JPS63277761A - Vacuum treating device - Google Patents

Abstract

PURPOSE:To simplify a conveyor line of the title device and to improve the quality of a film, etc., by lifting up and down the susceptor bearer carrying a sample between a conveyance chamber and a reaction chamber above the conveyance chamber by a susceptor supporting rod, and providing a closing lid to the susceptor supporting rod to seal the lower surface of the conveyance chamber. CONSTITUTION:The sample 41 is placed on a susceptor 14 supported on a tray 7, and conveyed into the conveyance chamber 2. When a lifting motor 32 is started to raise the susceptor supporting rod 18, the susceptor 14 is transferred onto the susceptor bearer 17, and the bearer 17 passes through a susceptor passage hole 6 and ascends into the reaction chamber 5. The opening and closing lid 21 fixed to the susceptor supporting rod 18 also ascends, and a movable seal ring is pressed on the lower surface of the top wall of the conveyance chamber 2 around the hole 6. Consequently, the hole 6 is closed by the opening and closing lid 21, and the gap can be vacuum-sealed by the movable seal ring and an O ring 23. Accordingly, the gas flow in the reaction chamber is uniformized, and the contamination is reduced.

Description

[Detailed description of the invention] [Industrial application field] The present invention uses sputter deposition on a sample on a susceptor.

This invention relates to a vacuum processing apparatus for performing vapor phase growth, etching, etc.

[Conventional technology and its problems]

Conventionally, a vapor phase growth apparatus using an organic metal has only one reaction chamber 5 as shown in FIG.
It was placed on the side of the

However, in a system equipped with only one reaction chamber, different reactions are repeated in one reaction chamber 5, so the next reaction proceeds in a state contaminated with residual gas from the previous reaction, and the product The drawback was that the quality was not stable.

In addition, in systems with multiple reaction chambers, the transport line 3 is a corridor-type module, which makes the transport line complicated, requires a large installation space in the clean room, and requires a large amount of space for exhaust. Therefore, a large-capacity exhaust system is required, which increases equipment costs. In addition, since a sample lifting mechanism is included in the reaction chamber 5,
This causes contamination within the reaction chamber 5, adversely affects the flow of gas, and causes deterioration in product quality, and there are disadvantages in that the durability of the mechanism becomes a problem.

[Purpose of the invention]

The present invention was made in order to solve the above-mentioned conventional problems, and aims to simplify the conveyance line, make the equipment more compact, and improve the quality of the product.

Means for Solving the CBB Point] The vacuum processing apparatus of the present invention has a sample preparation chamber and one or more transfer chambers connected to each other on a series of transfer lines so that each chamber can be separated by an appropriate gate valve. , a reaction chamber is connected to the upper part of the transfer chamber, and the susceptor pedestal is inserted in a sealed state from the lower part of the transfer chamber and can be moved up and down between the transfer chamber and the reaction chamber through a susceptor passage hole provided on the top wall of the transfer chamber. The present invention is characterized in that a susceptor support rod is provided, and the susceptor support rod is provided with an opening/closing lid that can be pressed onto the lower surface of the top wall of the transfer chamber around the susceptor passage opening through a gasket.

[Embodiment] An embodiment of the present invention will be described below with reference to FIGS. 1 to 4.

In the figure, 1 is a sample preparation room, and 2 is one or more transfer chambers (two in the example). A series of roller conveyors 3 for conveying trays are inserted into each chamber, and a transfer line consisting of the conveyors 3 is arranged. The chambers are connected to each other, and each chamber can be separated by a gate valve 4 as appropriate.

5 is a reaction chamber, which is connected to the upper part of the transfer chamber 2;
The upper and lower chambers 2 and 5 communicate with each other via a susceptor passage port 6 provided in the top wall of the transfer chamber 2.

Reference numeral 7 designates a tray, and the center of the tray 7 is provided with a tapered opening/closing lid passage opening 8 whose diameter expands upward, and guided sides 9 that are parallel to each other are provided at the outer facing portions of the - pair. It is formed. On the other hand, positioning flanges 11 are provided at both ends of each roller 10 of the tray conveying roller conveyor 3. Therefore, the tray 7 is placed on the roller conveyor 3 and guided by the positioning flange 11 at the guided side 9 and conveyed.

