JPS63185871A - Manufacture of inorganic layered porous body - Google Patents
Manufacture of inorganic layered porous bodyInfo
- Publication number
- JPS63185871A JPS63185871A JP30674886A JP30674886A JPS63185871A JP S63185871 A JPS63185871 A JP S63185871A JP 30674886 A JP30674886 A JP 30674886A JP 30674886 A JP30674886 A JP 30674886A JP S63185871 A JPS63185871 A JP S63185871A
- Authority
- JP
- Japan
- Prior art keywords
- inorganic
- compound
- compounds
- layered porous
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 44
- 229910010272 inorganic material Inorganic materials 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000011148 porous material Substances 0.000 claims description 20
- 150000002484 inorganic compounds Chemical class 0.000 claims description 14
- 239000002280 amphoteric surfactant Substances 0.000 claims description 13
- -1 cationic inorganic compound Chemical class 0.000 claims description 9
- 229910052901 montmorillonite Inorganic materials 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 230000008961 swelling Effects 0.000 claims description 7
- 239000004927 clay Substances 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims description 3
- 229910021647 smectite Inorganic materials 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- 239000005749 Copper compound Substances 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000002091 cationic group Chemical group 0.000 claims description 2
- 150000001845 chromium compounds Chemical class 0.000 claims description 2
- 150000001880 copper compounds Chemical class 0.000 claims description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical group OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 2
- 229910000271 hectorite Inorganic materials 0.000 claims description 2
- 150000002816 nickel compounds Chemical class 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 125000001174 sulfone group Chemical group 0.000 claims description 2
- 150000003752 zinc compounds Chemical class 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims 1
- 125000000129 anionic group Chemical group 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 150000002697 manganese compounds Chemical class 0.000 claims 1
- 238000012986 modification Methods 0.000 claims 1
- 230000004048 modification Effects 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000011800 void material Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000000376 reactant Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 230000002687 intercalation Effects 0.000 description 3
- 238000009830 intercalation Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000004438 BET method Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920003169 water-soluble polymer Polymers 0.000 description 2
- GSNUFIFRDBKVIE-UHFFFAOYSA-N DMF Natural products CC1=CC=C(C)O1 GSNUFIFRDBKVIE-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical group 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical group 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 150000002363 hafnium compounds Chemical class 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000006713 insertion reaction Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔技術分野〕
この発明は、断熱性に優れた無機層状多孔体の製法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for producing an inorganic layered porous material having excellent heat insulation properties.
空隙を有する層状化合物として、膨潤性層状化合物の層
間に水酸化物等の異種物質を挿入反応させたインターカ
レーション物質がある(たとえば、特開昭54−588
4号公報および特開昭54−16386号公報参照)。As a layered compound having voids, there is an intercalation material in which a different substance such as hydroxide is inserted between the layers of a swellable layered compound (for example, Japanese Patent Application Laid-Open No. 54-588
4 and JP-A-54-16386).
ところが、このものは、層間距離が10Å以下と小さい
ため、吸着水の影響を受けやすく、また、断熱性の点で
もあまり優れているとは言えないものである。However, since this material has a small interlayer distance of 10 Å or less, it is susceptible to the effects of adsorbed water, and it cannot be said to be very good in terms of heat insulation.
これに対し、微細多孔質粘土材料として、スメクタイト
型鉱物に水溶性高分子化合物を混合したものを使用し、
それに、陽イオン性酸化物あるいは重合体状シリカをイ
ンターカレーションすることが、特開昭60−1318
78号公報、特開昭60−137812号公報、特開昭
60−137813号公報、特開昭60−155526
号公報、ならびに、特開昭60−166217号公報等
に示されている。これらの方法によれば、層間距離を前
述のインターカレーション物質0場合の10Å以下から
、30人程度にまで拡げることができる。しかしながら
、この方法によって形成された層状多孔体では、前述し
たように層間距離を30人程度にまで拡げることができ
ても、その空隙内に水分が吸着されやすいため、この水
分の吸着による各層間の熱的な短絡が発生することが避
けられず、熱物性の向上が期待できない。In contrast, we used a mixture of smectite minerals and water-soluble polymer compounds as microporous clay materials.
In addition, intercalation of cationic oxide or polymeric silica has been proposed in JP-A-60-1318.
78, JP 60-137812, JP 60-137813, JP 60-155526
No. 60-166217, etc. According to these methods, the interlayer distance can be increased from the above-mentioned 10 Å or less in the case of no intercalation material to about 30. However, in the layered porous body formed by this method, even if the interlayer distance can be increased to about 30 people as described above, moisture is likely to be adsorbed within the pores. It is unavoidable that a thermal short circuit will occur, and no improvement in thermophysical properties can be expected.
