JPS634072A - Catalytic solution for electroless plating and its production - Google Patents

Catalytic solution for electroless plating and its production

Info

Publication number
JPS634072A
JPS634072A JP14761886A JP14761886A JPS634072A JP S634072 A JPS634072 A JP S634072A JP 14761886 A JP14761886 A JP 14761886A JP 14761886 A JP14761886 A JP 14761886A JP S634072 A JPS634072 A JP S634072A
Authority
JP
Japan
Prior art keywords
chloride
electroless plating
dipyridyl
palladium
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14761886A
Other languages
Japanese (ja)
Inventor
Takao Sato
高雄 佐藤
Shinichi Mitsui
三井 真一
Kenji Kobayashi
健治 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP14761886A priority Critical patent/JPS634072A/en
Publication of JPS634072A publication Critical patent/JPS634072A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating

Abstract

PURPOSE:To obtain a catalytic soln. enabling satisfactory electroless plating on an electrically insulating substance by aging an aqueous soln. contg. palladium chloride, hydrochloric acid, sodium chloride, stannous chloride and alpha,alpha'- dipyridyl each at a specified concn. at a specified temp. CONSTITUTION:An aqueous soln. prepd. by dissolving 0.1-1g/l palladium chloride (PdCl2), 3-30g/l stannous chloride (SnCl2.2H2O) and 1-100mg/l alpha,alpha'- dipyridyl in an aqueous soln. contg. 10-50ml/l hydrochloric acid (37%) and 5-150g/l sodium chloride is aged at >=80 deg.C to produce a catalytic soln. When an electrically insulating substance such as plastics is activated by treatment with the catalytic soln., perfect electroless plating can be carried out.

