JPS63270712A - Heat-resistant resin composition - Google Patents
Heat-resistant resin compositionInfo
- Publication number
- JPS63270712A JPS63270712A JP62106697A JP10669787A JPS63270712A JP S63270712 A JPS63270712 A JP S63270712A JP 62106697 A JP62106697 A JP 62106697A JP 10669787 A JP10669787 A JP 10669787A JP S63270712 A JPS63270712 A JP S63270712A
- Authority
- JP
- Japan
- Prior art keywords
- amount
- heat
- radical polymerization
- polymerization initiator
- meth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920006015 heat resistant resin Polymers 0.000 title claims abstract description 8
- 239000011342 resin composition Substances 0.000 title claims abstract description 8
- -1 N-substituted maleimide compound Chemical class 0.000 claims abstract description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 13
- 239000007870 radical polymerization initiator Substances 0.000 claims abstract description 10
- 229920005989 resin Polymers 0.000 claims abstract description 10
- 239000011347 resin Substances 0.000 claims abstract description 10
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 4
- 230000001588 bifunctional effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 23
- 230000003287 optical effect Effects 0.000 abstract description 6
- 239000003999 initiator Substances 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 4
- 238000002156 mixing Methods 0.000 abstract description 2
- VXLYKKNIXGIKAE-UHFFFAOYSA-N prop-2-enoyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(=O)C=C VXLYKKNIXGIKAE-UHFFFAOYSA-N 0.000 abstract 2
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 2
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000000463 material Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011344 liquid material Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- SJLLJZNSZJHXQN-UHFFFAOYSA-N 1-dodecylpyrrole-2,5-dione Chemical compound CCCCCCCCCCCCN1C(=O)C=CC1=O SJLLJZNSZJHXQN-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000002411 thermogravimetry Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical group CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 description 1
- YKTNISGZEGZHIS-UHFFFAOYSA-N 2-$l^{1}-oxidanyloxy-2-methylpropane Chemical group CC(C)(C)O[O] YKTNISGZEGZHIS-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 235000009852 Cucurbita pepo Nutrition 0.000 description 1
- 241000219104 Cucurbitaceae Species 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/42—Intermediate, backcoat, or covering layers
- B41M5/44—Intermediate, backcoat, or covering layers characterised by the macromolecular compounds
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は光で記録、再生、消去を行う光デイスク基板と
して主に用いられる耐熱性樹脂組成物に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a heat-resistant resin composition mainly used as an optical disk substrate for recording, reproducing, and erasing using light.
従来の技術
近年、コンピュータ用メモリ素子として光ディスクが注
目を浴びその実用化が強く望まれている。2. Description of the Related Art In recent years, optical disks have attracted attention as memory devices for computers, and their practical use has been strongly desired.
その中で、ディスク基板の成形方法についてみると、ポ
リカーボネートやPMMAに代表される熱可塑性樹脂に
よる射出成形法や、ガラスやエポキシ基板上に2P法に
より溝を形成する方法などが主流を占めている。Among these methods, the mainstream methods for forming disk substrates include injection molding using thermoplastic resins such as polycarbonate and PMMA, and forming grooves on glass or epoxy substrates using the 2P method. .
更に、ディスク構成についてみると、従来の基板用材料
ではその耐熱性が不十分であり、書込。Furthermore, regarding the disk structure, conventional substrate materials have insufficient heat resistance, making writing difficult.
消去時の強力なレーザー光により瞬時にして記録膜が数
百度まで上昇し、伝熱によりその熱が基板へ伝えられ、
基板自体の熱劣化や軟化、熱分解によるガス発生などが
起こり、記録膜に穴が開いたりしていた。それを防ぐた
め、基板と記録膜との間に断熱層を形成して基板の耐熱
性を上げようとしているが、この場合ディスク自体がた
いへん複雑な構造となっていた。The powerful laser beam used during erasing instantly raises the temperature of the recording film to several hundred degrees, and the heat is transferred to the substrate through heat transfer.
