JPS63177029U - - Google Patents

Info

Publication number

JPS63177029U

JPS63177029U JP6836587U JP6836587U JPS63177029U JP S63177029 U JPS63177029 U JP S63177029U JP 6836587 U JP6836587 U JP 6836587U JP 6836587 U JP6836587 U JP 6836587U JP S63177029 U JPS63177029 U JP S63177029U

Authority

JP

Japan

Prior art keywords

heat treatment

chamber

semiconductor wafer

short

transparent material

Prior art date

1987-05-07

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
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• 238000010438 heat treatment Methods 0.000 claims description 3
• 239000004065 semiconductor Substances 0.000 claims 1
• 239000012780 transparent material Substances 0.000 claims 1
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
• 229910052736 halogen Inorganic materials 0.000 description 1
• 150000002367 halogens Chemical class 0.000 description 1
• 239000010453 quartz Substances 0.000 description 1
• 229910052710 silicon Inorganic materials 0.000 description 1
• 239000010703 silicon Substances 0.000 description 1
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
• WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
• 229910052721 tungsten Inorganic materials 0.000 description 1
• 239000010937 tungsten Substances 0.000 description 1