JPS63291063A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS63291063A JPS63291063A JP12756287A JP12756287A JPS63291063A JP S63291063 A JPS63291063 A JP S63291063A JP 12756287 A JP12756287 A JP 12756287A JP 12756287 A JP12756287 A JP 12756287A JP S63291063 A JPS63291063 A JP S63291063A
- Authority
- JP
- Japan
- Prior art keywords
- type
- photoreceptor
- weight
- parts
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 47
- 239000011241 protective layer Substances 0.000 claims abstract description 36
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 27
- 239000006096 absorbing agent Substances 0.000 claims abstract description 24
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims abstract description 23
- 239000012964 benzotriazole Substances 0.000 claims abstract description 7
- 108091008695 photoreceptors Proteins 0.000 claims description 72
- 229920005989 resin Polymers 0.000 claims description 36
- 239000011347 resin Substances 0.000 claims description 36
- 239000011230 binding agent Substances 0.000 claims description 21
- 230000000694 effects Effects 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 69
- 238000005299 abrasion Methods 0.000 abstract description 15
- 230000006866 deterioration Effects 0.000 abstract description 14
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 abstract description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 abstract description 6
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 abstract description 6
- 150000001412 amines Chemical class 0.000 abstract description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 abstract description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract description 4
- 239000012965 benzophenone Substances 0.000 abstract description 4
- 150000002815 nickel Chemical class 0.000 abstract description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract description 3
- 230000036211 photosensitivity Effects 0.000 abstract description 3
- 239000011593 sulfur Substances 0.000 abstract description 3
- 229910052717 sulfur Inorganic materials 0.000 abstract description 3
- 230000002542 deteriorative effect Effects 0.000 abstract description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract 1
- 239000000463 material Substances 0.000 description 29
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 26
- 230000032258 transport Effects 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 17
- 239000000758 substrate Substances 0.000 description 14
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 13
- -1 fluorenone Chemical class 0.000 description 12
- 239000000049 pigment Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 6
- 239000002356 single layer Substances 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000002530 phenolic antioxidant Substances 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 3
- MJFOVRMNLQNDDS-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-dimethylphenol Chemical compound CC1=CC(C)=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MJFOVRMNLQNDDS-UHFFFAOYSA-N 0.000 description 2
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- ZQBAKBUEJOMQEX-UHFFFAOYSA-N phenyl salicylate Chemical compound OC1=CC=CC=C1C(=O)OC1=CC=CC=C1 ZQBAKBUEJOMQEX-UHFFFAOYSA-N 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229920002382 photo conductive polymer Polymers 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920001230 polyarylate Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- 150000003673 urethanes Chemical class 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- POLSVAXEEHDBMJ-UHFFFAOYSA-N (2-hydroxy-4-octadecoxyphenyl)-phenylmethanone Chemical compound OC1=CC(OCCCCCCCCCCCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 POLSVAXEEHDBMJ-UHFFFAOYSA-N 0.000 description 1
- JYFJHKRWGLEWKH-UHFFFAOYSA-N (4-chloro-2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 JYFJHKRWGLEWKH-UHFFFAOYSA-N 0.000 description 1
- VNFXPOAMRORRJJ-UHFFFAOYSA-N (4-octylphenyl) 2-hydroxybenzoate Chemical compound C1=CC(CCCCCCCC)=CC=C1OC(=O)C1=CC=CC=C1O VNFXPOAMRORRJJ-UHFFFAOYSA-N 0.000 description 1
- UONCERAQKBPLML-UHFFFAOYSA-N (6-ethoxypyridin-3-yl)boronic acid Chemical compound CCOC1=CC=C(B(O)O)C=N1 UONCERAQKBPLML-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- KLXCURAAWYXTPC-UHFFFAOYSA-N 1-n,4-n-diheptylbenzene-1,4-diamine Chemical compound CCCCCCCNC1=CC=C(NCCCCCCC)C=C1 KLXCURAAWYXTPC-UHFFFAOYSA-N 0.000 description 1
- ZRMMVODKVLXCBB-UHFFFAOYSA-N 1-n-cyclohexyl-4-n-phenylbenzene-1,4-diamine Chemical compound C1CCCCC1NC(C=C1)=CC=C1NC1=CC=CC=C1 ZRMMVODKVLXCBB-UHFFFAOYSA-N 0.000 description 1
- ZNRLMGFXSPUZNR-UHFFFAOYSA-N 2,2,4-trimethyl-1h-quinoline Chemical compound C1=CC=C2C(C)=CC(C)(C)NC2=C1 ZNRLMGFXSPUZNR-UHFFFAOYSA-N 0.000 description 1
- BYLSIPUARIZAHZ-UHFFFAOYSA-N 2,4,6-tris(1-phenylethyl)phenol Chemical compound C=1C(C(C)C=2C=CC=CC=2)=C(O)C(C(C)C=2C=CC=CC=2)=CC=1C(C)C1=CC=CC=C1 BYLSIPUARIZAHZ-UHFFFAOYSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- JLZIIHMTTRXXIN-UHFFFAOYSA-N 2-(2-hydroxy-4-methoxybenzoyl)benzoic acid Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1C(O)=O JLZIIHMTTRXXIN-UHFFFAOYSA-N 0.000 description 1
- VPAWGOVZZOBYMR-UHFFFAOYSA-N 2-(5-chlorobenzotriazol-2-yl)-4,6-dimethylphenol Chemical compound CC1=CC(C)=C(O)C(N2N=C3C=C(Cl)C=CC3=N2)=C1 VPAWGOVZZOBYMR-UHFFFAOYSA-N 0.000 description 1
- SGHJOQOVLLGIGF-UHFFFAOYSA-N 2-(5-chlorobenzotriazol-2-yl)-4-methylphenol Chemical compound CC1=CC=C(O)C(N2N=C3C=C(Cl)C=CC3=N2)=C1 SGHJOQOVLLGIGF-UHFFFAOYSA-N 0.000 description 1
- QUTMXPGFNSDHRT-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-hexyl-6-methylphenol Chemical compound CCCCCCC1=CC(C)=C(O)C(N2N=C3C=CC=CC3=N2)=C1 QUTMXPGFNSDHRT-UHFFFAOYSA-N 0.000 description 1
- SYFIBOFYDHBYCD-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-pentylphenol Chemical compound CCCCCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 SYFIBOFYDHBYCD-UHFFFAOYSA-N 0.000 description 1
- WXHVQMGINBSVAY-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 WXHVQMGINBSVAY-UHFFFAOYSA-N 0.000 description 1
- ITLDHFORLZTRJI-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1N1N=C2C=CC=CC2=N1 ITLDHFORLZTRJI-UHFFFAOYSA-N 0.000 description 1
- AQROEYPMNFCJCK-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-6-tert-butyl-4-methylphenol Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=CC=CC3=N2)=C1O AQROEYPMNFCJCK-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- FLCWJWNCSHIREG-UHFFFAOYSA-N 2-(diethylamino)benzaldehyde Chemical compound CCN(CC)C1=CC=CC=C1C=O FLCWJWNCSHIREG-UHFFFAOYSA-N 0.000 description 1
- WGRSVHBSCVGKDP-UHFFFAOYSA-N 2-ethyl-9h-carbazole-1-carbaldehyde Chemical compound C1=CC=C2C3=CC=C(CC)C(C=O)=C3NC2=C1 WGRSVHBSCVGKDP-UHFFFAOYSA-N 0.000 description 1
- JFJWVJAVVIQZRT-UHFFFAOYSA-N 2-phenyl-1,3-dihydropyrazole Chemical class C1C=CNN1C1=CC=CC=C1 JFJWVJAVVIQZRT-UHFFFAOYSA-N 0.000 description 1
- SDJUKATYFRSDAS-UHFFFAOYSA-N 2-tert-butyl-3-methylphenol Chemical compound CC1=CC=CC(O)=C1C(C)(C)C SDJUKATYFRSDAS-UHFFFAOYSA-N 0.000 description 1
- LZHCVNIARUXHAL-UHFFFAOYSA-N 2-tert-butyl-4-ethylphenol Chemical compound CCC1=CC=C(O)C(C(C)(C)C)=C1 LZHCVNIARUXHAL-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- GEKJEMDSKURVLI-UHFFFAOYSA-N 3,4-dibromofuran-2,5-dione Chemical compound BrC1=C(Br)C(=O)OC1=O GEKJEMDSKURVLI-UHFFFAOYSA-N 0.000 description 1
- CLQYLLIGYDFCGY-UHFFFAOYSA-N 4-(2-anthracen-9-ylethenyl)-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C=CC1=C(C=CC=C2)C2=CC2=CC=CC=C12 CLQYLLIGYDFCGY-UHFFFAOYSA-N 0.000 description 1
- 239000005201 4-Octylphenyl Salicylate Substances 0.000 description 1
- FAPXNOXKLZJBMT-UHFFFAOYSA-N 4-[5-[4-(dimethylamino)phenyl]-1,3,4-oxadiazol-2-yl]-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NN=C(C=2C=CC(=CC=2)N(C)C)O1 FAPXNOXKLZJBMT-UHFFFAOYSA-N 0.000 description 1
- VSAWBBYYMBQKIK-UHFFFAOYSA-N 4-[[3,5-bis[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-2,4,6-trimethylphenyl]methyl]-2,6-ditert-butylphenol Chemical compound CC1=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C1CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 VSAWBBYYMBQKIK-UHFFFAOYSA-N 0.000 description 1