Reference numeral 12 denotes a packing made of a magnetic material, which is formed into a ring shape with a tapered susceptor pedestal passage opening 13 whose diameter expands upward, and is tapered and fitted into the opening/closing lid passage opening 8 of the tray 7. It is supported by

Reference numeral 14 denotes a susceptor, in which a sample mounting part 15 is recessed in the upper part of the susceptor 14, and a fitting part 16 is recessed in the lower part. 17 and the susceptor pedestal passage port 13 of the packing 12, and is supported by being tapered onto the susceptor pedestal 17 or the susceptor pedestal passage port 13.

A susceptor support rod 18 concentrically connects an upper rod 19A and a lower rod 19B via a screw mechanism 20 for adjusting the height of the susceptor. The susceptor holder 17 is integrally attached to the upper end of the upper rod 19A, and the lower rod 19B
An opening/closing lid 21 is provided at the upper end so as to be relatively rotatable around the lower iron 19B and move integrally with the lower iron 19B. Lower Rondo 19B and opening/closing M2
1 is provided with a Q IJ song 3 that performs sealing at a position above the bearing 22. Also, opening/closing 1
A magnet 24 for magnetic adsorption onto the opening/closing 121 is attached to the outer peripheral portion of the lower surface of the opening/closing 121.

The susceptor support rod 18 extends downward through the bottom wall of the transfer chamber 2, and is rotatably supported by the lifting table 26 via the magnetic fluid rotation introducer 25 at the lower end of the lower condo. ing. The space between the lower iron 19B and the magnetic fluid rotation introducer 25 is sealed by magnetic fluid,
Further, the space between the magnetic fluid rotation introducer 25 and the bottom wall of the transfer chamber 2 is sealed by a bellows 27 surrounding the lower ring 19B. Therefore, the space between the lower rod 19B and the transfer chamber 2 is sealed so that the lower rod 19B can rotate and move up and down. Further, a rotation motor is connected to the lower end of the lower iron 19B via a belt transmission mechanism 28 (only the pulley is shown), and the susceptor support rod 18 is rotated by the operation of the motor. Further, the elevating table 26 is threadedly engaged with a vertical screw shaft 30 rotatably supported by a bearing 29, and an elevating motor 32 is connected to this screw shaft 30 via a gear mechanism 31. The susceptor support rod 18 supported by the lifting table 2G is moved up and down by the motor operation.

A gas introduction pipe 33 and a gas discharge pipe 34 are connected to the reaction chamber 5, and a water cooling jacket 35 and a high frequency coil 36 are also connected to the reaction chamber 5.
is provided. Further, a gas introduction pipe 37 and a gas exhaust pipe 38 are connected to the sample preparation chamber 1, and a gas introduction pipe 39 and a gas exhaust pipe 40 are also connected to the transfer chamber 2.

In this embodiment, the packing 12 is tapered fitted and supported by the tray 7 on the roller conveyor 3, and the opening/closing lid 2
2 may stick to the top wall of the transfer chamber 2 and may not come down when the opening/closing lid 22 is lowered. It goes without saying that the tray 7 may be raised and lowered by the lid 22 and the packing 12 may be integrally provided on the upper surface of the tray 7 or on the lower surface of the top wall of the transfer chamber 2. When the packing 12 is provided on the tray 7, the weight of the tray 7 can be reduced. It can be used as a force to lower the packing 12.

[For production]

After placing the tray 7 in the sample preparation chamber 1 by the roller conveyor 3 and placing the sample 41 on the susceptor 14 supported on the tray 7 via the packing 12, the sample entrance of the sample preparation chamber 1 is closed. Then, the vacuum pump connected to the gas exhaust pipe 38 is operated to evacuate the room, and after that, an inert gas is introduced into the room via the gas introduction pipe 39.

Similarly, the inside of the transfer chamber 2 and the reaction chamber 5 are evacuated in advance by operating the vacuum pump connected to the gas exhaust pipe 34.40. Once inside the chamber 1, the gate valve 4 separating the sample preparation chamber 1 and the first transfer chamber 2 is opened, and the tray 7 is conveyed into the first transfer chamber 2 by the roller conveyor 3. It is placed in a fixed position by the position detection sensor, and the gate valve 4 is closed.

