermediate layer (or undercoat layer) between the substrate and the recording layer that has features such as improving adhesion between these layers, improving recording sensitivity, and preventing contamination of the recording layer. It is equipped with
たとえば、記録感度を向上させるために、特開昭50−
126237号公報および特開昭57−205193号
公報に記載されているように、基板と記録層との間に、
ポリエステル、ポリエチレン、ポリスチレン、アクリル
系ポリマー等の有機高分子物質:あるいは二酸化ケイ素
等の非金属からなる断熱層を設けることにより、レーザ
ービームの照射による熱エネルギーが記録層から基板等
へ熱伝導によって損失することを低減するとの技術か知
られている。また特開昭55−46988号公報には、
同じく記録感度を向上させる目的にて、基板と記録層と
の間に臭素化ポリヒドロキシスチレンを含む中間層を設
けるとの発明が開示されている。For example, in order to improve recording sensitivity,
As described in Japanese Patent Application Laid-open No. 126237 and Japanese Patent Application Laid-open No. 57-205193, between the substrate and the recording layer,
By providing a heat insulating layer made of organic polymer materials such as polyester, polyethylene, polystyrene, acrylic polymers, etc. or non-metals such as silicon dioxide, thermal energy caused by laser beam irradiation is lost through heat conduction from the recording layer to the substrate, etc. What techniques are known to reduce this? Also, in Japanese Patent Application Laid-open No. 55-46988,
Similarly, an invention is disclosed in which an intermediate layer containing brominated polyhydroxystyrene is provided between the substrate and the recording layer for the purpose of improving recording sensitivity.
また、最近では記録層を保護するためのディスク構造と
して、二枚の円盤状基板から構成し、そのうちの少なく
とも一枚の基板上に記録層を設け、この二枚の基板を記
録層か内側に位置し、かつ閉空間を形成するようにリン
グ状内側スペーサとリング状外側スペーサとを介して接
合してなるエアーサンドイッチ構造か提案されている。Recently, a disk structure for protecting the recording layer has been constructed from two disc-shaped substrates, a recording layer is provided on at least one of the substrates, and these two substrates are attached to the inside of the recording layer. An air sandwich structure has been proposed in which a ring-shaped inner spacer and a ring-shaped outer spacer are joined to form a closed space.
このような構造を有する光ディスクでは、記録層が直接
外気に接することなく、情報の記録、再生は基板を透過
するレーザー光で行なわれるために、記録層が物理的ま
たは化学的な損傷を受けたり、あるいはその表面に塵埃
か付着して情報の記録、再生の障害となることがないと
の利点を有する。In optical discs with such a structure, the recording layer does not come into direct contact with the outside air, and information is recorded and reproduced using laser light that passes through the substrate, so the recording layer may be damaged physically or chemically. It has the advantage that there is no possibility of dust or dust adhering to its surface, which will impede the recording and reproduction of information.
記録媒体への情報の書き込みは、たとえばレーザービー
ムなこの記録媒体に照射することにより行なわれ、記録
層の照射部分がその光を吸収して局所的に温度上昇する
結果、物理的あるいは化学的な変化を生じてその光学的
特性を変えることにより情報か記録される。記録媒体か
らの情報の読み取りもまた、レーザービームを記録媒体
に照射することなどにより行なわれ、記録層の光学的特
性の変化に応じた反射光または透過光を検出することに
より情報が再生される。Information is written on a recording medium by irradiating the recording medium with a laser beam, for example, and the irradiated portion of the recording layer absorbs the light, causing a local temperature rise, resulting in physical or chemical damage. Information is recorded by making changes that change its optical properties. Reading information from a recording medium is also performed by irradiating the recording medium with a laser beam, and the information is reproduced by detecting reflected or transmitted light according to changes in the optical characteristics of the recording layer. .
情報記録媒体は、前述のように種々の分野において非常
に利用価値が高いものであるが、その記録感度は少しで
も高いものであることが望まれている。Information recording media are extremely useful in various fields as described above, but it is desired that their recording sensitivity be as high as possible.
[発明の要旨]
本発明は、記録感度の向上した情報記録媒体を提供する
ことを主な目的とするものである。[Summary of the Invention] The main object of the present invention is to provide an information recording medium with improved recording sensitivity.
本発明は、基板上に、中間層を介してレーザーによる情
報の書き込みおよび/または読み取りが可能な記録層を
有する情報記録媒体において、記録層および/または中
間層が、炭素数4以上の不飽和炭化水素化合物を主成分
として含む不飽和化合物の重合体の変性物を含有するこ
とを特徴とする情報記録媒体からなる。The present invention provides an information recording medium having a recording layer on a substrate, in which information can be written and/or read by a laser via an intermediate layer, wherein the recording layer and/or the intermediate layer is an unsaturated material having 4 or more carbon atoms. The information recording medium is characterized by containing a modified polymer of an unsaturated compound containing a hydrocarbon compound as a main component.
すなわち本発明は、基板と記録層との間の中間層、記録
層、あるいは中間層と記録層の双方に、炭素数4以上の
不飽和炭化水素化合物を主成分として含む不飽和化合物
(好ましくは不飽和炭化水素化合物)の重合体の変性物
を含有させることにより、情報記録媒体における感度の
顕著な向上を実現するものである。That is, the present invention provides an unsaturated compound (preferably By incorporating a modified polymer of (unsaturated hydrocarbon compound), a remarkable improvement in the sensitivity of an information recording medium is realized.
従来より、基板と記録層との間に断熱効果な有する材料
からなる層を設けて、得られる情報記録媒体の感度を高
めることか行なわれているが、本発明によれば、公知の
中間層を有する記録媒体よりも更に高感度の記録媒体か
得られる。情報記録媒体の中間層および/または記録層
に、炭素数4以上の不飽和炭化水素化合物を主成分とし
て含む不飽和化合物の重合体の変性物を含有させること
により、なぜ感度の顕著な向上が実現するかについては
詳細な点は不明であるが、この重合体はレーザービーム
の照射を受けた際に、それ自身の優れた熱的特性のため
に、その上に設けられた記録層もしくは共存している記
録材料の熱的変化の促進を実現するものと推察される。Conventionally, a layer made of a material having a heat insulating effect has been provided between the substrate and the recording layer to increase the sensitivity of the obtained information recording medium. It is possible to obtain a recording medium with even higher sensitivity than that of a recording medium having . Why is it possible to noticeably improve sensitivity by incorporating a modified polymer of an unsaturated compound containing as a main component an unsaturated hydrocarbon compound having 4 or more carbon atoms into the intermediate layer and/or recording layer of an information recording medium? The details of whether this will be realized are unknown, but due to its own excellent thermal properties when irradiated with a laser beam, this polymer can be It is presumed that this promotes thermal changes in the recording material.
[発明の構成]
本発明の情報記録媒体は、たとえば、次にような方法に
より製造することができる。[Structure of the Invention] The information recording medium of the present invention can be manufactured, for example, by the following method.
