JPS63216256A - Charged particle beam device - Google Patents

Charged particle beam device

Info

Publication number
JPS63216256A
JPS63216256A JP4818487A JP4818487A JPS63216256A JP S63216256 A JPS63216256 A JP S63216256A JP 4818487 A JP4818487 A JP 4818487A JP 4818487 A JP4818487 A JP 4818487A JP S63216256 A JPS63216256 A JP S63216256A
Authority
JP
Japan
Prior art keywords
signal
lens
wobbler
fed
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4818487A
Other languages
Japanese (ja)
Inventor
Haruo Kasahara
春生 笠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP4818487A priority Critical patent/JPS63216256A/en
Publication of JPS63216256A publication Critical patent/JPS63216256A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To perform the axis alignment in a short time by concurrently feeding a wobbler signal to multiple lenses and reversing the phase of some lenses. CONSTITUTION:Only specific type of ions among multiple types of ions from an emitter 1 are advanced straightly by an EXB filter 6 and radiated to a sample 10. An ion beam is scanned two-dimensionally on the sample 10 by the signal from a scan signal generating circuit to deflecting electrodes 9. Secondary electrons by the radiation are detected by a detector 16, the detection signal is fed to a cathode-ray tube 18, and a secondary electron image is displayed. To perform the axis alignment between a focusing lens 4 and an objective lens 7, a wobbler signal is fed to an amplifier 26 and a reversal amplifier 27 via amplitude adjusters 20, 21, 22 from a generator 19. The amplified signal is fed to a high-voltage power supply 12 for the lens 4. A signal with the same cycle and the opposite phase to the signal to the power supply 12 is fed to a high-voltage power supply 14 for the lens 7. When a switch 24 is turned on and a switch 25 off, the wobbler signal is applied only to the lens 4. Accordingly, the axis alignment can be performed in a short time.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、電子線やイオンビームを試料に照射するよう
にした荷電粒子線装置に関し、特に、レンズの軸合せを
行うに適した荷電粒子線装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a charged particle beam device that irradiates a sample with an electron beam or an ion beam, and particularly relates to a charged particle beam device suitable for aligning a lens. Regarding line equipment.

[従来の技術] 例えば、集束イオンビーム装置では、エミッターから発
生したイオンビームを静電レンズによって試料や材F4
等のターゲット上に細く集束するようにしている。とこ
ろで、該ターゲット上のイオンビームの照射位置を走査
し、該走査に伴って該試料から発生した2次電子を検出
し、該検出された2次電子信号を、該走査と同期した陰
極線管上に供給すると、該陰極線管には試料の2次電子
惟が表示される。ここで、エミッター交換後のイオンビ
ームの軸合せの際、ウォブラー機構によって、静電レン
ズの印加電圧を周期的に変動させると、イオンビームが
レンズの中心を通過していないと、陰極線管上の像が該
印加電圧の変動に伴って振動する。該陰極線管上の像の
状態を観察しながら、該レンズの上方に配置されたアラ
イメント電極に供給する信号を調節し、イオンビームを
適宜偏向させると、レンズへの周期的な変動電圧の供給
によっても像が移動しなくなる。この時、レンズの軸合
せが完了したことになる。
[Prior art] For example, in a focused ion beam device, an ion beam generated from an emitter is directed to a sample or material F4 using an electrostatic lens.
It is designed to narrowly focus on targets such as By the way, the irradiation position of the ion beam on the target is scanned, the secondary electrons generated from the sample are detected along with the scanning, and the detected secondary electron signals are transmitted to the cathode ray tube in synchronization with the scanning. When the electron beam is supplied to the cathode ray tube, the secondary electron density of the sample is displayed on the cathode ray tube. When aligning the axis of the ion beam after exchanging the emitter, if the voltage applied to the electrostatic lens is periodically varied using a wobbler mechanism, if the ion beam does not pass through the center of the lens, The image vibrates as the applied voltage changes. While observing the state of the image on the cathode ray tube, the signal supplied to the alignment electrode placed above the lens is adjusted, and the ion beam is appropriately deflected. The statue also stops moving. At this time, the alignment of the lenses is completed.