Thermal deterioration and softening of the substrate itself, gas generation due to thermal decomposition, etc. occurred, and holes were formed in the recording film. To prevent this, attempts have been made to increase the heat resistance of the substrate by forming a heat insulating layer between the substrate and the recording film, but in this case the disk itself has a very complicated structure.
発明が解決しようとする問題点
しかしながら上記のような方法では、射出酸−形におい
ては、成形特樹脂に高圧をかけるため、溝を転写するス
タンパ−の寿命が短くなること、金型内での樹脂の流れ
により分子配向が生じ複屈折が大きくなること、更には
、材料中に混入した異物を除去することが困難であるこ
となどが問題となっていた。Problems to be Solved by the Invention However, in the above method, high pressure is applied to the molding resin in the injection acid type, which shortens the life of the stamper that transfers the grooves, and causes problems in the mold. Problems include that the flow of the resin causes molecular orientation, increasing birefringence, and that it is difficult to remove foreign matter mixed into the material.
一方、2P法においては、確かにガラス基板やエポキシ
基板を用い、その上に2P材料を注入。On the other hand, in the 2P method, a glass substrate or epoxy substrate is certainly used, and the 2P material is injected onto it.
硬化させるため2P材材料体は反応性液状材料であり、
成形直前に洗浄やp過などにより材料中の異物は除去で
きるが、ガラス基板においては基板の生産タクト、コス
ト等が高くなり、エポキシ基板においてはエポキシ樹脂
の硬化時間が長いこと(数時間〜数十時間)や離型性が
悪いことなどが問題となっている。The 2P material body is a reactive liquid material to be cured;
Foreign matter in the material can be removed by cleaning or pupiling immediately before molding, but with glass substrates, the production tact and cost are high, and with epoxy substrates, the curing time of the epoxy resin is long (several hours to several hours). 10 hours) and poor mold releasability.
更に、ディスク構成からみると、熱可塑性樹脂や2P、
材料はその耐熱性が不十分であり、基板又は2P上に必
ず断熱層を形成し、その上に記録膜を形成して基板を保
護する必要があり、その断熱層を形成するのに多くの時
間が必要であり、量産に適したディスク構造とはなって
いなかった。Furthermore, from the perspective of the disk configuration, thermoplastic resin, 2P,
The heat resistance of the material is insufficient, so it is necessary to form a heat insulating layer on the substrate or 2P, and then form a recording film on it to protect the substrate. This required time, and the disk structure was not suitable for mass production.
そこで本発明は上記問題点を解決することを目的とし、
一方にアクリロイルオキシ基を、他方にメタアクリロイ
ルオキシ基を有する2官能モノアクリルモノメタクリレ
ートと、N−置換マレイミド化合物と、粘度調整用多官
能(メタ)アクリレートと1種以上のラジカル重合開始
剤より成る耐熱性樹脂組成物を提供するものである。Therefore, the present invention aims to solve the above problems,
Consisting of a bifunctional monoacrylic monomethacrylate having an acryloyloxy group on one side and a methacryloyloxy group on the other, an N-substituted maleimide compound, a polyfunctional (meth)acrylate for viscosity adjustment, and one or more radical polymerization initiators. A heat-resistant resin composition is provided.
問題を解決するための手段
上記問題点を解決するために本発明の耐熱性樹脂組成物
は、一般式(I)
(I)
で示されるビス(オキシメチル)トリシクロ〔6゜2
、1 、02+6)デカンモノアクリルモノメタクリレ
ートと、
一般式(n)
で示されるN−置換マレイミド化合物と粘度調整用多官
能(メタ)アクリレートと1種以上のラジカル重合開始
剤とから構成されているものである。Means for Solving the Problems In order to solve the above problems, the heat-resistant resin composition of the present invention comprises bis(oxymethyl)tricyclo[6゜2
, 1, 02+6) decane monoacrylic monomethacrylate, an N-substituted maleimide compound represented by the general formula (n), a viscosity-adjusting polyfunctional (meth)acrylate, and one or more radical polymerization initiators. It is something.