- IFKWPWYIIJBRDO-UHFFFAOYSA-N 4-n,4-n-bis(5-methylheptan-3-yl)benzene-1,4-diamine Chemical compound CCC(C)CC(CC)N(C(CC)CC(C)CC)C1=CC=C(N)C=C1 IFKWPWYIIJBRDO-UHFFFAOYSA-N 0.000 description 1
- KCSOBOZCMQBPFM-UHFFFAOYSA-N 4-n,4-n-dinaphthalen-2-ylbenzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1N(C=1C=C2C=CC=CC2=CC=1)C1=CC=C(C=CC=C2)C2=C1 KCSOBOZCMQBPFM-UHFFFAOYSA-N 0.000 description 1
- UXKQNCDDHDBAPD-UHFFFAOYSA-N 4-n,4-n-diphenylbenzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 UXKQNCDDHDBAPD-UHFFFAOYSA-N 0.000 description 1
- KZTCAXCBXSIQSS-UHFFFAOYSA-N 4-n-(4-methylpentan-2-yl)-4-n-phenylbenzene-1,4-diamine Chemical compound C=1C=C(N)C=CC=1N(C(C)CC(C)C)C1=CC=CC=C1 KZTCAXCBXSIQSS-UHFFFAOYSA-N 0.000 description 1
- DGAYRAKNNZQVEY-UHFFFAOYSA-N 4-n-butan-2-yl-4-n-phenylbenzene-1,4-diamine Chemical compound C=1C=C(N)C=CC=1N(C(C)CC)C1=CC=CC=C1 DGAYRAKNNZQVEY-UHFFFAOYSA-N 0.000 description 1
- DBOSBRHMHBENLP-UHFFFAOYSA-N 4-tert-Butylphenyl Salicylate Chemical compound C1=CC(C(C)(C)C)=CC=C1OC(=O)C1=CC=CC=C1O DBOSBRHMHBENLP-UHFFFAOYSA-N 0.000 description 1
- ISAVYTVYFVQUDY-UHFFFAOYSA-N 4-tert-Octylphenol Chemical compound CC(C)(C)CC(C)(C)C1=CC=C(O)C=C1 ISAVYTVYFVQUDY-UHFFFAOYSA-N 0.000 description 1
- SHHMQFZBTGZVTK-UHFFFAOYSA-N 4-tert-butyl-2-(5-chlorobenzotriazol-2-yl)-6-methylphenol Chemical compound CC1=CC(C(C)(C)C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O SHHMQFZBTGZVTK-UHFFFAOYSA-N 0.000 description 1
- UWSMKYBKUPAEJQ-UHFFFAOYSA-N 5-Chloro-2-(3,5-di-tert-butyl-2-hydroxyphenyl)-2H-benzotriazole Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O UWSMKYBKUPAEJQ-UHFFFAOYSA-N 0.000 description 1
- DOFLWDGGNKBGSL-UHFFFAOYSA-N 6-dodecyl-2,2,4-trimethyl-1h-quinoline Chemical compound N1C(C)(C)C=C(C)C2=CC(CCCCCCCCCCCC)=CC=C21 DOFLWDGGNKBGSL-UHFFFAOYSA-N 0.000 description 1
- ADRNSOYXKABLGT-UHFFFAOYSA-N 8-methylnonyl diphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OCCCCCCCC(C)C)OC1=CC=CC=C1 ADRNSOYXKABLGT-UHFFFAOYSA-N 0.000 description 1
- XYPMAZCBFKBIFK-UHFFFAOYSA-N 9,10-dinitroanthracene Chemical compound C1=CC=C2C([N+](=O)[O-])=C(C=CC=C3)C3=C([N+]([O-])=O)C2=C1 XYPMAZCBFKBIFK-UHFFFAOYSA-N 0.000 description 1
- PLAZXGNBGZYJSA-UHFFFAOYSA-N 9-ethylcarbazole Chemical compound C1=CC=C2N(CC)C3=CC=CC=C3C2=C1 PLAZXGNBGZYJSA-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- GHKOFFNLGXMVNJ-UHFFFAOYSA-N Didodecyl thiobispropanoate Chemical compound CCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC GHKOFFNLGXMVNJ-UHFFFAOYSA-N 0.000 description 1
- 239000003508 Dilauryl thiodipropionate Substances 0.000 description 1
- 239000002656 Distearyl thiodipropionate Substances 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- MSBUSYVAJTYZMD-UHFFFAOYSA-N N',N'-bis(2-hydroxyphenyl)oxamide Chemical compound C=1C=CC=C(O)C=1N(C(=O)C(=O)N)C1=CC=CC=C1O MSBUSYVAJTYZMD-UHFFFAOYSA-N 0.000 description 1
- XQVWYOYUZDUNRW-UHFFFAOYSA-N N-Phenyl-1-naphthylamine Chemical compound C=1C=CC2=CC=CC=C2C=1NC1=CC=CC=C1 XQVWYOYUZDUNRW-UHFFFAOYSA-N 0.000 description 1
- KEQFTVQCIQJIQW-UHFFFAOYSA-N N-Phenyl-2-naphthylamine Chemical compound C=1C=C2C=CC=CC2=CC=1NC1=CC=CC=C1 KEQFTVQCIQJIQW-UHFFFAOYSA-N 0.000 description 1
- OUBMGJOQLXMSNT-UHFFFAOYSA-N N-isopropyl-N'-phenyl-p-phenylenediamine Chemical compound C1=CC(NC(C)C)=CC=C1NC1=CC=CC=C1 OUBMGJOQLXMSNT-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CKWCKXWWDKQHBD-UHFFFAOYSA-N OC1=C(C=C(C=C1)CCCCCC)N1N=C2C(=N1)C=CC=C2 Chemical compound OC1=C(C=C(C=C1)CCCCCC)N1N=C2C(=N1)C=CC=C2 CKWCKXWWDKQHBD-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 239000004419 Panlite Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 125000004054 acenaphthylenyl group Chemical group C1(=CC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- HXGDTGSAIMULJN-UHFFFAOYSA-N acetnaphthylene Natural products C1=CC(C=C2)=C3C2=CC=CC3=C1 HXGDTGSAIMULJN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- PGEHNUUBUQTUJB-UHFFFAOYSA-N anthanthrone Chemical compound C1=CC=C2C(=O)C3=CC=C4C=CC=C5C(=O)C6=CC=C1C2=C6C3=C54 PGEHNUUBUQTUJB-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- OCWYEMOEOGEQAN-UHFFFAOYSA-N bumetrizole Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O OCWYEMOEOGEQAN-UHFFFAOYSA-N 0.000 description 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 150000001716 carbazoles Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 235000019304 dilauryl thiodipropionate Nutrition 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 1
- 235000019305 distearyl thiodipropionate Nutrition 0.000 description 1
- RRZCFXQTVDJDGF-UHFFFAOYSA-N dodecyl 3-(3-octadecoxy-3-oxopropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC RRZCFXQTVDJDGF-UHFFFAOYSA-N 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 150000008376 fluorenones Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 150000002545 isoxazoles Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- PADPKJACPLYMPK-UHFFFAOYSA-N n',n'-diphenylethane-1,2-diamine Chemical compound C=1C=CC=CC=1N(CCN)C1=CC=CC=C1 PADPKJACPLYMPK-UHFFFAOYSA-N 0.000 description 1
- UWNXTLKLPYIBSO-UHFFFAOYSA-L nickel(2+);propan-2-yloxymethanedithioate Chemical compound [Ni+2].CC(C)OC([S-])=S.CC(C)OC([S-])=S UWNXTLKLPYIBSO-UHFFFAOYSA-L 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- FMJSMJQBSVNSBF-UHFFFAOYSA-N octocrylene Chemical compound C=1C=CC=CC=1C(=C(C#N)C(=O)OCC(CC)CCCC)C1=CC=CC=C1 FMJSMJQBSVNSBF-UHFFFAOYSA-N 0.000 description 1
- GMMWKYSAFBYKHU-UHFFFAOYSA-N octylsulfanylbenzene Chemical compound CCCCCCCCSC1=CC=CC=C1 GMMWKYSAFBYKHU-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229960000969 phenyl salicylate Drugs 0.000 description 1
- RYSBYLUYRUYPNW-UHFFFAOYSA-N phenyl-(2-propoxyphenyl)methanone Chemical compound CCCOC1=CC=CC=C1C(=O)C1=CC=CC=C1 RYSBYLUYRUYPNW-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- GDESWOTWNNGOMW-UHFFFAOYSA-N resorcinol monobenzoate Chemical compound OC1=CC=CC(OC(=O)C=2C=CC=CC=2)=C1 GDESWOTWNNGOMW-UHFFFAOYSA-N 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 150000004867 thiadiazoles Chemical class 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- MGMXGCZJYUCMGY-UHFFFAOYSA-N tris(4-nonylphenyl) phosphite Chemical compound C1=CC(CCCCCCCCC)=CC=C1OP(OC=1C=CC(CCCCCCCCC)=CC=1)OC1=CC=C(CCCCCCCCC)C=C1 MGMXGCZJYUCMGY-UHFFFAOYSA-N 0.000 description 1
- QEDNBHNWMHJNAB-UHFFFAOYSA-N tris(8-methylnonyl) phosphite Chemical compound CC(C)CCCCCCCOP(OCCCCCCCC(C)C)OCCCCCCCC(C)C QEDNBHNWMHJNAB-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、電子写真感光体に関し、より詳しくは、有機
感光体として有用な電子写真感光体に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to an electrophotographic photoreceptor, and more particularly to an electrophotographic photoreceptor useful as an organic photoreceptor.
〈従来の技術〉
近年、電子写真用感光体として、加工性がよく製造コス
トの面で有利であると共に、機能設計の自由度が大きな
有機感光体が知られている。この有機感光体は、通常、
導電性基板上に、感光層が形成されており、上記感光層
としては、光照射により電荷を発生する電荷発生材料と
、発生した電荷を輸送する電荷輸送材料とを含有する単
層型のものや、電荷発生材料を含有する電荷発生層と、
電荷輸送材料を含有する電荷輸洋層とにより、各機能を
分離した複層型の有機感光体が知られている。また、上
記有機感光体の耐摩耗性等を高めるため、通常、感光層
の表面には保護層が形成されている。<Prior Art> In recent years, organic photoreceptors have been known as photoreceptors for electrophotography, which have good processability and are advantageous in terms of manufacturing cost, and also have a large degree of freedom in functional design. This organophotoreceptor is usually
A photosensitive layer is formed on a conductive substrate, and the photosensitive layer is a single-layer type containing a charge-generating material that generates charges when irradiated with light and a charge-transporting material that transports the generated charges. and a charge generation layer containing a charge generation material;
Multilayer organic photoreceptors are known in which each function is separated by a charge transport layer containing a charge transport material. Further, in order to improve the abrasion resistance of the organic photoreceptor, a protective layer is usually formed on the surface of the photosensitive layer.
