JPS63155435A - Member for information recording - Google Patents

Member for information recording

Info

Publication number
JPS63155435A
JPS63155435A JP61301226A JP30122686A JPS63155435A JP S63155435 A JPS63155435 A JP S63155435A JP 61301226 A JP61301226 A JP 61301226A JP 30122686 A JP30122686 A JP 30122686A JP S63155435 A JPS63155435 A JP S63155435A
Authority
JP
Japan
Prior art keywords
recording medium
information recording
reflectance
recording
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61301226A
Other languages
Japanese (ja)
Inventor
Yasuhiro Ota
康博 太田
Nobuhiro Tokujiyuku
徳宿 伸弘
Masaharu Ishigaki
正治 石垣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP61301226A priority Critical patent/JPS63155435A/en
Publication of JPS63155435A publication Critical patent/JPS63155435A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To easily obtain a recording medium suitable for executing recording, reproducing and erasing by forming the average compsn. in the film thickness direction of an information recording medium of specific atomic configuration. CONSTITUTION:The information recording medium 2 of which the atomic configuration can be changed by projection of a light beam for recording thereto is formed on a substrate 1. The average compsn. in the film thickness direction of the medium 2 in this case is formed of Bix Sey Mz, where M is at least one kind of the element selected from the group consisting of Si, In, Ag, Cu, and Au and X, Y, Z are respectively the numbers in ranging 5<=X<=60, 20<=Y<=60, 5<=Z<=60. The easy selection of the information recording medium adequate for recording, reproducing and erasing from many combinations of elements is thereby permitted.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ビデオディスク、デジタルオーディオディス
ク、コンピュータ用メモリディスク等に用いて好適な情
報記録用部材に関し、特に情報の記録・再生および消去
に好適な情報記録用部材に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an information recording member suitable for use in video discs, digital audio discs, computer memory discs, etc., and particularly relates to information recording members suitable for use in recording, reproducing, and erasing information. The present invention relates to a suitable information recording member.

〔従来の技術〕[Conventional technology]

消去可能な情報記録用部材において、情報の再生は、通
常レーザ光等の光ビームを該部材に照射し、該部材から
の反射光あるいは透過光を検出することによシ行われる
。また、情報の記録および消去は、例えばレーザ光の光
ビームエネルギーを上記部材に与えて、該部材に形成さ
れた記録媒体の原子配列を可逆的に変化させることによ
シ行なうことができる。このような記録媒体としては、
Toを主体としたカルコゲン化物が知られている。
In an erasable information recording member, information is usually reproduced by irradiating the member with a light beam such as a laser beam and detecting reflected light or transmitted light from the member. Furthermore, information can be recorded and erased by applying light beam energy of, for example, a laser beam to the member to reversibly change the atomic arrangement of the recording medium formed on the member. Such recording media include
Chalcogenides mainly composed of To are known.

カルコゲン化物は、光ビームエネルギーの照射条件によ
シ、非晶質状態と結晶質状態の異なる2つの構造状態を
とることができる。非晶質状態の上記記録媒体に光ビー
ムを照射し、除熱徐冷すると該媒体は結晶質状態に転移
する。また、結晶質状態の上記記録媒体に光ビームを照
射し、急熱急冷すると該媒体は非晶質状態に転移する。
A chalcogenide can take two different structural states, an amorphous state and a crystalline state, depending on the irradiation conditions of the light beam energy. When the recording medium in an amorphous state is irradiated with a light beam and slowly cooled to remove heat, the medium transforms into a crystalline state. Furthermore, when the recording medium in a crystalline state is irradiated with a light beam and rapidly heated and cooled, the medium transforms into an amorphous state.

以上のような消去可能な情報記録用部材の記録再生方法
あるいはその原理については、特公昭54−41902
号公報、特公昭47−26897号公報等に記載されて
いる。
Regarding the recording and reproducing method of the above-mentioned erasable information recording member and its principle, please refer to Japanese Patent Publication No. 54-41902.
No. 1, Japanese Patent Publication No. 47-26897, etc.

また、上記記録媒体としては、例えば上述の特許公報等
において、カルコゲン化物を中心として。
Further, as the recording medium, for example, in the above-mentioned patent publications, etc., chalcogenides are mainly used.

