JPS63217545A - Production of optical disk - Google Patents

Production of optical disk

Info

Publication number
JPS63217545A
JPS63217545A JP5055287A JP5055287A JPS63217545A JP S63217545 A JPS63217545 A JP S63217545A JP 5055287 A JP5055287 A JP 5055287A JP 5055287 A JP5055287 A JP 5055287A JP S63217545 A JPS63217545 A JP S63217545A
Authority
JP
Japan
Prior art keywords
disk
photoresist
slope
metal
grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5055287A
Other languages
Japanese (ja)
Inventor
Michiyoshi Nagashima
道芳 永島
Fumiaki Ueno
植野 文章
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5055287A priority Critical patent/JPS63217545A/en
Publication of JPS63217545A publication Critical patent/JPS63217545A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain a master disk formed with recording pits, the bottom of which is parallel with the slope of V-grooves and to produce a disk having high quality of reproduction signals by providing an ion milling stage in a stage for preparing the master disk. CONSTITUTION:A photoresist 8 is formed on a metallic disk 6 formed with the V-grooves and the signals are recorded thereon by a laser; thereafter, the resist is etched. An ion beam 11 is then projected thereto dig down uniformly the metallic part exposed by the etching (ion milling). Then, the metal is uniformly and increasingly dug by the ion milling and the recording pits having the bottom parallel with the slope of the original V-grooves are obtd. The photoresist is thereafter removed and the master disk is obtd. The bottom of the recording pits is paralleled with the slope of the V-grooves if the disk is prepd. by using such master disk. The disk having the high quality of the reproduction signals is thus produced.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、レーザーを絞って照射し、情報を再生する光
ディスクの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing an optical disc in which information is reproduced by focusing laser irradiation.

従来の技術 ディスク半径方向の断面がV字形の溝を形成し、その斜
面を信号トラックとして、高密度で高品質な情報を提供
するビデオディスク装置が特開昭60−212836号
公報に提案されている。そこで用いられるV溝形状や信
号ピット形状は特開昭57−105828号公報や特願
昭60−134568号公報で与えられている。第6図
にその断面形状を示す。1はアクリルやポリカーボネー
トなどの樹脂基板で、信号ピット2が形成されている。
2. Description of the Related Art A video disk device in which the radial cross-section of a disk forms a V-shaped groove and uses the slope of the groove as a signal track to provide high-density and high-quality information has been proposed in Japanese Patent Laid-Open No. 60-212836. There is. The V-groove shape and signal pit shape used therein are given in Japanese Patent Laid-Open No. 57-105828 and Japanese Patent Application No. 60-134568. FIG. 6 shows its cross-sectional shape. 1 is a resin substrate made of acrylic or polycarbonate, on which signal pits 2 are formed.

その上に反射層3が設けられて、保護層4で覆われてい
る。この信号ピット2の特徴は、ピット底面6がV溝の
ピット以外の斜面と平行なことである。
A reflective layer 3 is provided thereon and covered with a protective layer 4. A feature of this signal pit 2 is that the pit bottom surface 6 is parallel to the slope of the V-groove other than the pit.

従来のディスクの製造方法について第6図を用いて説明
する。銅などの軟質金属盤6を先端がV字形のダイヤモ
ンドのバイト7で機械的カッティングする(第6図a)
。そうしてできた金属盤上にフォトレジスト層8を形成
して(第6図b)、レーザー9をV溝斜面上に絞って照
射し信号を記録する(第6図C)。
A conventional disk manufacturing method will be explained using FIG. 6. A soft metal disc 6 such as copper is mechanically cut using a diamond cutting tool 7 with a V-shaped tip (Fig. 6a).
. A photoresist layer 8 is formed on the thus-formed metal disk (FIG. 6B), and a laser 9 is focused and irradiated onto the V-groove slope to record a signal (FIG. 6C).

レーザーでV溝斜面上に記録する方法の例は特開昭58
−155528号公報に述べられている。
An example of a method of recording on the slope of a V-groove using a laser is disclosed in Japanese Patent Application Laid-open No. 1983
It is described in the publication No.-155528.