一方、上記感光層は、一般に光劣化し易い電荷輸送材料
等を含有しているため、帯電時のコロナ放電により発生
する活性なオゾン等や、露光工程およびメインテナンス
時等の光、特に紫外線等の短波長光の照射により、電子
写真感光体が早期に劣、化してしまい、感光体の感度お
よび表面電位が低下す、る一方、残留電位が大きくなり
、画像濃度が低下したり、カブリが増加する等の問題が
生じる。On the other hand, since the photosensitive layer generally contains a charge transporting material etc. that is easily photodegraded, it is exposed to active ozone, etc. generated by corona discharge during charging, and light, especially ultraviolet rays, during the exposure process and maintenance. Irradiation with short wavelength light causes early deterioration and deterioration of the electrophotographic photoreceptor, reducing the sensitivity and surface potential of the photoreceptor, while increasing the residual potential, reducing image density and increasing fog. Problems such as
上記の問題を解決するため、上記保護層に酸化防止剤を
添加した感光体(特開昭59−138744号公報)や
、紫外線吸収剤を添加した感光体(特開昭58−160
957号公報)が知られている。In order to solve the above-mentioned problems, a photoreceptor with an antioxidant added to the protective layer (Japanese Unexamined Patent Publication No. 59-138744) and a photoreceptor with an ultraviolet absorber added (Japanese Unexamined Patent Publication No. 58-160) were developed.
No. 957) is known.
〈発明が解決しようとする問題点〉
しかしながら、上記従来の感光体は、未だ安定性等が十
分でない。すなわち、酸化防止剤を添加した感光体によ
れば、添加量が少量であると感光層の劣化を防止するこ
とができないだけでなく、添加量を多くすると、感光層
との界面で電荷発生材料や電荷輸送材料等の感光物質と
相互作用して保護層中の酸化防止剤がキャリアのトラッ
プとなったりするため、初期感度が低下したり、繰返し
使用により感光体の残留電位が大きくなるという問題が
ある。一方、紫外線吸収剤を含有する感光体によれば、
例えば、50重量%以上という多量の紫外線吸収剤を添
加しなければ、感光層の劣化を防止できないだけでなく
、紫外線吸収剤の添加量を多くすると、耐摩耗性が低下
し、保護層としての役割を果さなくなる。従って、上記
従来の感光体にあっては、少量の添加量で感光体の劣化
を防止し、感光体の感光特性および電気的特性と耐摩耗
性等とを同時に満足させることができず、感光特性およ
び電気的特性を長期に亘り安定に維持させることが困難
であるという問題がある。<Problems to be Solved by the Invention> However, the conventional photoreceptor described above still does not have sufficient stability. In other words, with a photoreceptor containing an antioxidant, if the amount added is small, it will not only be impossible to prevent deterioration of the photosensitive layer, but if the amount added is too large, the charge-generating material will form at the interface with the photosensitive layer. The antioxidant in the protective layer acts as a carrier trap by interacting with photosensitive materials such as photosensitive materials and charge transport materials, resulting in lower initial sensitivity and increased residual potential in the photoreceptor due to repeated use. There is. On the other hand, according to a photoreceptor containing an ultraviolet absorber,
For example, unless a large amount of ultraviolet absorber (50% by weight or more) is added, it is not only impossible to prevent the photosensitive layer from deteriorating, but if the amount of ultraviolet absorber added is too large, the abrasion resistance decreases, making it difficult to use as a protective layer. ceases to fulfill its role. Therefore, in the above-mentioned conventional photoreceptors, it is not possible to prevent deterioration of the photoreceptor with a small amount of addition, and to simultaneously satisfy the photosensitive characteristics, electrical characteristics, and abrasion resistance of the photoreceptor. There is a problem in that it is difficult to maintain stable characteristics and electrical characteristics over a long period of time.
〈発明の目的〉
本発明は上記問題点に鑑みてなされたものであり、耐摩
耗性等を低下させることなく、少量の添加量で感光層の
劣化を防止し、光照射や繰返し使用しても安定した感光
特性、電気的特性を示す電子写真感光体を提供すること
を目的とする。<Object of the Invention> The present invention has been made in view of the above-mentioned problems, and it prevents deterioration of the photosensitive layer with a small amount of addition without reducing wear resistance etc. Another object of the present invention is to provide an electrophotographic photoreceptor exhibiting stable photosensitive characteristics and electrical characteristics.
く問題点を解決するための手段および作用〉上記目的を
達成するため、本発明の電子写真感光体は、表面に保護
層を有する有機感光体において、保護層が、紫外線吸収
剤および酸化防止剤を含有することを特徴とするもので
ある。Means and Effects for Solving the Problems In order to achieve the above objects, the electrophotographic photoreceptor of the present invention is an organic photoreceptor having a protective layer on the surface, wherein the protective layer contains an ultraviolet absorber and an antioxidant. It is characterized by containing.
上記構成の電子写真感光体によれば、保護層が、紫外線
吸収剤および酸化防止剤を含有しているので、少ない添
加量で、感光体の劣化を防止でき、感光層の耐摩耗性を
低下させることなく、長期に亘り感光体を安定化させる
ことができる。According to the electrophotographic photoreceptor having the above structure, since the protective layer contains an ultraviolet absorber and an antioxidant, deterioration of the photoreceptor can be prevented with a small amount of addition, and the abrasion resistance of the photoreceptor layer is reduced. The photoreceptor can be stabilized for a long period of time without causing any damage.
以下に本発明の詳細な説明する。The present invention will be explained in detail below.
本発明は、表面に保護層を有する種々のタイプの感光体
に適用することができ、該感光体としては、例えば、第
1図に示すように、単層型の感光層を有する感光体、す
なわち、導電性基板(1)上に、電荷輸送材料と電荷発
生材料と結着樹脂等とを含有する感光層(4)と、保護
層(5)とが順次形成されたものや、第2図に示される
ように、複層型の感光層を有する感光体、すなわち、導
電性基板(11)上に、電荷輸送材料と結着樹脂等とを
含有する電荷輸送層(12)と電荷発生材料を含有する
電荷発生層(13)とからなる感光層(14)と、保護
層(15)とが順次形成されたもの、あるいは上記電荷
発生層と電荷輸送層とが逆の順序に積層された感光層を
有する感光体等が例示される。The present invention can be applied to various types of photoreceptors having a protective layer on the surface, such as a photoreceptor having a single-layer type photoreceptor layer as shown in FIG. That is, a photosensitive layer (4) containing a charge transporting material, a charge generating material, a binder resin, etc. and a protective layer (5) are sequentially formed on a conductive substrate (1), or a second layer is formed on a conductive substrate (1). As shown in the figure, a photoconductor having a multilayer photoconductor layer, that is, a conductive substrate (11), a charge transport layer (12) containing a charge transport material, a binder resin, etc., and a charge generating layer A photosensitive layer (14) consisting of a charge generation layer (13) containing a material and a protective layer (15) are formed in sequence, or the charge generation layer and charge transport layer are laminated in the reverse order. Examples include photoreceptors having a photosensitive layer.
上記導電性基板(1)(11)としては、シート状やド
ラム状のいずれであってもよく、基板自体が導電性を有
するか、基板の表面が導電性を有し、使用に際し十分な
機械的強度を有するものが好ましい。The above-mentioned conductive substrates (1) and (11) may be in the form of a sheet or a drum, and either the substrate itself is conductive or the surface of the substrate is conductive, and a sufficient mechanical It is preferable that the material has a strong target strength.
上記導電性基板としては、導電性を有する種々の材料が
使用でき、例えば、アルミニ7ム、アルミニウム合金、
銅、錫、白金、金、銀、バナジウム、モリブデン、クロ
ム、カドミウム、チタン、ニッケル、パラジウム、イン
ジウム、ステンレス鋼、真鍮の金属単体や、蒸着等の手
段による上記金属、酸化インジウム、酸化錫等の層が形
成されたプラスチック材料およびガラス等が例示される
。As the conductive substrate, various conductive materials can be used, such as aluminum 7m, aluminum alloy,
Single metals such as copper, tin, platinum, gold, silver, vanadium, molybdenum, chromium, cadmium, titanium, nickel, palladium, indium, stainless steel, and brass, as well as the above metals, indium oxide, tin oxide, etc., by means such as vapor deposition. Examples include layered plastic materials and glass.
上記感光層(4H14)の電荷発生材料としては、例え
ば、セレン、セレン−テルル、アモルファスシリコン、
ピリリウム塩、アゾ系顔料、ジスアゾ系顔料、トリスア
ゾ系顔料、アンサンスロン系顔料、フタロシアニン系顔
料、インジゴ系顔料、トリフェニルメタン系顔料、スレ
ン系顔料、トルイジン系顔料、ピラゾリン系顔料、ペリ
レン系顔料、キナクリドン系顔料等が例示される。Examples of the charge generating material for the photosensitive layer (4H14) include selenium, selenium-tellurium, amorphous silicon,
Pyrylium salts, azo pigments, disazo pigments, trisazo pigments, anthanthrone pigments, phthalocyanine pigments, indigo pigments, triphenylmethane pigments, threne pigments, toluidine pigments, pyrazoline pigments, perylene pigments, Examples include quinacridone pigments.
また、上記電荷輸送材料としては、例えば、クロラニル
、テトラシアノエチレン、2,4,7−ドリニトロー9
−フルオレノン等のフルオレノン系化合物、2.4.8
−)リニトロチオキサントン、ジニトロアントラセン等
のニトロ化化合物、N、N−ジエチルアミノベンズアル
デヒド N。In addition, examples of the charge transporting material include chloranil, tetracyanoethylene, 2,4,7-dolinitro 9
- Fluorenone compounds such as fluorenone, 2.4.8
-) Nitrated compounds such as linitrothioxanthone and dinitroanthracene, N,N-diethylaminobenzaldehyde N.