元素周期率表における■族、■族、V族、■族に属する
金属、半金属、半導体の中から、種々の組合せの記録媒
体が提案されている。
Various combinations of recording media have been proposed from among metals, metalloids, and semiconductors belonging to Groups 1, 2, V, and 2 in the Periodic Table of Elements.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来技術では、元素の組合せの例が数多くあシ、こ
れらの中から、記録・再生および消去に適切な情報記録
用媒体を選択することはむずかしく、これまでに良好な
特性を持つ例はほとんどなかった。
In the above conventional technology, there are many examples of combinations of elements, and it is difficult to select an information recording medium suitable for recording, reproducing, and erasing from among these, and so far there have been few examples with good characteristics. There wasn't.

そこで、本発明の目的は、記録・再生および消去を行な
うのに適した情報記録用媒体を有する情報記録用部材を
提供することにある。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide an information recording member having an information recording medium suitable for recording, reproducing, and erasing.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は、情報記録用部材における情報記録媒体とし
て膜厚方向の平均組成がBix Se7 Mz(ただし
、M FiSi e In @ Ag I Cu * 
Auからなる群から選ばれた少なくとも一つの元素であ
り、X、Y、Zは、それぞれ5≦X≦60.20≦Y≦
60,5≦Z≦60の範囲にある数である。)からなる
情報記録媒体を用いることによシ達成される。
The above purpose is to use an information recording medium in an information recording member whose average composition in the film thickness direction is Bix Se7 Mz (However, M FiSi e In @ Ag I Cu *
At least one element selected from the group consisting of Au, and X, Y, and Z are each 5≦X≦60.20≦Y≦
The number is in the range of 60,5≦Z≦60. ) is achieved by using an information recording medium consisting of:

〔作用〕[Effect]

真空蒸着で形成し九B1とSeよシ成る薄膜は、加熱に
よシ非晶質状態から結晶質状態に構造変化し、この変化
によシ、薄膜の反射率、透過率等の光学的特性が変化す
る。このとき、加熱による温度が結晶化温度に至るまで
は、光学的特性がほとんど変化せず、結晶化温度に至る
と直ぐに光学的特性が変化する。これは、記録媒体の使
用環境や保存時の温度が高くても、結晶化温度よシ低け
れば光学的特性が変化しないため、記録媒体の長寿命化
において有利である。しかし、上記媒体では、Biの光
吸収性が大きいため、媒体における光の干渉を利用して
非晶質状態での反射率を小さくすることが難しく、結晶
化前後の反射率変化を大きくすることができない。従っ
て、情報の再生時、その再生信号レベルが小さく、情報
の質が悪かった。
A thin film formed by vacuum evaporation and composed of 9B1 and Se undergoes a structural change from an amorphous state to a crystalline state upon heating, and this change changes the optical properties such as reflectance and transmittance of the thin film. changes. At this time, the optical properties hardly change until the temperature due to heating reaches the crystallization temperature, and as soon as the temperature reaches the crystallization temperature, the optical properties change. This is advantageous in extending the life of the recording medium, because even if the environment in which the recording medium is used or the temperature during storage is high, the optical characteristics will not change as long as it is lower than the crystallization temperature. However, in the above medium, since Bi has high light absorption, it is difficult to reduce the reflectance in the amorphous state by utilizing light interference in the medium, which increases the change in reflectance before and after crystallization. I can't. Therefore, when information is reproduced, the reproduction signal level is low and the quality of the information is poor.

そこで、発明者はB1とSeよ)なる薄膜に、光吸収性
の少ない第3元素を含有させ、非晶質状態の反射率を下
げ、結晶化前後の反射率変化を大きくすることを図った
。第3元素として要求される材料特性としては、■再生
レーザー波長830nmK対して、光吸収性が低いこと
、■記録媒体の結晶化温度を下げないために、4配位ま
たは3配泣の共有結合性材料であること、■耐酸化性が
あることなど1以上の3点が挙げられる。従って、第3
元素としては、Si 、 In 、 Geが好ましく、
よシ好ましくは、Si、Inである。
Therefore, the inventor attempted to incorporate a third element with low light absorption into the thin film (B1 and Se) to lower the reflectance in the amorphous state and increase the change in reflectance before and after crystallization. . The material properties required for the third element include: 1) low light absorption for the reproduction laser wavelength of 830 nmK, 2) 4-coordination or 3-coordination covalent bond in order not to lower the crystallization temperature of the recording medium. The following three points can be mentioned: (1) being a resistant material; and (2) having oxidation resistance. Therefore, the third
As the element, Si, In, and Ge are preferable,
More preferably, Si or In is used.

