JPS63163355A - Light shieldable masking film - Google Patents
Light shieldable masking filmInfo
- Publication number
- JPS63163355A JPS63163355A JP61309978A JP30997886A JPS63163355A JP S63163355 A JPS63163355 A JP S63163355A JP 61309978 A JP61309978 A JP 61309978A JP 30997886 A JP30997886 A JP 30997886A JP S63163355 A JPS63163355 A JP S63163355A
- Authority
- JP
- Japan
- Prior art keywords
- light
- shielding
- layer
- film
- base film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000000873 masking effect Effects 0.000 title claims abstract description 27
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 239000000049 pigment Substances 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 9
- 238000000576 coating method Methods 0.000 claims abstract description 9
- 239000010410 layer Substances 0.000 claims description 41
- 239000000853 adhesive Substances 0.000 claims description 20
- -1 polyethylene terephthalate Polymers 0.000 claims description 19
- 239000004698 Polyethylene Substances 0.000 claims description 10
- 229920000573 polyethylene Polymers 0.000 claims description 10
- 239000005038 ethylene vinyl acetate Substances 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 claims description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 6
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 6
- 239000012790 adhesive layer Substances 0.000 claims description 5
- 230000032683 aging Effects 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- 229920001577 copolymer Polymers 0.000 abstract description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract 2
- 239000005977 Ethylene Substances 0.000 abstract 2
- 238000001125 extrusion Methods 0.000 abstract 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 239000000975 dye Substances 0.000 description 9
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical group CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 229940081735 acetylcellulose Drugs 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 2
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 229920000554 ionomer Polymers 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Abstract
Description
【発明の詳細な説明】
［技術分野］
本発明は、ベースフィルム上に遮光性の剥離層を設けて
なる写真製版用に用いる遮光性マスキンクフィルムに関
する。更に詳しくは、遮光性、被膜性、耐泡化性、易剥
離性のほかに再粘着性を付与した遮光性マスキングフィ
ルムに関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a light-shielding masking film used for photolithography, which comprises a light-shielding release layer provided on a base film. More specifically, the present invention relates to a light-shielding masking film that has light-shielding properties, coating properties, bubble resistance, easy peelability, and re-adhesive properties.
［従来の技術］
従来より、写真製版用に用いる遮光性マスキングフィル
ムには、ベースフィルム上にゴム状物質、塩化ビニル樹
脂、塩化ビニル系共重合体、ニトロセルロース、アセチ
ルセルロース等の樹脂に可塑剤などを混合したものに遮
光性の染顔料を混合したものや、ポリウレタン樹脂と酢
酸繊維素樹脂の混合物に染顔料を混合したものの溶剤溶
液を塗布乾燥して遮光性の剥離層として設けたもの（例
えば特開昭５４−１０４９０２号公報参照）かあった。[Prior Art] Conventionally, light-shielding masking films used for photoengraving have been made by adding a rubber-like substance on a base film, a plasticizer to a resin such as vinyl chloride resin, vinyl chloride copolymer, nitrocellulose, or acetylcellulose. A light-shielding peeling layer is prepared by applying a solvent solution of a mixture of polyurethane resin and acetic acid cellulose resin with a dye and pigment, and drying it. For example, see Japanese Unexamined Patent Publication No. 104902/1983).
しかしながら、上記のような遮光性マスキングフィルム
は−、任意の図柄等に遮光性の剥離層を裁断し剥離して
写真製版用に用いられているか、誤って裁断し′Ａａｔ
、た場合にはもとに復元することができず、それまでの
作業労力並びに遮光性マスキングフイルムは無駄になっ
てしまうと言う欠点かイ１つだ６更にまた経１３成るい
は温度湿度に対する安定性か劣るために安定した′Ａ離
層の剥離力か得られない（ゴム、塩化ビニルなどの劣化
による）とごう欠点が有った。更にまた塗膜か厚いため
に、乾燥時間か充分に必要である為、ラインスピードか
遅くコストアップになると言う欠点もイ」っだ。However, the above-mentioned light-shielding masking film is either used for photolithography by cutting and peeling off the light-shielding release layer into an arbitrary design, or is used for photolithography by cutting it by mistake.
