JPS63184244A - Electrode for electron gun and its manufacture - Google Patents
Electrode for electron gun and its manufactureInfo
- Publication number
- JPS63184244A JPS63184244A JP1402087A JP1402087A JPS63184244A JP S63184244 A JPS63184244 A JP S63184244A JP 1402087 A JP1402087 A JP 1402087A JP 1402087 A JP1402087 A JP 1402087A JP S63184244 A JPS63184244 A JP S63184244A
- Authority
- JP
- Japan
- Prior art keywords
- recess
- recessed part
- electrode
- groove
- recessed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000010894 electron beam technology Methods 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 7
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 5
- 238000005243 fluidization Methods 0.000 abstract 3
- 238000007493 shaping process Methods 0.000 abstract 2
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000002184 metal Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はインライン形カラーブラウン管の電子銃用電極
およびその成形方法に係り、特に画面周辺のフォーカス
の改善を図るに好適な電極とその成形方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an electrode for an electron gun of an in-line color cathode ray tube and a method for molding the same, and particularly an electrode and a method for molding the same suitable for improving focus around the screen. Regarding.
従来、カラーブラウン管の画面周辺のフォーカスの改善
を目的とした電子銃として、例えば特開昭59−157
936号公報に示すものが知られている。この構部は、
第3図に示すように、第2グリツド電極1の電子ビーム
通過孔2の周辺部tこスリット状の凹部3を設け、前記
孔2の周辺部の板厚を垂直偏向方向(X方向)に厚く、
水平偏向方向(X方向)iこ薄くしてなり、これEこよ
って電子ビームの発散角を垂直偏向方向(X方向)で小
さくしている。なお、図中、4はリング状の突起を示す
。Conventionally, as an electron gun for the purpose of improving the focus around the screen of a color cathode ray tube, for example, Japanese Patent Application Laid-Open No. 59-157
The one shown in Japanese Patent No. 936 is known. This structure is
As shown in FIG. 3, a slit-shaped recess 3 is provided in the periphery of the electron beam passing hole 2 of the second grid electrode 1, and the plate thickness of the periphery of the hole 2 is adjusted in the vertical deflection direction (X direction). thick,
The electron beam is made thinner in the horizontal deflection direction (X direction) by I, thereby reducing the divergence angle of the electron beam in the vertical deflection direction (X direction). In addition, in the figure, 4 indicates a ring-shaped protrusion.
前記凹部3を形成するには、一般にプVスによるコイニ
ング加工が用いられている。例えば特公昭40−455
0号公報があげられる。To form the recess 3, coining processing using a press V is generally used. For example, Tokuko Sho 40-455
Publication No. 0 is mentioned.
第3図に示す電極1を成形する場合、特公昭40−45
50号公報に示されているようlこ、コイニング加工力
低減の目的から、まず第4図に示すように、電子ビーム
通過孔2の当該部に余肉吸収用下穴5を設けている。次
に第5図1こ示すようEこ、コイニング加工により余肉
吸収用下穴5の周辺部の凹部形成面61こ凹部3を形成
する。これにより前記余肉吸収用下穴5は番号7で示す
ようlこ小さくなる。その後余肉吸収用下穴7の部分を
所定の電子ビーム通過孔21こ形成する。When molding the electrode 1 shown in Fig. 3,
As shown in Japanese Patent Application No. 50, for the purpose of reducing the coining processing force, first, as shown in FIG. 4, a prepared hole 5 for absorbing excess thickness is provided in the relevant portion of the electron beam passage hole 2. Next, as shown in FIG. 5, the recess 3 is formed on the recess forming surface 61 around the pilot hole 5 for absorbing excess thickness by coining. As a result, the excess thickness absorbing pilot hole 5 becomes smaller by 1, as indicated by number 7. Thereafter, a predetermined electron beam passage hole 21 is formed in the portion of the pilot hole 7 for absorbing excess thickness.
上記従来技術は、第5図Iこ示すようfこ、凹部3のコ
イニング加工により必然的lこ生じる余肉は、下穴5の
縮小方向への流動8と突起4方向への流動9とのそれぞ
れの方向へ流動する。この際、突′起4方向への流動9
は、破線10で示したような変形で吸収されるが、この
流動9のために凹部3の開口部11iこは周囲にわたっ
て不規則的な丸み。In the above-mentioned prior art, as shown in FIG. Flowing in each direction. At this time, the flow 9 in the direction of the protrusion 4
is absorbed by the deformation shown by the broken line 10, but due to this flow 9, the opening 11i of the recess 3 has an irregular roundness around the circumference.
いわゆるひけを発生させる原因となる。このひけは凹部
3周囲でその大きさは不規則となり、凹部形状精度のば
らつきとなってしまう。特番こ第3図fこ示す電子ビー
ム通過孔2の近傍の凹部3の段差を出すため、孔2の近
傍の垂直偏向方向(y方向)の形状が主要である。This causes so-called sink marks. The size of this sink mark becomes irregular around the recess 3, resulting in variations in the accuracy of the recess shape. In order to create a step difference in the recess 3 near the electron beam passing hole 2 shown in FIG. 3F, the shape in the vertical deflection direction (y direction) near the hole 2 is important.