そこで1発明者は第3元素のSif:BiとSsと共に
真空蒸着によ)形成して記録媒体を得た。その結果、非
晶質状態での反射率を2(lから10チに小さくするこ
とができた。次に、該媒体にパルス幅が長くパワーの弱
い半導体レーザ光を照射して加熱すると該媒体の反射率
は増加し、30%になった。これは、B1とSeの2元
素による媒体の結晶状態の反射率とほぼ同じである。従
って、Slを含有したことによシ非晶質状態の反射率が
低くな夛、半導体レーザ光照射前後の反射率変化を大き
くすることができた。第3元素として、Slのかわ)に
Inを含有させても、上記とtlぼ同様な結果が得られ
た。
Therefore, one inventor obtained a recording medium by forming Sif:Bi and Ss (by vacuum evaporation) as a third element. As a result, we were able to reduce the reflectance in the amorphous state from 2 (l) to 10 l.Next, when the medium was heated by irradiating a semiconductor laser beam with a long pulse width and low power, the medium The reflectance of the medium increased to 30%. This is almost the same as the reflectance of the crystalline state of the medium due to the two elements B1 and Se. Therefore, due to the inclusion of Sl, the amorphous state Since the reflectance of the phosphor was low, we were able to increase the change in the reflectance before and after irradiation with the semiconductor laser beam.Even if In was added to the slium as the third element, almost the same results as above were obtained. Obtained.

また上記したB1−8s −Si 、 Bi −8s−
Inの各記録媒体に、Ag 、 Cu 、 Auのうち
少なくとも1元素を含、有させることによシ、結晶状態
の反射率は、含有させないときよりも増大した。Ag 
、 Cu 、 Auのうち少なくとも1元素を含有させ
ることによシ、結晶状態の反射率は、30%から40チ
に増大した。
In addition, the above-mentioned B1-8s -Si, Bi -8s-
By containing or having at least one element among Ag, Cu, and Au in each In recording medium, the reflectance in the crystalline state was increased compared to when it was not contained. Ag
By containing at least one element among , Cu, and Au, the reflectance in the crystalline state increased from 30% to 40%.

Ag 、 Cu 、 Auは1価の金属であるために1
記録媒体内のダングリングボンドを終端し、延いては記
録膜の自由電子密度が増大し、反射率が増大したと考え
られる。Ag 、 Cu 、 Auの少なくとも1元素
の含有量は、30原子チ以下が好ましく、20原子チ以
下がよシ好ましい。
Since Ag, Cu, and Au are monovalent metals,
It is thought that the dangling bonds in the recording medium are terminated, and as a result, the free electron density of the recording film is increased, and the reflectance is increased. The content of at least one of Ag, Cu, and Au is preferably 30 atoms or less, more preferably 20 atoms or less.

さらに、発明者は該媒体の結晶質状態にパルス幅が短く
パワーの強い半導体レーザ光を照射した所、反射率が減
少し、次に、パルス幅が長くパワーの弱い半導体レーザ
光を照射すると反射率が増加することを発見した。
Furthermore, the inventor found that when the crystalline state of the medium was irradiated with a semiconductor laser beam with a short pulse width and high power, the reflectance decreased, and then when the crystalline state of the medium was irradiated with a semiconductor laser beam with a long pulse width and low power, it was reflected. found that the rate increases.

