JPS63238088A - Production of chlorosilanes - Google Patents
Production of chlorosilanesInfo
- Publication number
- JPS63238088A JPS63238088A JP62070939A JP7093987A JPS63238088A JP S63238088 A JPS63238088 A JP S63238088A JP 62070939 A JP62070939 A JP 62070939A JP 7093987 A JP7093987 A JP 7093987A JP S63238088 A JPS63238088 A JP S63238088A
- Authority
- JP
- Japan
- Prior art keywords
- mol
- phosgene
- silanols
- reaction
- chlorosilanes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title claims description 15
- 239000005046 Chlorosilane Substances 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims abstract description 33
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims abstract description 19
- 150000004819 silanols Chemical class 0.000 claims abstract description 19
- 150000003511 tertiary amides Chemical class 0.000 claims abstract description 14
- FGWRMMTYIZKYMA-UHFFFAOYSA-N tert-butyl-hydroxy-dimethylsilane Chemical compound CC(C)(C)[Si](C)(C)O FGWRMMTYIZKYMA-UHFFFAOYSA-N 0.000 claims abstract description 6
- JIKUXBYRTXDNIY-UHFFFAOYSA-N n-methyl-n-phenylformamide Chemical compound O=CN(C)C1=CC=CC=C1 JIKUXBYRTXDNIY-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000126 substance Substances 0.000 claims abstract description 4
- 125000000217 alkyl group Chemical group 0.000 claims abstract 4
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 239000002994 raw material Substances 0.000 abstract description 3
- 239000003905 agrochemical Substances 0.000 abstract description 2
- 150000001408 amides Chemical class 0.000 abstract description 2
- 150000004756 silanes Chemical class 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 9
- 238000003756 stirring Methods 0.000 description 8
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000009835 boiling Methods 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- DPSOMRBQJJNYJD-UHFFFAOYSA-N decyl-hydroxy-dimethylsilane Chemical compound CCCCCCCCCC[Si](C)(C)O DPSOMRBQJJNYJD-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- VKNKSKIMMVEIPM-UHFFFAOYSA-N hexyl-hydroxy-dimethylsilane Chemical compound CCCCCC[Si](C)(C)O VKNKSKIMMVEIPM-UHFFFAOYSA-N 0.000 description 2
- CUUJVBDPSUOTIQ-UHFFFAOYSA-N hydroxy-dimethyl-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](C)(C)O CUUJVBDPSUOTIQ-UHFFFAOYSA-N 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- WVMSIBFANXCZKT-UHFFFAOYSA-N triethyl(hydroxy)silane Chemical compound CC[Si](O)(CC)CC WVMSIBFANXCZKT-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- ZLZGHBNDPINFKG-UHFFFAOYSA-N chloro-decyl-dimethylsilane Chemical compound CCCCCCCCCC[Si](C)(C)Cl ZLZGHBNDPINFKG-UHFFFAOYSA-N 0.000 description 1
- GZGREZWGCWVAEE-UHFFFAOYSA-N chloro-dimethyl-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](C)(C)Cl GZGREZWGCWVAEE-UHFFFAOYSA-N 0.000 description 1
- JQYKSDDVPXVEOL-UHFFFAOYSA-N chloro-hexyl-dimethylsilane Chemical compound CCCCCC[Si](C)(C)Cl JQYKSDDVPXVEOL-UHFFFAOYSA-N 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- XTNJZUUYUPLUDP-UHFFFAOYSA-N diethyl-hydroxy-methylsilane Chemical compound CC[Si](C)(O)CC XTNJZUUYUPLUDP-UHFFFAOYSA-N 0.000 description 1