N−ジフェニルヒドラゾン、N−メチル−3−カルバゾ
リルアルデヒド N、N−ジフェニルヒドラゾン等のヒ
ドラゾン系化合物、2,5−ジ(4−ジメチルアミノフ
ェニル)−1,3,4−オキサジアゾール等のオキサジ
アゾール系化合物、9−(4−ジエチルアミノスチリル
)アントラセン等のスチリル系化合物、N−エチルカル
バゾール等のカルバゾール系化合物、1−フェニル−3
−(4−ジメチルアミノフェニル)ピラゾリン等のピラ
ゾリン系化合物、2− (4−ジエチルアミノフェニル
)−4−(4−ジメチルアミノフェニル)−5−(2−
クロロフェニル)オキサゾール等のオキサゾール系化合
物、イソオキサゾール系化合物、2−(4−ジエチルア
ミノスチリル)−6−ジニチルアミノベンゾチアゾール
等のチアゾール系化合物、チアジアゾール系化合物、イ
ミダゾール系化合物、ピラゾール系化合物、インドール
系化合物、トリアゾール系化合物等の含窒素環式化合物
、縮合多環族化合物、無水コハク酸、無水マレイン酸、
ジブロモ無水マレイン酸、ポリ−N−ビニルカルバゾー
ル、ポリビニルピレン、ポリビニルアントラセン、エチ
ルカルバゾール−ホルムアルデヒド樹脂等が例示される
。Hydrazone compounds such as N-diphenylhydrazone, N-methyl-3-carbazolylaldehyde N,N-diphenylhydrazone, 2,5-di(4-dimethylaminophenyl)-1,3,4-oxadiazole, etc. oxadiazole compounds, styryl compounds such as 9-(4-diethylaminostyryl)anthracene, carbazole compounds such as N-ethylcarbazole, 1-phenyl-3
Pyrazoline compounds such as -(4-dimethylaminophenyl)pyrazoline, 2-(4-diethylaminophenyl)-4-(4-dimethylaminophenyl)-5-(2-
Oxazole compounds such as chlorophenyl)oxazole, isoxazole compounds, thiazole compounds such as 2-(4-diethylaminostyryl)-6-dinithylaminobenzothiazole, thiadiazole compounds, imidazole compounds, pyrazole compounds, indole compounds compounds, nitrogen-containing cyclic compounds such as triazole compounds, fused polycyclic compounds, succinic anhydride, maleic anhydride,
Examples include dibromomaleic anhydride, poly-N-vinylcarbazole, polyvinylpyrene, polyvinylanthracene, and ethylcarbazole-formaldehyde resin.
なお、本発明は、上記電荷輸送材料のうち、電荷輸送性
に優れるものの、光照射等により劣化し、感光特性等が
低下し易い電荷輸送材料、特に、光照射等により異性化
や三量化等が生じ易い上記ヒドラゾン系化合物を含有す
る感光層を有する感光体に適用する上で特に有用である
。Among the charge transport materials mentioned above, the present invention is directed to charge transport materials that are excellent in charge transport properties but tend to deteriorate due to light irradiation, etc., and whose photosensitivity properties etc. tend to deteriorate, particularly those that undergo isomerization, trimerization, etc. due to light irradiation, etc. It is particularly useful when applied to a photoreceptor having a photosensitive layer containing the above-mentioned hydrazone compound, which is likely to cause .
また、上記結着樹脂としては、種々のもの、例えば、ス
チレン系重合体、スチレン−ブタジェン共重合体、スチ
レン−アクリロニトリル共重合体、スチレン−マレイン
酸共重合体、アクリル系重合体、スチレン−アクリル系
共重合体、エチレン−酢酸ビニル共重合体、ポリ塩化ビ
ニル、塩化ビニル−酢酸ビニル共重合体、ポリエステル
、アルキッド樹脂、ポリアミド、ポリウレタン、エポキ
シ樹脂、ポリカーボネート、ボリアリレート、ポリスル
ホン、ジアリルフタレート樹脂、シリコーン3、 樹
脂、ケトン樹脂、ポリビニルブチラール樹脂、ポリエー
テル樹脂、フェノール樹脂や、エポキシアクリレート、
ウレタンアクリレート等の光硬化型樹脂等、各種の重合
体が例示される。なお、前記ポリ−N−ビニルカルバゾ
ール等の光導電性ポリマーも結着樹脂として使用できる
。In addition, various binder resins can be used, such as styrene polymers, styrene-butadiene copolymers, styrene-acrylonitrile copolymers, styrene-maleic acid copolymers, acrylic polymers, and styrene-acrylic copolymers. system copolymer, ethylene-vinyl acetate copolymer, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyester, alkyd resin, polyamide, polyurethane, epoxy resin, polycarbonate, polyarylate, polysulfone, diallyl phthalate resin, silicone 3. Resin, ketone resin, polyvinyl butyral resin, polyether resin, phenol resin, epoxy acrylate,
Examples include various polymers such as photocurable resins such as urethane acrylate. Note that photoconductive polymers such as the poly-N-vinylcarbazole can also be used as the binder resin.
なお、上記単層型の感光層(4)を有する感光体におけ
る電荷発生材料と電荷輸送材料と上記結着樹脂との使用
割合は、所望する有機感光体の特性等に応じて適宜選択
することができるが、結着樹脂100重量部に対して、
電荷発生材料2〜20重量部、好ましくは5〜10重量
部、電荷輸送材料25〜150重量部、好ましくは50
〜100重量部使用される。電荷発生材料および電荷輸
送材料が上記使用量よりも少ないと、感光体の感度が十
分でないばかりか、残留電位が大きくなる。また上記範
囲を越えると感光体の表面電位が低下する。また、単層
型の感光層(4)は、適宜の厚みを有していてもよいが
、3〜50μm1特に5〜25μmの厚みを有するもの
が好ましい。The ratio of the charge generating material, the charge transporting material, and the binder resin in the photoreceptor having the single-layer photoreceptor layer (4) may be appropriately selected depending on the desired characteristics of the organic photoreceptor. However, for 100 parts by weight of binder resin,
2 to 20 parts by weight of charge generating material, preferably 5 to 10 parts by weight, 25 to 150 parts by weight of charge transporting material, preferably 50 parts by weight.
~100 parts by weight are used. If the amount of charge generating material and charge transporting material used is less than the above-mentioned amount, not only the sensitivity of the photoreceptor will not be sufficient, but also the residual potential will become large. Moreover, when the above range is exceeded, the surface potential of the photoreceptor decreases. Further, the single-layer type photosensitive layer (4) may have an appropriate thickness, but preferably has a thickness of 3 to 50 μm, particularly 5 to 25 μm.
また、前記複層型の感光層(14)における電荷輸送層
(12)を形成する場合、電荷輸送層材料と結着樹脂と
の割合は適宜設定することができるが、電荷輸送材料1
00重量部に対して、結着樹脂25〜500重量部、特
に、100〜300重量部使用するのが好ましい。結着
樹脂が30重量部未満であると電荷輸送層の機械的強度
等が低下し、500重量部を越えると電荷輸送能が十分
でない。Further, when forming the charge transport layer (12) in the multilayer photosensitive layer (14), the ratio of the charge transport layer material and the binder resin can be set as appropriate;
It is preferable to use 25 to 500 parts by weight, particularly 100 to 300 parts by weight, of the binder resin per 00 parts by weight. If the amount of the binder resin is less than 30 parts by weight, the mechanical strength etc. of the charge transport layer will decrease, and if it exceeds 500 parts by weight, the charge transport ability will not be sufficient.
上記電荷輸送層(12)は、適宜の厚みを有していても
よいが、2〜100μm1特に5〜30μm程度の厚み
を有するものが好ましい。なお、上記電荷輸送層(12
)の結着樹脂としては、前記光導電性ポリマーも使用し
得る。The charge transport layer (12) may have an appropriate thickness, but preferably has a thickness of about 2 to 100 μm, particularly about 5 to 30 μm. Note that the charge transport layer (12
) The photoconductive polymers described above can also be used as the binder resin.
また、複層型の感光層(14)における電荷発生層(1
3)は、前記結着樹脂等を用いて形成してもよく、結着
樹脂を用いることなく導電性基板(11)に前記電荷発
生材料を蒸着、スパッタリング等することにより形成し
てもよい。結着樹脂等を用いて電荷発生層(13)を形
成する場合、電荷発生層(13)は、前記電荷発生材料
100重量部に対して結着樹脂1〜300重量部、特に
5〜150重量部使用するのが好ましい。結着樹脂等が
1重量部未満であると感光層の導電性基板(11)に対
する密着性が低下する等の問題があり、300重量部を
越えると電荷発生能が小さくなる。上記電荷発生層(1
3)は、適宜の厚みを有していてもよいが、0.01〜
5μ0、特に0.1〜3μ■程度の厚みを有するものが
好ましい。In addition, the charge generation layer (1) in the multilayer photosensitive layer (14)
3) may be formed using the binder resin or the like, or may be formed by vapor depositing, sputtering, etc. the charge generating material on the conductive substrate (11) without using the binder resin. When the charge generation layer (13) is formed using a binder resin or the like, the charge generation layer (13) contains 1 to 300 parts by weight, particularly 5 to 150 parts by weight of the binder resin based on 100 parts by weight of the charge generation material. It is preferable to use 10%. If the amount of the binder resin or the like is less than 1 part by weight, there will be problems such as a decrease in the adhesion of the photosensitive layer to the conductive substrate (11), and if it exceeds 300 parts by weight, the charge generation ability will be reduced. The charge generation layer (1
3) may have an appropriate thickness, but from 0.01 to
It is preferable to have a thickness of about 5μ0, especially about 0.1 to 3μ.
なお、前記電荷発生層(13)を蒸着等の手段で形成す
る場合を除き、上記単層型の感光層(4)や複層型の感
光層(15)における電荷輸送層(12)等は、前記電
荷輸送材料等と有機溶媒とからなる分散液を導電性基板
(1)(11)上に塗布し、溶剤を除去することにより
形成できる。また、上記分散液は、従来慣用の方法、例
えば、ボールミル、ペイントシェーカー、サンドミル、
アトライター、超音波分散器等を用いて調製することが
でき、得られた分散液の塗布に際しては、種々のコーテ
ィング手段を採用することができる。Note that, except when the charge generation layer (13) is formed by means such as vapor deposition, the charge transport layer (12), etc. in the single-layer type photosensitive layer (4) or multi-layer type photosensitive layer (15) are can be formed by applying a dispersion of the charge transporting material and an organic solvent onto the conductive substrates (1) and (11) and removing the solvent. Further, the above dispersion can be prepared by a conventional method such as a ball mill, a paint shaker, a sand mill,
It can be prepared using an attritor, an ultrasonic disperser, etc., and various coating means can be employed when applying the obtained dispersion.