したがって、該媒体にパワーの弱い半導体レーザ光を予
め連続に照射して結晶質状態にしておき情−に応じたパ
ルス幅の短いパワーの強い半導体レーザ光を照射して加
熱し、該箇所を非晶質状態にして記録し、更にパワーの
弱い半導体レーザ光を連続に照射して先に記録によシ非
晶質状態になった箇所を結晶質状態に変えて、未記録状
態にもどし消去できる。この後、情報を記録する場合、
先の記録と同様に情報に応じてパルス幅が短くパワーの
強い半導体レーザ光を照射して非晶質状態で記録すれば
よい。
Therefore, the medium is continuously irradiated with low-power semiconductor laser light in advance to make it crystalline, and then the medium is heated by irradiation with high-power semiconductor laser light with a short pulse width depending on the situation, and the area is heated. It is possible to record in a crystalline state, and then continuously irradiate the area with a weaker-power semiconductor laser beam to change the amorphous state caused by recording to a crystalline state, returning it to an unrecorded state and erasing it. . After this, if you want to record information,
As with the previous recording, recording may be performed in an amorphous state by irradiating semiconductor laser light with a short pulse width and high power depending on the information.

ここで、該媒体の好適な膜厚方向の平均組成はBix 
Se7 Mzとして、MはSi 、 In * Ag 
、 Cu 、 Auからなる群から選ばれた少なくとも
一つの元素であり、 X=5〜60原子チ Y=原子−60原子チ Z=S〜60原子チ である。MとしてAg * Cu 、 Au  の少な
くとも1元素を含有させるときは、それらの含有率は3
0原子チ以下にする必要がある。30原子チよシ多く含
有した場合には、非晶質状態での反射率が高くなること
よシ、非晶質−結晶質間の反射率変化が小さくなシ、実
用的でない。
Here, the preferred average composition in the film thickness direction of the medium is Bix
As Se7 Mz, M is Si, In*Ag
, Cu, and Au, and X=5 to 60 atoms, Y=atom-60 atoms, and Z=S to 60 atoms. When at least one element of Ag*Cu and Au is contained as M, the content rate thereof is 3
It must be less than 0 atoms. If more than 30 atoms are contained, it is not practical because the reflectance in the amorphous state increases and the change in reflectance between the amorphous and crystalline states becomes small.

また、B1が5原子−未満の場合、またはSsが60原
子チよシ大きい場合、または31″lまたけInが60
原子俤よシ大きい場合には、該媒体の半導体レーザ光の
吸収性がほとんどなく、現状のレーザパワーでは、加熱
するに不可能である。
In addition, when B1 is less than 5 atoms, or when Ss is more than 60 atoms, or when In is 60
When the size of the medium is larger than that of an atomic beam, the medium has almost no absorption of semiconductor laser light, and it is impossible to heat the medium with the current laser power.

また、B1が60原子チよシ大きい場合、またはSeが
20原子チ未満の場合、またはSlまたはInが5原子
チ未満の場合には、該媒体の非晶質状態の反射率が高く
なることよシ、非晶質−結晶質間の反射率変化が小さく
なシ、実用的でない。以上から上記範囲に限定される。
Furthermore, when B1 is larger than 60 atoms, Se is less than 20 atoms, or Sl or In is less than 5 atoms, the reflectance of the amorphous state of the medium increases. However, since the change in reflectance between amorphous and crystalline materials is small, it is not practical. From the above, it is limited to the above range.

〔実施例〕〔Example〕

以下、本発明の実施例について説明する。 Examples of the present invention will be described below.

(第1の実施例) 第1図は本発明の第1の実施例としての情報記録用部材
の構造を模式的に示した断面図である。
(First Embodiment) FIG. 1 is a sectional view schematically showing the structure of an information recording member as a first embodiment of the present invention.

第1図に示す情報記録用部材はディスクであり、光学を
形成し、更にその上次に紫外線硬化樹脂保護膜3を形成
して成る。
The information recording member shown in FIG. 1 is a disk, on which an optical element is formed and an ultraviolet curing resin protective film 3 is formed thereon.