, the only drawback is that it cannot be restored to its original state, and the work and effort and light-shielding masking film used up to that point are wasted. Due to the poor stability, a stable release force of 'A' was not obtained (due to deterioration of the rubber, vinyl chloride, etc.). Furthermore, because the coating is thick, it requires sufficient drying time, which slows down the line speed and increases costs.
［９，１！ｌ］の目的］
未発明は上記従来の問題点に鑑み、極めて良好な遮光性
、被膜性、耐老化性、易剥離性のほかに再粘着性を付与
したローコストて小ロットに対応てきる遮光性マスキン
グフィルムを提供することにある。[9,1! In view of the above-mentioned conventional problems, the present invention has been made to provide a light shielding device that has excellent light shielding properties, coating properties, aging resistance, easy peelability, and re-adhesive properties, and is low cost and suitable for small lot production. The purpose of the present invention is to provide a sexual masking film.
［発明の構成］
即ち本発明は、ベースフィルムの上に（ｌｆ粘着層性光
性′Ａ１ａ、層を設けた遮光性マスキングフィルムにお
いて、ベースフィルムかポリエチレンテレフタレートフ
ィルムであり、ベースフィルム」二に再粘着性遮光性剥
離層としてＩす粘着性層かエチレン−酢酸ビニル共重合
体からなる再粘着性層、ポリエチレンからなる中間層と
が共押出しにより形成され、さらにその上にゴム状［ｔ
とこれと相溶性がある物質および遮光性染料顔料との混
合物からなる遮光性層か塗布形成されてなることを特徴
とする遮光性マスキングフィルムに関するものである。[Structure of the Invention] That is, the present invention provides a light-shielding masking film in which a layer is provided on a base film, in which the base film is a polyethylene terephthalate film, and the base film is reused. As an adhesive light-shielding release layer, an adhesive layer, a re-adhesive layer made of ethylene-vinyl acetate copolymer, and an intermediate layer made of polyethylene are formed by coextrusion, and a rubber-like [t
This invention relates to a light-shielding masking film characterized in that a light-shielding layer is formed by coating a mixture of a light-shielding material, a substance compatible therewith, and a light-shielding dye/pigment.
即ち本発明の遮光性マスキングフィルムにおいては、従
来めベースフィルム上にゴム状物質、塩化ビニル樹脂、
塩化ビニル系共重合体、ニトロセルロース、アセチルセ
ルロース等の樹脂に可塑剤などを混合したものに遮光性
の染顔料を混合したものや、ポリウレタン樹脂と酢酸繊
維素樹脂の混合物に染顔料を混合したものの溶剤溶液を
塗布乾燥して設けていた遮光性の剥離層にかえて、ベー
スフィルム（１０）の上に再粘着性遮光性剥離層（２０
）を設けた遮光性マスキンクフィルムにおいて、ベース
フィルム（１０）かポリエチレンテレフタレー■・フィ
ルムてあり、ベースフィルム（１０）上に再粘刀性遮光
性′Ａｇ１層（２０）として再粘着性層（２１）かエチ
レン−酢酸ビニル共重合体からなる再粘着性層（２１）
、ポリエチレンからなる中間ｆｉ （２２）とが共押出
しにより形成され、さらにその上にゴム状！ｌｋ質とこ
れと相溶性がある物質および遮光性染料顔料との混合物
からなる遮光性層（２コ）が塗布形成することによって
、極めて良好な遮光性、被膜性、耐老化性、易剥離性の
ほかに再粘着性を付与した遮光性マスキングフィルムを
完成したもである。That is, in the light-shielding masking film of the present invention, a rubber-like substance, vinyl chloride resin,
Light-shielding dyes and pigments are mixed with resins such as vinyl chloride copolymers, nitrocellulose, and acetylcellulose, mixed with plasticizers, and dyes and pigments are mixed with a mixture of polyurethane resin and cellulose acetate resin. In place of the light-shielding release layer that had been prepared by coating and drying a solvent solution, a re-adhesive light-shielding release layer (20
) is provided with a base film (10) or a polyethylene terephthalate film, and a re-adhesive layer (20) as a re-adhesive light-shielding Ag layer (20) is provided on the base film (10). (21) or a re-adhesive layer made of ethylene-vinyl acetate copolymer (21)
, an intermediate fi (22) made of polyethylene is formed by coextrusion, and a rubber-like! By coating and forming two light-shielding layers consisting of a mixture of lk quality, a substance compatible with it, and a light-shielding dye/pigment, it has extremely good light-shielding properties, film properties, aging resistance, and easy peelability. In addition to this, we have also completed a light-shielding masking film that has re-adhesive properties.