なお、前記感光層(4)(14)は、ターフェニル、ノ
\ロナフトキノン類、アセナフチレン等、従来公知の増
感剤や可塑剤等の添加剤を含有していてもよい。また、
導電性基板(1)(11)と感光層(4)(14)との
間に下引き層が形成されていたり、電荷発生層(13)
と電荷輸送層(12)との間に中間層が形成されていて
もよい。The photosensitive layers (4) and (14) may contain additives such as conventionally known sensitizers and plasticizers such as terphenyl, noronaphthoquinones, and acenaphthylene. Also,
An undercoat layer is formed between the conductive substrate (1) (11) and the photosensitive layer (4) (14), or a charge generation layer (13)
An intermediate layer may be formed between the charge transport layer (12) and the charge transport layer (12).
そして、前記保護層(5)(15)は、耐摩耗性を維持
すると共に、感光層の劣化を防止し、安定した感光特性
、電気的特性を長期に亘り維持するため、結着樹脂と共
に紫外線吸収剤および酸化防止剤を含有している。The protective layers (5) and (15) maintain abrasion resistance, prevent deterioration of the photosensitive layer, and maintain stable photosensitive characteristics and electrical characteristics over a long period of time. Contains absorbents and antioxidants.
上記結着樹脂としては、前記例示の種々のものが使用で
き、耐摩耗性等の機械的特性に優れるアクリル系重合体
、スチレン−アクリル系共重合体、ポリエステル、ポリ
アミド、ポリイミド、ポリカーボネート、ボリアリレー
ト、ポリスルホン、ポリビニルブチラール樹脂、ポリエ
ーテル樹脂等の熱可塑性樹脂や、熱硬化性アクリル重合
体、アルキッド樹脂、不飽和ポリエステル、ポリウレタ
ン、エポキシ樹脂、ジアリルフタレート樹脂、シリコー
ン樹脂、フェノール樹脂等の熱硬化性樹脂、エポキシア
クリレート、ウレタンアクリレート等の光硬化性樹脂等
、特に、耐摩耗性に優れる上記熱硬化性樹脂、光硬化性
樹脂が好ましい。As the binder resin, various of the above-mentioned ones can be used, including acrylic polymers, styrene-acrylic copolymers, polyesters, polyamides, polyimides, polycarbonates, and polyarylates, which have excellent mechanical properties such as abrasion resistance. , thermoplastic resins such as polysulfone, polyvinyl butyral resin, and polyether resin; thermosetting resins such as thermosetting acrylic polymers, alkyd resins, unsaturated polyesters, polyurethanes, epoxy resins, diallyl phthalate resins, silicone resins, and phenolic resins. Resins, photocurable resins such as epoxy acrylate, urethane acrylate, etc., and particularly the above-mentioned thermosetting resins and photocurable resins that have excellent abrasion resistance are preferable.
また、上記紫外線吸収剤としては、種々のもの、例えば
、ベンゾフェノン系紫外線吸収剤、ベンゾトリアゾール
系紫外線吸収剤、ベンゾエート系紫外線吸収剤、アクリ
ロニトリル系紫外線吸収剤、その他の紫外線吸収剤が使
用できる。Various types of UV absorbers can be used, such as benzophenone UV absorbers, benzotriazole UV absorbers, benzoate UV absorbers, acrylonitrile UV absorbers, and other UV absorbers.
上記ベンゾフェノン系紫外線吸収剤としては、例えば、
2,4−ジヒドロキシベンゾフェノン、2−ヒドロキシ
−4−メトキシベンゾフェノン、2−ヒドロキシ−4−
オクチルオキシベンゾフェノン、4−ドデシルオキシ−
2−ヒドロキシベンシフエノン、2−ヒドロキシ−4−
オクタデシルオキシベンゾフェノン、2.2”−ジヒド
ロキシ−4−メトキシベンゾフェノン、2.2−−ジヒ
ドロキシ−4,4′−ジメトキシベンゾフェノン、2.
2=、4.4−−テトラヒドロキシベンゾフェノン、2
−ヒドロキシ−4,4′−ジメトキシ−3−,5−−ジ
ーtert−ブチルベンゾフェノン、2.4−一ジヒド
ロキシー3−、5−−ジーtert−ブチルベンゾフェ
ノン、2.4−−ジヒドロキシ−3−,5−−ジイソプ
ロピルベンゾフェノン、2.4′−ジヒドロキシ−4−
ペンチルオキシ−3−,5−−ジイソプロピルベンゾフ
ェノン、2−ヒドロキシ−4−クロロベンゾフェノン、
2−ヒドロキシ−4−メトキシ−5−スルホベンゾフェ
ノン、2−ヒドロキシ−4−メトキシ−2′−カルボキ
シベンゾフェノン、2−ヒドロキシ−4−(2−ヒドロ
キシ−3−メタクリロキシ)プロポキシベンゾフェノン
等が例示される。Examples of the benzophenone ultraviolet absorbers include:
2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-
Octyloxybenzophenone, 4-dodecyloxy-
2-hydroxybencyphenone, 2-hydroxy-4-
Octadecyloxybenzophenone, 2.2''-dihydroxy-4-methoxybenzophenone, 2.2-dihydroxy-4,4'-dimethoxybenzophenone, 2.
2=, 4.4-tetrahydroxybenzophenone, 2
-Hydroxy-4,4'-dimethoxy-3-,5-di-tert-butylbenzophenone, 2,4-dihydroxy-3-,5-di-tert-butylbenzophenone, 2,4-dihydroxy-3- , 5-diisopropylbenzophenone, 2,4'-dihydroxy-4-
Pentyloxy-3-,5-diisopropylbenzophenone, 2-hydroxy-4-chlorobenzophenone,
Examples include 2-hydroxy-4-methoxy-5-sulfobenzophenone, 2-hydroxy-4-methoxy-2'-carboxybenzophenone, and 2-hydroxy-4-(2-hydroxy-3-methacryloxy)propoxybenzophenone.
また、ベンゾトリアゾール系紫外線吸収剤としては、例
えば、2− (2−ヒドロキシ−5−メチルフェニル)
ベンゾトリアゾール、2− (2−ヒドロキシ−3,5
−ジメチルフェニル)ベンゾトリアゾール、2−(2−
ヒドロキシ−3−tert −ブチル−5−メチルフェ
ニル)ベンゾトリアゾール、2−(2−ヒドロキシ−3
,5−ジーtert −ブチルフェニル)ベンゾトリア
ゾール、2− (2−ヒドロキシ−4−オクチルオキシ
フェニル)ベンゾトリアゾール、2− (2−ヒドロキ
シ−5−ペンチルフェニル)ベンゾトリアゾール、2−
(2−ヒドロキシ−3,5−ジメチルフェニル)ベンゾ
トリアゾール、2− (2−ヒドロキシ−5−へキシル
フェニル)ベンゾトリアゾール、2−(2−ヒドロキシ
−3−メチル−5−へキシルフェニル)ベンゾトリアゾ
ール、2− (2−ヒドロキシ−5−メチルフェニル)
−5−クロロベンゾトリアゾール、2−(2−ヒドロキ
シ−3,5−ジメチルフェニル)−5−クロロベンゾト
リアゾール、2−(2−ヒドロキシ−3−メチル−5−
tert−ブチルフェニル)−5−クロロベンゾトリア
ゾール、2−(2−ヒドロキシ−3,5−ジーtert
−ブチルフェニル)−5−クロロベンゾトリアゾール、
2−(2−ヒドロキシ−3−tert−ブチル−5−メ
チルフェニル)−5−クロロベンゾトリアゾール等が例
示される。In addition, examples of benzotriazole-based ultraviolet absorbers include 2-(2-hydroxy-5-methylphenyl)
Benzotriazole, 2-(2-hydroxy-3,5
-dimethylphenyl)benzotriazole, 2-(2-
Hydroxy-3-tert-butyl-5-methylphenyl)benzotriazole, 2-(2-hydroxy-3
,5-di-tert-butylphenyl)benzotriazole, 2-(2-hydroxy-4-octyloxyphenyl)benzotriazole, 2-(2-hydroxy-5-pentylphenyl)benzotriazole, 2-
(2-hydroxy-3,5-dimethylphenyl)benzotriazole, 2-(2-hydroxy-5-hexylphenyl)benzotriazole, 2-(2-hydroxy-3-methyl-5-hexylphenyl)benzotriazole , 2- (2-hydroxy-5-methylphenyl)
-5-chlorobenzotriazole, 2-(2-hydroxy-3,5-dimethylphenyl)-5-chlorobenzotriazole, 2-(2-hydroxy-3-methyl-5-
tert-butylphenyl)-5-chlorobenzotriazole, 2-(2-hydroxy-3,5-di-tert
-butylphenyl)-5-chlorobenzotriazole,
Examples include 2-(2-hydroxy-3-tert-butyl-5-methylphenyl)-5-chlorobenzotriazole.
また、ベンゾエート系紫外線吸収剤としては、例えば、
サリチル酸フェニル、4−tert−プチルフェニルサ
リシレート、4−オクチルフェニルサリシレート、2,
4−ジーtert−ブチルフェニル−3,5−ジーte
rt−ブチルー4−ヒドロキシベンゾエート、レゾルシ
ノールモノベンゾエート等が例示される。また、アクリ
ロニトリル系紫外線吸収剤としては、2−エチル−2−
シアノ−3゜3−ジフェニルアクリレート、2−エチル
へキシル−2−シアノ−3,3−ジフェニルアクリレー
ト等が例示され、その他の紫外線吸収剤としては、[2
,2−−チオビス(4−tert−オクチルフェノラー
ト)コブチルアミン・ニッケル、ニッケルビス(オクチ
ルフェニルスルフィド)等のニッケル系紫外線吸収剤等
が例示される。In addition, examples of benzoate-based ultraviolet absorbers include:
Phenyl salicylate, 4-tert-butylphenyl salicylate, 4-octylphenyl salicylate, 2,
4-tert-butylphenyl-3,5-tert
Examples include rt-butyl-4-hydroxybenzoate and resorcinol monobenzoate. In addition, as an acrylonitrile-based ultraviolet absorber, 2-ethyl-2-
Examples include cyano-3゜3-diphenylacrylate, 2-ethylhexyl-2-cyano-3,3-diphenylacrylate, and other ultraviolet absorbers include [2
, 2-thiobis(4-tert-octylphenolate)cobutylamine nickel, nickel-based ultraviolet absorbers such as nickel bis(octylphenyl sulfide), and the like.