[発明が解決しようとする問題点1 静電レンズを2段用いる集束系では、各レンズにウォブ
ラー機構が備えられており、夫々のレンズの軸合せを可
能としている。この場合、1段目のレンズに変動電圧を
印加して1段目のレンズの軸合せを行った後、2段目の
レンズに変動電圧を印加して2段目のレンズの軸合せを
行うようにしている。しかしながら、各レンズに対する
1回の軸合せ作業では、全体が理想的に軸が合わず、各
レンズの軸合せを交互に多数回繰り返し行う必要があり
、繁雑な作業となっている。又、レンズ電圧を周期的に
変動させることは、焦点位置が変動することであり、陰
極線管上の像は、振動だけでなく、像のボケの程度が変
動し、像の振動の状態を正確に把握することが困難とな
る。
[Problem to be Solved by the Invention 1] In a focusing system using two stages of electrostatic lenses, each lens is provided with a wobbler mechanism to enable axis alignment of each lens. In this case, after applying a variable voltage to the first stage lens to align the first stage lens, apply a variable voltage to the second stage lens to align the second stage lens. That's what I do. However, when the axis of each lens is aligned once, the axes of the entire lens are not ideally aligned, and it is necessary to repeat the alignment of each lens many times alternately, which is a complicated operation. In addition, periodically changing the lens voltage causes the focal position to change, and the image on the cathode ray tube not only vibrates, but also changes the degree of blurring, making it difficult to accurately determine the state of image vibration. It becomes difficult to understand the situation.

本発明は、上述した点に鑑みてなされたもので、簡単に
レンズの軸合せを行うことができる荷電粒子線装置を提
供することを目的としている。
The present invention has been made in view of the above-mentioned points, and an object of the present invention is to provide a charged particle beam device in which lens alignment can be easily performed.

[問題点を解決するための手段] 本発明に基づく荷電粒子線装置は、荷電粒子線をターゲ
ット上に収束するための少なくとも第1と第2のレンズ
を有した荷電粒子°線装置において、該第1と第2のレ
ンズに同一周期であって互いに逆位相のウォブラー信号
を供給するように構成したことを特徴としている。
[Means for Solving the Problems] A charged particle beam device according to the present invention includes at least first and second lenses for converging a charged particle beam onto a target. It is characterized in that it is configured to supply wobbler signals having the same period and opposite phases to the first and second lenses.

し作用] 第1と第2のレンズには同時にウォブラー信号が供給さ
れるが、このウォブラー信号は同一周期であって逆位相
とされている。その結果、1段目と2段目のレンズの軸
合せのための調整を同時に行うことができると共に、ウ
ォブラー信号の供給によっても荷電粒子線の焦点位置が
変動せず、軸合1作業の際の像の観察を容易に行うこと
ができる。
Effect] A wobbler signal is supplied to the first and second lenses at the same time, but the wobbler signals have the same period and opposite phases. As a result, it is possible to simultaneously adjust the axis alignment of the first and second stage lenses, and the focal position of the charged particle beam does not change even when the wobbler signal is supplied. images can be easily observed.

[実施例] 以下本発明の一実施例を添附図面に基づいて詳述する。[Example] An embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