本発明において使用する基板は、従来の情報記録媒体の
基板として用いられている各種の材料から任意に選択す
ることができる。基板の光学的特性、平面性、加工性、
取扱い性、経時安定性および製造コストなどの点から、
基板材料の例としては強化ガラス等のガラス:セルキャ
ストポリメチルメタクリレート、射出成形ポリメチルメ
タクリレート等のアクリル樹脂:ポリ塩化ビニル、塩化
ビニル共重合体等の塩化ビニル系樹脂:ポリエチレンテ
レフタレートなどのポリエステル;およびポリカーボネ
ートを挙げることができる。The substrate used in the present invention can be arbitrarily selected from various materials used as substrates for conventional information recording media. Optical properties, flatness, processability of the substrate,
In terms of ease of handling, stability over time, and manufacturing cost,
Examples of substrate materials include glass such as tempered glass; acrylic resins such as cell cast polymethyl methacrylate and injection molded polymethyl methacrylate; vinyl chloride resins such as polyvinyl chloride and vinyl chloride copolymers; polyesters such as polyethylene terephthalate; and polycarbonate.
記録層が設けられる側の基板表面には、平面性の改善、
接着力の向上および記録層の変質の防止などの目的で、
下塗層が設けられていてもよい。The surface of the substrate on which the recording layer is provided has improved flatness,
For the purpose of improving adhesive strength and preventing deterioration of the recording layer,
An undercoat layer may be provided.
下塗層の材料としては、たとえば、ポリメチルメタクリ
レート、アクリル酸・メタクリル酸共重合体、スチレン
・無水マレイン酸共重合体、ポリビニルアルコール、N
−メチロールアクリルアミド、スチレン・スルホン酸共
重合体、塩素化ポリエチレン、クロルスルホン化ポリエ
チレン、ニトロセルロース、ポリ塩化ビニル、ポリエス
テル、ポリイミド、酢酸ビニル・塩化ビニル共重合体、
エチレン・酢酸ビニル共重合体、ポリエチレン、ポリプ
ロピレン、ポリカーボネートなどの高分子物質を挙げる
ことができる。Examples of materials for the undercoat layer include polymethyl methacrylate, acrylic acid/methacrylic acid copolymer, styrene/maleic anhydride copolymer, polyvinyl alcohol, N
- Methylolacrylamide, styrene/sulfonic acid copolymer, chlorinated polyethylene, chlorosulfonated polyethylene, nitrocellulose, polyvinyl chloride, polyester, polyimide, vinyl acetate/vinyl chloride copolymer,
Examples include polymeric substances such as ethylene/vinyl acetate copolymer, polyethylene, polypropylene, and polycarbonate.
下塗層は、上記高分子?V質を適当な溶剤に溶解または
分散した後、この塗布液をスピンコード、デイツプコー
ト、エクストルージョンコート、バーコード、スクリー
ン印刷などの塗布方法を用いて基板上に塗布することに
より、形成することかできる。下塗層の層厚は一般に0
.01乃至20JLmであり、好ましくはO,l乃至1
0gmである。Is the undercoat layer made of the above polymer? It can be formed by dissolving or dispersing V-quality in a suitable solvent and then applying this coating solution onto a substrate using a coating method such as spin code, dip coating, extrusion coating, bar code, screen printing, etc. can. The layer thickness of the undercoat layer is generally 0.
.. 01 to 20 JLm, preferably O,l to 1
It is 0gm.
次に、基板上には直接にあるいは下塗層を介して中間層
が設けられる。すなわち、中間層は下塗層を兼ねていて
もよい。Next, an intermediate layer is provided on the substrate either directly or via an undercoat layer. That is, the intermediate layer may also serve as an undercoat layer.
本発明の特徴的要件である炭素数4以上の不飽和炭化水
素化合物を主成分として含む不飽和化合物の重合体の変
性物は、この中間層または記録層に含有させる。また、
中間層と記録層の双方に含有させてもよい。なお記録層
は、その形成材料として色素などの塗布型材料を用いる
場合以外は、金属あるいは半金属などの記録層材料を蒸
着、スパッタリング、イオンブレーティングなどの方法
によって基板上に形成する場合が多いため、通常は上記
の不飽和炭化水素化合物の重合体は中間層に含有される
ことが好ましい。なお、中間層は上記変性物のみから形
成されていてもよく、あるいは他の重合体などの所望の
材料との混合物であってもよい。たたし、後者の場合に
は上記変性物はその混合物中に501量%を越える量に
て含有されていることが好ましい。A modified polymer of an unsaturated compound containing as a main component an unsaturated hydrocarbon compound having 4 or more carbon atoms, which is a characteristic feature of the present invention, is contained in this intermediate layer or recording layer. Also,
It may be contained in both the intermediate layer and the recording layer. Note that the recording layer is often formed of a recording layer material such as a metal or semimetal on a substrate by methods such as vapor deposition, sputtering, or ion blasting, unless a coated material such as a dye is used as the forming material. Therefore, it is usually preferable that the above-mentioned unsaturated hydrocarbon compound polymer is contained in the intermediate layer. Note that the intermediate layer may be formed only from the above-mentioned modified product, or may be a mixture with a desired material such as another polymer. However, in the latter case, it is preferable that the modified product is contained in the mixture in an amount exceeding 501% by weight.
炭素数4以上の不飽和炭化水素化合物び例としては、ブ
タジェン、イソブチン、l−ブテンおよび2−ブテンな
どの炭素数4の不飽和炭化水素化合物、ペンテン、イソ
プレン、1.3−ペンタジェンおよびメチルブテンなど
の炭素数5の鎖状不飽和炭化水素化合物、1−ヘキセン
などの炭素数6の鎖状不飽和炭化水素化合物、l−ヘプ
テンなどの炭素数7の鎖状不飽和炭化水素化合物、スチ
レン、フェニルアセチレンなどの炭素数8の不飽和炭化
水素化イ物、α−メチルスチレン、インデン、ビニルト
ルエンなどの炭素数9の不飽和炭化水素化合物、α−ピ
ネン、β−ピネン、ジペンテンなどの炭素数10以上の
不飽和炭化水素化合物、シクロペンタジェン、シクロペ
ンテン、シクロヘキセンなどの炭素数5もしくは6の環
状不竺和炭化水素化合物を挙げることができる。これら
の不飽和炭化水素化合物は単独で使用しても、組合せて
使用してもよい。Examples of unsaturated hydrocarbon compounds having 4 or more carbon atoms include unsaturated hydrocarbon compounds having 4 carbon atoms such as butadiene, isobutyne, l-butene, and 2-butene, pentene, isoprene, 1,3-pentadiene, and methylbutene. chain unsaturated hydrocarbon compounds with 5 carbon atoms, chain unsaturated hydrocarbon compounds with 6 carbon atoms such as 1-hexene, linear unsaturated hydrocarbon compounds with 7 carbon atoms such as l-heptene, styrene, phenyl Unsaturated hydrocarbon compounds with 8 carbon atoms such as acetylene, unsaturated hydrocarbon compounds with 9 carbon atoms such as α-methylstyrene, indene, and vinyltoluene, and 10 carbon atoms such as α-pinene, β-pinene, and dipentene. Examples include the above-mentioned unsaturated hydrocarbon compounds, and cyclic uncombined hydrocarbon compounds having 5 or 6 carbon atoms such as cyclopentadiene, cyclopentene, and cyclohexene. These unsaturated hydrocarbon compounds may be used alone or in combination.
