JPS63283576A - Substrate for cell culture - Google Patents

Substrate for cell culture

Info

Publication number
JPS63283576A
JPS63283576A JP11993587A JP11993587A JPS63283576A JP S63283576 A JPS63283576 A JP S63283576A JP 11993587 A JP11993587 A JP 11993587A JP 11993587 A JP11993587 A JP 11993587A JP S63283576 A JPS63283576 A JP S63283576A
Authority
JP
Japan
Prior art keywords
cells
substrate
cell culture
high polymer
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11993587A
Other languages
Japanese (ja)
Inventor
Shigeru Asako
茂 浅古
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP11993587A priority Critical patent/JPS63283576A/en
Publication of JPS63283576A publication Critical patent/JPS63283576A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve adhesiveness to cells, extension of cells and to improve multiplication and activity maintenance, by coating a high polymer substrate with a film of a polymerized organosilicon compound by plasma treatment and using the coated high polymer substrate as a substrate for cell culture. CONSTITUTION:A pair of facing electrodes connected to a high-frequency electric source are set in a reactor consisting of a bell-jar and a high polymer substrate is supported between the electrodes. Then, the bell-jar is sufficiently evacuated and a gaseous organosilicon compound is introduced into the bell-jar. Plasma is generated between the electrodes to form a plasma polymerized film of the organosilicon compound on the surface of the high polymer substrate. A porous high polymer material is preferable as the high polymer substrate and tubular or hollow shape is preferable as the shape for high-density culture. The prepared substrate for cell culture is useful for production system of hormone, etc., by cultivation of animal cell.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 この発明は、細胞培養用基材に関する。さらに詳細には
、動物細胞を培養するために使用される細胞培養用基材
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a substrate for cell culture. More specifically, the present invention relates to a cell culture substrate used for culturing animal cells.

〈従来技術及び発明が解決しようとする問題点〉近年、
生物の細胞を培養し、その細胞の代謝活動により有用な
生理活性物質、例えば、ワクチン、ホルモン、インター
フェロン等を生産する研究が活発に行われている。
<Prior art and problems to be solved by the invention> In recent years,
BACKGROUND OF THE INVENTION Research is actively being carried out to cultivate biological cells and produce useful physiologically active substances, such as vaccines, hormones, and interferons, through the metabolic activities of the cells.

このような方法において、従来、接着性動物細胞の培養
は、ガラス、プラスチック製のシャーレ、試験管、培養
ビンなどを用いて行なわれてきた。
In such methods, adherent animal cells have conventionally been cultured using glass or plastic petri dishes, test tubes, culture bottles, and the like.

また、最近、マイクロキャリアや中空糸を培養用基材と
して用い、より高密度の培養や、長期の培養を行なう試
みがなされつつある。接着性動物細胞を培養用基材上に
接着させ、増殖させるには、該基材表面と細胞の接着性
が良好であることと共に接着した細胞の形態、配列が、
細胞の伸展、増殖に有効な形態になっていることが必要
である。
Recently, attempts have been made to use microcarriers and hollow fibers as culture substrates to achieve higher-density culture and longer-term culture. In order to allow adherent animal cells to adhere and proliferate on a culture substrate, it is necessary to have good adhesion between the cells and the surface of the substrate, as well as the morphology and arrangement of the adhered cells.
It is necessary to have a form that is effective for cell expansion and proliferation.

しかしながら、従来から細胞培養用基材として用いられ
ている高分子材料は賦形性、耐久性に優れるものの、上
記接着性等の点に関して不適当であり、高密度かつ長期
間の細胞培養を行なうことができず、いずれも十分な成
果を上げるに至っていない。
However, although the polymer materials conventionally used as substrates for cell culture have excellent shapeability and durability, they are unsuitable in terms of adhesive properties, etc., and cannot be used for high-density and long-term cell culture. However, none of them have been able to achieve sufficient results.

