JPS63204676A - Highly repetitive excimer laser device - Google Patents
Highly repetitive excimer laser deviceInfo
- Publication number
- JPS63204676A JPS63204676A JP3564387A JP3564387A JPS63204676A JP S63204676 A JPS63204676 A JP S63204676A JP 3564387 A JP3564387 A JP 3564387A JP 3564387 A JP3564387 A JP 3564387A JP S63204676 A JPS63204676 A JP S63204676A
- Authority
- JP
- Japan
- Prior art keywords
- excimer laser
- laser device
- gas
- laser
- halogen gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003252 repetitive effect Effects 0.000 title abstract 4
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 19
- 150000002367 halogens Chemical class 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 229910000856 hastalloy Inorganic materials 0.000 claims abstract description 10
- 229910001026 inconel Inorganic materials 0.000 claims abstract description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 8
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 5
- 230000007797 corrosion Effects 0.000 claims abstract description 4
- 238000005260 corrosion Methods 0.000 claims abstract description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 39
- 230000010355 oscillation Effects 0.000 abstract description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 150000002739 metals Chemical class 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- -1 Mo and W Chemical class 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000004334 fluoridation Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
この発明は、高繰り返しエキシマレーザ−装置に関する
。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] The present invention relates to a high repetition rate excimer laser device.
（従来の技＃）
エキシマレーザ−は、従来のレーザーに比べて短波長で
あり、希ガスとハロゲンガスの組み合わせで約５ Ｑ
ｎｍととｌこ強いレーザー光が得られ、これら光の持つ
光子エネルギーは多くの物質の構成分子を切断し、原子
を遊離させたり、他の分子とごく短時間に高密度励起が
できるなどの特徴を持っている。これらの性質を利用し
て、種々の応用が考えられる。たとえば、化学分野では
光反応によって低温度で効率よく化学反応を行なわせた
り、次世代の半導体デバイス製造プロセスとして期待さ
れているレーザーＣＶＤ法も光化学反応を利用したもの
である。また、レーザ核融合やウラン濃縮の分野でもそ
の応用が期待されている。さらに、局所的に高温を発生
させることができることから高精度の熱加工の分野の研
究もさかんである。(Conventional technique #) Excimer laser has a shorter wavelength than conventional lasers, and uses a combination of rare gas and halogen gas to generate approximately 5 Q
Laser light as strong as 1 nm can be obtained, and the photon energy of this light can cut the constituent molecules of many substances, liberate atoms, and excite other molecules at high density in a very short time. It has characteristics. Various applications can be considered by utilizing these properties. For example, in the field of chemistry, photoreactions are used to efficiently carry out chemical reactions at low temperatures, and the laser CVD method, which is expected to be a next-generation semiconductor device manufacturing process, also utilizes photochemical reactions. Applications are also expected in the fields of laser nuclear fusion and uranium enrichment. Furthermore, since high temperatures can be generated locally, research in the field of high-precision thermal processing is also active.
ところで、エキシマレーザが汎用性の高い大出力レーザ
として広く応用されるには、レーザ発振の高繰り返し化
２よびガスの長寿化が不可欠である。高繰り返し化技術
に関しては、ガス循環技術。Incidentally, in order for the excimer laser to be widely applied as a versatile high-output laser, it is essential to increase the repetition rate of laser oscillation2 and to extend the life of the gas. Regarding high repetition rate technology, gas circulation technology.
繰り返し周波数が別オーダーに近づいている。The repetition frequency is approaching another order of magnitude.
一方、エキシマレーザの媒質ガスはＸｅ、Ｋｒ、Ａｒな
どの希ガスとＦｒ Ｃｌ 、 Ｂ ｒなどのハロゲンガ
スの混合気体である。ハロゲンガスは金属に対して非常
ｌこ腐食性の強いガスであり、周囲の金属と反応しハロ
ゲン化化物を形成することにより、媒質ガスの寿命短縮
の要因となっている。特にフッ素ガスは１気陰性度がす
べての原子の中で最も高く、他の原子と結びついてフッ
化物を形成する。これらフッ化物はレーザ発振を行わな
くとも時間経過とともに増加するが、連続的なレーザ発
振を行なう場合には発生する紫外線によりフッ化作用は
著しく促進される。このようなフッ化物の増大とともに
レーザ出力が徐々に低下する。同様なことがＣ１゜Ｂｒ
ガスを使用した場合にも発生し、エキシマレーザのエネ
ルギーコストの上昇の要因になり、実用化に際し非常に
大きな問題となっている。On the other hand, the medium gas of an excimer laser is a mixed gas of a rare gas such as Xe, Kr, or Ar and a halogen gas such as Fr Cl or Br. Halogen gas is highly corrosive to metals, and reacts with surrounding metals to form halides, thereby shortening the service life of the medium gas. In particular, fluorine gas has the highest 1-air negativity of all atoms, and combines with other atoms to form fluoride. These fluorides increase over time even without laser oscillation, but when continuous laser oscillation is performed, the fluoridation action is significantly accelerated by the generated ultraviolet rays. As the fluoride content increases, the laser output gradually decreases. The same thing is true for C1゜Br
It also occurs when gas is used, and becomes a factor in increasing the energy cost of excimer lasers, posing a very big problem in putting them into practical use.