第1図は本発明を集束イオンビーム装置に適用した実施
例を示しており、1はエミッター、2は引出し電極、3
は加速電極であり、例えば、該エミッター1先端の液状
金属は、該引出し電極2に印加された引出し電圧によっ
て引出されてイオン化され、該エミッター1と加速電極
3との間に印加された加速電圧によって加速される。4
は収束レンズ、5は収束レンズ4のアライメント電極、
6はEXBフィルタ、7は対物レンズ、8は対物レンズ
7のアライメント電極、9は偏向電極、10は試料であ
る。該エミッター1からのイオンビームは、該収束レン
ズ4と対物レンズ7によって試料10上に細く集束され
る。11は、アライメント電極5に供給されるアライメ
ント信号を発生するアライメント信号発生器、12は収
束レンズ4の高圧電源、13はアライメント電極8に供
給されるアライメント信号を発生するアライメント信号
発生器、14は対物レンズ7の高圧電源、15は偏向電
極9に印加される走査信号を発生する走査信号発生回路
、16は該試料へのイオンビームの照射に伴って発生し
た2次電子を検出する検出器、17は増幅器、18は該
検出器16によって検出され、増幅器17によって増幅
された信号が輝度信号として供給される陰極線管で、該
陰極線管の偏向コイルには該走査信号発生回路15から
の走査信号が供給されている。1つはウォブラー信号発
生器、20.21.22は信号の強度を任意に調整する
ための信号調整器、23.24゜25はスイッチ、26
は増幅器、27は反転増幅器である。
FIG. 1 shows an embodiment in which the present invention is applied to a focused ion beam device, in which 1 is an emitter, 2 is an extraction electrode, and 3 is an emitter.
is an accelerating electrode; for example, the liquid metal at the tip of the emitter 1 is extracted and ionized by the extraction voltage applied to the extraction electrode 2, and the accelerating voltage applied between the emitter 1 and the accelerating electrode 3 accelerated by 4
is a convergent lens, 5 is an alignment electrode of the convergent lens 4,
6 is an EXB filter, 7 is an objective lens, 8 is an alignment electrode of the objective lens 7, 9 is a deflection electrode, and 10 is a sample. The ion beam from the emitter 1 is narrowly focused onto the sample 10 by the converging lens 4 and objective lens 7. 11 is an alignment signal generator that generates an alignment signal to be supplied to the alignment electrode 5; 12 is a high voltage power source for the converging lens 4; 13 is an alignment signal generator that generates an alignment signal to be supplied to the alignment electrode 8; 14 is an alignment signal generator that generates an alignment signal to be supplied to the alignment electrode 5; A high-voltage power supply for the objective lens 7; 15 a scanning signal generation circuit that generates a scanning signal to be applied to the deflection electrode 9; 16 a detector that detects secondary electrons generated when the sample is irradiated with the ion beam; 17 is an amplifier; 18 is a cathode ray tube to which a signal detected by the detector 16 and amplified by the amplifier 17 is supplied as a luminance signal; a deflection coil of the cathode ray tube receives a scanning signal from the scanning signal generation circuit 15; is supplied. 1 is a wobbler signal generator, 20.21.22 is a signal adjuster for arbitrarily adjusting the signal strength, 23.24°25 is a switch, 26
is an amplifier, and 27 is an inverting amplifier.

上述した如き構成において、エミッター1から発生した
イオンビームは、収束レンズ4と対物レンズ7によって
試料10上に細く集束されるが、該エミッター1から発
生した複数のイオン種の内、特定のイオン種のみがEX
Bフィルタ6によって直進し、試料10に照射される。
In the above-described configuration, the ion beam generated from the emitter 1 is narrowly focused onto the sample 10 by the converging lens 4 and the objective lens 7. Only EX
The light travels straight through the B filter 6 and is irradiated onto the sample 10.

ここで、偏向電極9に走査信号発生回路15から走査信
号を供給することにより、該イオンビームは試料上で2
次元的に走査される。該試料へのイオンビームの照射に
よって発生した2次電子は、検出器16によって検出さ
れ、その検出信号は走査信号発生回路15からの走査信
号が供給されている陰極線管18に供給されることから
、該陰極線管には試料の2次電子像が表示されることに
なる。
Here, by supplying a scanning signal from the scanning signal generation circuit 15 to the deflection electrode 9, the ion beam is
Scanned dimensionally. The secondary electrons generated by irradiation of the sample with the ion beam are detected by the detector 16, and the detection signal is supplied to the cathode ray tube 18 to which the scanning signal from the scanning signal generation circuit 15 is supplied. , a secondary electron image of the sample will be displayed on the cathode ray tube.