本実施例において、記録媒体2は、次の様にして形成し
た。即ち、Bi 、 Ss 、 Siをそれぞれ別々の
蒸着ボートに入れ、真空度5 X 10−5paにした
後に、上記蒸着ボートに同時に電流を流し、蒸着ボート
の上方で12 Orpmの回転数で回転している基板I
 K B15o 5e5o 5i2oの組成で膜厚10
00Aの記録媒体2を形成した。そして、この様に記録
媒体2を形成した後に、該記録媒体面に紫外線硬化樹脂
をスピン塗布し、紫外線照射によシ硬化させて保護膜3
を約10μm形成し、これを情報記録用部材とした。
In this example, the recording medium 2 was formed as follows. That is, Bi, Ss, and Si were placed in separate evaporation boats, and the vacuum level was set to 5 x 10-5 pa, and then current was applied to the evaporation boats at the same time, and the boats were rotated at a rotation speed of 12 Orpm above the evaporation boats. Board I
Film thickness 10 with composition K B15o 5e5o 5i2o
A recording medium 2 of 00A was formed. After forming the recording medium 2 in this manner, an ultraviolet curing resin is spin-coated on the surface of the recording medium and cured by ultraviolet irradiation to form a protective film 3.
was formed to a thickness of approximately 10 μm, and this was used as an information recording member.

また、本実施例における記録媒体2の特性を知るために
、蒸着と同時に、φ25m1のガラス板を基板1に貼シ
付け、テストピースとしてガラス板上に上記記録媒体2
を形成したものを得た。そして、この様に得られたテス
トピースを、次に250℃。
In addition, in order to know the characteristics of the recording medium 2 in this example, a glass plate with a diameter of 25 m1 was attached to the substrate 1 at the same time as the vapor deposition, and the recording medium 2 was placed on the glass plate as a test piece.
I got one that formed. The test piece thus obtained was then heated to 250°C.

30分間の熱処理を施し、その前後においての反射率分
光特性を第2図に示す如く測定した。
A heat treatment was performed for 30 minutes, and the reflectance spectral characteristics before and after the heat treatment were measured as shown in FIG.

第2図において、熱処理前の特性を曲線4に、熱処理後
の特性を曲線5に示す。第2図に示す様に、半導体レー
ザの波長が830℃mである場合において、該記録媒体
2の反射率は、熱処理の前後で11チから31%に増大
した。
In FIG. 2, curve 4 shows the characteristics before heat treatment, and curve 5 shows the characteristics after heat treatment. As shown in FIG. 2, when the wavelength of the semiconductor laser was 830° C.m, the reflectance of the recording medium 2 increased from 11% to 31% before and after the heat treatment.

次に、前記した本実施例における情報記録用部材を回転
数180Orpmで回転させながら、記録再生消去実験
を行なった。半導体レーザの波長は830℃mであり、
スポット径は1μmである。記録に際しては、レーザパ
ワーを8mWとし周波数5MH2とした。消去に際して
は、レーザパワーを4mWとし、数回照射することによ
少記録された情報を消去することができた。上記レーザ
パワー条件でON比55dB以上の記録ができ、消去も
信号レベルを25 dBと小さくできた。さらに、20
回の記録・消去を繰返したところ、信号レベルの低下を
2dB以内におさえられ良好な結果を得た。
Next, a recording/reproducing/erasing experiment was conducted while rotating the information recording member in this example described above at a rotational speed of 180 rpm. The wavelength of the semiconductor laser is 830°Cm,
The spot diameter is 1 μm. During recording, the laser power was 8 mW and the frequency was 5 MH2. For erasing, the laser power was set to 4 mW, and a small amount of recorded information could be erased by irradiating it several times. Under the above laser power conditions, recording with an ON ratio of 55 dB or more was possible, and erasing was also possible at a signal level as low as 25 dB. In addition, 20
When recording and erasing was repeated several times, the drop in signal level was suppressed to within 2 dB and good results were obtained.

(第2の実施例) 次に、本発明の第2の実施例について説明する。(Second example) Next, a second embodiment of the present invention will be described.

本実施例における情報記録用部材の構成は、前述の第1
の実施例と同様であり、即ち、第1図に示す如くである
The configuration of the information recording member in this example is the same as the first one described above.
This embodiment is similar to that of the embodiment of FIG.

