JPS6332545A - Developer composition having improved work efficiency and developing method - Google Patents

Abstract

PURPOSE:To obtain a composition capable of properly developing a photosensitive material contg. a lipophilic substance and having satisfactory safety and hygienic characteristics by using an aqueous soln. contg. a compound represented by a prescribed general formula. CONSTITUTION:An aqueous soln. contg. a compound represented by the general formula is used to obtain a developer composition capable of properly developing a photosensitive material contg. a lipophilic substance which is slightly soluble in water or alkali, emitting no foul odor and having satisfactory safety and hygienic characteristics. In the formula, R1 is H, 1-4C alkyl, hydroxyalkyl or halogen, R2 is H, 1-4C alkyl, 1-4C hydroxyalkyl or 2-4C hydroxyalkoxyalkyl, R3 is H, 1-4C alkyl or 1-4C hydroxyalkyl and n=1, 2 or 3.

Description

[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a developer composition and a developing method for a photosensitive material, and more specifically, to a method for removing a non-image area of a photosensitive material having a water-insoluble image forming layer. Use the appropriate developing material and developing method for rVA.

[Conventional technology]

So-called wash-off type photosensitive materials, which obtain one relief image by removing non-image areas during development, are used for many purposes, such as resin letterpress plates and photosensitive planographic printing plates (PS plates). , resist for printed wiring, non-silver salt reversible film, photosensitive beer mask film, color pool-7 film, etc.

Alkaline aqueous developers are generally used for these developments, but since photosensitive materials often contain lipophilic substances that are insoluble or poorly soluble in water or alkaline aqueous solutions, development is slow and non-image areas are It may take too much time to remove or may leave undeveloped images. Furthermore, it often happens that the removed components do not dissolve sufficiently and float, adhering to the image area and causing stains.

Several techniques have been proposed to solve this problem. JP 51-77401 and ¥trR 1982
-44202 discloses an aqueous developer using benzyl alcohol, and JP-A No. 54-8632 discloses an aqueous developer using benzyl alcohol.
No. 8 discloses an aqueous developer containing 7enyl glycols.

Although these technologies improve developability by adding a small amount of organic solvent, they are still insufficient, and each has its own unique odor, which causes discomfort to workers and poses health and safety concerns. It is also undesirable.

[Purpose of the invention]

A first object of the present invention is to provide a developer composition and a developing method that can suitably develop a photosensitive material containing a lipophilic substance.

A second object of the present invention is to provide a developer composition and a developing method that are low in odor, have excellent workability, and have improved safety and health issues.

[Structure of the invention]

The object of the present invention is to provide a developer composition for a photosensitive material characterized by comprising an aqueous solution containing a compound represented by the following general formula [1], and a photosensitive material having a water-insoluble image forming layer on a support. After image exposure, the material is treated with a developer,
The method for obtaining an image by removing a non-image area is achieved by a method for developing a photosensitive material, characterized in that the developer contains a compound represented by the following general formula [1].

General formula [13 In the formula, R8 represents a hydrogen atom, a C1-C4 furkyl group, a C1-C4 alkoxy group, a hydroxyalkyl group, or a halogen atom, and R2 represents a hydrogen atom, a C1-C4
represents a furkyl group, a hydroxyfurkyl group having 1 to 4 carbon atoms, or a hydroxyalkoxyfurkyl group having 2 to 4 carbon atoms, and %R3 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a hydroxyfurkyl group having 1 to 4 carbon atoms. represents a furkyl group, ■ is 1
Represents an integer from ~3.

The present invention will be explained in detail below.

In the above general formula [1], the furkyl group represented by % R1 is preferably a methyl group, a preferable example of the alkoxy group represented by R1 is a methoxy group, and the hydroxyalkyl group represented by R1 preferably has 1 carbon number. Examples of the halogen atoms represented by %R1 include fluorine atoms, chlorine atoms, and bromine atoms.

