JPS63288784A - Substrate for optical recording and production thereof - Google Patents
Substrate for optical recording and production thereofInfo
- Publication number
- JPS63288784A JPS63288784A JP62124574A JP12457487A JPS63288784A JP S63288784 A JPS63288784 A JP S63288784A JP 62124574 A JP62124574 A JP 62124574A JP 12457487 A JP12457487 A JP 12457487A JP S63288784 A JPS63288784 A JP S63288784A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- optical recording
- group
- carbon atoms
- organosilicon compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 230000003287 optical effect Effects 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 229920000642 polymer Polymers 0.000 claims abstract description 24
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 21
- 239000002904 solvent Substances 0.000 claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 14
- 150000001875 compounds Chemical class 0.000 claims abstract description 12
- 125000000524 functional group Chemical group 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000004372 Polyvinyl alcohol Substances 0.000 claims abstract description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 4
- 229920002717 polyvinylpyridine Polymers 0.000 claims abstract description 4
- 238000010030 laminating Methods 0.000 claims abstract 2
- 238000000576 coating method Methods 0.000 claims description 36
- 239000011248 coating agent Substances 0.000 claims description 34
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 12
- 125000002252 acyl group Chemical group 0.000 claims description 5
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 5
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 claims description 4
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 claims description 4
- 229940081735 acetylcellulose Drugs 0.000 claims description 4
- 229920002301 cellulose acetate Polymers 0.000 claims description 4
- 239000001863 hydroxypropyl cellulose Substances 0.000 claims description 4
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 3
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 3
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 3
- 150000001298 alcohols Chemical class 0.000 claims description 2
- 125000000962 organic group Chemical group 0.000 claims 4
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims 2
- 239000004354 Hydroxyethyl cellulose Substances 0.000 claims 2
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 claims 2
- 229920000609 methyl cellulose Polymers 0.000 claims 2
- 239000001923 methylcellulose Substances 0.000 claims 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 3
- 230000035939 shock Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 8
- -1 hydrochloric acid Chemical class 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 5
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000013522 chelant Substances 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- PLXLQGPXPXIVKM-UHFFFAOYSA-N 3-chloropropyl(tripropoxy)silane Chemical compound CCCO[Si](CCCCl)(OCCC)OCCC PLXLQGPXPXIVKM-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- BJNKASMFSPKVTJ-UHFFFAOYSA-N O(CC)[SiH3].C(=C)[Si](OC)(OC)OC Chemical compound O(CC)[SiH3].C(=C)[Si](OC)(OC)OC BJNKASMFSPKVTJ-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- YNCDEEFMDXHURQ-UHFFFAOYSA-N aluminum;ethyl 3-oxobutanoate Chemical compound [Al].CCOC(=O)CC(C)=O YNCDEEFMDXHURQ-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- LQJYZOSQIDYKOM-UHFFFAOYSA-N dimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]-propylsilane Chemical compound CCC[Si](OC)(OC)CCOCC1CO1 LQJYZOSQIDYKOM-UHFFFAOYSA-N 0.000 description 1
- PWPGWRIGYKWLEV-UHFFFAOYSA-N dimethoxy-methyl-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](C)(OC)CCOCC1CO1 PWPGWRIGYKWLEV-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- GYLXWHLPLTVIOP-UHFFFAOYSA-N ethenyl(2,2,2-trimethoxyethoxy)silane Chemical compound COC(OC)(OC)CO[SiH2]C=C GYLXWHLPLTVIOP-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- OOPKJVYUAXPGHS-UHFFFAOYSA-N tributoxy(3-chloropropyl)silane Chemical compound CCCCO[Si](CCCCl)(OCCCC)OCCCC OOPKJVYUAXPGHS-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- ZNXDCSVNCSSUNB-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)CCOCC1CO1 ZNXDCSVNCSSUNB-UHFFFAOYSA-N 0.000 description 1
- HTVULPNMIHOVRU-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CC(C)OCC1CO1 HTVULPNMIHOVRU-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2533—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は、レーザー光によって記録し、かつ読み出すこ
とのできる光記録用基板およびその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical recording substrate that can be recorded and read by laser light, and a method for manufacturing the same.
[従来の技術]
近年、塗布によって記録層が形成できる、有機化合物を
記録月利に用いる光記録媒体が活発に検問されている。[Prior Art] In recent years, optical recording media that use organic compounds for recording, whose recording layer can be formed by coating, have been actively investigated.