また、本実施例における記録媒体2はBi −9e −
Si−Agの4元素から成シ、次の様に形成した。即ち
、Bi 、 Se 、 Si 、 Agをそれぞれ別々
の蒸着ボートに入れ、真空度5X10  paにした後
に、上記蒸着ボートに同時に電流を流し、蒸着ボートの
上方で12Orpmの回転数で回転している基板1にB
150Se4s 5i2o Agsの組成で膜厚が約8
0OAの記録媒体2を得た。
Moreover, the recording medium 2 in this embodiment is Bi −9e −
It was composed of four elements, Si--Ag, and was formed as follows. That is, Bi, Se, Si, and Ag were placed in separate evaporation boats, and after the vacuum level was set to 5×10 pa, electric current was applied to the evaporation boats at the same time, and the substrate was rotated at a rotation speed of 12 Orpm above the evaporation boats. 1 to B
The film thickness is about 8 with the composition of 150Se4s 5i2o Ags.
A recording medium 2 of 0OA was obtained.

また、第1の実施例の場合と同様にガラス板上に該記録
媒体を形成し、テストピースとした。そして、該テスト
ピースを、250℃、30分間の熱処理を施し、その前
後においての反射率分光特性を第3図に示す如く測定し
た。第3図において、熱処理前の特性を曲線6に、熱処
理後の特性を曲線7に示す。第3図に示す様に、半導体
レーザの波長が830℃mである場合において、該記録
媒体2の反射率は熱処理の前後で11チから40チに増
大した。
Further, the recording medium was formed on a glass plate as in the case of the first example, and a test piece was prepared. Then, the test piece was subjected to heat treatment at 250° C. for 30 minutes, and the reflectance spectral characteristics before and after the heat treatment were measured as shown in FIG. In FIG. 3, curve 6 shows the characteristics before heat treatment, and curve 7 shows the characteristics after heat treatment. As shown in FIG. 3, when the wavelength of the semiconductor laser was 830° C.m, the reflectance of the recording medium 2 increased from 11 inches to 40 inches before and after the heat treatment.

また、得られた情報記録部材を第1の実施例と同様に記
録再生消去実験を行なった所、ON比57dB以上、消
去の信号レベル20dBで、20回の記録消去で3dB
低下におさえられ、良好な結果を得た。
Further, when the obtained information recording member was subjected to a recording/reproducing/erasing experiment in the same manner as in the first example, it was found that the ON ratio was 57 dB or more, the erasing signal level was 20 dB, and 20 times of recording/erasing resulted in a 3 dB loss.
Good results were obtained.

(比較例) 次に、上記した2つの実施例の性能をよシ明確化するた
めに、次の様な比較例を求めて見た。
(Comparative Example) Next, in order to clarify the performance of the above-mentioned two embodiments, the following comparative example was obtained.

本比較例における情報記録用部材の構成は、第1の実施
例と同様であり、即ち、第1図に示す如くである。
The structure of the information recording member in this comparative example is the same as that in the first example, that is, as shown in FIG.

ま蛇、本比較例における記録媒体2はBi −8s −
81の元素から成シ、次の様に形成した。即ち、Bi。
By the way, the recording medium 2 in this comparative example is Bi-8s-
It was composed of 81 elements and was formed as follows. That is, Bi.

Se 、 Si  をそれぞれ別々の蒸着ボートに入れ
、真空度5X10paにした後に、上記蒸着ボートに同
時に電流を流し、蒸着ボートの上方で12Orpmの回
転数で回転している基板1にB17(I 5e11) 
512gの組成で膜厚が約80OAの記録媒体2を得た
After putting Se and Si into separate deposition boats and setting the vacuum to 5 x 10 pa, current was simultaneously applied to the deposition boats, and B17 (I 5e11) was applied to the substrate 1 rotating at a rotation speed of 12 Orpm above the deposition boats.
A recording medium 2 having a composition of 512 g and a film thickness of about 80 OA was obtained.