即ち本発明は、ベースフィルム（１０）としてポリエチ
レンテレフタレートフィルムを用い、その上にエチレン
−酢酸ビニル共重合体からなる再粘着性′Ａｓ層（２１
）、ポリエチレンからなる中間層（２２）を共押出によ
りにより形成し、さらにその上にゴム状物質とこれと相
溶性がある物質および遮光性染料顔料とがらなる混合物
の遮光性層（２３）が塗布形成することによって、極め
て良好な遮光性、被膜性、耐老化性、易２１離性のほか
に再粘着性を付与した遮光性マスキングフィルムを提供
することを０丁能としたものである。That is, in the present invention, a polyethylene terephthalate film is used as the base film (10), and a re-adhesive 'As layer (21) made of an ethylene-vinyl acetate copolymer is formed thereon.
), an intermediate layer (22) made of polyethylene is formed by coextrusion, and a light-shielding layer (23) of a mixture of a rubber-like substance, a substance compatible therewith, and a light-shielding dye/pigment is coated thereon. By forming the film, it is possible to provide a light-shielding masking film that has extremely good light-shielding properties, film properties, aging resistance, easy release properties, and re-adhesive properties.
本発明の遮光性マスキングフィルムのＳ１造方法におけ
るベースフィルム（１０）としては充分な自己保持性を
右するものでしかも共押出により再粘着性２Ｉｌｉｔ層
（２１）を設けるさいの熱に充分に耐えられ、光学的に
むらのない透明なものか要求され、このような条件を満
たすものとしてポリエチレンテレフタレートフィルムか
、好ましくはその二軸延伸フィルムか適している。その
厚さは５０〜２００１程度のものを用いるか、より好ま
しくは７５〜１２５μｍ程度のものを用いるのかしわや
亀裂などのない遮光性マスキングフィルムの製造か連続
的に大量生産出来る点から好ましい。As the base film (10) in the S1 manufacturing method of the light-shielding masking film of the present invention, it has sufficient self-retention properties and can withstand heat sufficiently when forming the re-adhesive 2Ilit layer (21) by coextrusion. The film is required to be optically uniform and transparent, and a polyethylene terephthalate film, preferably a biaxially stretched film thereof, is suitable as a film that satisfies these conditions. It is preferable to use a thickness of about 50 to 2,001 μm, more preferably about 75 to 125 μm, because it allows continuous mass production of a light-shielding masking film without wrinkles or cracks.
本発明の遮光性マスキングフィルムのベースフィルム（
１０）の上に形成される再粘着性遮光性′ＡＳ層（２０
）の厚さは特に制限は無いか通常１０〜３０μｍの範囲
から適宜選ばれる。The base film of the light-shielding masking film of the present invention (
re-adhesive light-shielding 'AS layer (20) formed on top of 10);
) The thickness is not particularly limited or is normally selected appropriately from the range of 10 to 30 μm.
本発明の遮光性マスキングフィルムのベースフィルム（
］０）の上に形成される再粘着性′Ａ離層（２１）を形
成するための樹脂としては、ポリエチレン、ポリプロピ
レン、エチレン−酢酸ビニル共重合体、アイオノマーな
どがあり、エチレン−酢酸ビニル共重合体か好ましく用
いられる。The base film of the light-shielding masking film of the present invention (
]0) Resins for forming the re-adhesive release layer (21) include polyethylene, polypropylene, ethylene-vinyl acetate copolymer, ionomer, etc. Polymers are preferably used.