フォトレジストが感光しない波長のレーザー(例えば6
33 nullのHeN6レーザー)でV溝の底、又は
、山にトラッキングをかけ、同時に、■溝斜面にHee
dレーザーやhrレーザーを絞って照射し、情報に合わ
せて変調して記録する。
A laser with a wavelength to which the photoresist is not sensitive (e.g. 6
33 Track the bottom or peak of the V-groove with a null HeN6 laser, and at the same time,
The d laser or hr laser is focused and irradiated, modulated according to the information, and recorded.

発明が解決しようとする問題点 ムZ1360(シブレイ社製)などの高分子フォトレジ
ストは感度や解像度も高く、高品質の情報に適している
が、塗布して形成しなければならない。そのため、粘性
や表面張力の影響で第6図すのように、■溝形状に均一
に沿っては形成できない。従って、エツチング後の形状
は第θ図dのようになる。これを原盤として、スタンパ
を作り、レプリカを作れば、第7図の断面形状の基板1
0になってし1つ。第6図の基板1の断面形状とは非常
に異なり、再生信号品質は劣化する。
Problems to be Solved by the Invention Polymer photoresists such as Mu Z1360 (manufactured by Sibley) have high sensitivity and resolution and are suitable for high quality information, but must be formed by coating. Therefore, due to the effects of viscosity and surface tension, it cannot be formed uniformly along the groove shape as shown in Figure 6. Therefore, the shape after etching is as shown in Figure θ d. If you use this master as a stamper and make a replica, you can create a board 1 with the cross-sectional shape shown in Figure 7.
It became 0 and then 1. The cross-sectional shape of the substrate 1 shown in FIG. 6 is very different, and the reproduced signal quality deteriorates.

スパッタリング法で形成できる5e−Ge系の無機フォ
トレジストを用いれば、V溝形状に均一に沿ってフォト
レジスト層を形成できる。しかし、これらの無機フォト
レジストは感度が低く、高転送レートの情報信号を実時
間で記録できない。
If a 5e-Ge-based inorganic photoresist that can be formed by sputtering is used, the photoresist layer can be formed uniformly along the V-groove shape. However, these inorganic photoresists have low sensitivity and cannot record high transfer rate information signals in real time.

問題点を解決するための手段 V溝を形成した金属盤上に、フォトレジストを形成し、
レーザーで信号を記録後、エツチングする。次に、イオ
ンビームを照射して、エツチングで露出した金属部を均
一に堀り込む手段を設ける。
Means to solve the problem: Form a photoresist on a metal plate with V grooves formed,
After recording the signal with a laser, it is etched. Next, a means is provided for irradiating an ion beam to uniformly dig into the metal parts exposed by etching.

その後、フォトレジストを除いて原盤とする。After that, the photoresist is removed and used as the master.

作用 イオンビームで堀り込む過程を設けることで、記録ビッ
ト底面がピット以外のv溝斜面に平行な原盤を作ること
ができる。
By providing a process of digging with an active ion beam, it is possible to create a master disk in which the bottom surface of the recording bit is parallel to the slope of the V-groove other than the pit.

実施例 実施例1 第1図に本発明の実施例を示す。第6図dの状態の金属
盤にアルゴンなどのイオンビーム11を照射して、フォ
トレジストがエツチングされて露出した金属を堀り込む
(イオンミリング)。この時、イオンビームによるエツ
チングレートが、金属の方がフォトレジストより速い方
が良い。例えば、アルゴンイオンビームをイオン電流密
度1誼ム/dでディスクに垂直に入射させれば銅のエツ
チングレートをムz1350の2〜3倍にすることがで
きる。
Examples Example 1 FIG. 1 shows an example of the present invention. The metal disk in the state shown in FIG. 6d is irradiated with an ion beam 11 of argon or the like, and the exposed metal after the photoresist is etched is dug (ion milling). At this time, it is better that the etching rate of the metal by the ion beam is faster than that of the photoresist. For example, if an argon ion beam is made perpendicularly incident on the disk at an ion current density of 1 in/d, the etching rate of copper can be increased to 2 to 3 times that of 1350 mm.

ビデオディスクに用いるレーザー波長i780nm、 
 基板1の屈折率を1.6とすれば、記録ビットの深さ
は約130nl11が良い(特願昭60−134568
号)。従って、フォトレジスト層の一番薄い部分の厚さ
は65 nu以上となる。即ち、記録ピノ)深さの半分
以上あればよい。
Laser wavelength i780nm used for video discs,
If the refractive index of the substrate 1 is 1.6, the depth of the recording bit should be approximately 130nl11 (Japanese Patent Application No. 134568/1986).
issue). Therefore, the thickness of the thinnest portion of the photoresist layer is 65 nu or more. That is, it is sufficient that the depth is at least half of the depth of the recording pin.

