JPS63193832A - Boron-nitride coated film - Google Patents
Boron-nitride coated filmInfo
- Publication number
- JPS63193832A JPS63193832A JP2522787A JP2522787A JPS63193832A JP S63193832 A JPS63193832 A JP S63193832A JP 2522787 A JP2522787 A JP 2522787A JP 2522787 A JP2522787 A JP 2522787A JP S63193832 A JPS63193832 A JP S63193832A
- Authority
- JP
- Japan
- Prior art keywords
- boron nitride
- film
- boron
- present
- coating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052582 BN Inorganic materials 0.000 title claims description 20
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims description 20
- 238000000576 coating method Methods 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 21
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000005422 blasting Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は、機械部品、切削工具等に用いられる窒化ボロ
ンコーティング皮膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a boron nitride coating film used for machine parts, cutting tools, etc.
［従来の技術］
従来、第６図の金属の被覆基材（例えば５ＫＨ５５から
なる）１に窒化ボロン皮膜（膜厚は３μｍで、硬度はＨ
ｖ ４０００）をコーティングするに際しては、基材１
の表面と窒化ボロンの付着力を向上させるために、先ず
基材１の表面にＡｒプラズマ洗浄により基材１の表面の
不純物分子、不動態層を除去した後、各種の真空蒸着法
により、窒化ボロンのコーティングを行なっている。[Prior Art] Conventionally, a boron nitride film (film thickness: 3 μm, hardness: H
v 4000), the base material 1
In order to improve the adhesion between the surface of the substrate 1 and the boron nitride, first, impurity molecules and a passive layer on the surface of the substrate 1 are removed by Ar plasma cleaning. It is coated with boron.
［発明が解決しようとする問題点１
上記窒化ボロン皮膜は、その結晶ＭＩ４造が六方晶形を
とる場合は、潤滑性を有し、また立方晶形をとるときは
、ダイヤモンドに次ぐ硬さをもつため、各機械部品、切
削工具へのコーティングが行なわれようしている。しか
し、上記窒化ボロンは金属との親和力が低く、皮膜をコ
ーティングした場合には、容易に剥離し、これに対する
改善が望まれていた。[Problem to be solved by the invention 1 The above-mentioned boron nitride film has lubricating properties when its crystal MI4 structure is in a hexagonal crystal form, and has hardness second only to diamond when it is in a cubic crystal form. , coatings are being applied to various machine parts and cutting tools. However, boron nitride has a low affinity with metals, and when coated with a film, it easily peels off, and improvements to this problem have been desired.
そこで、本発明は窒化ボロンとの親和力がよくなり、皮
膜の付着力が向上する窒化ボロンコーティング皮膜を提
供することを目的とする。Therefore, an object of the present invention is to provide a boron nitride coating film that has good affinity with boron nitride and improves the adhesion of the film.
［問題点を解決するための手段］
上記目的を達成するため本発明は、窒化ボロンと被覆基
材との間に、窒化チタンの結合層を介在させたことを特
徴とするものである。[Means for Solving the Problems] In order to achieve the above object, the present invention is characterized in that a bonding layer of titanium nitride is interposed between the boron nitride and the coating substrate.
［作用１
上記のように栴成することにより、窒化チタンの結合層
は熱膨玉係数の差がないため、窒化チタンの結合層と窒
化ボロンの親和力がよくなり、皮膜の付着力が向上する
。[Effect 1] By forming the titanium nitride bond layer as described above, there is no difference in thermal expansion coefficient, so the affinity between the titanium nitride bond layer and boron nitride is improved, and the adhesion of the film is improved. .
［実施例１
以下、本発明について図面を参照して説明する。第１図
は本発明による窒化ボロンコーティング皮膜の断面図で
、１は例えば５ＫＨ５５からなる基材である。２はイオ
ンブレーティング法又はスパッタリング法により形成し
た窒化チタン皮膜であり、この窒化チタン皮膜２の膜厚
は０．５μｍで、硬度はＨＶ１９６０である。３はイオ
ンブレーティング法又はスパッタリング法により形成し
た窒化ボロン皮膜であり、膜厚は３μ乳で、硬度はＨｖ
４０００である。[Example 1] Hereinafter, the present invention will be described with reference to the drawings. FIG. 1 is a sectional view of a boron nitride coating film according to the present invention, and 1 is a base material made of, for example, 5KH55. 2 is a titanium nitride film formed by an ion blasting method or a sputtering method, and this titanium nitride film 2 has a thickness of 0.5 μm and a hardness of HV1960. 3 is a boron nitride film formed by the ion blasting method or sputtering method, the film thickness is 3μ, and the hardness is Hv.
It is 4000.
