JPS63269499A - Charged particle device - Google Patents
Charged particle deviceInfo
- Publication number
- JPS63269499A JPS63269499A JP10319387A JP10319387A JPS63269499A JP S63269499 A JPS63269499 A JP S63269499A JP 10319387 A JP10319387 A JP 10319387A JP 10319387 A JP10319387 A JP 10319387A JP S63269499 A JPS63269499 A JP S63269499A
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- vacuum
- particle beam
- duct
- vacuum duct
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 title claims abstract description 44
- 238000000605 extraction Methods 0.000 description 6
- 238000005452 bending Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 102100032392 Circadian-associated transcriptional repressor Human genes 0.000 description 1
- 101710130150 Circadian-associated transcriptional repressor Proteins 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Particle Accelerators (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、荷電粒子装置、特に、その荷電粒子ビーム
が通る真空ダクトに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a charged particle device, and in particular to a vacuum duct through which the charged particle beam passes.
第6図及び第7図は、例えば、プロシーディンゲス オ
ン ザ sth シンポジウム オン アクセレレー
タ サイエンス アンド テクノロジー(Procee
dings of The 5th Symposiu
m 0nAccelerator 5cience A
nd Technology)の第238〜2,41ペ
ージ、オール アルミニウム アロイバキューム シス
テム フォー トリステンe+e−カライディング ビ
ームリング(ALL−ALUMINUMALLOY V
ACUUM SYSTEM FORTRl5TAN e
”e−COLLIDINGBEAM RING ) 、
t 984年9月、ナショナル ラボラトリ−フォー
ハイ エナジー(NATIONALLAnoRATo
Ry FORHIGHENERGY PHYSIC8)
発行に示された従来の荷電粒子装置の偏向部の真空ダク
トである。6 and 7, for example, Proceedings on the sth Symposium on Accelerator Science and Technology (Proceedings on the sth Symposium on Accelerator Science and Technology)
dings of The 5th Symposium
m 0nAccelerator 5science A
All Aluminum Alloy Vacuum System for Tristen e+e-Caliding Beam Ring (ALL-ALUMINUMALLOY V
ACUUM SYSTEM FORTRl5TAN e
”e-COLLIDINGBEAM RING),
September 1984, National Laboratory for High Energy (NATIONALLAnoRATo
Ry FORHIGHENERGY PHYSIC8)
This is a vacuum duct in the deflection section of a conventional charged particle device shown in the publication.
図において、符号(1)は真空ダクト、(2)は真空タ
リト(りの荷電粒子が通る荷電粒子ビーム通過部、(3
)は荷電粒子ビーム通過部(2)に隣接して真空ダクト
(1)内に設けられている組込みボング部、(4)は荷
電粒子ビーム通過部(2)K配設された5OR(Syn
chrotron 0rbital Radiatio
n )取出しポート、(5)は組込みポンプ部(3)内
に配設された既設真空排気装置である。In the figure, (1) is a vacuum duct, (2) is a charged particle beam passage section through which charged particles pass, and (3) is a vacuum duct.
) is a built-in bong part provided in the vacuum duct (1) adjacent to the charged particle beam passage part (2), and (4) is a 5OR (Syn
chrono rbital radio
n) The take-out port (5) is an existing vacuum evacuation device installed in the built-in pump section (3).
次にこの従来装置の動作について説明する。Next, the operation of this conventional device will be explained.
偏向電磁石を備えており、この偏向電磁石によって荷電
粒子を周回させろ荷電粒子装置において、光の速度に近
い速度を持つ荷電粒子は、偏向電磁石により軌道を曲げ
られる際K、進行方向にSORと呼ばれる電磁波を放射
する。In a charged particle device, charged particles with a speed close to the speed of light are equipped with a bending electromagnet, and when the charged particles have a speed close to the speed of light, when their orbits are bent by the bending electromagnet, they emit an electromagnetic wave called SOR in the direction of travel. radiate.
このSORはSOR取出しポート(4)によつ【取り出
され、半導体製造等に使用される。This SOR is extracted through the SOR extraction port (4) and used for semiconductor manufacturing, etc.
