JPS63305129A - Polyimide composition - Google Patents
Polyimide compositionInfo
- Publication number
- JPS63305129A JPS63305129A JP14275587A JP14275587A JPS63305129A JP S63305129 A JPS63305129 A JP S63305129A JP 14275587 A JP14275587 A JP 14275587A JP 14275587 A JP14275587 A JP 14275587A JP S63305129 A JPS63305129 A JP S63305129A
- Authority
- JP
- Japan
- Prior art keywords
- diamine
- polyimide
- formulas
- group
- modulus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 32
- 239000004642 Polyimide Substances 0.000 title claims abstract description 27
- 239000000203 mixture Substances 0.000 title claims abstract description 18
- 150000004985 diamines Chemical class 0.000 claims abstract description 18
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 7
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 5
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000002243 precursor Substances 0.000 abstract description 8
- 239000002966 varnish Substances 0.000 abstract description 7
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 abstract 1
- 125000003709 fluoroalkyl group Chemical group 0.000 abstract 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 8
- -1 siloxane diamine Chemical class 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GGAUUQHSCNMCAU-ZXZARUISSA-N (2s,3r)-butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C[C@H](C(O)=O)[C@H](C(O)=O)CC(O)=O GGAUUQHSCNMCAU-ZXZARUISSA-N 0.000 description 1
- LRMDXTVKVHKWEK-UHFFFAOYSA-N 1,2-diaminoanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C(N)C(N)=CC=C3C(=O)C2=C1 LRMDXTVKVHKWEK-UHFFFAOYSA-N 0.000 description 1
- QZWSOANAJGSJJT-UHFFFAOYSA-N 1-[methyl(trimethylsilyloxy)silyl]propane-1,3-diamine Chemical compound C[Si](C)(C)O[SiH](C)C(N)CCN QZWSOANAJGSJJT-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- QHDSBTKCTUXBEG-UHFFFAOYSA-N 2-[2-(2-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC=C1OC1=CC=CC=C1OC1=CC=CC=C1N QHDSBTKCTUXBEG-UHFFFAOYSA-N 0.000 description 1
- UANXVWIYZPLAAD-UHFFFAOYSA-N 3-(2-phenylphenyl)benzene-1,2-diamine Chemical group NC1=CC=CC(C=2C(=CC=CC=2)C=2C=CC=CC=2)=C1N UANXVWIYZPLAAD-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- HYBVISCYJVVEDX-UHFFFAOYSA-N 4-(4-aminophenyl)-3-chloroaniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1Cl HYBVISCYJVVEDX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- ZHDTXTDHBRADLM-UHFFFAOYSA-N hydron;2,3,4,5-tetrahydropyridin-6-amine;chloride Chemical compound Cl.NC1=NCCCC1 ZHDTXTDHBRADLM-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- JGGQWILNAAODRS-UHFFFAOYSA-N n-methyl-4-[4-(methylamino)phenyl]aniline Chemical compound C1=CC(NC)=CC=C1C1=CC=C(NC)C=C1 JGGQWILNAAODRS-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- ZNZJJSYHZBXQSM-UHFFFAOYSA-N propane-2,2-diamine Chemical compound CC(C)(N)N ZNZJJSYHZBXQSM-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はポリイミド組成物に関するものであり、さらに
詳しくは、ヤング率の低いポリイミドを得ることのでき
るポリイミド組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a polyimide composition, and more particularly to a polyimide composition capable of obtaining a polyimide having a low Young's modulus.
[従来の技術]
近年、半導体業界では、半導体素子の集積化が急速に進
んでおり、DRAMの分野では4Mビットレベルの製品
が試作されるに及んでいる。しかし、このような高集積
化に伴ないシリコン基板と樹脂封止剤との線膨張計数の
差に基因する熱応力の問題が大きくなり、パッシベーシ
ョン膜にクラックが入る、アルミ配線が切断されるとい
った事態が生じている。これらの問題点を解決できない
と品質の安定した製品は得られない。そのため、熱応力
を弱めるために低いヤング率で耐熱性を有した樹脂コー
ト剤の開発が望まれているが、従来のポリイミドの場合
、ヤング率は最低でも250kQ/mm2あるというの
が実状である。[Background Art] In recent years, in the semiconductor industry, the integration of semiconductor elements has progressed rapidly, and in the field of DRAM, products of 4 Mbit level are being prototyped. However, with this increase in integration, the problem of thermal stress caused by the difference in linear expansion coefficient between the silicon substrate and the resin encapsulant becomes greater, leading to problems such as cracks in the passivation film and breakage of aluminum wiring. A situation is occurring. Unless these problems are resolved, products with stable quality cannot be obtained. Therefore, it is desired to develop a heat-resistant resin coating agent with a low Young's modulus in order to weaken thermal stress, but in the case of conventional polyimide, the Young's modulus is at least 250 kQ/mm2. .