この発明は、このような事情に鑑みてなされたものであ
って、層間に比較的大きな空隙を有し、断熱効果に優れ
た無機層状多孔体を製造する方法を提供することを目的
としている。The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for manufacturing an inorganic layered porous body having relatively large voids between layers and having an excellent heat insulating effect.
以上の目的を達成するため、この発明は、膨潤性層状化
合物を膨潤させて、その層間に無機ピラーを挿入すると
ともに、両性界面活性剤をもこの層間に挿入し、乾燥を
行って前記層間に微細な空隙を形成する無機層状多孔体
の製法を要旨としている。In order to achieve the above object, the present invention swells a swellable layered compound, inserts an inorganic pillar between the layers, and also inserts an amphoteric surfactant between the layers, and then dries the compound and inserts an inorganic pillar between the layers. The gist of this paper is a method for producing inorganic layered porous materials that form fine voids.
以下に、この発明を、その1実施例をあられす図面を参
照しつつ詳しく説明する。Hereinafter, one embodiment of the present invention will be described in detail with reference to the accompanying drawings.
構造を模式化してあられした第1図にみるように、この
発明の無機層状多孔体の製法によって得られる無機層状
多孔体Aは、無機層状化合物の層1.1間に、無機化合
物2が挿入固定されている。そのため、その層間の空隙
3が30〜600人に保持されている。As shown in FIG. 1, which schematically shows the structure, the inorganic layered porous material A obtained by the method for producing an inorganic layered porous material of the present invention has an inorganic compound 2 inserted between the layers 1.1 of the inorganic layered compound. Fixed. Therefore, the gap 3 between the layers is maintained between 30 and 600 people.
膨潤性層状化合物としては、Na−モンモリロナイF
+ Ca−モンモリロナイト、酸性白土、3−八面体合
成スメクタイト、 Na−ヘクトライト、Li−ヘクト
ライト、 Na−テニオライトLi−テニオライト、お
よび、合成雲母(Naフッ素素子ケイ素雲母等が挙げら
れるが、膨潤性層状化合物でありさえすれば、これらに
限られるものではない。Ca −モンモリロナイトおよ
び酸性白土等のような膨潤性層状化合物を主材として用
いる場合には、強い剪断力を加えないと膨潤しにくいの
で、膨潤時には混錬する必要がある。As the swelling layered compound, Na-montmorillonite F
+ Ca-montmorillonite, acid clay, 3-octahedral synthetic smectite, Na-hectorite, Li-hectite, Na-teniolite, Li-teniolite, and synthetic mica (Na-fluorine element silicon mica, etc.), but swelling It is not limited to these as long as it is a layered compound.When using a swelling layered compound such as Ca-montmorillonite and acid clay as the main material, it is difficult to swell unless strong shearing force is applied. , it is necessary to knead during swelling.
膨潤性層状化合物の層間に挿入される無機ピラーとして
は、金属アルコラート(以下、[金属アルコラートAJ
と記す)を加水分解してなる重合物およびコロイド状無
機化合物のうちの少なくとも一方が用いられる。As the inorganic pillar inserted between the layers of the swellable layered compound, metal alcoholate (hereinafter referred to as [metal alcoholate AJ
At least one of a colloidal inorganic compound and a polymer obtained by hydrolyzing .
金属アルコラートAとしては、5t(OR)4゜A 1
(OR)3. T i(0R)4. Z r (
OR)イおよび、G e (OR)aなどが挙げられ、
これらが単独で、あるいは、複数混合して用いられる。As metal alcoholate A, 5t (OR) 4゜A 1
(OR)3. T i (0R)4. Z r (
OR) i and G e (OR) a, etc.
These may be used alone or in combination.
このような金属アルコラートAは、前記加水分解によっ
て金属−酸素結合を主鎖とする重合体となり、それが、
前記無機ピラーとなるのである。Such metal alcoholate A becomes a polymer having a metal-oxygen bond as the main chain by the hydrolysis, and it becomes a polymer having a metal-oxygen bond as the main chain.
This becomes the inorganic pillar.
以上のような金属アルコラートAとしては、たとえば、
以下のような化合物があるが、これ以外のものを使用す
ることもできる。Examples of the above metal alcoholate A include:
The following compounds are available, but other compounds can also be used.
S 1(OCzHs)4.S i(’0CHs)4*
Ge(OCzHy)4.Ge(OCtHS)a。S 1 (OCzHs)4. S i('0CHs)4*
Ge(OCzHy)4. Ge(OCtHS)a.