上記のような炭素数4以上の不飽和炭化水素化合物を主
成分として含む不飽和化合物の重合体の変性物の例とし
ては、炭素数4以上の不飽和炭化水素化合物とアクリル
酸、メタクリル酸、マレイン酸、無水マレイン酸、フタ
ル酸、イタコン酸、これらの誘導体(アルコールあるい
はジオールとのエステル、アミドなと)、酢酸ビニル、
およびエポキシ基もしくは水酸基を有するビニルモノマ
ーから選ばれた酸素原子を含むモノマーとの共重合体を
挙げることができる。Examples of modified polymers of unsaturated compounds containing the above-mentioned unsaturated hydrocarbon compounds having 4 or more carbon atoms as main components include unsaturated hydrocarbon compounds having 4 or more carbon atoms, acrylic acid, methacrylic acid, Maleic acid, maleic anhydride, phthalic acid, itaconic acid, derivatives thereof (esters and amides with alcohols or diols), vinyl acetate,
and a copolymer with a monomer containing an oxygen atom selected from vinyl monomers having an epoxy group or a hydroxyl group.
上記の変性に利用され得る酸素原子を含むモノマーの例
を以下に詳しく述べる。Examples of monomers containing oxygen atoms that can be used for the above modification are detailed below.
本発明の変性物の製造に使用できる酸素原子を含むモノ
マー誘導体の例としては、アクリル酸エステル類、アク
リルアミド類、メタクリル酸エステル類、メタクリルア
ミド類、アリル化合物類。Examples of monomer derivatives containing an oxygen atom that can be used to produce the modified product of the present invention include acrylic esters, acrylamides, methacrylic esters, methacrylamides, and allyl compounds.
ビニルエーテル類、ビニルエステル類、ビニル異部環化
合物類、N−ビニル化合物類などがある。Examples include vinyl ethers, vinyl esters, vinyl heterocyclic compounds, and N-vinyl compounds.
これらの化合物の具体例としては、
アクリル酸類1例えばアクリル酸、アクリレート(例、
アクリル酸メチル、アクリル酸エチル。Specific examples of these compounds include acrylic acids 1 such as acrylic acid, acrylates (e.g.
Methyl acrylate, ethyl acrylate.
アクリル酸プロピル、アクリル酸ブチル、アクリル酸ア
ミル、アクリル酸エチルヘキシル、アクリル酸オクチル
、アクリル酸−七−オクチル、2−メトキシエチルアク
リレート、2−ブトキシエチルアクリレート、2−フェ
ノキシエチルアクリレート、クロルエチルアクリレート
、ヒドロキシエチルアクリレート、シアノエチルアクリ
レート、ヒドロキシプロピルアクリレート、ジメチルア
ミノエチルアクリレート、2.2−ジメチルヒドロキシ
プロビルアクリレート、5−ヒドロキシペンチルアクリ
レート、ジエチレングリコールモノアクリレート、トリ
メチロールプロパンモノアクリレート、ペンタエリスリ
トールモノアクリレート、2−ヒドロキシ−3−クロロ
プロピルアクリレート、ベンジルアクリレート、メトキ
シベンジルアクリレート、フルフリルアクリレート、テ
トラヒドロフルフリルアクリレート、フェニルアクリレ
ートなど):
メタクリル酸類1例えばメタクリル酸、メタクリレート
(例、メチルメタクリレート、エチルメタクリレート、
プロピルメタクリレート、イソプロピルメタクリレート
、アミルメタクリレート、ヘキシルメタクリレート、シ
クロへキシルメタクリレート、ベンジルメタクリレート
、シアノアセトキシエチルメタクリレート、クロルベン
ジルメタクリレート、オクチルメタクリレート、スルホ
プロピルメタクリレート、N−エチル−N−フェニルア
ミノエチルメタクリレート、エチレングリコールモノメ
タクリレート、2−ヒドロキシエチルメタクリレート、
3−ヒドロキシプロピルメタクリレート、2−ヒドロキ
シプロピルメタクリレート、4−ヒドロキシブチルメタ
クリレート、5−ヒドロキシペンチルメタクリレート、
2.2−ジメチル−3−ヒドロキシプロピルメタクリレ
ート、ジエチレングリコールモノメタクリレート。Propyl acrylate, butyl acrylate, amyl acrylate, ethylhexyl acrylate, octyl acrylate, 7-octyl acrylate, 2-methoxyethyl acrylate, 2-butoxyethyl acrylate, 2-phenoxyethyl acrylate, chloroethyl acrylate, hydroxy Ethyl acrylate, cyanoethyl acrylate, hydroxypropyl acrylate, dimethylaminoethyl acrylate, 2,2-dimethylhydroxypropyl acrylate, 5-hydroxypentyl acrylate, diethylene glycol monoacrylate, trimethylolpropane monoacrylate, pentaerythritol monoacrylate, 2-hydroxy- 3-chloropropyl acrylate, benzyl acrylate, methoxybenzyl acrylate, furfuryl acrylate, tetrahydrofurfuryl acrylate, phenyl acrylate, etc.): Methacrylic acids 1, such as methacrylic acid, methacrylate (e.g., methyl methacrylate, ethyl methacrylate,
Propyl methacrylate, isopropyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, cyanoacetoxyethyl methacrylate, chlorobenzyl methacrylate, octyl methacrylate, sulfopropyl methacrylate, N-ethyl-N-phenylaminoethyl methacrylate, ethylene glycol mono methacrylate, 2-hydroxyethyl methacrylate,
3-hydroxypropyl methacrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, 5-hydroxypentyl methacrylate,
2.2-dimethyl-3-hydroxypropyl methacrylate, diethylene glycol monomethacrylate.
トリメチロールプロパンモノメタクリレート、ペンタエ
リスリトールモノメタクリレート、2−メトキシエチル
メタクリレート、2−(3−フェニルプロピルオキシ)
エチルメタクリレート、ジメチルアミノフェノキシエチ
ルメタクリレート、フルフリルメタクリレート、テトラ
ヒドロフルフリルメタクリレート、フェニルメタクリレ
ート、タレジルメタクリレート、ナフチルメタクリレー
トなど)ニ
アクリルアミド類、例えばアクリルアミド。Trimethylolpropane monomethacrylate, pentaerythritol monomethacrylate, 2-methoxyethyl methacrylate, 2-(3-phenylpropyloxy)
ethyl methacrylate, dimethylaminophenoxyethyl methacrylate, furfuryl methacrylate, tetrahydrofurfuryl methacrylate, phenyl methacrylate, talesyl methacrylate, naphthyl methacrylate, etc.) Niacrylamides, e.g. acrylamide.