前記したように垂直偏向方向(y方向)の凹部形状精度
のばらつきを招くので、カラーブラウン管のフォーカス
においても一様な性能が得られないという問題があった
。As described above, this causes variations in the precision of the shape of the concave portion in the vertical deflection direction (y direction), and therefore there is a problem that uniform performance cannot be obtained even in the focusing of color cathode ray tubes.
本発明の目的は、ひけの発生を防止し、凹部形状精度の
一様性の高い電子銃用電極とその形成方法を提供するこ
とにある。An object of the present invention is to provide an electrode for an electron gun that prevents the occurrence of sink marks and has a highly uniform concave shape precision, and a method for forming the same.
上記目的は、凹部形成面の凹部周囲の少なくとも垂直偏
向方向側に溝部を設けること(こより達成される。The above object is achieved by providing a groove on at least the vertical deflection direction side around the recess on the recess forming surface.
凹部形成面に形成される凹部周囲に対応した少なくとも
垂直偏向方向側(こあらかじめ溝部を設けておき、この
溝部を拘束して凹部をコイニング加工すると、この凹部
形成時におけるひけ発生方向への余肉の流動は制限され
るので、ひけは発生せず、垂直偏向方向(y方向)の凹
部形状精度を均一かつ高精度に成形できる。At least on the vertical deflection direction side corresponding to the periphery of the recess formed on the recess formation surface (if a groove is provided in advance and the groove is restrained and the recess is coined, the excess thickness in the direction of sinkage generation when the recess is formed) Since the flow of is restricted, sink marks do not occur, and the concave shape can be formed with uniform and high accuracy in the vertical deflection direction (y direction).
以下、本発明の一実施例を第1図により説明する。第2
グリツド電極20は、電子ビーム通過孔21の周辺部(
こスリット状の凹部22を有し、凹部形成面23の凹部
22周囲には環状溝部24と突起部25が設けられてい
る。An embodiment of the present invention will be described below with reference to FIG. Second
The grid electrode 20 is arranged around the electron beam passage hole 21 (
It has a slit-shaped recess 22, and an annular groove 24 and a protrusion 25 are provided around the recess 22 on the recess forming surface 23.
かかる形状よりなる第2グリツド電極20は第2図シこ
示す工程によって製作される。まず同図11)に示すよ
うに、電子ビーム通過孔21の当該部に余肉吸収用下穴
26を設ける。次に同図(+))に示すように、凹部2
2の周囲(こ対応した部分Iこ環状溝部24を設ける。The second grid electrode 20 having such a shape is manufactured by the steps shown in FIG. First, as shown in FIG. 11), a prepared hole 26 for absorbing excess thickness is provided in the corresponding part of the electron beam passage hole 21. Next, as shown in the figure (+), the recess 2
2 (corresponding portion I) is provided with an annular groove 24.
この環状溝部24は、その深さが凹部22とほぼ同じで
あるのが好ましく、またV字状断面が最も効果的である
。次に同図(cl+こ示すように、前記半製品をダイ2
7及びガイド28上に載置し、上方よりガイド29を下
降させて環状溝部24を拘束させる。この状態でポンチ
30を下降させて凹部22をコイニング加工する。これ
により、前記余肉吸収用下穴26は31のように小さく
変形する。最後に所定の電子ビーム通過孔21を形成す
ると、第1図に示す第2グリツド電極20が得られる。The depth of the annular groove 24 is preferably approximately the same as that of the recess 22, and a V-shaped cross section is most effective. Next, as shown in the same figure (cl+), the semi-finished product is
7 and the guide 28, and the guide 29 is lowered from above to restrain the annular groove 24. In this state, the punch 30 is lowered to coin the recess 22. As a result, the excess thickness absorbing pilot hole 26 is deformed into a small shape as indicated by 31. Finally, by forming a predetermined electron beam passage hole 21, a second grid electrode 20 shown in FIG. 1 is obtained.
このように、あらかじめ環状溝部24を設け、この溝部
24を拘束して凹部22をコイニング加工すると、この
凹部形成時におけるひけ発生方向への余肉の流動は著し
く制限でき、下穴縮少方向への流動に余肉を集中できる
ので、ひけの発生を防止し、凹部形状精度を一様かつ高
精度lこ成形できる。In this way, if the annular groove 24 is provided in advance and the groove 24 is constrained to form the coining of the recess 22, the flow of excess metal in the direction of sink mark generation when forming the recess can be significantly restricted, and the flow of excess metal in the direction of shrinkage of the prepared hole can be significantly restricted. Since the excess metal can be concentrated in the flow, it is possible to prevent the occurrence of sink marks and to form the concave portion with uniform and high accuracy.
