JPS63286809A - Base plate exposing device - Google Patents

Base plate exposing device

Info

Publication number
JPS63286809A
JPS63286809A JP62121095A JP12109587A JPS63286809A JP S63286809 A JPS63286809 A JP S63286809A JP 62121095 A JP62121095 A JP 62121095A JP 12109587 A JP12109587 A JP 12109587A JP S63286809 A JPS63286809 A JP S63286809A
Authority
JP
Japan
Prior art keywords
base plate
mask
pale
dark
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62121095A
Other languages
Japanese (ja)
Other versions
JPH0677097B2 (en
Inventor
Kenji Aiko
Hidekuni Sugimoto
Original Assignee
Hitachi Electronics Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Eng Co Ltd filed Critical Hitachi Electronics Eng Co Ltd
Priority to JP62121095A priority Critical patent/JPH0677097B2/en
Publication of JPS63286809A publication Critical patent/JPS63286809A/en
Publication of JPH0677097B2 publication Critical patent/JPH0677097B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Abstract

PURPOSE: To easily perform positioning of a light transmissive base plate to be exposed and a mask, by placing focuses on reflection marks on the base plate and the mask through the contrast between the dark and pale patterns projected upon the plate and mask.
CONSTITUTION: A light transmissive plate 17 which is positioned on the optical axis of a projecting optical system and provided with dark and pale patterns on both surfaces is provided and the dark and pale patterns respectively projected on a base plate 12 to be exposed and mask 13 are received by means of an image sensor 20. Focalizing operations of the base plate and mask are carried out by moving the base plate, mask and an observing optical system relatively to each other so that average contrast values of the dark and pale patterns projected on the surface or back of the base plate 12 and a reflection mark 11 can become equal to each other. Therefore, even if the transmissive base plate having a lower reflectivity is on one side, focalizing operations can be carried out easily and accurate positioning can be made.
COPYRIGHT: (C)1988,JPO&Japio
JP62121095A 1987-05-20 1987-05-20 Substrate exposure system Expired - Lifetime JPH0677097B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62121095A JPH0677097B2 (en) 1987-05-20 1987-05-20 Substrate exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62121095A JPH0677097B2 (en) 1987-05-20 1987-05-20 Substrate exposure system

Publications (2)

Publication Number Publication Date
JPS63286809A true JPS63286809A (en) 1988-11-24
JPH0677097B2 JPH0677097B2 (en) 1994-09-28

Family

ID=14802752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62121095A Expired - Lifetime JPH0677097B2 (en) 1987-05-20 1987-05-20 Substrate exposure system

Country Status (1)

Country Link
JP (1) JPH0677097B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112123A (en) * 1989-09-27 1991-05-13 Canon Inc Aligner
JPH0934134A (en) * 1995-07-19 1997-02-07 Nikon Corp Alignment device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112123A (en) * 1989-09-27 1991-05-13 Canon Inc Aligner
JPH0934134A (en) * 1995-07-19 1997-02-07 Nikon Corp Alignment device

Also Published As

Publication number Publication date
JPH0677097B2 (en) 1994-09-28

Similar Documents

Publication Publication Date Title
JPS57192929A (en) Projector provided with automatic focusing function
JPS63133625A (en) Alignment device
JPH02292813A (en) Automatic focussing device
JPS647618A (en) Method and apparatus for exposing semiconductor
JPS63286809A (en) Base plate exposing device
JPS63286810A (en) Base plate exposing device
JPS61210627A (en) Pinhole plate for measuring effective light source
JPS62114222A (en) Exposing apparatus
JPH04348019A (en) Focus position detecting device
JPH02191314A (en) Pattern detector
JPH0412207A (en) Position detector
JPS60107130A (en) Position indicating device
JPH02130910A (en) Alignment
JPS62149129A (en) Reducing projection-type alignment system
JPS6251219A (en) Clearance setting instrument
JPH02110914A (en) Exposing device
JPS58134640A (en) Matching mechanism for exposing device
JPS6375535A (en) Chromatoscanner
JPS58195833A (en) Image pickup device for carved character
JPH01240803A (en) Detecting apparatus for pattern position
JPS61100931A (en) Method of exposing semiconductor
JPS5677812A (en) Method of positioning optical-path splitting prism of focusing detector on photodetector substrate
JPH04157468A (en) Projection aligner
JPS59155812A (en) Focusing device
JPS62149128A (en) Exposure device