本発明者等はこのような事情に鑑み、ポリイミドの低ヤ
ング率化対策について鋭意検討の結果、ポリイミド組成
物を特定の構造をもつシロキサンジアミンと芳香族ジア
ミンと酸無水物よりなる配合物で構成した場合には、ヤ
ング率の著しく低く、しかも強伸度特性および耐湿接着
性等の優れたポリイミドが得られることを知見し、本発
明に到達したものである。In view of these circumstances, the inventors of the present invention have conducted extensive studies on measures to reduce the Young's modulus of polyimide, and have developed a polyimide composition composed of a combination of siloxane diamine with a specific structure, aromatic diamine, and acid anhydride. The inventors have discovered that, in this case, a polyimide having a significantly low Young's modulus and excellent strength and elongation properties and moisture-resistant adhesive properties can be obtained, and the present invention has been achieved based on this finding.
[発明が解決しようとする問題点]
したがって、本発明の目的は低いヤング率で、かつ強度
、伸度および耐湿接着性に優れたポリイミドを得ること
のできるポリイミド組成物を提供することにある。[Problems to be Solved by the Invention] Therefore, an object of the present invention is to provide a polyimide composition that has a low Young's modulus and is excellent in strength, elongation, and moisture-resistant adhesive properties.
[問題点を解決するための手段]
かかる本発明の目的は、次式(I)、(II>および(
II[>で表わされるジアミン成分を、モル比で、
(I)+(II)+ (I[I) 1000 10
0(I) 95 5
となるように配合した配合物と、ピロメリット酸二無水
物とを反応させて得られるポリイミド組成物により達成
される。[Means for Solving the Problems] The object of the present invention is to solve the following formulas (I), (II> and (
The molar ratio of the diamine component represented by II[> is (I)+(II)+(I[I) 1000 10
This is achieved by a polyimide composition obtained by reacting a compound blended to give 0(I) 95 5 and pyromellitic dianhydride.
(n)
(式中、Xは一〇−または−5−1Yは一〇−1−S−
1−SO−1−502−1−CO−1−CH2−1−C
F2−1−COD、2−1のアルキレン基、フッ素化ア
ルキレン基またはフェニレン基、R′は炭素数1〜10
のアルキル基、フッ素化アルキル基またはフェニル基、
nは3〜20の整数である。)
本発明で使用されるジアミン成分は、上述の式(I)、
(I[)および(I[I)で表わされる構造を有してお
り、Xは一〇−または−S−から選ばれる。Yは一〇−
1−S−1−8O−1−502−1−CO−1−CH2
−1−CF2−1−C(42好ましくは一〇−1−8−
または一〇F2−であるが、これに限定されない。Rは
炭素r111〜20のアルキレン基、フッ素化アルキレ
ン基またはフェニレン基を表わし、より好ましくはメチ
レン基、プロピレン基、ヘキサフルオロプロピレン基お
よびフェニレン基である。R′は炭素数1〜10のアル
キル基、フッ素化アルキル基またはフェニル基を表わし
、より好ましくはメチル基、トリフルオロメチル基およ
びフェニル基である。nは3〜20の整数であり、より
好ましくは8〜14の整数である。(n) (wherein, X is 10- or -5-1Y is 10-1-S-
1-SO-1-502-1-CO-1-CH2-1-C
F2-1-COD, 2-1 alkylene group, fluorinated alkylene group or phenylene group, R' has 1 to 10 carbon atoms
an alkyl group, a fluorinated alkyl group or a phenyl group,
n is an integer from 3 to 20. ) The diamine component used in the present invention has the above formula (I),
It has a structure represented by (I[) and (I[I), where X is selected from 10- or -S-. Y is 10-
1-S-1-8O-1-502-1-CO-1-CH2
-1-CF2-1-C (42 preferably 10-1-8-
or 10F2-, but is not limited thereto. R represents an alkylene group, a fluorinated alkylene group, or a phenylene group having carbon r111 to r20, and more preferably a methylene group, a propylene group, a hexafluoropropylene group, and a phenylene group. R' represents an alkyl group having 1 to 10 carbon atoms, a fluorinated alkyl group, or a phenyl group, more preferably a methyl group, a trifluoromethyl group, or a phenyl group. n is an integer of 3 to 20, more preferably an integer of 8 to 14.
