JPS63167166U - - Google Patents
Info
- Publication number
- JPS63167166U JPS63167166U JP6026487U JP6026487U JPS63167166U JP S63167166 U JPS63167166 U JP S63167166U JP 6026487 U JP6026487 U JP 6026487U JP 6026487 U JP6026487 U JP 6026487U JP S63167166 U JPS63167166 U JP S63167166U
- Authority
- JP
- Japan
- Prior art keywords
- target
- grooves
- large number
- sputtering target
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 6
- 238000005477 sputtering target Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000013077 target material Substances 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の第１実施例を示すスパツタリ
ング用ターゲツトの平面図、第２図は本考案の第
１実施例の断面図、第３図は本考案の第２実施例
の断面図、第４図は本考案の第３実施例の平面図
である。
１……バツキングプレート、２……スパツタリ
ング用ターゲツト本体、３……円柱形材料、４…
…止めネジ用穴、５……円錐台形材料、６……異
種材料Ａ、７……異種材料Ｂ。
FIG. 1 is a plan view of a sputtering target showing a first embodiment of the present invention, FIG. 2 is a cross-sectional view of the first embodiment of the present invention, and FIG. 3 is a cross-sectional view of a second embodiment of the present invention. FIG. 4 is a plan view of a third embodiment of the present invention. 1... Bucking plate, 2... Sputtering target body, 3... Cylindrical material, 4...
...Hole for set screw, 5...Truncated conical material, 6...Different material A, 7...Different material B.
Claims (1)
ターゲツト本体に異種の材例を配した構成によつ
て複数のターゲツト材料成分になる膜の形成が可
能となるスパツタリング用ターゲツトにおいて、
前記ターゲツト本体が、その前面に開口部がある
多数の溝を有し、前記溝とほぼ同じ断面形状を有
する異種の材料を前記溝に多数埋設した構成を特
色とするスパツタリング用ターゲツト。 In a sputtering target that enables the formation of a film consisting of a plurality of target material components by arranging different types of materials on a target body whose back surface is fixed on a backing plate,
A sputtering target characterized in that the target main body has a large number of grooves with openings on the front surface thereof, and a large number of different materials having approximately the same cross-sectional shape as the grooves are embedded in the grooves.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6026487U JPS63167166U (en) | 1987-04-21 | 1987-04-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6026487U JPS63167166U (en) | 1987-04-21 | 1987-04-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63167166U true JPS63167166U (en) | 1988-10-31 |
Family
ID=30892525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6026487U Pending JPS63167166U (en) | 1987-04-21 | 1987-04-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63167166U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016037617A (en) * | 2014-08-05 | 2016-03-22 | 富士電機株式会社 | Sputtering target, pvd film manufacturing method using the target, and control method for impurity concentration in pvd film |
-
1987
- 1987-04-21 JP JP6026487U patent/JPS63167166U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016037617A (en) * | 2014-08-05 | 2016-03-22 | 富士電機株式会社 | Sputtering target, pvd film manufacturing method using the target, and control method for impurity concentration in pvd film |