Preferred examples of the alkyl group in which R2 and Rs decrease include methyl group, ethyl group, etc., and hydroxyalkyl group includes, for example, hydroxymethyl group, hydroxyethyl group,
Examples of the hydroxyalkoxyalkyl group for R2, such as a hydroxypropyl group, include a diethyl group.

As specific examples of the compound represented by the general formula [1] used in the developer composition of the present invention, particularly preferred compounds are shown below, but the present invention is not limited thereto.

Compound example CHl ■ CH.

The compound represented by the general formula [1] can be synthesized by a known method.
dbuch der Organischen Che
You can refer to Volume 12, page 299 of mie.

The concentration of the compound represented by formula [1] in the development Q composition is suitably in the range of 0.01 to 10% by weight, more preferably in the range of 0.5 to 5% by weight.

The developer composition of the present invention has water as a main solvent,
It has an excellent effect of wetting and solubilizing lipophilic substances or lipophilic polymers using only water as a solvent, and basically consists of an aqueous solution containing the compound represented by the general formula [1], but Various additives can be used in combination, and examples of additives that are preferably used in combination include alkaline agents, anionic surfactants, and water-soluble reducing agents. - Examples of alkaline agents include sodium silicate, potassium silicate, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic potassium phosphate, dibasic potassium phosphate, tribasic ammonium phosphate, Inorganic alkaline agents such as ammonium diphosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc., mono-, salt- or triethyl-7mine and tetraflukylammonium hydroxide. Organic alkaline agents and 1'F1 ammonium silicate are useful.

The content of alkaline agent in the developer composition is 0.05
A range of 20% by weight is preferred, more preferably 0.5% by weight.
It ranges from 1 to 10% by weight.

Examples of the 7-ion type surfactant include higher alfur (cm~C2□) sulfate ester salts [e.g., sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of uryl alcohol sulfate, “T-ball B
-81J (trade name, manufactured by Shell Chemical Co., Ltd.), secondary sodium alkyl sulfate, etc.], aliphatic furfur phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate), alkylaryl sulfonates (e.g., dodecylbenzene), Sulfonic acid sodium salt, sodium salt of isopropylnaphthalene sulfonic acid,
sodium salt of nona-7tale disulfonic acid, sodium salt of metanitrobenzenesulfonic acid, etc.), sulfonate salts of alkylamides (e.g., C+ J)iCONCH2CHzSO3Na
etc.), dibasic CH.

There are sulfonate salts of fatty acid esters (eg, sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate nohexyl ester, etc.), and among these, alkylna-7-talenesulfonate salts are particularly preferably used.

The amount of these 7-ion surfactants added is in the range of 0.1 to 20% by weight, more preferably 1.0 to 10% by weight.

Water-soluble reducing agents include organic and inorganic reducing agents.

Examples of organic reducing agents include heptanols such as hedro-non, mesyl, and mexyquinone, and amine compounds such as phenylene-7mine and phenylhydracn. Examples of inorganic reducing agents include sodium sulfite. , potassium sulfite, ammonium sulfite, sodium hydrogen sulfite, potassium hydrogen sulfite and other sulfites, sodium phosphite, potassium phosphite, sodium hydrogen phosphite,
Examples include phosphates such as potassium hydrogen phosphite, potassium dihydrogen phosphite, sodium dihydrogen phosphite, potassium hydrogen sulfite, hydranone, sodium thiosulfate, sodium dithionite, etc., but the present invention Reducing agents that are particularly effective are sulfites, but the term water-soluble in the above-mentioned water-soluble reducing agents includes alkali-soluble, and these water-soluble reducing agents have a concentration of 0.1 to 10
It is contained in an amount of 0.5 to 5% by weight, more preferably 0.5 to 5% by weight.

The present invention eliminates the need to contain a solvent that has an odor or a problem in terms of health and safety by containing the compound represented by the above general formula [1] in a developer composition, or Therefore, in the developer composition of the present invention, the solvent other than water is
It is desirable that the amount of water in the solvent is not more than the limit that causes odor and health and safety problems, and the proportion of water in the solvent is preferably 80% or more.

