JPS63213527A - Production of polyarylene thioether - Google Patents
Production of polyarylene thioetherInfo
- Publication number
- JPS63213527A JPS63213527A JP62046075A JP4607587A JPS63213527A JP S63213527 A JPS63213527 A JP S63213527A JP 62046075 A JP62046075 A JP 62046075A JP 4607587 A JP4607587 A JP 4607587A JP S63213527 A JPS63213527 A JP S63213527A
- Authority
- JP
- Japan
- Prior art keywords
- lewis acid
- group
- halides
- polyarylene thioether
- thiophenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000003568 thioethers Chemical class 0.000 title claims description 25
- 229920000412 polyarylene Polymers 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000007800 oxidant agent Substances 0.000 claims abstract description 18
- 239000011968 lewis acid catalyst Substances 0.000 claims abstract description 17
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 9
- VMPVEPPRYRXYNP-UHFFFAOYSA-I antimony(5+);pentachloride Chemical compound Cl[Sb](Cl)(Cl)(Cl)Cl VMPVEPPRYRXYNP-UHFFFAOYSA-I 0.000 claims abstract description 9
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims abstract description 8
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 5
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 4
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 4
- 239000001301 oxygen Substances 0.000 claims abstract description 4
- 230000000379 polymerizing effect Effects 0.000 claims abstract description 3
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims description 13
- 239000002841 Lewis acid Substances 0.000 claims description 9
- 150000007517 lewis acids Chemical class 0.000 claims description 9
- 150000002366 halogen compounds Chemical class 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 5
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 150000002989 phenols Chemical class 0.000 claims 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 abstract description 39
- 238000006243 chemical reaction Methods 0.000 abstract description 18
- 229920000642 polymer Polymers 0.000 abstract description 18
- 239000003054 catalyst Substances 0.000 abstract description 13
- LXUNZSDDXMPKLP-UHFFFAOYSA-N 2-Methylbenzenethiol Chemical compound CC1=CC=CC=C1S LXUNZSDDXMPKLP-UHFFFAOYSA-N 0.000 abstract description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 4
- 229910052736 halogen Inorganic materials 0.000 abstract description 2
- 150000002367 halogens Chemical class 0.000 abstract description 2
- 239000005751 Copper oxide Substances 0.000 abstract 1
- 229910000431 copper oxide Inorganic materials 0.000 abstract 1
- -1 polyphenylene Polymers 0.000 description 85
- 238000000034 method Methods 0.000 description 22
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 238000006116 polymerization reaction Methods 0.000 description 16
- 239000002904 solvent Substances 0.000 description 15
- 230000001590 oxidative effect Effects 0.000 description 11
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 150000004820 halides Chemical class 0.000 description 6
- 235000002639 sodium chloride Nutrition 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 229920000265 Polyparaphenylene Polymers 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 4
- 238000002329 infrared spectrum Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 229910052714 tellurium Inorganic materials 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- ABROBCBIIWHVNS-UHFFFAOYSA-N 2-Ethylbenzenethiol Chemical compound CCC1=CC=CC=C1S ABROBCBIIWHVNS-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000001226 reprecipitation Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- IUPWBUULPWMLDU-UHFFFAOYSA-N 2,3,5,6-tetrachlorobenzenethiol Chemical compound SC1=C(Cl)C(Cl)=CC(Cl)=C1Cl IUPWBUULPWMLDU-UHFFFAOYSA-N 0.000 description 2
- JBISHCXLCGVPGW-UHFFFAOYSA-N 2,6-dichlorobenzenethiol Chemical compound SC1=C(Cl)C=CC=C1Cl JBISHCXLCGVPGW-UHFFFAOYSA-N 0.000 description 2
- QCLJODDRBGKIRW-UHFFFAOYSA-N 2,6-dimethylbenzenethiol Chemical compound CC1=CC=CC(C)=C1S QCLJODDRBGKIRW-UHFFFAOYSA-N 0.000 description 2
- DSCJETUEDFKYGN-UHFFFAOYSA-N 2-Methoxybenzenethiol Chemical compound COC1=CC=CC=C1S DSCJETUEDFKYGN-UHFFFAOYSA-N 0.000 description 2
- PWOBDMNCYMQTCE-UHFFFAOYSA-N 2-chlorobenzenethiol Chemical compound SC1=CC=CC=C1Cl PWOBDMNCYMQTCE-UHFFFAOYSA-N 0.000 description 2
- WJTZZPVVTSDNJJ-UHFFFAOYSA-N 2-fluorobenzenethiol Chemical compound FC1=CC=CC=C1S WJTZZPVVTSDNJJ-UHFFFAOYSA-N 0.000 description 2
- QDSPMTRKJURMOL-UHFFFAOYSA-N 3-chloro-2-methylbenzenethiol Chemical compound CC1=C(S)C=CC=C1Cl QDSPMTRKJURMOL-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 2
- KPWJBEFBFLRCLH-UHFFFAOYSA-L cadmium bromide Chemical compound Br[Cd]Br KPWJBEFBFLRCLH-UHFFFAOYSA-L 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- TXKMVPPZCYKFAC-UHFFFAOYSA-N disulfur monoxide Inorganic materials O=S=S TXKMVPPZCYKFAC-UHFFFAOYSA-N 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 2
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 2
- 229910003446 platinum oxide Inorganic materials 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- ZSUXOVNWDZTCFN-UHFFFAOYSA-L tin(ii) bromide Chemical compound Br[Sn]Br ZSUXOVNWDZTCFN-UHFFFAOYSA-L 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- JKNHZOAONLKYQL-UHFFFAOYSA-K tribromoindigane Chemical compound Br[In](Br)Br JKNHZOAONLKYQL-UHFFFAOYSA-K 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 2
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- IGOGJHYWSOZGAE-UHFFFAOYSA-N 2,3,5,6-tetrafluorobenzenethiol Chemical compound FC1=CC(F)=C(F)C(S)=C1F IGOGJHYWSOZGAE-UHFFFAOYSA-N 0.000 description 1
- OGEOHFISNPIYDJ-UHFFFAOYSA-N 2,3,5-triethylbenzenethiol Chemical compound CCC1=CC(S)=C(CC)C(CC)=C1 OGEOHFISNPIYDJ-UHFFFAOYSA-N 0.000 description 1
- HJOIBCVTGYMVTP-UHFFFAOYSA-N 2,3,5-trifluorobenzenethiol Chemical compound FC1=CC(F)=C(F)C(S)=C1 HJOIBCVTGYMVTP-UHFFFAOYSA-N 0.000 description 1
- QYTSIBBNZWTHMZ-UHFFFAOYSA-N 2,3-difluorobenzenethiol Chemical compound FC1=CC=CC(S)=C1F QYTSIBBNZWTHMZ-UHFFFAOYSA-N 0.000 description 1
- NDKJATAIMQKTPM-UHFFFAOYSA-N 2,3-dimethylbenzenethiol Chemical compound CC1=CC=CC(S)=C1C NDKJATAIMQKTPM-UHFFFAOYSA-N 0.000 description 1
- QIULLHZMZMGGFH-UHFFFAOYSA-N 2,5-dichlorobenzenethiol Chemical compound SC1=CC(Cl)=CC=C1Cl QIULLHZMZMGGFH-UHFFFAOYSA-N 0.000 description 1
- SESUUAOAUZDHHP-UHFFFAOYSA-N 2,5-dimethoxybenzenethiol Chemical compound COC1=CC=C(OC)C(S)=C1 SESUUAOAUZDHHP-UHFFFAOYSA-N 0.000 description 1
- ZHJYYYKHRSMJJP-UHFFFAOYSA-N 2,6-dibromobenzenethiol Chemical compound SC1=C(Br)C=CC=C1Br ZHJYYYKHRSMJJP-UHFFFAOYSA-N 0.000 description 1
- BAGGRHDWIFOWMB-UHFFFAOYSA-N 2,6-diethyl-3,5-difluorobenzenethiol Chemical compound CCC1=C(F)C=C(F)C(CC)=C1S BAGGRHDWIFOWMB-UHFFFAOYSA-N 0.000 description 1
- FFLZCYDKOHHQLE-UHFFFAOYSA-N 2,6-diethyl-3,5-dimethoxybenzenethiol Chemical compound CCC1=C(S)C(CC)=C(OC)C=C1OC FFLZCYDKOHHQLE-UHFFFAOYSA-N 0.000 description 1
- PALORHWWZVBSLZ-UHFFFAOYSA-N 2,6-difluorobenzenethiol Chemical compound FC1=CC=CC(F)=C1S PALORHWWZVBSLZ-UHFFFAOYSA-N 0.000 description 1
