JPS63303746A - Optical marking device - Google Patents

Optical marking device

Info

Publication number
JPS63303746A
JPS63303746A JP62139580A JP13958087A JPS63303746A JP S63303746 A JPS63303746 A JP S63303746A JP 62139580 A JP62139580 A JP 62139580A JP 13958087 A JP13958087 A JP 13958087A JP S63303746 A JPS63303746 A JP S63303746A
Authority
JP
Japan
Prior art keywords
mask
laser
pattern
cross
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62139580A
Other languages
Japanese (ja)
Inventor
Hideo Hara
秀雄 原
Shinichiro Kawamura
信一郎 河村
Hiroyuki Kondo
洋行 近藤
Kensho Tokuda
憲昭 徳田
Hitoshi Takeuchi
仁 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62139580A priority Critical patent/JPS63303746A/en
Publication of JPS63303746A publication Critical patent/JPS63303746A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce risks to an operator caused by scattering of laser beam significantly and prevent a mask from being thermally deformed by inserting it in an optical resonator. CONSTITUTION:A laser device 1 is composed of two optical resonators 1a, 1b and a laser medium 1c, and a mask 2 with a marking pattern formed previously is inserted between a total reflector 1a and the laser medium 1c. Consequently, when laser beam is oscillated, it has a beam cross-section gain distribution corresponding to the mask pattern. Therefore, the cross-section intensity distribution of a laser flux 6 emitted from an output mirror 1b revisualizes a mask pattern. In this way, not only the pattern portion of the mask is not subjected to strong laser beam projection, but also no laser beams are scattered by the pattern occurs. An optical system for image projection 3 is capable of any one of functions such as reduction, no magnification and enlargement of light flux cross-section profile.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光マーキング装置に関するものである。[Detailed description of the invention] [Industrial application field] The present invention relates to an optical marking device.

〔従来の技術〕[Conventional technology]

光マーキング装置は、文字、数字、記号等の有意符号(
以下、所定パターンという)を対象物品に付与するのに
使用されるもので、強力なレーザー光を照射することに
よって対象物品の表面層又は対象物品自体(Fiい場合
)を焼尽し、それにより所定パターンを対象物品に刻印
する。この場合、レーザー光を照射しながら所定パター
ンを描くように移動させる描画方式と、所定パターンの
光束断面を有するレーザー光を単に照射するだけの投影
方式の2通りがある。
Optical marking devices are used to mark significant symbols such as letters, numbers, and symbols.
This is used to apply a predetermined pattern (hereinafter referred to as a predetermined pattern) to a target article.By irradiating a powerful laser beam, the surface layer of the target article or the target article itself (in the case of a defect) is burnt out, thereby creating a predetermined pattern. Stamp the pattern onto the target item. In this case, there are two methods: a drawing method in which the object is moved so as to draw a predetermined pattern while irradiating the laser beam, and a projection method in which the laser beam having a beam cross section of a predetermined pattern is simply irradiated.

対象物品としては、例えば完成した半導体チップや製造
途中のそれ、あるいは半導体基板上に形成されたレジス
ト膜、その他の小さな物品例えば歯科用インブラントな
どが挙げられる。光マーキング装置は微小な所定パター
ンを刻印するときに特に宵月である。
Target articles include, for example, completed semiconductor chips, semiconductor chips in the process of being manufactured, resist films formed on semiconductor substrates, and other small articles such as dental implants. Optical marking devices are particularly useful when marking minute predetermined patterns.

投影方式の光マーキング装置の構造について説明すると
、従来、この種の装置(例えばCO8レーザーマーカー
)は、第3図に示すように、レーザー装置(1)からの
レーザー光をマスク(2)に照射し、この透過光による
マスク(2)のマスクパターンを投影光学系(3)で対
象物品例えばICチップ(4)上に投影(結像)し焼き
付ける。
To explain the structure of a projection type optical marking device, conventionally, this type of device (for example, a CO8 laser marker) irradiates a mask (2) with laser light from a laser device (1), as shown in Fig. 3. Then, the mask pattern of the mask (2) created by this transmitted light is projected (imaged) and printed onto a target article, such as an IC chip (4), using a projection optical system (3).

投影光学系(3)は、マスクパターンと同一の断面形状
を拡大、縮小、その他の修正を施して所定パターンの断
面形状を有する光束とするほか、光束を曲げて所望の照
射位置に持ってくるもので、必須のものではない。
The projection optical system (3) enlarges, reduces, or otherwise modifies the same cross-sectional shape as the mask pattern to produce a light beam having a cross-sectional shape of a predetermined pattern, and also bends the light beam to bring it to a desired irradiation position. It's a thing, but it's not required.

〔発明が解決しようとする間脛点〕[The problem that the invention attempts to solve]

従って、レーザー光のうちマスク(2)を透過しない部
分は、マスク(2)自身に吸収されたり周辺に散乱され
たりして、マスク(2)の温度上昇による損傷や、作業
者に対する安全確保という面から好ましくない影響を与
えるという欠点があった。
Therefore, the part of the laser beam that does not pass through the mask (2) is absorbed by the mask (2) itself or scattered around the mask (2), causing damage to the mask (2) due to temperature rise and safety for workers. The disadvantage was that it had an unfavorable effect on the surface.

本発明は、これらの欠点を解決し、マスク上で不要なレ
ーザー光の吸収や散乱が起きない構成のマーキング装置
を得ることを目的とする。
It is an object of the present invention to solve these drawbacks and provide a marking device having a configuration in which unnecessary absorption or scattering of laser light does not occur on the mask.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、マーキング光源であるレーザー装置の光共振
器内にマスクを挿入することによって、マスクパターン
と同一又は修正された形状をもつレーザー光束を発振さ
せることを技術的要点としている。
The technical point of the present invention is to oscillate a laser beam having the same or modified shape as the mask pattern by inserting a mask into the optical resonator of a laser device that is a marking light source.

〔実施例1〕 (])第1図に本発明の実施例の基本構成を示す。[Example 1] (]) FIG. 1 shows the basic configuration of an embodiment of the present invention.

本装置は大別して(1)レーザー装置、マスク(2)、
(3)結像投影光学系から成る。
This device is roughly divided into (1) laser device, mask (2),
(3) Consists of an image projection optical system.

(2)本実施例におけるレーザー装置はC08レーザー
とYAGレーザーを想定したが、エキシマレーザ−等地
の種類のレーザーでもかまわない。
(2) Although the laser device in this embodiment is assumed to be a C08 laser and a YAG laser, other types of lasers such as an excimer laser may also be used.

(3)  レーザー装置(1)は、2枚の光共振器(1
a)、(1b)とその間に配置されたレーザー媒質(1
c)とからなる。
(3) The laser device (1) consists of two optical resonators (1
a), (1b) and the laser medium (1
c).

(4)本実施例では光共振器(1a)、(1b)のうち
全反射鏡(la)とレーザー媒質(1c)との間にマス
ク(2)を挿入しである。マスク(2)には予めマーキ
ング・パターンが形成されている。
(4) In this embodiment, a mask (2) is inserted between the total reflection mirror (la) of the optical resonators (1a) and (1b) and the laser medium (1c). A marking pattern is previously formed on the mask (2).

(5)シたがって、レーザー光が発振する際、マスクパ
ターンに対応したビーム断面利得分布を持つため、出力
a (1b)から射出されるレーザー光束(6)の断面
強度分布はマスク・パターンを再現することになる。
(5) Therefore, when the laser beam oscillates, it has a beam cross-sectional gain distribution that corresponds to the mask pattern, so the cross-sectional intensity distribution of the laser beam (6) emitted from the output a (1b) corresponds to the mask pattern. Will be reproducing it.

(6)  このような構成であるから、マスクのパター
ン部が強いレーザー光で照射されることなく、またパタ
ーンによるレーザー光の散乱もなく、長時間にわたり安
定で安全なマーキング露光が可能である。
(6) With this configuration, the patterned portion of the mask is not irradiated with strong laser light, and the laser light is not scattered by the pattern, making it possible to perform stable and safe marking exposure over a long period of time.

(7)第1図の結像投影光学系(3)は、光束断面形状
の縮小・等倍・拡大のいづれでもよい、場合によっては
、なくてもよい。
(7) The image forming projection optical system (3) in FIG. 1 may be used to reduce, equal magnify, or enlarge the cross-sectional shape of the light beam, and may be omitted depending on the case.

〔実施例2〕 第2の実施例を第2図に示す1本実施例では第1の実施
例におけるレーザー媒質(IC)とマスク(2)の間に
ビームエクスパングー(7)を挿入し、拡大されたレー
ザー光束がマスク(2)を通り全反射鏡(1a)で反射
される配置になっている。これによりマスクパターンを
縮小してマーキングを行なう際に縮小結像投影光学系を
省くことができるという利点がある。
[Example 2] A second example is shown in FIG. 2. In this example, a beam expander (7) is inserted between the laser medium (IC) and the mask (2) in the first example. , the expanded laser beam passes through a mask (2) and is reflected by a total reflection mirror (1a). This has the advantage that a reduction image projection optical system can be omitted when marking is performed by reducing the mask pattern.

(発明の効果) 以上のように、本発明によれば、レーザー装置中にマス
クを挿入することによって、マスクパターンに相応した
光束断面形状を持つレーザー光束を射出するので、■マ
スクがレーザー光を吸収して熱変形や損傷を受けたり、
■マスクによるレーザー光の散乱のため周囲の作業者へ
の危険が増大するという欠点が著しく低減される。さら
に、第2図に示した実施例2では結像投影光学系が不要
なので、レーザー光による光学系の損傷を気にすること
なく、1ショット当りのレーザーエネルギーを大きくす
ることができ、スループット(生産性)が向上するとい
う利点もある。
(Effects of the Invention) As described above, according to the present invention, by inserting a mask into a laser device, a laser beam having a beam cross-sectional shape corresponding to the mask pattern is emitted. absorb and suffer thermal deformation or damage,
■The drawback of increased danger to surrounding workers due to scattering of laser light by the mask is significantly reduced. Furthermore, since the second embodiment shown in FIG. 2 does not require an image projection optical system, the laser energy per shot can be increased without worrying about damage to the optical system due to laser light, and the throughput ( It also has the advantage of improving productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による装置の実施例1の構成を説明する
概念図である。 第2図は、同じ〈実施例2の構成を説明する概念図であ
る。 第3図は従来例のマーキング装置の構成を説明する概念
図である。 (主要部分の符号の説明) lc・・・レーザー媒質 2・・・・・・マスク 3・・・・・・結像投影光学系 4・・・・・・マーキングされる対象物品5・・・・・
・対称物品の搬送台 6・・・・・・レーザー光
FIG. 1 is a conceptual diagram illustrating the configuration of a first embodiment of the apparatus according to the present invention. FIG. 2 is a conceptual diagram illustrating the configuration of the same Example 2. FIG. 3 is a conceptual diagram illustrating the configuration of a conventional marking device. (Explanation of symbols of main parts) lc... Laser medium 2... Mask 3... Imaging projection optical system 4... Target article to be marked 5...・・・
・Transportation platform 6 for symmetrical items... Laser light

Claims (1)

【特許請求の範囲】[Claims] レーザー装置とマスクとからなり、マスクパターンと同
一又は修正された断面形状を有するレーザー光束を出力
する光マーキング装置に於いて、前記マスクを前記レー
ザー装置の光共振器内に配置したことを特徴とする光マ
ーキング装置。
An optical marking device comprising a laser device and a mask and outputting a laser beam having a cross-sectional shape that is the same as or modified from a mask pattern, characterized in that the mask is disposed within an optical resonator of the laser device. optical marking device.
JP62139580A 1987-06-03 1987-06-03 Optical marking device Pending JPS63303746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62139580A JPS63303746A (en) 1987-06-03 1987-06-03 Optical marking device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62139580A JPS63303746A (en) 1987-06-03 1987-06-03 Optical marking device

Publications (1)

Publication Number Publication Date
JPS63303746A true JPS63303746A (en) 1988-12-12

Family

ID=15248569

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62139580A Pending JPS63303746A (en) 1987-06-03 1987-06-03 Optical marking device

Country Status (1)

Country Link
JP (1) JPS63303746A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2147799A1 (en) * 2008-07-21 2010-01-27 Gemplus Securing of a printed image using a laser beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2147799A1 (en) * 2008-07-21 2010-01-27 Gemplus Securing of a printed image using a laser beam
WO2010010073A1 (en) * 2008-07-21 2010-01-28 Gemalto Sa Securing a printed image using a laser beam

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