Next, when the lifting motor 32 is started and the susceptor support rod 18 is raised, the susceptor 14 is transferred from the packing 12 to the susceptor pedestal 17 at the upper end of the susceptor support rod 18 and passes through the susceptor passage port 6 into the reaction chamber 5. Opening/closing that rises to a predetermined position inside and is attached to the susceptor support rod 18 at the same time! 2
1 transfers the packing 12 from the tray 7 and rises, and presses the packing 12 against the lower surface of the top wall of the transfer chamber 2 around the susceptor passage opening 6.
Since the gap is vacuum-sealed by the gasket 12 and the O-ring 24, the interior of the reaction chamber 5 is hermetically sealed, and the sample 41 is placed at a predetermined position within the reaction chamber 5.

Next, the sample 41 is heated by induction using the high-frequency coil 36, and a reaction gas is introduced into the reaction chamber 5 through the gas introduction pipe 33, and the sample 41 is rotated via the susceptor support rod 18 by the rotation motor. A vapor phase growth process is performed on the sample 41.

After the reaction is completed, residual gas is discharged from the reaction chamber 5 through the gas exhaust pipe 34, and then an inert gas is introduced into the reaction chamber 5 through the gas introduction pipe 33.

After this process step, the procedure is the reverse of the above ~ lower the septa support rod IB to open the susceptor passage port 6, and return the susceptor 14 carrying the sample 41 onto the tray 7 via the packing 12. After that, the inside of the reaction chamber 5 and the inside of the transfer chamber 2 are evacuated through the gas exhaust pipe 34 or 4o, and when the same level of vacuum as the inside of the next reaction chamber 5 and the inside of the transfer chamber 2 is obtained, the transfer chamber is closed. Open the gate valve 4 separating the two,
The tray 7 is transported to a fixed position in the second transport chamber z by the roller conveyor 3, and the gate valve 4 is closed.

Then, the same process steps as above were performed to prepare sample 4.
After two films made of different materials are stacked on top of the second transfer chamber 2, the processed sample is taken out from the sample exit of the second transfer chamber 2.

The sample 41 is subjected to two-layer vapor phase growth treatment by the operations described above.

In this embodiment, an example of a vapor phase growth processing apparatus has been described, but it goes without saying that the present invention can also be applied to sputter deposition, etching, and the like.

〔Effect of the invention〕

As described above, in the present invention, a transfer preparation chamber and a transfer chamber are connected to each other on a transfer line so that each chamber can be separated, and a reaction chamber is connected to the upper part of the transfer chamber through a vacuum-sealable susceptor passage port. This allows the reaction chamber to be an independent unit separated from the transport mechanism, which simplifies the flow of gas within the reaction chamber and improves its uniformity.It also greatly reduces contamination within the reaction chamber, improving product quality. Improvements can be made.

In addition, the reaction chamber and transfer chamber are combined in the same unit above and below,
Since it has a simple online configuration that is connected to the sample preparation room on one transport line, the installation space can be reduced and the equipment can be made more compact, and the equipment can be easily expanded by extending the transport line and adding units. can. Furthermore, the conveyance mechanism can be simple, and equipment costs can be reduced.

[Brief explanation of the drawing]