このような問題点を改善するため、高分子材料を表面処
理して親水化した細胞培養基材、例えば、高分子材料が
オゾンで処理された組織培養材料(特開昭52−412
91号公報参照)、低温プラズマで処理された組織培養
用担体粒子(特開昭57−22891号公報参照)、さ
らに二重結合を含む炭化水素化合物と酸素との混合ガス
によるプラズマ重合膜を形成した細胞培養床(特開昭6
1−52281号公報参照)等が提案されている。
In order to improve these problems, cell culture substrates made of polymeric materials that are surface-treated to make them hydrophilic, such as tissue culture materials in which polymeric materials are treated with ozone (Japanese Patent Laid-Open No. 52-412
91), tissue culture carrier particles treated with low-temperature plasma (see JP-A-57-22891), and a plasma polymerized film formed using a mixed gas of a hydrocarbon compound containing a double bond and oxygen. cell culture bed (Unexamined Japanese Patent Publication No. 6
1-52281) etc. have been proposed.

しかしながら、上記の方法により得られた細胞培養用基
材は、いずれも親水性表面は有するものの、細胞との接
着性および細胞の伸展性と増殖性が十分でなく、細胞を
高密度かつ長期間に亘って行うことができないという問
題がある。
However, although all of the cell culture substrates obtained by the above methods have hydrophilic surfaces, they do not have sufficient adhesion with cells, and do not have sufficient cell spreadability and proliferation, allowing cells to be grown at high density and for long periods of time. The problem is that it cannot be carried out over a period of time.

く目 的〉 この発明は上記問題点に鑑みてなされたものであり、細
胞との接着性並びに細胞の伸展、増殖および活性維持に
優れ、高密度、長期間の培養を可能ならしめる細胞培養
用基材を提供することを目的とする。
Purpose This invention was made in view of the above-mentioned problems, and is a cell culture product that has excellent adhesion with cells, as well as cell spreading, proliferation, and maintenance of activity, and enables high-density, long-term culture. The purpose is to provide a base material.

く問題点を解決するための手段および作用〉上記目的を
達成するためになされた、この発明の細胞培養用基材は
、高分子基材の表面上に有機ケイ素化合物のプラズマ重
合膜が被覆されていることを特徴とするものである。
Means and Effects for Solving the Problems> The cell culture substrate of the present invention, which has been made to achieve the above object, has a polymer substrate whose surface is coated with a plasma polymerized film of an organosilicon compound. It is characterized by the fact that

この発明は上記の構成に示されるように、有機ケイ素化
合物のプラズマ重合膜で表面が被覆された高分子基材か
らなり、有機ケイ素化合物のプラズマ重合膜は、耐熱性
、耐薬品性、耐摩耗性等に優れる膜として知られており
、その表面は疎水性を示す傾向にある。従来、表面改質
による細胞培養用基材の開発は、基材の表面を親水化す
ることにより細胞との適合性を改良することを目的とし
て行われてきたが、本発明者らは、意外にも疎水的傾向
の大きい有機ケイ素化合物のプラズマ重合膜が細胞との
接着性に優れ、さらに接着した細胞の良好な伸展および
増殖を可能ならしめることを見出だした。この発明は上
記知見に基づいてなされたもので、高分子基材の表面に
、有機ケイ素化合物のプラズマ重合膜を被覆した材料は
、細胞との接着性および増殖性を向上させることができ
ると共に高温殺菌に耐えかっpHの変化にも安定な優れ
た細胞培養用基材となる。
As shown in the above structure, this invention consists of a polymer base material whose surface is coated with a plasma polymerized film of an organosilicon compound, and the plasma polymerized film of an organosilicon compound has heat resistance, chemical resistance, and wear resistance. It is known as a membrane with excellent properties, and its surface tends to be hydrophobic. Conventionally, the development of cell culture substrates through surface modification has been carried out with the aim of improving compatibility with cells by making the surface of the substrate hydrophilic. We have also discovered that a plasma-polymerized membrane made of an organosilicon compound with a strong hydrophobic tendency has excellent adhesion to cells, and also allows the adhered cells to spread and proliferate well. This invention was made based on the above knowledge, and a material in which the surface of a polymer base material is coated with a plasma-polymerized film of an organosilicon compound can improve adhesion and proliferation with cells, and can also be used at high temperatures. It is an excellent cell culture substrate that is resistant to sterilization and stable against pH changes.

なお、上記高分子基材は、多孔質材料であるのが好まし
い。また、上記基材が中空糸であるものが好ましい。上
記高分子材料が、多孔質材料であるときは、多孔質材料
の孔を通じて物質代謝が容易となり長期にきり細胞培養
することができる。
Note that the polymer base material is preferably a porous material. Further, it is preferable that the base material is a hollow fiber. When the polymeric material is a porous material, substance metabolism is facilitated through the pores of the porous material, and cells can be cultured for a long period of time.