（発明が解決しようとする問題点）
高繰り返しエキシマレーザ装置の媒質ガスは、Ｘｅ 、
Ｋｒ 、Ａｒなどの希ガスとＦ、（Ｊ、Ｂｒなどのハロ
ゲンガスとの混合気体である。ハロゲンガスは非常に腐
食性の強いガスであり、媒質ガスに触れる主放電用電極
、予備電離コンデンサー、熱交換器、ライシフローフ１
ン、ハロゲンガス配管、レーザ筐体はハロゲンガスと反
応し、ハロゲン化物を形成し、出力低下を招くと共にエ
キシマレーザのエネルギーコスト上昇の要因となる。(Problem to be solved by the invention) The medium gas of the high repetition excimer laser device is Xe,
It is a mixed gas of rare gases such as Kr and Ar and halogen gases such as F, (J and Br).Halogen gas is a highly corrosive gas and is used in main discharge electrodes and pre-ionization capacitors that come into contact with the medium gas. , heat exchanger, lysiflow 1
The halogen gas piping, halogen gas piping, and laser housing react with halogen gas to form halides, resulting in a decrease in output and an increase in the energy cost of excimer lasers.
そこで本発明では、媒質ガスの長寿命化により出力低下
を極力抑え、経済性の高い高繰り返しエキシマレーザを
提供することを目的とする。Therefore, an object of the present invention is to provide a highly economical, high-repetition excimer laser that minimizes the decrease in output by extending the life of the medium gas.
（問題点を解決するための手段）
高繰り返しエキシマレーザ装置の主放電用電極、予備電
離コンデンサー、熱交換器、ラインフローファン、ハロ
ゲンガス配管レーザ筐体は媒質ガス中のハロゲンガス（
Ｆ、ＣＪ、Ｂｒ）にさらされ、それらの構成材料である
純ニッケルあるいは鉄基合金とハロゲン化物を形成し、
媒質ガスの寿命の減少、レーザ出力め低下の原因となる
。一方、Ｍｏ、Ｗ。(Means for solving the problem) The main discharge electrode, pre-ionization condenser, heat exchanger, line flow fan, and halogen gas piping of the high-repetition excimer laser device are equipped with the halogen gas in the medium gas (
F, CJ, Br) to form halides with pure nickel or iron-based alloys that are their constituent materials,
This will shorten the life of the medium gas and cause a drop in laser output. On the other hand, Mo, W.
Ｐｔ、Ａｕなどの金属あるいはハステロイ、インコネル
などのニッケル基合金は、ハロゲンに対して高い耐食性
を有している。Metals such as Pt and Au or nickel-based alloys such as Hastelloy and Inconel have high corrosion resistance against halogens.
そこで、媒質ガスに触れる部品をＭｏ、Ｗ、 ハステ
ロイ、インコネルで構成することにより、ハロゲン化物
の生成によるハロゲンガスの消費Ｖ低く抑え、媒質ガス
の長寿命化を計ることができる。Therefore, by configuring the parts that come into contact with the medium gas with Mo, W, Hastelloy, or Inconel, it is possible to suppress the consumption V of halogen gas due to the production of halides and to extend the life of the medium gas.
さらにそれによりレーザ出力の低下の問題もかなり改善
される。また、高繰り返しエキシマレーザの平均出力は
媒質ガスのガス流速ｌこ大きく依存し繰り返し数が高い
程流速を早くする必要がある。Furthermore, the problem of laser power reduction is thereby considerably improved. Furthermore, the average output of a high-repetition excimer laser largely depends on the gas flow rate l of the medium gas, and the higher the repetition rate, the faster the flow rate needs to be.
したがって、高繰り返しエキシマレーザ装置の前述の部
品は腐食性の高速ガス流体中さらされるため耐食性ばか
りでなく、強度、耐摩耗性も要求される。ハステロイ、
インコネルなどのニッケル基合金およびＭＯＶなどの金
属は高強度でしかも耐摩耗性が良好であり、その点から
も有利である。Therefore, since the above-mentioned parts of a high-repetition excimer laser device are exposed to a corrosive high-speed gas fluid, they are required to have not only corrosion resistance but also strength and wear resistance. hastelloy,
Nickel-based alloys such as Inconel and metals such as MOV are advantageous in that they have high strength and good wear resistance.
