JPS63262516A - Positioning stage of sample - Google Patents

Positioning stage of sample

Info

Publication number
JPS63262516A
JPS63262516A JP9774287A JP9774287A JPS63262516A JP S63262516 A JPS63262516 A JP S63262516A JP 9774287 A JP9774287 A JP 9774287A JP 9774287 A JP9774287 A JP 9774287A JP S63262516 A JPS63262516 A JP S63262516A
Authority
JP
Japan
Prior art keywords
stage
sample
ring
movable stage
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9774287A
Other languages
Japanese (ja)
Inventor
Toshinori Shinooka
篠岡 敏則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9774287A priority Critical patent/JPS63262516A/en
Publication of JPS63262516A publication Critical patent/JPS63262516A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To simplify a vacuum vessel itself and to improve the efficiency and reliability of a test, by a construction wherein a movable stage having a tubular sample block put in with an O-ring interposed is disposed outside a space of the vacuum vessel. CONSTITUTION:A through hole in which a tubular sample block 3 is put is formed in the center of a base board 8 of a vacuum vessel 9, and an airtight sealing element of an O-ring 13 is formed between this through hole and the sample block 3. Outside a space of the vacuum vessel, a movable stage 6 having the tubular sample block 3 put in with an O-ring 4 interposed is disposed. The movable stage 6 constitutes a part of the base board 8 of the vacuum vessel 9, and a lubricating sealing surface 5 having a small sliding friction coefficient in relation to the O-ring 4 is formed on the periphery of the stage 6. A movable stage 15 in the direction Y is provided in relation to the movable stage 6 in the direction X, and these stages are driven by surbo motors.

Description

【発明の詳細な説明】 〔概要〕 高真空中において、XV平面上を自在に可動するように
した試料台に装着された検査対象の試料、例えばIC,
LSI等を診断試験する電子ビームプロービング装置の
試料位置決め機構に係り、真空槽の底盤側において、真
空シール用ゴム状Oリングに対する摺動摩擦係数の少な
い潤滑性のよい可動ステージを配置することにより、X
Y平面内における試料の位置決めとその駆動機構を簡素
化すると共に、試験の信頼性を向上する。
[Detailed Description of the Invention] [Summary] A sample to be inspected, such as an IC, is mounted on a sample stage that can freely move on an XV plane in a high vacuum.
Regarding the sample positioning mechanism of electron beam probing equipment for diagnostic testing of LSI etc., X
This simplifies the positioning of the sample in the Y plane and its driving mechanism, and improves the reliability of the test.

〔産業上の利用分野〕[Industrial application field]

本発明は、真空中において例えばIC,LSI等の試料
を検査する試料位置決めステージに関する。
The present invention relates to a sample positioning stage for inspecting samples such as ICs and LSIs in vacuum.

近時、例えばLSI素子の試験においては、高密度化に
ともないチップ素子内のパターンはその線幅が1μm!
!i!度の超微細寸法となっていることから、従来の機
械的な探針法によるプロービングは素子内パターンを破
壊する危険があるため使用出来ず、このため例えばEB
(Electron Beam)の照射による二次電子
の強度等を計測して、該素子の超微細パターンの特定位
置における電位分布やその絶対値を計測することが行わ
れる。
Recently, for example, in the testing of LSI devices, due to the increase in density, the line width of the pattern inside the chip device is 1 μm!
! i! Due to the ultra-fine dimensions of the device, probing using conventional mechanical probe methods cannot be used due to the risk of destroying the internal pattern of the device.
The intensity of secondary electrons generated by irradiation with an electron beam (electron beam) is measured to measure the potential distribution and its absolute value at a specific position of the ultrafine pattern of the element.

電子ビームプロービングは試料を高真空中のステージに
装着し該装着のステージをXY平面内で自在にステップ
駆動してその位置決めがされる。
In electron beam probing, a sample is mounted on a stage in a high vacuum, and the mounted stage is freely stepped in the XY plane to determine its position.

