JPS63286337A - Insulating molding with metallic luster - Google Patents
Insulating molding with metallic lusterInfo
- Publication number
- JPS63286337A JPS63286337A JP12093087A JP12093087A JPS63286337A JP S63286337 A JPS63286337 A JP S63286337A JP 12093087 A JP12093087 A JP 12093087A JP 12093087 A JP12093087 A JP 12093087A JP S63286337 A JPS63286337 A JP S63286337A
- Authority
- JP
- Japan
- Prior art keywords
- molding
- film
- metal
- deposited layer
- metal deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000465 moulding Methods 0.000 title claims abstract description 28
- 239000002932 luster Substances 0.000 title claims abstract description 17
- 238000009413 insulation Methods 0.000 claims abstract description 6
- 239000011104 metalized film Substances 0.000 claims description 8
- 239000002184 metal Substances 0.000 abstract description 27
- 229910052751 metal Inorganic materials 0.000 abstract description 27
- -1 polyethylene terephthalate Polymers 0.000 abstract description 8
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract description 5
- 239000005020 polyethylene terephthalate Substances 0.000 abstract description 5
- 229920005989 resin Polymers 0.000 abstract description 5
- 239000011347 resin Substances 0.000 abstract description 5
- 230000008018 melting Effects 0.000 abstract description 2
- 238000002844 melting Methods 0.000 abstract description 2
- 239000004800 polyvinyl chloride Substances 0.000 abstract description 2
- 229920000915 polyvinyl chloride Polymers 0.000 abstract description 2
- 206010014357 Electric shock Diseases 0.000 abstract 1
- 229910052797 bismuth Inorganic materials 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910000510 noble metal Inorganic materials 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 23
- 239000010408 film Substances 0.000 description 20
- 230000015556 catabolic process Effects 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 4
- 239000011888 foil Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Decoration Of Textiles (AREA)
- Insulating Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は金属光沢性モールに関し、特にテレビ、VT
R等の電子機器の外枠の装飾用モールとして使用すれば
有益な金属光沢を有する絶縁性モールに係るものである
。[Detailed Description of the Invention] (Industrial Application Field) This invention relates to a metallic luster molding, particularly for televisions and VTs.
This invention relates to an insulating molding having a metallic luster that is useful when used as a decorative molding for the outer frame of electronic equipment such as R.
(従来の技術)
従来、テレビ、VTR等の電子機器の外枠の装飾用とし
て金属光沢性モールが使用されているが、これは、A4
箔又はAI蒸着フィルムをモール成形用樹脂と貼合せて
モール成形したシ、あるいはモール成形と同時にそれら
を貼合せて加工している0(発明が解決しようとする間
頒点)
しかし上記従来のモールをテレビ、VTR等の電子機器
に使用した場合、Al箔又は金属蒸着フィルムの金属蒸
着層に電荷が帯電し、人がこれに接触すると電撃が起っ
たシ、また逆に人体に帯電した電荷によシミ子機器を破
壊することがある0そこでAd箔を使用する場合は通常
アースがとられておシ、またAJ蒸着フィルムを使用す
る場合はアースをとることは実際上困難であシ、常に上
記した電撃の起こる危険性がある。(Prior Art) Conventionally, metallic gloss molding has been used to decorate the outer frame of electronic devices such as televisions and VTRs.
The mold is formed by laminating foil or AI vapor-deposited film with resin for molding molding, or the two are laminated together at the same time as molding. When used in electronic equipment such as televisions and VTRs, the metal deposited layer of the aluminum foil or metal deposited film is charged with electric charge, and when a person comes into contact with it, an electric shock occurs, and conversely, the electric charge charged on the human body Therefore, when using Ad foil, it is usually grounded, and when using AJ vapor deposition film, it is practically difficult to ground. There is always a risk of the electric shock mentioned above occurring.
この発明はこのような欠点を除去したもので、金属光沢
を有しているKもかかわらず絶縁性であシ、従って電撃
が起こることもなくもちろんアースも不要である金属光
沢を有する絶縁性モールを提供するものである。This invention eliminates these drawbacks, and provides an insulating molding with a metallic luster that is insulating despite having a metallic luster, and thus does not cause electric shock and of course does not require grounding. It provides:
(問題点を解決するための手段)
この発明は、モール本体とそれに貼合せてなる金属蒸着
フィルムとからなる金属光沢性モールにおいて、金属蒸
着フィルムの金属蒸着層を島状構造としてif!、R性
をもたせたことを特徴とする、金属光沢を有する絶縁性
モールである。(Means for Solving the Problems) The present invention provides a metallic luster molding consisting of a molding body and a metallized film bonded thereto, in which the metallized layer of the metallized film is formed into an island-like structure. , an insulating molding with metallic luster, characterized by having R properties.