- QPDJWMFCTPUULR-UHFFFAOYSA-N diethyl-hydroxy-propylsilane Chemical compound CCC[Si](O)(CC)CC QPDJWMFCTPUULR-UHFFFAOYSA-N 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- AXCGWVYNDXPANP-UHFFFAOYSA-N ethyl-hydroxy-dimethylsilane Chemical compound CC[Si](C)(C)O AXCGWVYNDXPANP-UHFFFAOYSA-N 0.000 description 1
- DYDNPESBYVVLBO-UHFFFAOYSA-N formanilide Chemical compound O=CNC1=CC=CC=C1 DYDNPESBYVVLBO-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- LWIGVRDDANOFTD-UHFFFAOYSA-N hydroxy(dimethyl)silane Chemical compound C[SiH](C)O LWIGVRDDANOFTD-UHFFFAOYSA-N 0.000 description 1
- IOANYFLVSWZRND-UHFFFAOYSA-N hydroxy(tripropyl)silane Chemical compound CCC[Si](O)(CCC)CCC IOANYFLVSWZRND-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DCNUQRBLZWSGAV-UHFFFAOYSA-N n,n-diphenylformamide Chemical compound C=1C=CC=CC=1N(C=O)C1=CC=CC=C1 DCNUQRBLZWSGAV-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- JYVWRCIOZLRMKO-UHFFFAOYSA-N tributyl(hydroxy)silane Chemical compound CCCC[Si](O)(CCCC)CCCC JYVWRCIOZLRMKO-UHFFFAOYSA-N 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野〉
本発明はシラノール類からクロルシラン類を製造する方
法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for producing chlorosilanes from silanols.
クロルシラン類はシリコンゴム、シリコン油、シリコン
樹脂などの有機ケイ素製品の中間体として、また医薬品
、農薬、染料などの有機薬品製造の原料として広範囲な
産業分野に利用される重要な化合物である。Chlorsilanes are important compounds used in a wide range of industrial fields as intermediates for organosilicon products such as silicone rubber, silicone oil, and silicone resin, and as raw materials for the production of organic chemicals such as pharmaceuticals, agricultural chemicals, and dyes.
〈従来の技術〉
シラノール類からクロルシラン類を得る方法としては次
の方法が知られている。<Prior Art> The following method is known as a method for obtaining chlorosilanes from silanols.
(1)シラノール類に塩化水素を反応させる方法〔ケミ
カルアブストラクト(Chemical Abstra
ct)74巻、58908W)
(2) シラノール類に五塩化リンを反応させる方法
〔ジャーナル・オブ・オーガノメタリック・ケミストリ
ー(Journal of Organon+etal
lic Che−sistry) 275巻、01〜0
4ページ(1984年)〕
(発明が解決しようとする問題点ン
しかしながら、上記の公知の方法では零度以下の低温で
反応する必要があり、工業的に不利な条件下での反応で
あったり、また不要の副生物を伴い、場合によっては反
応の後処理の際に生じる廃液の処理などの環境保全上の
問題を伴って必ずしも満足できるものではない。(1) Method of reacting silanols with hydrogen chloride [Chemical Abstract
ct) Volume 74, 58908W) (2) Method of reacting silanols with phosphorus pentachloride [Journal of Organometallic Chemistry (Journal of Organon+etal)
lic Che-sistry) Volume 275, 01-0
Page 4 (1984)] (Problems to be Solved by the Invention) However, in the above-mentioned known methods, it is necessary to carry out the reaction at a low temperature below zero, and the reaction may be carried out under industrially disadvantageous conditions. Moreover, it is not always satisfactory, as it produces unnecessary by-products and, in some cases, causes problems in terms of environmental protection, such as the treatment of waste liquid generated during post-treatment of the reaction.
かかる事情に鑑み、本発明者らはシラノール類からクロ
ルシラン類を工業的に有利に製造する方法を検討した結
果、シラノール類に三級アミドの存在下にホスゲンを反
応させることにより、穏やかな条件で選択的かつ高収率
でクロルシラン類を製造できることを見いだし、本発明
を完成させるに至った。In view of these circumstances, the present inventors investigated an industrially advantageous method for producing chlorosilanes from silanols, and found that chlorosilanes can be produced under mild conditions by reacting silanols with phosgene in the presence of a tertiary amide. It was discovered that chlorosilanes can be produced selectively and in high yields, leading to the completion of the present invention.