Photosensitive materials suitable for processing with the developer composition of the present invention have an image-forming layer containing components that are insoluble or insoluble in water or aqueous alkaline solutions, and particularly suitable are water-based materials having lipophilic groups. A photosensitive material containing an insoluble substance or a high molecular weight polymer. *Furthermore, the developer composition of the present invention is particularly suitable for photosensitive materials of the type in which non-image areas are removed by development, so-called wash-to-7 type photosensitive materials.

In wash-off type photosensitive materials, the areas irradiated with actinic rays harden and become insoluble in the developer, and the areas that remain as image areas are called wash-off type photosensitive materials, and the areas irradiated with actinic rays are cured in the developer. There is a positive-working photosensitive material that has increased solubility in the photosensitive material and is removed during development, leaving the active light irradiated area as an image.The present invention works well on negative-type and top-type ambiguous photosensitive materials. This is particularly effective for negative photosensitive materials.

Specific examples of such wash-off type photosensitive materials include photosensitive lithographic printing plates, resin letterpress plates, color blue films, lenost for printed wiring, non-silver salt reversible films, and photosensitive beer mask films. Among these, monophotonic lithographic printing plates use highly lipophilic components to make image areas more receptive to oil-based ink, and in non-image areas, it is necessary to completely remove lipophilic components during development. Applying the present invention has great effects.

The image forming layer of the photosensitive material according to the present invention contains a photosensitive substance as an essential component, and the physical and chemical properties of the photosensitive substance change upon exposure or subsequent development treatment. Some products have a difference in solubility in developing solutions, some have a difference in the adhesion between molecules before and after exposure, and some have a difference in affinity for water and oil due to exposure or subsequent development processing. Those capable of forming an image area, and those disclosed in Japanese Patent Application Laid-Open No. 55-16
The multilayer structure described in No. 6645 is included.

Typical photosensitive substances include, for example, photosensitive diazo compounds, photosensitive 7dide compounds, compounds with ethylenically unsaturated double bonds, epoxy compounds that polymerize in acidic solvents, and C- Examples include compounds having an 0-C- group. Typical positive type compounds that become alkali-soluble when exposed to ts light include 0-quinone noacido compounds, acid-decomposable ether compounds, and ester compounds.

Aromatic noazonium salts and the like are examples of negative-type compounds whose solubility decreases upon exposure to light.

As specific examples of the 0-kynnoazide compound, for example, Japanese Patent Application Publication Nos. 47-5303, 48-63802, and 48
-63803, 49-38701, 56-10
No. 44, No. 56-1045, Special Publication No. 41-1] 222
No. 43-28403, No. 45-9610, No. 4
No. 9-17481, U.S. Pat. No. 2,797,213, U.S. Pat. No. 3,046,120, U.S. Pat.
, No. 454,400, No. 3, No. 544, No. 323, No. 3,573,917, No. 3,674,495, No. 3
, 785,825, British Patent No. 1,227,602,
1,251,345, 1,267.005, L329,888, 1,330, 932, and German Patent No. 854°890. No. 60-37549, No. 60-1024
No. 7, No. 60-3625, etc., and the present invention can be preferably applied at least to photosensitive materials using these compounds alone or in combination as photosensitive components.

These photosensitive components include 0-quinoneoacetocarphonic acid esters or 1-quinonediatcarboxylic acid esters of aromatic hydroxy compounds, and 0-quinonenoacytosulfonic acid or 0-quinonediatcarboxylic acid esters of aromatic amino compounds. It includes acid amides, and also includes those in which these O-quinonediazide compounds are used alone, and those in which they are mixed with alkali-soluble O (fat) and this mixture is provided as a photosensitive layer.