ところが、従来の有機化合物を塗膜として樹脂製の基板
上に形成する際には、塗布溶媒によって樹脂基板表面が
侵され、フォーカスサーボ・トラッキングサーボに必要
なグループ(案内溝)が消失してしまう恐れがあった。However, when conventional organic compounds are formed as a coating on a resin substrate, the resin substrate surface is attacked by the coating solvent, and the groups (guide grooves) necessary for focus servo and tracking servo disappear. There was fear.
そこで基板と記録層の間に種々の被膜を設けて上記問題
点を解決しようとする提案がある。Therefore, there have been proposals to solve the above problems by providing various coatings between the substrate and the recording layer.
例えば、被膜として酸化ケイ素を用いる提案(特開昭6
0−204395号公報)、ケイ素縮合物のコロイド粒
子分散液の塗膜を用いる提案(特開昭61−11294
号公報、熱処理したオルガノアルコキシシラン、オルガ
ノアロキシシラシ、オルガノシリコンの層を用いる提案
(特開昭61−35288号公報、特開昭61−573
89号公報)などがある。For example, a proposal to use silicon oxide as a coating (Japanese Unexamined Patent Publication No. 6)
0-204395), a proposal using a coating film of a colloidal particle dispersion of a silicon condensate (JP-A-61-11294)
JP-A-61-35288, JP-A-61-573, proposals using heat-treated layers of organoalkoxysilane, organoalkoxysilane, and organosilicon.
Publication No. 89).
[発明が解決しようとする問題点]
しかしながら、特開昭60−204395号公報の提案
は、通常蒸着あるいはスパッタリングによって形成する
もので、膜厚が薄く不均一であり、また生産性も悪いと
いう問題点を有していた。[Problems to be Solved by the Invention] However, the proposal in JP-A No. 60-204395 involves the problem that the film is usually formed by vapor deposition or sputtering, and the film thickness is thin and non-uniform, and the productivity is also poor. It had a point.
また、特開昭61−11294号公報の提案は、コロイ
ド粒子間から塗布溶媒が浸透して基板を浸してしまうと
いう問題点があった。Furthermore, the proposal of JP-A-61-11294 had a problem in that the coating solvent penetrated between the colloid particles and soaked the substrate.
また、特開昭61−35288号公報、特開昭61−5
7389号公報の提案は、熱処理にかなりの高温を必要
とするため樹脂基体への適用がむずかしく、ざらに、熱
処理後に生成するシリコーン層は非常に可撓性が乏しく
容易に亀裂が入るという欠点を有していた。Also, JP-A-61-35288, JP-A-61-5
The proposal in Publication No. 7389 requires a considerably high temperature for heat treatment, making it difficult to apply to resin substrates, and has the drawback that the silicone layer formed after heat treatment has very poor flexibility and easily cracks. had.
本発明は、かかる従来技術の欠点を解消しようとするも
のであり、耐溶剤性、可撓性に優れた、樹脂を基体とし
た光記録用基板およびその製造方法を提供することを目
的とする。The present invention aims to eliminate the drawbacks of the prior art, and aims to provide a resin-based optical recording substrate that has excellent solvent resistance and flexibility, and a method for manufacturing the same. .
F問題点を解決するための手段]
本発明は、上記目的を達成するために、下記の構成を有
する。Means for Solving Problem F] In order to achieve the above object, the present invention has the following configuration.
「(1) 樹脂製の基体上に、ポリマーと有機ケイ素
化合物とから得られる被膜を積層してなることを特徴と
する光記録用基板。(1) An optical recording substrate comprising a resin substrate and a coating made of a polymer and an organosilicon compound laminated thereon.
(2) 樹脂製の基体上に、脂肪族低級アルコール、
セロソルブ類、水から選ばれる少なくとも一種を溶媒と
したポリマーと有はケイ素化合物との溶液をコーティン
グすることを特徴とする光記録用基板の製造方法。」
本発明におけるポリマーとは、脂肪族低級アルコール、
セロソルブ類、水から選ばれる一種あるいは2種以上の
混合溶媒に溶けるポリマーなら何でもよいが、特に水素
結合性の官能基を有するポリマーが好ましく、具体的に
はポリビニルアルコール、ポリビニルピリジン、ポリビ
ニルピロリドン、ヒドロキシエチルセルロース、アセチ
ルセルロース、ヒドロキシブチルセルロースあるいはこ
れらのコポリマーからなる群から選ばれるものがその例
として挙げられる。(2) Aliphatic lower alcohol,
1. A method for producing an optical recording substrate, comprising coating a solution of a polymer and a silicon compound using at least one selected from cellosolves and water as a solvent. ” The polymer in the present invention refers to aliphatic lower alcohol,
Any polymer can be used as long as it is soluble in one or more mixed solvents selected from cellosolves and water, but polymers with hydrogen-bonding functional groups are particularly preferred, and specific examples include polyvinyl alcohol, polyvinylpyridine, polyvinylpyrrolidone, and hydroxyl. Examples include those selected from the group consisting of ethylcellulose, acetylcellulose, hydroxybutylcellulose, or copolymers thereof.
本発明に用いる有機ケイ素化合物とは、一般式%式%
(式中、R1は炭素数1〜10の有は基、R2は、炭素
数1〜6のアルキル基、またはハロゲン化アルキル基、
R3は炭素数1〜8のアルキル基、アルコキシアルキル
基またはアシル基である。aはOまたは1である。)
で表わされる化合物および/またはその加水分解物であ
ることが好ましく、具体的な例としては、次のようなも
のが挙げられる。The organosilicon compound used in the present invention has the general formula % (in the formula, R1 is a group having 1 to 10 carbon atoms, R2 is an alkyl group having 1 to 6 carbon atoms, or a halogenated alkyl group,
R3 is an alkyl group, an alkoxyalkyl group, or an acyl group having 1 to 8 carbon atoms. a is O or 1. ) and/or a hydrolyzate thereof, and specific examples include the following.
β−グリシドキシエチルトリメトキシシラン、γ−グリ
シドキシプロピルトリメトキシシラン、γ−グリシドキ
シエチルトリエトキシシラン、β−グリシドキシプロピ
ルトリメトキシシラン、β−グリシドキシエチルメチル
ジメトキシシラン、β−グリシドキシエチルメチルジェ
トキシシラン、γ−グリシドキシプロピルメチルジメ1
−キシシラン、γ−グリシドキシプロビルメチルジェト
キシシラン、β−グリシドキシプロピルメチルジェトキ
シシラン、T−グリシドキシプロビルエチルジメトキシ
シラン、γ−グリシドキシプロピルエチルジェトキシシ
ラン、β−グリシドキシプロピルエチルジェトキシシラ
ン、β−グリシドキシエチルプロピルジメトキシシラン
、β−(3,4エポキシシクロヘキシル)エチルトリエ
トキシシラン、メチルトリメトキシシラン、メチルトリ
エトキシシラン、ビニルトリメトキシシラン、ビニルト
リエトキシシラン、ビニルトリアセトキシシラン、ビニ
ルトリメトキシエトキシシラン、γ−クロロプロピルト
リメトキシシラン、γ−クロロプロピルトリエトキシシ
ラン、γ−クロロプロピルトリプロポキシシラン、γ−
クロロプロピルトリブトキシシラン、フェニルトリメト
キシシラン、フェニルトリエトキシシラン、γ−トリフ
ロロプロピルトリメトキシシラン、γ−メタクリロキシ
プロピルトリメトキシシラン、ジメチルジメトキシシラ
ン、γ−クロロプロピルメチルジメトキシシラン、γ−
メタクリロキシプロピルメチルジメトキシシランなどが
挙げられる。またこれらの化合物は、単独のみならす2
種以上混合して用いることも可能である。β-glycidoxyethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxyethyltriethoxysilane, β-glycidoxypropyltrimethoxysilane, β-glycidoxyethylmethyldimethoxysilane, β-glycidoxyethylmethyljethoxysilane, γ-glycidoxypropylmethyldime 1
-xysilane, γ-glycidoxypropylmethyljethoxysilane, β-glycidoxypropylmethyljethoxysilane, T-glycidoxypropylethyldimethoxysilane, γ-glycidoxypropylethyljethoxysilane, β- Glycidoxypropylethyljethoxysilane, β-glycidoxyethylpropyldimethoxysilane, β-(3,4 epoxycyclohexyl)ethyltriethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, vinyltrimethoxysilane Ethoxysilane, vinyltriacetoxysilane, vinyltrimethoxyethoxysilane, γ-chloropropyltrimethoxysilane, γ-chloropropyltriethoxysilane, γ-chloropropyltripropoxysilane, γ-
Chloropropyltributoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, γ-trifluoropropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, dimethyldimethoxysilane, γ-chloropropylmethyldimethoxysilane, γ-
Examples include methacryloxypropylmethyldimethoxysilane. In addition, these compounds may be used alone or in combination with 2
It is also possible to use a mixture of more than one species.