また、第1の実施例の場合と同様にガラス板上に該記録
媒体を形成し、テストピースとした。そして、該テスト
ピースを、250℃、30分間の熱処理を施し、その前
後においての反射率分光特性を第4に示す如く測定した
。第4図において、熱処理前の特性を曲線8に、熱処理
後の特性を曲線9に示す。第4図に示す様に半導体レー
ザの波長が830℃mである場合において、該記録媒体
2の反射率は熱処理の前後で21チから31%に増大し
た。しかし、得られた情報記録用部材を第1の実施例と
同様に記録再生実験を行なった所、CN比30dBであ
り、実用レベル以下であった。これは、熱処理前の反射
率が21チと高いために、反射率変化が小さくなシ、C
N比が低くなったものである。
Further, the recording medium was formed on a glass plate as in the case of the first example, and a test piece was prepared. Then, the test piece was subjected to heat treatment at 250° C. for 30 minutes, and the reflectance spectral characteristics before and after the heat treatment were measured as shown in Section 4. In FIG. 4, curve 8 shows the characteristics before heat treatment, and curve 9 shows the characteristics after heat treatment. As shown in FIG. 4, when the wavelength of the semiconductor laser was 830° C.m, the reflectance of the recording medium 2 increased from 21% to 31% before and after the heat treatment. However, when the obtained information recording member was subjected to a recording/reproduction experiment in the same manner as in the first example, the CN ratio was 30 dB, which was below the practical level. This is because the reflectance before heat treatment is as high as 21 cm, so the change in reflectance is small.
This has a low N ratio.

さて、以上述べた実施例及び比較例以外にも、様々な例
について求めて見た。その結果を次の表1に示す。
Now, in addition to the Examples and Comparative Examples described above, various other examples were investigated. The results are shown in Table 1 below.

表  1 N111,2は、上記した第1及び第2の実施例の場合
であり、また、随3は、前記比較例の場合である。表1
には、各記録媒体組成においてのC/Nが示されている
。判定の欄で、×はCハが45dB未満であシ実用的で
ないもの、OはC/Nが45dB以上であシ好ましいも
の、◎はC/Nが50dB以上で特に好ましいものを示
している。
Table 1 N111,2 is for the first and second embodiments described above, and Table 3 is for the comparative example. Table 1
shows the C/N for each recording medium composition. In the judgment column, × indicates that the C/N is less than 45 dB and is not practical, O indicates that the C/N is 45 dB or more and is preferable, and ◎ indicates that the C/N is 50 dB or more and is particularly preferable. .

以上の結果よシ、Bi −8s−9i系においての好ま
しい組成域を第5図に示す。Bi −8e−In系にお
いても、SlをInに変えた場合の第5図とほぼ同様で
ある。
Based on the above results, the preferred composition range for the Bi-8s-9i system is shown in FIG. In the Bi-8e-In system, the results are almost the same as in FIG. 5 when Sl is replaced with In.

第5図において、5MHzでのC/Nが45dB以上の
好ましい特性を得た記録媒体の組成範囲を実線10−1
1−12−15−14−15で囲った。ここで、Bi。
In FIG. 5, the solid line 10-1 indicates the composition range of the recording medium that has obtained preferable characteristics of C/N of 45 dB or more at 5 MHz.
1-12-15-14-15. Here, Bi.

Ss 、 Siの組成は、それぞれ50〜60,20〜
60,5〜60 原子−の範囲である。この組成範囲は
、Bi。
The compositions of Ss and Si are 50-60 and 20-60, respectively.
The range is from 60,5 to 60 atoms. This composition range is Bi.

Ss 、 Inにおいても同様であった。The same was true for Ss and In.

また、Cハが50dB以上の特に好ましい特性を得た組
成範囲を破線16−17−実線15−10で囲った。こ
こで、Bi 、 Ss 、 Siの組成は、それぞれ2
0〜60.50〜60.5〜50原子チである。この組
成範囲は、Bi 、 Ss 、 Inにおいても同様で
あった。
Further, the composition range in which a particularly preferable characteristic of Cc of 50 dB or more was obtained is surrounded by broken lines 16-17 and solid lines 15-10. Here, the compositions of Bi, Ss, and Si are each 2
0 to 60.50 to 60.5 to 50 atoms. This composition range was also the same for Bi, Ss, and In.