本発明の遮光性マスキンクフィルムの再粘着性剥離層（
２１）上に形成される中間層（２２）を形成するための
樹脂としては、ポリエチレン、ポリプロピレン、エチレ
ン−酢酸ビニル共重合体、アイオノマーなどがあり、ポ
リエチレンが好ましく用いられる。再粘着性剥離層（２
１）に対してポリエチレン等はその強度を高め、その表
面のベトッキを防止（ブロッキング防止）する作用かあ
る。Re-adhesive release layer of the light-shielding masking film of the present invention (
21) Examples of the resin for forming the intermediate layer (22) formed thereon include polyethylene, polypropylene, ethylene-vinyl acetate copolymer, ionomer, etc., and polyethylene is preferably used. Re-adhesive release layer (2
In contrast to 1), polyethylene and the like have the effect of increasing its strength and preventing the surface from becoming sticky (blocking prevention).
一方エチレンー酢酩ビニル共重合体等はその再粘着性を
コントロールする作用かある。したかって両者の割合を
適宜選択することによって任意の特性のものを得ること
ができる。On the other hand, ethylene-acetate vinyl copolymers and the like have the effect of controlling readack properties. Therefore, by appropriately selecting the ratio of the two, it is possible to obtain a material with arbitrary characteristics.
本発明の遮光性マスキンクフィルムの中間層（２２）の
上に形成される遮光性層（２３）を形成するための樹脂
としては、アクリルニトロリル含有量か２０〜４０重量
％のアクリロニトロリル−ブタジェン共重合体と塩化ビ
ニルモノマーと酢酸ビニルモノマーの共重合比か重量比
て８０〜９５：２０〜５の範囲の塩化ビニル−酢酸ビニ
ル共重合体との混合物が良い、又この混合比はより好ま
しくは３０〜５０ニア０〜５０の範囲が好ましく用いら
れる。The resin for forming the light-shielding layer (23) formed on the intermediate layer (22) of the light-shielding masking film of the present invention has an acrylonitrolyl content of 20 to 40% by weight. A mixture of a vinyl chloride-vinyl acetate copolymer and a vinyl chloride-vinyl acetate copolymer with a copolymerization ratio of vinyl chloride monomer and vinyl acetate monomer in a range of 80-95:20-5 by weight is good, and this mixing ratio is more preferably in the range of 30 to 50 near 0 to 50.
遮光性層（２３）に遮光性を付与するのに着色剤か適宜
が用いられるが、染料または顔料及び染料と顔料との混
合物を用いることができ、遮光性マスキングフィルムと
しての遮光性を満たし、樹脂との相溶性かあるものであ
れば特にその種類や添加祉に制限はない。A coloring agent or an appropriate coloring agent is used to impart light-shielding properties to the light-shielding layer (23), but dyes or pigments or mixtures of dyes and pigments can be used, satisfying the light-shielding properties as a light-shielding masking film, As long as it is compatible with the resin, there are no particular restrictions on its type or addition.
本発明の遮光性マスキングフィルムの再粘着性剥離層（
２１）および中間層（２２）の形成は、前記再粘着性剥
離層（２１）および中間層（２２）を形成するための樹
脂を通常の溶融共押出し法により前記ベースフィルム（
１０）上に形成される。Re-adhesive release layer of the light-shielding masking film of the present invention (
21) and the intermediate layer (22) are formed by adding the resin for forming the re-adhesive release layer (21) and the intermediate layer (22) to the base film (21) by a usual melt coextrusion method.
10) Formed on.