本発明におけるポリイミド組成物は、上述の3種のジア
ミン成分を、モル比で、
(I>+ (If)+ (I[[) 1000
100(I) 95 5
となるように配合し、この配合物とピロメリット酸二無
水物とを反応させることにより得られるものである。The polyimide composition in the present invention contains the three types of diamine components described above in a molar ratio of (I>+ (If) + (I[[) 1000
100(I) 95 5 and is obtained by reacting this blend with pyromellitic dianhydride.
ここで、(In>/((I)+ (II)+ (III
) )が5/1000より少なくなるとヤング率の低い
ものが得られず、10/100より多くなると透明なも
のが得られなくなり、実用性を失う。また(n)/(1
)が9515より多くなると、ワニスが不安定となりゲ
ル化しやすくなるため実用性を失う。より好ましくは、
(I)+(n)+(III) 1000 100(
n) 20 80
の範囲である。Here, (In>/((I)+ (II)+ (III
) When ) is less than 5/1000, a product with a low Young's modulus cannot be obtained, and when it is more than 10/100, a transparent product cannot be obtained and practicality is lost. Also (n)/(1
) is more than 9515, the varnish becomes unstable and tends to gel, thus losing its practicality. More preferably, (I) + (n) + (III) 1000 100 (
n) in the range of 20 80 .
本発明のポリイミド組成物は、ヤング率に影響を与えな
い範囲で、他のジアミンやテトラカルボン酸で変性させ
ることができる。このようなジアミンの例としては、フ
ェニレンジアミン、トルエンジアミン、3.3′−ジア
ミノジフェニルスルホン、ベンチジン、3.4”−ジア
ミノジフェニルメタン、ジメチルベンチジン、クロルベ
ンチジン、ジアミノターフェニル、ビス(アミノフェノ
キシ)ベンゼン、ジアミノアントラキノンのような芳香
族ジアミン、エチレンジアミン、ジアミノプロパン、ヘ
キサメチレンジアミン、ヘプタメチレンジアミンのよう
な脂肪族ジアミンが挙げられる。またテトラカルボン酸
の例としては、ベンゾフェノンテトラカルボン酸、ビフ
ェニルテトラカルボン酸、ジフェニルエーテルテトラカ
ルボン酸のような芳香族テトラカルボン酸、ブタンテト
ラカルボン酸、シクロペンタンテトラカルボン酸のよう
な脂肪族テトラカルボン酸が挙げられる。The polyimide composition of the present invention can be modified with other diamines or tetracarboxylic acids as long as the Young's modulus is not affected. Examples of such diamines include phenylene diamine, toluenediamine, 3,3'-diaminodiphenylsulfone, benzizine, 3,4''-diaminodiphenylmethane, dimethylbenzidine, chlorbenzidine, diaminoterphenyl, bis(aminophenoxy ) benzene, aromatic diamines such as diaminoanthraquinone, aliphatic diamines such as ethylenediamine, diaminopropane, hexamethylenediamine, heptamethylenediamine. Examples of tetracarboxylic acids include benzophenonetetracarboxylic acid, biphenyltetra Examples include carboxylic acids, aromatic tetracarboxylic acids such as diphenyl ether tetracarboxylic acid, and aliphatic tetracarboxylic acids such as butanetetracarboxylic acid and cyclopentanetetracarboxylic acid.
ざらに接着性を改良するために、1,3−ビス(3−ア
ミノプロピル)テトラメチルジシロキサンのようなシロ
キサンジアミンを全アミン母の1〜6モル%配合させ、
変性させることもできる。In order to improve the adhesive properties, siloxane diamine such as 1,3-bis(3-aminopropyl)tetramethyldisiloxane is blended in an amount of 1 to 6 mol% based on the total amine base.
It can also be denatured.