く問題点を解決するための手段〉
すなわち、本発明は一般式
[
%式%
で示されるシラノール類に三級アミドの存在下にホスゲ
ンを反応させることを特徴とするクロルシラン類の製造
方法である。Namely, the present invention is a method for producing chlorosilanes, which is characterized by reacting silanols represented by the general formula [% formula %] with phosgene in the presence of a tertiary amide. .
本発明において用いられるシラノール類としてはトリエ
チルシラノール、トリメチルシラノール、トリブチルシ
ラノール、トリプロピルシラノール、エチルジメチルシ
ラノール、ジエチルメチルシラノール、t−ブチルジメ
チルシラノール、ジエチルプロピルシラノール、ヘキシ
ルジメチルシラノール、デシルジメチルシラノール、テ
トラデシルジメチルシラノール、オクタデシルジメチル
シラノールなどを挙げることができるが、これらに限定
されるものではない。The silanols used in the present invention include triethylsilanol, trimethylsilanol, tributylsilanol, tripropylsilanol, ethyldimethylsilanol, diethylmethylsilanol, t-butyldimethylsilanol, diethylpropylsilanol, hexyldimethylsilanol, decyldimethylsilanol, and tetradecyl. Examples include dimethylsilanol, octadecyldimethylsilanol, and the like, but are not limited to these.
これらのシラノール類は容易に人手可能であり、また有
機薬品の製造において官能基の保護または活性化のため
に用いられるクロルシラン類から副生ずるシラノール類
を用いることもできる。These silanols can be easily produced manually, and silanols produced by-product from chlorosilanes used for protecting or activating functional groups in the production of organic drugs can also be used.
本発明に用いられる三級アミドとしてはN。The tertiary amide used in the present invention is N.
N−ジ置換カルボン酸アミドが一触に用いられる。 ′
N、N−ジメチルホルムアミド、N、N−ジエチルホル
ムアミド、N−メチル−N−フェニルホルムアミド、N
、N−ジフェニルホルムアミド、N、N−ジメチルアセ
トアミド、及びこれらの酸アミドを側鎖に存する高分子
等が挙げられる。N-disubstituted carboxylic acid amides are commonly used. 'N,N-dimethylformamide, N,N-diethylformamide, N-methyl-N-phenylformamide, N
, N-diphenylformamide, N,N-dimethylacetamide, and polymers having these acid amides in their side chains.
反応速度が大きいことから好ましくはN、 N−ジメチ
ルホルムアミド、N−メチル−N−フェニルホルムアミ
ドが、特に好ましくはN、 N−ジメチルホルムアミド
が用いられる。Since the reaction rate is high, N,N-dimethylformamide and N-methyl-N-phenylformamide are preferably used, and N,N-dimethylformamide is particularly preferably used.
三級アミドは一般にシラノール類中のケイ素−酸素結合
1当債当たり約0.001モル以上、好ましくは0.0
1モル以上、特に好ましくは0゜02モル以上用いられ
る。The tertiary amide is generally about 0.001 mol or more per silicon-oxygen bond in the silanol, preferably 0.0 mol or more.
It is used in an amount of 1 mol or more, particularly preferably 0.02 mol or more.
三級アミドは溶媒としての機能も兼ねているので、上限
は特に制限されるものではない。Since the tertiary amide also functions as a solvent, the upper limit is not particularly limited.
三級アミドの使用量が約0.001モルより少ないと反
応完結に長時間を要するため好ましくない。If the amount of tertiary amide used is less than about 0.001 mole, it is not preferable because it takes a long time to complete the reaction.
反応促進のためだけには通常0.01〜0.2モル程度
用いられる。It is usually used in an amount of about 0.01 to 0.2 mol just to promote the reaction.