N−置換アクリルアミド(例、メチルアクリルアミド、
エチルアクリルアミド、プロピルアクリルアミド、イソ
プロピルアクリルアミド、ブチルアクリルアミド、t−
ブチルアクリルアミド、ヘプチルアクリルアミド、t−
オクチルアクリルアミド、シクロヘキシルアクリルアミ
ド、ベンジルアクリルアミド、ヒドロキシメチルアクリ
ルアミド、メトキシエチルアクリルアミド、ジメチルア
ミノエチルアクリルアミド、ヒドロキシエチルアクリル
アミド、フェニルアクリルアミド、ヒドロキシフェニル
アクリルアミド、トリルアクリルアミド、ナフチルアク
リルアミド、ジメチルアクリルアミド、ジエチルアクリ
ルアミド、ジブチルアクリルアミド、ジイソブチルアク
リルアミド、ダイア七トンアクリルアミド、メチルベン
ジルアクリルアミド、ベンジルオキシエチルアクリルア
ミド、β−シアノエチルアクリルアミド、アクリロイル
モルホリン、N−メチル−N−アクリロイルピペラジン
、N−アクリロイルピペリジン。N-substituted acrylamide (e.g., methylacrylamide,
Ethylacrylamide, propylacrylamide, isopropylacrylamide, butylacrylamide, t-
Butylacrylamide, heptyl acrylamide, t-
Octylacrylamide, cyclohexylacrylamide, benzylacrylamide, hydroxymethylacrylamide, methoxyethylacrylamide, dimethylaminoethylacrylamide, hydroxyethylacrylamide, phenylacrylamide, hydroxyphenylacrylamide, tolylacrylamide, naphthylacrylamide, dimethylacrylamide, diethylacrylamide, dibutylacrylamide, diisobutylacrylamide , diaseptone acrylamide, methylbenzylacrylamide, benzyloxyethylacrylamide, β-cyanoethylacrylamide, acryloylmorpholine, N-methyl-N-acryloylpiperazine, N-acryloylpiperidine.
アクリロイルグリシン、N−(1,1−ジメチル−3−
ヒドロキシブチル)アクリルアミド、N−β−モルホリ
ノエチルアクリルアミド、N−アクリロイルへキサメチ
レンイミン、N−ヒドロキシエチル−N−メチルアクリ
ルアミド、N−2−アセトアミドエチル−N−アセチル
アクリルアミドなと):
メタクリルアミド類2例えばメタクリルアミド、N−2
を換メタクリルアミド(例、メチルメタクリルアミド、
t−ブチル−メタクリルアミド。Acryloylglycine, N-(1,1-dimethyl-3-
hydroxybutyl)acrylamide, N-β-morpholinoethyl acrylamide, N-acryloylhexamethyleneimine, N-hydroxyethyl-N-methylacrylamide, N-2-acetamidoethyl-N-acetylacrylamide): Methacrylamides 2 For example, methacrylamide, N-2
methacrylamide (e.g., methylmethacrylamide,
t-Butyl-methacrylamide.
t−オクチルメタクリルアミド、ベンジルメタクリルア
ミド、シクロヘキシルメタクリルアミド。t-octyl methacrylamide, benzyl methacrylamide, cyclohexyl methacrylamide.
フェニルメタクリルアミド、ジメチルメタクリルアミド
、ジエチルメタクリルアミド、ジプロピルメタクリルア
ミド、ヒドロキシエチル−N−メチルメタクリルアミド
、N−メチル−N−フェニルメタクリルアミド、N−エ
チル−N−フェニルメタクリルアミドなと)
アリル化合物1例えばアリルエステル類(例。phenylmethacrylamide, dimethylmethacrylamide, diethylmethacrylamide, dipropylmethacrylamide, hydroxyethyl-N-methylmethacrylamide, N-methyl-N-phenylmethacrylamide, N-ethyl-N-phenylmethacrylamide, etc.) Allyl compounds 1 For example, allyl esters (eg.
酢酸アリル、カプロン酸アリル、カプリル酸アリル、ラ
ウリン酸アリル、バルミチン酸アリル、ステアリン酸ア
リル、安息香酸アリル、アセト酢酸アリル、乳酸アリル
など、アリルエキシエタノール、アリルブチルエーテル
、アリルフェニルエーテルなど);
ビニルエーテル類(例、メチルビニルエーテル、ブチル
ビニルエーテル、ヘキシルビニルエーテル、オクチルビ
ニルエーテル、デシルビニルエーテル、エチルヘキシル
ビニルエーテル、メトキシエチルビニルエーテル、エト
キシエチルビニルエーテル、クロルエチルビニルエーテ
ル、1−メチル−2,2−ジメチルプロピルビニルエー
テル、2−エチルブチルエーテル、ヒドロキシエチルビ
ニルエーテル、ジエチレングリコールビニルエーテル、
ジメチルアミノエチルビニルエーテル、ジエチルアミノ
エチルビニルエーテル、ブチルアミノエチルビニルエー
テル、ベンジルビニルエーテル、テトラヒドロフルフリ
ルビニルエーテル、ビニルフェニルエーテル、ビニルト
リルエーテル、ビニルクロルフェニルエーテル、ビニル
−2,4−ジクロルフェニルエーテル、ビニルナフチル
エーテル、ビニルアントラニルエーテルなど);
ビニルエステル類(例、ビニルアセテート、ビニルプロ
ピオネート、ビニルブチレート、ビニルイソブチレート
、ビニルジメチルプロピオネート、ビニルエチルブチレ
ート、とニルバレレート、ビニルカプロエート、ビニル
クロルアセテート、ビニルジクロルアセテート、ビニル
メトキシアセテート、ビニルブトキシアセテート、ビニ
ルフェニルアセテート、ビニルアセトアセテート、ビニ
ルラクテート、ビニル−β−フェニルブチレート、ビニ
ルシクロへキシルカルボキシレート、安息香酸ビニル、
サリチル酸ビニル、クロル安息香酸ビニル、テトラクロ
ル安息香酸ビニル、ナフトエ酸どニルなど);
ビニル異箇環化合物(例、N−ビニルオキサゾリドン、
ビニルピリジン、ビニルピコリン、N−ビニルイミダゾ
ール、N−ビニルピロリドン、N−ビニルカルバゾール
、ビニルチオフェン、N−ビニルエチルアセトアミドな
ど);
クロトン酸類;
エポキシ基を含む化合物(例、グリシジルアクリレート
、グリシジルメタクリレート、アリルグリシジルエーテ
ル、ビニルグリシジルエーテルなどがある)。Allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl valmitate, allyl stearate, allyl benzoate, allyl acetoacetate, allyl lactate, allyl exiethanol, allyl butyl ether, allyl phenyl ether, etc.); Vinyl ethers (Examples: methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethyl butyl ether, Hydroxyethyl vinyl ether, diethylene glycol vinyl ether,
Dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether, vinyl phenyl ether, vinyl tolyl ether, vinyl chlorphenyl ether, vinyl-2,4-dichlorophenyl ether, vinyl naphthyl ether, Vinyl esters (e.g., vinyl acetate, vinyl propionate, vinyl butyrate, vinyl isobutyrate, vinyl dimethyl propionate, vinyl ethyl butyrate, and vinyl valerate, vinyl caproate, vinyl chloride); Acetate, vinyl dichloroacetate, vinyl methoxy acetate, vinyl butoxy acetate, vinyl phenylacetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenylbutyrate, vinylcyclohexylcarboxylate, vinyl benzoate,
vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate, donyl naphthoate, etc.); vinyl heterocyclic compounds (e.g., N-vinyloxazolidone,
(vinylpyridine, vinylpicoline, N-vinylimidazole, N-vinylpyrrolidone, N-vinylcarbazole, vinylthiophene, N-vinylethylacetamide, etc.); Crotonic acids; Compounds containing epoxy groups (e.g., glycidyl acrylate, glycidyl methacrylate, allyl (glycidyl ether, vinyl glycidyl ether, etc.)
