JPS63238088A - Production of chlorosilanes - Google Patents

Production of chlorosilanes

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Publication number
JPS63238088A
JPS63238088A JP62070939A JP7093987A JPS63238088A JP S63238088 A JPS63238088 A JP S63238088A JP 62070939 A JP62070939 A JP 62070939A JP 7093987 A JP7093987 A JP 7093987A JP S63238088 A JPS63238088 A JP S63238088A
Authority
JP
Japan
Prior art keywords
mol
phosgene
silanols
reaction
chlorosilanes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62070939A
Other languages
Japanese (ja)
Other versions
JPH0714947B2 (en
Inventor
Tetsuo Murata
哲雄 村田
Katsuhisa Masumoto
勝久 増本
Masaru Kamoda
勝 鴨田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP62070939A priority Critical patent/JPH0714947B2/en
Priority to US07/150,902 priority patent/US4780556A/en
Priority to EP88101482A priority patent/EP0278368B1/en
Priority to DE8888101482T priority patent/DE3860612D1/en
Priority to CA000557994A priority patent/CA1310655C/en
Publication of JPS63238088A publication Critical patent/JPS63238088A/en
Publication of JPH0714947B2 publication Critical patent/JPH0714947B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To readily obtain the titled silanes useful as a raw material producing organic chemicals, such as an intermediate for an organosilicon products and agricultural chemicals in high purity and high yield, by reacting a specific silanols with phosgene in the presence of an amide. CONSTITUTION:(A) Silanols expressed by the formula (R1 represents 1-18C alkyl; R2 and R3 represent 1-3C alkyl) (e.g. t-butyldimethylsilanol) are reacted with (C) phosgene in the presence of (B) a tertiary amide, for example at 20-70 deg.C. As for the component (B), N,N-dimethylformamide or N-methyl-N- phenylformamide is preferably used.

Description

【発明の詳細な説明】 (産業上の利用分野〉 本発明はシラノール類からクロルシラン類を製造する方
法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for producing chlorosilanes from silanols.

クロルシラン類はシリコンゴム、シリコン油、シリコン
樹脂などの有機ケイ素製品の中間体として、また医薬品
、農薬、染料などの有機薬品製造の原料として広範囲な
産業分野に利用される重要な化合物である。
Chlorsilanes are important compounds used in a wide range of industrial fields as intermediates for organosilicon products such as silicone rubber, silicone oil, and silicone resin, and as raw materials for the production of organic chemicals such as pharmaceuticals, agricultural chemicals, and dyes.

〈従来の技術〉 シラノール類からクロルシラン類を得る方法としては次
の方法が知られている。
<Prior Art> The following method is known as a method for obtaining chlorosilanes from silanols.

(1)シラノール類に塩化水素を反応させる方法〔ケミ
カルアブストラクト(Chemical Abstra
ct)74巻、58908W) (2)  シラノール類に五塩化リンを反応させる方法
〔ジャーナル・オブ・オーガノメタリック・ケミストリ
ー(Journal of Organon+etal
lic Che−sistry) 275巻、01〜0
4ページ(1984年)〕 (発明が解決しようとする問題点ン しかしながら、上記の公知の方法では零度以下の低温で
反応する必要があり、工業的に不利な条件下での反応で
あったり、また不要の副生物を伴い、場合によっては反
応の後処理の際に生じる廃液の処理などの環境保全上の
問題を伴って必ずしも満足できるものではない。
(1) Method of reacting silanols with hydrogen chloride [Chemical Abstract
ct) Volume 74, 58908W) (2) Method of reacting silanols with phosphorus pentachloride [Journal of Organometallic Chemistry (Journal of Organon+etal)
lic Che-sistry) Volume 275, 01-0
Page 4 (1984)] (Problems to be Solved by the Invention) However, in the above-mentioned known methods, it is necessary to carry out the reaction at a low temperature below zero, and the reaction may be carried out under industrially disadvantageous conditions. Moreover, it is not always satisfactory, as it produces unnecessary by-products and, in some cases, causes problems in terms of environmental protection, such as the treatment of waste liquid generated during post-treatment of the reaction.