この発明は、モール本体に金属光沢性を付与するために
、塩化ビニルシート等のモール本体にモール成形と同時
に貼合せたシ、あるいはモール成形用樹脂とあらかじめ
貼合せてその後モール成形したシする場合K、使用する
金属蒸着フィルム特に金属蒸着フィルムの金属蒸着層を
島状構造として絶縁性をもたせた点に大きな特徴を有す
るものである。In order to impart metallic luster to the molding body, this invention is applicable to the case where the molding body is laminated to a molding body such as a vinyl chloride sheet at the same time as molding the molding, or when it is laminated with resin for molding molding in advance and then molded. A major feature is that the metal vapor deposited film used, particularly the metal vapor deposited layer of the metal vapor deposited film, is made into an island structure to provide insulation properties.
モール本体と金属蒸着フィルムとの貼合せは、金属蒸着
フィルムのフィルム側又は金属蒸着層側のいずれが外側
又は内側であってもよい。金属蒸着層上にはもちろん着
色又は未着色の保護層があってもよい。また、金属蒸着
フィルムは他のプラスチックフィルム等と貼着したシし
たものであってもよい。The molding body and the metallized film may be bonded to each other on either the film side of the metallized film or the metallized layer side on the outside or inside. A colored or uncolored protective layer may of course be present on the metallized layer. Further, the metallized film may be a sheet pasted with another plastic film or the like.
金属蒸着フィルムに使用するフィルムとしては、ポリエ
チレンテレフタレートフィルム、ポリプロピレンフィル
ム、ポリエチレンフィルム、ポリ塩化ビニルフィルム、
その他各種のプラスチックフィルムが使用できる。Films used for metallized films include polyethylene terephthalate film, polypropylene film, polyethylene film, polyvinyl chloride film,
Various other plastic films can be used.
金属蒸着層は真空蒸着、スパッタリング、イオンブレー
ティング等の従来公知の薄膜生成法によシ設ける。金属
蒸着層は薄膜生成過程でいえば「核生成」から「被結合
」、「初期島状構造」を経た後の島状構造となるように
設ける。The metal vapor deposition layer is provided by a conventionally known thin film forming method such as vacuum deposition, sputtering, or ion blasting. In terms of the thin film production process, the metal vapor deposition layer is provided so as to form an island structure after passing through "nucleation", "bonding", and "initial island structure".
この発明は金属蒸着層の構造を島状構造とすることによ
シ、金属を使用しているにもかかわらず絶縁性のものと
したものである。島状構造における島のサイズは200
人〜1μm程度とする。 島のサイズが200λよシ小
さいと美麗な金属光沢が得られない。島のサイズが1μ
mを超えると島と島とが接して一体となってきて絶縁性
が低下する。In this invention, the structure of the metal vapor deposited layer is made into an island-like structure, thereby making the layer insulating even though metal is used. The size of the island in the island structure is 200
It should be about 1 μm for humans. If the size of the island is smaller than 200λ, a beautiful metallic luster cannot be obtained. Island size is 1μ
If it exceeds m, the islands will come into contact with each other and become a single piece, resulting in a decrease in insulation properties.
島の間隔は1001〜5oooXとする0島の間隔が1
001よシ小さいとトンネル電流が流れ絶縁性が悪い。The spacing between islands is 1001 to 5oooX. The spacing between 0 islands is 1.
If it is smaller than 001, tunnel current will flow and the insulation will be poor.
島の間隔がs o o oXよシ大きいと全体としての
金属の量が少なく美麗な金属光沢は得られない。If the spacing between the islands is larger than s o o o x, the amount of metal as a whole will be small and a beautiful metallic luster will not be obtained.
また、島の間隔が5oooiを超えると、金属蒸着層の
平面方向の密度が粗となシ耐摩耗性が低下する0
この発明の金属蒸着層の島状構造を得るには、蒸発速度
、蒸着膜厚等を制御する必要がある。この発明の島のサ
イズや間隔を得るための制御は使用する金属によシ難易
がある。大ざっばKいえば融点の低い金属や貴金礒は制
御が比較的容易であ〕、中でもSn、 Pbs Zn、
Bi等はこの発明には特に好ましい。また、T1、C
r%Fe%Co、Ni等の遷移金属やSi、Ge等の牛
導体金属は制御は比較的容易でない0
この発明の島状構造の金属蒸着層の生成は、金属の凝集
エネルギーと吸着エネルギーとの関係の制御にかかつて
おシ、そのために各種の蒸着条件の制御を要するもので
あるが、一般的には蒸発速度を速くする程島のサイズは
小さくなる傾向にある0しかし蒸着膜厚の影響は特に大
きい。Furthermore, if the distance between the islands exceeds 5oooi, the density of the metal vapor deposited layer in the plane direction becomes coarse and the wear resistance decreases. It is necessary to control the film thickness, etc. Controlling the size and spacing of the islands in this invention is difficult depending on the metal used. Generally speaking, metals with low melting points and precious metals are relatively easy to control, especially Sn, Pbs, Zn,
Bi and the like are particularly preferred for this invention. Also, T1, C
It is not relatively easy to control transition metals such as Co and Ni and conductor metals such as Si and Ge.The generation of the metal vapor deposited layer with the island-like structure of the present invention depends on the cohesive energy and adsorption energy of the metal. In order to control the relationship between is especially large.