なお、上記の一ツマーはハロゲンなどの置換基を、有し
ていてもよい。In addition, the above monomer may have a substituent such as a halogen.
上記の変性物は、たとえば石油樹脂として市販されてい
るが、あるいは、公知のオレフィン重合法に従って容易
に製造することかできる。The above-mentioned modified products are commercially available as, for example, petroleum resins, or can be easily produced according to known olefin polymerization methods.
なお本発明にて使用する変性物は、平均分子量か100
〜10000の範囲内に入る程度の低分子量のものであ
ることが望ましく、さらに300〜5000の範囲内の
平均分子量を有するものであることが特に望ましい。The modified product used in the present invention has an average molecular weight of 100
It is desirable that the molecular weight is as low as in the range of 10,000 to 10,000, and it is particularly desirable that the average molecular weight is in the range of 300 to 5,000.
上記の変性物は、公知の各種の高分子物質、たとえば、
ポリアクリレート系樹脂、ポリメタクリレート系樹脂、
セルロース系樹脂などと混合して用いてもよい。The above-mentioned modified products can be made of various known polymeric substances, such as
Polyacrylate resin, polymethacrylate resin,
It may be used in combination with a cellulose resin or the like.
中間層の形成においては、まず上記変性物を溶剤に溶解
して塗布液を調製する。In forming the intermediate layer, first, the above-mentioned modified product is dissolved in a solvent to prepare a coating solution.
変性物を溶解するための溶剤としては、メタノール、エ
タノール、プロパツール、ブタノール、アセトン、メチ
ルエチルケトン、メチルイソブチルケトン、ジアセトン
アルコール、メチルセロソルブ、エチルセロソルブ、ブ
チルセロソルブ、メチルセロソルブアセテート、エチル
セロソルブアセテート、ジメチルホルムアミド、シンナ
ーなどを挙げることができる。Solvents for dissolving modified substances include methanol, ethanol, propatool, butanol, acetone, methyl ethyl ketone, methyl isobutyl ketone, diacetone alcohol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, dimethyl formamide. , thinner, etc.
これらの変性物溶液中には、基板との接着性増強剤、可
塑剤、滑剤、マット剤、帯電防止剤、架橋剤などの各種
の添加物を所望に応じて添加することが可能である。Various additives such as an adhesive enhancer with the substrate, a plasticizer, a lubricant, a matting agent, an antistatic agent, a crosslinking agent, etc. can be added to the modified solution as desired.
この塗布液を、スプレー法、スピンナー法、デイツプ法
、ロールコート法、ブレードコート法、ドクターロール
法、スクリーン印刷法などの塗布方法により基板表面(
もしくは下塗層表面)に塗布して塗膜を形成したのち乾
燥することにより、基板(または下塗層)上に中間層を
形成することができる。中間層の層厚は1通常は0.0
2乃至20終mであり、好ましくは0.05乃至5.0
ルmである。This coating solution is applied to the substrate surface (
Alternatively, an intermediate layer can be formed on the substrate (or the undercoat layer) by coating the intermediate layer on the substrate (or the undercoat layer) to form a coating film and then drying it. The thickness of the intermediate layer is 1, usually 0.0
2 to 20 m, preferably 0.05 to 5.0 m
It is le m.
次いで、中間層上には記録層が設けられる。A recording layer is then provided on the intermediate layer.
記Q層に用いられる材料の例としては、Te、Zn、I
n、Sn、Zr、An、Ti、Cu、Ge、Au、Pt
等の金属;Bi、As、Sb等の半金属;Ge、Si等
の半導体;およびこれらの合金またはこれらの組合せを
挙げることができる。また、これらの金属、半金属また
は半導体の硫化物、酸化物、ホウ化物、ケイ素化合物、
炭化物および窒化物等の化合物:およびこれらの化合物
と金属との混合物も記録層に用いることができる。ある
いは、色素と変性物との組合せを利用することもできる
。Examples of materials used for the Q layer include Te, Zn, I
n, Sn, Zr, An, Ti, Cu, Ge, Au, Pt
metalloids such as Bi, As, and Sb; semiconductors such as Ge and Si; and alloys thereof or combinations thereof. In addition, sulfides, oxides, borides, silicon compounds of these metals, semimetals or semiconductors,
Compounds such as carbides and nitrides: and mixtures of these compounds with metals can also be used in the recording layer. Alternatively, a combination of dyes and modifiers can be used.
記j2層は、上記材料を蒸着、スパッタリング。For the second layer, the above materials were deposited and sputtered.
イオンブレーティングなどの方法により基板上に直接に
または下塗層を介して形成することができる。記録層は
単層または重層でもよいが、その層厚は、光情報記録に
要求される光学濃度の点から一般にlOO乃至5500
又の範囲であり、好ましくは150〜100OXの範囲
である。It can be formed directly on the substrate or via an undercoat layer by a method such as ion blasting. The recording layer may be a single layer or a multilayer, but its layer thickness is generally from lOO to 5,500 mm in terms of optical density required for optical information recording.
It is preferably in the range of 150 to 100OX.
記録層が色素と重合物との組合せからなる場合には、そ
の重合物として、前記の変性物を用いてもよい。When the recording layer is composed of a combination of a dye and a polymer, the above-mentioned modified product may be used as the polymer.
このようにして、基本的に基板、中間層および記録層が
この順序で積層された情報記録媒体を製造することがで
きる。In this way, an information recording medium in which the substrate, intermediate layer, and recording layer are basically laminated in this order can be manufactured.