The alkali-soluble resin includes a phenol resin of the volatility type, and specifically includes a 7ケ/-l formaldehyde resin, a cresol formaldehyde resin, a phenol-cresol mixed formaldehyde resin, a cresol xylenol mixed formaldehyde resin, and the like. Furthermore, as described in JP-A-50-125806, in addition to the above phenol resin, phenol or cresol substituted with an alkyl group having 3 to 8 carbon atoms such as t-butylphenol formaldehyde resin and formaldehyde are used. It is also possible to use a condensate of the same.

If necessary, additives such as dyes, plasticizers, and components imparting printout performance can be added to the photosensitive layer containing an 0-quinonediazide compound as a photosensitive component.

The present invention can be applied to the amount per unit area of the photosensitive layer containing the 0-quinonenoanodo compound as a photosensitive component, preferably in the range of about 0.5 to h/12.

Typical photosensitive components of the negative-type photosensitive layer are diazo compounds, such as diazo resins, which are noazonihum salts and/or condensates of p-diazophenylamine and formaldehyde, as described in Japanese Patent Publication No. 7364/1983. 72/-l salt or fluorocaprate of p-diazophenylamine, 3-methoxyphenylamine-4-diazonifum chloride r and 4-nitrodichloride described in Japanese Patent Publication No. 49-48001. Diazo 84 m consisting of an organic solvent soluble salt of a copolycondensate of 7enylamine and formaldehyde, 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonate of a condensate of p-diazodiphenylamine and formaldehyde, p- Examples include tetrafluoroborate, hexafluorophosphate, and the like, which are condensates of diazophenylamine and formaldehyde. The present invention can be preferably applied at least to negative photosensitive materials containing these as photosensitive components.

In addition to those in which these diazo compounds are used alone, the present invention can also be applied to those in which they are used in combination with various resins in order to improve the physical properties of the photosensitive layer. Examples of such resins include Shelafta, derivatives of polyvinyl alcohol, copolymers having an alcoholic hydroxyl group in the gA chain described in JP-A-50-1]8802, and copolymers having an alcoholic hydroxyl group in the gA chain described in JP-A-55-155355. Examples include copolymers that frequently have phenolic hydroxyl groups.

These resins include copolymers containing at least 50% by weight of structural units represented by the following general formula, general formula R
3 "(CH,-C) COO(CH2CHO) n H (wherein, R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom, a methyl group, an ethyl group, or a chloromethyl group, and n represents 1 to 10 1 to 80 mol% of monomer units having an aromatic hydroxyl group, and 5 to 90 mol% of acrylic ester and/± or methacrylic ester monomer units, and 10 Included are polymeric compounds with acid values of ~200.

Development of the present invention 8! The composition and development method are applicable.
Additives such as dyes, plasticizers, and components imparting printout performance can be added to the photosensitive layer of the type photosensitive material.

The amount per unit area of the photosensitive layer is at least 0.1 to 7
The present invention is applicable to the range of g7z2.

Supports used in the photosensitive material of the present invention include paper, plastics (for example, polyethylene, polypropylene, polystyrene, etc.), laminated paper, aluminum (including aluminum alloys), metal plates such as zinc, copper, etc. Plastic films such as cellulose acetate, cellulose triacetate, cellulose propionate, polyethylene terephthalate, polyethylene, polypropylene, polycarbonate, polyvinyl acecool, etc., paper laminated or vapor-deposited with the above metals, or steel plate plated with chrome. Examples include.

In addition to the development process, the development method using the developer composition of the present invention includes, if necessary, a development stop process (the stop process solution includes a disposable method or a cyclic use method), a non-sensitizing process, Each individual treatment step of the fatification treatment step, a development stop treatment step followed by a desensitization treatment step, a treatment step that combines a development treatment step and a desensitization treatment, or a development stop treatment step and a desensitization treatment step For example, the treatment process described in Japanese Unexamined Patent Application Publication No. 54-8001 may be included.

The developer composition of the present invention is also suitable for developing both square-type and round-type photosensitive lithographic printing plates with the same developer.