特に、前記高分子材料からなる基材が中空糸であるもの
は、中空部内や中空糸の外側に培養液等を潅流すること
により、中空糸上に細胞を高密度に育成、増殖させるこ
とができる。
In particular, when the base material made of the polymeric material is a hollow fiber, cells can be grown and multiplied at high density on the hollow fiber by perfusing a culture solution or the like into the hollow portion or outside of the hollow fiber. can.

以下、この発明の詳細な説明する。The present invention will be explained in detail below.

上記高分子基材としては、賦形性、機械的強度を有する
ものであればいかなるものでも使用でき、例えば、ポリ
エチレン、ポリプロピレン、塩素化ポリエチレン、アイ
オノマー等のオレフィン系重合体、ポリテトラフルオロ
エチレン、ポリフッ化ビニリデン等のフッ素系樹脂、ポ
リスチレン等のスチレン系樹脂、ポリメチルメタクリレ
ート等のアクリル系樹脂、ポリビニルアルコール、ポリ
酢酸ビニル、ポリビニルアセタール、ポリアクリロニト
リル、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリカー
ボネート、ボリアリレート、ポリフェニレンオキサイド
、ポリエチレンテレフタレート、ポリブチレンテレフタ
レート等のポリエステル樹脂、エポキシ樹脂、ポリアミ
ド、ポリイミド、ポリスルホン、セルロース系樹脂、シ
リコーン樹脂、ポリウレタンなどの種々の重合体もしく
は共重合体またはそれらのブレンド物が例示できる。
As the polymer base material, any material can be used as long as it has formability and mechanical strength, such as polyethylene, polypropylene, chlorinated polyethylene, olefin polymers such as ionomers, polytetrafluoroethylene, Fluorine resins such as polyvinylidene fluoride, styrene resins such as polystyrene, acrylic resins such as polymethyl methacrylate, polyvinyl alcohol, polyvinyl acetate, polyvinyl acetal, polyacrylonitrile, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polyarylate , polyester resins such as polyphenylene oxide, polyethylene terephthalate, and polybutylene terephthalate, various polymers or copolymers such as epoxy resins, polyamides, polyimides, polysulfones, cellulose resins, silicone resins, and polyurethanes, or blends thereof. .

上記高分子基材は、種々の形態に形成でき、例えば、シ
ャーレ、フラスコ等の成形品の他、フィルム、チューブ
、中空糸、繊維、微粒子等の形態が例示できる。これら
の形態のうち、長期に亘り細胞培養を行なうには、物質
代謝を容易にする孔を有する多孔質高分子材料が好まし
く、また、高密度培養を行なうには、チューブ、中空糸
の形状が好適である。特に、物質代謝が容易で、高密度
培養を長期に亘り行なえる多孔質高分子材料からなる中
空糸が好ましい。この中空糸を用いるとき、培養液を、
中空糸の中空部または外側に潅流させ、必要に応じて炭
酸ガスや空気等を上記中空糸の中空部等に送ることによ
り、細胞を中空糸上で育成し、増殖させることができる
。なお、前記中空糸としては、種々の大きさのものが使
用でき、例えば、内径50〜1000μ鳳程度のものが
用いられる。
The above-mentioned polymeric base material can be formed into various forms, such as molded products such as petri dishes and flasks, as well as forms such as films, tubes, hollow fibers, fibers, and fine particles. Among these forms, for long-term cell culture, porous polymeric materials with pores that facilitate material metabolism are preferable, and for high-density culture, tubes and hollow fibers are preferable. suitable. Particularly preferred are hollow fibers made of porous polymeric materials that are easy to metabolize and can be cultured at high density for a long period of time. When using this hollow fiber, the culture solution is
Cells can be grown and proliferated on the hollow fiber by perfusing the hollow portion or the outside of the hollow fiber and sending carbon dioxide gas, air, etc. into the hollow portion of the hollow fiber as necessary. Note that the hollow fibers can be of various sizes, and for example, those having an inner diameter of about 50 to 1000 μm are used.

また、この発明の細胞培養用基材をマイクロキャリアー
法のビーズ担体として使用する場合には、前記高分子基
材は100〜300μm程度の粒径のものが用いられる
Further, when the cell culture substrate of the present invention is used as a bead carrier in a microcarrier method, the polymer substrate used has a particle size of about 100 to 300 μm.