なお、記録層の上には、機械的強度の向上などの目的で
、たとえばゼラチン、ゼラチン誘導体等の天然高分子物
質;セルロース誘導体、ポリサッカライド、ラテックス
状ビニルポリマー、エチレン・酢酸ビニル共変性物等の
合成高分子物質などからなる保護膜が設けられていても
よい。In addition, for the purpose of improving mechanical strength, for example, natural polymer substances such as gelatin and gelatin derivatives; cellulose derivatives, polysaccharides, latex-like vinyl polymers, ethylene-vinyl acetate co-modified products, etc. are coated on the recording layer. A protective film made of a synthetic polymer material or the like may be provided.
また、基板上にはレーザービームのトラッキング用溝や
アドレス信号等の情報を表わす凹凸か予め設けられてい
てもよい、このような溝および凹凸を設ける方法として
は、溝または凹凸を有する原盤から射出成形法によりポ
リメチルメタクリレート、ポリカーボネート等のプラス
チック基板を作製する方法がある。この場合に本発明に
係る中間層は、この溝、凹凸を有する基板上に前述の方
法により塗設される。また、溝、凹凸を設ける別の方法
としては、基板と原盤との間に光硬化性樹脂からなる塗
膜を設けて光硬化させたのち、原盤を剥離させる方法(
2P法)がある。この場合には1本発明に係る中間層を
予めIXI!1に塗設したのち光硬化性樹脂を原盤と基
板との間に挟み込み、光照射後、N51を剥離させて光
硬化性樹脂層上に中間層が設けられた構造を得ることか
できる。Further, grooves for laser beam tracking or unevenness representing information such as address signals may be provided in advance on the substrate.A method for providing such grooves and unevenness is to eject from a master disk having grooves or unevenness. There is a method of producing a plastic substrate made of polymethyl methacrylate, polycarbonate, or the like using a molding method. In this case, the intermediate layer according to the present invention is coated on the substrate having grooves and irregularities by the method described above. Another method for providing grooves and unevenness is to provide a coating film made of a photocurable resin between the substrate and the master, photocure it, and then peel off the master (
2P method). In this case, one intermediate layer according to the present invention is prepared in advance by IXI! 1, a photocurable resin is sandwiched between the master and the substrate, and after light irradiation, N51 is peeled off to obtain a structure in which an intermediate layer is provided on the photocurable resin layer.
後者の方法に使用される光硬化性ml1liの代表的な
例としては、光重合性モノマー(および/またはオリゴ
マー)と光重合開始剤等との混合物が挙げられる。光重
合性モノマー(オリゴマー)としては、エチレングリコ
ール、ポリエチレングリコール、ポリプロピレングリコ
ール、トリメチロールプロパン、ペンタエリスリトール
等のメタクリル酸エステル、アクリル酸エステルなど公
知の材料を単独でまたは組み合わせて用いることかでき
る。また光重合開始剤としては、ベンゾフェノン、ベン
ゾインメチルエーテル等のベンゾインアルキルエーテル
、アンスラキノン等のキノン知能の従来公知の材料を好
適に用いることかてきる。A typical example of the photocurable ml1li used in the latter method is a mixture of a photopolymerizable monomer (and/or oligomer), a photopolymerization initiator, and the like. As the photopolymerizable monomer (oligomer), known materials such as methacrylic esters and acrylic esters such as ethylene glycol, polyethylene glycol, polypropylene glycol, trimethylolpropane, and pentaerythritol can be used alone or in combination. As the photopolymerization initiator, conventionally known materials such as benzophenone, benzoin alkyl ethers such as benzoin methyl ether, and quinones such as anthraquinone can be suitably used.
基板の記録層が設けられる側とは反対側の表面には、耐
傷性、防湿性などを高めるために、たとえば二酸化ケイ
素、酸化スズ、弗化マグネシウムなどの無機物質からな
る薄膜が真空蒸着、スパッタリング等により設けられて
いてもよい。On the surface of the substrate opposite to the side on which the recording layer is provided, a thin film made of an inorganic substance such as silicon dioxide, tin oxide, or magnesium fluoride is deposited by vacuum evaporation or sputtering to improve scratch resistance and moisture resistance. etc. may be provided.
なお1本発明の情報記録媒体は貼り合わせタイプの形態
にあってもよく、この記録媒体においては、上記構成を
有する二枚の基板を接着剤等を用いて接合することによ
り製造することができる。Note that the information recording medium of the present invention may be in the form of a bonded type, and this recording medium can be manufactured by bonding two substrates having the above configuration using an adhesive or the like. .
また、エアーサンドイッチタイプの記録媒体においては
、二枚の円盤状基板のうちの少なくとも一方が上記構成
を有する基板を、リング状の外側スペーサと円盤状内側
スペーサとを介して接合することにより製造することが
てきる。 ・あるいは、ポリエステル薄膜などからな
る可撓性支持体上に中間層を設け、さらに記録層と保護
層とを設けることによりウェブ状のレーザー記録媒体を
得ることもできる。Furthermore, an air sandwich type recording medium is manufactured by joining two disc-shaped substrates, at least one of which has the above configuration, via a ring-shaped outer spacer and a disc-shaped inner spacer. Something will happen. Alternatively, a web-like laser recording medium can be obtained by providing an intermediate layer on a flexible support made of a polyester thin film, and further providing a recording layer and a protective layer.
次に本発明の実施例および比較例を記載する。Next, Examples and Comparative Examples of the present invention will be described.
ただし、これらの6例は本発明を制限するものでない。However, these six examples do not limit the present invention.
[実施例1] 正方形のポリエステル基板(locmXl。[Example 1] Square polyester substrate (locmXl.
cm、厚さ:100gm)をイソプロピルアルコール中
に浸漬して超音波洗浄し、次いでプレオンを用いて素早
く乾燥させた。cm, thickness: 100 gm) was immersed in isopropyl alcohol for ultrasonic cleaning, and then quickly dried using Preon.
シクロペンタジェン/ジシクロペンタジェン/シクロペ
ンテン/ヒドロキシエチルメタクリレート共重合体[平
均分子量二800、フィントン1700 (日本ゼオン
■製)]2gを、メチルエチルケトン30mJl、トル
エン30 m lおよびプロピレングリコール七ツメチ
ルエーテル60mfLからなる混合溶媒に溶解して中間
層形成用塗布液を調製し、この塗布液を上記基板の表面
にスピンコーターを用い、回転数30Orpmにて10
秒間塗布し、次いで回転数800rpmにて20秒間塗
布した。この塗布層を80℃にて10分間乾燥して、乾
燥後の膜厚が0.21Lmの中間層を形成した。2 g of cyclopentadiene/dicyclopentadiene/cyclopentene/hydroxyethyl methacrylate copolymer [average molecular weight 2800, Finton 1700 (manufactured by Nippon Zeon)] was added from 30 mJl of methyl ethyl ketone, 30 ml of toluene, and 60 mfL of propylene glycol 7-methyl ether. A coating solution for forming an intermediate layer was prepared by dissolving it in a mixed solvent, and this coating solution was coated on the surface of the substrate using a spin coater at a rotation speed of 30 rpm for 10 minutes.