Description

【発明の詳細な説明】 【産業上の利用分野】 本発明は無電解めっき用触媒液及びその製造方法、詳し
くは電気絶縁物質、特にプラスチックを活性化して、無
電解めっきによる金属被覆工程の準備を行うためのパラ
ジウム触媒液及びその製造方法に関するものである。 (従来の技術〕 一般に電子工業においてはプラスチックを無電解めっき
により金属被覆し、導電化することが広く行われている
0例えば印刷配線板の製造においては銅張リエポキシ樹
脂積層板の表面の所望の位置に貫通孔を形成した後、貫
通孔壁に無電解めっき用触媒を吸着させ、次いで無電解
銅めっき等の無電解めっきにより貫通孔壁面に金属被覆
を施して貫通孔壁面を導電化することが行われている。 無電解めっき用触媒としてはパラジウム金属が広く使用
されており、パラジウム金属の貫通孔壁面への形成は貫
通孔壁面を塩化第一錫と塩化パラジウムの混合コロイド
水溶液に接触させた後水洗し、次いでパラジウム金属と
同時に吸着した錫化合物を塩酸溶液あるいはホウフッ化
水素酸溶液に浸漬して除去し、パラジウム金属が露出す
るようにしなければならない、このようなパラジウム触
媒としては特公昭56−10377号により基材に金属
を無電解析出するための触媒調合物として塩化パラジウ
ムIg/Q、塩化第一錫10〜60gIQ、塩酸(37
%溶液)8mQ/Q、塩化ナトリウム58に/Qの組成
が開示されている。 〔発明が解決しようとする問題点〕 しかし、これら塩化第一錫と塩化パラジウムの混合コロ
イド水溶液はプラスチックやガラス上への吸着性が十分
でなく、これがしばしば銅張リエボキシ樹脂積層板の貫
通孔壁への無電解銅めっきの析出不良(ピンホール、ボ
イド等)発生の原因となっていた。 〔発明の従来技術に対する相違点〕 本発明の目的はかかる従来技術の欠点を除去した無電解
めっき用触媒液およびその製造方法を提供することにあ
り、特にパラジウムイオンの錫イオン(Sn” ” )
による還元反応を促進し、安定なパラジウム金属コロイ
ドの生成及びパラジウム金属の吸着促進効果を有するα
、α′−ジピリジルを該触媒液に含有させた点に独創的
内容を有する。 〔問題点を解決するための手段〕 本発明は水溶液IQ当り、塩化パラジウム(PdCら)
0.1〜Ig、塩酸(37%溶液)10〜50m1l、
塩化ナトリウム50〜150g、塩酸第一錫(SnCQ
2・2H20)3〜30gおよびα、α′−ジピリジル
1〜100■を含むことを特徴とする無電解めっき用触
媒液および、塩酸および塩化ナトリウムを含む水溶液に
塩化パラジウム、塩化第一錫およびα、α′−ジピリジ
ルを添加溶解させた後、該水溶液を80℃以上の液温で
熟成することを特徴とする無電解めっき用触媒液の製造
方法である。 〔原理・作用〕 本発明の無電解めっき用触媒液(以下触媒液と略す)中
のα、α′−ピリジルは塩化パラジウムの塩化第一錫に
よる還元反応を促進させ、安定なパラジウム金属コロイ
ドの生成及びパラジウム金属のプラスチック及びガラス
上への吸着を促進する。 触媒液中のα、α′−ジピリジルの濃度がll1g/Q
より低下するとパラジウム金属の吸着促進効果が著しく
減少する。またα、α′−ジピリジルの濃度が100m
g#Iをこえると、銅張リエポキシ樹脂積層板を触媒液
で処理する場合、銅箔が変色しゃすくなる。α、α′−
ジピリジルは上記の効果ばかりでなく、触媒液中に不純
物として含まれる鉄イオンをマスキングし、触媒液を安
定化させる効果を有する。 〔実施例〕 以下、本発明を実施例により詳細に説明する。 (実施例1) 純水的700m1lに37%濃度の塩酸を40mA添加
し、さらに塩化ナトリウムを100g溶解する0次いで
塩化パラジウムを1g溶解し、さらに塩化第一錫(Sn
CR,−28,0)20 gとα、α′−ジピリジル2
0mgとを溶解させた後、液温を85℃にして30分間
熟成した。液の色は黒縁色から黒褐色に変化し、塩化パ
ラジウム−塩化第一錫の混合コロイドが生成したことを
示している。なお比較例として、α、α′−ジピリジル
を含有しない水溶液について同じ液温で熟成したところ
、液の色が黒縁色から黒褐色に変化し、上記液と同じ吸
光度を示すのに約1時間かかった。 これによってα、α′−ジピリジルのパラジウムイオン
の第一錫イオン(S n+ + )により還元反応を促
進することが立証された0次いで室温まで冷却後、純水
を加えて全体をIQとし、触媒液を調製した。 本触媒液に貫通孔の形成された銅張りエポキシ樹脂積層
板を約5分間浸漬後流水洗し、さらに5%ホウフッ化水
素酸水溶液に5分間浸漬し、金属パラジウムと一緒に銅
張リエポキシ樹脂積層板の貫通孔壁に吸着した塩化第−
錫等の錫化合物を除去し、貫通孔壁土の金属パラジウム
を活性化する。 次いで水洗機液温25℃、pH=13の無電解銅めっき
液に約15分間浸漬し、貫通孔壁上に無電解銅めっき膜
を析出させた。貫通孔壁は無電解銅めっき膜で完全に被
覆されていた。−方比較例としてα。 α′−ジピリジルを添加しない触媒液を使用し、上記と
同様な操作で銅張りエポキシ樹脂積層板を処理し、無電
解銅めっきを行ったが貫通孔壁の無電解鋼めっき膜には
多数のピンホールが観察された。 (実施例2) 実施例1において調製したa、α′−ジピリジルを含有
する触媒液を純水で2倍に希釈した触媒液を使用し、実
施例1と同様な操作によって銅張りエポキシ樹脂積層板
を無電解銅めっきしたところ、貫通孔壁面は無電解銅め
っき膜で完全に被覆されていた。 〔発明の効果〕 以上説明したように本発明の触媒液で処理することによ
り、印刷配線板の貫通孔壁は無電解めっき膜で完全に被
覆でき、貫通孔の電気的接続信頼性を向上することがで
きる効果を有するものである。
Detailed Description of the Invention [Industrial Application Field] The present invention relates to a catalyst solution for electroless plating and a method for producing the same, specifically for activating an electrically insulating material, especially plastic, to prepare it for a metal coating process by electroless plating. This invention relates to a palladium catalyst liquid and a method for producing the same. (Prior Art) In general, in the electronics industry, it is widely practiced to coat plastics with metals by electroless plating to make them conductive. After forming a through hole at a location, a catalyst for electroless plating is adsorbed on the wall of the through hole, and then a metal coating is applied to the wall surface of the through hole by electroless plating such as electroless copper plating to make the wall surface of the through hole conductive. Palladium metal is widely used as a catalyst for electroless plating, and palladium metal is formed on the walls of the through-holes by bringing the walls of the through-holes into contact with a mixed colloidal aqueous solution of stannous chloride and palladium chloride. After washing with water, the tin compound adsorbed at the same time as the palladium metal must be removed by immersion in a hydrochloric acid solution or a fluoroboric acid solution to expose the palladium metal. 56-10377, palladium chloride Ig/Q, stannous chloride 10-60 g IQ, hydrochloric acid (37
% solution) 8 mQ/Q, the composition of sodium chloride 58 mQ/Q is disclosed. [Problems to be Solved by the Invention] However, these mixed colloidal aqueous solutions of stannous chloride and palladium chloride do not have sufficient adsorption properties on plastics and glass, and this often causes the through-hole walls of copper-clad revoxy resin laminates to become sticky. This caused deposition defects (pinholes, voids, etc.) in electroless copper plating. [Differences between the invention and the prior art] The purpose of the present invention is to provide a catalyst solution for electroless plating that eliminates the drawbacks of the prior art and a method for producing the same, and in particular, to provide a catalyst solution for electroless plating that eliminates the drawbacks of the prior art.