上記高分子材料基材の表面に形成される有機ケイ素化合
物のプラズマ重合膜の原料である有機ケイ素化合物とし
ては、メチル、エチル、プロピル、イソプロピル、ブチ
ル、ペンチル、ヘキシル、オクチル、ドデシルなどのア
ルキル基;メトキシ、エトキシ、プロポキシ、ブトキシ
、ペンチルオキシ、ヘキシルオキシ、オクチルオキシな
どのアルコキシ基;ビニル、エチニル、アリルなどの不
飽和炭化水素基;フェニル、ナフチルなどのアリール基
;ベンジル、ベンズヒドリル、フェネチルなどのアラル
キル基等の有機置換基、塩素、臭素、ヨウ素、フッ素等
のハロゲン原子などを有するシラン化合物、シロキサン
化合物、シラザン化合物等が挙げられ、例えば、トリメ
チルシラン、テトラメチルシラン、トリエチルシラン、
テトラエチルシラン、オクチルシラン、ジクロロジメチ
ルシラン、ジメトキシジメチルシラン、メチルトリメト
キシシラン、エトキシトリメチルシラン、ジェトキシシ
ラン、ジブトキシシラン、トリフェニルシラン、ジメチ
ルフェニルシラン、ジエチルフェニルシラン、トリクロ
ロシラン、トリメチルビニルシラン、ジメチルメトキシ
ビニルシラン、ジメチルエトキシビニルシラン、エチニ
ルジメチルメトキシシラン、ジメチルジビニルシラン、
メチルトリビニルシラン、トリメトキシビニルシラン、
テトラビニルシラン、アリルトリメチルシラン、ジベン
ジルシラン等のシラン化合物、テトラメチルジシロキサ
ン、ヘキサメチルジシロキサン、ヘキサプロピルジシロ
キサン、ヘキサメチルシクロトリシロキサン、オクタメ
チルシクロトリシロキサン、ヘキサフェニルジシロキサ
ン、1.3−ジメトキシ−1,1,3,3−テトラメチ
ルジシロキサン、ペンタメチルビニルジシロキサン、ペ
ンタメチルフェニルジシロキサン等のシロキサン化合物
、ヘキサメチルジシラザン、テトラメチルジシラザン等
のシラザン化合物が例示され、これら有機ケイ素化合物
は2種類以上を混合して用いてもよい。
Organosilicon compounds that are raw materials for the plasma-polymerized film of organosilicon compounds formed on the surface of the polymer material base material include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl, octyl, and dodecyl. ; Alkoxy groups such as methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, octyloxy; Unsaturated hydrocarbon groups such as vinyl, ethynyl, allyl; Aryl groups such as phenyl, naphthyl; benzyl, benzhydryl, phenethyl, etc. Examples include silane compounds, siloxane compounds, and silazane compounds having organic substituents such as aralkyl groups, halogen atoms such as chlorine, bromine, iodine, and fluorine, such as trimethylsilane, tetramethylsilane, triethylsilane,
Tetraethylsilane, octylsilane, dichlorodimethylsilane, dimethoxydimethylsilane, methyltrimethoxysilane, ethoxytrimethylsilane, jetoxysilane, dibutoxysilane, triphenylsilane, dimethylphenylsilane, diethylphenylsilane, trichlorosilane, trimethylvinylsilane, dimethyl Methoxyvinylsilane, dimethylethoxyvinylsilane, ethynyldimethylmethoxysilane, dimethyldivinylsilane,
Methyltrivinylsilane, trimethoxyvinylsilane,
Silane compounds such as tetravinylsilane, allyltrimethylsilane, dibenzylsilane, tetramethyldisiloxane, hexamethyldisiloxane, hexapropyldisiloxane, hexamethylcyclotrisiloxane, octamethylcyclotrisiloxane, hexaphenyldisiloxane, 1.3 Examples include siloxane compounds such as -dimethoxy-1,1,3,3-tetramethyldisiloxane, pentamethylvinyldisiloxane, and pentamethylphenyldisiloxane, and silazane compounds such as hexamethyldisilazane and tetramethyldisilazane. Two or more types of organosilicon compounds may be used in combination.