The coating was applied for 2 seconds, and then for 20 seconds at a rotation speed of 800 rpm. This coated layer was dried at 80° C. for 10 minutes to form an intermediate layer having a thickness of 0.21 Lm after drying.
次に、上記中間層の上にI n f9 (300ス)と
GeS層(240X)とを共蒸着し1層厚が540又の
記録層を形成した。Next, I n f9 (300×) and a GeS layer (240×) were co-deposited on the intermediate layer to form a recording layer having a thickness of 540×.
以上の方法により、基板、不飽和炭化水素化合物の変性
物からなる中間層、および記録層から構成された情報記
録媒体を製造した。By the method described above, an information recording medium consisting of a substrate, an intermediate layer made of a modified unsaturated hydrocarbon compound, and a recording layer was manufactured.
[実施例2]
中間層形成用の変性物としてペンテン/イソプレン/l
、3−ペンタジェン/メチルブテン/無水マレイン酸共
重合体[平均分子ffi:1000]を同量用いた以外
は実施例1と同様にして、基板、不飽和炭化水素化合物
の変性物からなる中間層、および記録層から構成された
情報記録媒体を製造した。[Example 2] Pentene/isoprene/l as a modified substance for forming an intermediate layer
, a substrate, an intermediate layer made of a modified unsaturated hydrocarbon compound, An information recording medium comprising a recording layer and a recording layer was manufactured.
[実施例3]
中間層形成用の変性物として、スチレン/ビニルトルエ
ン/アクリル酸共重合体[平均分子量:1400、プラ
イオライド、グツドイヤー■製]を同量用いた以外は実
施例1と同様にして、基板、不飽和炭化水素化合物の変
性物からなる中間層、および記Q層から構成された情報
記録媒体を製造した。[Example 3] The same procedure as in Example 1 was carried out, except that the same amount of styrene/vinyltoluene/acrylic acid copolymer [average molecular weight: 1400, manufactured by Prioride, Gutdeyer ■] was used as the modified material for forming the intermediate layer. Thus, an information recording medium was produced, which was composed of a substrate, an intermediate layer made of a modified unsaturated hydrocarbon compound, and the Q layer.
[比較例1]
中間層形成用の変性物として、ポリメチルメタクリレー
ト(ダイヤナールBR−85、三菱レーヨン■製、平均
分子量: 250000)を同量用いた以外は実施例1
と同様にして、基板、ポリメチルメタクリレートからな
る中間層、および記録層から構成された情報記録媒体を
製造した。[Comparative Example 1] Example 1 except that the same amount of polymethyl methacrylate (Dyanal BR-85, manufactured by Mitsubishi Rayon ■, average molecular weight: 250,000) was used as the modified material for forming the intermediate layer.
In the same manner as above, an information recording medium consisting of a substrate, an intermediate layer made of polymethyl methacrylate, and a recording layer was manufactured.
[比較例2コ
中間層形成用の変性物として、ニトロセルロース(RS
1/2.ダイセル−製、平均分子量=1200)を同
量用いた以外は実施例1と同様にして、基板、ニトロセ
ルロースからなる中間層、および記録層から構成された
情報記録媒体を製造した。[Comparative Example 2] Nitrocellulose (RS) was used as a modified material for forming the intermediate layer.
1/2. An information recording medium consisting of a substrate, an intermediate layer made of nitrocellulose, and a recording layer was produced in the same manner as in Example 1, except that the same amount of 1200 (manufactured by Daicel) was used.
[比較例3]
中間層形成用の変性物として、ポリスチレン(ハイマー
5T−95,三洋化1株製、平均分子量: 10000
)を同量用いた以外は実施例1と同様にして、基板、ポ
リスチレンからなる中間層、および記録層から構成され
た情報記録媒体を製造した。[Comparative Example 3] Polystyrene (Himer 5T-95, manufactured by Sanyo Kaisha, Ltd., average molecular weight: 10,000) was used as a modified material for forming the intermediate layer.
An information recording medium composed of a substrate, an intermediate layer made of polystyrene, and a recording layer was manufactured in the same manner as in Example 1, except that the same amount of (A) was used.
[比較例4]
中間層形成用の変性物として、ポリスチレン(ハイマー
5B7120、三洋化成■製3平均分子量: 2500
0)を同量用いた以外は実施例1と同様にして、基板、
ポリスチレンからなる中間層、および記録層から構成さ
れた情報記録媒体を製造した。[Comparative Example 4] Polystyrene (HIMER 5B7120, manufactured by Sanyo Chemical Co., Ltd., 3 average molecular weight: 2500) was used as a modified material for forming the intermediate layer.
A substrate,
An information recording medium consisting of an intermediate layer made of polystyrene and a recording layer was manufactured.
[情報記録媒体の感度評価]
アルゴンレーザー(波長:514−5nm)をレンズに
よりビーム系25pmに集光し、変調器により1.33
Bsecのパルス幅として、各側に8いて得られた情報
記録媒体に照射して、露光操作を行なった。この露光操
作において記録層に線幅10pmの溝を形成するに必要
なレーザー出力強度を当該情報記録媒体の感度として評
価した。[Sensitivity evaluation of information recording media] An argon laser (wavelength: 514-5 nm) is focused to a beam system of 25 pm by a lens, and a modulator is used to
An exposure operation was performed by irradiating the obtained information recording medium with a pulse width of 8 Bsec on each side. In this exposure operation, the laser output intensity required to form a groove with a line width of 10 pm in the recording layer was evaluated as the sensitivity of the information recording medium.
従って、レーザー出力強度の低い記録媒体はど感度が高
いことになる。Therefore, a recording medium with a low laser output intensity has a high sensitivity.
以下余白 評価結果を第1表に示す。Margin below The evaluation results are shown in Table 1.
第1表
感度(m W )
実施例1 85
実施例2 85
実施例3 140
比較例1 175
比較例2 175
比較例3 170
比較例4 170
第1表に示した結果から明らかなように、本発明の情報
記録媒体(実施例1.2.3)は、公知の情報記録媒体
(比較例1.2,3.4)と比較して記録感度が著しく
高いことが確認された。Table 1 Sensitivity (mW) Example 1 85 Example 2 85 Example 3 140 Comparative Example 1 175 Comparative Example 2 175 Comparative Example 3 170 Comparative Example 4 170 As is clear from the results shown in Table 1, this It was confirmed that the information recording medium of the invention (Example 1.2.3) had significantly higher recording sensitivity than the known information recording medium (Comparative Examples 1.2 and 3.4).
[実施例4]
正方形のポリエステル基板[10cmX10cm、厚さ
:10100pをイソプロピルアルコール中に浸漬して
超音波洗浄し、次いでフレオンを用いて素早く乾爆させ
た。[Example 4] A square polyester substrate [10 cm x 10 cm, thickness: 10100 p] was immersed in isopropyl alcohol, ultrasonically cleaned, and then quickly dry-exploded using Freon.