α, which has the effect of promoting the reduction reaction of
The invention is original in that α'-dipyridyl is contained in the catalyst liquid. [Means for solving the problems] The present invention provides palladium chloride (PdC et al.) per aqueous solution IQ.
0.1 to Ig, 10 to 50 ml of hydrochloric acid (37% solution),
50-150 g of sodium chloride, stannous hydrochloride (SnCQ)
2.2H20) A catalyst solution for electroless plating characterized by containing 3 to 30 g and 1 to 100 g of α, α'-dipyridyl, and an aqueous solution containing hydrochloric acid and sodium chloride containing palladium chloride, stannous chloride and α , α'-dipyridyl is added and dissolved, and then the aqueous solution is aged at a temperature of 80° C. or higher. [Principle/Action] α,α′-pyridyl in the catalyst liquid for electroless plating (hereinafter abbreviated as catalyst liquid) of the present invention promotes the reduction reaction of palladium chloride with stannous chloride, and forms a stable palladium metal colloid. Facilitates the formation and adsorption of palladium metal onto plastics and glass. The concentration of α,α′-dipyridyl in the catalyst solution is 11g/Q
When it is lowered further, the effect of promoting adsorption of palladium metal is significantly reduced. Also, the concentration of α, α′-dipyridyl is 100 m
When g#I is exceeded, the copper foil tends to discolor when a copper-clad epoxy resin laminate is treated with a catalyst solution. α, α′−
In addition to the above effects, dipyridyl also has the effect of masking iron ions contained as impurities in the catalyst liquid and stabilizing the catalyst liquid. [Example] Hereinafter, the present invention will be explained in detail with reference to Examples. (Example 1) 40 mA of 37% hydrochloric acid was added to 700 ml of pure water, and 100 g of sodium chloride was then dissolved. Next, 1 g of palladium chloride was dissolved, and then stannous chloride (Sn
CR, -28,0) 20 g and α,α'-dipyridyl 2
After dissolving 0 mg, the liquid temperature was raised to 85°C and aged for 30 minutes. The color of the liquid changed from black edge color to blackish brown, indicating that a mixed colloid of palladium chloride and stannous chloride was produced. As a comparative example, when an aqueous solution containing no α,α'-dipyridyl was aged at the same liquid temperature, the color of the liquid changed from black edge color to blackish brown, and it took about 1 hour to show the same absorbance as the above liquid. . This proved that the reduction reaction was promoted by the stannous ion (S n + + ) of the palladium ion in α,α'-dipyridyl. After cooling to room temperature, pure water was added to the whole to make it IQ, and the catalyst A liquid was prepared. A copper-clad epoxy resin laminate with through-holes formed in this catalyst solution was immersed for about 5 minutes, then rinsed with water, and further immersed in a 5% aqueous fluoroboric acid solution for 5 minutes to form a copper-clad epoxy resin laminate together with metallic palladium. Chloride adsorbed on the wall of the through hole of the plate
Tin compounds such as tin are removed and the metal palladium in the through-hole wall soil is activated. Next, it was immersed in an electroless copper plating solution having a water washer temperature of 25° C. and a pH of 13 for about 15 minutes to deposit an electroless copper plating film on the wall of the through hole. The wall of the through hole was completely covered with an electroless copper plating film. − α as a comparative example. A copper-clad epoxy resin laminate was treated in the same manner as above using a catalyst solution to which α'-dipyridyl was not added, and electroless copper plating was performed. Pinholes were observed. (Example 2) A copper-clad epoxy resin laminate was prepared in the same manner as in Example 1 using a catalyst solution prepared by diluting the a,α'-dipyridyl-containing catalyst solution in Example 1 twice with pure water. When the plate was subjected to electroless copper plating, the walls of the through holes were completely covered with an electroless copper plating film. [Effects of the Invention] As explained above, by treating with the catalyst liquid of the present invention, the walls of the through holes in the printed wiring board can be completely covered with an electroless plating film, improving the reliability of the electrical connection of the through holes. It has the effect that it can.