上記有機ケイ素化合物の使用に際しては、そのまま成分
として添加することもできるし、あらかじめ加水分解を
行なった後、添加して使用することも可能である。また
、加水分解に際しては、通常の方法、例えば、塩酸等の
無機酸、酢酸等の有 □機酸、カセイソーダのようなア
ルカリ、あるいは水のみを用いて加水分解する方法を利
用することができる。When using the above-mentioned organosilicon compound, it can be added as a component as it is, or it can be added after being hydrolyzed in advance. Further, for hydrolysis, a conventional method can be used, for example, a method of hydrolysis using an inorganic acid such as hydrochloric acid, an organic acid such as acetic acid, an alkali such as caustic soda, or only water.
また、該有機ケイ素化合物の被膜における硬度を向上さ
せる目的で一般式が、
AQ−Xo−Y3□ (ここでXは、低級アルコキシ基
、Yは、MI C0CHコC0M2およびM3C0CR
2COOM 4からなる群から選ばれた化合物から生ず
る配位子(Ml 、M2、M3およびM4は低級アルキ
ル基、nは0.1または2である)で表わされるアルミ
ニウムキレート化合物を添加することが好ましい。In addition, for the purpose of improving the hardness of the film of the organosilicon compound, the general formula is AQ-Xo-Y3□ (where X is a lower alkoxy group, Y is MI C0CH, C0M2, and M3C0CR).
It is preferred to add an aluminum chelate compound represented by a ligand derived from a compound selected from the group consisting of 2COOM 4 (Ml, M2, M3 and M4 are lower alkyl groups, n is 0.1 or 2) .
かかるアルミニウムキレート化合物は各種の化合物が使
用できるが、触媒活性、組成物中の溶解性および安定性
の点から好ましい例としては、アルミニウムアセチルア
セトナート、アルミニウムエチルアセトアセテートビス
アセチルアセトナート、アルミニウムビスアセトアセテ
ートアセチルアトナート、アルミニウムジn−ブトキシ
ドモノエチルアセテート、アルミニウムジ−ミープロポ
キシドモノメチルアセトアセテートなどが挙げられ、こ
れらの化合物の混合物を用いることもできる。Various types of aluminum chelate compounds can be used, but preferred examples from the viewpoint of catalytic activity, solubility in the composition, and stability are aluminum acetylacetonate, aluminum ethyl acetoacetate bisacetylacetonate, and aluminum bisacetoacetate. Examples include acetate acetylatonate, aluminum di-n-butoxide monoethyl acetate, aluminum di-propoxide monomethyl acetoacetate, and mixtures of these compounds can also be used.
本発明の被膜は通常は各々次のような割合で用いられる
成分で組成物を形成する。これらはいずれも固形分量と
して各々ポリマーを100重同部に対して有機ケイ素化
合物は0.5〜500重量部の範囲で用いられる。有機
ケイ素化合物が0゜5重量部よりも少ないと記録層形成
時に塗布溶媒が浸透して基板を侵してしまう。また50
0重量部よりも多くなると被膜にむらが生じて記録層形
成がむずかしくなる。より好ましくは10〜400重量
部である。またアルミニウムにキレート化合物を使用す
る際には0.05〜30重量部の範囲内で用いられるこ
とが好ましい。0.05重量部より少ない場合は耐溶剤
性、密着性が不充分となる場合があり、30重量部より
多くなると被膜の透明性が不充分となるなどの原因とな
る。より好ましい範囲としては0.1〜20重量部であ
る。The coating of the present invention is typically formed from a composition of components used in the following proportions. In all of these, the organosilicon compound is used in a solid content range of 0.5 to 500 parts by weight per 100 parts by weight of the polymer. If the amount of the organosilicon compound is less than 0.5 parts by weight, the coating solvent will penetrate and attack the substrate during formation of the recording layer. 50 again
If the amount is more than 0 parts by weight, unevenness will occur in the coating, making it difficult to form a recording layer. More preferably, it is 10 to 400 parts by weight. Moreover, when using a chelate compound for aluminum, it is preferable to use it within the range of 0.05 to 30 parts by weight. If it is less than 0.05 parts by weight, solvent resistance and adhesion may be insufficient, and if it is more than 30 parts by weight, the transparency of the film may be insufficient. A more preferable range is 0.1 to 20 parts by weight.
本発明の被膜には前)ホした成分の他にざらに添加剤、
各種改質剤などを含有させることも可能である。In addition to the ingredients mentioned above, the coating of the present invention also contains additives,
It is also possible to contain various modifiers.