シラノール類との反応に供されるホスゲンの使用量は、
シラノール類中のケイ素−酸素結合をすべてケイ素−塩
素結合に変喚するためにはケイ素−酸素結合1当量に対
して1当量以上必要である。The amount of phosgene used for reaction with silanols is:
In order to convert all the silicon-oxygen bonds in the silanols into silicon-chlorine bonds, 1 equivalent or more is required per 1 equivalent of silicon-oxygen bonds.
過剰のホスゲンは反応後、未反応のまま残存するので、
必要以上に使用することは回収操作に多大な労力を要す
るので好ましくない。Excess phosgene remains unreacted after the reaction, so
It is not preferable to use more than necessary because the recovery operation requires a lot of effort.
ホスゲンが残ることが不都合な場合は1当量以下にする
こともできる。If it is inconvenient for phosgene to remain, the amount can be reduced to 1 equivalent or less.
この場合には反応に供されたホスゲンはすべて目的物の
生成に消費される。In this case, all of the phosgene used in the reaction is consumed to produce the target product.
通常シラノール類中のケイ素−酸素結合1当量に対して
約0.8〜1.2当量の塩素化剤が用いられる。Usually, about 0.8 to 1.2 equivalents of the chlorinating agent are used per equivalent of silicon-oxygen bonds in the silanols.
本反応は一般には溶媒の存在下に実施されるが、無溶媒
でも実施できる。This reaction is generally carried out in the presence of a solvent, but can also be carried out without a solvent.
かかるン容媒としてはベンゼン、トルエン、キシレン、
モノクロルベンゼン、ジクロルベンゼンなどの芳香族炭
化水素、シクロヘキサン、ヘキサン、n−へブタン、n
−オクタン、メチルシクロヘキサン、イソオクタンなど
の脂肪族炭化水素、ジエチルエーテル、ジブチルエーテ
ルなどのエーテル、酢酸エチル、酢酸ブチルなどのエス
テル、N、N−ジメチルホルムアミド、N−メチル−N
−フェニルホルムアミドなどの酸アミド、クロロホルム
、1.2−ジクロルエタン、1,1.1−トリクロルエ
タン、1.l。Such carriers include benzene, toluene, xylene,
Aromatic hydrocarbons such as monochlorobenzene and dichlorobenzene, cyclohexane, hexane, n-hebutane, n
-Aliphatic hydrocarbons such as octane, methylcyclohexane and isooctane, ethers such as diethyl ether and dibutyl ether, esters such as ethyl acetate and butyl acetate, N,N-dimethylformamide, N-methyl-N
- Acid amides such as phenylformamide, chloroform, 1,2-dichloroethane, 1,1,1-trichloroethane, 1. l.
2− ト!J クロルエタン、テトラクロルエチレンな
どの低級ハロゲン化炭化水素を挙げることができる。2- To! J Examples include lower halogenated hydrocarbons such as chloroethane and tetrachloroethylene.
反応は一般には約O℃〜100℃、好ましくは20℃〜
70℃の温度で実施される。The reaction is generally carried out at a temperature of about 0°C to 100°C, preferably 20°C to
It is carried out at a temperature of 70°C.
反応温度が約100℃を越すと三級アミドの分解により
収率が低下し、また0℃より低いと反応速度が遅くなっ
て反応完結に長時間を要するので好ましくない。If the reaction temperature exceeds about 100°C, the yield will decrease due to decomposition of the tertiary amide, and if it is lower than 0°C, the reaction rate will be slow and it will take a long time to complete the reaction, which is not preferred.
反応圧力は加圧でも減圧でも別設差し支えないが、通常
は常圧付近で実施される。Although the reaction pressure may be increased or decreased, it is usually carried out at around normal pressure.
反応方法は連続式、半連続式または回分式のいずれでも
行うことができる。The reaction method can be carried out continuously, semi-continuously or batchwise.
通常、反応はシラノール類と三級アミド、または場合に
より溶媒をあらかじめ混合した混合物中にホスゲンを導
入することにより行われる。The reaction is usually carried out by introducing phosgene into a premixed mixture of silanols and tertiary amide, or optionally a solvent.