Claims (2)

【特許請求の範囲】[Claims] (1)水溶液1l当り、塩化パラジウム(PdCl_2
)0.1〜1g、塩酸(37%溶液)10〜50ml、
塩化ナトリウム50〜150g、塩酸第一錫(SnCl
_2・2H_2O)3〜30gおよびα,α′−ジピリ
ジル1〜100mgを含むことを特徴とする無電解めっ
き用触媒液。
(1) Palladium chloride (PdCl_2
) 0.1-1 g, hydrochloric acid (37% solution) 10-50 ml,
50-150 g of sodium chloride, stannous hydrochloride (SnCl
_2.2H_2O) 3 to 30 g and α,α'-dipyridyl 1 to 100 mg.
(2)塩酸および塩化ナトリウムを含む水溶液に塩化パ
ラジウム、塩化第一錫およびα,α′−ジピリジルを添
加溶解させた後、該水溶液を80℃以上の液温で熟成す
ることを特徴とする無電解めっき用触媒液の製造方法。
(2) Palladium chloride, stannous chloride and α,α'-dipyridyl are added and dissolved in an aqueous solution containing hydrochloric acid and sodium chloride, and then the aqueous solution is aged at a liquid temperature of 80°C or higher. A method for producing a catalyst solution for electrolytic plating.
JP14761886A 1986-06-24 1986-06-24 Catalytic solution for electroless plating and its production Pending JPS634072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14761886A JPS634072A (en) 1986-06-24 1986-06-24 Catalytic solution for electroless plating and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14761886A JPS634072A (en) 1986-06-24 1986-06-24 Catalytic solution for electroless plating and its production

Publications (1)

Publication Number Publication Date
JPS634072A true JPS634072A (en) 1988-01-09

Family

ID=15434395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14761886A Pending JPS634072A (en) 1986-06-24 1986-06-24 Catalytic solution for electroless plating and its production

Country Status (1)

Country Link
JP (1) JPS634072A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03236489A (en) * 1989-12-22 1991-10-22 Nippon Mining Co Ltd Ruthenium plating liquid
CN108930030A (en) * 2018-06-15 2018-12-04 惠州市荣安达化工有限公司 A kind of wiring board perforation plating activator and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03236489A (en) * 1989-12-22 1991-10-22 Nippon Mining Co Ltd Ruthenium plating liquid
CN108930030A (en) * 2018-06-15 2018-12-04 惠州市荣安达化工有限公司 A kind of wiring board perforation plating activator and preparation method thereof

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