添加剤としては、表面平滑性を改良する目的で各種の界
面活性剤が使用可能であり、実例としてはシリコーン系
化合物、フッ素系界面活性剤、有機界面活性剤などが使
用できる。ざらに改質剤としてはエチルシリケート、n
−プロピルシリケート、1−プロピルシリケート、n−
ブチルシリケート、i−ブチルシリケート、t−ブチル
シリケートなどの4官能シラン化合物も添加することが
可能である。As additives, various surfactants can be used for the purpose of improving surface smoothness, and examples include silicone compounds, fluorine surfactants, and organic surfactants. As a rough modifier, ethyl silicate, n
-propyl silicate, 1-propyl silicate, n-
It is also possible to add tetrafunctional silane compounds such as butyl silicate, i-butyl silicate, t-butyl silicate.
また他の改質剤として添加可能なものは各種エポキシ樹
脂、メラミン樹脂、アミド樹脂などがある。Other modifiers that can be added include various epoxy resins, melamine resins, and amide resins.
本発明の被膜の膜厚は、通常は0.005μm〜0.1
μmの範囲で好ましく適用される。0゜005μm未満
では、充分な耐溶剤性が得られない傾向にあり、逆に0
.1μmより厚くなると、基板に形成されたグループが
埋められる危険性が大きいため、トラッキング信号を太
きくifることが困難となる。なお、グループのない基
板においては、10μmまでの膜厚が好ましく適用され
る。The film thickness of the film of the present invention is usually 0.005 μm to 0.1 μm.
It is preferably applied in the μm range. If the diameter is less than 0.005 μm, sufficient solvent resistance tends to not be obtained;
.. If it is thicker than 1 μm, there is a great risk that the groups formed on the substrate will be buried, making it difficult to make the tracking signal thicker. Note that for a substrate without groups, a film thickness of up to 10 μm is preferably applied.
本発明の被膜は有機ケイ素化合物の他にポリマーを使用
しているため十分な可どう性を有しており、急激な温度
変化あるいは、衝撃によって容易に亀裂が入るものでは
ない。Since the coating of the present invention uses a polymer in addition to an organosilicon compound, it has sufficient flexibility and does not easily crack due to sudden temperature changes or impacts.
本発明の製造方法において使用されるポリマーおよび有
機ケイ素化合物などを溶解する溶媒としては、樹脂製の
基板を侵さない溶媒であればよいが、アルコール類、セ
ロソルブ類、ジメチルスルホキシド、水などが挙げられ
る。これらの溶媒は単独のみならず2種以上混合して用
いることも可能である。またコーティング法としては例
えばハケ塗り、浸漬塗り、スピンコーティング、流し塗
り、スプレー塗装、ロール塗装、カーテン70−塗装な
どの公知の方法を用いることが可能である。The solvent for dissolving the polymer, organosilicon compound, etc. used in the production method of the present invention may be any solvent that does not attack the resin substrate, and examples thereof include alcohols, cellosolves, dimethyl sulfoxide, water, etc. . These solvents can be used not only alone but also in combination of two or more. Further, as a coating method, it is possible to use known methods such as brush coating, dip coating, spin coating, flow coating, spray coating, roll coating, curtain 70-coating, and the like.
また本発明に使用できる基体は、光記録媒体に通常使用
される、アクリル基板、ポリカーボネート基板、エポキ
シ樹脂基板などのプラスチック基体である。Substrates that can be used in the present invention are plastic substrates, such as acrylic substrates, polycarbonate substrates, and epoxy resin substrates, which are commonly used for optical recording media.
さらに、基体表面がプラズマ処理されていれば基板表面
と被膜との接着性が向上しより好ましい結果を与える。Furthermore, if the substrate surface is plasma-treated, the adhesion between the substrate surface and the coating will be improved, giving more favorable results.
[実施例] 以下、本発明を具体的な実施例によって説明する。[Example] The present invention will be explained below using specific examples.
実施例1
(1)γ−グリシドキシプロピルトリメトキシシラン加
水分解物の調製
回転子を備えた反応器中にγ−グリシドキシプロピルト
リメトキシシラン236qを仕込み、液温を10’Cに
保ち、マグネチツクスターラーで撹拌しながら0.(1
1規定塩酸水溶液54CIを徐々に滴下する。滴下終了
後冷却をやめて、γ−グリシドキシプロピル1〜リメト
キシシラン加水分解物を得た。Example 1 (1) Preparation of γ-glycidoxypropyltrimethoxysilane hydrolyzate 236q of γ-glycidoxypropyltrimethoxysilane was charged into a reactor equipped with a rotor, and the liquid temperature was maintained at 10'C. , while stirring with a magnetic stirrer. (1
54 CI of 1N hydrochloric acid aqueous solution was gradually added dropwise. After the dropwise addition was completed, cooling was stopped to obtain a hydrolyzate of γ-glycidoxypropyl 1-rimethoxysilane.
