JPS63279157A - Carbon dioxide electrode - Google Patents
Carbon dioxide electrodeInfo
- Publication number
- JPS63279157A JPS63279157A JP62113927A JP11392787A JPS63279157A JP S63279157 A JPS63279157 A JP S63279157A JP 62113927 A JP62113927 A JP 62113927A JP 11392787 A JP11392787 A JP 11392787A JP S63279157 A JPS63279157 A JP S63279157A
- Authority
- JP
- Japan
- Prior art keywords
- carbon dioxide
- electrode
- film
- bacteria
- recesses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 title claims abstract description 82
- 239000001569 carbon dioxide Substances 0.000 title claims abstract description 41
- 229910002092 carbon dioxide Inorganic materials 0.000 title claims abstract description 41
- 241000894006 Bacteria Species 0.000 claims abstract description 19
- 230000001651 autotrophic effect Effects 0.000 claims description 16
- 239000012528 membrane Substances 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 22
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 13
- 239000000377 silicon dioxide Substances 0.000 abstract description 9
- 238000001514 detection method Methods 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 abstract description 4
- 239000011347 resin Substances 0.000 abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 244000005700 microbiome Species 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 230000003100 immobilizing effect Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 230000001846 repelling effect Effects 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 229920001187 thermosetting polymer Polymers 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000004677 Nylon Substances 0.000 description 4
- 239000007853 buffer solution Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229920001778 nylon Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 230000006872 improvement Effects 0.000 description 3
- -1 nylon Chemical class 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000012488 sample solution Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101100136092 Drosophila melanogaster peng gene Proteins 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000855 fermentation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 239000002504 physiological saline solution Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 230000000241 respiratory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Apparatus Associated With Microorganisms And Enzymes (AREA)
Abstract
Description
【発明の詳細な説明】
（Ｊｌ要〕
工業用プラスチック例えばナイロン等の高分子化合物、
ガラス、石英、シリコン等の板状体の一面に凹部を形成
し、この凹部の内面から板状体の上面にかけて、相互に
絶縁された２個の電極を形成し、凹部内に好気性独立栄
養細菌を固定し。[Detailed description of the invention] (Jl required) Industrial plastics, such as polymer compounds such as nylon,
A recess is formed on one side of a plate-like body made of glass, quartz, silicon, etc., and two mutually insulated electrodes are formed from the inner surface of this recess to the upper surface of the plate-like body, and aerobic autotrophy is generated within the recess. Fix the bacteria.
好気性独立栄養細菌をガス透過膜をもってカバーして製
造された二酸化炭素電極であり、寸法がコンパクトであ
り、使用しやすく、大量生産にも適する二酸化炭素電極
である。This is a carbon dioxide electrode manufactured by covering aerobic autotrophic bacteria with a gas-permeable membrane, and is compact in size, easy to use, and suitable for mass production.
本発明は、ｍ酵の進行状態の制御等に使用される二酸化
炭素センサとして機能する二酸化炭素電極の構造的改良
に関する。特に、二酸化炭素を資化する好気性独立栄養
細菌を使用する二酸化炭素電極の構造的改良に関する。The present invention relates to structural improvements to a carbon dioxide electrode that functions as a carbon dioxide sensor used to control the progress of m-fermentation. In particular, it relates to structural improvements in carbon dioxide electrodes that use aerobic autotrophic bacteria that utilize carbon dioxide.
本発明の発明者は１本来的に酸素センサである酸素電極
と二酸化炭素を資化する好気性独立栄養細菌とを組み合
わせて、第６図に示す構造を有し二酸化炭素センサとし
て機能するアンペロメトリックな二酸化炭素電極を開発
して、特許出願をなしている０図において、１１は鉛よ
りなる７ノードであり、１２は内金よりなるカソードで
あり、水酸化カリウム水溶液１３中に浸漬されている。The inventor of the present invention has developed an amperone having the structure shown in FIG. 6 and functioning as a carbon dioxide sensor by combining an oxygen electrode, which is essentially an oxygen sensor, and an aerobic autotrophic bacterium that utilizes carbon dioxide. In the figure, 11 is 7 nodes made of lead, 12 is a cathode made of inner metal, which is immersed in a potassium hydroxide aqueous solution 13. There is.