本発明は、LSIやICの診断試験、もしくは不良解析
等に適用して有用なステージの位置決め機構を提示して
いる。
The present invention presents a stage positioning mechanism that is useful when applied to diagnostic tests of LSIs and ICs, failure analysis, and the like.

〔従来の技術〕[Conventional technology]

第4図は、従来における真空槽内の試料位置決めステー
ジの側断面図である。図によりステージ構成ならびに試
験装置の概要を説明する。
FIG. 4 is a side sectional view of a conventional sample positioning stage in a vacuum chamber. An overview of the stage configuration and test equipment will be explained using figures.

図において、略1O−6Torrもしくはそれ以−トの
真空空間を形成する真空槽22は、鉄製の底盤24上に
組立てられる。該底盤24の一部には真空排気管23が
連結され、また真空槽22はその中央部には電子鏡筒2
5が配置される。
In the figure, a vacuum chamber 22 forming a vacuum space of about 10-6 Torr or more is assembled on a bottom plate 24 made of iron. A vacuum exhaust pipe 23 is connected to a part of the bottom plate 24, and the vacuum chamber 22 has an electron lens barrel 2 in its center.
5 is placed.

電子鏡筒25内は、詳細図示されないが、電子ビーム発
生源、該発生源のビーム加速器、ビームの偏向制御器、
及び照射ビーム26(点線)による試料21よりの二次
電子検出器、二次電子のエネルギー分析器が収納される
Although not shown in detail in the electron lens barrel 25, there are an electron beam generation source, a beam accelerator for the generation source, a beam deflection controller,
A secondary electron detector and a secondary electron energy analyzer from the sample 21 using the irradiation beam 26 (dotted line) are housed.

次に、真空槽内に設けられる可動ステージ20と該ステ
ーシートの試料21の位置決め機構を説明する。
Next, a mechanism for positioning the movable stage 20 provided in the vacuum chamber and the sample 21 on the stay sheet will be explained.

可動ステージ20は、試料21の位置をX、Y方向に自
在に移動させる直交配置された二つのサーボモータMを
備える。
The movable stage 20 includes two servo motors M arranged orthogonally to freely move the position of the sample 21 in the X and Y directions.

即ち、図示モータMはX方向矢印30にそって上部ステ
ージ31を平行移動させ、また図面の背面側に設けられ
るV方向モータにより下部ステージ32を平行移動させ
て、プリント基板】9上に装着された試料21に対する
XV平面内の位置決めがされる。
That is, the illustrated motor M moves the upper stage 31 in parallel along the X-direction arrow 30, and the lower stage 32 is moved in parallel by the V-direction motor provided on the back side of the drawing, so that the printed circuit board 9 is mounted. The sample 21 is positioned within the XV plane.

尚、プリント基板19の端部には複数のビン端子を備え
るコネクタ39が接続され、該コネクタ39を介し電源
もしくは各種の信号が入力される。
A connector 39 having a plurality of pin terminals is connected to the end of the printed circuit board 19, and power or various signals are inputted through the connector 39.

前述のサーボモータMによるそれぞれのステージ移動(
送り)は、モータMの軸に連結された軸方向送り螺子3
6、及び該甥子36の軸受部33よりなる送り機構によ
り行われる。図中、34は送り甥子36の軸端部の支軸
部、また37は下部ステージ32の移動を平行的にガイ
ドしかつ該ステージを支承するベースステージである。
Each stage is moved by the aforementioned servo motor M (
The feed) is an axial feed screw 3 connected to the shaft of the motor M.
6, and a feeding mechanism consisting of the bearing portion 33 of the nephew 36. In the figure, 34 is a support shaft at the end of the shaft of the feeder 36, and 37 is a base stage that guides the movement of the lower stage 32 in parallel and supports the stage.