上記反応方法によって得られた反応液からクロルシラン
類は蒸留など公知の方法によって容易に原料であるシラ
ノール類、ホスゲン、三級アミド、副生物または溶媒と
分離することができる。Chlorosilanes can be easily separated from the raw materials silanols, phosgene, tertiary amides, by-products, or solvents from the reaction solution obtained by the above reaction method by a known method such as distillation.
また分離された三級アミド及び溶媒は繰り返して反応に
使用することができる。Furthermore, the separated tertiary amide and solvent can be used repeatedly in the reaction.
〈発明の効果〉
三級アミドの存在下にホスゲンをシラノール類に反応さ
せる本発明方法によれば、従来の方法にくらべて穏やか
な条件下で反応ができ、高収率でクロルシラン類を製造
することができる。<Effects of the Invention> According to the method of the present invention in which phosgene is reacted with silanols in the presence of a tertiary amide, the reaction can be carried out under milder conditions than in conventional methods, and chlorosilanes can be produced in high yield. be able to.
さらに副生物が蒸留などの操作により容易に分離できる
ため、高純度のクロルシラン類を容易に製造することが
できる。Furthermore, since by-products can be easily separated by operations such as distillation, highly pure chlorosilanes can be easily produced.
〈実施例〉
以下、本発明を実施例により更に具体的に説明するが、
本発明はこれらの実施例に限定されるものではない。<Examples> Hereinafter, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited to these examples.
実施例1
ガス導入管、還流冷却器、温度計、撹拌器を備えたガラ
ス製反応器に、t−ブチルジメチルシラノール66.1
g(0,5モル)、4.2−ジクロルエタン265g及
びN、N−ジメチルホルムアミド18.3 g (0,
25モル)を仕込み、撹拌しながらこの中にホスゲン7
4.0g(0,748モル)を温度40〜45℃で2時
間にわたって導入した。導入終了後、反応混合物を蒸留
することによりt−ブチルジメチルクロルシラン72.
4g(沸点124〜126℃、収率96゜0%)を得た
。Example 1 A glass reactor equipped with a gas inlet tube, a reflux condenser, a thermometer, and a stirrer was charged with 66.1 g of t-butyldimethylsilanol.
g (0,5 mol), 265 g of 4,2-dichloroethane and 18.3 g of N,N-dimethylformamide (0,
25 mol) and add phosgene 7 to this while stirring.
4.0 g (0,748 mol) were introduced over a period of 2 hours at a temperature of 40-45°C. After the introduction is complete, the reaction mixture is distilled to yield 72% of t-butyldimethylchlorosilane.
4 g (boiling point 124-126°C, yield 96°0%) was obtained.
実施例2
実施例1と同様の反応器に、トリエチルシラノール66
.2g(0,5モル)、1.2−ジクロルエタン250
g及びN、 N−ジメチルホルムアミド3.65 g
(0,05モル)を仕込み、撹拌しながらこの中にホス
ゲン54.4g(0,55モル)を40〜45℃で2時
間にわたって導入した。導入終了後、実施例1と同様の
操作を行ってトリエチルクロルシラン71.6g(沸点
144〜145℃、収率95%)を得た。Example 2 In a reactor similar to Example 1, triethylsilanol 66
.. 2g (0.5 mol), 1,2-dichloroethane 250
g and N, N-dimethylformamide 3.65 g
(0.05 mol) was charged, and 54.4 g (0.55 mol) of phosgene was introduced thereinto at 40-45° C. over 2 hours while stirring. After the introduction was completed, the same operation as in Example 1 was performed to obtain 71.6 g of triethylchlorosilane (boiling point 144-145°C, yield 95%).