コロイド状無機化合物としては、特に限定されないが、
熱的に安定な酸化物や、加熱することにより膨張するも
のが好ましい。このような化合物トシテは、たとえば、
SiO2,5bzC)+ 、FezO5、A1zO3,
Ti0t、5notおよび、ZrO2などが挙げられ、
これらが単独で、あるいは、複数混合して用いられる。Colloidal inorganic compounds are not particularly limited, but include:
A thermally stable oxide or one that expands when heated is preferred. Such compounds include, for example,
SiO2,5bzC)+ , FezO5, A1zO3,
Examples include Ti0t, 5not and ZrO2,
These may be used alone or in combination.
このようなコロイド状無機化合物の粒径も、この発明で
は、特に限定されないが、50〜150人程度の粒程度
あることが好ましい。Although the particle size of such a colloidal inorganic compound is not particularly limited in the present invention, it is preferably about 50 to 150 particles.
以上のような無機ピラーは、そのままで膨潤性層状化合
物の層間に挿入されてもよいが、その表面が陽イオン性
無機化合物および、前記金属アルコラートAとは別の金
属アルコラート(以下、「金属アルコラートB」と記す
)のうちの少なくとも一方で修飾されてから、前記層間
に挿入されるようであってもよい。The above-mentioned inorganic pillars may be inserted as they are between the layers of the swellable layered compound, but the surface of the inorganic pillars is a cationic inorganic compound and a metal alcoholate other than the metal alcoholate A (hereinafter referred to as "metal alcoholate"). B) may be modified and then inserted between the layers.
無機ピラーの表面を修飾するために用いられる陽イオン
性無機化合物としては、チタン系化合物、ジルコニウム
系化合物、ハフニウム系化合物2鉄系化合物、銅系化合
物、クロム系化合物、ニッケル系化合物、亜鉛系化合物
、アルミニウム系化合物、マンガン系化合物、リン系化
合物、ホウ素系化合物等が挙げられる。このような陽イ
オン系無機化合物としては、TiCl4等の金属塩化物
やZ r OCl z等の金属オキシ塩化物、あるいは
硝酸塩化合物等があるが、それ以外のものを使用するこ
ともできる。Cationic inorganic compounds used to modify the surface of inorganic pillars include titanium compounds, zirconium compounds, hafnium compounds, diiron compounds, copper compounds, chromium compounds, nickel compounds, and zinc compounds. , aluminum-based compounds, manganese-based compounds, phosphorus-based compounds, boron-based compounds, and the like. Examples of such cationic inorganic compounds include metal chlorides such as TiCl4, metal oxychlorides such as Z r OCl z, and nitrate compounds, but other compounds may also be used.
また、同じ用途に用いられる金属アルコラートBとして
は、T i (OR)4. Z r (OR)−、P
O(OR) 3. A I (OR)3、および、B
(OR)3等が挙げられる。そして、これらが単独で
、あるいは、複数混合して用いられる。Further, as metal alcoholate B used for the same purpose, T i (OR) 4. Z r (OR)-, P
O(OR) 3. A I (OR)3, and B
(OR)3 etc. are mentioned. These may be used alone or in combination.
以上のような金属アルコラートBとしては、たとえば、
以下のような化合物があるが、それ以外のものを使用す
ることもできる。Examples of the above-mentioned metal alcoholate B include:
The following compounds are available, but other compounds can also be used.
Ti(OC3Ht)n 、Zr(OCaHt)a 、P
O(OCH3)4 、PO(OCzHsLs 、B(O
CHi)4゜B(OCzHs)4゜
以上のような無機ピラーとともに、前記膨潤性層状化合
物の層1.1間に挿入される両性界面活性剤としては、
種々のものが考えられるが、たとえば、以下のような基
を有するものが、この発明に好ましいものとしてあげら
れる。Ti(OC3Ht)n, Zr(OCaHt)a, P
O(OCH3)4, PO(OCzHsLs, B(O
The amphoteric surfactant inserted between the layer 1.1 of the swellable layered compound together with an inorganic pillar such as CHi)4°B(OCzHs)4° or more,
Although various types can be considered, for example, those having the following groups are preferred for this invention.
陽イオン部:脂肪族アミン型
陰イオン部:カルボキシル基、硫酸エステル基、スルホ
ン基、および、リン酸エステル基からなる群より選ばれ
た少なくとも1つ。Cation part: Aliphatic amine type Anion part: At least one selected from the group consisting of carboxyl group, sulfate ester group, sulfone group, and phosphate ester group.
また、この発明では、以上のような両性界面活性剤以外
の有機ピラーを層1.1間に挿入することもできる。Further, in the present invention, organic pillars other than the amphoteric surfactant described above can also be inserted between the layers 1.1.