イオンミリングで金属は均一に掘り進められ、元のV溝
斜面と平行な底面を持つ記録ピットが作られる。フォト
レジストも少し残った状態を示したのが第1図である。
Ion milling uniformly excavates the metal, creating a recording pit with a bottom parallel to the original V-groove slope. FIG. 1 shows a state in which a small amount of photoresist remains.

フォトレジストを除去すれば、断面形状が第2図の原盤
12が得られ、以後は従来の方法でこれから作られた基
板は第6図のものになる。
When the photoresist is removed, a master 12 having a cross-sectional shape as shown in FIG. 2 is obtained, and a substrate made from this by the conventional method thereafter becomes that shown in FIG. 6.

実施例2 信号の記録する前の金属盤よりNiなどの金属をメッキ
してスタンパ13を作り(第3図)、このスタンパを用
いて、第6図す、(1,及び、第1図の過程を経ても、
第2図の形状の良い原盤12を作ることができる。この
場合、Niのアルゴンイオンビームによるエツチングレ
ートは銅と同程度か、少し速い程度であり問題はない。
Embodiment 2 A stamper 13 is made by plating a metal such as Ni on a metal disk before recording a signal (Fig. 3). Using this stamper, Even after going through the process,
A master disk 12 having a good shape as shown in FIG. 2 can be made. In this case, the etching rate of Ni by the argon ion beam is comparable to or slightly faster than that of copper, so there is no problem.

更に、このように、スタンパを用いることで、−回のV
溝のカッティングで、多種類の情報信号が記録された原
盤を作れるようになる。
Furthermore, by using a stamper in this way, - times of V
By cutting the grooves, it becomes possible to create master discs on which many types of information signals are recorded.

実施例3 スタンパ13上に、イオンビームによるエツチングレー
トが、銅やニッケルより速い金属膜14をスパッタリン
グ法で形成したもの(第4図)を用いて、第6図b−d
1及び、第1図の過程を経ても、第2図の原盤12は作
れる。そのような金属として、Pt、Mn%Ge1Au
、Pd5Sn、Ag、Pbがある。例えば、金(Au)
t−用いた場合、エツチングレートは人Z1360の6
倍位にでき、フォトレジスト層の最も薄い厚みは記録ビ
ット深さの5分の1以上でよい。再生レーザー波長が7
80nmならば、その厚さは26 nm以上でよく、フ
ォトレジストの塗布の仕方には注意を払わなくて良くな
る。
Embodiment 3 Using a metal film 14 formed on a stamper 13 by a sputtering method (FIG. 4), the etching rate of which is faster than that of copper or nickel by an ion beam, the metal film 14 shown in FIGS.
1 and the master disc 12 shown in FIG. 2 can be made even after the steps shown in FIG. Such metals include Pt, Mn%Ge1Au
, Pd5Sn, Ag, and Pb. For example, gold (Au)
When using T-T, the etching rate is 6 for Z1360.
The thinnest thickness of the photoresist layer may be one-fifth or more of the recording bit depth. The reproduction laser wavelength is 7
If it is 80 nm, the thickness may be 26 nm or more, and there is no need to pay attention to the method of applying the photoresist.

また、V溝をカッティングした金属盤6に、直接ムUな
どの金属膜14を形成したものを用いてもよい。これは
、ダイヤバイト7によるカッティングと、メッキによる
スタンパ13の製造とで、コストの低い方を選べばよい
Alternatively, a metal plate 6 having a V-groove cut thereon may be directly coated with a metal film 14 such as a groove U. This can be done by selecting the lower cost option between cutting with the diamond bite 7 and manufacturing the stamper 13 by plating.