この発明に使用する代表的金属であるSn゛の場合、S
4着層の光線透過率が3〜113%よ〕少ないと絶縁破
壊電圧が100OVK達せず、光線透過率が15%を超
えると絶縁破壊電圧は12ooov以上となるが、美麗
な金属光沢がなくなる。美麗な金属光沢を得るにはan
蒸着1層の場合光沢度で大体SSO%以上を要するので
あるが、Sn蒸着層の光線透過率が15%以下であれば
光沢度が350%以上となるものである。しかし、Sn
蒸着層の光線透過率が5〜10%よ〕少ないと光沢度は
450%以上ともなるのであるが、絶縁破壊電圧は10
(IOVに達しなくなるものである。In the case of Sn, which is a typical metal used in this invention, S
If the light transmittance of the fourth layer is less than 3 to 113%, the dielectric breakdown voltage will not reach 100OVK, and if the light transmittance exceeds 15%, the dielectric breakdown voltage will be 12ooov or more, but the beautiful metallic luster will be lost. To obtain a beautiful metallic luster an
In the case of a single vapor deposited layer, a gloss level of approximately SSO% or higher is required, but if the light transmittance of the Sn vapor deposited layer is 15% or lower, the gloss level will be 350% or higher. However, Sn
If the light transmittance of the vapor-deposited layer is as low as 5 to 10%, the gloss will be 450% or more, but the dielectric breakdown voltage will be 10%.
(IOV will no longer be reached.
(実施例)
厚さ12μmの長尺なポリエチレンテレフタレートフィ
ルムの片面に、半連続式真空蒸着機を使用して釦蒸着層
を真空蒸着によシ下記の蒸着条件にて下記の島状構造に
設けて実施例1、実施例2とし、さらにこれら実施例の
Sn蒸着層上にロールコ−ターによシ塩ビ酢ビ共重合体
樹脂を2μmの厚さに塗布し、200μm厚の塩化ビニ
ルフィルムと加熱、加圧ラミネートした0その後このよ
うにして得られたものを1tll’1幅にスリットし、
塩化ビニル樹脂によるモール成形と同時に塩化ビニルフ
ィルムを内側としポリエチレンテレフタレートフィルム
を外側として貼合せて、金属光沢を有する絶縁性モール
を得た。(Example) A button deposition layer was vacuum deposited on one side of a long polyethylene terephthalate film with a thickness of 12 μm using a semi-continuous vacuum deposition machine, and was provided in the following island-like structure under the following deposition conditions. Example 1 and Example 2 were obtained. Furthermore, a vinyl chloride-vinyl acetate copolymer resin was applied to a thickness of 2 μm using a roll coater on the Sn vapor-deposited layer of these Examples, and then heated with a 200 μm thick vinyl chloride film. , pressure laminated.Then, the thus obtained material was slit into 1tll'1 width.
At the same time as molding the mold with vinyl chloride resin, a vinyl chloride film was attached to the inside and a polyethylene terephthalate film was pasted to the outside to obtain an insulating mold with metallic luster.
東光線透過率はフィルム巻取スピードの制御によシコン
トロールした
※光線透過率は、全光線透過率をJ工5K6714の方
法によシ測定した
※島のサイズについては電子顕微鏡にて蒸着層を観察し
平均的な大きさを表示した
来島の間隔については電子顕微鏡にて蒸着層を観察し平
均的な間隔を表示した
(比較例)
実施例1におけるSn蒸着暦にかえて厚さ500久のA
d蒸着層としたほかは実施例1と同様にして金属光沢性
モールを作成しこれを比較例とした。The light transmittance was controlled by controlling the film winding speed. *The total light transmittance was measured using the method of J Engineering 5K6714. *The size of the islands was determined by measuring the deposited layer using an electron microscope. Regarding the spacing of Kurushima, which was observed and displayed as an average size, the vapor deposited layer was observed with an electron microscope and the average spacing was displayed (comparative example). A
A metallic luster molding was prepared in the same manner as in Example 1, except that the d vapor deposited layer was used, and this was used as a comparative example.