また、Ｍｏ、Ｗ、Ｐｔ、Ａｕなどの金属あるいはハステ
ロイ、インコネルなどのニッケル基合金などを前述の部
品の表面にコーティングしても同様の効果が得られる。Further, similar effects can be obtained by coating the surface of the above-mentioned parts with metals such as Mo, W, Pt, and Au, or nickel-based alloys such as Hastelloy and Inconel.
コーティングの方法は真空蒸着。The coating method is vacuum deposition.
めっき、溶射スパッタリング、イオンブレーティングな
どいずれの方法でもよい。第１図は、表面に溶射により
Ｍｏをコーティングした主放電用電極を持った高繰り返
しエキシマレーザ装置の概略図を示す。コーティング層
がＭｏ、Ｗ、ハステロイ。Any method such as plating, thermal spray sputtering, or ion blasting may be used. FIG. 1 shows a schematic diagram of a high-repetition excimer laser device having a main discharge electrode whose surface is coated with Mo by thermal spraying. The coating layer is Mo, W, and Hastelloy.
インコネルなどの耐摩耗性が良好な金属あるいは合金で
ある場合は、電極自体の寿命の向上にも有効である。If the electrode is made of a metal or alloy with good wear resistance, such as Inconel, it is effective in improving the life of the electrode itself.
（作用）
本発明の高繰り返しエキシマレーザ装置において、媒質
ガスに触れる主放電用電極、予備ｉ！離コンデンサー、
熱交換器、ライシフローフ１ン、ハロゲンガス配管、レ
ーザ筺体をＭｏ、Ｗなどの金属またはハステロイ、イン
コネルなどの合金で構成するか、あるいは前述の部品の
表面にＭｏ、Ｗ、Ｐｔ。(Function) In the high repetition excimer laser device of the present invention, the main discharge electrode, the preliminary i! separate condenser,
The heat exchanger, lysiflow oven, halogen gas piping, and laser housing are made of metals such as Mo and W, or alloys such as Hastelloy and Inconel, or the surfaces of the aforementioned parts are coated with Mo, W, and Pt.
Ａｕなどの金属、またはハステロイ、インコネルなどの
合金をコーティングすることＥこよりレーザ出力低下を
極力抑え、経済性の高い高繰り返しエキシマレーザを提
供することができる。By coating with a metal such as Au or an alloy such as Hastelloy or Inconel, it is possible to suppress a decrease in laser output as much as possible and provide a highly economical high-repetition excimer laser.
（実施例）
繰り返し数５ｏｏ）ｉｚ の高繰り返しエキシマレーレ
ーザ装置を試作し、媒質ガスとしてＫｒ−Ｆガスを用い
て、ニッケル製電極に４ＱｋＶの陽性電極電圧をかけた
ところ、波長２４９１ｍのエキシマレーザを発振した。(Example) A high-repetition excimer laser device with a repetition rate of 5oo)iz was prototyped, and when a positive electrode voltage of 4QkV was applied to a nickel electrode using Kr-F gas as a medium gas, an excimer laser with a wavelength of 2491 m was produced. oscillated.
レーザ発振回数１．０Ｘ１０シ１ット時のレーザ出＾期
出力の約６０％であ−た。この装置の５Ｏ８３０４裂筐
体内面およびニッケル製電極の表面に溶射により約１０
０μｍのＭｏコーティング層を形成し、同じ条件でエキ
シマレーザを発振させた。レーザ発振回数１．０Ｘ１０
ンーット時のレーザ出力は初期出力の約７５ｔｓで
あり、レーザ筐体内面電極へのＭｏコーティング層の形
成によりレーザ出力低下の問題がかなり改善されること
を確認した。The output was approximately 60% of the initial laser output when the number of laser oscillations was 1.0×10 shots. Approximately 10
A 0 μm Mo coating layer was formed, and an excimer laser was oscillated under the same conditions. Number of laser oscillations 1.0X10
The laser output at the time of operation was approximately 75 ts of the initial output, and it was confirmed that the problem of laser output reduction was considerably improved by forming a Mo coating layer on the inner electrode of the laser casing.
本発明によれば、従来よりも繰り返し発振によるレーザ
出力の低下が起こりにくり、経済性の高い高繰り返しエ
キシマレーザ装置を提供することができる。According to the present invention, a reduction in laser output due to repeated oscillation is less likely to occur than in the past, and it is possible to provide a high-repetition excimer laser device that is highly economical.
第１図は、主放電用電極表面にＭｏコーティングした高
繰り返しエキシマレーザ装置の概略図である。
１・・・高電圧電源、２・・・陽極、３・・・＠極、４
・・・レーザ筐体、５・・Ｍｏコーティング層。FIG. 1 is a schematic diagram of a high repetition excimer laser device in which the surface of the main discharge electrode is coated with Mo. 1...High voltage power supply, 2...Anode, 3...@pole, 4
...Laser housing, 5...Mo coating layer.