上記の有機ケイ素化合物のプラズマ重合は慣用の方法お
よび装置を用いて行うことができ、例えば、ペルジャー
により構成される反応容器内に、高周波電源に接続され
た対向する一対の電極を設け、その電極間に高分子基材
を保持する。次いで、ペルジャー内を十分に減圧した後
、気体状の有機ケイ素化合物を導入し、電極間にプラズ
マを発生させて、高分子基材表面に有機ケイ素化合物の
プラズマ重合膜を形成する。この際、有機ケイ素化合物
と共にアルゴン、ヘリウム、窒素、アンモニア、酸素、
水素などのキャリアガスを混合してプラズマ重合を行っ
てもよい。なお上記めプラズマ重合の条件、例えば、反
応容器内の真空度、有機ケイ素化合物の導入量等は、通
常のプラズマ重合の反応条件と同様な条件が用いられ、
例えば、反応容器内の真空度としては1ミリTorr〜
10To r r、有機ケイ素化合物の流量としては反
応容器の容積1j!当りI X 10−3m11分〜1
0m1/分程度が適当である。また、形成されるプラズ
マ重合膜の膜厚は特に限定されないが通常1〜1000
0 A程度とされ、膜厚の制御は有機ケイ素化合物の導
入量、重合時間等により適宜調整することができる。
Plasma polymerization of the above-mentioned organosilicon compounds can be carried out using conventional methods and equipment. For example, a pair of opposing electrodes connected to a high-frequency power source is provided in a reaction vessel constituted by a Pelger, and the electrodes are A polymeric substrate is held in between. Next, after the pressure inside the Pelger is sufficiently reduced, a gaseous organosilicon compound is introduced, and plasma is generated between the electrodes to form a plasma-polymerized film of the organosilicon compound on the surface of the polymer substrate. At this time, along with organosilicon compounds, argon, helium, nitrogen, ammonia, oxygen,
Plasma polymerization may be performed by mixing a carrier gas such as hydrogen. Note that the conditions for the plasma polymerization mentioned above, such as the degree of vacuum in the reaction vessel, the amount of introduced organosilicon compound, etc., are the same as the reaction conditions for normal plasma polymerization.
For example, the degree of vacuum inside the reaction vessel is 1 mm Torr ~
10Torr, the volume of the reaction vessel is 1j as the flow rate of the organosilicon compound! Per I x 10-3m11min~1
Approximately 0 m1/min is appropriate. In addition, the thickness of the plasma polymerized film to be formed is not particularly limited, but is usually 1 to 1000.
The film thickness can be adjusted as appropriate by adjusting the amount of the organosilicon compound introduced, the polymerization time, etc.

この発明の細胞培養用基材は、種々の細胞の培養に使用
することができ、細胞の種類は特に限定されず生体由来
細胞、ハイブリドーマ−等が挙げられ、例えば、チャイ
ニーズハムスター肺由来細胞v−79、ヒト子宮癌由来
細胞HeLa、ヒト胎児肺由来細胞MRC−5、ヒト肝
由来細胞Chang Liver sヒト肺由来正二倍
体線維芽細胞IRC−90、ヒトリンパ腫由来ナマルバ
細胞等が例示される。
The cell culture substrate of the present invention can be used to culture various cells, and the type of cells is not particularly limited, and examples include living body-derived cells, hybridomas, etc. For example, Chinese hamster lung-derived cells v- 79, human uterine cancer-derived cells HeLa, human fetal lung-derived cells MRC-5, human liver-derived cells Chang Livers, human lung-derived eudiploid fibroblasts IRC-90, human lymphoma-derived Namalva cells, and the like.

また、この発明の細胞培養用基材を用いて動物細胞を培
養する場合、培養する細胞の種類に応じて種々の培養液
が用いられ、細胞の増殖に適した至適温度、pH等の条
件で培養が行なわれる。
Furthermore, when culturing animal cells using the cell culture substrate of the present invention, various culture solutions are used depending on the type of cells to be cultured, and conditions such as optimal temperature and pH suitable for cell proliferation are used. Culture is carried out in

〈実施例〉 以下に、実施例に基づいて、この発明をより詳細に説明
する。
<Examples> The present invention will be described in more detail below based on examples.

