JPS63217676A - Pulse gas laser device - Google Patents

Pulse gas laser device

Info

Publication number
JPS63217676A
JPS63217676A JP5018387A JP5018387A JPS63217676A JP S63217676 A JPS63217676 A JP S63217676A JP 5018387 A JP5018387 A JP 5018387A JP 5018387 A JP5018387 A JP 5018387A JP S63217676 A JPS63217676 A JP S63217676A
Authority
JP
Japan
Prior art keywords
cathode
gas
porous
ray
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5018387A
Other languages
Japanese (ja)
Inventor
Osamu Morimiya
森宮 脩
Setsuo Suzuki
鈴木 節雄
Etsuo Noda
悦夫 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP5018387A priority Critical patent/JPS63217676A/en
Publication of JPS63217676A publication Critical patent/JPS63217676A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To obtain an intense pulse X-ray source by supplying a cathode for generating electron beams consisting of a porous metal or a porous metallic carbide with a gas or a liquid metal from a gas source or a liquid metal source mounted outside an X-ray generating chamber. CONSTITUTION:When voltage is applied to a cathode 5 and an anode 6 under the state in which a trace quantity of a gas 9 is fed through the porous cathode 5, an intense electric field is generated on the surface of the cathode 5, and cold cathode electron emission is generated. Ionization plasma is generated near the surface of the porous cathode 5 by the electric field and electrons, and electrons are led out of the plasma and accelerated and made to collide with a target (the anode) 6, thus generating X-rays. A previously utilized gas 2 is discharged outside an X-ray generator by an exhauster 10. Accordingly, an intense (large flux) pulse X-ray source can be realized.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) この発明はガスレーザの中のパルスガスレーザ装置に係
わり、特にレーザガスをX線照射し予備励起する装置に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a pulsed gas laser device among gas lasers, and particularly to a device for pre-exciting a laser gas by irradiating it with X-rays.

(従来の技術) 従来のX線予備励起法ではX線発生装置としては通常の
熱陰極を用いたX線管か、冷陰極を用た方法である。パ
ルスレーザのX線予備励起法では、通常パルス巾1μa
程度の強力なパルスX線源が必要となる。
(Prior Art) In the conventional X-ray pre-excitation method, an X-ray tube using a normal hot cathode or a cold cathode is used as an X-ray generator. In the pulsed laser X-ray pre-excitation method, the pulse width is usually 1 μa.
A reasonably powerful pulsed X-ray source is required.

熱陰極X線管では、熱陰極の加熱の応答時間の関係から
、パルス的に強力なX線の放射することは出来ず線量が
不足する。
Hot cathode X-ray tubes cannot emit strong X-rays in a pulsed manner due to the response time of heating the hot cathode, resulting in insufficient radiation.

一方冷陰極方式は熱陰極を必要とせず、構成要素が少な
くてすむが、陰極先端を鋭利な形状としかつ高い印加電
圧を必要とする。しかも動作が安定しにくいので、特殊
な用途を除いては利用出来ない。
On the other hand, the cold cathode method does not require a hot cathode and requires fewer components, but requires a sharp cathode tip and a high applied voltage. Moreover, since the operation is difficult to stabilize, it cannot be used except for special purposes.

(発明が解決しようとする問題点) パルス的に強力なX線を得るには、X線発生装置の陰極
から、大電流の電子ビームを得ることが必要である。こ
のため、熱陰極方式では陰極温度を高くする必要がある
が、高い動作温度は陰極の寿命を短くする欠点がある。
(Problems to be Solved by the Invention) In order to obtain strong pulsed X-rays, it is necessary to obtain a large current electron beam from the cathode of the X-ray generator. Therefore, in the hot cathode method, it is necessary to increase the cathode temperature, but a high operating temperature has the disadvantage of shortening the life of the cathode.

一方、冷陰極方式では陰極先端を鋭利な形状とし、かつ
高電圧を印加し、陰極先端に強い電界を発生する必要が
ある。このため電子放出は陰極先端の形状に影響されや
すい。また高電圧を印加するので、レーザガスの励起に
適した波長のX線よシ短い波長のX線が多くなシ、励起
効率が低下する。
On the other hand, in the cold cathode method, it is necessary to make the cathode tip sharp and apply a high voltage to generate a strong electric field at the cathode tip. Therefore, electron emission is easily influenced by the shape of the cathode tip. Furthermore, since a high voltage is applied, there are many X-rays with a shorter wavelength than the X-rays with a wavelength suitable for excitation of the laser gas, and the excitation efficiency decreases.