ブタジェン/イソブチン/l−ブテン/2−ブテン/ヒ
ドロキシエチルメタクリレート共重合体5gを、メチル
エチルケトン60gとトルエン40gからなる混合溶媒
に溶解して中間層形成用塗布液を調製し、この塗布液を
上記基板の表面にスピンコーターを用い、回転数300
rpmにて10秒間塗布し、次いで回転数800rpm
にて20秒間塗布した。この塗布層を80℃にて10分
間乾燥して、乾燥後の膜厚が0.24mの中間層を形成
した。A coating solution for forming an intermediate layer is prepared by dissolving 5 g of butadiene/isobutyne/l-butene/2-butene/hydroxyethyl methacrylate copolymer in a mixed solvent consisting of 60 g of methyl ethyl ketone and 40 g of toluene, and this coating solution is applied to the substrate. Using a spin coater on the surface of
Apply for 10 seconds at rpm, then rotate at 800 rpm.
It was applied for 20 seconds. This coated layer was dried at 80° C. for 10 minutes to form an intermediate layer having a thickness of 0.24 m after drying.
上記中間層の表面上に、ペンタメチン過塩素酸塩色素0
.6gをメタノール95gとジクロルメタン5gとの混
合溶媒に溶解させた記録層形成用塗布液を、スピンコー
ターを用い1回転fi300rpmにて10秒間塗布し
1次いで回転a800rpmにて20秒間塗布した。こ
の塗布層を80℃にて10分間乾燥して、乾燥後の膜厚
が4g0ルmの色素記録層を形成した。On the surface of the intermediate layer, pentamethine perchlorate dye 0
.. A recording layer forming coating solution prepared by dissolving 6 g of methanol in a mixed solvent of 95 g of methanol and 5 g of dichloromethane was applied using a spin coater for 10 seconds at a rotation speed of 300 rpm, and then for 20 seconds at a rotation speed of 800 rpm. This coating layer was dried at 80° C. for 10 minutes to form a dye recording layer having a thickness of 4 g 0 m after drying.
以上の方法により、基板、不飽和炭化水素5化合物水素
化合物の変性物からなる中間層および色素記録層から構
成された情報記録媒体を製造した。By the method described above, an information recording medium comprising a substrate, an intermediate layer made of a modified unsaturated hydrocarbon pentahydrogen compound, and a dye recording layer was manufactured.
Claims (1)
き込みおよび/または読み取りが可能な記録層を有する
情報記録媒体において、記録層および/または中間層が
、炭素数4以上の不飽和炭化水素化合物を主成分として
含む不飽和化合物の重合体の変性物を含有することを特
徴とする情報記録媒体。 2、炭素数4以上の不飽和炭化水素化合物を主成分とし
て含む不飽和化合物の重合体の変性物が、炭素数4以上
の不飽和炭化水素化合物とアクリル酸、メタクリル酸、
マレイン酸、無水マレイン酸、フタル酸、イタコン酸、
これらの誘導体、酢酸ビニル、およびエポキシ基もしく
は水酸基を有するビニルモノマーから選ばれた酸素原子
を含むモノマーとの共重合体であることを特徴とする特
許請求の範囲第1項記載の情報記録媒体。 3、酸素原子を含むモノマーが、メタクリル酸もしくは
アクリル酸とジオールとのエステル、あるいは無水マレ
イン酸であることを特徴とする特許請求の範囲第2項記
載の情報記録媒体。 4、炭素数4以上の不飽和炭化水素化合物を主成分とし
て含む不飽和化合物の重合体の変性物が、100〜10
000の範囲内の平均分子量を有するものであることを
特徴とする特許請求の範囲第1項記載の情報記録媒体。 5、炭素数4以上の不飽和炭化水素化合物を主成分とし
て含む不飽和化合物の重合体の変性物が、300〜50
00の範囲内の平均分子量を有するものであることを特
徴とする特許請求の範囲第1項記載の情報記録媒体。 6、記録層が、上記変性物を含有することを特徴とする
特許請求の範囲第1項記載の情報記録媒体。 7、中間層が、上記変性物を含有することを特徴とする
特許請求の範囲第1項記載の情報記録媒体。 8、中間層が、実質的に上記変性物よりなることを特徴
とする特許請求の範囲第1項記載の情報記録媒体。[Claims] 1. An information recording medium having a recording layer on a substrate in which information can be written and/or read by a laser via an intermediate layer, wherein the recording layer and/or the intermediate layer has a carbon number of 4. An information recording medium characterized by containing a modified polymer of an unsaturated compound containing the above unsaturated hydrocarbon compound as a main component. 2. A modified polymer of an unsaturated compound containing as a main component an unsaturated hydrocarbon compound having 4 or more carbon atoms, an unsaturated hydrocarbon compound having 4 or more carbon atoms, acrylic acid, methacrylic acid,
maleic acid, maleic anhydride, phthalic acid, itaconic acid,
2. The information recording medium according to claim 1, which is a copolymer of these derivatives, vinyl acetate, and a monomer containing an oxygen atom selected from vinyl monomers having an epoxy group or a hydroxyl group. 3. The information recording medium according to claim 2, wherein the monomer containing an oxygen atom is an ester of methacrylic acid or acrylic acid with a diol, or maleic anhydride. 4. A modified polymer of an unsaturated compound containing as a main component an unsaturated hydrocarbon compound having 4 or more carbon atoms has 100 to 10
2. The information recording medium according to claim 1, wherein the information recording medium has an average molecular weight within the range of 0.000. 5. The modified product of a polymer of an unsaturated compound containing as a main component an unsaturated hydrocarbon compound having 4 or more carbon atoms has 300 to 50 carbon atoms.
2. The information recording medium according to claim 1, wherein the information recording medium has an average molecular weight within a range of 0.000. 6. The information recording medium according to claim 1, wherein the recording layer contains the modified substance. 7. The information recording medium according to claim 1, wherein the intermediate layer contains the above modified substance. 8. The information recording medium according to claim 1, wherein the intermediate layer consists essentially of the above-mentioned modified product.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61184630A JPS6341189A (en) | 1986-08-05 | 1986-08-05 | Information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61184630A JPS6341189A (en) | 1986-08-05 | 1986-08-05 | Information recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6341189A true JPS6341189A (en) | 1988-02-22 |
Family
ID=16156591
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61184630A Pending JPS6341189A (en) | 1986-08-05 | 1986-08-05 | Information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6341189A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS647347A (en) * | 1987-03-10 | 1989-01-11 | Daicel Chem | Optical information recording medium |
-
1986
- 1986-08-05 JP JP61184630A patent/JPS6341189A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS647347A (en) * | 1987-03-10 | 1989-01-11 | Daicel Chem | Optical information recording medium |
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