更に、一般式(II)で示されるN−置換マレイミド化
合物は、そのN−置換体としてN−シクロヘキシル、N
−2,6−ジニチルフエニル、N−〇−クロロフェニル
、N−フェニル、N−ラウリルが好ましく、かつ、その
N−置換マレイミド化合物の配合量としては全樹脂量の
40wt%以下であることが、多官能(メタ)アクリレ
ート化合物に対する溶解性9機械的強度の面から考慮す
ると好ましく、より好ましくは全樹脂量の6〜30wt
%の範囲にある方が良い。Furthermore, the N-substituted maleimide compound represented by general formula (II) has N-cyclohexyl, N-cyclohexyl, N-substituted
The polyfunctional Solubility in (meth)acrylate compounds 9 Preferable in terms of mechanical strength, more preferably 6 to 30 wt of the total resin amount
It is better to be in the % range.
粘度調整用多官能(メタ)アクリレートとしで、2.2
′−ビス〔4−(β−(メタ)アクリロイルオキシ)シ
クロヘキシルプロパン、2.2’−ビス〔4−(β−(
メタ)アクリロイルオキシジェトキシ)シクロヘキシル
プロパン、1,4−ビス((メタ)アクリロイルオキシ
メチル)シクロヘキサン1、トリメチロールプロパント
リ(メタ)アクリレート、ネオペンチルグリコールジ(
メタ)アクリレート、1,6−ヘキサンシオールジ(メ
タ)アクリレート、ジエチレングリコールジ(メタ)ア
クリレート等の(メタ)アクリル酸エステル化合物の単
体又はそれらの混合物であることが良い。Polyfunctional (meth)acrylate for viscosity adjustment, 2.2
'-bis[4-(β-(meth)acryloyloxy)cyclohexylpropane, 2,2'-bis[4-(β-(
meth)acryloyloxyjetoxy)cyclohexylpropane, 1,4-bis((meth)acryloyloxymethyl)cyclohexane 1, trimethylolpropane tri(meth)acrylate, neopentyl glycol di(
It is preferable to use a single (meth)acrylic acid ester compound such as meth)acrylate, 1,6-hexanethiol di(meth)acrylate, diethylene glycol di(meth)acrylate, or a mixture thereof.
重合方法としては、熱重合、光重合(紫外線(UV))
、光、熱の併用した重合等全て可能であり、特に限定さ
れない。また、重合開始剤もラジカル開始剤であれば特
に限定されず、−例を上げるならば、過酸化ベンゾイル
、ジイソプロピルパーオキシカーボネ−1−、ラウロイ
ルパーオキサイド、ターシャリ−ブチルパーオキシビバ
レート等の過酸化物、アゾビスインブチロニトリル等の
アソ化合物、ベンゾフェノン、ベンゾインエチルエーテ
ル、ベンジル、アセトフェノン、アントラキノン等の光
増感剤、チオキサントン等の硫黄化合物等公知のラジカ
ル開始剤は全て使用可能であり、単独又は2種以上併用
することも可能である。Polymerization methods include thermal polymerization, photopolymerization (ultraviolet (UV))
, polymerization using light, heat, etc. are all possible and are not particularly limited. Further, the polymerization initiator is not particularly limited as long as it is a radical initiator, and examples thereof include benzoyl peroxide, diisopropyl peroxycarbonate-1-, lauroyl peroxide, tert-butyl peroxy bivalate, etc. All known radical initiators such as peroxides, aso compounds such as azobisin butyronitrile, photosensitizers such as benzophenone, benzoin ethyl ether, benzyl, acetophenone, and anthraquinone, and sulfur compounds such as thioxanthone can be used. , may be used alone or in combination of two or more.
開始剤量としては、1種当り全樹脂量の1 wt%以下
であり、その全開始剤量としては、全樹脂量に対し0.
01〜6 w t%の範囲内で用い、より好ましくは1
種当り0.1〜o、swt%である。また、重合温度(
UV硬化も含む)は0〜300℃でよシ好ましくは、2
0〜260℃でちる。The amount of initiator is 1 wt% or less based on the total amount of resin per type, and the total amount of initiator is 0.0% based on the total amount of resin.