第２図は上記イオンオペレーティング法によるコーティ
ング皮膜と従来のコーティング皮膜との皮膜の付着力（
臨界荷重）を評価した結果であり、第３図はイオンブレ
ーティング法におけるコーティング条件を示し、また第
４図は上記スパッタ法によるコーティング皮膜と従来の
コーティング皮膜の付着力を評価した結果であり、第５
図はスパッタ法のコーティング条件を示している。Figure 2 shows the adhesion force (
Figure 3 shows the coating conditions in the ion blating method, and Figure 4 shows the results of evaluating the adhesion between the sputtering coating film and the conventional coating film. Fifth
The figure shows the coating conditions of the sputtering method.
この場合、スクラッチテストより評価した。この方法は
、皮膜にダイヤモンドポイントを当て荷重を増しながら
スキャンし、その結果、剥離した荷重をＡＥ（アコース
チックエミッション）信号より求め、これを臨界荷重と
し、付着力の目安としものである。In this case, evaluation was made using a scratch test. In this method, a diamond point is applied to the film and scanned while increasing the load, and as a result, the peeled load is determined from the AE (acoustic emission) signal, and this is taken as the critical load and used as a measure of the adhesion force.
この結果、本発明のものは従来のものに比べてｆＪＷ力
の向上が確認できた。これは、ＣＶＤ （化学気相成長
）法の場合も同等の結果が得られた。As a result, it was confirmed that the fJW force of the present invention was improved compared to the conventional one. Similar results were obtained in the case of CVD (chemical vapor deposition).
本発明のコーティング条件としては、イオンブレーティ
ング法およびスパッタ法共に、ペルジャー内を５ Ｘ
１０’ ＴＯｒｒ以下に真空排気した後に、Ａｒガスを
導入し、基材１の表面をエツチングあるいはボンバード
を行なった後に、窒化チタン皮膜２をコーティングし、
この窒化チタン皮膜２の上に窒化ボロン皮膜３をコーテ
ィングしたものである。The coating conditions of the present invention are as follows: 5×
After evacuation to 10' TOrr or less, Ar gas is introduced and the surface of the base material 1 is etched or bombarded, and then a titanium nitride film 2 is coated.
This titanium nitride film 2 is coated with a boron nitride film 3.
［発明の効果］
以上述べた本発明によれば、窒化ボロンと被覆基材との
間に、窒化チタンの結合層を介在させたので、窒化ボロ
ンとの親和性が向上し、付着力が向上する窒化ボロンコ
ーティング皮膜を提供できる。[Effects of the Invention] According to the present invention described above, since a bonding layer of titanium nitride is interposed between boron nitride and the coating base material, affinity with boron nitride is improved and adhesion strength is improved. A boron nitride coating film can be provided.
第１図は本発明による窒化ボロンコーティング皮膜の断
面図、第２図は本発明に用いたイオンオペレーティング
法によるコーティング皮膜と従来のコーティング皮膜と
の皮膜の付着力（臨界荷重）を評価した結果を示す図、
第３図はイオンブレーティング法におけるコーティング
条件を示す図、第４図は本発明に用（Ｘだスパッタ法に
よるコーティング皮膜と従来のコーティング皮膜の付着
力を評価した結果をを示す図、第５図はスパッタ法のコ
ーティング条件を示す図、第６図は従来のコーティング
皮膜の断面図である。
１・・・基材、２・・・窒化チタン皮膜、３・・・窒化
ボロン皮膜。
出願人代理人 弁理士 鈴江 武彦
第２図Fig. 1 is a cross-sectional view of the boron nitride coating film according to the present invention, and Fig. 2 shows the results of evaluating the adhesion force (critical load) between the coating film formed by the ion operating method used in the present invention and the conventional coating film. The figure shown,
Figure 3 is a diagram showing the coating conditions in the ion blasting method, Figure 4 is a diagram showing the results of evaluating the adhesion between the coating film by the X sputtering method and the conventional coating film used in the present invention. The figure shows the coating conditions of the sputtering method, and Figure 6 is a cross-sectional view of a conventional coating film. 1... Base material, 2... Titanium nitride film, 3... Boron nitride film. Applicant Agent Patent Attorney Takehiko Suzue Figure 2
Claims (1)
介在させたことを特徴とする窒化ボロンコーティング皮
膜。A boron nitride coating film characterized in that a bonding layer of titanium nitride is interposed between boron nitride and a coating base material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2522787A JPS63193832A (en) | 1987-02-05 | 1987-02-05 | Boron-nitride coated film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2522787A JPS63193832A (en) | 1987-02-05 | 1987-02-05 | Boron-nitride coated film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63193832A true JPS63193832A (en) | 1988-08-11 |
Family
ID=12160082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2522787A Pending JPS63193832A (en) | 1987-02-05 | 1987-02-05 | Boron-nitride coated film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63193832A (en) |
-
1987
- 1987-02-05 JP JP2522787A patent/JPS63193832A/en active Pending
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