JPS6328074A - Microwave field effect transistor - Google Patents
Microwave field effect transistorInfo
- Publication number
- JPS6328074A JPS6328074A JP17216686A JP17216686A JPS6328074A JP S6328074 A JPS6328074 A JP S6328074A JP 17216686 A JP17216686 A JP 17216686A JP 17216686 A JP17216686 A JP 17216686A JP S6328074 A JPS6328074 A JP S6328074A
- Authority
- JP
- Japan
- Prior art keywords
- active layer
- fingers
- drain
- equal
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005669 field effect Effects 0.000 title claims description 9
- 230000000644 propagated effect Effects 0.000 abstract 2
- 230000003321 amplification Effects 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 229940015273 buspar Drugs 0.000 description 2
- QWCRAEMEVRGPNT-UHFFFAOYSA-N buspirone Chemical compound C1C(=O)N(CCCCN2CCN(CC2)C=2N=CC=CN=2)C(=O)CC21CCCC2 QWCRAEMEVRGPNT-UHFFFAOYSA-N 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、マイクロ波電界効果トランジスタに関し、特
に櫛形電極構造を有するマイクロ波電界トランジスタの
電極構造に閃する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a microwave field effect transistor, and particularly relates to an electrode structure of a microwave field effect transistor having a comb-shaped electrode structure.
近年マイクロ波電界効果トランジスタ(以下MESFE
Tという)はその良好な特性から、マイクロ波通信等広
く用いられるようになってきている。特に高出力を要求
されるGaAs基板からなるMESFE、Tはゲート幅
を大きくとる必要があるため、一般に櫛形電極構造が採
用されている。In recent years, microwave field effect transistors (MESFE)
Due to its good properties, it has become widely used in microwave communications and other applications. In particular, since MESFEs and Ts made of GaAs substrates that require high output require a large gate width, a comb-shaped electrode structure is generally adopted.
第2図は従来のMESFETの電極部の平面図であり、
活性層1上に形成されたバスパー4Aとフィンガ4Bか
らなる櫛形のゲート電極4とバスパー5Aとフィンガ5
Bとからなる櫛形のドレイン電極5とを示している。FIG. 2 is a plan view of the electrode section of a conventional MESFET,
A comb-shaped gate electrode 4 consisting of a buspar 4A and a finger 4B formed on the active layer 1, a buspar 5A, and a finger 5.
A comb-shaped drain electrode 5 made of B is shown.
上述した従来構造のMESFETcr)電極は、第2図
に示したように、矩形状の活性層1上にゲート電極のフ
ィンガ4 Bが周期的に並んでいるため、RF倍信号入
力位置であるゲートパッドの0点から、ゲート電極4を
構成する各フィンガー4Bと活性層1の端部との交点A
、C,E、G。As shown in FIG. 2, in the MESFET cr) electrode of the conventional structure described above, fingers 4B of the gate electrode are arranged periodically on the rectangular active layer 1, so that the gate electrode, which is the input position of the RF multiplied signal, From the 0 point of the pad to the intersection point A of each finger 4B forming the gate electrode 4 and the end of the active layer 1
,C,E,G.
I、に、Mまでの距離は等しくない。同様に、ドレイン
電極5を構成する、各フィンガーと5Bと活性層1の交
点B、D、F、H,J、Lと、RF倍信号出力位置であ
るドレインパッドのP点までの距離も等しくない。その
ため各電極等で構成されるMESFETの増幅部が点0
に入力したRF倍信号対して同相で動作しないという問
題点がある。The distances from I to M are not equal. Similarly, the distances from the intersections B, D, F, H, J, and L of each finger, 5B, and active layer 1, which constitute the drain electrode 5, to the point P of the drain pad, which is the RF multiplication signal output position, are also equal. do not have. Therefore, the amplification section of MESFET consisting of each electrode etc.
There is a problem in that it does not operate in the same phase with respect to the RF multiplied signal input to the RF signal.