Used within the range of 01 to 6 wt%, more preferably 1
It is 0.1-0, swt% per seed. In addition, the polymerization temperature (
(including UV curing) preferably at 0 to 300°C.
Chill at 0-260°C.
重合雰囲気としては、空気中、不活性ガス中、真空中い
ずれも行うことができるが、硬化物の熱分解、酸化など
を考慮すると不活性ガス中、真空中はその併用が好まし
い。The polymerization atmosphere can be carried out in air, in an inert gas, or in a vacuum, but in consideration of thermal decomposition, oxidation, etc. of the cured product, it is preferable to use both in an inert gas and a vacuum.
作 用
本発明は上記した構成によって反応性液状材料となるた
め、材料中に混入している異物は濾過により除去される
と共に、多官能(メタ)アクリレートとN−置換マレイ
ミド化合物より構成されているため、エポキシ樹脂に比
較し著しく硬化時間が短縮(数時間→数秒〜数十分)で
き、かつ、離型性も向上するため生産タクトの向上が図
れると共に、射出成形のように、成形時に莫大な圧力を
かけて、樹脂を溝転写用のスタンバ−上に流す必要がな
く、大気圧〜微少加圧(I Ky/c4以下)ですむた
め、ガラス型などの簡易型や装置の小型化が可能となり
クリーンルーム内での作業性に適し、更にスタンバ−寿
命も大幅に伸ばすことが可能となった。更に、ディスク
構造についてみると、本発明の耐熱性樹脂組成物による
ディスク基板は、その耐熱性が従来のディスク材料に比
較し、著しく高いため、基板保護のために基板上に断熱
層を形成する必要がなくなり、ディスク構造のシンプル
化とそれに伴なう生産性向上、コストダウン更には信頼
性の向上がはかられた。Function Since the present invention becomes a reactive liquid material with the above-described structure, foreign substances mixed in the material are removed by filtration, and the material is composed of a polyfunctional (meth)acrylate and an N-substituted maleimide compound. Therefore, compared to epoxy resin, the curing time can be significantly shortened (several hours → several seconds to several tens of minutes), and the mold releasability is also improved, making it possible to improve production takt time. There is no need to apply heavy pressure to flow the resin onto the stub bar for groove transfer, and only atmospheric pressure to minute pressure (I Ky/c4 or less) is required. This makes it suitable for workability in clean rooms, and it has also become possible to significantly extend the life of the stand bar. Furthermore, regarding the disk structure, the heat resistance of the disk substrate made of the heat-resistant resin composition of the present invention is significantly higher than that of conventional disk materials, so a heat insulating layer is formed on the substrate to protect the substrate. This eliminated the need for disk structures, resulting in improvements in productivity, cost reduction, and reliability.
実施例 以下、本発明の実施例について説明する。Example Examples of the present invention will be described below.
評価方法としては、熱重量測定と示差熱分析(TG−D
TA)を行い、ガラス転移点(Tq)と熱重量測定(T
G)により重量が10チ、20%、60チ減少する時の
温度により評価した。また、光学特性としては、厚み1
.6瓢の平板を作り、光透過率(810nmの値)と複
屈折(シングルパス)により評価した。Evaluation methods include thermogravimetry and differential thermal analysis (TG-D
TA), and the glass transition temperature (Tq) and thermogravimetry (T
Evaluation was made based on the temperature at which the weight decreased by 10 inches, 20%, and 60 inches according to G). In addition, as for optical properties, thickness 1
.. A flat plate of 6 gourds was made and evaluated by light transmittance (value at 810 nm) and birefringence (single pass).