本発明の目的は熱陰極、冷陰極の上記欠点を除いた簡単
な構造のパルス大電流電子ビームの得られるプラズマカ
ソードを利用したX線発生方式を用いたパルスガスレー
ザ装置を提供することにある。
An object of the present invention is to provide a pulsed gas laser device using an X-ray generation method using a plasma cathode, which has a simple structure and can generate a pulsed large current electron beam, eliminating the above-mentioned drawbacks of hot cathodes and cold cathodes.

〔発明の構成〕[Structure of the invention]

(問題点を解決するための手段) 本発明は陰極表面上の近傍にプラズマを生成させ、そこ
から電子を引き出すプラズマ陰極生成法に関する。
(Means for Solving the Problems) The present invention relates to a plasma cathode generation method in which plasma is generated near the surface of a cathode and electrons are extracted from the plasma.

X線発生用陰極は多孔質金属あるいは多孔質金属炭化物
から構成され、この多孔質材を通して、X線発生装置の
外部からガスあるいは液体金属を供給する装置とガスを
排気する装置およびX線発生用ターゲット(陽極)から
構成されている。また電子加速用電源を設ける。
The cathode for X-ray generation is made of porous metal or porous metal carbide, and includes a device for supplying gas or liquid metal from outside the X-ray generator through this porous material, a device for exhausting the gas, and a device for X-ray generation. It consists of a target (anode). A power source for electron acceleration will also be provided.

(作用) 多孔質陰極を通してガスをわずかに供給している状態で
陰極と陽極に電圧を印加すると、陰極表面に強い電界が
生じ、また冷陰極電子放出が生じる。この電界と電子に
よシ多孔質陰極表面近傍のガスを電離プラズマを生成す
る。このプラズマよシミ子を引出しターゲット(陽極)
に加速衝突させX線発生させる。利用ずみのガスは排気
装置でX線発生装置外に排気する。
(Function) When a voltage is applied to the cathode and anode while a small amount of gas is supplied through the porous cathode, a strong electric field is generated on the cathode surface and cold cathode electron emission occurs. This electric field and electrons ionize the gas near the surface of the porous cathode to generate plasma. This plasma pulls out the stain and targets (anode)
Accelerate the collision to generate X-rays. The used gas is exhausted to the outside of the X-ray generator using an exhaust system.

多孔質陰極から液体金属を供給した場合は、陰極、陽極
に印加した電圧によシ陰極表面に強い電界が生じ、この
電界の静電力により液体金属は引伸ばされその先端では
さらに強電界が生じる。このため電界放出電流の増大と
液体金属の蒸発によシプラズマが発生し、プラズマカソ
ードの機能を発揮する。
When liquid metal is supplied from a porous cathode, the voltage applied to the cathode and anode creates a strong electric field on the cathode surface, and the electrostatic force of this electric field stretches the liquid metal, creating an even stronger electric field at its tip. . Therefore, plasma is generated due to the increase in field emission current and the evaporation of the liquid metal, and it functions as a plasma cathode.

(実施例) 第1図は本発明の一実施例である。レーザガス2を励起
用主放電電極1,11間に導入し、電源3で放電励起す
る。この電源3の投入とほぼ同時または、それ以前にX
線発生装置を起動し発生したX線8を主電極に設けたX
線透過膜11を通じ入射し主放電領域4のレーザガスを
予備励起する。
(Example) FIG. 1 shows an example of the present invention. A laser gas 2 is introduced between the main discharge electrodes 1 and 11 for excitation, and discharge is excited by a power source 3. Almost at the same time as this power supply 3 is turned on, or before
The X-ray generator is activated and the generated X-rays 8 are placed on the main electrode.
The laser gas enters through the line-transmitting film 11 and pre-excites the laser gas in the main discharge region 4.

この予備励起によシ、主放電領域4には均一なグロー放
電が生成維持され良好な発振が得られる。
Due to this preliminary excitation, a uniform glow discharge is generated and maintained in the main discharge region 4, and good oscillation can be obtained.

図にはレーザ発振器は省略されている。The laser oscillator is omitted from the figure.