本発明の遮光性マスキングフィルムの遮光層（２３）の
形成は、前記遮光層（２３）を形成するための混合物樹
脂を通常のロールコータ法及びグラビアコーター法等に
より前記中間層（２２）上に形成される。Formation of the light-shielding layer (23) of the light-shielding masking film of the present invention involves applying a resin mixture for forming the light-shielding layer (23) onto the intermediate layer (22) by a conventional roll coater method, gravure coater method, etc. It is formed.
つぎに実施例をあげて本発明を説明する。尚、実施例中
の％はいずれも重量％である。Next, the present invention will be explained with reference to Examples. Note that all percentages in the examples are percentages by weight.
［実施例］
実施例１
■ エチレン−酢酸ビニル共重合体（酢酸ビニル２０％
）と
■ ポリエチレンとの
２種類の樹脂を夫々押出機より供給しＴダイにて共押出
コーティングを行なった。[Example] Example 1 ■ Ethylene-vinyl acetate copolymer (vinyl acetate 20%
) and (2) polyethylene were respectively supplied from an extruder, and coextrusion coating was performed using a T-die.
厚さ １００μの二輪延伸ポリエチレンテレフタレート
フィルムと共押出部のエチレン−酢酸ビニル共重合体面
を合うように１対のニッポロールて挟みながら積層し、
総厚１１５μｓの積層体を得た。Two-wheel stretched polyethylene terephthalate film with a thickness of 100μ and the ethylene-vinyl acetate copolymer of the coextruded part were laminated by sandwiching them between a pair of Nippor rolls so that their surfaces matched,
A laminate having a total thickness of 115 μs was obtained.
更にアクリルニトリル含有量が３３％のアクリロニトリ
ル−ブタジェンラバーと塩化ビニル９０％と酢酸ビニル
１０％の混合物をメチ゛ルケトン対トルエンの混合比が
２対ｌの混合溶剤に溶解し、遮光染料（ネオザポンオレ
ンジＲＥ ＢＡＳＦ社製）２％を混合した溶液を上記
でえた積層体のポリエチレン面をコロナ放電にて処理後
、塗工し、総厚１２５μｓの本発明の遮光性マスキング
フィルムを得た。Furthermore, a mixture of acrylonitrile-butadiene rubber containing 33% acrylonitrile, 90% vinyl chloride, and 10% vinyl acetate was dissolved in a mixed solvent with a mixing ratio of methylketone to toluene of 2:1, and a light-shielding dye (neozapone) was dissolved. The polyethylene surface of the laminate obtained above was treated with corona discharge and then coated with a solution containing 2% of Orange RE (manufactured by BASF) to obtain a light-shielding masking film of the present invention having a total thickness of 125 μs.
二軸延伸ポリエチレンテレフタレートフィルムと２層共
押出積層部の接着強度は２５■■幅の試験片で、ｌｓｇ
／２５ｍ５（１８０度剥離）、また共押出積層部の引張
強度は２．４ｋｇ／２５−■、伸度は１２０％であった
。The adhesive strength of the biaxially oriented polyethylene terephthalate film and the two-layer coextruded laminate was measured using a test piece with a width of 25 lsg.
/25 m5 (180 degree peeling), and the tensile strength of the coextruded laminated part was 2.4 kg/25-■, and the elongation was 120%.
且つ、ベースフィルムと共押出積層部とは適切な再粘着
性を有していた。In addition, the base film and coextruded laminate had appropriate readack properties.
［発明の効果］
実施例１で得られた遮光性マスキングフィルムを用いて
、写真製版用に用いると同様に任意の図柄等に遮光性の
剥離層を裁断し一度剥離したものを再粘若してもとに復
元し、再度別の図柄に裁断し所望の図柄通りの写真製版
用マスクをつくることがてきた。この効果は従来品には
全く期待できない効果である。[Effect of the invention] Using the light-shielding masking film obtained in Example 1, cut the light-shielding release layer into any desired pattern, etc. in the same way as when used for photolithography, and once peeled, re-stick or By restoring it to its original state and cutting it again into a different design, it has become possible to create photolithography masks with the desired design. This effect is completely unexpected from conventional products.
