JPS6323316A - 露光量制御方法 - Google Patents
露光量制御方法Info
- Publication number
- JPS6323316A JPS6323316A JP62146377A JP14637787A JPS6323316A JP S6323316 A JPS6323316 A JP S6323316A JP 62146377 A JP62146377 A JP 62146377A JP 14637787 A JP14637787 A JP 14637787A JP S6323316 A JPS6323316 A JP S6323316A
- Authority
- JP
- Japan
- Prior art keywords
- value
- exposure
- shutter
- time
- exposure amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62146377A JPS6323316A (ja) | 1987-06-12 | 1987-06-12 | 露光量制御方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62146377A JPS6323316A (ja) | 1987-06-12 | 1987-06-12 | 露光量制御方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55147090A Division JPS5771132A (en) | 1980-10-21 | 1980-10-21 | Exposure controlling system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6323316A true JPS6323316A (ja) | 1988-01-30 |
| JPH0221131B2 JPH0221131B2 (enrdf_load_stackoverflow) | 1990-05-11 |
Family
ID=15406337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62146377A Granted JPS6323316A (ja) | 1987-06-12 | 1987-06-12 | 露光量制御方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6323316A (enrdf_load_stackoverflow) |
-
1987
- 1987-06-12 JP JP62146377A patent/JPS6323316A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0221131B2 (enrdf_load_stackoverflow) | 1990-05-11 |
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