上記紫外線吸収剤は結着樹脂の種類、紫外線膜衣剤の種
類等に応じて適宜量添加することができるが、少ない添
加量で前記効果を達成しうるベンゾフェノン系紫外線吸
収剤、ベンゾトリアゾール系紫外線吸収剤、ベンゾエー
ト系紫外線吸収剤、中でもベンゾトリアゾール系紫外線
吸収剤が好ましい。また、上記紫外線吸収剤は一種また
は二種以上混合して用いられる。The above-mentioned ultraviolet absorbers can be added in an appropriate amount depending on the type of binder resin, the type of ultraviolet film coating agent, etc., but benzophenone-based ultraviolet absorbers and benzotriazole-based ultraviolet absorbers can achieve the above effects with a small amount of addition. Absorbers, benzoate-based ultraviolet absorbers, and benzotriazole-based ultraviolet absorbers are particularly preferred. Further, the above-mentioned ultraviolet absorbers may be used alone or in combination of two or more.
また、酸化防止剤としては、アミン系酸化防止剤、フェ
ノール系酸化防止剤、硫黄系酸化防止剤、リン系酸化防
止剤、ヒドロキノン系酸化防止剤、キノリン系酸化防止
剤、ニッケル塩系酸化防止剤、その他の酸化防止剤が使
用される。In addition, antioxidants include amine antioxidants, phenolic antioxidants, sulfur antioxidants, phosphorus antioxidants, hydroquinone antioxidants, quinoline antioxidants, and nickel salt antioxidants. , other antioxidants are used.
上記アミン系酸化防止剤としては、例えば、フェニル−
α−ナフチルアミン、フェニル−β−ナフチルアミン、
ジフェニルアミンとアセトンとの反応生成物、N、N−
−ジフェニル−p−フェニレンジアミン、N、N−−ジ
−β−ナフチル−p−フェニレンジアミン、N、N−−
ジヘプチルーp−フェニレンジアミン、N−シクロへキ
シル−N′−フェニル−p−フェニレンジアミン、N−
イソプロピル−N′−フェニル−p−フェニレンジアミ
ン、N、N−−ジ(1−エチル−3−メチルペンチル)
−p−フェニレンジアミン、N。Examples of the above amine antioxidant include phenyl-
α-naphthylamine, phenyl-β-naphthylamine,
Reaction product of diphenylamine and acetone, N, N-
-diphenyl-p-phenylenediamine, N,N--di-β-naphthyl-p-phenylenediamine, N,N--
Diheptyl-p-phenylenediamine, N-cyclohexyl-N'-phenyl-p-phenylenediamine, N-
Isopropyl-N'-phenyl-p-phenylenediamine, N,N-di(1-ethyl-3-methylpentyl)
-p-phenylenediamine, N.
N”−ジ(1−メチルヘプチル)−p−フェニレンジア
ミン、N、N−−ジアリル−p−フェニレンジアミン、
N−フェニル−N−−(1,3−ジメチルブチル)−p
−フェニレンジアミン、N+N′−ジ(1,4−ジメチ
ルペンチル)−p−フェニレンジアミン、N−フェニル
−N−−(1−メチルプロピル)−p−フェニレンジア
ミン、N−フェニル−N−−(1−メチルヘプチル)
−p−フェニレンジアミン、N、N−−ジフェニルエチ
レンジアミン等が例示される。N”-di(1-methylheptyl)-p-phenylenediamine, N,N-diallyl-p-phenylenediamine,
N-phenyl-N--(1,3-dimethylbutyl)-p
-phenylenediamine, N+N'-di(1,4-dimethylpentyl)-p-phenylenediamine, N-phenyl-N--(1-methylpropyl)-p-phenylenediamine, N-phenyl-N--(1 -methylheptyl)
Examples include -p-phenylenediamine, N,N-diphenylethylenediamine, and the like.
また、フェノール系酸化防止剤としては、例えば、2.
4−ジメチル−6−tert−ブチルフェノール、2,
6−シーtert−ブチルフェノール、3゜5−ジーt
ert−ブチルー4−ヒドロキシトルエン、4.4−一
チオビス(6−tert−ブチル−m−クレゾール)、
4.4−−チオビス(6−tert−ブチル−0−クレ
ゾール)、2.2′−チオビス(4−メチル−6−tc
rt−ブチルフェノール)、2.2−一メチレンビス(
4−メチル−6−tert−ブチルフェノール)、2.
2−−メチレンビス(4−エチル−6−tert−ブチ
ルフェノール)、4.4゛−メチレンビス(2,6−シ
ーtert−ブチルフェノール)、4.4−−ビス(2
,6−ジー tert−ブチルフェノール)、4.4−
−メチレンビス(6−tert−ブチル−0−クレゾー
ル)、1.3.5−トリメチル−2,4,6−トリス(
3,5−ジーtert−ブチルー4−ヒドロキシベンジ
ル)ベンゼン、4.4−−ブチリデンビス(6−ter
t−ブチル−m−クレゾール)、スチレン化フェノール
等が例示される。In addition, examples of phenolic antioxidants include 2.
4-dimethyl-6-tert-butylphenol, 2,
6-tert-butylphenol, 3゜5-tert-butylphenol
ert-butyl-4-hydroxytoluene, 4,4-monothiobis(6-tert-butyl-m-cresol),
4.4-thiobis(6-tert-butyl-0-cresol), 2.2'-thiobis(4-methyl-6-tc
rt-butylphenol), 2.2-monethylenebis(
4-methyl-6-tert-butylphenol), 2.
2-Methylenebis(4-ethyl-6-tert-butylphenol), 4.4-methylenebis(2,6-tert-butylphenol), 4.4-bis(2-tert-butylphenol)
, 6-tert-butylphenol), 4.4-
-methylenebis(6-tert-butyl-0-cresol), 1,3,5-trimethyl-2,4,6-tris(
3,5-di-tert-butyl-4-hydroxybenzyl)benzene, 4,4-butylidene bis(6-tert)
(t-butyl-m-cresol), styrenated phenol, and the like.
また、硫黄系酸化防止剤としては、例えば、ジラウリル
チオジプロピオネート、ジステアリルチオジプロピオネ
ート、ラウリルステアリルチオジプロピオネート、シミ
リスチルチオジプロピオネート等が例示される。Further, examples of the sulfur-based antioxidant include dilaurylthiodipropionate, distearylthiodipropionate, laurylstearylthiodipropionate, simiristylthiodipropionate, and the like.
リン系酸化防止剤としては、例えば、トリイソデシルフ
ォスファイト、ジフェニルイソデシルフオスファイト、
トリフェニルフォスファイト、トリノニルフェニルフォ
スファイト等が例示される。Examples of phosphorus antioxidants include triisodecylphosphite, diphenylisodecylphosphite,
Examples include triphenylphosphite and trinonylphenylphosphite.
ヒドロキノン系酸化防止剤としては、例えば、2.5−
ジーtert−ブチルヒドロキノン、2.5−ジーte
rt−アミルヒドロキノン等が例示される。Examples of hydroquinone antioxidants include 2.5-
Di-tert-butylhydroquinone, 2,5-tert-butylhydroquinone
Examples include rt-amylhydroquinone.
キノリン系酸化防止剤としては、例えば、2゜2.4−
トリメチル−1,2−ジヒドロキノリン、6−ニトキシ
ー2.2.4−トリメチル−1,2−ジヒドロキノリン
、6−ドデシル−2,2,4−トリメチル−1,2−ジ
ヒドロキノリン等が例示される。As a quinoline antioxidant, for example, 2゜2.4-
Examples include trimethyl-1,2-dihydroquinoline, 6-nitoxy-2.2.4-trimethyl-1,2-dihydroquinoline, 6-dodecyl-2,2,4-trimethyl-1,2-dihydroquinoline, etc. .
ニッケル塩系酸化防止剤としては、例えば、ジブチルジ
チオカルバミン酸ニッケル、イソプロピルキサントゲン
酸ニッケル等が例示される。Examples of the nickel salt antioxidant include nickel dibutyldithiocarbamate, nickel isopropylxanthate, and the like.
その他の酸化防止剤としては、2−メルカプトベンゾイ
ミダゾール、N−サジシロイル−N−−アルデヒドヒド
ラジン、N−サリシロイルーN゛−アセチルヒドラジン
、N、N″−ジフェニルオキサミド、N、N−−ジ(2
−ヒドロキシフェニル)オキサミド等が例示される。Other antioxidants include 2-mercaptobenzimidazole, N-sadicilloyl-N--aldehydehydrazine, N-salicilloyl-N'-acetylhydrazine, N,N''-diphenyloxamide, N,N-di(2
-hydroxyphenyl)oxamide and the like.
上記酸化防止剤は、酸化防止剤の種類等に応じて適宜量
添加することができるが、アミン系酸化防止剤、フェノ
ール系酸化防止剤、ニッケル塩系酸化防止剤が好ましい
。なお、上記酸化防止剤は一種または二種以上混合して
用いられる。The above antioxidant can be added in an appropriate amount depending on the type of antioxidant, but amine antioxidants, phenolic antioxidants, and nickel salt antioxidants are preferred. The above antioxidants may be used alone or in combination of two or more.
上記紫外線吸収剤および酸化防止剤は、その種類等に応
じて適宜の割合で使用できるが、保護層(5)(15)
の結着樹脂100重量部に対して、紫外線吸収剤5〜4
0重量部、好ましくは15〜35重量部、より好ましく
は20〜30重量部、酸化防止剤1〜10重量部、好ま
しくは2.5〜10重量部、より好ましくは5〜10重
量部の割合で使用される。紫外線吸収剤が5重量部未満
であると、感光層の劣化防止効果が十分でなく、光照射
後の感光体の残留電位が大きくなり、40重量部を越え
ると、感光層の耐摩耗性が低下する傾向を示す。The above-mentioned ultraviolet absorbers and antioxidants can be used in appropriate proportions depending on their types, etc., but in the protective layer (5) (15)
5 to 4 parts of ultraviolet absorber per 100 parts by weight of binder resin.