第1図において電子ビーム発生用陰極5は多孔質金属あ
るいは、多孔質金属炭化物からなシ、この陰極にX線発
生室外に設けた、ガスソースあるいは液体金属ソース9
よシガスまたは液体金属を供給する。
In FIG. 1, the electron beam generating cathode 5 is made of porous metal or porous metal carbide, and a gas source or liquid metal source 9 is provided on this cathode outside the X-ray generating chamber.
Supply yoshigas or liquid metal.

陰極5とX線発生用ターゲット(陽極)6との間に電源
7から電圧を印加する。(作用)の項で述べた原理によ
シ陰極5の表面近傍にプラズマが生じる。このプラズマ
中より電子を引出し、ターゲット6に当てX線8を生成
する。プラズマ生成に使用したガスは排気袋[10によ
り、X線発生室の仕切シは図示されていない)外に排気
する。
A voltage is applied from a power source 7 between the cathode 5 and the X-ray generation target (anode) 6. Plasma is generated near the surface of the cathode 5 according to the principle described in the section (Operation). Electrons are extracted from this plasma and hit the target 6 to generate X-rays 8. The gas used for plasma generation is exhausted to the outside through an exhaust bag (10, the partition of the X-ray generation chamber is not shown).

〔発明の効果〕〔Effect of the invention〕

簡単な陰極構造で大電流の電子ビームが安定に得られる
プラズマカソードを用い、強力(fluxの大きい)な
パルスX線源を実現する。
A powerful (large flux) pulsed X-ray source is realized using a plasma cathode that can stably obtain a large current electron beam with a simple cathode structure.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す構成図である。 1.11・・主放電電極、3・・・主放電電源、5・・
・XW!A発生用多孔質陰極、6・・・X線発生用ター
ゲット、9・・・ガスあるいは液体金属源、10・・・
排気装置。 代理人 弁理士 則 近 憲 佑 同    竹 花 喜久男
FIG. 1 is a block diagram showing an embodiment of the present invention. 1.11... Main discharge electrode, 3... Main discharge power supply, 5...
・XW! A porous cathode for generation, 6... target for X-ray generation, 9... gas or liquid metal source, 10...
Exhaust device. Agent Patent Attorney Nori Chika Yudo Kikuo Takehana

Claims (2)

【特許請求の範囲】[Claims] (1)レーザガスをX線によって予備励起するガスレー
ザ装置において、X線発生用電子ビーム発生源(電子ビ
ーム用陰極)が、多孔質金属あるいは多孔質金属間化合
物からなり、前記多孔質陰極を通し希薄なガスあるいは
液体金属を供給する手段を備えたことを特徴とするパル
スガスレーザ装置。
(1) In a gas laser device that pre-excites laser gas with X-rays, an electron beam source for generating X-rays (electron beam cathode) is made of a porous metal or a porous intermetallic compound, and diluted through the porous cathode. 1. A pulsed gas laser device comprising means for supplying a gas or liquid metal.
(2)多孔質陰極が少なくもMo、Ta、Ti、Wある
いはこれらの炭化物のいずれか一つからなることを特徴
とする特許請求の範囲第1項記載のパルスガスレーザ装
置。
(2) The pulsed gas laser device according to claim 1, wherein the porous cathode is made of at least Mo, Ta, Ti, W, or any one of these carbides.
JP5018387A 1987-03-06 1987-03-06 Pulse gas laser device Pending JPS63217676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5018387A JPS63217676A (en) 1987-03-06 1987-03-06 Pulse gas laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5018387A JPS63217676A (en) 1987-03-06 1987-03-06 Pulse gas laser device

Publications (1)

Publication Number Publication Date
JPS63217676A true JPS63217676A (en) 1988-09-09

Family

ID=12852076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5018387A Pending JPS63217676A (en) 1987-03-06 1987-03-06 Pulse gas laser device

Country Status (1)

Country Link
JP (1) JPS63217676A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2221848A1 (en) * 2009-02-18 2010-08-25 LightLab Sweden AB X-ray source comprising a field emission cathode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2221848A1 (en) * 2009-02-18 2010-08-25 LightLab Sweden AB X-ray source comprising a field emission cathode
WO2010094588A3 (en) * 2009-02-18 2010-10-21 Lightlab Sweden Ab X-ray source comprising a field emission cathode
TWI399780B (en) * 2009-02-18 2013-06-21 Lightlab Sweden Ab X-ray source comprising a field emission cathode

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