＋４はガス透過膜であり１以上の部材をもって酸素電
極が構成され、ガス透過膜を貫通して酸素が水酸化カリ
ウム水溶液１３中に溶解してこの溶液１３中の酸素濃度
が変化すると正・負の電極１１−１２間に流れる電流が
変化して酸素センサとして機能する。+4 is a gas permeable membrane, and an oxygen electrode is composed of one or more members, and when oxygen penetrates the gas permeable membrane and dissolves in the potassium hydroxide aqueous solution 13, and the oxygen concentration in this solution 13 changes, it becomes positive or negative. The current flowing between the electrodes 11 and 12 changes to function as an oxygen sensor.
１５が二酸化炭素を資化する好気性独立栄養細菌であり
、ガス透過膜１４を貫通した二酸化炭素がこれに接触す
るとこの独立栄養線！ｉ１５の呼吸作用が活発になり酸
素の消費量が増大し１周囲の酸素濃度が減少するから、
この酸素減少量を上記の酸素電極を使用して測定すれば
、二酸化炭素濃度を測定することができる。15 is an aerobic autotrophic bacterium that assimilates carbon dioxide, and when carbon dioxide that has penetrated the gas permeable membrane 14 comes into contact with it, this autotrophic line! The respiratory action of i15 becomes active, the amount of oxygen consumed increases, and the surrounding oxygen concentration decreases.
By measuring this amount of oxygen reduction using the oxygen electrode described above, the carbon dioxide concentration can be measured.
上記の二酸化炭素電極を使用して二酸化炭素濃度を測定
するには、まず、上記の二酸化炭素電極。To measure the carbon dioxide concentration using the carbon dioxide electrode described above, first, measure the carbon dioxide concentration using the carbon dioxide electrode described above.
を緩衝液中に浸漬して、その検出電流を十分安定させた
後、上記の緩衝液中に二酸化炭素を含んだ試料液を加え
、上記の反応により変化する酸素電極の検出値の変化を
検出すればよい。After immersing the sensor in a buffer solution and stabilizing the detection current sufficiently, add a sample solution containing carbon dioxide to the buffer solution and detect the change in the detection value of the oxygen electrode that changes due to the above reaction. do it.
上記の二酸化炭素電極は、アンペロメトリックで高感度
であり、原理的には極めてすぐれており、実験室的には
すぐれた結果を与えているが、寸法がかなり大きく、産
業的に使用するには、実用上不便な点があり、大量生産
にも適さず、なお改良の余地があり、よりコンパクトで
使用しやすく大量生産しやすい構造の二酸化炭素電極の
開発が望まれている。The above-mentioned carbon dioxide electrode is amperometric, highly sensitive, extremely good in principle, and has given excellent results in the laboratory, but its dimensions are quite large and it cannot be used industrially. However, there are practical inconveniences and it is not suitable for mass production, and there is still room for improvement, and there is a desire to develop a carbon dioxide electrode with a structure that is more compact, easier to use, and easier to mass produce.
本発明の目的は、この要望に応えることにあり、二酸化
炭素を資化する好気性独立栄養細菌と酸素電極との組み
合わせにもとづく二酸化炭素電極を、コンパクトにし、
使用しやすくシ、大量生産しやすいように改良された構
造の二酸化炭素電極を提供することにある。The purpose of the present invention is to meet this demand by making a carbon dioxide electrode compact, which is based on a combination of an aerobic autotrophic bacterium that utilizes carbon dioxide, and an oxygen electrode.
The object of the present invention is to provide a carbon dioxide electrode having an improved structure that is easy to use and mass-produced.
上記の目的を達成するために本発明が採った手段は、板
状体（２）の一面に四部（５）を形成し、該凹部（５）
の内面から前記板状体（２）の上面にかけて、相互に絶
縁された２個の電極（７・８）を形成し、前記凹部（５
）内に好気性独立栄養細菌（１０）を固定し、該好気性
独立栄養細菌（１０）をガス透過１！５１（１７）をも
ってカバーして二酸化炭素電極を構成することにある。The means taken by the present invention to achieve the above object is to form four parts (5) on one surface of the plate-shaped body (2), and to form the four parts (5) in the recessed part (5).