0 parts by weight, preferably 15-35 parts by weight, more preferably 20-30 parts by weight, antioxidants 1-10 parts by weight, preferably 2.5-10 parts by weight, more preferably 5-10 parts by weight. used in If the amount of the ultraviolet absorber is less than 5 parts by weight, the effect of preventing deterioration of the photosensitive layer will not be sufficient and the residual potential of the photoreceptor after irradiation with light will become large, and if it exceeds 40 parts by weight, the abrasion resistance of the photosensitive layer will deteriorate. Shows a decreasing trend.
また、酸化防止剤の量が1重量部未満であると、感光層
の劣化を十分に防止できず、15重量部を越えると、感
光体の初期感度が低下すると共に繰返し使用により残留
電位が大きくなる傾向にある。Furthermore, if the amount of antioxidant is less than 1 part by weight, deterioration of the photosensitive layer cannot be sufficiently prevented, and if it exceeds 15 parts by weight, the initial sensitivity of the photoreceptor will decrease and the residual potential will increase due to repeated use. There is a tendency to
また、上記紫外線吸収剤と酸化防止剤とは上記範囲内で
適宜量添加することができるが、保護層(5)(15)
の耐摩耗性をより一層高めると共に感光層の劣化を防止
するため、保護層(5)(15)の結着樹脂100重量
部に対して、紫外線吸収剤と酸化防止剤との合計量が、
40重量部以下、特に、25〜40重量部となるように
設定するのが好ましい。In addition, the above-mentioned ultraviolet absorber and antioxidant can be added in appropriate amounts within the above-mentioned range.
In order to further increase the abrasion resistance of the photosensitive layer and to prevent deterioration of the photosensitive layer, the total amount of the ultraviolet absorber and antioxidant is
It is preferably set to 40 parts by weight or less, particularly 25 to 40 parts by weight.
なお、上記保護層(5)(15)は、前記結着樹脂、紫
外線吸収剤および酸化防止剤を含有する塗布液を、従来
慣用のコーティング方法、例えば、ディップコーティン
グ、スプレーコーティング、スピンコーティング、ロー
ラーコーティング、ブレードコーティング、カーテンコ
ーティング、バーコーティング法等により、前記感光層
(4)(14)上に塗布することにより形成することが
できる。また、上記保護層(5)(15)は、適宜の膜
厚に形成することができるが、0.1〜10μm1好ま
しくは1〜5μmに形成される。The protective layers (5) and (15) can be formed by applying a coating solution containing the binder resin, an ultraviolet absorber, and an antioxidant using a conventional coating method such as dip coating, spray coating, spin coating, or roller coating. It can be formed by coating on the photosensitive layer (4) (14) by coating, blade coating, curtain coating, bar coating, or the like. Further, the protective layers (5) and (15) can be formed to have an appropriate thickness, but are formed to have a thickness of 0.1 to 10 μm, preferably 1 to 5 μm.
上記塗布液の調製に際しては、結着樹脂等の種類に応じ
て適宜の有機溶媒が使用され、該有機溶媒としては、例
えば、n−へキサン、オクタン、シクロヘキサン等の脂
肪族系炭化水素、ベンゼン、トルエン、キシレン等の芳
香族炭化水素、ジクロロメタン、ジクロロエタン、四塩
化炭素、クロロベンゼン等のハロゲン化炭化水素、ジメ
チルエーテル、ジエチルエーテル、テトラヒドロフラン
、エチレングリコールジメチルエーテル、エチレングリ
コールジエチルエーテル、ジエチレングリコールジメチ
ルエーテル等のエーテル類、アセトン、メチルエチルケ
トン、シクロヘキサノン等のケトン類、酢酸エチル、酢
酸メチル等のエステル類、ジメチルホルムアミド、ジメ
チルスルホキシド等、種々の溶剤が例示され、一種また
は二種以上混合して用いられる。なお、上記塗布液は、
分散性、塗工性等をよくするため、界面活性剤、レベリ
ング剤等を含有していてもよい。When preparing the above coating liquid, an appropriate organic solvent is used depending on the type of binder resin, etc. Examples of the organic solvent include aliphatic hydrocarbons such as n-hexane, octane, and cyclohexane, and benzene. , aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as dichloromethane, dichloroethane, carbon tetrachloride, and chlorobenzene, ethers such as dimethyl ether, diethyl ether, tetrahydrofuran, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, and diethylene glycol dimethyl ether; Examples of various solvents include ketones such as acetone, methyl ethyl ketone, and cyclohexanone, esters such as ethyl acetate and methyl acetate, dimethyl formamide, and dimethyl sulfoxide, which may be used singly or in combination of two or more. In addition, the above coating liquid is
In order to improve dispersibility, coating properties, etc., a surfactant, a leveling agent, etc. may be contained.
上記のように本発明の電子写真感光体は、保護層が、紫
外線吸収剤および酸化防止剤を含有しているので、コロ
ナ放電により発生するオゾンや、光照射などによる感光
体の感光特性、電気的特性の劣化を少ない添加量で防止
できると共に、感光層の耐摩耗性に優れている。従って
、本発明の電子写真感光体は、複写機、レーザープリン
タ等の感光体として有用である。As described above, in the electrophotographic photoreceptor of the present invention, since the protective layer contains an ultraviolet absorber and an antioxidant, ozone generated by corona discharge, photosensitive characteristics of the photoreceptor due to light irradiation, etc. Deterioration of optical properties can be prevented with a small addition amount, and the photosensitive layer has excellent abrasion resistance. Therefore, the electrophotographic photoreceptor of the present invention is useful as a photoreceptor for copying machines, laser printers, and the like.
〈実施例〉
以下に、実施例に基づき、この発明をより詳細に説明す
る。<Examples> The present invention will be described in more detail below based on Examples.
実施例1〜7
導電性基板としてアルミニウム板を用い、単層型の感光
層を有する感光体を作製した。すなわち、ジブロモアン
サンスロン1重量部、N、N−ジエチルアノベンズアル
デヒド N、N−ジフェニルヒドラゾン8重量部、ポリ
カーボネート(帝人化成社製商品名パンライトL122
5)10重量部および所定量のテトラヒドロフランを用
い、ボールミルにて分散液を調製し、該分散液を上記ア
ルミニウム板上に塗布し、厚み約20声の感光層を有す
る感光体を作製した。Examples 1 to 7 Photoreceptors having a single-layer photosensitive layer were manufactured using an aluminum plate as a conductive substrate. Namely, 1 part by weight of dibromoanthanthrone, 8 parts by weight of N,N-diethylanobenzaldehyde N,N-diphenylhydrazone, polycarbonate (trade name Panlite L122 manufactured by Teijin Kasei Co., Ltd.)
5) A dispersion was prepared using a ball mill using 10 parts by weight and a predetermined amount of tetrahydrofuran, and the dispersion was coated on the aluminum plate to produce a photoreceptor having a photosensitive layer with a thickness of approximately 20 tones.
次いで、熱硬化性変性ウレタン樹脂(関西ペイント社製
商品名レタン4000)100重量部に 24一
対して、紫外線吸収剤としての2−(2−ヒドロキシ−
5−tert−ブチルフェニル)ベンゾトリアゾールお
よび酸化防止剤としてのジブチルジチオカルバミン酸ニ
ッケルを、表に示す割合(重量部)で添加すると共に、
所定量のテトラヒドロフランを用い保護層用テトラヒド
ロフラン溶液を調製した。Next, 2-(2-hydroxy-
While adding 5-tert-butylphenyl)benzotriazole and nickel dibutyldithiocarbamate as an antioxidant in the proportions (parts by weight) shown in the table,
A tetrahydrofuran solution for a protective layer was prepared using a predetermined amount of tetrahydrofuran.
そして、得られた保護層用のテトラヒドロフラン溶液を
上記感光層上に塗布し、加熱乾燥させると共に硬化させ
、膜厚的2μmの保護層を形成し、本発明の電子写真感
光体を得た。Then, the obtained tetrahydrofuran solution for a protective layer was applied onto the photosensitive layer, dried by heating, and cured to form a protective layer having a thickness of 2 μm, thereby obtaining an electrophotographic photoreceptor of the present invention.
比較例1および2
上記実施例の保護層用テトラヒドロフラン溶液に代えて
、上記実施例で用いた熱硬化性変性ウレタン樹脂100
重量部に対して、2−(2−ヒドロキシ−5−tert
−ブチルフェニル)ベンゾトリアゾールを25重量部(
比較例1)、50重量部(比較例2)を添加して調製し
たテトラヒドロフラン溶液を用い、上記実施例で作製し
た感光体の感光層上に塗布し、上記実施例と同様にして
膜厚約2μmの保護層を有する電子写真感光体を得た。Comparative Examples 1 and 2 Thermosetting modified urethane resin 100 used in the above example was used in place of the tetrahydrofuran solution for the protective layer in the above example.
Based on parts by weight, 2-(2-hydroxy-5-tert
-butylphenyl)benzotriazole in 25 parts by weight (
A tetrahydrofuran solution prepared by adding 50 parts by weight of Comparative Example 1) and 50 parts by weight (Comparative Example 2) was applied onto the photosensitive layer of the photoreceptor prepared in the above example, and a film thickness of approximately An electrophotographic photoreceptor having a protective layer of 2 μm was obtained.
比較例3および4
上記実施例の保護層用テトラヒドロフラン溶液に代えて
、上記実施例の熱硬化性変性ウレタン樹脂100重量部
に対して、ジブチルジチオカルバミン酸ニッケル5重量
部(比較例3.)、20重量部(比較例4)を添加して
調製したテトラヒドロフラン溶液を用い、上記実施例と
同様にして電子写真感光体を得た。Comparative Examples 3 and 4 Instead of the tetrahydrofuran solution for the protective layer in the above example, 5 parts by weight of nickel dibutyldithiocarbamate (Comparative Example 3), 20 An electrophotographic photoreceptor was obtained in the same manner as in the above example using a tetrahydrofuran solution prepared by adding parts by weight (Comparative Example 4).
上記の電子写真感光体の特性について、以下の方法によ
り調べた。The characteristics of the above electrophotographic photoreceptor were investigated by the following method.
(a)感光特性および表面電位
静電複写紙試験装置(川口電機社製 SP〜428型)
を用いて、+B、OKVの条件でコロナ放電を行なうこ
とにより、各感光体を正に帯電させた。(a) Photosensitive properties and surface potential Electrostatic copying paper test device (Kawaguchi Electric Co., Ltd. SP~428 type)
Each photoreceptor was positively charged by performing corona discharge under the conditions of +B and OKV.