Figures 1 and 2 are a schematic plan view and side view showing an embodiment of the present invention, Figure 3 is a detailed enlarged sectional view taken along line m-■ in Figure 2, and Figure 4 is a conveyance mechanism. 5 and 6 are cross-sectional views showing
The figure is a schematic plan view showing a conventional example. 1...Sample preparation room, 2...Transportation room, 3
...Roller conveyor, 4...Gate valve, 5...Reaction chamber, 6...Susceptor passage port, 7...Tray, 12 ...Patsukin, 14
...Susceptor, 17...Susceptor cradle, 18...Susceptor support rod, 22...
Opening/closing lid, 24...0 ring, 25...
Magnetic fluid rotation introducer, 26... Lifting table,
27...Bellows, 33,37.39...
...Gas inlet pipe, 34°38.40...Gas discharge pipe, 41...Sample. Procedural amendments Director General of the Patent Office Kunio Ogawa 1, Eqgyu's 1962 Patent Application No. 111800 4, Sub-Agent Address ■107 Shadow Akasaka 5, 6-5-21 Akasaka, Minato-ku, Tokyo; Date of amendment order Voluntary amendment 6,
Subject of amendment: Specification 1, Drawing 7, Contents of amendment (1) The entire specification shall be corrected as shown in the attached sheet. (2) Correct Figure 2 @ Figure 4 according to Mltffi. (3) Delete the numeral "39" in FIG. Description 1, Title of the invention Vacuum processing device 2, Claims A sample preparation chamber and one or more transfer chambers are connected to each other on a series of transfer lines so that each chamber can be separated by a gate valve as appropriate. ,
A reaction chamber is connected to the upper part of the transfer chamber, and the susceptor pedestal is inserted in a sealed state from the lower part of the transfer chamber and can be moved up and down between the transfer chamber and the reaction chamber through a susceptor passage hole provided on the top wall of the transfer chamber. A susceptor support rod is provided, and the susceptor support rod has a
A vacuum processing apparatus characterized in that an opening/closing lid that can be pressed via a movable seal ring is provided on the lower surface of the top wall of the transfer chamber around the susceptor passage opening. 3. Detailed Description of the Invention [Industrial Application Field] The present invention involves sputter deposition on a sample on a susceptor. This invention relates to a vacuum processing apparatus for performing vapor phase growth, etching, etc. [Prior art and its problems] Conventionally, a vapor phase growth apparatus using an organic metal has only one reaction chamber 5 as shown in FIG. 5, or has two sample preparation chambers 1 and 1 as shown in FIG. A plurality of reaction chambers 5 are connected to a transport line 3
It was placed on the side of the However, in a system equipped with only one reaction chamber, different reactions are repeated in one reaction chamber 5, so the next reaction proceeds in a state contaminated with residual gas from the previous reaction, and the product The drawback was that the quality was not stable. In addition, in systems with multiple reaction chambers, the transport line 3 is a corridor-type module, which makes the transport line complicated, requires a large installation space in the clean room, and requires a large amount of space for exhaust. Therefore, a large-capacity exhaust system is required, which increases equipment costs. In addition, since a sample lifting mechanism is included in the reaction chamber 5,
This causes contamination within the reaction chamber 5, adversely affects the flow of gas, and causes deterioration in product quality, and there are disadvantages in that the durability of the mechanism becomes a problem. [Object of the Invention] The present invention was made to solve the above-mentioned conventional problems, and aims to simplify the conveyance line, make the equipment more compact, and improve the quality of the product. do. [Means for Solving the Problems] The vacuum processing apparatus of the present invention has a sample preparation chamber and one or more transfer chambers connected to each other on a series of transfer lines so that each chamber can be separated by an appropriate gate valve. A reaction chamber is connected to the upper part of the transfer chamber, and the susceptor holder is inserted in a sealed state from the lower part of the transfer chamber and is moved up and down between the transfer chamber and the reaction chamber through a susceptor passage hole provided on the top wall of the transfer chamber. The susceptor support rod is provided with an opening/closing lid that can be pressed onto the lower surface of the top wall of the transfer chamber around the susceptor passage opening via a movable seal ring. . [Embodiment] An embodiment of the present invention will be described below with reference to FIGS. 1 to 4. In the figure, 1 is a sample preparation room, 2 is one or a plurality of transfer chambers (two in the example), and a series of roller conveyors 3 for conveying trays are inserted into each chamber, and a transfer line is made up of the conveyors 3. The chambers are connected to each other on the top, and each chamber can be separated by a gate valve 4 as appropriate. 5 is a reaction chamber, which is connected to the upper part of the transfer chamber 2;