次に本発明のポリイミド組成物の製造方法の一例につい
て説明する。すなわち、溶媒中に3種のジアミン(I)
、(II)および(III)をモル比で、(I>+ (
II)十(III) 1000 100(II)
5 95(I) 95
5
となるように配合し、これに全ジアミン量に対して好ま
しくは90〜110モル%、より好ましくは等モルのピ
ロメリット酸二無水物とを、−20℃〜100℃で反応
させることにより、本発明のポリイミド前駆体のワニス
を得ることができる。Next, an example of a method for manufacturing the polyimide composition of the present invention will be explained. That is, three types of diamine (I) in the solvent
, (II) and (III) in molar ratio, (I>+ (
II) Ten (III) 1000 100 (II)
5 95(I) 95
5, and react this with preferably 90 to 110 mol%, more preferably equimolar pyromellitic dianhydride based on the total amount of diamine at -20°C to 100°C. , a varnish of the polyimide precursor of the present invention can be obtained.
上記製造方法で用いる溶媒としては、ポリマーの溶解性
の点から極性溶媒を使用するのが好ましく、特に非プロ
トン性極性溶媒が好適である。非プロトン性極性溶媒と
しては、N−メチル−2−ピロリドン、N、N−ジメチ
ルホルムアミド、N。As the solvent used in the above production method, it is preferable to use a polar solvent from the viewpoint of solubility of the polymer, and an aprotic polar solvent is particularly preferable. Examples of the aprotic polar solvent include N-methyl-2-pyrrolidone, N,N-dimethylformamide, and N.
N−ジメチルアセトアミド、ヘキサメチルホスホロトリ
アミド、ジメチルスルホキシド、γ−ブチロラクトン、
スルホランなどが好ましく用いられる。N-dimethylacetamide, hexamethylphosphorotriamide, dimethyl sulfoxide, γ-butyrolactone,
Sulfolane and the like are preferably used.
また上述の極性溶媒にトルエン、キシレンなどの芳香族
炭化水素を混合して用いてもよい。Further, an aromatic hydrocarbon such as toluene or xylene may be mixed with the above-mentioned polar solvent.
次に、以上のようにして得たポリイミド前駆体のりニス
を適当な支持体上に塗布し、50〜100℃で乾燥し、
ポリイミド前駆体のフィルムを得る。Next, the polyimide precursor glue varnish obtained as described above is applied onto a suitable support and dried at 50 to 100°C.
A film of polyimide precursor is obtained.
このようにして得たポリイミド前駆体のフィルムを化学
的あるいは熱的に処理して脱水閉環することによりポリ
イミド製フィルムが得られる。A polyimide film can be obtained by chemically or thermally treating the film of the polyimide precursor thus obtained to cause dehydration and ring closure.
化学的に処理する場合は、ポリイミド前駆体のフィルム
を、無水酢酸とピリジンの混合溶液に浸漬処理すること
により、ポリイミドフィルムを得る。また熱的に処理す
る場合は、ポリイミド前駆体のフィルムを室温から45
0℃の範囲で数段階の温度を選び段階的に昇温するか、
ある温度範囲を選び連続的に昇温しながら、5分〜5時
間実施するのがよい。例えば、130℃、200℃、3
00℃、400℃各々30分づつ熱処理するか、または
室温から400℃まで2時間かけて直線的に昇温しても
よい。In the case of chemical treatment, a polyimide film is obtained by immersing a polyimide precursor film in a mixed solution of acetic anhydride and pyridine. In addition, in the case of thermal treatment, the film of polyimide precursor is
Select several temperatures within the 0°C range and increase the temperature in stages, or
It is preferable to select a certain temperature range and carry out the process for 5 minutes to 5 hours while continuously increasing the temperature. For example, 130℃, 200℃, 3
The heat treatment may be performed at 00°C and 400°C for 30 minutes each, or the temperature may be increased linearly from room temperature to 400°C over 2 hours.
(特性の測定方法)
■ ヤング率
本発明のヤング率の測定方法は、JIS−Z1702に
基づき、試料幅10mm、試験長5Qmmの試験片を東
洋ボールドウィン社製テンシロンで20mm/分の引張
速度で測定した。(Method of Measuring Properties) ■Young's Modulus The method of measuring Young's modulus of the present invention is based on JIS-Z1702, and a test piece with a sample width of 10 mm and a test length of 5 Q mm is measured at a tensile speed of 20 mm/min using a Tensilon manufactured by Toyo Baldwin. did.
また同時に強度と伸度を算出した。At the same time, strength and elongation were calculated.