荷電粒子装置は、荷電粒子ビームの寿命を長くするため
に、荷電粒子ビームの通る真空ダクト(1)内を超高真
空状態にしなければならない。このため、真空夕゛り)
(1)には、荷電粒子ビームの通過する荷電粒子ビー
ム通過部(2)に隣接して、組込みポンプ部(3)が配
設されており、真空ダクト(1)の壁部からSORによ
ってたたきだされたアウトガスを組込みポンプ部(3)
内の既設真空排気装置(5)によって排気するように構
成されている。In order to extend the life of the charged particle beam, the charged particle device must maintain an ultra-high vacuum inside the vacuum duct (1) through which the charged particle beam passes. For this reason, vacuum dusk)
In (1), a built-in pump part (3) is installed adjacent to the charged particle beam passage part (2) through which the charged particle beam passes, and a built-in pump part (3) is installed to pump the charged particle beam from the wall of the vacuum duct (1) by SOR. Pump part (3) that incorporates the released outgas
It is configured to be evacuated by an existing vacuum evacuation device (5) inside.
従来の荷電粒子装置は、以上のように構成されているの
で、組込みポンプ部(3)に当て得るスペースは限られ
ておりかつ狭く、従って、真空排気装置は排気能力の小
さなものしか配役できないために、真空ダクト(1)内
を超高真空状態に保つことが困難であった。Since the conventional charged particle device is configured as described above, the space available for the built-in pump section (3) is limited and small, and therefore, the vacuum pumping device can only be equipped with a small pumping capacity. Furthermore, it was difficult to maintain the inside of the vacuum duct (1) in an ultra-high vacuum state.
この発明は、上記のような問題点を解決するためになさ
れたもので、真空ダクト(1)内をより高い真空度にす
ることができる荷電粒子装置を得ることを目的とする。The present invention was made to solve the above-mentioned problems, and an object of the present invention is to obtain a charged particle device that can create a higher degree of vacuum inside the vacuum duct (1).
この発明に係る荷電粒子装置は、真空ダクトのアウトガ
スが多量に発生する部分にポート接続部を設け、このポ
ート接続部の多量のアワトガス発生部に近接させて荷電
粒子ビームに直交させて真空排気装置の吸気口を取り付
けている真空排気装置を備えている。The charged particle device according to the present invention is provided with a port connecting portion in a portion of the vacuum duct where a large amount of outgas is generated, and the port connecting portion is placed close to the portion where a large amount of outgas is generated, and the charged particle beam is perpendicular to the charged particle beam. Equipped with a vacuum exhaust system with an air inlet.
〔作用]
この発明装置においては、アウトガスが多量に発生して
も、所望容量の真空排気装置をアウトガス発生場所へ設
置することによって、真空排気能力が増しているので、
真空ダクト内の到達真空度が向上し、また、真空排気装
置の吸気口の設置が荷電粒子ビームに直交した方向の部
分への設置であるために、SOR取出しを妨害しない。[Function] In the device of this invention, even if a large amount of outgas is generated, the vacuum evacuation capacity is increased by installing a vacuum evacuation device with a desired capacity at the location where outgas is generated.
The degree of vacuum achieved within the vacuum duct is improved, and since the inlet of the vacuum evacuation device is installed in a direction perpendicular to the charged particle beam, it does not interfere with SOR extraction.
以下、この発明をその一実施例を示す図に基づいて説明
する。The present invention will be explained below based on the drawings showing one embodiment thereof.
第1図〜第3図において、符号(1)は真空ダクト、(
2)は荷電粒子ビーム通過部、(3)は荷電粒子ビーム
通過部(2)に隣接して設けられている組込みポンプ部
、(5)は組込みポンプ部(3)内に配設されている既
設真空排気装置である。In Figs. 1 to 3, the symbol (1) indicates the vacuum duct, (
2) is a charged particle beam passage section, (3) is a built-in pump section provided adjacent to the charged particle beam passage section (2), and (5) is arranged within the built-in pump section (3). This is an existing vacuum exhaust system.
また、(11)は荷電粒子ビーム通過部(2)のアウト
ガスが多量に発生する場所に配設されたポート接続部、
(12)はポート接続部(11)に配設されたSOR取
出しポート、(13)はポートa続部(12)にその下
側に向けて配設されている真空排気装置である。In addition, (11) is a port connection part disposed in a place where a large amount of outgas is generated in the charged particle beam passage part (2),
(12) is an SOR extraction port disposed in the port connection part (11), and (13) is a vacuum exhaust device disposed in the port a connection part (12) facing downward.
また、第4図及び第5図は、上記実施例で示した真空ダ
クト(1)を偏向電磁石に装着した図であり、符号(1
4)は偏向電磁石である。Moreover, FIGS. 4 and 5 are diagrams in which the vacuum duct (1) shown in the above embodiment is attached to a bending electromagnet, and the reference numeral (1)
4) is a bending electromagnet.
次に、上記実施例の作用について説明する。Next, the operation of the above embodiment will be explained.
真空ダクト(1)に荷電粒子を周回させると、SORは
荷電粒子ビームの進行方向に放射される。When charged particles are circulated in the vacuum duct (1), SOR is emitted in the direction in which the charged particle beam travels.
このため、真空ダクト(1)にポート接続部(11)が
設けられているので、例えば、第1図に示すポート接続
部(11)の壁部(ha)に集中してSORが当たり、
従って、壁部(Lla)から大量のアウトガスが放出さ
れる。しかし、この実施例では、真空排気装置(13)
%にその吸気口が壁部(lla)に近接して設けられて
いるので、壁部(tla)からの排気コンダクタンスが
小さく、壁部(lla)からたたき出されたアウトガス
な効率よく排気することができろ。For this reason, since the port connection part (11) is provided in the vacuum duct (1), for example, the SOR is concentrated on the wall (ha) of the port connection part (11) shown in FIG.
Therefore, a large amount of outgas is released from the wall (Lla). However, in this embodiment, the vacuum evacuation device (13)
Since the intake port is provided close to the wall (lla), the exhaust conductance from the wall (tla) is small, and the outgas knocked out from the wall (lla) can be efficiently exhausted. Be able to do it.
また、真空排気装置(13)はポート接続部(11)の
下側に取り付けているために、SORは真空排気装置(
13)に妨げられることもなく、SOR取出しポート(
12)を経て、真空ダクト(1)の外へ取り出される。In addition, since the vacuum evacuation device (13) is attached to the lower side of the port connection part (11), the SOR
13) without being obstructed by the SOR extraction port (
12) and is taken out of the vacuum duct (1).
なお、組込みポンプ(3)内に配設されている既設真空
排気装置(5)は、従来の荷電粒子装置と同様に、排気
作用を分担するので、SORによつ【たたき出されるア
ウトガス以外のガスを排気するための十分な能力を持っ
ている@
なお、上記実施例では、真空排気装置(13)をポート
接続部(11)の下側に直接取り付けたが、ポート接続
部(11)の下側に真空排気装置の吸気口を設け、この
吸気口に接続の太いノくイブを介して、ポート接続部か
ら離れた場所に配設した真空排気装置により排気するよ
5Kしても良い。Note that the existing vacuum evacuation device (5) installed inside the built-in pump (3) shares the evacuation action in the same way as a conventional charged particle device. Has sufficient capacity to exhaust gas@ In the above embodiment, the vacuum evacuation device (13) was attached directly to the bottom of the port connection (11). An inlet of a vacuum evacuation device may be provided on the lower side, and the air may be evacuated by a vacuum evacuation device disposed at a location away from the port connection portion via a thick groove connected to this inlet.
また、上記実施例では、真空排気装置(13)をポート
接続部(11)の下側に取り付けたが、これに限らず、
ポート接続部(11)の上側に取り付けてもよく、更に
は、偏光ビームに対して外径側のポート接続部(lt)
K取り付けてもよい。Further, in the above embodiment, the vacuum evacuation device (13) was attached to the lower side of the port connection part (11), but the invention is not limited to this.
It may be attached to the upper side of the port connection part (11), and furthermore, the port connection part (lt) on the outer diameter side with respect to the polarized beam may be attached.
K may be attached.