The upper and lower chambers 2 and 5 communicate with each other via a susceptor passage port 6 provided in the top wall of the transfer chamber 2. Reference numeral 7 designates a tray, and the center of the tray 7 is provided with a tapered opening/closing lid passage opening 8 whose diameter expands upward, and guided sides 9 that are parallel to each other are provided at the outer facing portions of the - pair. It is formed. On the other hand, left and right positioning flanges 11 are provided at both ends of each roller 10 of the tray conveying roller conveyor 3. Therefore, the tray 7 is placed on the roller conveyor 3 and guided by the left-right positioning flange 11 at the guided side 9 and conveyed. 12 is a movable seal ring made of a magnetizable material, and has a tapered susceptor pedestal passage port 13 whose diameter expands upward.
is formed into a ring shape, and the tray 7
The opening/closing lid passage port 8 is tapered fitted and supported. Reference numeral 14 denotes a susceptor, in which a sample mounting part 15 is recessed in the upper part of the susceptor 14, and a fitting part 16 is recessed in the lower part. 17 and the susceptor pedestal passage port 13 of the movable seal ring 12, and is supported by being tapered fitted to the susceptor pedestal 17 or the susceptor pedestal passage port 13. A susceptor support rod 18 concentrically connects an upper rod 19A and a lower rod 19B via a screw mechanism 20 for adjusting the height of the susceptor. The susceptor holder 17 is integrally attached to the upper end of the upper rod 19A, and the lower rod 19B
An opening/closing M21 is provided at the upper end of the rod so as to be relatively rotatable around the lower rod 19B and move integrally with the lower rod 19B. Lower Rondo 19B and opening/closing lid 2
1, an O-ring 23 is provided above the bearing 22 for sealing. In addition, the opening/closing lid 21
A magnet 24 for magnetically attracting the movable seal ring 12 onto the opening/closing lid 21 is attached to the outer peripheral portion of the lower surface of the opening/closing lid 21 . The susceptor support rod 18 extends downward through the bottom wall of the transfer chamber 2, and is rotatably supported by the lifting table 26 via the magnetic fluid rotation introducer 25 at the lower end of the lower condo 19B. There is. The space between the lower iron 19B and the magnetic fluid rotation introducer 25 is sealed by magnetic fluid,
Further, the space between the magnetic fluid rotation introducer 25 and the bottom wall of the transfer chamber 2 is sealed by a bellows 27 surrounding the lower ring 19B. Therefore, the space between the lower iron 19B and the transfer chamber 2 is sealed so that the lower iron 19B can rotate and move up and down. Further, a rotation motor is connected to the lower end of the lower iron 19B via a belt transmission mechanism 28 (only the boot is shown), and the susceptor support rod 18 is rotated by the operation of the motor. Further, the lifting table 26 is screwed into a vertical screw shaft 30 rotatably supported by a bearing 29, and a lifting motor 32 is connected to this screw shaft 30 via a gear mechanism 31, and the motor is operated. As a result, the susceptor support rod 18 supported by the lifting table 26 moves up and down. A gas introduction pipe 33 and a gas discharge pipe 34 are connected to the reaction chamber 5, and a water cooling jacket 35 and a high frequency coil 36 are also connected to the reaction chamber 5.
is provided. Further, a gas introduction pipe 37 and a gas exhaust pipe 38 are connected to the sample preparation chamber 1, and a gas introduction pipe 39 and a gas exhaust pipe 40 are also connected to the transfer chamber 2. In this embodiment, the movable seal ring 12 is tapered fitted and supported by the tray 7 on the roller conveyor 3.
Since the movable seal ring 12 may be pressed against the top wall of the transfer chamber 2 by the opening/closing lid 21 and may not come down when the opening/closing lid 21 is lowered, the movable seal ring 12 is devised to be magnetically attracted onto the opening/closing lid 21 by the magnet 24. ing. Although the movable seal ring 12 and the tray 7 have a separate structure, it is also possible to form them into an integral structure. In this case, the weight of the tray 7 can be used as a force for lowering the seal ring. [Function] After placing the tray 7 in the sample preparation chamber 1 by the roller conveyor 3 and placing the sample 41 on the susceptor 14 supported on the tray 7 via the movable seal ring 12, the tray 7 is placed in the sample preparation chamber 1. The sample loading port is closed, the vacuum pump connected to the gas exhaust pipe 38 is operated to evacuate the room, and then an inert gas is introduced into the room via the gas introduction pipe 39. Similarly, the inside of the transfer chamber 2 and the reaction chamber 5 are evacuated in advance by operating the vacuum pump connected to the gas exhaust pipe 34.40. Once inside the chamber 1, the gate valve 4 separating the sample preparation chamber 1 and the first transfer chamber 2 is opened, and the tray 7 is conveyed into the first transfer chamber 2 by the roller conveyor 3. It is placed in a fixed position by the position detection sensor, and the gate valve 4 is closed. Next, when the lifting motor 32 is started to raise the susceptor support rod 18, the susceptor holder 17 at the upper end of the susceptor support rod 18 transfers