つぎに、この発明の無機層状多孔体の製法について、そ
の1実施例を模式化して表した図面にもとづいて、詳し
く説明する。Next, a method for producing an inorganic layered porous body according to the present invention will be explained in detail based on drawings schematically showing one embodiment thereof.
膨潤性粘土鉱物のような物質は、第2図に示すように、
膨潤性層状化合物A+の集まりでできている。主材たる
この化合物Atを水などの溶媒と混合(必要に応じて混
錬)して、第3図にみるように、層1.1間に溶媒4を
含ませて、あらかじめ、膨潤させてお(。溶媒としては
、一般に水が用いられるが、それ以外の極性溶媒、たと
えば、メタノール、DMF、DMSO等を単独で、ある
いは、複数混合して用いるようにしてもかまわない。Substances such as swellable clay minerals, as shown in Figure 2,
It is made up of a collection of swellable layered compounds A+. This compound At, which is the main material, is mixed with a solvent such as water (kneaded if necessary), and as shown in Figure 3, the solvent 4 is impregnated between the layers 1 and 1 to swell it in advance. Water is generally used as the solvent, but other polar solvents such as methanol, DMF, DMSO, etc. may be used alone or in combination.
つぎに、無機ピラー21として、金属アルコラートAの
重合物を使用する場合には、金属アルコラートAにエタ
ノール、イソプロパツール等の溶媒を加えて溶解し、こ
れに水と塩酸等の反応触媒(加水分解触媒)を加えて混
合し、加水分解反応させる。この加水分解反応は、特に
限定されないが、70℃前後の温度で行うことが好まし
い。また、このような無機ピラー21の加水分解反応が
ある程度進行し、核が成長した段階で、この反応液中に
金属アルコラートBまたは陽イオン性無機化合物を加え
、これらの化合物を前記核の表面に付加反応させれば、
第4図(b)にみるように、その表面がプラスにチャー
ジした反応物21′が得られる。Next, when using a polymer of metal alcoholate A as the inorganic pillar 21, a solvent such as ethanol or isopropanol is added to metal alcoholate A to dissolve it, and water and a reaction catalyst such as hydrochloric acid (hydrated Decomposition catalyst) is added and mixed to cause a hydrolysis reaction. This hydrolysis reaction is preferably carried out at a temperature of about 70°C, although it is not particularly limited. Further, when the hydrolysis reaction of the inorganic pillar 21 has progressed to a certain extent and the nucleus has grown, metal alcoholate B or a cationic inorganic compound is added to the reaction solution, and these compounds are applied to the surface of the nucleus. If you make an addition reaction,
As shown in FIG. 4(b), a reactant 21' whose surface is positively charged is obtained.
無機ピラー21として、コロイド状無機化合物を使用す
る場合には、そのままで使用してもよいし、あるいは、
このコロイド状無機化合物の分散液中に、前記金属アル
コラートBまたは陽イオン性無機化合物を加え、これら
の化合物を先の場合と同様に、前記無機ピラー21の表
面に付加反応させて、同様に反応物21゛を得る。When using a colloidal inorganic compound as the inorganic pillar 21, it may be used as is, or
The metal alcoholate B or the cationic inorganic compound is added to the dispersion of the colloidal inorganic compound, and these compounds are subjected to an addition reaction on the surface of the inorganic pillar 21 in the same manner as in the previous case. Obtain item 21゛.
以上のような反応@ff2L’あるいは無機ピラー21
を、両性界面活性剤5とともに、あらかじめ膨潤させて
おいた前記膨潤性層状化合物と混合して、層状化合物の
層1.1間に挿入(インターカレーション)する。混合
時の温度は、この発明では、特に限定されないが、60
〜70℃前後であることが好ましい。The above reaction @ff2L' or inorganic pillar 21
is mixed with the swellable layered compound which has been swollen in advance together with the amphoteric surfactant 5, and inserted (intercalated) between the layers 1.1 of the layered compound. The temperature during mixing is not particularly limited in this invention, but is 60°C.
The temperature is preferably around 70°C.
そうすると、両性界面活性剤5等の有機ピラーが層1,
1間を押し拡げて保持し、それとともに、無機ピラー2
1の動きを鈍くして、この層1゜1間にとどめる働きを
する。とどめられた無機ピラー21は、それによって、
層1.1間を押し拡げたまま保持する。また、この無機
ピラー21が、その表面を修飾された反応物21′であ
る場合には、第5図中)にみるように、その表面の正電
荷が層1表面のマイナス部分と電気的に結合して、それ
によって、層1,1間をより拡げたままで保持できるよ
うになるものと考えられる。Then, organic pillars such as amphoteric surfactant 5 are added to layer 1,
1 is expanded and held, and at the same time, the inorganic pillar 2
It works to slow down the movement of 1 and keep it between 1° and 1 in this layer. The retained inorganic pillar 21 is thereby
Layers 1.1 are kept spread apart. In addition, when this inorganic pillar 21 is a reactant 21' whose surface is modified, the positive charge on its surface is electrically connected to the negative part on the surface of layer 1, as shown in FIG. It is believed that this bonding makes it possible to maintain the distance between the layers 1 and 1 even further.
