JPS63167166U - - Google Patents

Info

Publication number
JPS63167166U
JPS63167166U JP6026487U JP6026487U JPS63167166U JP S63167166 U JPS63167166 U JP S63167166U JP 6026487 U JP6026487 U JP 6026487U JP 6026487 U JP6026487 U JP 6026487U JP S63167166 U JPS63167166 U JP S63167166U
Authority
JP
Japan
Prior art keywords
target
grooves
large number
sputtering target
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6026487U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6026487U priority Critical patent/JPS63167166U/ja
Publication of JPS63167166U publication Critical patent/JPS63167166U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP6026487U 1987-04-21 1987-04-21 Pending JPS63167166U (US07122603-20061017-C00045.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6026487U JPS63167166U (US07122603-20061017-C00045.png) 1987-04-21 1987-04-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6026487U JPS63167166U (US07122603-20061017-C00045.png) 1987-04-21 1987-04-21

Publications (1)

Publication Number Publication Date
JPS63167166U true JPS63167166U (US07122603-20061017-C00045.png) 1988-10-31

Family

ID=30892525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6026487U Pending JPS63167166U (US07122603-20061017-C00045.png) 1987-04-21 1987-04-21

Country Status (1)

Country Link
JP (1) JPS63167166U (US07122603-20061017-C00045.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016037617A (ja) * 2014-08-05 2016-03-22 富士電機株式会社 スパッタリングターゲット並びにそれを用いたpvd膜の製造方法およびpvd膜中の不純物濃度の制御方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016037617A (ja) * 2014-08-05 2016-03-22 富士電機株式会社 スパッタリングターゲット並びにそれを用いたpvd膜の製造方法およびpvd膜中の不純物濃度の制御方法

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