Two mutually insulated electrodes (7, 8) are formed from the inner surface to the upper surface of the plate-shaped body (2), and the recess (5)
), and the aerobic autotrophic bacteria (10) are covered with a gas permeation of 1.51 (17) to form a carbon dioxide electrode.
板状体２の材料には、工業用プラスチック例えばナイロ
ン等の高分子化合物をはじめ、ガラス。Materials for the plate-shaped body 2 include industrial plastics such as polymer compounds such as nylon, and glass.
石英、単結晶シリコン等が使用しうる。Quartz, single crystal silicon, etc. can be used.
本発明は、半導体装置の製造方法に広く使用されている
技術、例えば、エツチング法、金属等の本積法、金属膜
等のパターニング法等を使用することを前提として、二
酸化炭素電極の構造を改良したものであり、工業用プラ
スチック等の高分子化合物をはじめ、ガラス、石英、単
結晶シリコン等の板状体２の１面に凹部５を形成し、そ
の凹部５の内面から板状体２の上面にかけて２個の電極
７・８を形成し、上記の凹部５内に二酸化炭素を資化す
る好気性独立栄養細菌ｌＯを固定し、その上をガス透過
膜！７をもってカバーしたものであり。The present invention is based on the premise that techniques widely used in semiconductor device manufacturing methods, such as etching methods, metal deposition methods, patterning methods for metal films, etc., are used to develop the structure of carbon dioxide electrodes. This is an improved version in which a recess 5 is formed on one side of a plate-shaped body 2 made of polymer compounds such as industrial plastics, glass, quartz, single crystal silicon, etc., and the plate-shaped body 2 is formed from the inner surface of the recess 5. Two electrodes 7 and 8 are formed over the upper surface of the recess 5, and aerobic autotrophic bacteria lO that assimilates carbon dioxide are fixed in the recess 5, and a gas permeable membrane is placed on top of the aerobic autotrophic bacteria lO. This is covered by 7.
寸法は例えば５面膳×５膳腸Ｘｌ■腸程度と小さくする
ことができ、取り扱いも容易であり、大量生産にも適す
る。The dimensions can be as small as, for example, 5 servings x 5 servings x 1 serving, making it easy to handle and suitable for mass production.
以下、図面を参照しつ一１本発明の一実施例に係る二酸
化炭素電極についてさらに説明する。Hereinafter, a carbon dioxide electrode according to an embodiment of the present invention will be further described with reference to the drawings.
第２図参照
シリコン基板２を酸化して、その表面に厚さが１鉢層程
度の二酸化シリコン膜３を形成する。Referring to FIG. 2, a silicon substrate 2 is oxidized to form a silicon dioxide film 3 having a thickness of about one pot layer on its surface.
第３図参照
リソグラフィー法を使用して１例えばｌｓ鵬×１ ＋＋
＋＋ｓＸ ０．３ｍｌの凹部５を形成する。この工程
に使用されるエッチャントは、二酸化シリコンエツチン
グ用にはフッ酸とフッ化アンモニウムとの混合水溶液が
、シリコンエツチング用には水酸化カリウム水溶液が好
適である。レジストパターン形成後、二酸化シリコンの
エツチングを行ない、レジストを除去した後、二酸化シ
リコンをマスクとしてシリコンのエツチングを行なう。Refer to Figure 3 using the lithography method 1 eg ls Peng x 1 ++
++sX Form a recess 5 of 0.3 ml. The etchant used in this step is preferably a mixed aqueous solution of hydrofluoric acid and ammonium fluoride for silicon dioxide etching, and a potassium hydroxide aqueous solution for silicon etching. After the resist pattern is formed, silicon dioxide is etched, and after the resist is removed, silicon is etched using the silicon dioxide as a mask.