以上のような反応溶液を遠心分離して脱水を行ったのち
、ヘラ等で板状に配向させる。この板状材を60℃程度
の温度で温風乾燥等によって乾燥したあと、さらに、3
00〜600℃、好ましくは450〜550℃で焼成す
る。この焼成によって、無機ピラー21や反応物21′
中に含まれていた微量の有機物や、有機ピラー5等はC
0t=NH,、H,O等に変化して除去され、第1図に
示したように、層間に無機化合物2が挿入された板状の
無機層状多孔体を得ることができる。After the reaction solution as described above is dehydrated by centrifugation, it is oriented into a plate shape using a spatula or the like. After drying this plate material by hot air drying at a temperature of about 60°C,
Firing is performed at 00 to 600°C, preferably 450 to 550°C. By this firing, the inorganic pillar 21 and the reactant 21'
The trace amount of organic matter contained in it and organic pillar 5 are C.
0t = NH, H, O, etc. and removed, and as shown in FIG. 1, a plate-shaped inorganic layered porous body with an inorganic compound 2 inserted between the layers can be obtained.
このようにして得られた無機層状多孔体は、その全体の
40%以上が層間隔30〜600人を保持しており、第
1図矢印B方向の断熱性に優れている。The inorganic layered porous material thus obtained has a layer spacing of 30 to 600 in more than 40% of the total, and has excellent heat insulation properties in the direction of arrow B in FIG.
なお、以上の実施例では、無機ピラーあるし)しよ反応
物と、両性界面活性剤等とを別々に、膨潤性層状化合物
の層間に挿入しているが、これらは、あらかじめ、混合
しておいてから、前記層間に挿入されるようであっても
かまわない。In the above examples, the inorganic pillar (inorganic pillar) reactant and the amphoteric surfactant were separately inserted between the layers of the swellable layered compound, but these were mixed in advance. It may be inserted between the layers after being placed there.
つぎに、この発明の実施例について、比較例とあわせて
説明する。Next, examples of the present invention will be described together with comparative examples.
(実施例1)
無機ピラーとして、コロイド状無機化合物であるシリカ
ゾル(日産化学工業■製スノーテフクスOXS、平均粒
径60人)の10重量%水溶液を使用し、これに、陽イ
オン性無機化合物であるTicI4 (半井化学薬品■
製)の25重量%水溶液を添加して充分に混合し、反応
を行って反応物が分散された反応液を得た。このとき、
シリカゾルとT i C14の配合比(モル比)は、5
iOzとT i Otに換算して、Sin、:TkO,
=10wlであった。(Example 1) As an inorganic pillar, a 10% by weight aqueous solution of silica sol (Snowtefx OXS, manufactured by Nissan Chemical Industries, Ltd., average particle size 60), which is a colloidal inorganic compound, was used, and in this, a cationic inorganic compound, silica sol, was used. TicI4 (Hani Chemicals■
A 25 wt % aqueous solution of 100% by weight was added thereto and thoroughly mixed, and a reaction was carried out to obtain a reaction solution in which the reactants were dispersed. At this time,
The blending ratio (molar ratio) of silica sol and T i C14 is 5
Converted to iOz and T i Ot, Sin, :TkO,
=10wl.
この反応物に対し、両性界面活性剤であるジメチルヤシ
アルキルベタイン(日本油脂■製、ニツサンアノンBF
)の25重量%水溶液を混合し、それを、あらかじめ水
で膨潤させておいた膨潤性層状化合物であるNa−モン
モリロナイト(クニミネ工業側製りニピアF)の0.8
重量%水溶液に混合し、60℃で1.5時間の挿入反応
を行った。For this reaction product, an amphoteric surfactant, dimethylcocoalkylbetaine (Nippon Oil Co., Ltd., Nitsusan Anon BF)
) was mixed with a 25% aqueous solution of Na-montmorillonite (Nipia F manufactured by Kunimine Industries), which is a swellable layered compound that had been swollen with water in advance.
It was mixed with a wt % aqueous solution and subjected to insertion reaction at 60° C. for 1.5 hours.
反応後、これを遠心分離し、ヘラで板状に配向させ、室
温で一日乾燥させたあと、60℃で温風乾燥させた。こ
れを電気炉中に入れ、450℃で焼成し、厚み1.5
mの板状無機層状多孔体試料を得た。After the reaction, this was centrifuged, oriented into a plate shape with a spatula, dried at room temperature for one day, and then dried with warm air at 60°C. This was placed in an electric furnace and fired at 450°C to a thickness of 1.5
A plate-like inorganic layered porous material sample of m was obtained.
なお、Na−モンモリロナイト、SiO□、T’ OZ
+両性界面活性剤の最終組成比は、モル比で、1:1
0:1:2.88であった。In addition, Na-montmorillonite, SiO□, T'OZ
+The final composition ratio of the amphoteric surfactant is 1:1 in molar ratio.
The ratio was 0:1:2.88.
(実施例2〜23)
以下、上記実施例1と同様の条件で、第1表(a)、(
b)に示した成分系で板状無機層状多孔体試料を得た。(Examples 2 to 23) Table 1 (a), (
A plate-like inorganic layered porous material sample was obtained using the component system shown in b).
(比較例1)
コロイド状無機化合物としてコロイダルシリカ(平均粒
径130人、20重重量水溶液)を、膨潤性層状化合物
としてNa−モンモリロナイト(クニミネ工業■製りニ
ピアF)を、それぞれ使用し、これを水溶性高分子化合
物であるポリエチレンオキサイド(明成化学■製アルコ
ックスE75゜平均分子量150万〜220万)および
水とともに70℃で40分間混合した。この混合物をヘ
ラなどで板状に配向させ乾燥後、400℃、2時間の焼
成を行い、板状無機層状多孔体試料を得た。(Comparative Example 1) Colloidal silica (average particle size: 130 particles, 20% aqueous solution) was used as the colloidal inorganic compound, and Na-montmorillonite (Nipia F manufactured by Kunimine Kogyo ■) was used as the swelling layered compound. was mixed with a water-soluble polymer compound, polyethylene oxide (Alcox E75, manufactured by Meisei Kagaku ■, average molecular weight 1.5 million to 2.2 million) and water at 70° C. for 40 minutes. This mixture was oriented into a plate shape with a spatula, dried, and then fired at 400°C for 2 hours to obtain a plate-shaped inorganic layered porous material sample.
なお、Na−モンモリロナイト、水、コロイダルシリカ
、ポリエチレンオキサイドの配合比は、重量比で1:1
0:3:0.1であった。The blending ratio of Na-montmorillonite, water, colloidal silica, and polyethylene oxide is 1:1 by weight.
The ratio was 0:3:0.1.
これら実施例ならびに比較例で得られた板状無機層状多
孔体試料の開孔率、層間距離、密度、熱伝導率を測定し
、その結果を、石膏ボードおよび砂の成形体の2つの比
較例と併せて第1表(al、 (b)に示す。なお、開
孔率はつぎのような式によって得られる。比表面積は窒
素吸着法におけるBETの方法を、平均層間距離(細孔
分布)は窒素吸着法におけるCI法を、それぞれ、用い
て得た。窒素吸着装置はカンタクローム社のオートソー
ブ6を用いた。熱伝導測定は、キセノンフラッシュ法に
よる熱伝導測定装置を用いた。The porosity, interlayer distance, density, and thermal conductivity of the plate-like inorganic layered porous material samples obtained in these Examples and Comparative Examples were measured, and the results were compared to the two comparative examples of gypsum board and sand moldings. They are also shown in Table 1 (al, (b)).The porosity can be obtained by the following formula.The specific surface area is determined by the BET method in the nitrogen adsorption method, and the average interlayer distance (pore distribution) is determined by the BET method in the nitrogen adsorption method. The CI method in the nitrogen adsorption method was used to obtain the samples.The nitrogen adsorption device used was Autosorb 6 manufactured by Quantachrome.The heat conduction measurement was performed using a heat conduction measurement device using the xenon flash method.
この発明の無機層状多孔体の製法は、以上のように構成
されているため、無機化合物によって全体の40%以上
が層間隔を30〜600人に保持されて開孔率が40%
以上になっており、低熱伝導率であって断熱材等に有用
な断熱性に非常にすぐれた無機層状多孔体を確実に得る
ことができるようになる。Since the manufacturing method of the inorganic layered porous material of the present invention is configured as described above, the layer spacing is maintained at 30 to 600 in more than 40% of the total by the inorganic compound, and the porosity is 40%.
As described above, it is possible to reliably obtain an inorganic layered porous body that has low thermal conductivity and has excellent heat insulating properties that are useful for heat insulating materials and the like.
第1図は無機層状多孔体の模式的側面図、第2図は膨潤
性層状化合物の模式的側面図、第3図はその膨潤に至る
状態を説明する説明図、第4図(a)はコロイド状無機
化合物または金属アルコラートAを加水分解して形成さ
れた無機ピラーを説明する説明図、第4図(b)は無機
ピラーとしてその表面が修飾された反応物を説明する説
明図、第5図(alは第4図(alの無機ピラーと両性
界面活性剤とを膨潤性層状化合物の層間に挿入した状態
を説明する説明図、第5図(b)は第4図(b)の反応
物と両性界面活性剤とを膨潤性層状化合物の層間に挿入
した状態を説明する説明図である。
A・・・無機層状多孔体 A、・・・膨潤性無機層状化
合物 1・・・層 2・・・無機化合物 3・・・空隙
5・・・両性界面活性剤 21.21”・・・無機ピ
ラー代理人 弁理士 松 本 武 彦
@1図
第2図
第3図
第4図
(a)Figure 1 is a schematic side view of an inorganic layered porous material, Figure 2 is a schematic side view of a swellable layered compound, Figure 3 is an explanatory diagram illustrating the state leading to swelling, and Figure 4 (a) is An explanatory diagram illustrating an inorganic pillar formed by hydrolyzing a colloidal inorganic compound or metal alcoholate A. FIG. 4(b) is an explanatory diagram illustrating a reactant whose surface is modified as an inorganic pillar. Figure (al is an explanatory diagram illustrating the state in which the inorganic pillars of Figure 4 (al) and the amphoteric surfactant are inserted between the layers of the swellable layered compound, Figure 5 (b) is the reaction of Figure 4 (b) It is an explanatory diagram explaining a state in which a substance and an amphoteric surfactant are inserted between layers of a swellable layered compound. A... Inorganic layered porous body A,... Swellable inorganic layered compound 1... Layer 2 ... Inorganic compound 3 ... Voids 5 ... Amphoteric surfactant 21.21" ... Inorganic pillar agent Patent attorney Takehiko Matsumoto @1 Figure 2 Figure 3 Figure 4 (a)
Claims (9)
ピラーを挿入するとともに、両性界面活性剤をもこの層
間に挿入し、乾燥を行って前記層間に微細な空隙を形成
する無機層状多孔体の製法。(1) Inorganic layered porous structure in which a swellable layered compound is swollen, inorganic pillars are inserted between the layers, an amphoteric surfactant is also inserted between the layers, and fine voids are formed between the layers by drying. How the body is made.
Ca−モンモリロナイト、酸性白土、3−八面体合成ス
メクタイト、Na−ヘクトライト、Li−ヘクトライト
、Na−テニオライト、Li−テニオライト、および、
合成雲母からなる群より選ばれた少なくとも1つである
特許請求の範囲第1項記載の無機層状多孔体の製法。(2) The swelling layered compound is Na-montmorillonite,
Ca-montmorillonite, acid clay, 3-octahedral synthetic smectite, Na-hectorite, Li-hectite, Na-teniolite, Li-teniolite, and
The method for producing an inorganic layered porous material according to claim 1, which is at least one selected from the group consisting of synthetic mica.
アルコラートの加水分解物のうちの少なくとも一方であ
る特許請求の範囲第1項または第2項記載の無機層状多
孔体の製法。(3) The method for producing an inorganic layered porous material according to claim 1 or 2, wherein the inorganic pillar is at least one of a colloidal inorganic compound and a hydrolyzate of a metal alcoholate.
O_3、Fe_2O_3、Al_2O_3、TiO_3
、SnO_2および、ZrO_2からなる群より選ばれ
た少なくとも1つであり、加水分解物となる金属アルコ
ラートが、Si(OR)_4、Al(OR)_3、Ti
(OR)_4、Zr(OR)_4、および、Ge(OR
)_4からなる群より選ばれた少なくとも1つである特
許請求の範囲第3項記載の無機層状多孔体の製法。(4) The colloidal inorganic compound is SiO_2, Sb_2
O_3, Fe_2O_3, Al_2O_3, TiO_3
, SnO_2, and ZrO_2, and the metal alcoholate to be the hydrolyzate is Si(OR)_4, Al(OR)_3, Ti
(OR)_4, Zr(OR)_4, and Ge(OR
The method for producing an inorganic layered porous material according to claim 3, which is at least one selected from the group consisting of )_4.
および金属アルコラートのうちの少なくとも一方で修飾
したものである特許請求の範囲第1項から第4項までの
いずれかに記載の無機層状多孔体の製法。(5) The inorganic layered porous structure according to any one of claims 1 to 4, wherein the inorganic pillar has a surface modified with at least one of a cationic inorganic compound and a metal alcoholate. How the body is made.
コニウム系化合物、ハフニウム系化合物、鉄系化合物、
銅系化合物、クロム系化合物、ニッケル系化合物、亜鉛
系化合物、アルミニウム系化合物、マンガン系化合物、
リン系化合物、および、ホウ素系化合物からなる群より
選ばれた少なくとも1つであり、修飾に使用される金属
アルコラートが、Ti(OR)_4、Zr(OR)_4
、PO(OR)_3、Al(OR)_3、および、B(
OR)_3からなる群より選ばれた少なくとも1つであ
る特許請求の範囲第5項記載の無機層状多孔体の製法。(6) The cationic inorganic compound is a titanium-based compound, a zirconium-based compound, a hafnium-based compound, an iron-based compound,
Copper compounds, chromium compounds, nickel compounds, zinc compounds, aluminum compounds, manganese compounds,
At least one selected from the group consisting of phosphorus-based compounds and boron-based compounds, and the metal alcoholate used for modification is Ti(OR)_4, Zr(OR)_4
, PO(OR)_3, Al(OR)_3, and B(
The method for producing an inorganic layered porous material according to claim 5, which is at least one selected from the group consisting of OR)_3.
あり、陰イオン部がカルボキシル基、硫酸エステル基、
スルホン基、および、リン酸エステル基からなる群より
選ばれた少なくとも1つである特許請求の範囲第1項か
ら第6項までのいずれかに記載の無機層状多孔体の製法
。(7) The cationic part of the amphoteric surfactant is an aliphatic amine type, and the anionic part is a carboxyl group, a sulfuric ester group,
7. The method for producing an inorganic layered porous material according to any one of claims 1 to 6, wherein the material is at least one selected from the group consisting of a sulfone group and a phosphate ester group.
項から第7項までのいずれかに記載の無機層状多孔体の
製法。(8) After drying, the first claim further includes firing.
7. A method for producing an inorganic layered porous material according to any one of Items 7 to 7.
項から第8項までのいずれかに記載の無機層状多孔体の
製法。(9) Claim 1 in which the void is 30 to 600 Å
A method for producing an inorganic layered porous material according to any one of Items 1 to 8.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61-215627 | 1986-09-11 | ||
JP21562786 | 1986-09-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63185871A true JPS63185871A (en) | 1988-08-01 |
Family
ID=16675532
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JP30674886A Pending JPS63185871A (en) | 1986-09-11 | 1986-12-23 | Manufacture of inorganic layered porous body |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63230579A (en) * | 1987-03-17 | 1988-09-27 | 工業技術院長 | Manufacture of porous body |
JPH02145489A (en) * | 1988-11-25 | 1990-06-04 | Matsushita Electric Works Ltd | Inorganic porous material |
JP2001048523A (en) * | 1999-08-11 | 2001-02-20 | Co-Op Chem Co Ltd | Organic mica |
WO2003004412A1 (en) * | 2001-07-06 | 2003-01-16 | The University Of Queensland | Metal oxide nanoparticles in an exfoliated silicate framework |
JP2004196656A (en) * | 2002-12-17 | 2004-07-15 | Hilti Ag | Method of manufacturing layered silicate intercalation compound, intercalation compound obtained thereby and its use |
JP2009242198A (en) * | 2008-03-31 | 2009-10-22 | National Institute Of Advanced Industrial & Technology | Porous self-supporting clay film and its producing method |
JP2013124203A (en) * | 2011-12-14 | 2013-06-24 | Tosoh Corp | Alumina modified layered clay compound |
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1986
- 1986-12-23 JP JP30674886A patent/JPS63185871A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63230579A (en) * | 1987-03-17 | 1988-09-27 | 工業技術院長 | Manufacture of porous body |
JPH02145489A (en) * | 1988-11-25 | 1990-06-04 | Matsushita Electric Works Ltd | Inorganic porous material |
JP2001048523A (en) * | 1999-08-11 | 2001-02-20 | Co-Op Chem Co Ltd | Organic mica |
WO2003004412A1 (en) * | 2001-07-06 | 2003-01-16 | The University Of Queensland | Metal oxide nanoparticles in an exfoliated silicate framework |
JP2004196656A (en) * | 2002-12-17 | 2004-07-15 | Hilti Ag | Method of manufacturing layered silicate intercalation compound, intercalation compound obtained thereby and its use |
JP2009242198A (en) * | 2008-03-31 | 2009-10-22 | National Institute Of Advanced Industrial & Technology | Porous self-supporting clay film and its producing method |
JP2013124203A (en) * | 2011-12-14 | 2013-06-24 | Tosoh Corp | Alumina modified layered clay compound |
JP2014069461A (en) * | 2012-09-28 | 2014-04-21 | Dainippon Printing Co Ltd | Thermal transfer image-receiving sheet |
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