さて、収束レンズ4と対物レンズ7の軸合せを行う場合
には、ウォブラー信号発生器19からのウォブラー信号
が該レンズに供給されることになる。該発生器19から
は第2図(a)に示す信号が発生され、この信号は振幅
調整器20.21゜22を介して増幅器26と反転増幅
器27に供給される。該増幅器26によって増幅された
第2図(a)に示す信号は、収束レンズ4の高圧電源1
2に供給され、その結果、該電源12から収束レンズ4
に印加される電圧は周期的に変動することになる。一方
、該反転増幅器27は第2図(a)に示す信号を反転し
て増幅するため、対物レンズの高圧電源14には、第2
図(1))に示す如く、収束レンズの高圧電源12に供
給される信号とは同一周期であるが位相が逆の信号が供
給されることになる。その結果、該電源14から対物レ
ンズ7に印加される電圧は周期的に変動することになる
が、この変動の位相は収束レンズ4に印加される電圧の
位相とは逆となる。
Now, when aligning the axes of the converging lens 4 and the objective lens 7, a wobbler signal from the wobbler signal generator 19 is supplied to the lens. The signal shown in FIG. 2(a) is generated from the generator 19, and this signal is supplied to an amplifier 26 and an inverting amplifier 27 via amplitude adjusters 20, 21 and 22. The signal shown in FIG. 2(a) amplified by the amplifier 26 is transmitted to the high-voltage power supply 1
2, so that from the power source 12 the converging lens 4
The voltage applied to will vary periodically. On the other hand, since the inverting amplifier 27 inverts and amplifies the signal shown in FIG.
As shown in FIG. (1)), a signal having the same period as the signal supplied to the high-voltage power supply 12 of the converging lens but having an opposite phase is supplied. As a result, the voltage applied from the power source 14 to the objective lens 7 will fluctuate periodically, but the phase of this fluctuation will be opposite to the phase of the voltage applied to the converging lens 4.

今、スイッチ24をONとし、スイッチ25をOFFと
すると、収束レンズ4にのみ変動電圧、すなわちウォブ
ラー信号が印加される。この場合のイオンビームの集束
の状f3を第3図(a)に示す。図中、実FAB +の
状態がジャストフォーカスであり、点ta B zの状
態は収束レンズへの印加電圧が高くなってオーバーフォ
ーカスとなった状態、2点鎖PiIB 3の状態は収束
レンズ4への印加電圧が低くなってアンダーフォーカス
となった状態である。この図では、光軸と収束レンズ4
.対物レンズ7の中心とが一致しており、収束レンズ4
にウォブラー信号が印加されても、光軸に対して垂直な
方向のイオンビームの集束点は移動しないが、光軸とレ
ンズ中心とが一致していないと、該集束点は光軸と垂直
な方向で移動することになる。又、スイッチ25をON
とし、スイッチ24をOFFとすると、対物レンズ7に
のみウォブラー信号が印加される。この場合のイオンビ
ームの集束の状態を第3図(b)に示す。図中、実線8
1の状態” がジャストフォーカスであり、点線B2の
状態は収束レンズへの印加電圧が高くなってオーバーフ
ォーカスとなった状態、2点鎖線B3の状態は収束レン
ズ4への印加電圧が低くなってアンダーフォーカスとな
った状態である。この図では、前記と同様に、光軸と収
束レンズ4.対物レンズ7の中心とが一致しており、対
物レンズ7にウォブラー信号が印加されても、光軸に対
して垂直な方向のイオンビームの集束点は移動しないが
、光軸とレンズ中心とが一致していないと、該集束点は
光軸と垂直な方向で移動することになる。この第3図(
a)、(b)共に、レンズへのウォブラー信号の印加に
より、光軸方向のイオンビームの集束点は変動し、得ら
れる2次電子像は該集束点の変動に伴ってボケたものと
なる。
Now, when the switch 24 is turned on and the switch 25 is turned off, a variable voltage, that is, a wobbler signal, is applied only to the converging lens 4. The state of focus f3 of the ion beam in this case is shown in FIG. 3(a). In the figure, the state of the actual FAB + is just focus, the state of point ta B z is the state of overfocus due to the high voltage applied to the converging lens, and the state of the two-dot chain PiIB 3 is the state of focus to the converging lens 4. This is a state in which the applied voltage has become low, resulting in underfocus. In this figure, the optical axis and converging lens 4
.. The center of the objective lens 7 coincides with the center of the converging lens 4.
Even if a wobbler signal is applied to the ion beam, the focal point of the ion beam in the direction perpendicular to the optical axis does not move. However, if the optical axis and the lens center do not match, the focal point will move perpendicular to the optical axis. It will move in the direction. Also, turn on switch 25
When the switch 24 is turned off, the wobbler signal is applied only to the objective lens 7. The focused state of the ion beam in this case is shown in FIG. 3(b). In the figure, solid line 8
State 1" is just focus, the state indicated by dotted line B2 is a state in which the voltage applied to the converging lens 4 has become high and overfocus has occurred, and the state indicated by two-dot chain line B3 is a state in which the voltage applied to the converging lens 4 has become low. This is a state of underfocus. In this figure, as before, the optical axis and the center of the converging lens 4 and objective lens 7 coincide, and even if the wobbler signal is applied to the objective lens 7, the light The focal point of the ion beam in the direction perpendicular to the axis does not move, but if the optical axis and the lens center do not coincide, the focal point will move in the direction perpendicular to the optical axis. Figure 3 (
In both a) and (b), the application of a wobbler signal to the lens changes the focal point of the ion beam in the optical axis direction, and the resulting secondary electron image becomes blurred as the focal point changes. .