(2) 塗布液の調整
ヒドロキシプロピルセルロース12.50をメタノール
964.5CIに攪拌溶解した後、前記γ−グリシドキ
シプロピルトリメトキシシラン加水分解物21.70と
アルミニウムアセチルアセトナート0.130を加え、
十分攪拌混合して塗布液とした。(2) Preparation of coating solution After stirring and dissolving 12.50% of hydroxypropyl cellulose in 964.5CI of methanol, 21.70% of the γ-glycidoxypropyltrimethoxysilane hydrolyzate and 0.130% of aluminum acetylacetonate were added. ,
The mixture was thoroughly stirred and mixed to prepare a coating solution.
(3) 塗布およびキュア
前項塗布液を用い、ポリカーボネート基板上にスピンコ
ード法(1St −1500rpm / 10Sec
。(3) Coating and curing Using the coating solution described above, spin code method (1St - 1500rpm / 10Sec
.
2nd−3ooorpm /20sec )で塗布し、
90℃で4時間加熱キュアを行なった。2nd-3ooorpm/20sec),
Heat curing was performed at 90°C for 4 hours.
(4〉 試験結果 塗布したポリカーボネート基板は次の試験を行なった。(4) Test results The coated polycarbonate substrate was subjected to the following tests.
結果を第1表に示す。The results are shown in Table 1.
■耐溶剤性試験
ジメヂルホルムアミド、1,2−ジクロロエタン酢酸エ
チル、ピリジンの各溶剤を塗膜上に落として基板の溶解
あるいは白化が起きるかどうか目視で観察した。(2) Solvent Resistance Test Solvents dimethylformamide, 1,2-dichloroethaneethyl acetate, and pyridine were dropped onto the coating film, and it was visually observed whether the substrate dissolved or whitened.
◎外観 肉眼観察で透明度、塗布むらの有無などを調べた。◎Appearance Transparency, presence of uneven coating, etc. were examined with the naked eye.
O基板への色素の溶解拡散性試験
被膜の上にシ、アニン色素(日本感光色素製品、NK−
2(114,2,0wt%、1,2−ジクロロエタン溶
ts)の記録媒体をスピンコード法で被膜を形成した時
の基板と被膜の状態を目視で観察した。Dye dissolution and diffusion test film on O substrate
2 (114,2,0 wt%, dissolved in 1,2-dichloroethane) on a recording medium using a spin code method, and the state of the substrate and the coating was visually observed.
実施例2
(1) 塗布液の調整
アセチルセルロース12.5gをエチレングリコール七
ツメチルエーテル919.9CIに攪拌溶解した後、実
施例1のγ−グリシドキシプロピルトリメトキシシラン
加水分解物65.1qとアルミニウムアセチルアセトナ
ート2.50を加え、十分攪拌混合して塗布液とした。Example 2 (1) Preparation of coating solution After stirring and dissolving 12.5 g of acetyl cellulose in 919.9 CI of ethylene glycol methyl ether, 65.1 q of the γ-glycidoxypropyltrimethoxysilane hydrolyzate of Example 1 was added. 2.50% of aluminum acetylacetonate was added and thoroughly stirred and mixed to prepare a coating solution.
(2)塗布およびキュア
前項塗布液を用い、実施例1に準じて塗布し、120℃
で1時間加熱キュアを行なった。(2) Coating and curing Using the coating solution described above, apply according to Example 1, and cure at 120°C.
Heat curing was performed for 1 hour.
(3) 試験結果
実施例1に準じて試験を行なった。結果を@1表に示す
。(3) Test results Tests were conducted according to Example 1. The results are shown in Table @1.
実施例3
実施例1のポリカーボネート基板を以下に示す方法でプ
ラズマ処理を施して用いた以外は、すべて実施例1と同
様に行なった。結果を第1表に示す。Example 3 Everything was carried out in the same manner as in Example 1, except that the polycarbonate substrate of Example 1 was subjected to plasma treatment by the method shown below. The results are shown in Table 1.
ガ ス二M素
ガス流量:100CC/分
出 力;50W
処理時間:5分
実施例4
実施例1の塗布液の調整でアルミニウムアセチルアセト
ナートを除いた以外は、すべて実施例1と同様に行なっ
た。結果を第1表に示す。Gas diM gas flow rate: 100 CC/min Output: 50 W Processing time: 5 minutes Example 4 All procedures were performed in the same manner as in Example 1 except that aluminum acetylacetonate was removed from the preparation of the coating solution in Example 1. Ta. The results are shown in Table 1.