〔Example〕

Hereinafter, the present invention will be explained in more detail with reference to specific examples, but the present invention is not limited thereto.

Example 1 A 33 aluminum plate with a thickness of 0.24zz was degreased by immersing it in a 20% sodium phosphate aqueous solution, and then electrolytically polished in a 0.2N hydrochloric acid bath at a current density of 3^/, 2. , anodized in a sulfuric acid bath. At this time, the amount of anodic oxidation is 4g/1
It was 2. Further, the pores were sealed with an aqueous sodium metasilicate solution to prepare an aluminum plate for use in a lithographic printing plate.

The following photosensitive solution 1 was applied onto the aluminum plate using a Whaler and dried at 85° C. for 3 minutes to obtain a photosensitive lithographic printing plate (1).

Photosensitive liquid-1 ・N-(4-hydroxyphenyl) methacrylamide:
7 Acrylonitrile: Ethyl acrylate: Methacrylic acid = 27:33:41: 6 (weight ratio) copolymer (acid value = 80) (High molecular polymer exemplified in JP-A-55-155355) ...S, O,.

・Hexafluorophosphate of paraformaldehyde condensate of p-noazinophenylamine
・・・・・・0.5fI Jurimer A CIOL (1 product name, manufactured by Nippon Pure Chemical Industries, Ltd., acrylic acid polymer) ・・・・・・0.059 ゛Tartaric acid ・・・・・・0.05゜・Victoria Pure Pull-BOH (Product name, manufactured by Hodogaya Chemical Industry Co., Ltd., dye)...
・・0.1g ・Novolac tree tolt (PP-3121) (manufactured by Gunei Chemical Co., Ltd.) ・・・・・・0.15°・Bruronic Shi-64 (product name, Jiryuka Co., Ltd.)!! !, surfactant)...
・・・0.0059 ・Methyl cellosolve ・・・・・・100m1
The thickness of the photosensitive layer of the obtained photosensitive lithographic printing plate (1) was 18
It was xg/d foot 2.

Next, this photosensitive planographic printing plate (1) was heated using a metal halide lamp "Idol Fin 2000" (Iwasaki Electric Co., Ltd. 91).
) for 30 seconds from a distance of 80 cl, and using the following developer composition (1), Sakura PAS 86
0 27℃ using a PS plate automatic developing machine (manufactured by Konishiroku Photo Co., Ltd.)
A 40-second development process was performed to obtain a lithographic printing plate.

Developer composition (1) Sodium silicate (No. 3 solid content 40%)... Bow, 79
・Bionin^-44B (trade name, manufactured by Fractional Oil, solid content of sodium diptylnaphthalene sulfonate 80%)
...2.01・General formula [1]
Exemplary compound (1)...3.02・Sodium sulfite...1.0g・Water
...92.3g development9. Composition(
1) had almost no odor and was favorable in terms of the working environment. Furthermore, the completed plate had no residual film and had excellent developability.

Next, this lithographic printing plate was attached to a Heidelberg GTO type printing machine and printing was performed, resulting in a clean and sharp printed matter.

Example 2 The following photosensitive liquid-2 was applied to the aluminum plate used in Example 1.
was coated and dried in the same manner as in Example 1 to obtain a photosensitive lithographic printing plate (2).

Photosensitive liquid-2 2-hydroxyethyl methacrylate: 7 crylonitrile: methyl methacrylate: methacrylic acid = 3
9:10:36:15 (weight ratio) copolymer (acid value = 9
7) ...5.5g 2-methoxy-4-hydroxy-5-benzoylbenzenesulfone hydrochloric acid of paraformaldehyde condensate of p-diazodiphenylamine...0.6g Tartaric acid ...0.05g
・Oil Blue (trade name, manufactured by Orient Chemical Co., Ltd., dye) ...0.1°・2-
Methoxyethanol: 33 g, methanol: 33 g, ethylene dichloride: 33° The thickness of the photosensitive layer of the obtained photosensitive lithographic printing plate (2) was 19 gg/da''.