さて、スイッチ24.25を共にONにすると、収束レ
ンズ4には第2図(a)に示すウォブラー信号が印加さ
れ、対物レンズ7には第2図<1))に示すウォブラー
信号が印加される。この結果、両つォブラー信号は同一
周期で位相が逆のため、第3図(C)に点線F1で示す
如く、収束レンズ4によってイオンビームが強く集束さ
れるときには、対物レンズ7によってイオンビームは弱
く集束され、逆に、2点鎖線F2で示す如く、収束レン
ズによってイオンビームが弱く集束されるときには、対
物レンズ7によってイオンビームは強く集束される。そ
して、実線F3で示ず如く、収束レンズ4でジャストフ
ォーカスの状態では、対物レンズ7もジャストフォーカ
スの状態となる。従って、収束レンズ4による光軸方向
の集束点の移動は、対物レンズ7による集束点の移動に
よって相殺され、ウォブラー信号の供給によっても常に
焦点の合った状態の像が得られることになる。なJ3、
ウォブラー信号の供給に応じて像がボケる場合には、振
幅調整器21.22を調整し、ウォブラー信号の振幅を
任意に増減して像がボケないようにすれば良い。ここで
、両レンズへのウォブラー信号の供給によっても像のボ
ケは生じないが、各レンズの中心と光軸とが一致してい
ないと、レンズへのウォブラー信号の印加に伴って陰極
線管18上の像が振動することになる。この陰極線管上
の像の振動を監視しながら、アライメント信号発生器1
1.13を調整し、レンズの中心とイオンビームの軸と
を一致させれば、該陰極線管18上の像はウォブラー信
号の供給によっても振動しないことになり、各レンズの
軸合せが完了したことになる。該各レンズの軸合せが終
了した後は、スイッチ23がOFFとされ、各レンズへ
のウォブラー信号の供給は停止される。
Now, when both switches 24 and 25 are turned ON, the wobbler signal shown in FIG. 2(a) is applied to the converging lens 4, and the wobbler signal shown in FIG. 2<1)) is applied to the objective lens 7. Ru. As a result, both wobbler signals have the same period and opposite phases, so when the ion beam is strongly focused by the converging lens 4, the ion beam is focused by the objective lens 7, as shown by the dotted line F1 in FIG. Conversely, when the ion beam is weakly focused by the converging lens, as shown by the two-dot chain line F2, the ion beam is strongly focused by the objective lens 7. As shown by the solid line F3, when the converging lens 4 is in just focus, the objective lens 7 is also in just focus. Therefore, the movement of the focal point in the optical axis direction by the converging lens 4 is offset by the movement of the focal point by the objective lens 7, and an in-focus image can always be obtained even by supplying the wobbler signal. Na J3,
If the image becomes blurred depending on the supply of the wobbler signal, the amplitude adjusters 21 and 22 may be adjusted to arbitrarily increase or decrease the amplitude of the wobbler signal to prevent the image from becoming blurred. Although the image does not become blurred by supplying the wobbler signal to both lenses, if the center of each lens does not match the optical axis, the application of the wobbler signal to the lenses causes the image to become blurred on the cathode ray tube 18. The image will vibrate. While monitoring the vibration of the image on the cathode ray tube, the alignment signal generator 1
1.13 and align the center of the lens with the axis of the ion beam, the image on the cathode ray tube 18 will not vibrate even when the wobbler signal is supplied, and the axis alignment of each lens is completed. It turns out. After the axis alignment of each lens is completed, the switch 23 is turned off, and the supply of the wobbler signal to each lens is stopped.

なお、この実施例において、収束レンズ4の焦点位置を
EXBフィルタ6の1ifl場の中心に固定する必要が
あるが、このための調整を収束レンズ4へのウオプラー
信号の供給によって簡単に行うことができる。又、軸合
せの粗調整や微調整に応じて、信号調整器20を調整し
、各レンズに印加されるウォブラー信号の振幅を調整す
ることは有効である。
In this embodiment, it is necessary to fix the focal position of the converging lens 4 to the center of the 1ifl field of the EXB filter 6, but this adjustment can be easily performed by supplying the Wopler signal to the converging lens 4. can. Further, it is effective to adjust the signal adjuster 20 and adjust the amplitude of the wobbler signal applied to each lens in accordance with coarse adjustment or fine adjustment of the axis alignment.

以上本発明の一実施例を詳述したが、本発明はこの実施
例に限定されず幾多の変形が可能である。
Although one embodiment of the present invention has been described above in detail, the present invention is not limited to this embodiment and can be modified in many ways.

例えば、イオンビームを電電レンズによって集束する例
について説明したが、電子ビームを磁界型レンズによっ
て集束する場合にも本発明を適用することができる。又
、2段の集束系のみならず、3段以上の集束系にも本発
明を適用することができる。なお、3段の集束系の場合
、任意の1段のレンズに印加する変動信号の位相と他の
2つのレンズに印加する変動信号の位相を逆にし、最終
的にターゲットに照射されるビームの焦点を該変動信号
の供給によっても変化させないようにすれば良い。
For example, although an example in which an ion beam is focused by an electro-electric lens has been described, the present invention can also be applied to a case where an electron beam is focused by a magnetic field type lens. Further, the present invention can be applied not only to a two-stage focusing system but also to a three-stage or more focusing system. In the case of a three-stage focusing system, the phase of the fluctuation signal applied to any one stage lens and the fluctuation signal applied to the other two lenses are reversed, and the beam finally irradiated on the target is adjusted. It is sufficient that the focal point is not changed even by supplying the fluctuation signal.