真空槽内のプリント基板19に取付けられた試料21に
供給する各種の信号と駆動電源、ステージ31゜32に
対するサーボそ一タMの駆動電源は、真空槽外部に設け
られる電子制御回路40からケーブル41を介して供給
される。このため真空槽22の槽壁にはケーブル41の
接続用端子盤42が設けられる。
Various signals and drive power supplied to the sample 21 attached to the printed circuit board 19 inside the vacuum chamber, and drive power for the servo motor M for the stages 31 and 32 are supplied by cables from an electronic control circuit 40 provided outside the vacuum chamber. 41. For this purpose, a terminal board 42 for connecting the cable 41 is provided on the wall of the vacuum chamber 22.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、従来の位置決めステージは真空槽内に可
動ステージ20があるため槽自体が大きくなる一方、電
子制御回路40と検査対象の試料21とを接続するケー
ブル41の余長が長く、特に真空槽内部のケーブル41
は、試料21の可動範囲を考慮すると充分な余長が必要
になる。ケーブル41の余長が必要以上に長くなると、
結果的に試料21の動作特性が正しく計測出来ないと云
う問題がある。
However, since the conventional positioning stage has the movable stage 20 inside the vacuum chamber, the chamber itself becomes large, and the extra length of the cable 41 connecting the electronic control circuit 40 and the sample 21 to be inspected is long, especially inside the vacuum chamber. cable 41
Considering the movable range of the sample 21, a sufficient extra length is required. If the extra length of the cable 41 becomes longer than necessary,
As a result, there is a problem that the operating characteristics of the sample 21 cannot be measured correctly.

更に真空槽22内に配設するケーブル41は、有機ガス
を放出して槽内の真空度を低下させ真空排気系のポンプ
負荷容量が増大することである。
Furthermore, the cable 41 disposed within the vacuum chamber 22 releases organic gas, lowers the degree of vacuum within the chamber, and increases the pump load capacity of the vacuum evacuation system.

〔問題点を解決するための手段〕[Means for solving problems]

真空槽内に設ける試料装着の可動ステージの構成として
、本発明によれば 真空槽と、窓部を有する底盤と、底盤の裏面側において
連接される0リングとの摺動摩擦係数が少ない摺動面が
形成されたXY方向へ送り駆動される可動ステージと、
該可動ステージと一体的に連結されかつ底盤の窓部より
突出させて配置された筒状の試料台からなる該試料台に
載置された試料を真空中で位置決めするようにした試料
位置決めステージとしたことである。
According to the present invention, a movable stage for mounting a sample provided in a vacuum chamber has a sliding surface with a small sliding friction coefficient between the vacuum chamber, a bottom plate having a window, and an O-ring connected on the back side of the bottom plate. a movable stage that is driven to be fed in the X and Y directions, and
A sample positioning stage comprising a cylindrical sample stand integrally connected to the movable stage and arranged to protrude from a window of a bottom plate, and for positioning a sample placed on the sample stand in a vacuum. That's what I did.

〔作 用〕[For production]

本発明あ試料位置決めステージを示す第1図と従来の同
ステージを示す第4図を比較参照すれば明らかなように
、従来、該ステージが真空槽内に配置されていたが、本
発明は真空槽空間の外部に0リングを介し筒状の試料台
を嵌入した可動ステージが配置されていること。
As is clear from a comparison between FIG. 1 showing the sample positioning stage of the present invention and FIG. 4 showing the conventional stage, the stage was conventionally placed in a vacuum chamber, but the present invention A movable stage into which a cylindrical sample stage is fitted via an O-ring is placed outside the tank space.

そして可動ステージは、真空槽の底盤の一部を構成し、
その周辺は0リングに対して摺動摩擦係数の少ない潤滑
シール面が形成されていること。
The movable stage forms part of the bottom of the vacuum chamber,
A lubricating seal surface with a low sliding friction coefficient should be formed around the O-ring.

このため、従来同様のサーボモータによって試料台の×
Y平面内の送りが容易である。またステージ送り駆動用
の電源ケーブル、試料に対する信号ケーブル等の槽内配
線が不要となり、真空ポンプの負荷が軽減され、同時に
所定の真空度が迅速に得られる。
For this reason, a servo motor similar to the conventional one can be used to
Easy to feed in the Y plane. In addition, internal wiring such as a power cable for driving the stage feed and a signal cable for the sample is not required, the load on the vacuum pump is reduced, and at the same time, a predetermined degree of vacuum can be quickly obtained.