Next, this photosensitive lithographic printing plate (2) was subjected to image exposure in the same manner as in Example 1, and developed in the same manner as in Example 1 using the following Development 81 composition (2) to obtain a lithographic printing plate. Obtained.

Developing composition (2) Jetanolamine...1,51
]・Belefus NBL (trade name, manufactured by Kako Atlas, solid content of sodium alkylnaphthalene sulfonate 35%)
...3.02・General formula [1]
Exemplary compound (3)...Og.3-methyl-3-methoxybutamer...3.5g...Sodium sulfite...0.5° water
...90.5° The above developer composition (2) exhibited good developability with the addition of a relatively small amount of organic solvent, and was a developer with low toxicity and low risk. In addition, an exemplary compound of general formula [1] (
The developer composition excluding 3) (comparison (1)) had extremely poor developability and had virtually no developing ability.

Example 3 The square type photosensitive lithographic printing plate used in Example 2 was
The density difference step wedge was used as an original and exposed, and Table 1
Bat development was performed at 30° C. for 20 seconds using a developing solution of 100% to obtain the results shown in Table 2. The development evaluation is based on the development ink spo-1 (
The ink was applied using a printer (manufactured by Konishiroku Photo Industry Co., Ltd.).

The symbols in the odor column of Table 2 are as follows.

◎...There is no odor or almost no odor, and it does not become a nuisance to work with.

O...The odor is slight, but it bothers me as a work supervisor.

Table 2 As is clear from Table 2, the developer of the present invention developed the photosensitive lithographic printing plate well, had a low odor, and had good workability.

Example 4 An aluminum plate with a thickness of 0.24JZ was immersed in a 20% aqueous sodium phosphate solution to degrease it, electrolytically polished in a 0.2N hydrochloric acid bath at a current density of 3^/ x 2, and then polished in a sulfuric acid column. It was anodized inside. At this time, the amount of anodization was 4g7m
It was 2. Further, the pores were sealed with an aqueous solution of IJ (metasilicate) to prepare an aluminum plate for use as a lithographic printing plate.Next, the following photosensitive solution 3 was applied onto this aluminum plate to obtain a photosensitive plate. The printing plate was coated with Photosensitive G, -4 to obtain a positive type photosensitive lithographic printing plate. Coating was performed using a rotary coater and dried at 100° C. for 4 minutes.

The coating film thickness weight was 2.5 g/x2 for both plates.

Photosensitive liquid-3 ・N-(4-hydroxyphenyl) methacryl 7mide:
7 Acrylonitrile: Ethyl acrylate: Methacrylic acid = 27:33:41: 6 (weight ratio) copolymer (acid value 80) ...... 5.0 g p-noazinophenylamine paraformaldehyde Synthetic hexafluorophosphate
・・・・・・0.5g・Julimar A CIOL
(Product name, manufactured by Nippon Pure Chemical Industries, Ltd., acrylic acid polymer) ...0.05°・Tartaric acid ...0.05°・Victoria Pure Blue BO) ((Product name, Togaya Chemical Industry Co., Ltd. 91, dye)...
...0,1°・Novolac resin (PP-3121) (Gunei Chemical Co., Ltd. fJl) ......-0,1
52・Bruronic Shi-64 (Product name, manufactured by Jishuka Co., Ltd., surfactant)...
0.005g ・Methyl cellosolve ・・・・・・100zN
Photosensitive liquid-4 ・S7toquinone-(1,2)-noanod-(2)-5-
Condensate of sulfonic acid chloride and resorcinol-ben-X aldehyde resin...3.5g ・I-cresol-formaldehyde 7-borac resin
M P-707” (manufactured by Gunei Chemical Industry Co., Ltd.)...
・・9g ・S7toquinone-(1,2)-noanod-(2)-4-
Sulfonic acid chloride...0,15-Li Victoria Pure Blue B OH (trade name, manufactured by Hodogaya Chemical Industry Co., Ltd., dye)...
...0.2g Methyl cellosolve ...100g The negative-type and bottom-type photosensitive lithographic printing plates thus obtained were passed through a stamp wedge with a density difference of 0.15 to 2K.
Exposure was performed using a metal halide lamp. Thereafter, development processing was carried out at 25° C. using developer composition (6) in an automatic developing machine.