発明の効果 以上のようにして、イオンミリング工程を経ることで、
記録ビットの底がV rM斜面と平行な、再生信号品質
の高いディスクを製造することができる。
By going through the ion milling process in a way that exceeds the effects of the invention,
It is possible to manufacture a disk with high reproduction signal quality in which the bottom of the recording bit is parallel to the VrM slope.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のイオンミリング工程を説明するだめの
断面図、第2図は本発明で得られる原盤の断面図、第3
図は本発明の第2の実施例で用いるスタンパ製作工程を
示す断面図、第4図は本発明の第3の実施例で用いる金
属盤の断面図、第6図は再生信号品質の高いディスク断
面図、第6図は従来のディスク製造工程を説明するため
の断面図、七e第7図は従来の方法でできる光ディスク
の断面図である。 2・・・・・・信号ピット、6・・・・・・金属盤、8
・・・・・・フォトレジスト、9・・・・・・レーザー
、11・・・・・・イオンビーウ、12・・・・・・原
盤。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 第2図 第3図 第5図 第6図
FIG. 1 is a cross-sectional view of a pot explaining the ion milling process of the present invention, FIG. 2 is a cross-sectional view of a master disk obtained by the present invention, and FIG.
The figure is a cross-sectional view showing the stamper manufacturing process used in the second embodiment of the present invention, Figure 4 is a cross-sectional view of a metal disc used in the third embodiment of the present invention, and Figure 6 is a disc with high reproduction signal quality. 6 is a cross-sectional view for explaining a conventional disk manufacturing process, and FIG. 7 is a cross-sectional view of an optical disk manufactured by the conventional method. 2...Signal pit, 6...Metal plate, 8
...Photoresist, 9...Laser, 11...Ion Beu, 12...Master disc. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2 Figure 3 Figure 5 Figure 6

Claims (2)

【特許請求の範囲】[Claims] (1)レーザーを絞って照射し、情報を再生する光ディ
スクの製造方法において、ディスク半径方向の断面がV
字形の同心円、又は、スパイラルの溝を形成した金属盤
上に、フォトレジスト層を形成し、レーザーを前記V字
形溝の斜面に絞って照射して信号を記録し、エッチング
した後、イオンビームを照射して、前記エッチングで露
出した金属部が前記V字形溝の元の斜面と平行な底面を
持つ信号ピットを形成し、その後、フォトレジストを除
去して原盤とする光ディスクの製造方法。
(1) In a manufacturing method for optical discs in which information is reproduced by focusing laser irradiation, the cross section in the radial direction of the disc is V.
A photoresist layer is formed on a metal plate with concentric or spiral grooves formed thereon, a laser beam is focused on the slope of the V-shaped groove, a signal is recorded, and an ion beam is etched. A method of manufacturing an optical disc by irradiating the metal part exposed by the etching to form a signal pit having a bottom surface parallel to the original slope of the V-shaped groove, and then removing the photoresist and using it as a master disc.
(2)金属盤の少なくとも前記V字形溝側の表面部分は
、イオンビームによるエッチングレートがフォトレジス
トよりも速い金属で成り、かつ、その速さをN倍とした
時、前記フォトレジスト層の最も薄い部分の膜厚が、信
号ピットの深さのN分の1以上とする事を特徴とする特
許請求の範囲第1項記載の光ディスクの製造方法。
(2) At least the surface portion of the metal plate on the side of the V-shaped groove is made of a metal whose etching rate by an ion beam is faster than that of the photoresist, and when the etching rate is multiplied by N, the most of the photoresist layer. 2. The method of manufacturing an optical disk according to claim 1, wherein the thickness of the thin portion is at least 1/N of the depth of the signal pit.
JP5055287A 1987-03-05 1987-03-05 Production of optical disk Pending JPS63217545A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5055287A JPS63217545A (en) 1987-03-05 1987-03-05 Production of optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5055287A JPS63217545A (en) 1987-03-05 1987-03-05 Production of optical disk

Publications (1)

Publication Number Publication Date
JPS63217545A true JPS63217545A (en) 1988-09-09

Family

ID=12862176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5055287A Pending JPS63217545A (en) 1987-03-05 1987-03-05 Production of optical disk

Country Status (1)

Country Link
JP (1) JPS63217545A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5783371A (en) * 1994-07-29 1998-07-21 Trustees Of Boston University Process for manufacturing optical data storage disk stamper

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6222251A (en) * 1985-07-22 1987-01-30 Victor Co Of Japan Ltd Manufacture of information recording medium disc

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6222251A (en) * 1985-07-22 1987-01-30 Victor Co Of Japan Ltd Manufacture of information recording medium disc

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5783371A (en) * 1994-07-29 1998-07-21 Trustees Of Boston University Process for manufacturing optical data storage disk stamper

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