実施例1および比較例1 ポリテトラフルオロエチレン多孔質膜(住友電気工業株
式会社製、フロロボアFP−065)を13.56MH
zの高周波電源を有するペルジャー型プラズマ装置に設
置し、ペルジャー内を0.01Torrまで排気した後
、窒素ガスをキャリヤーガスとしてトリメトキシビニル
シランを導入しQ、35Torrに維持しながら、放電
出力30W1処理時間3分間の条件でプラズマ重合を行
った。このようにして得られれたフィルムを10mmX
10層−の8チエンバースライドガラス(Lab  T
ea社製)にセットし、高圧蒸気滅菌後、ヒト肝臓由来
のChang L1ver細胞を培養した。培養液は、
牛胎児血清を含むイーグルMEM培養液を用い、チェン
バー当り2X104個の培養細胞を播種し、インキ二ベ
ター(5%炭酸ガスおよび95%空気の雰囲気中)で培
養を行った。
Example 1 and Comparative Example 1 Polytetrafluoroethylene porous membrane (manufactured by Sumitomo Electric Industries, Ltd., Fluorobor FP-065) was used at 13.56MH
It was installed in a Pelger type plasma device with a high frequency power supply of Plasma polymerization was performed for 3 minutes. The film thus obtained is 10mm
10-layer, 8-chamber slide glass (Lab T
After high-pressure steam sterilization, human liver-derived Chang L1ver cells were cultured. The culture solution is
Using Eagle's MEM culture solution containing fetal bovine serum, 2×10 4 cultured cells were seeded per chamber and cultured in an incubator (in an atmosphere of 5% carbon dioxide gas and 95% air).

24時間後、フィルムに付着している細胞を分離し、血
球算定盤により細胞数を計算したところ、2.9X10
4個であり、優れた接着性と増殖性を示した。
After 24 hours, the cells attached to the film were separated and the number of cells was calculated using a hemocytometer.
4, showing excellent adhesion and proliferation.

一方、比較例1として、プラズマ重合膜で被覆されてい
ないポリテトラフルオロエチレン多孔質膜をそのまま用
いて、上記実施例1と同様に培養試験を行ったが、細胞
数は4X103個であった。
On the other hand, as Comparative Example 1, a culture test was conducted in the same manner as in Example 1 using a polytetrafluoroethylene porous membrane that was not coated with a plasma polymerized membrane, but the number of cells was 4×10 3 cells.

実施例2および比較例2 ポリスチレンシャーレ(10枚)に、実施例1と同様な
方法で、テトラメチルシラザンとアンモニアガスの混合
ガスを用い、圧力0.3Torr、放電出力50W1処
理時間5分間の条件でプラズマ重合を行った。これらの
シャーレをエチレンオキサイド滅菌後、別途培養してお
いたチャイニーズハムスター肺由来のv−79細胞(ト
リプシン−EDTAにより遊離の細胞としている)を各
シャーレに仕込み、10%牛脂児血清を含むイーグルM
EM培養液を用いてインキュベーター(5%炭酸ガスお
よび9・5%空気の雰囲気中)で培養した。2時間後、
インキュベーターより各シャーレを取り出し、シャーレ
表面に接着していた細胞を遊離させ、細胞数を血球算定
盤により算出した。
Example 2 and Comparative Example 2 Polystyrene petri dishes (10 plates) were treated in the same manner as in Example 1 using a mixed gas of tetramethylsilazane and ammonia gas under conditions of a pressure of 0.3 Torr, a discharge output of 50 W, and a treatment time of 5 minutes. Plasma polymerization was performed. After sterilizing these petri dishes with ethylene oxide, separately cultured Chinese hamster lung-derived V-79 cells (separated by trypsin-EDTA) were placed in each petri dish, and Eagle M containing 10% tallow serum was added.
The cells were cultured in an incubator (in an atmosphere of 5% carbon dioxide gas and 9.5% air) using EM culture solution. 2 hours later
Each petri dish was removed from the incubator, the cells adhered to the surface of the petri dish were released, and the number of cells was calculated using a hemocytometer.

そして、仕込み細胞数に対する接着細胞数の割合(接着
率)を求めた。その結果を下記表に示す。
Then, the ratio of the number of adherent cells to the number of prepared cells (adhesion rate) was determined. The results are shown in the table below.

一方、比較例2として、プラズマ重合膜が被覆されてい
ないポリスチレンシャーレ(10枚)をそのまま用い、
上記実施例2と同様に培養試験を行い、細胞の接着率を
求めた。その結果を下記表に併せて示す。
On the other hand, as Comparative Example 2, polystyrene petri dishes (10 pieces) not coated with the plasma polymerized film were used as they were.
A culture test was conducted in the same manner as in Example 2 above, and the cell adhesion rate was determined. The results are also shown in the table below.

(以下余白) 上記の表から明らかなように、比較例2のシャーレは細
胞に対する接着率が低いのに対し、実施例2のシャーレ
は高い接着率を示し、細胞に対する優れた接着性を有す
る。
(The following is a blank space) As is clear from the above table, the petri dish of Comparative Example 2 has a low adhesion rate to cells, whereas the petri dish of Example 2 shows a high adhesion rate and has excellent adhesion to cells.

〈発明の効果〉 以上のように、この発明の細胞培養用基材によれば、高
分子基材の表面に有機ケイ素化合物のプラズマ重合膜が
被覆されており、有機ケイ素化合物のプラズマ重合膜は
細胞との接着性に優れかつ増殖性を高めることができる
ので、高密度かつ長期間の細胞培養が可能になるという
特有の効果を奏する。従って、この発明の細胞培養用基
材は、動物細胞の培養によるホルモン等の有用物の生産
システムに利用できる他、例えばインスリン産生細胞を
基材表面に接着、培養することにより人工膵臓が形成で
きるように人工臓器の構築に利用できる。
<Effects of the Invention> As described above, according to the cell culture substrate of the present invention, the surface of the polymer substrate is coated with a plasma polymerized film of an organosilicon compound. Since it has excellent adhesion to cells and can increase proliferation, it has the unique effect of enabling high-density and long-term cell culture. Therefore, the cell culture substrate of the present invention can be used in a system for producing useful products such as hormones by culturing animal cells, and can also form an artificial pancreas by, for example, attaching and culturing insulin-producing cells to the surface of the substrate. It can be used to construct artificial organs.

特許出願人  住友電気工業株式会社 (ほか3名)Patent applicant: Sumitomo Electric Industries, Ltd. (3 others)

Claims (1)

【特許請求の範囲】 1、有機ケイ素化合物のプラズマ重合膜で 被覆された高分子基材からなることを特 徴とする細胞培養用基材。 2、高分子基材が、多孔質材料である上記 特許請求の範囲第1項記載の細胞培養用 基材。 3、高分子基材が、中空糸である上記特許 請求の範囲第1項または第2項のいずれ かに記載の細胞培養用基材。[Claims] 1. With plasma polymerized membrane of organosilicon compound It is characterized by being made of a coated polymeric base material. Substrate for cell culture. 2. The above where the polymer base material is a porous material For cell culture according to claim 1 Base material. 3. The above patent in which the polymer base material is a hollow fiber Either claim 1 or 2 The cell culture substrate described in Crab.
JP11993587A 1987-05-15 1987-05-15 Substrate for cell culture Pending JPS63283576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11993587A JPS63283576A (en) 1987-05-15 1987-05-15 Substrate for cell culture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11993587A JPS63283576A (en) 1987-05-15 1987-05-15 Substrate for cell culture

Publications (1)

Publication Number Publication Date
JPS63283576A true JPS63283576A (en) 1988-11-21

Family

ID=14773809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11993587A Pending JPS63283576A (en) 1987-05-15 1987-05-15 Substrate for cell culture

Country Status (1)

Country Link
JP (1) JPS63283576A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2425538A (en) * 2005-04-29 2006-11-01 Porvair Filtration Group Ltd Substrate and method for modulating tissue formation or deposition
JP2008073040A (en) * 2006-09-07 2008-04-03 Commiss Energ Atom Culture substrate having oxidized silicone resin coated film
JP2008306977A (en) * 2007-06-14 2008-12-25 Nitto Denko Corp Cell culture substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2425538A (en) * 2005-04-29 2006-11-01 Porvair Filtration Group Ltd Substrate and method for modulating tissue formation or deposition
JP2008073040A (en) * 2006-09-07 2008-04-03 Commiss Energ Atom Culture substrate having oxidized silicone resin coated film
JP2008306977A (en) * 2007-06-14 2008-12-25 Nitto Denko Corp Cell culture substrate

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