例えば第2図における点○に入力したRF倍信号対して
、点OA間の距離と点00間の距離には距離にしてフィ
ンガ4B間隔aの3倍、すなわち3aの差がある。従っ
てゲートパッド2に最も近いフィンガ4Bに加わる入力
信号と、最も遠いフィンガ4Bに加わる入力信号には3
a/λの位相差が生ずる。また出力信号についても点P
B間と点PF間には2aの距離の差があるため2a/λ
の位相差が生ずる。このため、ゲートパッド2に人力し
た信号とドレインパッド3から出力される信号には最大
5a/λの位相のずれたPF倍信号混在していることに
なり、各フィンガーで構成されるM E S r’ E
Tの増・幅部により増幅された出力は100%合成さ
れずにドレインパッドから出力されることになる。この
ことはMESFETの本来有する良好な利得特性を、十
分に引き出せない原因となっている。For example, with respect to the RF multiplied signal input to point ○ in FIG. 2, the distance between points OA and the distance between points 00 has a difference of 3 times the distance a between the fingers 4B, that is, 3a. Therefore, the input signal applied to the finger 4B closest to the gate pad 2 and the input signal applied to the farthest finger 4B are 3
A phase difference of a/λ is generated. Also, regarding the output signal, point P
Since there is a distance difference of 2a between B and point PF, 2a/λ
A phase difference occurs. Therefore, the signal manually applied to the gate pad 2 and the signal output from the drain pad 3 contain PF multiplied signals with a maximum phase shift of 5a/λ, and the M E S composed of each finger r'E
The output amplified by the amplification/width section of T is not 100% combined and is output from the drain pad. This is the cause of not being able to fully bring out the good gain characteristics inherent in the MESFET.
本発明の目的は、利得特性の向上したマイクロ波電界効
果トランジスタを提供することにある。An object of the present invention is to provide a microwave field effect transistor with improved gain characteristics.
本発明のマイクロ波電界効果トランジスタは、活性層上
に形成された櫛形構造のゲート電極とドレイン電極とを
有するマイクロ波電界効果トランジスタにおいて、前記
ゲート電極に接続するゲートパッドから、前記ゲート電
極を構成する各フィンガと前記活性層の端部との交点迄
の距離が等しく形成され、かつ前記ドレイン電極に接続
するドレインパッドから、前記ドレイン電極を構成する
各フィンガと前記活性層の端部との交点迄の距離が等し
く形成されているものである。The microwave field effect transistor of the present invention has a comb-shaped gate electrode and a drain electrode formed on an active layer, in which the gate electrode is formed from a gate pad connected to the gate electrode. The distance from the intersection between each finger constituting the drain electrode and the end of the active layer is equal, and the distance from the drain pad connected to the drain electrode is equal to the intersection between each finger constituting the drain electrode and the end of the active layer. The distances up to the point are the same.
次に、本発明の実施例について図面を参照して説明する
。Next, embodiments of the present invention will be described with reference to the drawings.
第1図は本発明の一実施例の電極部の平面図である。FIG. 1 is a plan view of an electrode section according to an embodiment of the present invention.
第1図において、ゲートパッド2に接続し活性層1上に
形成されたゲート電極4を構成するフィンガ4Bの長さ
は、中心に向うにつれて長く形成されており、ゲートパ
ッド2端の点○から、フィンガ4Bと活性層1の端部と
の交点迄の距離OA。In FIG. 1, the length of the fingers 4B constituting the gate electrode 4 connected to the gate pad 2 and formed on the active layer 1 increases toward the center, and starts from the point ○ at the end of the gate pad 2. , the distance OA to the intersection of the finger 4B and the end of the active layer 1.
○C・・・OMは等しい長さに形成されている。また同
様に、ドレインバンド3端の点Pから、ドレイン電極5
を構成するフィンガ5Bと活性層1の端部との交点迄の
距離PB、PD、・・・PLも等しい長さに形成されて
いる。○C...OMs are formed to have the same length. Similarly, from the point P at the end of the drain band 3, the drain electrode 5
The distances PB, PD, . . . , PL to the intersections of the fingers 5B constituting the active layer 1 and the ends of the active layer 1 are also formed to have the same length.
このように構成された本実施例においては、ゲートパッ
ド2から入力したPF倍信号分割されて各フィンガ4B
の活性層1との交点A、C,・・・M走向位相で進み、
各電極のフィンガで構成されるMESFETの増幅部に
より増幅される。そして増幅されたRF倍信号ドレイン
電極5の各フィンガ5B中を同位相で進み点Pで100
%合成されてドレインパッド3より出力される。従って
利得特性はより向上したものとなる。In this embodiment configured in this way, the PF multiplied signal input from the gate pad 2 is divided and sent to each finger 4B.