実施例3
実施例1と同様の反応器に、t−ブチルジメチルシラノ
ール66.1g(0,5モル)、1.2−ジクロルエタ
ン950 g7及びN−メチル−N−フェニルホルムア
ミド6.76 g (0,05モル)を仕込み、撹拌下
にこの中にホスゲン54.4 g(0,55モル)を4
0〜45℃で2時間にわたって導入した。導入終了後、
同温度で3時間撹拌を続けた後、実施例1と同様の操作
を行ってt−ブチルジメチルクロルシラン69.3g(
tA点124〜125℃、収率92%)を得た。Example 3 In a reactor similar to Example 1, 66.1 g (0.5 mol) of t-butyldimethylsilanol, 950 g (7 mol) of 1,2-dichloroethane and 6.76 g (0.5 mol) of N-methyl-N-phenylformamide were added. , 0.05 mol), and 54.4 g (0.55 mol) of phosgene was added to it while stirring.
The introduction was carried out over a period of 2 hours at 0-45°C. After the installation is complete,
After continuing stirring at the same temperature for 3 hours, the same operation as in Example 1 was performed to obtain 69.3 g of t-butyldimethylchlorosilane (
tA point 124-125°C, yield 92%).
実施例4
実施例1と同様の反応器に、ヘキシルジメチルシラノー
ル40.1g(0,25モル)、1.2−ジクロルエタ
ン160g及びN、N−ジメチルホルムアミド1.83
g (0,025モル)を仕込み、撹拌しながらこの
中にホスゲン27.2 g(0,275モル)を40〜
45℃で2時間にわたって導入した。導入終了後、実施
例1と同様の操作を行って、ヘキシルジメチルクロルシ
ラン40.7g(沸点77〜80℃/ 16 T o
r r収率91%)を得た。Example 4 In a reactor similar to Example 1, 40.1 g (0.25 mol) of hexyldimethylsilanol, 160 g of 1,2-dichloroethane and 1.83 g of N,N-dimethylformamide were added.
g (0,025 mol) and 27.2 g (0,275 mol) of phosgene was added into the mixture while stirring.
The introduction was carried out for 2 hours at 45°C. After the introduction, the same operation as in Example 1 was performed to obtain 40.7 g of hexyldimethylchlorosilane (boiling point 77-80°C/16 To
rr yield of 91%) was obtained.
実施例5
実施例1と同様の反応器に、デシルジメチルシラノール
54.1g(0,25モル)、1.2−ジクロルエタン
215g及びN、N−ジメチルホルムアミド1.83
g (0,025モル)を仕込み、撹拌しながらこの中
にホスゲン27.2 g(0,2’15モル)を40〜
45℃で2時間にわたって導入した。導入終了後、実施
例1と同様の操作を行って、デシルジメチルクロルシラ
ン51.7g<沸点103〜106℃/ l T o
r r収率88%)を得た。Example 5 In a reactor similar to Example 1, 54.1 g (0.25 mol) of decyldimethylsilanol, 215 g of 1,2-dichloroethane and 1.83 g of N,N-dimethylformamide were added.
g (0,025 mol) and 27.2 g (0.2'15 mol) of phosgene was added into the mixture while stirring.
The introduction was carried out for 2 hours at 45°C. After the introduction was completed, the same operation as in Example 1 was performed to obtain 51.7 g of decyldimethylchlorosilane <boiling point 103-106°C/l To
rr yield of 88%) was obtained.
実施例6
実施例1と同様の反応器に、オクタデシルジメチルシラ
ノール82.2 g (0,25モル)、■。Example 6 In a reactor similar to Example 1, 82.2 g (0.25 mol) of octadecyldimethylsilanol was added.
2−ジクロルエタン330g及びN、N−ジメチルホル
ムアミド1.83 g (0,025モル)を仕込み、
撹拌しながらこの中にホスゲン27.2g (0,27
5モル)を40〜45℃で2時間にわたって導入した。330 g of 2-dichloroethane and 1.83 g (0,025 mol) of N,N-dimethylformamide were charged,
27.2 g of phosgene (0,27
5 mol) was introduced over a period of 2 hours at 40-45°C.