The pH of the developer should be adjusted to 1 after adding the additives and immediately before use.
0%N a Otl or IN-HCj! So 12,6
Adjusted to 5.

Developer composition (6) Sodium silicate (Japanese Industrial Standard Sodium Silicate No. 3)
250°・Sodium hydroxide
30°・Exemplary compound (1) of general formula [1] 100I?・Perex NB-L (trade name, manufactured by Kako Co., Ltd., anionic surfactant) 1.700g ・Sodium sulfite 2002 ・Emalden^-500 (trade name, manufactured by Kako (Aji), /ionic surfactant) 103 ・Water 101 When the above-mentioned negative-type and bottom-type photosensitive lithographic printing plates were developed indiscriminately using the above developer, both the side plates could be developed well. When the lithographic printing plate obtained by the development treatment was attached to a Heidelberg GTO type printing machine and printing was performed, sharp printed matter without stains was obtained for both the negative type lithographic printing plate and the positive type lithographic printing plate. In addition, there was almost no odor, excellent workability, and no hygiene problems.

Example 5 An undercoat layer coating solution having the following composition was applied onto a polyethylene terephthalate film to prepare a support having a releasable surface.

10 g of Trenone F-30 (Furcol soluble nylon, manufactured by Toshi) 90 g of methanol Next, a colored 0-layer dispersion of four colors with the following composition was prepared, and dried e.g.
! 10g (m:n=4) of a photosensitive resin (average molecular weight 800) with a margin of 6 or less and the following structure applied so that the film thickness was 3μl
:6, average molecular weight 2000) 51?・5g of the following pigments ・Ethyl cellosolve
180g (pigment) Black 2 carbon black #5o (Mitsubishi Kasei gI) Yellow: Chromo7tal yellow 8G 4
The color imaging material was superimposed with a color separation Bow Medano mask of each color and imagewise exposed from a distance of 50 cz using a +-P-f halide lamp.

Next, the above four color image forming materials were developed in a vat at 27° C. for 30 seconds using the following developer composition (7).

Developing composition (7) - Sodium silicate (Japanese Industrial Standard Sodium Silicate No. 3) 60g - Exemplary compound of general formula [1] (7) 20° - Water
When four color films developed at 1000° were sequentially heat-pressed and transferred to transfer paper, a good color image was obtained with clear reproduction from the shadows to the highlights. Furthermore, the developer had no odor and had excellent workability.

〔Effect of the invention〕

The developer composition according to the present invention can satisfactorily develop photosensitive materials containing lipophilic substances, has little odor and is excellent in workability, and also improves safety and health problems.

Procedural amendment January 28, 1986

Claims (2)

[Claims] (1) A developer composition for a photosensitive material, comprising an aqueous solution containing a compound represented by the following general formula [1]. General formula [1] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R_1 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a hydroxyalkyl group, or a halogen atom. , R_2 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 1 to 4 carbon atoms, or a hydroxyalkoxyalkyl group having 1 to 4 carbon atoms, and R_3 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms. group or a hydroxyalkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 to 3. ] (2) A method in which a photosensitive material having a water-insoluble image forming layer on a support is processed with a developer after image exposure to remove non-image areas to obtain an image, in which the developer has the following general formula [ 1
] A method for developing a photosensitive material, characterized by containing a compound represented by the following. General formula [1] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R_1 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a hydroxyalkyl group, or a halogen atom. , R_2 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 1 to 4 carbon atoms, or a hydroxyalkoxyalkyl group having 1 to 4 carbon atoms, and R_3 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms. group or a hydroxyalkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 to 3. ]