- SWSQMSHHBGQNCI-UHFFFAOYSA-N 2-(2-methylbutyl)benzenethiol Chemical compound CCC(C)CC1=CC=CC=C1S SWSQMSHHBGQNCI-UHFFFAOYSA-N 0.000 description 1
- ZQNZYGACKJQSCW-UHFFFAOYSA-N 2-[(2-methylpropan-2-yl)oxy]benzenethiol Chemical compound CC(C)(C)OC1=CC=CC=C1S ZQNZYGACKJQSCW-UHFFFAOYSA-N 0.000 description 1
- YUQUNWNSQDULTI-UHFFFAOYSA-N 2-bromobenzenethiol Chemical compound SC1=CC=CC=C1Br YUQUNWNSQDULTI-UHFFFAOYSA-N 0.000 description 1
- LYJBNJHMJBVLHD-UHFFFAOYSA-N 2-butan-2-ylbenzenethiol Chemical compound CCC(C)C1=CC=CC=C1S LYJBNJHMJBVLHD-UHFFFAOYSA-N 0.000 description 1
- ULGBHEHEJSBQFC-UHFFFAOYSA-N 2-butoxybenzenethiol Chemical compound CCCCOC1=CC=CC=C1S ULGBHEHEJSBQFC-UHFFFAOYSA-N 0.000 description 1
- DIQZCHWAZXTQCD-UHFFFAOYSA-N 2-chloro-5-ethylbenzenethiol Chemical compound CCC1=CC=C(Cl)C(S)=C1 DIQZCHWAZXTQCD-UHFFFAOYSA-N 0.000 description 1
- WSEXNJRRBCNZOC-UHFFFAOYSA-N 2-chloro-5-fluorobenzenethiol Chemical compound FC1=CC=C(Cl)C(S)=C1 WSEXNJRRBCNZOC-UHFFFAOYSA-N 0.000 description 1
- RZQGSFMCSQMPKT-UHFFFAOYSA-N 2-chloro-5-methylbenzenethiol Chemical compound CC1=CC=C(Cl)C(S)=C1 RZQGSFMCSQMPKT-UHFFFAOYSA-N 0.000 description 1
- WNRLJMYSWRBJIG-UHFFFAOYSA-N 2-chloro-6-methylbenzenethiol Chemical compound CC1=CC=CC(Cl)=C1S WNRLJMYSWRBJIG-UHFFFAOYSA-N 0.000 description 1
- ZLHYXSYCZODOKJ-UHFFFAOYSA-N 2-ethyl-3,5-difluoro-6-methylbenzenethiol Chemical compound CCC1=C(F)C=C(F)C(C)=C1S ZLHYXSYCZODOKJ-UHFFFAOYSA-N 0.000 description 1
- FHBBXKZUKGKWEG-UHFFFAOYSA-N 2-ethyl-6-fluorobenzenethiol Chemical compound CCC1=CC=CC(F)=C1S FHBBXKZUKGKWEG-UHFFFAOYSA-N 0.000 description 1
- USQLYRYSUIXTOU-UHFFFAOYSA-N 2-ethyl-6-methylbenzenethiol Chemical compound CCC1=CC=CC(C)=C1S USQLYRYSUIXTOU-UHFFFAOYSA-N 0.000 description 1
- UWNWVKXVJLZBPH-UHFFFAOYSA-N 2-fluoro-5-methylbenzenethiol Chemical compound CC1=CC=C(F)C(S)=C1 UWNWVKXVJLZBPH-UHFFFAOYSA-N 0.000 description 1
- GMDVXNRTSGRJSL-UHFFFAOYSA-N 2-fluoro-6-methylbenzenethiol Chemical compound CC1=CC=CC(F)=C1S GMDVXNRTSGRJSL-UHFFFAOYSA-N 0.000 description 1
- UGCIYEJQSCHEOX-UHFFFAOYSA-N 2-hexylbenzenethiol Chemical compound CCCCCCC1=CC=CC=C1S UGCIYEJQSCHEOX-UHFFFAOYSA-N 0.000 description 1
- UIAYSOIPQBEGQP-UHFFFAOYSA-N 2-methoxy-5-methylbenzenethiol Chemical compound COC1=CC=C(C)C=C1S UIAYSOIPQBEGQP-UHFFFAOYSA-N 0.000 description 1
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- LPVAPKDUUYWBGL-UHFFFAOYSA-N 2-octylbenzenethiol Chemical compound CCCCCCCCC1=CC=CC=C1S LPVAPKDUUYWBGL-UHFFFAOYSA-N 0.000 description 1
- PZEPHEBEJKGATR-UHFFFAOYSA-N 2-pentoxybenzenethiol Chemical compound CCCCCOC1=CC=CC=C1S PZEPHEBEJKGATR-UHFFFAOYSA-N 0.000 description 1
- QEDRUXIMTJVXFL-UHFFFAOYSA-N 2-propan-2-ylbenzenethiol Chemical compound CC(C)C1=CC=CC=C1S QEDRUXIMTJVXFL-UHFFFAOYSA-N 0.000 description 1
- QWMLZTMIRVEOIY-UHFFFAOYSA-N 2-propoxybenzenethiol Chemical compound CCCOC1=CC=CC=C1S QWMLZTMIRVEOIY-UHFFFAOYSA-N 0.000 description 1
- XBUIQKVLOGMVKR-UHFFFAOYSA-N 2-propylsulfanylphenol Chemical compound CCCSC1=CC=CC=C1O XBUIQKVLOGMVKR-UHFFFAOYSA-N 0.000 description 1
- BKMGLHQPYYCKPO-UHFFFAOYSA-N 2-tert-butylbenzenethiol Chemical compound CC(C)(C)C1=CC=CC=C1S BKMGLHQPYYCKPO-UHFFFAOYSA-N 0.000 description 1
- RXIPOEOQJMSDMW-UHFFFAOYSA-N 3,5-dichloro-2,6-dimethylbenzenethiol Chemical compound CC1=C(Cl)C=C(Cl)C(C)=C1S RXIPOEOQJMSDMW-UHFFFAOYSA-N 0.000 description 1
- WRXIPCQPHZMXOO-UHFFFAOYSA-N 3,5-dichlorobenzenethiol Chemical compound SC1=CC(Cl)=CC(Cl)=C1 WRXIPCQPHZMXOO-UHFFFAOYSA-N 0.000 description 1
- NWFZZXFJQBNCKK-UHFFFAOYSA-N 3,5-difluoro-2-methylbenzenethiol Chemical compound CC1=C(F)C=C(F)C=C1S NWFZZXFJQBNCKK-UHFFFAOYSA-N 0.000 description 1
- CESBAYSBPMVAEI-UHFFFAOYSA-N 3,5-dimethylbenzenethiol Chemical compound CC1=CC(C)=CC(S)=C1 CESBAYSBPMVAEI-UHFFFAOYSA-N 0.000 description 1
- PEEYRKVXQAKUMR-UHFFFAOYSA-N 3-chloro-5-methylbenzenethiol Chemical compound CC1=CC(S)=CC(Cl)=C1 PEEYRKVXQAKUMR-UHFFFAOYSA-N 0.000 description 1
- SWXOGIWNHWXDBS-UHFFFAOYSA-N 3-fluoro-2-methylbenzenethiol Chemical compound CC1=C(F)C=CC=C1S SWXOGIWNHWXDBS-UHFFFAOYSA-N 0.000 description 1
- VRRSYCJFFOUSFM-UHFFFAOYSA-N 3-fluoro-5-methylbenzenethiol Chemical compound CC1=CC(F)=CC(S)=C1 VRRSYCJFFOUSFM-UHFFFAOYSA-N 0.000 description 1
- PSHGYSFLYYILEN-UHFFFAOYSA-N 3-methoxy-2-methylbenzenethiol Chemical compound COC1=CC=CC(S)=C1C PSHGYSFLYYILEN-UHFFFAOYSA-N 0.000 description 1
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- UWBHMRBRLOJJAA-UHFFFAOYSA-N oxaluric acid Chemical compound NC(=O)NC(=O)C(O)=O UWBHMRBRLOJJAA-UHFFFAOYSA-N 0.000 description 1
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- WKMKTIVRRLOHAJ-UHFFFAOYSA-N oxygen(2-);thallium(1+) Chemical compound [O-2].[Tl+].[Tl+] WKMKTIVRRLOHAJ-UHFFFAOYSA-N 0.000 description 1
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- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
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- KGRJUMGAEQQVFK-UHFFFAOYSA-L platinum(2+);dibromide Chemical compound Br[Pt]Br KGRJUMGAEQQVFK-UHFFFAOYSA-L 0.000 description 1
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- 238000012805 post-processing Methods 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
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- 239000000047 product Substances 0.000 description 1
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- YUCDNKHFHNORTO-UHFFFAOYSA-H rhenium hexafluoride Chemical compound F[Re](F)(F)(F)(F)F YUCDNKHFHNORTO-UHFFFAOYSA-H 0.000 description 1
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- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
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- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000010558 suspension polymerization method Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- YRGLXIVYESZPLQ-UHFFFAOYSA-I tantalum pentafluoride Chemical compound F[Ta](F)(F)(F)F YRGLXIVYESZPLQ-UHFFFAOYSA-I 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- VJHDVMPJLLGYBL-UHFFFAOYSA-N tetrabromogermane Chemical compound Br[Ge](Br)(Br)Br VJHDVMPJLLGYBL-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 229910003438 thallium oxide Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- FEONEKOZSGPOFN-UHFFFAOYSA-K tribromoiron Chemical compound Br[Fe](Br)Br FEONEKOZSGPOFN-UHFFFAOYSA-K 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
- LOIHSHVELSAXQN-UHFFFAOYSA-K trirhenium nonachloride Chemical compound Cl[Re](Cl)Cl LOIHSHVELSAXQN-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、ポリアリーレンチオエーテルの製造法に関
し、さらに詳しく言うと、ポリアリーレンチオエーテル
を温和な重合条件で効率よく得ることができるポリアリ
ーレンチオエーテルの製造法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for producing polyarylene thioether, and more specifically, to a method for producing polyarylene thioether, which can be efficiently obtained under mild polymerization conditions. It concerns the manufacturing method.
[従来の技術およびその問題点]
従来、ポリフェニレンチオエーテル(以下、これをPP
Tと略記することがある。)などのポリアリーレンチオ
エーテル(以下、これをFATと略記することがある。[Prior art and its problems] Conventionally, polyphenylene thioether (hereinafter referred to as PP)
It is sometimes abbreviated as T. ) and other polyarylene thioethers (hereinafter sometimes abbreviated as FAT).