筒状の試料台は、表面に装着された試料に対し、その裏
面側から必要な信号及び電源用のケーブル長を最短距離
で収納するにも好都合である。
The cylindrical sample stage is convenient for storing the necessary signal and power cable lengths from the back side of the sample mounted on the front side in the shortest distance.

〔実施例〕〔Example〕

第1図は本発明の真空槽の試料位置決めステージ構成を
示す側断面図である。第2図は第1図の0リング4゛の
真空シール部Aの拡大断面図、また第3図は第1図の指
標線B−B切断になるステージ平面図である。
FIG. 1 is a side sectional view showing the structure of the sample positioning stage of the vacuum chamber of the present invention. 2 is an enlarged sectional view of the vacuum seal portion A of the O-ring 4'' shown in FIG. 1, and FIG. 3 is a plan view of the stage taken along the index line BB in FIG. 1.

実施例図は、従来同様の電子鏡筒25を結合せしめた真
空槽を例示しているが、本発明の試料位置決めステージ
は電子鏡筒25をともなう真空槽に限定するものではな
い。
Although the embodiment drawings illustrate a vacuum chamber to which an electron lens barrel 25 is coupled as in the prior art, the sample positioning stage of the present invention is not limited to a vacuum chamber with an electron lens barrel 25.

真空槽9の底盤8は、例えば鉄等を基材とし、該底盤8
の位置決めステージが装着される部分はXY方向のステ
ージ6の移動が可能な面積的に広い窓部7が打ち抜かれ
る。またその裏面には介挿された真空シール用のゴム状
Oリング4を安定に固定する溝11が形成される(第2
図)。
The bottom plate 8 of the vacuum chamber 9 is made of iron or the like as a base material, for example.
A wide window 7 is punched out in the portion where the positioning stage is mounted, allowing the stage 6 to move in the X and Y directions. In addition, a groove 11 is formed on the back surface of the groove 11 for stably fixing the inserted rubber O-ring 4 for vacuum sealing.
figure).

介挿のOリング4(直径約70)を介して底盤8に対接
する可動ステージ6は、微量のカーボンが添加された適
宜厚さの鉄が用いられる。
The movable stage 6, which is in contact with the bottom plate 8 via an interposed O-ring 4 (diameter approximately 70 mm), is made of iron of an appropriate thickness to which a small amount of carbon is added.

底盤8の中央は、直径約140mの筒状試料台3を嵌入
する貫通孔が形成され、貫通孔と試料台3間はOリング
13による気密シール部が形成される。
A through hole into which the cylindrical sample stand 3 having a diameter of approximately 140 m is inserted is formed in the center of the bottom plate 8, and an airtight seal portion is formed between the through hole and the sample stand 3 by an O-ring 13.

該ステージ6の表裏周辺面は平面研削加工法により高精
度の平坦面が形成される。尚、筒状の試料台3は、その
下端がベースステージ16側まで延び、該ステージ16
の窓部17に突出する。
The front and back peripheral surfaces of the stage 6 are formed into highly accurate flat surfaces by surface grinding. Note that the lower end of the cylindrical sample stage 3 extends to the base stage 16 side, and the lower end thereof extends to the base stage 16 side.
It protrudes into the window 17 of.

更に可動ステージ6の平坦な研削面は、第2図に示す摺
動摩擦係数が少ない摺動面5を形成する。
Further, the flat ground surface of the movable stage 6 forms a sliding surface 5 having a small sliding friction coefficient as shown in FIG.

摺動面5は、下地層に多孔質の例えばニッケルめっき屓
12を形成した後、その表面に500μmの有機質の液
状樹脂例えば弗素系の樹脂を含浸させかつこれを焼成し
て得られる。
The sliding surface 5 is obtained by forming a porous, for example, nickel plating layer 12 on the base layer, impregnating the surface with a 500 μm thick organic liquid resin, such as a fluorine-based resin, and firing the same.