the susceptor 14 from the movable seal ring 12, passes through the susceptor passage port 6, and reacts. At the same time, the opening/closing lid 21 attached to the susceptor support rod 18 lifts the movable seal ring 12 from the tray 7 and moves the movable seal ring 12 around the susceptor passage opening 6. In order to press against the lower surface of the top wall of the transfer chamber 20, the susceptor passage port 6 is closed by the opening/closing lid 21, and the gap is vacuum sealed by the movable seal ring 12 and the 01J ring 23, so the inside of the reaction chamber 5 is sealed. The sample 41 is placed at a predetermined position within the reaction chamber 5. Next, the sample 41 is heated by induction using the high-frequency coil 36, and a reaction gas is introduced into the reaction chamber 5 through the gas introduction pipe 33, and the sample 41 is rotated via the susceptor support rod 18 by the rotation motor. A vapor phase growth process is performed on the sample 41. After the reaction is completed, residual gas is discharged from the reaction chamber 5 through the gas exhaust pipe 34, and then an inert gas is introduced into the reaction chamber 5 through the gas introduction pipe 33. After this process step, the susceptor support rod 18 is lowered in the reverse order to open the susceptor passage port 6, and the susceptor 14 on which the sample 41 is placed is moved to the movable seal ring 1.
2 and return onto the tray 7. After that, gas exhaust pipe 3
4 or 40, the inside of the reaction chamber 5 and the inside of the transfer chamber 2 are evacuated, and when the same degree of vacuum as the inside of the reaction chamber 5 and the inside of the transfer chamber 2 of the next chamber (B room) is obtained, The gate valve 4 separating the transport chambers B and B is opened, and the tray 7 is transported to a fixed position in the transport chamber B by the roller conveyor 3, and the gate valve is closed. Then, the same process steps as above were performed to prepare sample 4.
After two films made of different materials are laminated on the sample preparation chamber 1, the sample passes from the B chamber to the A chamber, and then is taken out into the atmosphere through the sample preparation chamber 1. The sample 41 is subjected to two-layer vapor phase growth treatment by the operations described above. In this embodiment, an example of a vapor phase growth processing apparatus has been described, but it goes without saying that the present invention can also be applied to sputter deposition, etching, and the like. [Effects of the Invention] As described above, the present invention makes it possible to separate each chamber and transport fJ.
, the preparation chamber and the transfer chamber are connected on the transfer line, and the reaction chamber is connected to the upper part of the transfer chamber via the vacuum-sealable susceptor passage port, so the reaction chamber can be an independent unit separated from the transfer mechanism. Therefore, the gas flow inside the reaction chamber is simple,
Not only can the uniformity be improved, but also contamination within the reaction chamber can be significantly reduced, so that the quality of the product can be improved. In addition, the reaction chamber and transfer chamber are combined in the same unit above and below,
Although it has a simple online configuration that is connected to the sample preparation room on one transport line, it reduces the installation space and makes the equipment more compact, and the equipment can be easily expanded by extending the transport line and adding units. can. Furthermore, the conveyance mechanism can be simple, and equipment costs can be reduced. 4. Brief description of the drawings Figures 1 and 2 are a schematic plan view and side view showing one embodiment of the present invention, and Figure 3 is a detailed enlarged sectional view taken along line m-■ in Figure 2. , FIG. 4 is a sectional view showing the conveyance mechanism, FIGS. 5 and 6.
The figure is a schematic plan view showing a conventional example. ■・・・Sample preparation room, 2・・・Transportation room, 3
...Roller conveyor, 4...Gate valve, 5...Reaction chamber, 6...Susceptor passage port, 7...Tray, 12 ...Movable seal ring, 14...Susceptor, 17...Susceptor pedestal, 18...Susceptor support rod, 21...
・Opening/closing lid, 24...Magnet, 25...
... Magnetic fluid rotation introducer, 26 ... Elevating table, 27 ... Bellows, 33, 37.39 ...
...Gas inlet pipe, 34,38.40...Gas discharge pipe, 41...Sample.

Claims (1)

[Claims] A sample preparation chamber and one or more transfer chambers are connected on a series of transfer lines so that each chamber can be separated by a gate valve as appropriate,
A reaction chamber is connected to the upper part of the transfer chamber, and the susceptor pedestal is inserted in a sealed state from the lower part of the transfer chamber and can be moved up and down between the transfer chamber and the reaction chamber through a susceptor passage hole provided on the top wall of the transfer chamber. A susceptor support rod is provided, and the susceptor support rod has a
A vacuum processing apparatus characterized in that an opening/closing lid that can be pressed through a packing is provided on the lower surface of the top wall of the transfer chamber around the susceptor passage opening.