■ 耐湿接着性
シリコンウェハー上に形成したポリイミド膜に、カッタ
ーで2mm間隔の切れ目を縦横6本づつ形成して25個
の基盤目を作る。これを120℃、2.0気圧の飽和水
蒸気下、所定の時間湿熱処理を行なう。この試料にセロ
ハン粘着テープ、 にチバン(株)製)を貼りつけ、
JIS D0202表13.1に記載の方法に準じて
引き剥す。■ Moisture-resistant adhesive In the polyimide film formed on the silicon wafer, use a cutter to make 6 cuts vertically and horizontally at 2 mm intervals to create 25 base holes. This is subjected to moist heat treatment at 120° C. under saturated steam at 2.0 atm for a predetermined period of time. Attach cellophane adhesive tape (manufactured by Chiban Co., Ltd.) to this sample,
Peel off according to the method described in JIS D0202 Table 13.1.
[実施例] 以下本発明を実施例に基づいて具体的に説明する。[Example] The present invention will be specifically described below based on examples.
実施例1〜3、比較実施例1〜3
温度計、攪拌装置、窒素導入口を有する四つロフラスコ
に表1に記載の酸無水物とジアミンを入れ、N−メチル
−2−ピロリドン(以下NMPという)とキシレンが重
量比で6:4になる混合溶媒中で固形分が20%になる
ように反応を行なった。反応は最初の30分は水浴中で
、その後室温で約5時間行ない、表1に示す組成のポリ
イミド前駆体のワニスを得た。また反応終了後、粘度が
著しく上昇した場合、適宜NMPで希釈した。Examples 1 to 3, Comparative Examples 1 to 3 Acid anhydrides and diamines listed in Table 1 were placed in a four-bottle flask equipped with a thermometer, a stirrer, and a nitrogen inlet, and N-methyl-2-pyrrolidone (hereinafter NMP) was added. The reaction was carried out in a mixed solvent of 6:4 (weight ratio) and xylene so that the solid content was 20%. The reaction was carried out in a water bath for the first 30 minutes and then at room temperature for about 5 hours to obtain polyimide precursor varnishes having the compositions shown in Table 1. Further, if the viscosity increased significantly after the reaction was completed, it was diluted with NMP as appropriate.
得られたワニスをシリコンウェハー上にスピナーを用い
てイミド化1変の厚さが20μ±2μとなるように塗布
した。これを80℃、200 ’C1300℃、350
℃で各々30分づつ熱処理でポリイミドのフィルムを得
、ヤング率の測定を行なった。The obtained varnish was applied onto a silicon wafer using a spinner so that the thickness of imidization was 20μ±2μ. 80℃, 200'C1300℃, 350
Polyimide films were obtained by heat treatment at ℃ for 30 minutes each, and Young's modulus was measured.
表1から明らかなごとく、本発明を満足するポリイミド
組成物からなるフィルムの場合は、ヤング率が低い上、
耐湿接着性および強伸度特性が良好であることがわかる
。これに対して、ジアミン成分(III)を含まない比
較例1,2のポリイミド組成物からなるフィルムの場合
、ヤング率の低下はみられない上、耐湿接着性が著しく
劣るという欠点があり、またジアミン成分(n)を含ま
ない比較例3の場合は、フィルムの失透が著しく、実用
性のないものしか得られない。As is clear from Table 1, the film made of the polyimide composition that satisfies the present invention has a low Young's modulus and
It can be seen that the moisture resistant adhesion and strength and elongation properties are good. On the other hand, in the case of the films made of the polyimide compositions of Comparative Examples 1 and 2 that do not contain the diamine component (III), there is no decrease in Young's modulus, and there is a drawback that the moisture-resistant adhesiveness is significantly inferior. In the case of Comparative Example 3, which does not contain the diamine component (n), the devitrification of the film is significant and the film is impractical.
実施例4
実施例1と同様な四ツロフラスコに、4,4−−ビスア
ミノフェノキシジフェニル52.5g、4.4−−ジア
ミノジフェニルエーテル66.6Q、1.3−ビスアミ
ノプロピルテトラメチルジシロキサン4.970と、(
■)で表わされるR=+CH2号、R−= −CH3で
あり、アミ2価が620のシリコンジアミン6.29を
ピロメリット酸二無水物109.’IQとN−メチル−
2−ピロリドンとキシレンが重量比で6/4である溶媒
中(固形分濃度16%)で反応を行なった。Example 4 In a four-piece flask similar to Example 1, 52.5 g of 4,4-bisaminophenoxydiphenyl, 66.6Q of 4,4-diaminodiphenyl ether, and 4.0 g of 1,3-bisaminopropyltetramethyldisiloxane were added. 970 and (
(2) where R = +CH2, R- = -CH3, and silicone diamine with an amide valence of 620, 6.29, is converted into pyromellitic dianhydride, 109. 'IQ and N-methyl-
The reaction was carried out in a solvent containing 2-pyrrolidone and xylene in a weight ratio of 6/4 (solid content concentration 16%).