The intersection points A, C, . . . with the active layer 1 of
The signal is amplified by a MESFET amplification section consisting of fingers of each electrode. Then, the amplified RF multiplied signal passes through each finger 5B of the drain electrode 5 in the same phase and reaches 100 at point P.
% is combined and output from the drain pad 3. Therefore, the gain characteristics are further improved.
以上説明したように本発明は、ゲートパッドから、ゲー
ト電極を構成する各フィンガと活性層の端部との交点迄
の距離と、ドレインパッドから、ドレイン電極を構成す
る各フィンガと活性層の端部との交点迄の距離とを等し
くすることにより、ゲート電極及びドレイン電極の各フ
ィンガで構成されるMESFETの増幅部を同位相の入
力信号で動作できるため、櫛形電極構造を有するマイク
ロ波電界効果トランジスタの本来有する良好な利得特性
をより向上させることができる。As explained above, the present invention is based on the distance from the gate pad to the intersection of each finger constituting the gate electrode and the edge of the active layer, and the distance from the drain pad to the intersection of each finger constituting the drain electrode and the edge of the active layer. By making the distances to the intersections with the gate and drain electrodes equal, the amplifying section of the MESFET consisting of each finger of the gate electrode and the drain electrode can be operated with input signals of the same phase. The inherently good gain characteristics of the transistor can be further improved.
【図面の簡単な説明】
第1図は本発明の一実施例の電極部の平面図、第2図は
従来のマイクロ波電界効果トランジスタの電極部の平面
図である。
1・・・活性層、2−・ゲートバッドド、3・・・ドレ
インパッド、4・・・ゲート電極、4A・・・バスバー
、4B・・・フィンガ、5・・・ドレイン電極、5A・
・バスバー、5B・・・フィンガ。
第1図
躬2図BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a plan view of an electrode portion of an embodiment of the present invention, and FIG. 2 is a plan view of an electrode portion of a conventional microwave field effect transistor. DESCRIPTION OF SYMBOLS 1... Active layer, 2-- Gate pad, 3... Drain pad, 4... Gate electrode, 4A... Bus bar, 4B... Finger, 5... Drain electrode, 5A...
・Busbar, 5B...Finger. Figure 1 Figure 2
Claims (1)
ン電極とを有するマイクロ波電界効果トランジスタにお
いて、前記ゲート電極に接続するゲートパッドから、前
記ゲート電極を構成する各フィンガと前記活性層の端部
との交点迄の距離が等しく形成され、かつ前記ドレイン
電極に接続するドレインパッドから、前記ドレイン電極
を構成する各フィンガと前記活性層の端部との交点迄の
距離が等しく形成されていることを特徴とするマイクロ
波電界効果トランジスタ。In a microwave field effect transistor having a comb-shaped gate electrode and a drain electrode formed on an active layer, from a gate pad connected to the gate electrode, each finger constituting the gate electrode and an end of the active layer The distances from the drain pad connected to the drain electrode to the intersections of the fingers constituting the drain electrode and the ends of the active layer are equal. A microwave field effect transistor featuring:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17216686A JPS6328074A (en) | 1986-07-21 | 1986-07-21 | Microwave field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17216686A JPS6328074A (en) | 1986-07-21 | 1986-07-21 | Microwave field effect transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6328074A true JPS6328074A (en) | 1988-02-05 |
Family
ID=15936795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17216686A Pending JPS6328074A (en) | 1986-07-21 | 1986-07-21 | Microwave field effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6328074A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8796697B2 (en) | 2012-07-11 | 2014-08-05 | Mitsubishi Electric Corporation | Semiconductor device including transistor chips having oblique gate electrode fingers |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60107868A (en) * | 1983-11-16 | 1985-06-13 | Fujitsu Ltd | Semiconductor device |
-
1986
- 1986-07-21 JP JP17216686A patent/JPS6328074A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60107868A (en) * | 1983-11-16 | 1985-06-13 | Fujitsu Ltd | Semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8796697B2 (en) | 2012-07-11 | 2014-08-05 | Mitsubishi Electric Corporation | Semiconductor device including transistor chips having oblique gate electrode fingers |
DE102013208142B4 (en) | 2012-07-11 | 2019-07-04 | Mitsubishi Electric Corporation | Semiconductor device |
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