導入終了後、実施例1と同様の操作を行ってオクタデシ
ルジメチルクロルシラン75.5g(沸点184〜18
6℃10.2Torr、収率87%)を得た。After the introduction, the same operation as in Example 1 was carried out to obtain 75.5 g of octadecyldimethylchlorosilane (boiling point 184-18
6° C., 10.2 Torr, yield 87%).
比較例
実施例1と同様の反応器に、t−ブチルジメチルシラノ
ール66.1g (0,5モル)、1゜2−ジクロルエ
タン265gを仕込み、攪拌し′ながらこの中にホスゲ
ン98.9g (1,0モル)を温度60℃で10時間
にわたって導入した。導入終了後、同温度でさらに8時
間攪拌を続けた。反応混合物をガスクロマトグラフを用
いて分析したところt−ブチルジメチルクロルシラン8
.38(収率11%)が生成していた。Comparative Example Into the same reactor as in Example 1, 66.1 g (0.5 mol) of t-butyldimethylsilanol and 265 g of 1.2-dichloroethane were charged, and 98.9 g (1.5 mol) of phosgene was added to the reactor while stirring. 0 mol) was introduced over a period of 10 hours at a temperature of 60°C. After the introduction was completed, stirring was continued for an additional 8 hours at the same temperature. Analysis of the reaction mixture using gas chromatography revealed that t-butyldimethylchlorosilane 8
.. 38 (yield 11%) was produced.
Claims (3)
1〜3のアルキル基を表す。] で示されるシラノール類に三級アミドの存在下にホスゲ
ンを反応させることを特徴とするクロルシラン類の製造
方法。(1) General formula ▲ There are numerical formulas, chemical formulas, tables, etc. ▼ [In the formula, R_1 represents an alkyl group having 1 to 18 carbon atoms, and R_2 and R_3 represent the same or different alkyl groups having 1 to 3 carbon atoms. ] A method for producing chlorosilanes, which comprises reacting silanols represented by the following with phosgene in the presence of a tertiary amide.
はN−メチル−N−フェニルホルムアミドである特許請
求の範囲第1項記載のクロルシラン類の製造方法。(2) The method for producing chlorosilanes according to claim 1, wherein the tertiary amide is N,N-dimethylformamide or N-methyl-N-phenylformamide.
ある特許請求の範囲第1項記載のクロルシラン類の製造
方法。(3) The method for producing chlorosilanes according to claim 1, wherein the silanol is t-butyldimethylsilanol.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62070939A JPH0714947B2 (en) | 1987-03-24 | 1987-03-24 | Method for producing chlorosilanes |
US07/150,902 US4780556A (en) | 1987-02-06 | 1988-02-01 | Method for producing chlorosilanes |
EP88101482A EP0278368B1 (en) | 1987-02-06 | 1988-02-02 | A method for producing chlorosilanes |
DE8888101482T DE3860612D1 (en) | 1987-02-06 | 1988-02-02 | METHOD FOR PRODUCING CHLOROSILANES. |
CA000557994A CA1310655C (en) | 1987-02-06 | 1988-02-02 | Method for producing chlorosilanes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62070939A JPH0714947B2 (en) | 1987-03-24 | 1987-03-24 | Method for producing chlorosilanes |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63238088A true JPS63238088A (en) | 1988-10-04 |
JPH0714947B2 JPH0714947B2 (en) | 1995-02-22 |
Family
ID=13445973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62070939A Expired - Fee Related JPH0714947B2 (en) | 1987-02-06 | 1987-03-24 | Method for producing chlorosilanes |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0714947B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007231022A (en) * | 1996-03-15 | 2007-09-13 | Dow Agrosciences Llc | Use of n,n-disubstituted formamide as halogenation catalyst |
-
1987
- 1987-03-24 JP JP62070939A patent/JPH0714947B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007231022A (en) * | 1996-03-15 | 2007-09-13 | Dow Agrosciences Llc | Use of n,n-disubstituted formamide as halogenation catalyst |
Also Published As
Publication number | Publication date |
---|---|
JPH0714947B2 (en) | 1995-02-22 |
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