JPS63149554U - - Google Patents

Info

Publication number
JPS63149554U
JPS63149554U JP4283687U JP4283687U JPS63149554U JP S63149554 U JPS63149554 U JP S63149554U JP 4283687 U JP4283687 U JP 4283687U JP 4283687 U JP4283687 U JP 4283687U JP S63149554 U JPS63149554 U JP S63149554U
Authority
JP
Japan
Prior art keywords
recess
pressure sensor
semiconductor
semiconductor substrate
semiconductor pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4283687U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4283687U priority Critical patent/JPS63149554U/ja
Publication of JPS63149554U publication Critical patent/JPS63149554U/ja
Pending legal-status Critical Current

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  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例の構成説明図、第2
図は第1図の動作説明図、第3図は第2図の部品
説明図、第4図は第1図の動作説明図、第5図は
本考案の他の実施例の構成説明図、第6図は本考
案の別の実施例の構成説明図である。 1……半導体基板、2……凹部、3……ダイア
フラム、A……マスク、B……穴、C……サンド
ブラストノズル、D……テープ、E……サンドブ
ラストノズル、F……テーブル。
Figure 1 is an explanatory diagram of the configuration of one embodiment of the present invention;
3 is an explanatory diagram of the operation of FIG. 1, FIG. 3 is an explanatory diagram of the parts of FIG. 2, FIG. 4 is an explanatory diagram of the operation of FIG. 1, and FIG. 5 is an explanatory diagram of the configuration of another embodiment of the present invention. FIG. 6 is a diagram illustrating the configuration of another embodiment of the present invention. 1... Semiconductor substrate, 2... Recess, 3... Diaphragm, A... Mask, B... Hole, C... Sandblasting nozzle, D... Tape, E... Sandblasting nozzle, F... Table.

Claims (1)

【実用新案登録請求の範囲】 半導体基板と、該半導体基板に形成された凹部
と、該凹部によつて形成され入力圧を受圧するダ
イアフラムとを具備する半導体圧力センサにおい
て、 前記凹部が前記半導体基板の凹部位置に対応し
て穴があけられたマスクを介したサンドブラスト
加工により形成されたことを特徴とする半導体圧
力センサ。
[Claims for Utility Model Registration] A semiconductor pressure sensor comprising a semiconductor substrate, a recess formed in the semiconductor substrate, and a diaphragm formed by the recess and receiving input pressure, wherein the recess is connected to the semiconductor substrate. 1. A semiconductor pressure sensor, characterized in that it is formed by sandblasting through a mask with holes drilled corresponding to the recess positions of the semiconductor pressure sensor.
JP4283687U 1987-03-24 1987-03-24 Pending JPS63149554U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4283687U JPS63149554U (en) 1987-03-24 1987-03-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4283687U JPS63149554U (en) 1987-03-24 1987-03-24

Publications (1)

Publication Number Publication Date
JPS63149554U true JPS63149554U (en) 1988-10-03

Family

ID=30859133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4283687U Pending JPS63149554U (en) 1987-03-24 1987-03-24

Country Status (1)

Country Link
JP (1) JPS63149554U (en)

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