かかる事情に鑑み、本発明者らはシラノール類からクロ
ルシラン類を工業的に有利に製造する方法を検討した結
果、シラノール類に三級アミドの存在下にホスゲンを反
応させることにより、穏やかな条件で選択的かつ高収率
でクロルシラン類を製造できることを見いだし、本発明
を完成させるに至った。
In view of these circumstances, the present inventors investigated an industrially advantageous method for producing chlorosilanes from silanols, and found that chlorosilanes can be produced under mild conditions by reacting silanols with phosgene in the presence of a tertiary amide. It was discovered that chlorosilanes can be produced selectively and in high yields, leading to the completion of the present invention.

く問題点を解決するための手段〉 すなわち、本発明は一般式 [ %式% で示されるシラノール類に三級アミドの存在下にホスゲ
ンを反応させることを特徴とするクロルシラン類の製造
方法である。
Namely, the present invention is a method for producing chlorosilanes, which is characterized by reacting silanols represented by the general formula [% formula %] with phosgene in the presence of a tertiary amide. .

本発明において用いられるシラノール類としてはトリエ
チルシラノール、トリメチルシラノール、トリブチルシ
ラノール、トリプロピルシラノール、エチルジメチルシ
ラノール、ジエチルメチルシラノール、t−ブチルジメ
チルシラノール、ジエチルプロピルシラノール、ヘキシ
ルジメチルシラノール、デシルジメチルシラノール、テ
トラデシルジメチルシラノール、オクタデシルジメチル
シラノールなどを挙げることができるが、これらに限定
されるものではない。
The silanols used in the present invention include triethylsilanol, trimethylsilanol, tributylsilanol, tripropylsilanol, ethyldimethylsilanol, diethylmethylsilanol, t-butyldimethylsilanol, diethylpropylsilanol, hexyldimethylsilanol, decyldimethylsilanol, and tetradecyl. Examples include dimethylsilanol, octadecyldimethylsilanol, and the like, but are not limited to these.

これらのシラノール類は容易に人手可能であり、また有
機薬品の製造において官能基の保護または活性化のため
に用いられるクロルシラン類から副生ずるシラノール類
を用いることもできる。
These silanols can be easily produced manually, and silanols produced by-product from chlorosilanes used for protecting or activating functional groups in the production of organic drugs can also be used.

本発明に用いられる三級アミドとしてはN。The tertiary amide used in the present invention is N.

N−ジ置換カルボン酸アミドが一触に用いられる。 ′ N、N−ジメチルホルムアミド、N、N−ジエチルホル
ムアミド、N−メチル−N−フェニルホルムアミド、N
、N−ジフェニルホルムアミド、N、N−ジメチルアセ
トアミド、及びこれらの酸アミドを側鎖に存する高分子
等が挙げられる。
N-disubstituted carboxylic acid amides are commonly used. 'N,N-dimethylformamide, N,N-diethylformamide, N-methyl-N-phenylformamide, N
, N-diphenylformamide, N,N-dimethylacetamide, and polymers having these acid amides in their side chains.

反応速度が大きいことから好ましくはN、 N−ジメチ
ルホルムアミド、N−メチル−N−フェニルホルムアミ
ドが、特に好ましくはN、 N−ジメチルホルムアミド
が用いられる。
Since the reaction rate is high, N,N-dimethylformamide and N-methyl-N-phenylformamide are preferably used, and N,N-dimethylformamide is particularly preferably used.

三級アミドは一般にシラノール類中のケイ素−酸素結合
1当債当たり約0.001モル以上、好ましくは0.0
1モル以上、特に好ましくは0゜02モル以上用いられ
る。
The tertiary amide is generally about 0.001 mol or more per silicon-oxygen bond in the silanol, preferably 0.0 mol or more.
It is used in an amount of 1 mol or more, particularly preferably 0.02 mol or more.

三級アミドは溶媒としての機能も兼ねているので、上限
は特に制限されるものではない。
Since the tertiary amide also functions as a solvent, the upper limit is not particularly limited.

三級アミドの使用量が約0.001モルより少ないと反
応完結に長時間を要するため好ましくない。
If the amount of tertiary amide used is less than about 0.001 mole, it is not preferable because it takes a long time to complete the reaction.

反応促進のためだけには通常0.01〜0.2モル程度
用いられる。
It is usually used in an amount of about 0.01 to 0.2 mol just to promote the reaction.

シラノール類との反応に供されるホスゲンの使用量は、
シラノール類中のケイ素−酸素結合をすべてケイ素−塩
素結合に変喚するためにはケイ素−酸素結合1当量に対
して1当量以上必要である。
The amount of phosgene used for reaction with silanols is:
In order to convert all the silicon-oxygen bonds in the silanols into silicon-chlorine bonds, 1 equivalent or more is required per 1 equivalent of silicon-oxygen bonds.

過剰のホスゲンは反応後、未反応のまま残存するので、
必要以上に使用することは回収操作に多大な労力を要す
るので好ましくない。
Excess phosgene remains unreacted after the reaction, so
It is not preferable to use more than necessary because the recovery operation requires a lot of effort.

ホスゲンが残ることが不都合な場合は1当量以下にする
こともできる。
If it is inconvenient for phosgene to remain, the amount can be reduced to 1 equivalent or less.

この場合には反応に供されたホスゲンはすべて目的物の
生成に消費される。
In this case, all of the phosgene used in the reaction is consumed to produce the target product.

通常シラノール類中のケイ素−酸素結合1当量に対して
約0.8〜1.2当量の塩素化剤が用いられる。
Usually, about 0.8 to 1.2 equivalents of the chlorinating agent are used per equivalent of silicon-oxygen bonds in the silanols.

本反応は一般には溶媒の存在下に実施されるが、無溶媒
でも実施できる。
This reaction is generally carried out in the presence of a solvent, but can also be carried out without a solvent.

かかるン容媒としてはベンゼン、トルエン、キシレン、
モノクロルベンゼン、ジクロルベンゼンなどの芳香族炭
化水素、シクロヘキサン、ヘキサン、n−へブタン、n
−オクタン、メチルシクロヘキサン、イソオクタンなど
の脂肪族炭化水素、ジエチルエーテル、ジブチルエーテ
ルなどのエーテル、酢酸エチル、酢酸ブチルなどのエス
テル、N、N−ジメチルホルムアミド、N−メチル−N
−フェニルホルムアミドなどの酸アミド、クロロホルム
、1.2−ジクロルエタン、1,1.1−トリクロルエ
タン、1.l。
Such carriers include benzene, toluene, xylene,
Aromatic hydrocarbons such as monochlorobenzene and dichlorobenzene, cyclohexane, hexane, n-hebutane, n
-Aliphatic hydrocarbons such as octane, methylcyclohexane and isooctane, ethers such as diethyl ether and dibutyl ether, esters such as ethyl acetate and butyl acetate, N,N-dimethylformamide, N-methyl-N
- Acid amides such as phenylformamide, chloroform, 1,2-dichloroethane, 1,1,1-trichloroethane, 1. l.

2− ト!J クロルエタン、テトラクロルエチレンな
どの低級ハロゲン化炭化水素を挙げることができる。
2- To! J Examples include lower halogenated hydrocarbons such as chloroethane and tetrachloroethylene.

反応は一般には約O℃〜100℃、好ましくは20℃〜
70℃の温度で実施される。
The reaction is generally carried out at a temperature of about 0°C to 100°C, preferably 20°C to
It is carried out at a temperature of 70°C.

反応温度が約100℃を越すと三級アミドの分解により
収率が低下し、また0℃より低いと反応速度が遅くなっ
て反応完結に長時間を要するので好ましくない。
If the reaction temperature exceeds about 100°C, the yield will decrease due to decomposition of the tertiary amide, and if it is lower than 0°C, the reaction rate will be slow and it will take a long time to complete the reaction, which is not preferred.

反応圧力は加圧でも減圧でも別設差し支えないが、通常
は常圧付近で実施される。
Although the reaction pressure may be increased or decreased, it is usually carried out at around normal pressure.

反応方法は連続式、半連続式または回分式のいずれでも
行うことができる。
The reaction method can be carried out continuously, semi-continuously or batchwise.

通常、反応はシラノール類と三級アミド、または場合に
より溶媒をあらかじめ混合した混合物中にホスゲンを導
入することにより行われる。
The reaction is usually carried out by introducing phosgene into a premixed mixture of silanols and tertiary amide, or optionally a solvent.

上記反応方法によって得られた反応液からクロルシラン
類は蒸留など公知の方法によって容易に原料であるシラ
ノール類、ホスゲン、三級アミド、副生物または溶媒と
分離することができる。
Chlorosilanes can be easily separated from the raw materials silanols, phosgene, tertiary amides, by-products, or solvents from the reaction solution obtained by the above reaction method by a known method such as distillation.

また分離された三級アミド及び溶媒は繰り返して反応に
使用することができる。
Furthermore, the separated tertiary amide and solvent can be used repeatedly in the reaction.

〈発明の効果〉 三級アミドの存在下にホスゲンをシラノール類に反応さ
せる本発明方法によれば、従来の方法にくらべて穏やか
な条件下で反応ができ、高収率でクロルシラン類を製造
することができる。
<Effects of the Invention> According to the method of the present invention in which phosgene is reacted with silanols in the presence of a tertiary amide, the reaction can be carried out under milder conditions than in conventional methods, and chlorosilanes can be produced in high yield. be able to.

さらに副生物が蒸留などの操作により容易に分離できる
ため、高純度のクロルシラン類を容易に製造することが
できる。
Furthermore, since by-products can be easily separated by operations such as distillation, highly pure chlorosilanes can be easily produced.

〈実施例〉 以下、本発明を実施例により更に具体的に説明するが、
本発明はこれらの実施例に限定されるものではない。
<Examples> Hereinafter, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited to these examples.

実施例1 ガス導入管、還流冷却器、温度計、撹拌器を備えたガラ
ス製反応器に、t−ブチルジメチルシラノール66.1
g(0,5モル)、4.2−ジクロルエタン265g及
びN、N−ジメチルホルムアミド18.3 g (0,
25モル)を仕込み、撹拌しながらこの中にホスゲン7
4.0g(0,748モル)を温度40〜45℃で2時
間にわたって導入した。導入終了後、反応混合物を蒸留
することによりt−ブチルジメチルクロルシラン72.
4g(沸点124〜126℃、収率96゜0%)を得た
Example 1 A glass reactor equipped with a gas inlet tube, a reflux condenser, a thermometer, and a stirrer was charged with 66.1 g of t-butyldimethylsilanol.
g (0,5 mol), 265 g of 4,2-dichloroethane and 18.3 g of N,N-dimethylformamide (0,
25 mol) and add phosgene 7 to this while stirring.
4.0 g (0,748 mol) were introduced over a period of 2 hours at a temperature of 40-45°C. After the introduction is complete, the reaction mixture is distilled to yield 72% of t-butyldimethylchlorosilane.
4 g (boiling point 124-126°C, yield 96°0%) was obtained.

実施例2 実施例1と同様の反応器に、トリエチルシラノール66
.2g(0,5モル)、1.2−ジクロルエタン250
g及びN、 N−ジメチルホルムアミド3.65 g 
(0,05モル)を仕込み、撹拌しながらこの中にホス
ゲン54.4g(0,55モル)を40〜45℃で2時
間にわたって導入した。導入終了後、実施例1と同様の
操作を行ってトリエチルクロルシラン71.6g(沸点
144〜145℃、収率95%)を得た。
Example 2 In a reactor similar to Example 1, triethylsilanol 66
.. 2g (0.5 mol), 1,2-dichloroethane 250
g and N, N-dimethylformamide 3.65 g
(0.05 mol) was charged, and 54.4 g (0.55 mol) of phosgene was introduced thereinto at 40-45° C. over 2 hours while stirring. After the introduction was completed, the same operation as in Example 1 was performed to obtain 71.6 g of triethylchlorosilane (boiling point 144-145°C, yield 95%).

実施例3 実施例1と同様の反応器に、t−ブチルジメチルシラノ
ール66.1g(0,5モル)、1.2−ジクロルエタ
ン950 g7及びN−メチル−N−フェニルホルムア
ミド6.76 g (0,05モル)を仕込み、撹拌下
にこの中にホスゲン54.4 g(0,55モル)を4
0〜45℃で2時間にわたって導入した。導入終了後、
同温度で3時間撹拌を続けた後、実施例1と同様の操作
を行ってt−ブチルジメチルクロルシラン69.3g(
tA点124〜125℃、収率92%)を得た。
Example 3 In a reactor similar to Example 1, 66.1 g (0.5 mol) of t-butyldimethylsilanol, 950 g (7 mol) of 1,2-dichloroethane and 6.76 g (0.5 mol) of N-methyl-N-phenylformamide were added. , 0.05 mol), and 54.4 g (0.55 mol) of phosgene was added to it while stirring.
The introduction was carried out over a period of 2 hours at 0-45°C. After the installation is complete,
After continuing stirring at the same temperature for 3 hours, the same operation as in Example 1 was performed to obtain 69.3 g of t-butyldimethylchlorosilane (
tA point 124-125°C, yield 92%).

実施例4 実施例1と同様の反応器に、ヘキシルジメチルシラノー
ル40.1g(0,25モル)、1.2−ジクロルエタ
ン160g及びN、N−ジメチルホルムアミド1.83
 g (0,025モル)を仕込み、撹拌しながらこの
中にホスゲン27.2 g(0,275モル)を40〜
45℃で2時間にわたって導入した。導入終了後、実施
例1と同様の操作を行って、ヘキシルジメチルクロルシ
ラン40.7g(沸点77〜80℃/ 16 T o 
r r収率91%)を得た。
Example 4 In a reactor similar to Example 1, 40.1 g (0.25 mol) of hexyldimethylsilanol, 160 g of 1,2-dichloroethane and 1.83 g of N,N-dimethylformamide were added.
g (0,025 mol) and 27.2 g (0,275 mol) of phosgene was added into the mixture while stirring.
The introduction was carried out for 2 hours at 45°C. After the introduction, the same operation as in Example 1 was performed to obtain 40.7 g of hexyldimethylchlorosilane (boiling point 77-80°C/16 To
rr yield of 91%) was obtained.

実施例5 実施例1と同様の反応器に、デシルジメチルシラノール
54.1g(0,25モル)、1.2−ジクロルエタン
215g及びN、N−ジメチルホルムアミド1.83 
g (0,025モル)を仕込み、撹拌しながらこの中
にホスゲン27.2 g(0,2’15モル)を40〜
45℃で2時間にわたって導入した。導入終了後、実施
例1と同様の操作を行って、デシルジメチルクロルシラ
ン51.7g<沸点103〜106℃/ l T o 
r r収率88%)を得た。
Example 5 In a reactor similar to Example 1, 54.1 g (0.25 mol) of decyldimethylsilanol, 215 g of 1,2-dichloroethane and 1.83 g of N,N-dimethylformamide were added.
g (0,025 mol) and 27.2 g (0.2'15 mol) of phosgene was added into the mixture while stirring.
The introduction was carried out for 2 hours at 45°C. After the introduction was completed, the same operation as in Example 1 was performed to obtain 51.7 g of decyldimethylchlorosilane <boiling point 103-106°C/l To
rr yield of 88%) was obtained.

実施例6 実施例1と同様の反応器に、オクタデシルジメチルシラ
ノール82.2 g (0,25モル)、■。
Example 6 In a reactor similar to Example 1, 82.2 g (0.25 mol) of octadecyldimethylsilanol was added.

2−ジクロルエタン330g及びN、N−ジメチルホル
ムアミド1.83 g (0,025モル)を仕込み、
撹拌しながらこの中にホスゲン27.2g (0,27
5モル)を40〜45℃で2時間にわたって導入した。
330 g of 2-dichloroethane and 1.83 g (0,025 mol) of N,N-dimethylformamide were charged,
27.2 g of phosgene (0,27
5 mol) was introduced over a period of 2 hours at 40-45°C.

導入終了後、実施例1と同様の操作を行ってオクタデシ
ルジメチルクロルシラン75.5g(沸点184〜18
6℃10.2Torr、収率87%)を得た。
After the introduction, the same operation as in Example 1 was carried out to obtain 75.5 g of octadecyldimethylchlorosilane (boiling point 184-18
6° C., 10.2 Torr, yield 87%).

比較例 実施例1と同様の反応器に、t−ブチルジメチルシラノ
ール66.1g (0,5モル)、1゜2−ジクロルエ
タン265gを仕込み、攪拌し′ながらこの中にホスゲ
ン98.9g (1,0モル)を温度60℃で10時間
にわたって導入した。導入終了後、同温度でさらに8時
間攪拌を続けた。反応混合物をガスクロマトグラフを用
いて分析したところt−ブチルジメチルクロルシラン8
.38(収率11%)が生成していた。
Comparative Example Into the same reactor as in Example 1, 66.1 g (0.5 mol) of t-butyldimethylsilanol and 265 g of 1.2-dichloroethane were charged, and 98.9 g (1.5 mol) of phosgene was added to the reactor while stirring. 0 mol) was introduced over a period of 10 hours at a temperature of 60°C. After the introduction was completed, stirring was continued for an additional 8 hours at the same temperature. Analysis of the reaction mixture using gas chromatography revealed that t-butyldimethylchlorosilane 8
.. 38 (yield 11%) was produced.

Claims (3)

【特許請求の範囲】[Claims] (1)一般式 ▲数式、化学式、表等があります▼ [式中、R_1は炭素数1〜18のアルキ ル基を、R_2及びR_3は同一または相異なる炭素数
1〜3のアルキル基を表す。] で示されるシラノール類に三級アミドの存在下にホスゲ
ンを反応させることを特徴とするクロルシラン類の製造
方法。
(1) General formula ▲ There are numerical formulas, chemical formulas, tables, etc. ▼ [In the formula, R_1 represents an alkyl group having 1 to 18 carbon atoms, and R_2 and R_3 represent the same or different alkyl groups having 1 to 3 carbon atoms. ] A method for producing chlorosilanes, which comprises reacting silanols represented by the following with phosgene in the presence of a tertiary amide.
(2)三級アミドがN,N−ジメチルホルムアミドまた
はN−メチル−N−フェニルホルムアミドである特許請
求の範囲第1項記載のクロルシラン類の製造方法。
(2) The method for producing chlorosilanes according to claim 1, wherein the tertiary amide is N,N-dimethylformamide or N-methyl-N-phenylformamide.
(3)シラノール類がt−ブチルジメチルシラノールで
ある特許請求の範囲第1項記載のクロルシラン類の製造
方法。
(3) The method for producing chlorosilanes according to claim 1, wherein the silanol is t-butyldimethylsilanol.
JP62070939A 1987-02-06 1987-03-24 Method for producing chlorosilanes Expired - Fee Related JPH0714947B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP62070939A JPH0714947B2 (en) 1987-03-24 1987-03-24 Method for producing chlorosilanes
US07/150,902 US4780556A (en) 1987-02-06 1988-02-01 Method for producing chlorosilanes
EP88101482A EP0278368B1 (en) 1987-02-06 1988-02-02 A method for producing chlorosilanes
DE8888101482T DE3860612D1 (en) 1987-02-06 1988-02-02 METHOD FOR PRODUCING CHLOROSILANES.
CA000557994A CA1310655C (en) 1987-02-06 1988-02-02 Method for producing chlorosilanes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62070939A JPH0714947B2 (en) 1987-03-24 1987-03-24 Method for producing chlorosilanes

Publications (2)

Publication Number Publication Date
JPS63238088A true JPS63238088A (en) 1988-10-04
JPH0714947B2 JPH0714947B2 (en) 1995-02-22

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP62070939A Expired - Fee Related JPH0714947B2 (en) 1987-02-06 1987-03-24 Method for producing chlorosilanes

Country Status (1)

Country Link
JP (1) JPH0714947B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007231022A (en) * 1996-03-15 2007-09-13 Dow Agrosciences Llc Use of n,n-disubstituted formamide as halogenation catalyst

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007231022A (en) * 1996-03-15 2007-09-13 Dow Agrosciences Llc Use of n,n-disubstituted formamide as halogenation catalyst

Also Published As

Publication number Publication date
JPH0714947B2 (en) 1995-02-22

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