Claims (1)
予備電離コンデンサー、熱交換器、ラインフローファン
、ハロゲンガス配管、レーザ筐体などハロゲンガスに触
れる部品の少なくとも表面がＭｏ、Ｗ、Ｐｔ、Ａｕ、ハ
ステロイ、インコネルなどのハロゲンガスに対して耐食
性の良好な金属又は合金で構成されたことを特徴とする
高繰り返しエキシマレーザー装置。1) Main discharge electrode of high repetition excimer laser device,
At least the surface of parts that come into contact with halogen gas, such as pre-ionization condensers, heat exchangers, line flow fans, halogen gas piping, and laser casings, has good corrosion resistance against halogen gases such as Mo, W, Pt, Au, Hastelloy, and Inconel. A high repetition rate excimer laser device characterized by being made of a metal or alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3564387A JPS63204676A (en) | 1987-02-20 | 1987-02-20 | Highly repetitive excimer laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3564387A JPS63204676A (en) | 1987-02-20 | 1987-02-20 | Highly repetitive excimer laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63204676A true JPS63204676A (en) | 1988-08-24 |
Family
ID=12447552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3564387A Pending JPS63204676A (en) | 1987-02-20 | 1987-02-20 | Highly repetitive excimer laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63204676A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4007309A1 (en) * | 1990-03-08 | 1990-10-25 | Wolfgang Dr Mueckenheim | Excimer laser discharge components - made of or coated with precious metals |
| DE3920634A1 (en) * | 1989-06-23 | 1991-01-10 | Lambda Physik Forschung | Ignition electrode for gas lasers - contains metal of platinum gp. in ignition area to increase its working life |
| US5220575A (en) * | 1989-04-04 | 1993-06-15 | Doduco Gmbh + Dr. Eugen Durrwachter | Electrode for pulsed gas lasers |
-
1987
- 1987-02-20 JP JP3564387A patent/JPS63204676A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5220575A (en) * | 1989-04-04 | 1993-06-15 | Doduco Gmbh + Dr. Eugen Durrwachter | Electrode for pulsed gas lasers |
| DE3920634A1 (en) * | 1989-06-23 | 1991-01-10 | Lambda Physik Forschung | Ignition electrode for gas lasers - contains metal of platinum gp. in ignition area to increase its working life |
| DE4007309A1 (en) * | 1990-03-08 | 1990-10-25 | Wolfgang Dr Mueckenheim | Excimer laser discharge components - made of or coated with precious metals |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9903040B2 (en) | Method for stripping nitride coatings | |
| JP4807889B2 (en) | Gas laser electrode, laser chamber and gas laser device using the electrode | |
| JPS63204676A (en) | Highly repetitive excimer laser device | |
| Borisov et al. | High-power, highly stable KrF laser with a pulse repetition rate | |
| Dong et al. | A Cr4+: YAG passively Q-switched Nd: YVO4 microchip laser for controllable high-order Hermite–Gaussian modes | |
| JP4367886B2 (en) | Gas laser device | |
| Nada et al. | Pulsed Solid State Laser Systems Using ABCD Matrix Method: A Review. | |
| Borisov et al. | Prototype of a high-power, high-energy industrial XeCl laser | |
| Bokhan et al. | Copper bromide vapour laser excited by an electron beam | |
| US7190708B2 (en) | Annealed copper alloy electrodes for fluorine containing gas discharge lasers | |
| JP2590087B2 (en) | Heat exchanger fin for excimer laser | |
| JP4068944B2 (en) | Manufacturing method of main discharge electrode | |
| JP2590086B2 (en) | Blower fin for excimer laser | |
| Bai et al. | GTR-KTP enhanced stable intracavity frequency doubled Cr, Nd: YAG self-Q-switched green laser | |
| Malatji et al. | Modupeola Dada, Patricia Popoola, Ntombizodwa Mathe, Samson Adeosun, Sisa Pityana, Olufemi Aramide | |
| Briquet et al. | Generation of a monomode giant pulse laser by coherent pumping | |
| JP3216440B2 (en) | Apparatus and method for producing alloy thick film having hydrogen storage capacity | |
| JPH02187085A (en) | Excimer laser device | |
| NADA et al. | Theoretical Study of Thermal Lens Effect in Q-switched. | |
| Sercel | Matrix Overview Of Medium To High Power CO [sub] 2 [/sub] Lasers | |
| JPH03120770A (en) | Gas laser device | |
| JPS6062171A (en) | Laser oscillator | |
| JPS63229870A (en) | High gas pressure laser device | |
| JPS63204678A (en) | Excimer laser tube | |
| JPS6038893A (en) | Laser oscillator |