第１図は本願発明の遮光性マスキングフィルムの基本構
成を示す断面図である。
（図面の符号）
（１０） ：ベースフイルム
（２０） ：再粘着性遮光性剥離層
（２１） ：再粘着性剥離層
（２２） ：中間層
（２コ）：遮光性層FIG. 1 is a sectional view showing the basic structure of the light-shielding masking film of the present invention. (Drawing code) (10): Base film (20): Re-adhesive light-shielding release layer (21): Re-adhesive release layer (22): Intermediate layer (2): Light-shielding layer
Claims (1)
層（２０）を設けた遮光性マスキングフィルムにおいて
、ベースフィルム（１０）がポリエチレンテレフタレー
トフィルムであり、ベースフィルム（１０）上に再粘着
性遮光性剥離層（２０）として再粘着性層（２１）がエ
チレン−酢酸ビニル共重合体からなる再粘着性層（２１
）、ポリエチレンからなる中間層（２２）とが共押出し
により形成され、さらにその上にゴム状物質とこれと相
溶性がある物質および遮光性染料顔料との混合物からな
る遮光性層（２３）が塗布形成されてなることを特徴と
する遮光性マスキングフィルム。1 In a light-shielding masking film in which a re-adhesive light-shielding peeling layer (20) is provided on a base film (10), the base film (10) is a polyethylene terephthalate film, and a re-adhesive light-shielding peeling layer (20) is provided on the base film (10). The re-adhesive layer (21) as the light-shielding peeling layer (20) is made of an ethylene-vinyl acetate copolymer.
), an intermediate layer (22) made of polyethylene is formed by coextrusion, and a light-shielding layer (23) made of a mixture of a rubber-like substance, a substance compatible therewith, and a light-shielding dye pigment is further formed thereon. A light-shielding masking film characterized by being formed by coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30997886A JPH07104593B2 (en) | 1986-12-25 | 1986-12-25 | Light-shielding masking film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30997886A JPH07104593B2 (en) | 1986-12-25 | 1986-12-25 | Light-shielding masking film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63163355A true JPS63163355A (en) | 1988-07-06 |
| JPH07104593B2 JPH07104593B2 (en) | 1995-11-13 |
Family
ID=17999661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30997886A Expired - Lifetime JPH07104593B2 (en) | 1986-12-25 | 1986-12-25 | Light-shielding masking film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07104593B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01292344A (en) * | 1988-05-20 | 1989-11-24 | Sanyo Kokusaku Pulp Co Ltd | Peel off film and its production |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54104902A (en) * | 1978-02-01 | 1979-08-17 | Daicel Ltd | Lighttintercepting mask film |
| JPS55133442U (en) * | 1979-03-13 | 1980-09-22 | ||
| JPS61110141A (en) * | 1984-11-05 | 1986-05-28 | Shinko Kagaku Kogyo Kk | Light shieldable masking film |
| JPS61143758A (en) * | 1984-12-17 | 1986-07-01 | Kimoto & Co Ltd | Light interrupting masking film |
| JPS61166549A (en) * | 1985-01-18 | 1986-07-28 | Somar Corp | Light shieldable masking film |
-
1986
- 1986-12-25 JP JP30997886A patent/JPH07104593B2/en not_active Expired - Lifetime
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54104902A (en) * | 1978-02-01 | 1979-08-17 | Daicel Ltd | Lighttintercepting mask film |
| JPS55133442U (en) * | 1979-03-13 | 1980-09-22 | ||
| JPS61110141A (en) * | 1984-11-05 | 1986-05-28 | Shinko Kagaku Kogyo Kk | Light shieldable masking film |
| JPS61143758A (en) * | 1984-12-17 | 1986-07-01 | Kimoto & Co Ltd | Light interrupting masking film |
| JPS61166549A (en) * | 1985-01-18 | 1986-07-28 | Somar Corp | Light shieldable masking film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01292344A (en) * | 1988-05-20 | 1989-11-24 | Sanyo Kokusaku Pulp Co Ltd | Peel off film and its production |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07104593B2 (en) | 1995-11-13 |
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