以上のように、この発明によれば、真空ダクトのアウト
ガスの発生量の多い部分にポート接続部を設け、このポ
ート接続部の多量のアウトガス発生部に近接して荷電粒
子ビームに直交させて真空排気装置の吸気口を取り付け
ている真空排気装置を設けているので、SOR取出しを
妨害することなく、真空ダクトの外径側でかつアウトガ
スの発生の多い所から真空引きができ、従って、従来の
装置よりも、真空ダクトの到達真空度がより一層扁い荷
電粒子装置が得られる効果を有している。As described above, according to the present invention, a port connection part is provided in a part of the vacuum duct where a large amount of outgas is generated, and the port connection part is placed close to the part where a large amount of outgas is generated and is placed orthogonally to the charged particle beam. Since the vacuum exhaust device is attached to the intake port of the exhaust device, vacuum can be drawn from the outer diameter side of the vacuum duct and from the area where outgas is generated, without interfering with SOR extraction. This has the effect of providing a charged particle device in which the degree of vacuum achieved by the vacuum duct is lower than that of the device.
第1図はこの発明の一実施例による荷電粒子装置の偏向
部の真空ダクトを示す平面図、第2図は第1図のII−
II線による断面図、第3図は第1図の11線による断
面図、第4図は第1図の実施例による荷電粒子装置の偏
光部の真空ダクトを偏向電磁石に装着した平面図、第5
図は第4図のV−V線による断面図、第6図は従来の荷
電粒子装置の偏向部の真空ダクトの平面図、第7図は第
6図の■−■線による断面図である。
(1)・・真空ダクト、(2)・・荷電粒子ビーム通過
部、(3)・・組込みポンプ部、(5)・・既設真空排
気装置、(11)・・ポート接続部、(lla)・・壁
部、(12)・・SOR取出しポート、(13)・・真
空排気装置。
なお・各図中・同一符号は同−又は相当部分を示す。
兇2図 児3図
憾4図
児5図
児6図
手続補正書
昭和63年 1月8日FIG. 1 is a plan view showing a vacuum duct of a deflection section of a charged particle device according to an embodiment of the present invention, and FIG.
3 is a sectional view taken along line 11 in FIG. 1, FIG. 4 is a plan view of the vacuum duct of the polarizing section of the charged particle device according to the embodiment shown in FIG. 5
The figure is a sectional view taken along the line V-V in FIG. 4, FIG. 6 is a plan view of a vacuum duct in the deflection section of a conventional charged particle device, and FIG. 7 is a sectional view taken along the line ■-■ in FIG. 6. . (1) Vacuum duct, (2) Charged particle beam passage section, (3) Built-in pump section, (5) Existing vacuum exhaust system, (11) Port connection section, (lla)・・Wall part, (12)・・SOR extraction port, (13)・・Vacuum exhaust device. Note that the same reference numerals in each figure indicate the same or equivalent parts. Figure 2, Figure 3, Figure 4, Figure 5, Figure 6, Procedure Amendment, January 8, 1988.
Claims (2)
の多い部分にポート接続部を設け、該ポート接続部の多
量のアウトガス発生部に近接して荷電粒子ビームに直交
して真空排気装置の吸気口を取り付けている真空排気装
置を備えていることを特徴とする荷電粒子装置。(1) A port connection part is provided in a part of the vacuum duct through which charged particles pass, where a large amount of outgas is generated, and the intake air of the vacuum evacuation equipment is placed close to the part of the port connection part that generates a large amount of outgas, and perpendicular to the charged particle beam. A charged particle device comprising a vacuum evacuation device having an opening attached thereto.
置の吸気口は、荷電粒子ビームが偏向している場合には
、偏向している荷電粒子ビームを含む面に対して直交し
て設けられている特許請求の範囲第1項記載の荷電粒子
装置。(2) If the charged particle beam is deflected, the inlet of the vacuum evacuation device, which is provided perpendicular to the charged particle beam, is provided perpendicular to the plane containing the deflected charged particle beam. A charged particle device according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10319387A JPS63269499A (en) | 1987-04-28 | 1987-04-28 | Charged particle device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10319387A JPS63269499A (en) | 1987-04-28 | 1987-04-28 | Charged particle device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63269499A true JPS63269499A (en) | 1988-11-07 |
Family
ID=14347679
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10319387A Pending JPS63269499A (en) | 1987-04-28 | 1987-04-28 | Charged particle device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63269499A (en) |
-
1987
- 1987-04-28 JP JP10319387A patent/JPS63269499A/en active Pending
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