[効果] 以上詳述した如く、本発明においては、複数のレンズに
同時にウォブラー信号を供給すると共に、該ウォブラー
信号の位相をレンズに応じて逆としたため、レンズ系全
体の軸合せを短時間に行うことができると共に、軸合せ
作業の際に焦点の合った状態の像を観察しながら軸合せ
作業を行うことができる。
[Effects] As detailed above, in the present invention, wobbler signals are simultaneously supplied to a plurality of lenses, and the phase of the wobbler signals is reversed depending on the lenses, so that alignment of the entire lens system can be accomplished in a short time. In addition, it is possible to perform the alignment work while observing a focused image during the alignment work.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す図、第2図はウォブラ
ー信号を示す図、第3図はレンズへのウォブラー信号の
供給に応じたビームの集束の状態を示す図である。 1・・・エミッター    2・・・引出し電極3・・
・加速電極     4・・・収束レンズ5.8・・・
アライメント電極 6・・・EXBフィルタ  7・・・対物レンズ9・・
・偏向電極    1o・・・試料11.13川アライ
メント信号発生器 12.14・・・高圧電源 15・・・走査信号発生回路 16・・・検出器     17・・・増幅器18・・
・陰極線管
FIG. 1 is a diagram showing an embodiment of the present invention, FIG. 2 is a diagram showing a wobbler signal, and FIG. 3 is a diagram showing a state of beam focusing in response to supply of the wobbler signal to the lens. 1... Emitter 2... Extraction electrode 3...
・Accelerating electrode 4... Converging lens 5.8...
Alignment electrode 6...EXB filter 7...Objective lens 9...
・Deflection electrode 1o...Sample 11.13 Alignment signal generator 12.14...High voltage power supply 15...Scanning signal generation circuit 16...Detector 17...Amplifier 18...
・Cathode ray tube

Claims (2)

【特許請求の範囲】[Claims] (1)荷電粒子線をターゲット上に収束するための少な
くとも第1と第2のレンズを有した荷電粒子線装置にお
いて、該第1と第2のレンズに同一周期であって互いに
逆位相のウォブラー信号を供給するように構成した荷電
粒子線装置。
(1) In a charged particle beam device having at least first and second lenses for converging a charged particle beam onto a target, wobblers having the same period and opposite phases are attached to the first and second lenses. A charged particle beam device configured to provide a signal.
(2)該第1と第2のレンズに供給されるウォブラー信
号の振幅を調整することができる特許請求の範囲第1項
記載の荷電粒子線装置。
(2) The charged particle beam device according to claim 1, wherein the amplitude of the wobbler signal supplied to the first and second lenses can be adjusted.
JP4818487A 1987-03-03 1987-03-03 Charged particle beam device Pending JPS63216256A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4818487A JPS63216256A (en) 1987-03-03 1987-03-03 Charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4818487A JPS63216256A (en) 1987-03-03 1987-03-03 Charged particle beam device

Publications (1)

Publication Number Publication Date
JPS63216256A true JPS63216256A (en) 1988-09-08

Family

ID=12796299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4818487A Pending JPS63216256A (en) 1987-03-03 1987-03-03 Charged particle beam device

Country Status (1)

Country Link
JP (1) JPS63216256A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0877957A (en) * 1994-09-06 1996-03-22 Hitachi Ltd Charged particle projector
JPH11312485A (en) * 1998-04-28 1999-11-09 Nikon Corp Charged particle beam image projecting optical system and its adjustment method
JP2003331763A (en) * 2002-05-15 2003-11-21 Ebara Corp Electron beam device and device manufacturing method using the same
JP2004152608A (en) * 2002-10-30 2004-05-27 Ebara Corp Electron beam device, and manufacturing method of device using same
JP2018142472A (en) * 2017-02-28 2018-09-13 株式会社荏原製作所 Optical axis adjustment method and electron beam inspection device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0877957A (en) * 1994-09-06 1996-03-22 Hitachi Ltd Charged particle projector
JPH11312485A (en) * 1998-04-28 1999-11-09 Nikon Corp Charged particle beam image projecting optical system and its adjustment method
JP2003331763A (en) * 2002-05-15 2003-11-21 Ebara Corp Electron beam device and device manufacturing method using the same
JP2004152608A (en) * 2002-10-30 2004-05-27 Ebara Corp Electron beam device, and manufacturing method of device using same
JP2018142472A (en) * 2017-02-28 2018-09-13 株式会社荏原製作所 Optical axis adjustment method and electron beam inspection device

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