)は、ジハロゲン芳香族化合物とアルカリ金属硫化物を
、極性溶媒中で高温加圧下で縮重合反応゛することによ
り製造している。) is produced by subjecting a dihalogen aromatic compound and an alkali metal sulfide to a polycondensation reaction in a polar solvent under high temperature and pressure.
しかし、この方法では、■アル、カリ金属塩がFAT中
に残存し、FATの電気特性を悪化させる。■消費エネ
ルギーが大きくコスト高となる等の問題点があった。However, in this method, (1) Al and potassium metal salts remain in the FAT, deteriorating the electrical properties of the FAT. ■There were problems such as high energy consumption and high costs.
一方、チオフェノールを重合してFATを得る方法とし
ては、ソ連国特許第898.988号が知られているが
、この方法では、No C15/CF3COOHなどの
非常に高価な触媒を使用するため工業的に不利である。On the other hand, as a method for obtaining FAT by polymerizing thiophenol, Soviet Patent No. 898.988 is known, but this method uses a very expensive catalyst such as No C15/CF3COOH, which makes it difficult to produce industrially. This is disadvantageous.
また、硫酸を触媒とする方法も知られでいるが、副生物
が多く、また架橋ポリマーも大寸に生成するという欠点
があった。A method using sulfuric acid as a catalyst is also known, but it has the drawbacks of producing many by-products and producing a large crosslinked polymer.
[発明の■的]
この発明は、前記事情に基いてなされたものであり、そ
の目的は、前記問題点を解消し、電気的特性、機械的特
性、化学的特性等に優れたポリフェニレンチオエーテル
などのポリアリーレンチオエーテル、特に架橋ポリマー
の副生が少なく実質的に直鎖状のポリフェニレンチオエ
ーテルなどのポリアリーレンチオエーテルを、筒便に、
かつ温和な重合条件で、安価に得ることができる工業上
著しく有利なポリアリーレンチオエーテルの製造法を提
供することにある。[Objective of the invention] This invention has been made based on the above-mentioned circumstances, and its purpose is to solve the above-mentioned problems and to provide polyphenylene thioether etc. that have excellent electrical properties, mechanical properties, chemical properties, etc. Polyarylene thioethers, especially polyarylene thioethers such as substantially linear polyphenylene thioethers with less cross-linked polymer by-products,
The object of the present invention is to provide an extremely industrially advantageous method for producing polyarylene thioether, which can be obtained at low cost under mild polymerization conditions.
[問題点を解決するための手段]
この発明者らは、前記問題点を解決すべく鋭意研究を重
ねた結果、IX料七ツマ−としてチオフェノールを用い
、これを酸化剤の存在下で、ルイス触媒を用いて重合さ
せる方法が、この発明の目的を達成するのに極めて有効
であることを見い出し、この知見に基いてこの発明を完
成するに至った。[Means for Solving the Problems] As a result of intensive research to solve the above problems, the inventors used thiophenol as an IX ingredient, and in the presence of an oxidizing agent, It has been discovered that a method of polymerization using a Lewis catalyst is extremely effective in achieving the object of the present invention, and based on this knowledge, the present invention has been completed.
(1)一般式[Il中、lit、、R4は、それぞれ、
水素原子、低級アルキル基、ハロゲン原子および低級ア
ルコキシ基よりなる群から選択された置換基を表す。(1) In the general formula [Il, lit, R4 are each,
Represents a substituent selected from the group consisting of a hydrogen atom, a lower alkyl group, a halogen atom, and a lower alkoxy group.
なお、R1−R4は、たがいに同じ種類であっても異な
った種類であってもよい、)
で表されるチオフェノール類を、酸化剤の存在下、ルイ
ス醜触媒を用いて、重合することを特徴とするポリアリ
ーレンチオエーテルの製造法である。In addition, R1-R4 may be the same type or different types.) The thiophenols represented by ) can be polymerized using a Lewis ugly catalyst in the presence of an oxidizing agent. This is a method for producing polyarylene thioether characterized by the following.
前記一般式[Il中の1lil、、、R4について、さ
らに詳しく説明すると次の通りである。A more detailed explanation of R4 in the general formula [Il] is as follows.
すなわち、前記1it、、、l(4のそれぞれの具体例
としては、たとえば、水素原子:メチル基、エチル基、
プロピル基、l−メチルエチル基、ブチルノ^、l−メ
チルプロピル基、2−メチルプロピル基、1.1−ジメ
チルエチル基、ペンチル基、ヘキシル基、ヘプチル基、
オクチル基などの低級アルキル基 :フッ素原子、塩素
原子、臭素原子。That is, as specific examples of each of the above 1it, , 1 (4), for example, hydrogen atom: methyl group, ethyl group,
Propyl group, l-methylethyl group, butylno^, l-methylpropyl group, 2-methylpropyl group, 1,1-dimethylethyl group, pentyl group, hexyl group, heptyl group,
Lower alkyl groups such as octyl groups: fluorine atom, chlorine atom, bromine atom.
ヨウ素原子;メトキシ基、エトキシ基、プロポキシ基、
インプロポキシ基、ブトキシ基、インブトキシ基、 5
ee−ブトキシ基、 terk−ブトキシ基、ペンチル
オキシ基、ヘキシルオキシ基などの低級アルコキシ基を
挙げることができる。Iodine atom; methoxy group, ethoxy group, propoxy group,
Impropoxy group, butoxy group, imbutoxy group, 5
Examples include lower alkoxy groups such as ee-butoxy group, terk-butoxy group, pentyloxy group, and hexyloxy group.
これらの中でも、水素原子:メチル基、エチル ′基な
どのさらに低級なアルキル基:フッ素原子、塩素原子、
メトキシ基などのさらに低級なアルコキシ基が好ましく
、特に水素原子、メチル基、エチル基、塩素原子などが
好ましい。Among these, hydrogen atoms: methyl group, ethyl group, lower alkyl groups: fluorine atom, chlorine atom,
A lower alkoxy group such as a methoxy group is preferred, and a hydrogen atom, methyl group, ethyl group, chlorine atom, etc. are particularly preferred.
なお、前記一般式[I]で表されるチオフェノール類は
、1種単独で用いてもよく、2種以上を組み合せて用い
てもよい。The thiophenols represented by the general formula [I] may be used alone or in combination of two or more.
前記一般式[I]で表されるチオフェノール類としては
、たとえば、チオフェノール、2−メチルチオフェノー
ル、2−エチルチオフェノール2−プロピルチオフェノ
ール、2− (1−メチルエチル)チオフェノール、2
−ブチルチオフェノール、2− (1−メチルプロピル
)チオフェノール、2−(2−メチルブチル)チオフェ
ノール、2− (1,1−ジメチルエチル)チオフェノ
ール、スーペンチルチオフェノール、2−へキシルチオ
フェノール、2−オクチルチオフェノール、2−フルオ
ロチオフェノール、2−クロロチオフェノール、2−ブ
ロモチオフェノール、?−ヨードチオフェノール、2−
メトキシチオフェノール、?−エトキシチオフェノール
、2−プロポキシチオフェノール、2−インプロポキシ
チオフェノール、2−ブトキシチオフェノール、2−5
ec−ブトキシチオフェノール、2−インブトキシチオ
フェノール、2− tert−ブトキシチオフェノール
、2−ペンチルオキシチオフェ/−ル、2−ヘキシルオ
キソチオフェノール、2.6−ジメチルチオフェノール
、2.6−ジエチルチオフェノール、2−メチル−6−
エチルチオフェノール、2.6−ジフルオロチオフェノ
ール、2−メチル−6−フルオロチオフェノール、2−
エチル−6−フルオロチオフェノール、2,6−ジクロ
ロチオフェノール、2.6−ジブロモチオフェノール、
2−メチル−6−クロロチオフェノール、2.6−ジメ
トキシチオフェノール、2−メチル−6−ブトキシチオ
フェノール、2,3−ジメチルチオフェノール、2.3
−ジエチルチオフェノール、2,3−ジフルオロチオフ
ェノール、2−メチル−3−フルオロチオフェノール、
2−ブルオロー3−メチルチオフェノール、2.3−ジ
メトキシチオフェノール、2−メチル−3−メトキシチ
オフェノール、2.3−ジクロロチオフェノール、2−
メチル−3−クロロチオフェノール、3−クロロ−2−
メチルチオフェノール、2.5−ジメチルチオフェノー
ル、2.5−ジフルオロチオフェノール、2.5−ジエ
チルチオフェノール、2−メチル−5−フルオロチオフ
ェノール、2−メチル−5−エチルチオフェノール、2
−フルオロ−5−メチルチオフェノール、2.5−ジク
ロロチオフェノール、2,5−ジメトキシチオフェノー
ル、2−メチル−5−クロロチオフェノール、2−メチ
ル−5−メトキシチオフェノール、2−クロロ−5−メ
チルチオフェノール、2−メトキシ−5−メチルチオフ
ェノール、2−クロロ−5−フルオロチオフェノール、
2−エチル−5−クロロチオフェノール、2−クロロ−
5−エチルチオフェノール、3,5−ジメチルチオフェ
ノール、3.5−ジフルオロチオフェノール、3.5−
ジメトキシチオフェノール、3.5−ジエチルチオフェ
ノール、3,5−ジクロロチオフェノール、3−メチル
−5−フルオロチオフェノール、3−メチル−5−クロ
ロチオフェノール、3−メチル−5−メトキシチオフェ
ノール、2゜3.5−トリメチルチオフェノール、2,
3.5−トリフルオロチオフェノール、2,3.5−ト
リエチルチオフェノール、2,3.5−1リクロロチオ
フエノール、2−メチル−3,5−ジフルオロチオフェ
ノール、2,3,5.6−チトラメチルチオフエノール
、2,3,5.6−テトラフルオロチオフェノール、2
,3,5.6−テトラクロルチオフエノール、2,3.
5.6−テトラメトキシチオフエノール、2,3,5.
6−テトラエチルチオフエノール、2,6−シメチルー
3.5−テトラフルオロチオフェノール、2.6−ジエ
チル−3,5−ジフルオロチオフエノール。Examples of the thiophenols represented by the general formula [I] include thiophenol, 2-methylthiophenol, 2-ethylthiophenol, 2-propylthiophenol, 2-(1-methylethyl)thiophenol, and 2-ethylthiophenol.
-Butylthiophenol, 2-(1-methylpropyl)thiophenol, 2-(2-methylbutyl)thiophenol, 2-(1,1-dimethylethyl)thiophenol, supentylthiophenol, 2-hexylthiophenol , 2-octylthiophenol, 2-fluorothiophenol, 2-chlorothiophenol, 2-bromothiophenol, ? -iodothiophenol, 2-
Methoxythiophenol? -Ethoxythiophenol, 2-propoxythiophenol, 2-impropoxythiophenol, 2-butoxythiophenol, 2-5
ec-butoxythiophenol, 2-imbutoxythiophenol, 2-tert-butoxythiophenol, 2-pentyloxythiophenol, 2-hexyloxothiophenol, 2.6-dimethylthiophenol, 2.6- diethylthiophenol, 2-methyl-6-
Ethylthiophenol, 2,6-difluorothiophenol, 2-methyl-6-fluorothiophenol, 2-
Ethyl-6-fluorothiophenol, 2,6-dichlorothiophenol, 2,6-dibromothiophenol,
2-Methyl-6-chlorothiophenol, 2.6-dimethoxythiophenol, 2-methyl-6-butoxythiophenol, 2,3-dimethylthiophenol, 2.3
-diethylthiophenol, 2,3-difluorothiophenol, 2-methyl-3-fluorothiophenol,
2-Blue 3-methylthiophenol, 2.3-dimethoxythiophenol, 2-methyl-3-methoxythiophenol, 2.3-dichlorothiophenol, 2-
Methyl-3-chlorothiophenol, 3-chloro-2-
Methylthiophenol, 2.5-dimethylthiophenol, 2.5-difluorothiophenol, 2.5-diethylthiophenol, 2-methyl-5-fluorothiophenol, 2-methyl-5-ethylthiophenol, 2
-Fluoro-5-methylthiophenol, 2,5-dichlorothiophenol, 2,5-dimethoxythiophenol, 2-methyl-5-chlorothiophenol, 2-methyl-5-methoxythiophenol, 2-chloro-5- Methylthiophenol, 2-methoxy-5-methylthiophenol, 2-chloro-5-fluorothiophenol,
2-ethyl-5-chlorothiophenol, 2-chloro-
5-ethylthiophenol, 3,5-dimethylthiophenol, 3.5-difluorothiophenol, 3.5-
Dimethoxythiophenol, 3.5-diethylthiophenol, 3,5-dichlorothiophenol, 3-methyl-5-fluorothiophenol, 3-methyl-5-chlorothiophenol, 3-methyl-5-methoxythiophenol, 2゜3.5-trimethylthiophenol, 2,
3.5-trifluorothiophenol, 2,3.5-triethylthiophenol, 2,3.5-1-lichlorothiophenol, 2-methyl-3,5-difluorothiophenol, 2,3,5.6 -Titramethylthiophenol, 2,3,5.6-tetrafluorothiophenol, 2
, 3,5.6-tetrachlorothiophenol, 2,3.
5.6-tetramethoxythiophenol, 2,3,5.
6-tetraethylthiophenol, 2,6-dimethyl-3,5-tetrafluorothiophenol, 2,6-diethyl-3,5-difluorothiophenol.
2.6−ジエチル−3,5−ジクロロチオフエノール、
2,6−ダニチル−3,5−ジメチルチオフエノール、
2,6−ジエチル−3,5−ジメトキシチオフエノール
、2.6−シメチルー3.5−ジクロロチオフェノール
、2−メチル−6−エチル−3,5−ジフルオロチオフ
エノールなどを挙げることができる。2.6-diethyl-3,5-dichlorothiophenol,
2,6-danityl-3,5-dimethylthiophenol,
Examples include 2,6-diethyl-3,5-dimethoxythiophenol, 2,6-dimethyl-3,5-dichlorothiophenol, and 2-methyl-6-ethyl-3,5-difluorothiophenol.
これらの中でも特に、チオフェノール、2−メチルチオ
フェノール、2−エチルチオフェノール、2−フルオロ
チオフェノール、2−クロロチオフェノール、2−メト
キシチオフェノール、2、6−シメチルチオフエノール
、2,6−ジニチルチオフエノール、2,6−シフルオ
ロチオフエノール、2.6−ジクロロチオフェノール、
2゜6−シメトキシチオフエノール、2,3,5.6−
テトラクロロチオフエノール、2,3,5.6−チトラ
メチルチオフエノールチオフエノールなどが好ましい。Among these, thiophenol, 2-methylthiophenol, 2-ethylthiophenol, 2-fluorothiophenol, 2-chlorothiophenol, 2-methoxythiophenol, 2,6-dimethylthiophenol, 2,6-dimethylthiophenol, Nitylthiophenol, 2,6-cyfluorothiophenol, 2,6-dichlorothiophenol,
2゜6-Simethoxythiophenol, 2,3,5.6-
Tetrachlorothiophenol, 2,3,5.6-titramethylthiophenol thiophenol, and the like are preferred.
なおこれらの化合物は、1種単独で用いても。Note that these compounds may be used alone.
2種以上を組み合せて用いてもよい。You may use two or more types in combination.
この発明の方法においては、一般式[I]で表されるチ
オフェノール類を反応原料として用いて重合することに
よって1通常。In the method of the present invention, thiophenols represented by the general formula [I] are polymerized using as a reaction raw material.
(1)一般式[I[]中、R5−R8は、前記一般式[
I]中のR1−R4と同様の意味を表す、nは2以上の
整数を表す、)
で表される主鎖構造を有するポリアリーレンチオエーテ
ル、4.νに架橋度が著しく低い直鎖状もしくは実質的
に直鎖状のポリアリーレンチオエーテルを高い選択率で
効率よく得ることができる。(1) In the general formula [I[], R5-R8 are represented by the general formula [I].
Polyarylene thioether having the main chain structure represented by R1-R4 in R1-R4, where n represents an integer of 2 or more; 4. A linear or substantially linear polyarylene thioether having an extremely low degree of crosslinking in ν can be obtained efficiently with high selectivity.
この発明の方法に用いる前記ルイス酸触媒としては、た
とえば、全屈等のハロゲン化合物、オキシハロゲン化合
物等のハロゲン化合物、硫酸塩、硝酸塩、リン酸塩、塩
素酸塩、臭素酸塩、ケイ酸塩、メタロケイ酸塩、ペテロ
酸塩などのオキソ酸塩、フルオロケイ酸塩、酸性酸化物
などの公知のいわゆるルイスa(形式上の非プロトン酸
)もしくはそれらを含有するルイス酸組成物を挙げるこ
とができる。Examples of the Lewis acid catalyst used in the method of the present invention include halogen compounds such as halogen compounds, oxyhalogen compounds, sulfates, nitrates, phosphates, chlorates, bromates, and silicates. Examples include known so-called Lewis a (formally aprotic acids) such as oxoacid salts such as metallosilicates and peteroates, fluorosilicates, acidic oxides, and Lewis acid compositions containing them. can.
なお、これらのルイス酸もしくはルイス酸組成物は、形
式上非プロトン酸に分類されているもの、微量の結晶水
、構造水、吸着水などの水分等のプロトン供与性物質の
共存によってその1部がプロトン酸に変化することが知
られており、一般の酸触媒反応に、これらの非プロトン
型ルイス酸触媒を用いた場合においても、酸触媒作用に
場合によりプロトンが関与している可能性もあることが
指摘されている。Note that some of these Lewis acids or Lewis acid compositions are formally classified as aprotic acids, and some of them are due to the coexistence of proton-donating substances such as trace amounts of water such as crystal water, structured water, and adsorbed water. is known to change into a protic acid, and even when these aprotic Lewis acid catalysts are used in general acid-catalyzed reactions, there is a possibility that protons may be involved in the acid-catalyzed reaction. One thing has been pointed out.
この発明の方法においても、前記ルイス酸もしくはルイ
ス酸触媒組成物は、触媒活性を実質的に消失させない程
度の量の水もしくはプロトン供与性の物質を含有する状
態もしくはその共存下に用いることができる。Also in the method of this invention, the Lewis acid or Lewis acid catalyst composition can be used in a state containing or in the coexistence of water or a proton-donating substance in an amount that does not substantially eliminate the catalytic activity. .
また、前記様々の金属塩等の水和物を用いる場合には、
必要に応じて、加熱翅理などの活性化処理を施して、こ
の発明の方法におけるルイス酸触媒とし用いることもで
きる。In addition, when using hydrates of the various metal salts, etc.,
If necessary, it can be used as a Lewis acid catalyst in the method of the present invention after being subjected to an activation treatment such as heating.
この発明の方法において前記ルイス酸触媒として通常好
適に使用できる物質としては、たとえば周期表IIa〜
■a族、■族、nb〜vtb族の元素から選ばれる少く
とも1種の元素のハロゲン化物、オキシハロゲン化物、
ハロゲン錯体等のハロゲン化合物などを挙げることがで
き、中でもハロゲン化物などが好ましい。In the method of the present invention, substances that can be normally suitably used as the Lewis acid catalyst include, for example, those in the periodic table IIa to
■A halide or oxyhalide of at least one element selected from the elements of group A, group II, and group nb to vtb,
Examples include halogen compounds such as halogen complexes, among which halides are preferred.
これらのハロゲン化合物を例示すると、たとえば、
BeF2 、 BaCu z、 BeBr2などのハ
ロゲン化ベリリウム。Examples of these halogen compounds include beryllium halides such as BeF2, BaCuz, and BeBr2.
MgF2、HgC12,MgBr2 など17) ハロ
ゲン化マグネシウム。MgF2, HgC12, MgBr2, etc. 17) Magnesium halides.
LaF3、 LaCJ13 などのハロゲン化ランタン
。Lanthanum halides such as LaF3 and LaCJ13.
CeFx 、 CeC13、CeFa、CeC1a
、 CeBr3などのハロゲン化セリウム、
Tici 2. TiCjL z、Tih、 T
ick i、TiBr5.Ti1a、TrClz Br
2.などのハロゲン化チタン。CeFx, CeC13, CeFa, CeC1a
, cerium halides such as CeBr3, Tici 2. TiCjL z, Tih, T
ick i, TiBr5. Ti1a, TrClzBr
2. Titanium halides such as.
ZrF4. ZrCfL 4 、 ZrBr1などの
ハロゲン化ジルコニウム、
HfCdLs /Zトのハロゲン化ハフニウム。ZrF4. Zirconium halides such as ZrCfL 4 and ZrBr1, hafnium halides such as HfCdLs /Z.
VClt 、 VCJ13 、 VF3 、 VCla
、VBr4なト(1) ハロゲン化バナジウム。VClt, VCJ13, VF3, VCla
, VBr4 (1) Vanadium halide.
NbCnz 、 NbBrz、NbF3、NbC1s
、 NbBr5などのハロゲン化ニオブ、
TaF5、 TaCl3、 TaCjLs 、 TaB
r3.↑Brsなどのハロゲン化タンタル、
CrF3、CrCn2. CrCn3. CrBr2
. CrBr3、Orb 、 Crhなどのハロゲン
化クロム、MoF3 、MoFa、 MoFs、
MOF6、 No(j17、MoCfL:+、NoCu
4. How15 、 MoBr+ 、 Mo
Bra 、MoBr5 、Mo1sなどのハロゲン
化モリブデン、WFa 、 WF6. ’dc12.
’dC交4、wC文5.vCC60WBr6、W16
などのハロゲン化タングステン、MnF2、 HnCn
2 、 NnBr2 、 Nn12などのハロゲン
化マンガン、
ReF6、ReCl 3、Re0文5などのハロゲン化
レニウム、
FeF2 、 FeCfL 2 、 FeBr2 、
Fe12 、 FeCl3゜FeBr3. Fe1
3 などのハロゲン化鉄、GaF2、 Ca1l 2
、 CoBr2、 Co I2、 CaCO2、CoB
r3、 (:OH3などのハロゲン化コバルト。NbCnz, NbBrz, NbF3, NbC1s
, Niobium halides such as NbBr5, TaF5, TaCl3, TaCjLs, TaB
r3. ↑Tantalum halides such as Brs, CrF3, CrCn2. CrCn3. CrBr2
.. Chromium halides such as CrBr3, Orb, Crh, MoF3, MoFa, MoFs,
MOF6, No(j17, MoCfL:+, NoCu
4. How15, MoBr+, Mo
Molybdenum halides such as Bra, MoBr5, Mo1s, WFa, WF6. 'dc12.
'dC intersection 4, wC sentence 5. vCC60WBr6, W16
Tungsten halides such as MnF2, HnCn
2, manganese halides such as NnBr2, Nn12, rhenium halides such as ReF6, ReCl3, Re05, FeF2, FeCfL2, FeBr2,
Fe12, FeCl3°FeBr3. Fe1
Iron halides such as 3, GaF2, Ca1l2
, CoBr2, Co I2, CaCO2, CoB
r3, (cobalt halide such as OH3.
RuC13、RuBr3、Ru1xなどのハロゲン化ル
テニウム、
NiF2、NiCl2.旧Br2、Ni12などのハロ
ゲン化ニッケル、
PdF2. PdC12、PaBr2、 Pd12
などのハロゲン化パラジウム、
RhC13、RhBrz 、 Rhl3などのハロゲン
化ロジウPtF2 、 PtC12、PtBr2 、
PtI2 、 PtC15、PtBrAなど
のハロゲン化白金、
CuC1、CuF2、CuC12、CuBr2、Cu
Elなどのハロゲン化銅、
AgF 、 AgC1、AgBr、 Aglなどのハ
ロゲン化銀、ZnF2、ZnCfJ、2 、ZnBr2
、ZnI2などのハロゲン化唾鉛、
CdF2. CtiCl 2 、 CdBr2、 G
dI2などのハロゲン化カドミウム、
Hg2Cfly、 NiCl2などのハロゲン化水銀、
BF3 、 BCl3、BBr3 、BI3 などのハ
ロゲン化ホウ素。Ruthenium halides such as RuC13, RuBr3, Ru1x, NiF2, NiCl2. Nickel halides such as old Br2, Ni12, PdF2. PdC12, PaBr2, Pd12
Palladium halides such as RhC13, RhBrz, Rhl3, PtF2, PtC12, PtBr2,
Platinum halides such as PtI2, PtC15, PtBrA, CuC1, CuF2, CuC12, CuBr2, Cu
Copper halides such as El, silver halides such as AgF, AgC1, AgBr, Agl, ZnF2, ZnCfJ, 2, ZnBr2
, halogenated salivary lead such as ZnI2, CdF2. CtiCl2, CdBr2, G
Cadmium halides such as dI2, mercury halides such as Hg2Cfly, NiCl2,
Boron halides such as BF3, BCl3, BBr3, BI3.
A文F3、 An C13、A文Br3、 A見I3な
どのへロケン化アルミニウム。Aluminum helokenide such as A-F3, An-C13, A-Br3, and A-I3.
GaF3 、 GaCJl 3 、 GaBr3、Ga
l3など(7) ハロゲン化カリウム、
IJIF3、 InC13、InBr3 などのハロゲ
ン化インジウム。GaF3, GaCJl3, GaBr3, Ga
(7) Indium halides such as potassium halides, IJIF3, InC13, and InBr3.
Tlh、置 CfB、TI C1、TJlzBrsなど
のハロゲン化タリウム、
SiF4.5iC1aなどのハロゲン化ケイ素、GeF
4、Ge(fL4.GeBr4などのハロゲン化ゲルマ
ニウム、
SnF2、 ’;nFa、5nCfL2 、 SnC;
fLs 、 SnBr2゜SnB rs、5n12.5
n14などのハロゲン化スズ。Tlh, thallium halides such as CfB, TI C1, TJlzBrs, silicon halides such as SiF4.5iC1a, GeF
4, Ge (fL4. Germanium halides such as GeBr4, SnF2, '; nFa, 5nCfL2, SnC;
fLs, SnBr2゜SnBrs, 5n12.5
Tin halides such as n14.
PbF2. PbF4、PbCl2、 pbc文4
、PbBr2、Pb 12 などのハロゲン化鉛、
PFs 、 PCfLs などのハロゲン化リン、As
F5. AsCl 5などのハロゲン化ひ素。PbF2. PbF4, PbCl2, pbc sentence 4
, lead halides such as PbBr2, Pb12, phosphorus halides such as PFs, PCfLs, As
F5. Arsenic halides such as AsCl5.
SbF5、 SbC文s 、 5bBrsなどのハロゲ
ン化アンチモン。Antimony halides such as SbF5, SbC, and 5bBrs.
BiF3. B1C13などのハロゲン化ビスマス、
TeC12、TeC1aなどのハロゲン化テルルなどの
様々なハロゲン化物、
ZrC0fL2、 Ti(OH)(J13 、 Mo0
GJ1、MOO2C12、WOCla 、 WO2C1
2,Cr0C1a、 Gra2C12、VOCJ13、
POCJ13 、 SO2CfLzなどのオキシ/’i
ロゲン化物などを挙げることができる。BiF3. Bismuth halides such as B1C13,
Various halides such as tellurium halides such as TeC12, TeC1a, ZrC0fL2, Ti(OH)(J13, Mo0
GJ1, MOO2C12, WOCl, WO2C1
2, Cr0C1a, Gra2C12, VOCJ13,
Oxy/'i such as POCJ13, SO2CfLz
Examples include rogens.
これらの中でも、ベリリウム、マグネシウム。Among these, beryllium, magnesium.
亜鉛、ホウ素、アルミニウム、ガリウム、スズ、アンチ
モン、ビスマス、テルル、チタン、ジルコニウム、ニオ
ブ、タンタル、クロム、モリブデン、タングステン、鉄
、コバルト、銅の中から選ばれる元素のハロゲン化物な
どが好ましく、特に、塩化アルミニウム、四塩化チタン
、五塩化アンチモン、六塩化タングステンなどが好まし
い。Preferred are halides of elements selected from zinc, boron, aluminum, gallium, tin, antimony, bismuth, tellurium, titanium, zirconium, niobium, tantalum, chromium, molybdenum, tungsten, iron, cobalt, and copper, and particularly, Preferred are aluminum chloride, titanium tetrachloride, antimony pentachloride, tungsten hexachloride, and the like.
なお、これらの化合物は、実質的な無水物として、エー
テル錯体、アルコール錯体、カルボン酸錯体、ニトリル
錯体等の反応層中において離脱しゃすい配位子を有する
錯体として、あるいは、実質的に触媒活性を破壊しない
程度の量の水や他のプロトン供与性物質を含有する状態
として用いることができる。Note that these compounds can be used as substantially anhydrous compounds, as complexes having a ligand that can be easily separated in the reaction layer, such as ether complexes, alcohol complexes, carboxylic acid complexes, or nitrile complexes, or as substantially catalytically active compounds. It can be used in a state containing water or other proton-donating substances in an amount that does not destroy the proton-donating substance.
また、これらの化合物等の前記ルイス酸もしくはルイス
酸組成物は、1種単独で用いても、2種以上を混合もし
くは複合するなどして組み合せて用いても良い。Further, the Lewis acids or Lewis acid compositions such as these compounds may be used alone or in combination by mixing or compounding two or more.
さらに、これらのルイス酸もしくはルイス酸組成物は、
実質的に触媒活性を破壊しない範囲内の量のアルカリ金
属化合物などの他の化合物を混合もしくは複合して用い
ることもできる。Furthermore, these Lewis acids or Lewis acid compositions are
Other compounds such as alkali metal compounds can also be mixed or used in combination in amounts that do not substantially destroy the catalytic activity.
前記酸化剤は、チオフェノールを酸化し、ジフェニルジ
スルフィドを生成させることができる程度の酸化能力を
有し、かつ、使用するルイス酸触媒の触媒活性を実質的
に失活させないものであれば特に制限はない。The oxidizing agent is particularly limited as long as it has an oxidizing ability capable of oxidizing thiophenol to produce diphenyl disulfide and does not substantially deactivate the catalytic activity of the Lewis acid catalyst used. There isn't.
そのようなものの具体例として、酸素ガス、オゾン、塩
素などの酸化性ガス、もしくはこれを含有する空気など
の酸化性ガス組成物:酸化銅(II) 、 #化[(I
I)酸化鉄(■)、酸化コバル) (m)、m化ニッケ
ル(■)、酸化マンガン(■)、酸化ルテニウム(m)
、酸化ロジウム(■)、酸化白金(■)、酸化白金(■
)、酸化パラジウム(II)、酸化レニウム(■)、酸
化クロム(■)、酸化モリブデン(■)、酸化バナジウ
ム(V)、酸化タリウム(■)、酸化スズ(■)、酸化
鉛(■)、酸化イオウ(Vl) 、酸化イオウ(■)、
酸化テルル(■)、酸化ひ素(V)、m化ビスマス(m
) 、酸化ビスマス(V)、ヘテロポリ酸、ペロブスカ
イト、過マンガン酸カリウム、過レニウム酸、ニクロム
ナトリウム、硫酸、塩素酸、塩素酸ナトリウム次亜塩素
酸1次亜塩累酸ナトリウム、などの酸化性酸化物、酸化
性複合酸化物、酸化性オキソ酸、酸化性オキソ酸塩;亜
型化アンチモン、塩化銅(II)、塩化第二鉄、塩化コ
バル) (II) 、塩化スズ(■)、塩化テルル(■
)、塩化鉛(■)、塩化パラジウム(II)、塩化トレ
テニウム(III)塩化白金(II)、塩化白金(■)
、塩化ffi (I) 、二酸化二塩化クロム、オキシ
塩化モリブデンなどの酸化性金属塩化物もしくは酸化性
金属オキシ塩化物、ヨウ素、シュウ素などの酸化性単体
などを挙げることができる。Specific examples of such things include oxidizing gases such as oxygen gas, ozone, and chlorine, or oxidizing gas compositions such as air containing the same: copper(II) oxide, [(I
I) Iron oxide (■), cobal oxide) (m), nickel oxide (■), manganese oxide (■), ruthenium oxide (m)
, rhodium oxide (■), platinum oxide (■), platinum oxide (■)
), palladium (II) oxide, rhenium oxide (■), chromium oxide (■), molybdenum oxide (■), vanadium (V) oxide, thallium oxide (■), tin oxide (■), lead oxide (■), Sulfur oxide (Vl), sulfur oxide (■),
Tellurium oxide (■), arsenic oxide (V), bismuth mide (m
), bismuth (V) oxide, heteropolyacid, perovskite, potassium permanganate, perrhenic acid, sodium dichrome, sulfuric acid, chloric acid, sodium chlorate, sodium hypochlorite, sodium hypochlorite, etc. substances, oxidizing complex oxides, oxidizing oxoacids, oxidizing oxoacid salts; subtype antimony, copper(II) chloride, ferric chloride, cobal chloride) (II), tin chloride (■), tellurium chloride (■
), lead chloride (■), palladium (II) chloride, trethenium (III) chloride, platinum (II) chloride, platinum chloride (■)
, ffi(I) chloride, oxidizing metal chlorides or oxidizing metal oxychlorides such as chromium dioxide dichloride, and molybdenum oxychloride, and oxidizing simple substances such as iodine and oxal.
これらの中でも、特に好適なものとして、たとえば1m
化銅(II)、ヨウ素、酸素ガスもしくは空気、五塩化
アンチモン、硫酸などを挙げることができ、さらに好ま
しいものとし、ヨウ素、五塩化アンチモン、酸素もしく
は空気などを挙げることができる。Among these, particularly suitable ones include, for example, 1 m
Examples include copper (II) chloride, iodine, oxygen gas or air, antimony pentachloride, sulfuric acid, and more preferred examples include iodine, antimony pentachloride, oxygen, and air.
なお、これらの酸化剤は1種単独で用いても、2種以上
を組み合せて用いることもできる。Note that these oxidizing agents may be used alone or in combination of two or more.
また、これらの酸化剤の中で、前記ルイス酸触媒として
も使用できるものは、その1種をもって、前記ルイス酸
触媒を前記酸化剤を兼ねることが可能である。そのよう
なものとして、たとえば五塩化アンチモン、塩化第二鉄
などの酸化性金属ハロゲン化物などを挙げることができ
る。Moreover, among these oxidizing agents, it is possible to use one type of the oxidizing agent that can also be used as the Lewis acid catalyst and the Lewis acid catalyst can also serve as the oxidizing agent. Examples of such materials include oxidizing metal halides such as antimony pentachloride and ferric chloride.
また、これらの酸化剤の中で、重合反応の溶媒としても
用いることができるものは、その1種をもって溶媒と酸
化剤を兼ねることが可能である。Furthermore, among these oxidizing agents, one type that can be used as a solvent for the polymerization reaction can serve both as a solvent and as an oxidizing agent.
そのようなものとして、たとえば硫酸などを挙げること
ができる。Examples of such substances include sulfuric acid.
この発明の方法においては、少なくとも1種の前記一般
式[IIで表されるチオフェノール類を、少なくとも1
種の前記ルイス酸触媒を用いて、前記酸化剤の存在下も
しくは雰囲気下で、重合して、ポリアリーレンチオエー
テルを製造する。In the method of the present invention, at least one thiophenol represented by the general formula [II] is
A polyarylene thioether is produced by polymerization using the aforementioned Lewis acid catalyst in the presence or atmosphere of the aforementioned oxidizing agent.
この重合は、溶媒の非存在下においても行いうるが、通
常、溶媒の存在下に行うことが望ましい。Although this polymerization can be carried out in the absence of a solvent, it is usually desirable to carry out it in the presence of a solvent.
溶媒としては、使用するルイス酸触媒の触媒効果を実質
的に消失させないものであれば使用可能であるが、通常
用いる七ツマ−を溶解できるものが望ましい。As the solvent, any solvent can be used as long as it does not substantially eliminate the catalytic effect of the Lewis acid catalyst used, but it is desirable to use a solvent that can dissolve the commonly used hexamer.
通常、好適に使用することができる溶媒としては、たと
えば、ニトロメタン、ジクロロメタン。Usually, examples of solvents that can be suitably used include nitromethane and dichloromethane.
ジクロロメタン、テトラクロロエタン、ニトロベンゼン
などを挙げることができ、このほか一般にフリーデルク
ラフッ反応、カチオン重合等に使用される溶媒も適宜選
択することによって好適に使用することができる。Dichloromethane, tetrachloroethane, nitrobenzene, etc. can be mentioned, and in addition, solvents generally used in Friedel-Krach reactions, cationic polymerizations, etc. can also be suitably selected by appropriately selecting them.
なお、これらの溶媒は、1種単独で用いても、2種以上
を混合して用いてもよく、あるいは必要により、たとえ
ば、ベンゼン、トルエンなどの芳香族炭化水素などの不
活性溶媒などを適宜混合して用いてもよい。These solvents may be used alone or in combination of two or more, or if necessary, an inert solvent such as an aromatic hydrocarbon such as benzene or toluene may be used as appropriate. They may be used in combination.
前記重合反応に使用する前記ルイス酸触媒[A]と前記
チオフェノール[B]との割合は。What is the ratio of the Lewis acid catalyst [A] and the thiophenol [B] used in the polymerization reaction?
使用する触媒や溶媒やモノマーの種類、系中の水分子の
不純物の濃度などの他の条件によって異なるので一様に
規定できないが、通常、[A] / [B] (モル
比)が、0.05〜30、好ましくは、0.5〜8であ
る。It cannot be specified uniformly because it varies depending on other conditions such as the type of catalyst, solvent, and monomer used, and the concentration of water molecule impurities in the system, but usually [A] / [B] (molar ratio) is 0. .05-30, preferably 0.5-8.
この値が、0.05未満であると、重合速度が遅くなり
、ポリマーの収率が低下することがある。一方、30を
超えると触媒のコストが高くなり経済上不利になる。If this value is less than 0.05, the polymerization rate may become slow and the yield of the polymer may decrease. On the other hand, if it exceeds 30, the cost of the catalyst will increase, resulting in an economic disadvantage.
前記酸化剤[C]の使用割合は、用いる酸化剤の種類、
反応条件などの他の条件によって著しく異なるので一様
に規定できないが、[C]/[B] (モル比)が、通
常0.5以上、好ましくは1〜10程度とすれば十分で
ある。The usage ratio of the oxidizing agent [C] depends on the type of oxidizing agent used,
Although it cannot be specified uniformly because it varies significantly depending on other conditions such as reaction conditions, it is sufficient that [C]/[B] (molar ratio) is usually 0.5 or more, preferably about 1 to 10.
なお、この酸化剤の使用量や濃度を、その種類や重合条
件に応じて適宜調整することによって反応の効率を向上
させることができる。The efficiency of the reaction can be improved by appropriately adjusting the amount and concentration of the oxidizing agent depending on the type and polymerization conditions.
前記重合に際しての反応温度は、使用する触媒や七ツマ
−の種類によって一様でないが、通常、−5〜 150
℃であり、好ましくは0〜50℃である。The reaction temperature during the polymerization varies depending on the catalyst used and the type of hexamer, but is usually between -5 and 150°C.
℃, preferably 0 to 50℃.
反応圧力としては、特に制限がなく、通常、常圧もしく
は反応系の自圧で好適に行うことができる。もっとも、
必要により、重合反応に支障のない稀釈ガスなどを用い
て加圧下に行うこともできる。There is no particular restriction on the reaction pressure, and the reaction can usually be carried out suitably at normal pressure or the autogenous pressure of the reaction system. However,
If necessary, the reaction can also be carried out under pressure using a diluting gas that does not interfere with the polymerization reaction.
反応時間は、用いる触媒、モノマーの種類やその使用割
合、反応温度などの他の条件によって著しく異なるので
あるが、通常、 1〜80時間であり、好ましくは8〜
72時間である。The reaction time varies considerably depending on other conditions such as the catalyst used, the type and proportion of monomers used, and the reaction temperature, but is usually 1 to 80 hours, preferably 8 to 80 hours.
It is 72 hours.
前記重合反応系を構成するにあたって、前記ルイス酸触
媒、前記チオフェノール、前記酸化剤、および前記溶媒
の配合の順序・方法については特に制限はなく、それぞ
れを同時にあるいは種々の順序・様式で段階的に配合す
ることができる。In constructing the polymerization reaction system, there is no particular restriction on the order and method of blending the Lewis acid catalyst, the thiophenol, the oxidizing agent, and the solvent, and each may be added simultaneously or stepwise in various orders and manners. It can be blended with.
反応方式としては、特に制限はなく、連続式。There are no particular restrictions on the reaction method, and it is a continuous method.
半連続式、回分式のいずれの方式を用いてもよい0回分
式を用いる場合には1反応系を攪拌して行うことが望ま
しい。Either a semi-continuous system or a batch system may be used. When a 0-batch system is used, it is desirable to stir one reaction system.
重合方式としては、懸濁重合方式、塊状重合方式なども
可渣であるが、通常、溶液重合方式が好ましい。As the polymerization method, a suspension polymerization method, a bulk polymerization method, etc. are also possible, but a solution polymerization method is usually preferred.
この後処理は、公知の様々の方法に準じて行うことがで
きる。This post-processing can be performed according to various known methods.
重合を溶液重合で行った場合の、この後処理の1例を挙
げれば、以下のとおりである。An example of this post-treatment when polymerization is carried out by solution polymerization is as follows.
すなわち、前記重合反応が、完結もしくは必要な程度に
進行したならば、反応混合物を水、メタノールなどの低
級アルコールあるいはそれらの混合液と接触させて、触
媒を失活させるとともに、生成物のポリマーを沈澱せし
める。この際、必要により、塩基性物質等の重合停止剤
を併用してもよい。That is, once the polymerization reaction has been completed or progressed to the required extent, the reaction mixture is brought into contact with water, a lower alcohol such as methanol, or a mixture thereof to deactivate the catalyst and deactivate the product polymer. Let it settle. At this time, a polymerization terminator such as a basic substance may be used in combination, if necessary.
この沈澱したポリマーは、通常のろ過などの分離操作に
よって、液体から分離される。この分離したポリマーは
、必要に応じて、アルカリ水溶液などの洗浄液によって
洗浄もしくは中和Φ洗浄され、さらに必要に応じて、適
当な溶媒と再沈液とを用いて溶解・再沈・分離・メタノ
ール洗浄などの洗浄を必要なだけ繰り返したのち、乾燥
され。This precipitated polymer is separated from the liquid by conventional separation operations such as filtration. The separated polymer is washed or neutralized with a washing solution such as an alkaline aqueous solution, if necessary, and then dissolved, reprecipitated, separated, or methanol using an appropriate solvent and reprecipitation solution. After repeating the cleaning process as many times as necessary, it is dried.
種々の純度に精製されたポリアリーレンチオエーテルと
して回収することができる。It can be recovered as polyarylene thioether purified to various purity levels.
なお、前記溶解・再沈に用いる溶媒としては。In addition, the solvent used for the above-mentioned dissolution/reprecipitation is as follows.
ポリマーを効率よく溶解するという点などから、たとえ
ばN−メチルピロリドンなどが好適に用いられる。For example, N-methylpyrrolidone is preferably used because it dissolves the polymer efficiently.
また、上記再沈液、洗浄液としては、通常、たとえば氷
、メタノールあるいは、これらの混合液など、特にメタ
ノールなどが好適に使用できる。Further, as the reprecipitation liquid and the washing liquid, ice, methanol, or a mixture thereof, particularly methanol, can be preferably used.
一方、ポリマーから分離された混合液中の未反応モノマ
ー、副生低分子化合物、溶媒、メタノールなどは、通常
の蒸留操作によって精製・回収され、綴り返し、反応系
あるいは、後処理工程に、あるいは他の様々な用途に有
効に利用することができる。On the other hand, unreacted monomers, by-product low-molecular compounds, solvents, methanol, etc. in the mixed liquid separated from the polymer are purified and recovered by normal distillation operations, and then added to the reaction system or post-treatment process, or It can be effectively used for various other purposes.
この発明の方法によって得られたポリフェニレンチオエ
ーテルなどのポリアリーレンチオエーテルは、耐熱性、
耐薬品に優れ、剛性、強度、耐衝撃性、耐摩耗性などの
種々の機械的特性に優れるとともに、特に、従来聞届と
なっていた食塩等の耐絶縁性を悪化する塩を含まないの
で、耐絶縁性等の電気特性に著しく優れており、さらに
、ポリマーの構造が実質的に直鎖状であるなどの理由に
よって、加工性にも優れたエンジニアリングプラスチッ
クであり、電子、電気分野、機械分野、塗料関係、自動
車、化学関係などの様々の分野・関係の機器部品、機械
部品、素材などとして好適に用いることができる。Polyarylene thioethers such as polyphenylene thioether obtained by the method of this invention have heat resistance,
It has excellent chemical resistance and various mechanical properties such as rigidity, strength, impact resistance, and abrasion resistance, and in particular, it does not contain salts that deteriorate insulation resistance, such as common salt, which has been reported in the past. It is an engineering plastic with outstanding electrical properties such as insulation resistance, and also has excellent processability due to the fact that the polymer structure is essentially linear. It can be suitably used as equipment parts, mechanical parts, materials, etc. in various fields and fields, such as coatings, automobiles, and chemicals.
以上のような方法によって、所望のポリマーを含む反応
混合物を得ることができる。A reaction mixture containing a desired polymer can be obtained by the method described above.
目的とするポリマーは、この反応混合物に様々な後処理
を施して、種々の純度で回収することができる。The desired polymer can be recovered in various purities by subjecting the reaction mixture to various post-treatments.
[発明の効果]
この発明によると、特定な原料モ、ツマ−および特定の
触媒を用いているので、反応条件が温和であり、製造方
法が簡便であり、かつ原料および触媒が安価であるなど
工業的に有利なポリアリーレンチオエーテル特に架橋度
が著しく低い実質的に直鎖状のポリアリーレンチオエー
テルの製造法を提供することができる。[Effects of the Invention] According to the present invention, since a specific raw material, a catalyst, and a specific catalyst are used, the reaction conditions are mild, the manufacturing method is simple, and the raw materials and catalyst are inexpensive. It is possible to provide an industrially advantageous method for producing polyarylene thioethers, particularly substantially linear polyarylenchioethers with a significantly low degree of crosslinking.
[実施例]
(実施例1)
チオフェノール2.18gをニトロメタン100 wi
nに溶解させ、ヨウ素4gを混合し、1時間後塩化アル
ミニウム10 gを混合して、24時間反応後。[Example] (Example 1) 2.18 g of thiophenol was added to 100 ml of nitromethane.
After 1 hour, 10 g of aluminum chloride was mixed and reacted for 24 hours.
反応液をメタノール中へ滴下しポリ(p−フェニレンチ
オエーテル)の沈澱を得た。得られた沈澱をアルカリ水
溶液で洗浄後、N−メチルピロリドンに溶解させ、メタ
ノール中で再沈し、精製ポリマーを得た。この精製ポリ
マーのg収率は85%融点は、113G−180℃であ
った。The reaction solution was dropped into methanol to obtain a precipitate of poly(p-phenylenethioether). The obtained precipitate was washed with an aqueous alkaline solution, dissolved in N-methylpyrrolidone, and reprecipitated in methanol to obtain a purified polymer. The purified polymer had a g yield of 85% and a melting point of 113G-180°C.
ポリマーの構造は次の測定結果より決定した。The structure of the polymer was determined from the following measurement results.
元’X分析(理iJMti) CB8.1%(88,8
)、H3,79!(3,7) 、 S 29.4
IRスペクトル )l、−、=3000.3050
cm−1、νc=c 1380.14130.1580
cm−’δc−H−820cm−’
X線回折 θ弓、5.10.5゜13C−NM
Rδ(phenyl G)−135ppmスペクトル
(実施例2)
2.6−ジニチルチオフエノール4.15gをニトロベ
ンゼンに溶解させ五塩化アンチモンを混合して0℃、3
日間反応させ、ポリ(2,6−ジエチル−1,4−フエ
ニレンチオエーテル)の粉末状沈澱を得た。この沈澱を
実施例1と同様にして精製し、精製ポリマー2.9g得
た。このポリマーのg収率は70%、融点は187〜1
82℃であり、VPO法より求めた数平均分子量は48
00であった。Original 'X Analysis (RiiJMti) CB8.1% (88,8
), H3,79! (3,7), S29.4 IR spectrum )l,-,=3000.3050
cm-1, νc=c 1380.14130.1580
cm-'δc-H-820cm-' X-ray diffraction θ bow, 5.10.5°13C-NM
Rδ (phenyl G) - 135 ppm spectrum (Example 2) 4.15 g of 2.6-dinitylthiophenol was dissolved in nitrobenzene, mixed with antimony pentachloride, and the mixture was heated at 0°C for 30 minutes.
The reaction was allowed to proceed for several days to obtain a powdery precipitate of poly(2,6-diethyl-1,4-phenylenethioether). This precipitate was purified in the same manner as in Example 1 to obtain 2.9 g of purified polymer. The g yield of this polymer is 70% and the melting point is 187-1
The temperature was 82°C, and the number average molecular weight determined by the VPO method was 48.
It was 00.
ポリマー構造は、IRスペクトル、元素分析。Polymer structure is determined by IR spectrum and elemental analysis.
l H−NMRにより確認した。Confirmed by lH-NMR.
IRスペクトル シc−H−2890,2945
,2980cm−1νc−〇−1380,1485cm
−1、δc−H=890cm−’
I H−NIP δ(−GHz
11)=1.25ppm。IR spectrum C-H-2890, 2945
,2980cm-1νc-〇-1380,1485cm
-1, δc-H=890cm-' I H-NIP δ(-GHz
11)=1.25ppm.
δC−CH2−4H)−2,70pp■δ (phen
yl 2H)=7.00ppm元素分析(理論値)
C71,5%(73,2)、 H7,91%(7,3)
、 S 19.44(19,5)(実施例3)
2−メチル−チオフェノール(12,4g)をジクロロ
メタン25騰見に溶解し、 TiC1a (30騰見
)および塩化チオニル(15mjL)を加え、20℃で
酸素存在下に1日間反応した0次いで、実施例1と同様
の操作により精製した粉末状ポリ(2−メチルフェニレ
ンチオエーテル) 8.49gを得た。ポリマー構造は
、次のデータにより確認した。δC-CH2-4H)-2,70pp ■δ (phen
yl 2H) = 7.00ppm elemental analysis (theoretical value)
C71,5% (73,2), H7,91% (7,3)
, S 19.44 (19,5) (Example 3) 2-Methyl-thiophenol (12,4 g) was dissolved in 25 g of dichloromethane, TiC1a (30 g) and thionyl chloride (15 mjL) were added, The reaction mixture was reacted for 1 day at 20° C. in the presence of oxygen. Then, 8.49 g of purified powdered poly(2-methylphenylenethioether) was obtained in the same manner as in Example 1. The polymer structure was confirmed by the following data.
IRスペクトル シc−n=2845. 291
0. 2950cm−’シ、、c−1375.1440
.1550cm−1δ 露870c+s−1
−HIR spectrum c-n=2845. 291
0. 2950cm-'shi,,c-1375.1440
.. 1550cm-1δ Dew 870c+s-1 -H
Claims (5)
、水素原子、低級アルキル基、ハロゲン原子および低級
アルコキシ基よりなる群から選択された置換基を表す。 なお、R^1〜R^4は、たがいに同じ種類であっても
異なった種類であってもよい。) で表されるチオフェノール類を、酸化剤の存在下、ルイ
ス酸触媒を用いて、重合することを特徴とするポリアリ
ーレンチオエーテルの製造法。(1) General formula [I] ▲Mathematical formulas, chemical formulas, tables, etc.▼[I] (However, in formula [I], R^1 to R^4 are hydrogen atoms, lower alkyl groups, and halogen atoms, respectively. and a lower alkoxy group. Note that R^1 to R^4 may be the same type or different types.) 1. A method for producing polyarylene thioether, which comprises polymerizing phenols using a Lewis acid catalyst in the presence of an oxidizing agent.
くは実質的に直鎖状のポリアリーレンチオエーテルであ
る前記特許請求の範囲第1項に記載のポリアリーレンチ
オエーテルの製造法。(2) The method for producing polyarylene thioether according to claim 1, wherein the polyarylene thioether is a linear or substantially linear polyarylene thioether.
II族、 I b〜VIb族の中から選らばれる少くとも1種
の元素のハロゲン化合物から成るルイス酸である前記特
許請求の範囲第1項または第2項に記載のポリアリーレ
ンチオエーテルの製造法。(3) The Lewis acid catalyst is selected from groups IIa to VIIa of the periodic table, and group VIIa of the periodic table.
The method for producing polyarylene thioether according to claim 1 or 2, which is a Lewis acid consisting of a halogen compound of at least one element selected from Group II and Groups Ib to VIb.
チタン、または五塩化アンチモンである前記特許請求の
範囲第1項から第3項までのいずれかに記載のポリアリ
ーレンチオエーテルの製造法。(4) The method for producing polyarylene thioether according to any one of claims 1 to 3, wherein the Lewis acid catalyst is aluminum chloride, titanium tetrachloride, or antimony pentachloride.
、酸化銅(II)、塩化鉄(III)の中よりなる群から選
ばれた1種または2種以上である前記特許請求の範囲第
1項から第5項までのいずれかに記載のポリアリーレン
チオエーテルの製造法。(5) The oxidizing agent is one or more selected from the group consisting of iodine, antimony pentachloride, oxygen, copper(II) oxide, and iron(III) chloride. A method for producing polyarylene thioether according to any one of Items 1 to 5.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62046075A JPH0657748B2 (en) | 1987-02-28 | 1987-02-28 | Method for producing polyary lentithioether |
US07/160,936 US4931542A (en) | 1987-02-28 | 1988-02-26 | Process for preparing a polyarylene thioether |
EP88102927A EP0281036A3 (en) | 1987-02-28 | 1988-02-26 | A process for preparing a polyarylene thioether |
US07/409,351 US4983720A (en) | 1987-02-28 | 1989-09-19 | Process for preparing a polyarylene thioether |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62046075A JPH0657748B2 (en) | 1987-02-28 | 1987-02-28 | Method for producing polyary lentithioether |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63213527A true JPS63213527A (en) | 1988-09-06 |
JPH0657748B2 JPH0657748B2 (en) | 1994-08-03 |
Family
ID=12736871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62046075A Expired - Lifetime JPH0657748B2 (en) | 1987-02-28 | 1987-02-28 | Method for producing polyary lentithioether |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0657748B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990006961A1 (en) * | 1988-12-22 | 1990-06-28 | Research Institute For Production Development | Production of polyarylene thioether |
JPH02212520A (en) * | 1989-02-13 | 1990-08-23 | Hidetoshi Tsuchida | Production of polyarylene thioether |
JP2017052834A (en) * | 2015-09-07 | 2017-03-16 | Jxエネルギー株式会社 | Molding material and method for producing the same, and optical member and method for producing the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58185626A (en) * | 1982-04-23 | 1983-10-29 | Asahi Glass Co Ltd | Production of polyarylene sulfide |
JPS5981334A (en) * | 1982-11-02 | 1984-05-11 | Asahi Glass Co Ltd | Production of polyarylene sulfide |
JPS61101534A (en) * | 1984-10-25 | 1986-05-20 | フイリツプス ペトロリユーム コンパニー | Production of polyarylene sulfide |
-
1987
- 1987-02-28 JP JP62046075A patent/JPH0657748B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58185626A (en) * | 1982-04-23 | 1983-10-29 | Asahi Glass Co Ltd | Production of polyarylene sulfide |
JPS5981334A (en) * | 1982-11-02 | 1984-05-11 | Asahi Glass Co Ltd | Production of polyarylene sulfide |
JPS61101534A (en) * | 1984-10-25 | 1986-05-20 | フイリツプス ペトロリユーム コンパニー | Production of polyarylene sulfide |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1990006961A1 (en) * | 1988-12-22 | 1990-06-28 | Research Institute For Production Development | Production of polyarylene thioether |
JPH02169626A (en) * | 1988-12-22 | 1990-06-29 | Res Inst For Prod Dev | Production of polyarylene thioether |
US5153305A (en) * | 1988-12-22 | 1992-10-06 | Research Institute For Production Development | Catalytic process for preparing polyarylene thioether |
US5290911A (en) * | 1988-12-22 | 1994-03-01 | Research Institute For Production Development | Process for preparing polyarylene thioether from thiophenol |
JPH02212520A (en) * | 1989-02-13 | 1990-08-23 | Hidetoshi Tsuchida | Production of polyarylene thioether |
JP2017052834A (en) * | 2015-09-07 | 2017-03-16 | Jxエネルギー株式会社 | Molding material and method for producing the same, and optical member and method for producing the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0657748B2 (en) | 1994-08-03 |
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