第４図参照
再び熱庸化して凹部５の内面を二酸化シリコン膜６をも
ってカバーする。Referring to FIG. 4, the temperature is increased again and the inner surface of the recess 5 is covered with a silicon dioxide film 6.
第５図参照
リソグラフィー法を使用してパターニングした後、クロ
ムを５００Ａ蒸着し、さらに金をＩＪＬ騰蒸着して、止
り負の電極７・８を形成する。９はこの工程に使用され
たレジスト膜である。After patterning using the lithography method shown in FIG. 5, chromium is deposited at 500A, and gold is further deposited by IJL vapor deposition to form negative electrodes 7 and 8. 9 is a resist film used in this step.
第１ａ図、第１ｂ図参照
レジスト膜９を除去した後、凹部５中に、生理的食塩水
中に懸濁した二酸化炭素を資化する独立栄養細菌１０．
例えば、微工研寄第８４７３号を入れ、光硬化性樹脂例
えばポリビニルアルコールを滴下し、室内光をもって徐
々に硬化して、固定膜１Ｂを形成して微生物を固定する
。After removing the resist film 9 (see FIGS. 1a and 1b), autotrophic bacteria 10 that assimilate carbon dioxide suspended in physiological saline are placed in the recess 5.
For example, a photocurable resin such as polyvinyl alcohol is added dropwise to the resin, and is gradually cured under room light to form a fixed film 1B to fix microorganisms.
次に、シリコンゴム等をコートして厚さ１０＃Ｌ諺程度
の撥水性膜１７を形成する。第ｔｂ図は斜視図である。Next, a water-repellent film 17 having a thickness of approximately 10 #L is formed by coating with silicone rubber or the like. Figure tb is a perspective view.
上記の製造方法においては、板状体２の材料としてシリ
コン基板が使用されているが、これは１例であり、上記
のとおり、工業用ナイロンをはじめ各種の高分子化合物
やガラス等も使用可能である。エツチング法をもって凹
部を形成しうる材料であれば足りる。電極の材料・寸法
や四部の大きさ等も上記せるところは単なる例であり、
その選択は全く自由である０ｗＬ生物固定膜・ガス透過
膜の材料・形成法等も全く自由に選択することが許され
る。多孔質撥水性の膜材であればよい、独立栄養細菌も
、二酸化炭素を資化するものであれば上記せるところ以
外でも全くさしつかえない。In the above manufacturing method, a silicon substrate is used as the material for the plate-shaped body 2, but this is just one example; as mentioned above, industrial nylon, various polymer compounds, glass, etc. can also be used. It is. Any material that can form recesses using an etching method is sufficient. The materials and dimensions of the electrodes, the sizes of the four parts, etc. mentioned above are just examples.
The selection is completely free. The material, formation method, etc. of the 0wL biological immobilization membrane and gas permeable membrane are also allowed to be completely freely selected. Any porous water-repellent membrane material may be used, and autotrophic bacteria other than those mentioned above are also acceptable as long as they can assimilate carbon dioxide.
上記のようにして製造した二酸化炭素電極を使用して二
酸化炭素濃度を測定するには、まず、上記の二酸化炭素
電極を緩衝液中に浸漬して、その検出電圧を十分安定さ
せた後、上記の緩衝液中に二酸化炭素を含んだ試料液を
加え、上記の反応により変化する酸素電極の検出値の変
化を検出すればよい。To measure the carbon dioxide concentration using the carbon dioxide electrode manufactured as described above, first immerse the carbon dioxide electrode in a buffer solution to sufficiently stabilize its detection voltage, and then A sample solution containing carbon dioxide may be added to the buffer solution, and changes in the detected value of the oxygen electrode caused by the above reaction may be detected.
以上説明せるとおり、本発明に係る二酸化炭素電極は、
工業用プラスチック例えばナイロン等の高分子化合物、
ガラス、石英、シリコン等の板状体の一面に四部を形成
し、この凹部の内面から板状体の上面にかけて、相互に
絶縁された２個の電極を形成し、凹部内に好気性独立栄
養細菌を固定し、好気性独立栄養細菌をガス透過膜をも
ってカバーして製造することとされているので、寸法が
コンパクトであり、使用しやすく、大量生産にも適する
。As explained above, the carbon dioxide electrode according to the present invention is
Industrial plastics such as high molecular compounds such as nylon,
Four parts are formed on one side of a plate-shaped body made of glass, quartz, silicon, etc., and two mutually insulated electrodes are formed from the inner surface of this concave part to the top surface of the plate-shaped body, and aerobic autotrophy is formed in the concave part. Since it is manufactured by fixing the bacteria and covering the aerobic autotrophic bacteria with a gas-permeable membrane, it is compact in size, easy to use, and suitable for mass production.
第１ａ図は、本発明の一実施例に係る二酸化炭素電極の
断面図である。
第ｔｂ図は、本発明の一実施例に係る二酸化炭素電極の
斜視図である。
第２〜５図は、本発明の一実施例に係る二酸化炭素電極
の製造工程図である。
第６図は、従来技術に係る二酸化炭素電極の構成図であ
る。
２・争・板状体（シリコン基板）、
３・拳・二酸化シリコン膜、
５・・・凹部。
６・番・二酸化シリコン膜、
７・８・−・正−負電極、
９ＩＩ・・レジスト膜、
１０−−・二酸化炭素を資化する独立栄養細菌、１１・
１２・・・正慟負電極。
１３・参〇水酸化カリウム水溶液、
１４・・・ガス透過膜、
１５−−・二酸化炭素を資化する独立栄養細菌。
１６・参会固定膜。
１７・・・ガス透過膜（撥水性膜）。
第６図
工程図
第２図
工程図
第３図
第４図
第５図
本発明
第１８図FIG. 1a is a cross-sectional view of a carbon dioxide electrode according to an embodiment of the present invention. FIG. tb is a perspective view of a carbon dioxide electrode according to an embodiment of the present invention. 2 to 5 are process diagrams for manufacturing a carbon dioxide electrode according to an embodiment of the present invention. FIG. 6 is a block diagram of a carbon dioxide electrode according to the prior art. 2. Battle: plate-like body (silicon substrate), 3. Fist: silicon dioxide film, 5: recess. 6. Silicon dioxide film, 7.8 -- Positive and negative electrodes, 9 II. Resist film, 10 -- Autotrophic bacteria that utilizes carbon dioxide, 11.
12... Positive and negative electrodes. 13. Potassium hydroxide aqueous solution, 14... Gas permeable membrane, 15-- Autotrophic bacteria that assimilate carbon dioxide. 16. Participation fixation membrane. 17... Gas permeable membrane (water repellent membrane). Figure 6 Process diagram Figure 2 Process diagram Figure 3 Figure 4 Figure 5 Present invention Figure 18
Claims (1)
５）の内面から前記板状体（２）の上面にかけて、相互
に絶縁された２個の電極（７・８）が形成され、 前記凹部（５）内に好気性独立栄養細菌（１０）が固定
され、 該好気性独立栄養細菌（１０）はガス透過膜（１７）を
もってカバーされてなる ことを特徴とする二酸化炭素電極。[Claims] A recess (5) is formed on one surface of the plate-shaped body (2), and the recess (5)
Two mutually insulated electrodes (7, 8) are formed from the inner surface of the plate (5) to the upper surface of the plate-like body (2), and aerobic autotrophic bacteria (10) are formed in the recess (5). A carbon dioxide electrode characterized in that the aerobic autotrophic bacteria (10) are fixed and covered with a gas permeable membrane (17).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62113927A JPS63279157A (en) | 1987-05-11 | 1987-05-11 | Carbon dioxide electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62113927A JPS63279157A (en) | 1987-05-11 | 1987-05-11 | Carbon dioxide electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63279157A true JPS63279157A (en) | 1988-11-16 |
Family
ID=14624678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62113927A Pending JPS63279157A (en) | 1987-05-11 | 1987-05-11 | Carbon dioxide electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63279157A (en) |
-
1987
- 1987-05-11 JP JP62113927A patent/JPS63279157A/en active Pending
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