また、MとしてAg、 Cu 、 Auの1元素を含有
させた場合の記録媒体の組成とC/Nの関係を表1の曵
2、i5,14.i5に示した。Ag 、 Cu 、 
Auの少なくとも1元素を30原子チ以下含有させるこ
とによシ、高C/Nが得られた。
In addition, the relationship between the composition of the recording medium and the C/N when one of Ag, Cu, and Au is contained as M is shown in Table 1, i5, i5, 14. Shown in i5. Ag, Cu,
A high C/N was obtained by containing at least one element of Au in an amount of 30 atoms or less.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、半導体レーザ等によって情報の記録・
再生・消去を行うのに適した情報記録媒体が得られ、光
ディスクの用途を拡大させることができる。
According to the present invention, information is recorded and recorded by a semiconductor laser or the like.
An information recording medium suitable for reproducing and erasing can be obtained, and the uses of optical discs can be expanded.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明による情報記録用部材の断面図、第2
図は、本発明の第1の実施例における記録媒体の反射率
分光特性を示すグラフ、第3図は、本発明の第2の実施
例における記録媒体の反射率分光特性を示すグラフ、第
4図は、第1及び第2の実施例との比較例における記録
媒体の反射率分光特性を示すグラフ、第5図は、本発明
における良好な組成範囲を説明するための説明図である
。 1・・・基板 2・・・記録媒体 3・・・保護膜 4.6.8・・・熱処理前の反射率分光特性5.7.9
・・・熱処理後の反射率分光特性。 1 基紙 Z 託シを媒体 波長(−11気) 第3図 渫長C筑) Sj (眞、1す
FIG. 1 is a sectional view of an information recording member according to the present invention, and FIG.
The figures are graphs showing the reflectance spectral characteristics of the recording medium in the first embodiment of the present invention, FIG. 3 is a graph showing the reflectance spectral characteristics of the recording medium in the second embodiment of the invention, and The figure is a graph showing the reflectance spectral characteristics of a recording medium in a comparative example with the first and second examples, and FIG. 5 is an explanatory diagram for explaining a favorable composition range in the present invention. 1...Substrate 2...Recording medium 3...Protective film 4.6.8...Reflectance spectral characteristics before heat treatment 5.7.9
...Reflectance spectral characteristics after heat treatment. 1 Base paper Z Consignment to medium wavelength (-11 ki) Fig. 3

Claims (1)

【特許請求の範囲】 1、記録用光ビームの照射によりその原子配列が変化し
得る情報記録用媒体を基板上に形成して成る情報記録用
部材において、前記情報記録用媒体は、その膜厚方向の
平均組成がBi_XSe_YM_Z(ただし、MはSi
、In、Ag、Cu、Auからなる群から選ばれた少な
くとも一つの元素であり、X、Y、Zは、それぞれ5≦
X≦60、20≦Y≦60、5≦Z≦60の範囲の数で
ある。)であることを特徴とする情報記録用部材。 2、特許請求の範囲の第1項記載の情報記録用部材にお
いて、前記情報記録用媒体がMとしてAg、Cu、Au
のうち少なくとも一つの元素を含有した場合、それらの
含有率を30原子%以下としたことを特徴とする情報記
録用部材。
[Scope of Claims] 1. An information recording member comprising an information recording medium whose atomic arrangement can be changed by irradiation with a recording light beam on a substrate, wherein the information recording medium has a film thickness that is The average composition in the direction is Bi_XSe_YM_Z (where M is Si
, In, Ag, Cu, and Au, and each of X, Y, and Z is 5≦
The number is in the range of X≦60, 20≦Y≦60, and 5≦Z≦60. ) An information recording member characterized by: 2. In the information recording member according to claim 1, where M is Ag, Cu, or Au.
An information recording member characterized in that when it contains at least one of the elements, the content thereof is 30 atomic % or less.
JP61301226A 1986-12-19 1986-12-19 Member for information recording Pending JPS63155435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61301226A JPS63155435A (en) 1986-12-19 1986-12-19 Member for information recording

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61301226A JPS63155435A (en) 1986-12-19 1986-12-19 Member for information recording

Publications (1)

Publication Number Publication Date
JPS63155435A true JPS63155435A (en) 1988-06-28

Family

ID=17894299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61301226A Pending JPS63155435A (en) 1986-12-19 1986-12-19 Member for information recording

Country Status (1)

Country Link
JP (1) JPS63155435A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63304439A (en) * 1987-06-05 1988-12-12 Hitachi Ltd Thin film for information recording

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63304439A (en) * 1987-06-05 1988-12-12 Hitachi Ltd Thin film for information recording

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