比較例1
ヒドロキシプロピルセルロース25.0CIをメタノー
ル975.0CIに攪拌溶解して塗15液を調整した以
外はすべて実施例1と同様に行なった。Comparative Example 1 The same procedure as in Example 1 was carried out except that 25.0 CI of hydroxypropyl cellulose was stirred and dissolved in 975.0 CI of methanol to prepare coating liquid 15.
結果を第1表に示す。The results are shown in Table 1.
比較例2
被膜を塗布しないポリカーボネート基板について行なっ
た。その結果を第1表に示す。Comparative Example 2 A test was carried out on a polycarbonate substrate to which no film was applied. The results are shown in Table 1.
本発明の光記録用基板を用いれば溶剤によって樹脂製基
体が侵されず、かつ可撓性に優れ、また色素が拡散する
ことなく記録層を形成することができる。By using the optical recording substrate of the present invention, the resin substrate is not attacked by solvents, has excellent flexibility, and a recording layer can be formed without dye diffusion.
また本発明の光記録用基板の製造方法は、基体への被膜
形成がコーティングによって簡単にできるため、生産性
に優れる。Further, the method for manufacturing an optical recording substrate of the present invention has excellent productivity because a film can be easily formed on the substrate by coating.
Claims (12)
とから得られる被膜を積層してなることを特徴とする光
記録用基板。(1) An optical recording substrate characterized by being formed by laminating a coating made of a polymer and an organosilicon compound on a resin substrate.
ーであることを特徴とする特許請求の範囲第(1)項記
載の光記録用基板。(2) The optical recording substrate according to claim (1), wherein the polymer is a polymer having a hydrogen-bonding functional group.
ニルアルコール、ポリビニルピリジン、ポリビニルピロ
リドン、ヒドロキシエチルセルロース、アセチルセルロ
ース、メチルセルロース、ヒドロキシプロピルセルロー
スおよびヒドロキシブチルセルロースから選ばれる一種
以上であることを特徴とする特許請求の範囲第(2)項
記載の光記録用基板。(3) The polymer having a hydrogen-bonding functional group is one or more selected from polyvinyl alcohol, polyvinylpyridine, polyvinylpyrrolidone, hydroxyethylcellulose, acetylcellulose, methylcellulose, hydroxypropylcellulose, and hydroxybutylcellulose. An optical recording substrate according to claim (2).
して0.5〜500重量部の割合で含有されることを特
徴とする特許請求の範囲第(1)項記載の光記録用基板
。(4) The optical recording substrate according to claim (1), wherein the organosilicon compound is contained in a proportion of 0.5 to 500 parts by weight per 100 parts by weight of the polymer.
れる化合物であることを特徴とする特許請求の範囲第(
1)項記載の光記録用基板。 R^1R^2_aSi(OR^3)_3_−_a(A) (式中、R^1は炭素数1〜10の有機基、R^2は、
炭素数1〜6のアルキル基、またはハロゲン化アルキル
基、R^3は炭素数1〜8のアルキル基、アルコキシア
ルキル基またはアシル基である。aは0または1である
。)(5) The organosilicon compound is a compound represented by the following general formula (A),
1) The optical recording substrate described in item 1). R^1R^2_aSi(OR^3)_3_-_a(A) (wherein, R^1 is an organic group having 1 to 10 carbon atoms, R^2 is,
R^3 is an alkyl group having 1 to 6 carbon atoms or a halogenated alkyl group, and R^3 is an alkyl group having 1 to 8 carbon atoms, an alkoxyalkyl group, or an acyl group. a is 0 or 1. )
れる化合物の加水分解物であることを特徴とする特許請
求の範囲第(1)項記載の光記録用基板。 R^1R^2_aSi(OR^3)_3_−_a(A) (式中、R^1は炭素数1〜10の有機基、R^2は、
炭素数1〜6のアルキル基、またはハロゲン化アルキル
基、R^3は炭素数1〜8のアルキル基、アルコキシア
ルキル基またはアシル基である。aは0または1である
。)(6) The optical recording substrate according to claim (1), wherein the organosilicon compound is a hydrolyzate of a compound represented by the following general formula (A). R^1R^2_aSi(OR^3)_3_-_a(A) (wherein, R^1 is an organic group having 1 to 10 carbon atoms, R^2 is,
R^3 is an alkyl group having 1 to 6 carbon atoms or a halogenated alkyl group, and R^3 is an alkyl group having 1 to 8 carbon atoms, an alkoxyalkyl group, or an acyl group. a is 0 or 1. )
ソルブ類、水から選ばれる少なくとも一種を溶媒とした
ポリマーと有機ケイ素化合物との溶液をコーティングす
ることを特徴とする光記録用基板の製造方法。(7) Production of an optical recording substrate characterized by coating a resin substrate with a solution of a polymer and an organosilicon compound using at least one selected from aliphatic lower alcohols, cellosolves, and water as a solvent. Method.