かような摺動面5が形成された可動ステージ6を使用す
れば、ゴム状0リング4に対する摩擦係数μが略0.1
程度に収めら乳、可動ステージ6のXY平面内の駆動が
容易になる。然も、摺動面5は静摩擦係数(μ0)と動
摩擦係数(μS)の比が極めて少ない即ち、μ07μs
カ月程度の潤滑性のよい接触面が形成される。
If a movable stage 6 with such a sliding surface 5 is used, the coefficient of friction μ against the rubber O-ring 4 will be approximately 0.1.
The movement of the movable stage 6 in the XY plane becomes easy. However, the ratio of the static friction coefficient (μ0) to the dynamic friction coefficient (μS) of the sliding surface 5 is extremely small, that is, μ07μs.
A contact surface with good lubricity is formed for about a month.

第2図のOリング4による気密な摺動向5は、0リング
4による圧縮反力に抗して、上方向へ約200 kgの
荷重が印加される。従ってOリング4に接触する可動ス
テージ6に対するXY平面内の水平駆動力は約20kg
となる。
The airtight sliding movement 5 caused by the O-ring 4 in FIG. 2 resists the compression reaction force caused by the O-ring 4, and a load of about 200 kg is applied upward. Therefore, the horizontal driving force in the XY plane for the movable stage 6 that contacts the O-ring 4 is approximately 20 kg.
becomes.

可動ステージ6をX方向の送りステージとすれば、その
外側にY方向駆動の送りステージ15が設けられる。そ
してY方向送りステージ15はX方同送りステージ6に
対して、X方向の送りを平行的にガイドするようになっ
ている。
If the movable stage 6 is used as a feed stage in the X direction, a feed stage 15 for driving in the Y direction is provided outside of the movable stage 6. The Y-direction feed stage 15 guides the X-direction feed in parallel to the X-direction feed stage 6.

第3図はXY平面内に筒状試料台3を送り駆動せしめる
可動ステージ6.15の平面図である。同図は単ステー
ジ平面に複数方向の送り駆動がされるステージ構成であ
るが、ここは積層のステージ構成とすることも出来る。
FIG. 3 is a plan view of a movable stage 6.15 that drives and feeds the cylindrical sample stage 3 within the XY plane. Although the figure shows a stage configuration in which a single stage is fed and driven in multiple directions on a flat surface, a stacked stage configuration may also be used.

XY方向送りステージ6.15の下方は、上下(Z)方
向に可動するベースステージ16、が設けられる。
A base stage 16 movable in the vertical (Z) direction is provided below the XY direction feeding stage 6.15.

可動ステージ6.15は、従来同様のサーボモータ(該
モータは図示されない)で駆動される。図示18は該モ
ータの制御部である。
The movable stage 6.15 is driven by a conventional servo motor (not shown). Reference numeral 18 in the figure is a control section of the motor.

このように本発明の試料位置決めステージによれば、真
空槽底盤8の裏面に連接させて可動ステ間を用いて、プ
リント基板2が装着された試料台3の裏面側から試料1
に対する必要な信号ならびに電源がベースステージ16
内部の電子制御回路40から供給されることになり、従
来、問題とされた接続ケーブルの余長も大幅に短縮され
る。
As described above, according to the sample positioning stage of the present invention, the sample 1 is moved from the back side of the sample stage 3 on which the printed circuit board 2 is attached by using the movable stand connected to the back side of the vacuum chamber bottom plate 8.
The necessary signals and power for the base stage 16
Since the power is supplied from the internal electronic control circuit 40, the extra length of the connection cable, which has been a problem in the past, is also significantly reduced.