次に、実施例1)実施例2、及び上記比較例における塩
化ビニルフィルムを貼着する前の金属蒸着フィルムを一
部それぞれサンプルとして絶縁破壊電圧を測定した。測
定方法は、サンプルの金属蒸着層表面にsav/の円柱
による電極と7a−肉厚5鰭のガードリング電極を接触
させ、この両電極間に電圧を印加し、放電により金属蒸
着層に孔がおいてポリエチレンテレフタレートフィルム
が露出したときの電圧を測定した。Next, the dielectric breakdown voltage was measured using some of the metal-deposited films in Example 1), Example 2, and the above-mentioned Comparative Example before the vinyl chloride film was attached as samples. The measurement method is to contact the surface of the metal vapor deposited layer of the sample with a sav/cylindrical electrode and a guard ring electrode with a thickness of 5 fins, apply a voltage between these two electrodes, and create holes in the metal vapor deposited layer due to discharge. The voltage when the polyethylene terephthalate film was exposed was measured.
このようセして実施例1、実施例2、及び比較例の場合
の絶縁破壊電圧を測定した結果は次の通りである。また
、それぞれのサンプルにつき表面の光沢度についても測
定した。The results of measuring the dielectric breakdown voltage in Example 1, Example 2, and Comparative Example in this manner are as follows. The surface gloss of each sample was also measured.
(発明の効果)
この発明は、金属蒸着層を島状構造として絶縁性をもた
せたから、1ooov以上もの絶縁破壊電圧を容易に得
ることができるものであシ1従来の単なるA41蒸着層
等を使用した場合とは異なシ、テレビ、VTR等の電子
機器外枠に使用した場合に手を融れても何ら通電するこ
となく安心して使用できると共に、金属光沢も従来と同
様美麗なものが得られるものである。(Effects of the Invention) This invention makes it possible to easily obtain a dielectric breakdown voltage of 100V or more because the metal vapor deposited layer has an island-like structure and has insulating properties. When used on the outer frame of electronic devices such as televisions and VTRs, it can be used safely without any electricity being applied even if the hand melts, and the same beautiful metallic luster as before can be obtained. It is something.
Claims (1)
らなる金属光沢性モールにおいて、金属蒸着フィルムの
金属蒸着層を島状構造として絶縁性をもたせたことを特
徴とする、金属光沢を有する絶縁性モール。An insulating mold with metallic luster, which is composed of a molding body and a metallized film laminated thereon, characterized in that the metallized layer of the metallized film has an island-like structure to provide insulation properties. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12093087A JPS63286337A (en) | 1987-05-18 | 1987-05-18 | Insulating molding with metallic luster |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12093087A JPS63286337A (en) | 1987-05-18 | 1987-05-18 | Insulating molding with metallic luster |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63286337A true JPS63286337A (en) | 1988-11-24 |
JPH0531464B2 JPH0531464B2 (en) | 1993-05-12 |
Family
ID=14798491
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12093087A Granted JPS63286337A (en) | 1987-05-18 | 1987-05-18 | Insulating molding with metallic luster |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63286337A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009022493A1 (en) * | 2007-08-11 | 2009-02-19 | Toplas Co., Ltd. | Decorating method and decorated nonconducting material |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5649294A (en) * | 1979-09-29 | 1981-05-02 | Toppan Printing Co Ltd | Preparation of partially metal deposited transferring foil |
JPS58140729U (en) * | 1982-03-19 | 1983-09-21 | 積水化学工業株式会社 | Adhesive sheet for decorative glass |
JPS605824U (en) * | 1983-06-22 | 1985-01-16 | 筒中プラスチツク工業株式会社 | Patterned laminate with mirror surface and transparent portion |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2550203B2 (en) * | 1975-11-08 | 1980-03-13 | Leybold-Heraeus Gmbh, 5000 Koeln | Pendulum slide |
-
1987
- 1987-05-18 JP JP12093087A patent/JPS63286337A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5649294A (en) * | 1979-09-29 | 1981-05-02 | Toppan Printing Co Ltd | Preparation of partially metal deposited transferring foil |
JPS58140729U (en) * | 1982-03-19 | 1983-09-21 | 積水化学工業株式会社 | Adhesive sheet for decorative glass |
JPS605824U (en) * | 1983-06-22 | 1985-01-16 | 筒中プラスチツク工業株式会社 | Patterned laminate with mirror surface and transparent portion |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009022493A1 (en) * | 2007-08-11 | 2009-02-19 | Toplas Co., Ltd. | Decorating method and decorated nonconducting material |
Also Published As
Publication number | Publication date |
---|---|
JPH0531464B2 (en) | 1993-05-12 |
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