また、各感光体の当初の表面電位V i mを測定する
と共に、感光体表面の照度がIOルックスとなるように
調整したタングステンランプにより露光し、上記表面電
位Viが1/2となるまでの時間を求め、半減露光量E
1/2 (lux、 ・see、)を算出した。ま
た、露光後0.15秒経過後の表面電位を残留電位V
r、p、 mとした。In addition, the initial surface potential V i m of each photoconductor was measured, and the photoconductor surface was exposed to light using a tungsten lamp adjusted so that the illumination intensity was IOlux, until the surface potential Vi was reduced to 1/2. Find the time and half the exposure E
1/2 (lux, ·see,) was calculated. In addition, the surface potential after 0.15 seconds after exposure is the residual potential V
r, p, and m.
(b)光劣化性
3000ルツクスの白色螢光灯で上記各感光体を15分
間照射した後、上記(a)と同様にして残留電位を測定
し、当初の感光体の残留電位V r、p。(b) Photodegradability After irradiating each photoreceptor with a white fluorescent lamp of 3000 lux for 15 minutes, the residual potential was measured in the same manner as in (a) above, and the initial residual potential V r, p of the photoreceptor was measured. .
との差異を、△V r、p、 (V)として表示した。The difference from the above was expressed as ΔVr,p, (V).
(e)繰返し特性
上記(a)における帯電、露光工程を1000回繰返し
、1000回繰返し後の感光体の残留電位を上記(a)
と同様にして測定し、当初の感光体の残留電位V r、
p、との差異を、△V r、p、1000(V)として
表示した。(e) Repeatability characteristics The charging and exposure steps in (a) above are repeated 1000 times, and the residual potential of the photoreceptor after 1000 repetitions is determined as shown in (a) above.
Measured in the same manner as the initial residual potential Vr of the photoreceptor,
The difference from p, was expressed as ΔV r,p, 1000 (V).
(d)耐摩耗性
複写機(三田工業社製DC−111型機)に、上記各電
子写真感光体を装着し、乾式トナーを用いて、1000
0枚複写し、前記保護層の当初の膜厚と、10000枚
複写後の保護層の膜厚との差から、摩耗量(μff1)
を求めた。(d) Each of the electrophotographic photoreceptors described above was installed in a wear-resistant copying machine (Model DC-111 manufactured by Sanda Kogyo Co., Ltd.), and 1,000 copies were made using dry toner.
After copying 0 sheets, the wear amount (μff1) is determined from the difference between the initial thickness of the protective layer and the thickness of the protective layer after copying 10,000 sheets.
I asked for
上記実施例および比較例で得られた各電子写真感光体の
感光特性、帯電特性および繰返し特性等の結果を次表に
示す。The results of the photosensitive characteristics, charging characteristics, repeatability characteristics, etc. of each electrophotographic photoreceptor obtained in the above Examples and Comparative Examples are shown in the following table.
表より明らかなように、紫外線吸収剤のみを含む保護層
では、紫外線吸収剤が少ないと感光層の光劣化が生じ、
多いと耐摩耗性が劣る(比較例]および2)。一方、酸
化防止剤のみを含む保護層では、酸化防止剤が少ないと
光劣化が生じ、多いと初期感度が低下すると共に、繰返
し特性が悪くなることが判明した(比較例3および4)
。また、比較例のもの、特に比較例3のものは、残留電
位が大きいものであった。従って、比較例1〜4の電子
写真感光体によれば、感光体の感光特性および電気的特
性と耐摩耗性等とを同時に満足することができない。こ
れに対して、本発明の電子写真感光体によれば、少量の
添加量で感光体の安定化等を図ることができる。すなわ
ち、感度が低下せず、残留電位が小さいだけでなく、光
劣化および繰返し使用による劣化を防止することができ
、耐摩耗性の点でも優れていることが判明した。As is clear from the table, in a protective layer containing only an ultraviolet absorber, when the amount of ultraviolet absorber is small, photodeterioration of the photosensitive layer occurs;
If it is too large, the wear resistance will be poor (Comparative Example) and 2). On the other hand, in a protective layer containing only an antioxidant, it was found that a small amount of antioxidant caused photodeterioration, and a large amount resulted in a decrease in initial sensitivity and poor repeatability (Comparative Examples 3 and 4).
. Further, the samples of Comparative Examples, especially those of Comparative Example 3, had a large residual potential. Therefore, according to the electrophotographic photoreceptors of Comparative Examples 1 to 4, it is not possible to simultaneously satisfy the photosensitive characteristics, electrical characteristics, abrasion resistance, etc. of the photoreceptor. On the other hand, according to the electrophotographic photoreceptor of the present invention, the photoreceptor can be stabilized with a small amount of addition. That is, it was found that not only the sensitivity did not decrease and the residual potential was small, but also it was possible to prevent photodeterioration and deterioration due to repeated use, and it was also excellent in abrasion resistance.
実施例8
実施例1の熱硬化性変性ウレタン樹脂100重量部およ
び紫外線吸収剤を25重量部を用いると共に、実施例1
の酸化防止剤に代えて、3,5−ジーtert−ブチル
ー4−ヒドロキシトルエンを1〜10重量部の範囲で使
用し、実施例1と同様にして保護層用テトラヒドロフラ
ン溶液を調製した。Example 8 Using 100 parts by weight of the thermosetting modified urethane resin of Example 1 and 25 parts by weight of the ultraviolet absorber,
A tetrahydrofuran solution for a protective layer was prepared in the same manner as in Example 1, except that 1 to 10 parts by weight of 3,5-di-tert-butyl-4-hydroxytoluene was used in place of the antioxidant.
また、上記保護層用テトラヒドロフラン溶液を実施例1
の感光体の感光層上に塗布し、電子写真感光体を作製し
た。In addition, the above tetrahydrofuran solution for the protective layer was prepared in Example 1.
was coated on the photosensitive layer of the photoreceptor to produce an electrophotographic photoreceptor.
比較例5
上記実施例8で用いた紫外線吸収剤を0〜50重量部使
用し、実施例1と同様にして紫外線吸収剤のみを含有す
る保護層用テトラヒドロフラン溶液を調製すると共に、
電子写真感光体を作製した。Comparative Example 5 Using 0 to 50 parts by weight of the ultraviolet absorber used in Example 8 above, a tetrahydrofuran solution for a protective layer containing only the ultraviolet absorber was prepared in the same manner as in Example 1, and
An electrophotographic photoreceptor was produced.
比較例6
上記実施例8で用いた酸化防止剤を0〜40重量部使用
し、実施例1と同様にして酸化防止剤のみを含有する保
護層用テトラヒドロフラン溶液を調製すると共に、電子
写真感光体を作製した。Comparative Example 6 Using 0 to 40 parts by weight of the antioxidant used in Example 8 above, a tetrahydrofuran solution for a protective layer containing only the antioxidant was prepared in the same manner as in Example 1. was created.
そして、上記感光体の光劣化性を前記試験方法により調
べたところ、第3図に示す結果を得た。When the photoreceptor was examined for photodegradability using the test method described above, the results shown in FIG. 3 were obtained.
第3図より明らかなように、紫外線吸収剤や酸化防止剤
単独では、添加量を多くしなければ感光体の光劣化を防
止することができない(比較例5および6参照)。これ
に対しぞ、紫外線吸収剤と酸化防止剤とを併用した実施
例8では、少ない添加量で感光体の光劣化を防止しうろ
ことが判明した。As is clear from FIG. 3, UV absorbers and antioxidants alone cannot prevent photodeterioration of the photoreceptor unless added in large amounts (see Comparative Examples 5 and 6). On the other hand, in Example 8 in which an ultraviolet absorber and an antioxidant were used in combination, it was found that photodeterioration of the photoreceptor could be prevented with a small amount added.
〈発明の効果〉
以上のように、本発明の電子写真感光体によれば、保護
層が、紫外線吸収剤および酸化防止剤を含有しているの
で、少量の添加量で感光体の光劣化を防止でき、感光層
の耐摩耗性を低下させることなく、感光体の感光特性お
よび電気的特性を長期に亘り維持することができるとい
う特有の効果を奏する。<Effects of the Invention> As described above, according to the electrophotographic photoreceptor of the present invention, since the protective layer contains an ultraviolet absorber and an antioxidant, photodeterioration of the photoreceptor can be prevented with a small amount of addition. The unique effect is that the photosensitive characteristics and electrical characteristics of the photoreceptor can be maintained over a long period of time without reducing the abrasion resistance of the photosensitive layer.
第1図および第2図はそれぞれ感光体の構造を示す概略
図、
第3図は実施例8、比較例5および比較例6の結果を示
す図である。
(1)(11)・・・導電性基板、(12)・・・電荷
輸送層、(13)・・・電荷発生層、(4)(14)・
・・感光層、(5)(15)・・・保護層。1 and 2 are schematic diagrams showing the structure of the photoreceptor, respectively, and FIG. 3 is a diagram showing the results of Example 8, Comparative Example 5, and Comparative Example 6. (1) (11) Conductive substrate, (12) Charge transport layer, (13) Charge generation layer, (4) (14)
...Photosensitive layer, (5) (15)...Protective layer.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12756287A JPS63291063A (en) | 1987-05-25 | 1987-05-25 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12756287A JPS63291063A (en) | 1987-05-25 | 1987-05-25 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63291063A true JPS63291063A (en) | 1988-11-28 |
Family
ID=14963097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12756287A Pending JPS63291063A (en) | 1987-05-25 | 1987-05-25 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63291063A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5147751A (en) * | 1989-01-13 | 1992-09-15 | Ricoh Company, Ltd. | Electrophotographic photoconductor and electrophotographic copying process and apparatus using the photoconductor |
JP2017156409A (en) * | 2016-02-29 | 2017-09-07 | コニカミノルタ株式会社 | Image forming apparatus |
-
1987
- 1987-05-25 JP JP12756287A patent/JPS63291063A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5147751A (en) * | 1989-01-13 | 1992-09-15 | Ricoh Company, Ltd. | Electrophotographic photoconductor and electrophotographic copying process and apparatus using the photoconductor |
JP2017156409A (en) * | 2016-02-29 | 2017-09-07 | コニカミノルタ株式会社 | Image forming apparatus |
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