〔発明の効果〕〔Effect of the invention〕

以上、説明した本発明の真空中における試料位置決めス
テージによれば、真空槽の外部にステージが配置されて
いることから、真空槽自体も簡素化されることから、こ
れをLSIやICの診断試験や不良解析等に適用すれば
試験の効率が向上しまた試験の信頼性も向上する顕著な
効果がある。
As described above, according to the sample positioning stage in vacuum of the present invention, since the stage is placed outside the vacuum chamber, the vacuum chamber itself can be simplified, and this can be used for diagnostic tests of LSIs and ICs. If applied to testing and failure analysis, it will have a remarkable effect of improving test efficiency and test reliability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の真空槽の試料位置決めステージの側断
面図、 第2図は第1図の0リングの真空シール部のA部の拡大
断面図、 第3図は第1図の指標線B−B切断のステージ平面図、 第4図は従来の真空槽内の試料位置決めステージ側断面
図である。 図中、1は試料(例えばICチップ)、2はプリント基
板、3は試料台、 4は0リング、  5は摺動摩擦面、 6は可動ステージ、7は底盤8の貫通孔、8は真空槽の
底盤、9は真空槽、 10は試料台3が突出する真空空間、
Fig. 1 is a side sectional view of the sample positioning stage of the vacuum chamber of the present invention, Fig. 2 is an enlarged sectional view of part A of the vacuum seal portion of the O-ring in Fig. 1, and Fig. 3 is the index line in Fig. 1. FIG. 4 is a side sectional view of a stage for positioning a sample in a conventional vacuum chamber. In the figure, 1 is a sample (for example, an IC chip), 2 is a printed circuit board, 3 is a sample stage, 4 is an O-ring, 5 is a sliding friction surface, 6 is a movable stage, 7 is a through hole in the bottom plate 8, and 8 is a vacuum chamber 9 is a vacuum chamber, 10 is a vacuum space from which the sample stage 3 protrudes,

Claims (1)

【特許請求の範囲】 真空槽(9)と、窓部(7)を有する底盤(8)と、該
底盤(8)の裏面側において連接されるOリング(4)
との摺動摩擦係数が少ない摺動面(5)が形成されたX
Y方向へ送り駆動される可動ステージ(6)または(1
5)と、 前記ステージ(6)または(15)と一体的に連結され
かつ底盤(8)の面より突出して配置された筒状の試料
台(3)、からなる前記試料台(3)上に載置された試
料(1)を真空中(10)で位置決めするようにしたこ
とを特徴とする試料位置決めステージ。
[Claims] A vacuum chamber (9), a bottom plate (8) having a window (7), and an O-ring (4) connected on the back side of the bottom plate (8).
A sliding surface (5) with a small sliding friction coefficient is formed.
The movable stage (6) or (1) is driven in the Y direction.
5); and a cylindrical sample stand (3) integrally connected to the stage (6) or (15) and arranged to protrude from the surface of the bottom plate (8). A sample positioning stage characterized in that a sample (1) placed on a sample is positioned in a vacuum (10).
JP9774287A 1987-04-20 1987-04-20 Positioning stage of sample Pending JPS63262516A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9774287A JPS63262516A (en) 1987-04-20 1987-04-20 Positioning stage of sample

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9774287A JPS63262516A (en) 1987-04-20 1987-04-20 Positioning stage of sample

Publications (1)

Publication Number Publication Date
JPS63262516A true JPS63262516A (en) 1988-10-28

Family

ID=14200344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9774287A Pending JPS63262516A (en) 1987-04-20 1987-04-20 Positioning stage of sample

Country Status (1)

Country Link
JP (1) JPS63262516A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03185327A (en) * 1989-12-15 1991-08-13 Sanwa Musen Sokki Kenkyusho:Kk Vaccum measuring apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124044A (en) * 1984-11-20 1986-06-11 Fujitsu Ltd Apparatus for positioning measuring point of electron beam prober

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124044A (en) * 1984-11-20 1986-06-11 Fujitsu Ltd Apparatus for positioning measuring point of electron beam prober

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03185327A (en) * 1989-12-15 1991-08-13 Sanwa Musen Sokki Kenkyusho:Kk Vaccum measuring apparatus

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