JPS6341048B2 - - Google Patents

Info

Publication number
JPS6341048B2
JPS6341048B2 JP54006305A JP630579A JPS6341048B2 JP S6341048 B2 JPS6341048 B2 JP S6341048B2 JP 54006305 A JP54006305 A JP 54006305A JP 630579 A JP630579 A JP 630579A JP S6341048 B2 JPS6341048 B2 JP S6341048B2
Authority
JP
Japan
Prior art keywords
polymer compound
compound
basic
acid
acetic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54006305A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5598744A (en
Inventor
Kuniomi Eto
Masaru Nanhei
Shinichi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP630579A priority Critical patent/JPS5598744A/ja
Publication of JPS5598744A publication Critical patent/JPS5598744A/ja
Publication of JPS6341048B2 publication Critical patent/JPS6341048B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP630579A 1979-01-22 1979-01-22 Photosensitive resin composition Granted JPS5598744A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP630579A JPS5598744A (en) 1979-01-22 1979-01-22 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP630579A JPS5598744A (en) 1979-01-22 1979-01-22 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5598744A JPS5598744A (en) 1980-07-28
JPS6341048B2 true JPS6341048B2 (enrdf_load_stackoverflow) 1988-08-15

Family

ID=11634653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP630579A Granted JPS5598744A (en) 1979-01-22 1979-01-22 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5598744A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178238A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive composition
JP2607094B2 (ja) * 1987-09-03 1997-05-07 富士写真フイルム株式会社 感光性組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5136932A (ja) * 1974-09-25 1976-03-29 Unitika Ltd Kankoseisoseibutsu
JPS5145518A (ja) * 1974-10-16 1976-04-19 Unitika Ltd Kankoseisoseibutsu

Also Published As

Publication number Publication date
JPS5598744A (en) 1980-07-28

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