本実施例は、構造式(I)にビス(オキシメチル)トリ
シクロ(5,2,1,02シロ〕デカンモノアクリルモ
ノメタクリレート(以下、BTDMAと略す、三菱油化
■製)とトリメチロールプロパントリアクリレート(以
下、TMPTAと略す、日本化薬■製)を用い、これに
N−シクロヘキシルマレイミド(CMI L N−ラウ
リルマレイミド(LMI)、N−2,6−ジニチルフエ
ニルマレイミド(DEPMI )、N−o−クロロフェ
ニルマレイミド(CFx工)、N−フェニルマレイミド
(PMり(以上、■大入化学工業所製)を所定量配合し
、ラジカル重合開始剤としてBPO(日本油脂■製)と
、光増感剤としてIigaaure 184(チバガイ
ギー社(製))を用い、プリキュアとして80 ℃、5
0分又はUVを積算光量10100O0〆一(365n
mの波長)を照射し、ポストキュアとして真空引きしな
がら窒素フロー(0,51/m1n)下で、150℃、
2時間と250’C,1時間行い、硬化物を得た。尚、
UV照射装置として、株式会社オーク製作所(製)ジェ
ットライト(T L −3300)を用いた。This example has structural formula (I) containing bis(oxymethyl)tricyclo(5,2,1,02silo)decane monoacrylic monomethacrylate (hereinafter abbreviated as BTDMA, manufactured by Mitsubishi Yuka) and trimethylolpropane tricyclo(5,2,1,02silo)decane. Acrylate (hereinafter abbreviated as TMPTA, manufactured by Nippon Kayaku ■) was used, and N-cyclohexylmaleimide (CMIL N-laurylmaleimide (LMI), N-2,6-dinitylphenylmaleimide (DEPMI), N A predetermined amount of -o-chlorophenylmaleimide (CFx) and N-phenylmaleimide (PM) (manufactured by Oiri Chemical Industry Co., Ltd.) are blended together, and BPO (manufactured by NOF Corporation) as a radical polymerization initiator and Kosen Iigaaure 184 (manufactured by Ciba Geigy) was used as a sensitizing agent, and 80°C, 5°C was used as a precure.
0 minute or UV integrated light amount 10100O0〆1 (365n
150°C under a nitrogen flow (0.51/m1n) while vacuuming as a post-cure.
After 2 hours and 1 hour at 250'C, a cured product was obtained. still,
As the UV irradiation device, Jet Light (TL-3300) manufactured by Oak Seisakusho Co., Ltd. was used.
そりの評価としては、平板の片側を定板の上に固定し、
長手方向の他端の定板からの高さをそり量として測定し
た。To evaluate warpage, fix one side of the flat plate on a fixed plate,
The height of the other end in the longitudinal direction from the fixed plate was measured as the amount of warpage.
○・・・・・・・・・0.2fl以下
△・・・・・・・・・0.2〜1 寵
×・・・・・・・・・1111111以上判定は、Tg
)250’C,重量減少量が10%の時の温度360℃
以上、かつそシ量が0.2IIII11以下を良品とし
た。○・・・・・・・・・0.2 fl or less △・・・・・・0.2 to 1 ×・・・・・・1111111 or more Judgment is Tg
) 250'C, temperature 360°C when weight loss is 10%
In the above, those with a cutlet amount of 0.2III11 or less were considered to be good products.
表1に配合組成を、表2にその硬化物の評価結果を示し
た。Table 1 shows the blending composition, and Table 2 shows the evaluation results of the cured product.