反応は最初の30分は水浴中で、その後室温で約5時間
行なった。The reaction was carried out in a water bath for the first 30 minutes and then at room temperature for about 5 hours.
1qられたワニスをシリコンウェハー上にスピナーを用
いてイミド化後の厚さが20μ±2μとなるように塗布
した。これを80℃、200℃、300℃、350℃で
各々30分づつ熱処理してポリイミドのフィルムを得、
ヤング率の測定を行なった。1q of the varnish was applied onto a silicon wafer using a spinner so that the thickness after imidization was 20μ±2μ. This was heat-treated at 80°C, 200°C, 300°C, and 350°C for 30 minutes each to obtain a polyimide film.
Young's modulus was measured.
このフィルムは、ヤング率160kg/mm2、耐湿接
着性250時間、強度12kg/mm2゜伸度30%と
良好な特性を示した。This film exhibited good properties such as a Young's modulus of 160 kg/mm 2 , a moisture resistant adhesion of 250 hours, a strength of 12 kg/mm 2 , and an elongation of 30%.
[発明の効果]
本発明のポリイミド組成物は、上述のごとく3種の特定
のジアミンで構成したので、低ヤング率にして耐湿接着
性、強度、伸度に優れた高機能なポリイミドを得ること
ができたものである。[Effects of the Invention] Since the polyimide composition of the present invention is composed of the three specific diamines as described above, it is possible to obtain a highly functional polyimide with a low Young's modulus and excellent moisture-resistant adhesion, strength, and elongation. This is what was created.
Claims (1)
ン成分を、モル比で (III)/{( I )+(II)+(III)}=5/100
0〜10/100(II)/( I )=5/95〜95/
5 となるように配合した配合物と、ピロメリット酸二無水
物とを反応させて得られるポリイミド組成物。 ▲数式、化学式、表等があります▼( I ) ▲数式、化学式、表等があります▼(II) ▲数式、化学式、表等があります▼(III) (式中、Xは−O−または−S−、Yは−O−、−S−
、−SO−、−SO_2−、−CO−、−CH_2−、
−CF_2−、−CCl_2−、▲数式、化学式、表等
があります▼または▲数式、化学式、表等があります▼
、Rは炭素数1〜20 のアルキレン基、フッ素化アルキレン基またはフェニレ
ン基、R′は炭素数1〜10のアルキル基、フッ素化ア
ルキル基またはフェニル基、nは3〜20の整数である
。)[Claims] Diamine components represented by the following formulas (I), (II) and (III) are combined in a molar ratio of (III)/{(I)+(II)+(III)}=5/100.
0~10/100(II)/(I)=5/95~95/
5. A polyimide composition obtained by reacting a compound blended as follows with pyromellitic dianhydride. ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(III) (In the formula, X is -O- or - S-, Y is -O-, -S-
, -SO-, -SO_2-, -CO-, -CH_2-,
-CF_2-, -CCl_2-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼or▲There are mathematical formulas, chemical formulas, tables, etc.▼
, R is an alkylene group having 1 to 20 carbon atoms, a fluorinated alkylene group or a phenylene group, R' is an alkyl group having 1 to 10 carbon atoms, a fluorinated alkyl group or a phenyl group, and n is an integer of 3 to 20. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14275587A JP2621180B2 (en) | 1987-06-08 | 1987-06-08 | Polyimide composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14275587A JP2621180B2 (en) | 1987-06-08 | 1987-06-08 | Polyimide composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63305129A true JPS63305129A (en) | 1988-12-13 |
JP2621180B2 JP2621180B2 (en) | 1997-06-18 |
Family
ID=15322822
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14275587A Expired - Fee Related JP2621180B2 (en) | 1987-06-08 | 1987-06-08 | Polyimide composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2621180B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02208321A (en) * | 1989-02-07 | 1990-08-17 | Toray Ind Inc | Polyimide for lsi mounting packaging substrate |
-
1987
- 1987-06-08 JP JP14275587A patent/JP2621180B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02208321A (en) * | 1989-02-07 | 1990-08-17 | Toray Ind Inc | Polyimide for lsi mounting packaging substrate |
Also Published As
Publication number | Publication date |
---|---|
JP2621180B2 (en) | 1997-06-18 |
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