ーであることを特徴とする特許請求の範囲第(7)項記
載の光記録用基板の製造方法。(8) The method for producing an optical recording substrate according to claim (7), wherein the polymer is a polymer having a hydrogen-bonding functional group.
ニルアルコール、ポリビニルピリジン、ポリビニルピロ
リドン、ヒドロキシエチルセルロース、アセチルセルロ
ース、メチルセルロース、ヒドロキシプロピルセルロー
スおよびヒドロキシブチルセルロースから選ばれる一種
以上であることを特徴とする特許請求の範囲第(8)項
記載の光記録用基板の製造方法。(9) The polymer having a hydrogen-bonding functional group is one or more selected from polyvinyl alcohol, polyvinylpyridine, polyvinylpyrrolidone, hydroxyethylcellulose, acetylcellulose, methylcellulose, hydroxypropylcellulose, and hydroxybutylcellulose. A method for manufacturing an optical recording substrate according to claim (8).
対して0.5〜500重量部の割合で含有されているこ
とを特徴とする特許請求の範囲第(7)項記載の光記録
用基板の製造方法。(10) The optical recording substrate according to claim (7), wherein the organosilicon compound is contained in a proportion of 0.5 to 500 parts by weight per 100 parts by weight of the polymer. Production method.
される化合物であることを特徴とする特許請求の範囲第
(7)項記載の光記録用基板の製造方法。 R^1R^2_aSi(OR^3)_3_−_a(A) (式中、R^1は炭素数1〜10の有機基、R^2は、
炭素数1〜6のアルキル基、またはハロゲン化アルキル
基、R^3は炭素数1〜8のアルキル基、アルコキシア
ルキル基またはアシル基である。aは0または1である
。)(11) The method for producing an optical recording substrate according to claim (7), wherein the organosilicon compound is a compound represented by the following general formula (A). R^1R^2_aSi(OR^3)_3_-_a(A) (wherein, R^1 is an organic group having 1 to 10 carbon atoms, R^2 is,
R^3 is an alkyl group having 1 to 6 carbon atoms or a halogenated alkyl group, and R^3 is an alkyl group having 1 to 8 carbon atoms, an alkoxyalkyl group, or an acyl group. a is 0 or 1. )
される化合物の加水分解物であることを特徴とする特許
請求の範囲第(7)項記載の光記録用基板の製造方法。 R^1R^2_aSi(OR^3)_3_−_a(A) (式中、R^1は炭素数1〜10の有機基、R^2は、
炭素数1〜6のアルキル基、またはハロゲン化アルキル
基、R^3は炭素数1〜8のアルキル基、アルコキシア
ルキル基またはアシル基である。aは0または1である
。)(12) The method for producing an optical recording substrate according to claim (7), wherein the organosilicon compound is a hydrolyzate of a compound represented by the following general formula (A). R^1R^2_aSi(OR^3)_3_-_a(A) (wherein, R^1 is an organic group having 1 to 10 carbon atoms, R^2 is,
R^3 is an alkyl group having 1 to 6 carbon atoms or a halogenated alkyl group, and R^3 is an alkyl group having 1 to 8 carbon atoms, an alkoxyalkyl group, or an acyl group. a is 0 or 1. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62124574A JPS63288784A (en) | 1987-05-21 | 1987-05-21 | Substrate for optical recording and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62124574A JPS63288784A (en) | 1987-05-21 | 1987-05-21 | Substrate for optical recording and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63288784A true JPS63288784A (en) | 1988-11-25 |
Family
ID=14888843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62124574A Pending JPS63288784A (en) | 1987-05-21 | 1987-05-21 | Substrate for optical recording and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63288784A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0412539A2 (en) * | 1989-08-11 | 1991-02-13 | Hitachi Maxell Ltd. | Thermal recording medium |
-
1987
- 1987-05-21 JP JP62124574A patent/JPS63288784A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0412539A2 (en) * | 1989-08-11 | 1991-02-13 | Hitachi Maxell Ltd. | Thermal recording medium |
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