表 1 組成表
表 2 硬化物の評価結果
発明の効果
以上のように本発明は、一般式(1)で示されるビス(
オキシメチル)トリシクロ(5,2,1,021’〕デ
カンモノアクリルモノメタクリレートと、一般式(II
)で示されるN−置換マレイミド化合物と、粘度調整用
多官能(メタ)アクリレートとを、ラジカル重合開始剤
により共重合させることによシ、耐熱性を著しく向上さ
せるとともに、複屈折を0〜3nmと低減でき、光透過
率も91%以上確保でき光デイスク基板用材料として十
分使用可能であることがわかり、仁の材料を用いたディ
スク成形プロセスは、クリーンルーム内での作業に適し
た、小型、小スペースのディスク基板成形システムにす
ることが可能になった。更に、反応性液状材料の特徴を
生かし、クリーン度を保つことにより、ディスク基板中
の異物混入量がポリカーボネート基板に比較しに以下と
なシ、エラーレートも1オ一ダ以上、低減できる。また
、高耐熱性の特徴を生かし、ディスク構造の検討を行っ
た結果、従来必要とされていた基板と記録膜との間の断
熱層をなくすことができ、構造が簡単で、生産性。Table 1 Composition table Table 2 Evaluation results of cured product Effects of the invention As described above, the present invention provides bis(
oxymethyl) tricyclo(5,2,1,021']decane monoacrylic monomethacrylate and general formula (II
) By copolymerizing the N-substituted maleimide compound represented by () with a viscosity-adjusting polyfunctional (meth)acrylate using a radical polymerization initiator, heat resistance is significantly improved and birefringence is reduced to 0 to 3 nm. It was found that the disc molding process using Jin's material can be used as a material for optical disk substrates by ensuring a light transmittance of over 91%. It has become possible to create a disk substrate molding system in a small space. Furthermore, by taking advantage of the characteristics of the reactive liquid material and maintaining cleanliness, the amount of foreign matter mixed into the disk substrate can be reduced to less than that of a polycarbonate substrate, and the error rate can be reduced by more than an order of magnitude. In addition, as a result of considering the disk structure to take advantage of its high heat resistance, we were able to eliminate the heat insulating layer between the substrate and recording film that was previously required, resulting in a simpler structure and improved productivity.
信頼性が高く、低コストの光ディスクを作ることが可能
となった。It has become possible to create highly reliable and low-cost optical discs.
Claims (3)
一般式(II) ▲数式、化学式、表等があります▼ R:{シクロヘキシルラウリル 2、6−ジエチルフェニル o−クロロフェニルフェニル} で示されるN−置換マレイミド化合物と、粘度調整用多
官能(メタ)アクリレートとラジカル重合開始剤より成
る耐熱性樹脂組成物。(1) General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ Bifunctional monoacrylic monomethacrylate,
General formula (II) ▲ Numerical formulas, chemical formulas, tables, etc. are available ▼ R: N-substituted maleimide compound represented by {cyclohexyllauryl 2,6-diethylphenyl o-chlorophenylphenyl} and polyfunctional (meth)acrylate for viscosity adjustment and a radical polymerization initiator.
シメチル)トリシクロ〔5、2、1、0^2^、^6〕
デカンモノアクリルモノメタクリレートであり、かつ、
一般式(II)で示されるN−置換マレイミド化合物が全
樹脂量の40wt%以下である特許請求の範囲第1項に
記載の耐熱性樹脂組成物。(2) The main structure represented by general formula (I) is bis(oxymethyl)tricyclo[5,2,1,0^2^,^6]
Decane monoacrylic monomethacrylate, and
The heat-resistant resin composition according to claim 1, wherein the N-substituted maleimide compound represented by general formula (II) is 40 wt% or less of the total resin amount.
し、ラジカル重合開始剤1種当り全樹脂量の1wt%以
下である特許請求の範囲第1項に記載の耐熱性樹脂組成
物。(3) The heat-resistant resin composition according to claim 1, which contains at least one radical polymerization initiator, and the amount of each radical polymerization initiator is 1 wt% or less based on the total resin amount.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62106697A JPS63270712A (en) | 1987-04-30 | 1987-04-30 | Heat-resistant resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62106697A JPS63270712A (en) | 1987-04-30 | 1987-04-30 | Heat-resistant resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63270712A true JPS63270712A (en) | 1988-11-08 |
Family
ID=14440212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62106697A Pending JPS63270712A (en) | 1987-04-30 | 1987-04-30 | Heat-resistant resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63270712A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7018697B2 (en) * | 2003-05-29 | 2006-03-28 | Tdk Corporation | Optical recording medium |
-
1987
- 1987-04-30 JP JP62106697A patent/JPS63270712A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7018697B2 (en) * | 2003-05-29 | 2006-03-28 | Tdk Corporation | Optical recording medium |
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