JPS63176060U - - Google Patents
Info
- Publication number
- JPS63176060U JPS63176060U JP18392086U JP18392086U JPS63176060U JP S63176060 U JPS63176060 U JP S63176060U JP 18392086 U JP18392086 U JP 18392086U JP 18392086 U JP18392086 U JP 18392086U JP S63176060 U JPS63176060 U JP S63176060U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- processing head
- semiconductor
- wafer
- semiconductor manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18392086U JPS63176060U (en, 2012) | 1986-11-28 | 1986-11-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18392086U JPS63176060U (en, 2012) | 1986-11-28 | 1986-11-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63176060U true JPS63176060U (en, 2012) | 1988-11-15 |
Family
ID=31131101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18392086U Pending JPS63176060U (en, 2012) | 1986-11-28 | 1986-11-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63176060U (en, 2012) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002257998A (ja) * | 2001-02-28 | 2002-09-11 | Sony Corp | 電子ビーム照射装置及び電子ビーム照射装置における真空シール方法 |
-
1986
- 1986-11-28 JP JP18392086U patent/JPS63176060U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002257998A (ja) * | 2001-02-28 | 2002-09-11 | Sony Corp | 電子ビーム照射装置及び電子ビーム照射装置における真空シール方法 |