なお、上記実施例においては、凹部22の全周にわたっ
て溝部24を設けたが、前記したように凹部22の近傍
、即ち垂直偏向方向(y方向)[の凹部開口部にひけが
発生しないことが重要であるので、前記溝部24は垂直
偏向方向側に部分的に形成してもよい。In the above embodiment, the groove 24 is provided over the entire circumference of the recess 22, but as described above, it is possible that sink marks will not occur in the vicinity of the recess 22, that is, at the opening of the recess in the vertical deflection direction (y direction). Since it is important, the groove portion 24 may be partially formed on the vertical deflection direction side.
本発明によれば、凹部周囲に対応した少なくとも垂直偏
向方向側に溝部を設け、この溝部を拘束して凹部を形成
することで、ひけ発生方向の余肉流動を制限できるので
、凹部形状精度が向上し、カラーブラウン管のフォーカ
ス品質も一様性の高いものとなる。According to the present invention, by providing a groove at least on the vertical deflection direction side corresponding to the periphery of the recess and constraining this groove to form a recess, it is possible to restrict the flow of excess metal in the sink direction, thereby improving the accuracy of the recess shape. The focus quality of color cathode ray tubes also becomes highly uniform.
第1図は本発明の一実施例1こなる第2グリツド電極の
電子ビーム通過孔部分を示し、ta)は拡大正面図、(
b)は断面図、第2図111乃至telは第1図の第2
グリツド電極の成形方法の一実施例を示す断面図、第3
図は従来の第2グリツド電極を示し、lalは正面図、
(blは断面図、第4図及び第5図は従来例の第2グリ
ツド電極の成形方法を示し、falは拡大正面図、(b
)は断面図である。
20・・・第2グリツド電極、 21・・・電子ビー
ム通過孔、 22・・・凹部、 23・・・凹
部形成面、24・・・溝部。
第4図
(G) (b)
第5図
(CI) (b)
11雨元
^ ((
p’″FIG. 1 shows the electron beam passage hole portion of the second grid electrode according to Embodiment 1 of the present invention, ta) is an enlarged front view, and (ta) is an enlarged front view.
b) is a sectional view, and 111 to tel in FIG. 2 are sectional views in FIG. 1.
Cross-sectional view showing an example of a method for forming a grid electrode, No. 3
The figure shows a conventional second grid electrode, lal is a front view,
(bl is a sectional view, FIGS. 4 and 5 show the conventional method of forming the second grid electrode, fal is an enlarged front view, (b
) is a cross-sectional view. 20... Second grid electrode, 21... Electron beam passing hole, 22... Concave portion, 23... Concave portion forming surface, 24... Groove portion. Figure 4 (G) (b) Figure 5 (CI) (b) 11 Amemoto ^ (( p'″
Claims (1)
た電子銃用電極において、凹部形成面の凹部周囲の少な
くとも垂直偏向方向側に溝部を設けたことを特徴とする
電子銃用電極。 2、電子ビーム通過孔周辺部にスリット状の凹部を設け
た電子銃用電極の成形方法において、凹部形成面に形成
される凹部周囲に対応した少なくとも垂直偏向方向側に
溝部を形成し、その後溝部を拘束して凹部をコイニング
加工によつて形成することを特徴とする電子銃用電極の
成形方法。[Claims] 1. An electrode for an electron gun in which a slit-like recess is provided around the electron beam passage hole, characterized in that a groove is provided at least on the vertical deflection direction side around the recess on the recess formation surface. Electrode for electron gun. 2. In a method for forming an electrode for an electron gun in which a slit-like recess is provided around the electron beam passage hole, a groove is formed at least on the vertical deflection direction side corresponding to the periphery of the recess formed on the recess formation surface, and then the groove is 1. A method for forming an electrode for an electron gun, characterized in that a concave portion is formed by coining by constraining the electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62014020A JPH0821318B2 (en) | 1987-01-26 | 1987-01-26 | Method for forming electrode for color CRT electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62014020A JPH0821318B2 (en) | 1987-01-26 | 1987-01-26 | Method for forming electrode for color CRT electron gun |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63184244A true JPS63184244A (en) | 1988-07-29 |
JPH0821318B2 JPH0821318B2 (en) | 1996-03-04 |
Family
ID=11849507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62014020A Expired - Fee Related JPH0821318B2 (en) | 1987-01-26 | 1987-01-26 | Method for forming electrode for color CRT electron gun |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0821318B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61147445A (en) * | 1984-12-20 | 1986-07-05 | Mitsubishi Electric Corp | Electron gun |
-
1987
- 1987-01-26 JP JP62014020A patent/JPH0821318B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61147445A (en) * | 1984-12-20 | 1986-07-05 | Mitsubishi Electric Corp | Electron gun |
Also Published As
Publication number | Publication date |
---|---|
JPH0821318B2 (en) | 1996-03-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |