JPS6314786A - Spironaphthoxazine based compound and photosensitive material using said compound - Google Patents
Spironaphthoxazine based compound and photosensitive material using said compoundInfo
- Publication number
- JPS6314786A JPS6314786A JP61160124A JP16012486A JPS6314786A JP S6314786 A JPS6314786 A JP S6314786A JP 61160124 A JP61160124 A JP 61160124A JP 16012486 A JP16012486 A JP 16012486A JP S6314786 A JPS6314786 A JP S6314786A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- formula
- atom
- spironaphthoxazine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 44
- 239000000463 material Substances 0.000 title claims abstract description 22
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 22
- 125000005843 halogen group Chemical group 0.000 claims abstract description 14
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 12
- 125000004429 atom Chemical group 0.000 claims abstract description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 6
- 125000005138 alkoxysulfonyl group Chemical group 0.000 claims abstract description 5
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims abstract description 5
- 125000003118 aryl group Chemical group 0.000 claims abstract description 4
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000005156 substituted alkylene group Chemical group 0.000 claims 2
- 125000005649 substituted arylene group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 abstract description 3
- 238000004040 coloring Methods 0.000 abstract description 3
- 125000004183 alkoxy alkyl group Chemical group 0.000 abstract description 2
- 125000002947 alkylene group Chemical group 0.000 abstract description 2
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical class C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 abstract 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 16
- 239000002904 solvent Substances 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- -1 methoxyethyl group Chemical group 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- BXXWFOGWXLJPPA-UHFFFAOYSA-N 2,3-dibromobutane Chemical compound CC(Br)C(C)Br BXXWFOGWXLJPPA-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000012454 non-polar solvent Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 244000055346 Paulownia Species 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000004042 decolorization Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920013716 polyethylene resin Polymers 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- ORIHZIZPTZTNCU-VMPITWQZSA-N 2-[(E)-hydroxyiminomethyl]phenol Chemical compound O\N=C\C1=CC=CC=C1O ORIHZIZPTZTNCU-VMPITWQZSA-N 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 241000283986 Lepus Species 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000006125 ethylsulfonyl group Chemical group 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229920006230 thermoplastic polyester resin Polymers 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、フォトクロミック性を有する新規なスピロナ
フトオキサジン系化合物及び該化合物を溶解ある−は分
散した樹脂を含有する感光層を基板上に有する感光祠料
に関するものである。Detailed Description of the Invention (Industrial Application Field) The present invention provides a photosensitive layer on a substrate containing a novel spironaphthoxazine compound having photochromic properties and a resin in which the compound is dissolved or dispersed. It is related to photosensitive amulets.
光の照射により発色又は消色するフォトクロミック性を
有することは知られており、これを使用したフォトクロ
ミック感光拐料が梅々提案されて因る。It is known that it has a photochromic property that develops or discolors when irradiated with light, and a number of photochromic photosensitive materials using this property have been proposed.
例えば、特公昭Bj−2ととデー号には、次式の様なス
ピロナフトオキサジン系化合物を含有するフォトクロミ
ック材料が提案されてbる。For example, in Japanese Patent Publication No. Bj-2 and D, a photochromic material containing a spironaphthoxazine compound as shown in the following formula is proposed.
(式中、1(1は水素原子、ハロゲン原子、シアン基、
炭素数7〜♂のアルキル基またはアルコキシ基を示す。(In the formula, 1 (1 is a hydrogen atom, a halogen atom, a cyan group,
Indicates an alkyl group or alkoxy group having 7 to ♂ carbon atoms.
)
また、特公昭419−41/に3/号には、次式の様な
スピロナフトオキサジン系化合物を高分子物質中に分散
窩せたフ第1・クロミック感光桐料= 3−
が提案されてbる。) Furthermore, in Japanese Patent Publication No. 419-41/3/, a fu-1 chromic photosensitive paulownia material = 3- was proposed in which a spironaphthoxazine compound as shown in the following formula was dispersed in a polymeric substance. Tebru.
b
(式中、Rbハ(:0H2fncQOJ (−On、+
nON −1タロi% OH7九〇〇0R(Rは炭素
数/〜!のアルキル基)、ROおよびHdは炭素数/〜
!のアルキル基;Cは水素原子、炭素数7〜1個のアル
キル基、ハロゲン原子、ニトロ基、シアン基、炭素数−
〜g(IIのアルコキシカルボニル基または炭素数/〜
J’ 個のアルコキシ基を示す。)また、特開昭オΔ−
−−3乙λ♂グ号には、次式の様なフォトクロミック化
合物が提案されてbる。b (wherein, Rbc(:0H2fncQOJ (-On, +
nON -1 Talo i% OH79000R (R is an alkyl group with carbon number/~!), RO and Hd have carbon number/~
! alkyl group; C is a hydrogen atom, an alkyl group having 7 to 1 carbon atoms, a halogen atom, a nitro group, a cyan group, a carbon number -
~g(alkoxycarbonyl group or carbon number of II/~
Indicates J' alkoxy groups. ) Also, Tokukai Akio Δ-
--3 Otsu λ♂g issue proposes a photochromic compound as shown in the following formula.
OH8
(式中、R’ 、LHR“の一つはハロゲン原子又は低
級アルコキシ基で他の一つは水嵩原子で、又HhとR1
は水素原子、低級アルキル基、低級アルコキシ基、又は
ハロゲン原子を示す。)また、UEIPグ、3グコ、6
6ざには、次式の様なフォトクロミック化合物が提案さ
れている。OH8 (in the formula, one of R' and LHR" is a halogen atom or a lower alkoxy group, the other is a water bulk atom, and Hh and R1
represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, or a halogen atom. ) Also, UEIP, 3, 6
Sixth, photochromic compounds as shown in the following formula have been proposed.
Rn
(式中 HjとPの一つはハロゲン原子又は低級アルコ
キシ基で、他の一つは水素原子で、また、R1とaff
iは水嵩原子、低級アルキル基、低級アルコキシ基、又
はハロゲン原子を示し、Rnは炭素数2から/θまでの
アルキル基を示す。)通常、フォトクロばツク感光I料
は、上述の様に高分子化合物にスピロナフトオキサジン
化合物を溶解あるいは分散させたものなフィルム状に製
膜して使用される。Rn (in the formula, one of Hj and P is a halogen atom or a lower alkoxy group, the other is a hydrogen atom, and R1 and aff
i represents a bulky water atom, a lower alkyl group, a lower alkoxy group, or a halogen atom, and Rn represents an alkyl group having 2 to /θ carbon atoms. ) Usually, the photochromic photosensitive I material is used in the form of a film in which a spironaphthoxazine compound is dissolved or dispersed in a polymer compound as described above.
物の場合、発色濃度および着色状態の堅牢性が必ずしも
十分でなかった。従って、発色、・消色のコントラスト
が良好で大きな発色刺度を示す虹牢なフォトクロミック
感光材料が得られていない。In the case of products, the color density and the fastness of the colored state were not necessarily sufficient. Therefore, it has not been possible to obtain a photochromic light-sensitive material that exhibits a good contrast between coloring and decoloring and a high degree of coloring.
(発明が解決しようとする問題点)
本発明は発色飯就が大きく、庸色状態の堅牢性に優れて
bて発色・消色のくシ返し安定性の良好なフォトクロミ
ック性を有するスピロナフトオキサジン系化合物及び該
化合物を含有する感光j−よシ成る感光材料を提供しよ
うというものである。(Problems to be Solved by the Invention) The present invention provides spironaphthoxazine, which has great color development performance, excellent fastness in the normal color state, and photochromic properties with good cycling stability for color development and decolorization. The object of the present invention is to provide a photosensitive material comprising a compound based on the compound and a photosensitive material containing the compound.
(問題点を解決するだめの手段)
すなわち、本発明は、一般式〔I〕
XIX家
(式中、xl、X!、Yl、” ハフ /l/ キルi
、7 k コキシアルキル基、シクロアルキル基、アリ
ール基を示し、XIとX2、y+とY2は互いに結合し
環化していてもよい。2は、他の基もしくは原子を介し
ていてもよく、また置換されていてもよりアルキレン、
&、klされていてもよいアリーレン基を示し、R1,
R意、R1、)j4、Rコ、R6,8丁、R11は水素
原仔、ハロゲン原子、アルキル基、アルコキシ基、アル
コキシカルボニル基、アルコキシスルホニル基、アルキ
ルスルホニル基を示す。)
で表わされるスピロナフトオキサジ/系化合物およびそ
れを使用した感光材料である。(Means for Solving the Problems) That is, the present invention provides a general formula [I]
, 7 k represents a koxyalkyl group, a cycloalkyl group, or an aryl group, and XI and X2, and y+ and Y2 may be bonded to each other and cyclized. 2 may be substituted through another group or atom, or even if it is substituted, alkylene,
&, indicates an arylene group which may be kl, and R1,
R, R1,)j4, Rco, R6,8, and R11 represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxysulfonyl group, and an alkylsulfonyl group. ) and a photosensitive material using the same.
本発明の一般式〔1〕で表わされるスピロナフトオキサ
ジン系化合物において、xl 、 x2、Yl、Y2は
0.〜78、好ましくは、01〜番のアルキル基等のア
ルキル基;メトキシエチル基、エトキシエチル基等のア
ルコキシアルキル基;シクロヘキシル基、シフ關ペンチ
ル基等のシクロアルキル基;フェニル基、p−メチルフ
ェニル基、ナフチル基、m−メトキシフェニル基等のア
リール基を示し、XlとX2、Ylとytは互込に環化
し、シクロヘキシル基、シクロペンチル基、シクロへブ
チル基等のシクロアルキル基等を形成してbてもよ込。In the spironaphthoxazine compound represented by the general formula [1] of the present invention, xl, x2, Yl, and Y2 are 0. ~78, preferably, an alkyl group such as an alkyl group of number 01~; an alkoxyalkyl group such as a methoxyethyl group or an ethoxyethyl group; a cycloalkyl group such as a cyclohexyl group or a pentyl group; a phenyl group, p-methylphenyl Xl and X2, Yl and yt are mutually cyclized to form a cycloalkyl group such as a cyclohexyl group, a cyclopentyl group, a cyclohebutyl group, etc. te b moyokomi.
xl、x2、Y8、Y2としては、メチル基、エチル基
、グロビル基、ブチル基、フェニル基または塊化したシ
クロヘキシル基等が好ましい。As xl, x2, Y8, Y2, methyl group, ethyl group, globyl group, butyl group, phenyl group, agglomerated cyclohexyl group, etc. are preferable.
zとしては、−〇H!−1(OH2+、モan2−)、
+ang−)、、÷0H2−)、、+OH*+6、(O
H1塾そOH,九、LIMsOH3
OH。For z, -〇H! -1 (OH2+, moan2-),
+ang-),,÷0H2-),,+OH*+6,(O
H1 Juku SoOH, 9, LIMsOH3 OH.
−OH,00)L、−1−〇、H400,H,−1占H
3
しくは原子を介しているかまたはf11換されて騒いて
もよいアリーレン基が皐げられる。-OH, 00) L, -1-〇, H400, H, -1 occupancy H
Alternatively, an arylene group which may be substituted through a 3 or atom or substituted with f11 is added.
R1,1(!、R3,1(4、RII、 H”、 R7
、”” としては、水素原子;塩素原子、裏車原子、
日つ累原子等のハロゲン原子+C1〜6のアルキル基等
のアルキル;C4〜。のアルコキシ基等のアルコキシ基
、または、CI〜6のアルコキシカルボニル基等のアル
コキシカルボニル基または、メトキシスルホニル基、エ
トキシスルホニル基等のアルコキシスルホニル基、メチ
ルスルホニル基、エチルスルホニル基等のアルキルスル
ホニル基が挙ケられる。R1,1(!, R3,1(4, RII, H”, R7
, ” means hydrogen atom; chlorine atom, Ugurashi atom,
A halogen atom such as a halogen atom + an alkyl group such as a C1-6 alkyl group; C4~. an alkoxy group such as an alkoxy group, or an alkoxycarbonyl group such as an alkoxycarbonyl group of CI to 6, an alkoxysulfonyl group such as a methoxysulfonyl group or an ethoxysulfonyl group, or an alkylsulfonyl group such as a methylsulfonyl group or an ethylsulfonyl group. Can be mentioned.
本発明の化合物は、例えば、次のようにして製造するこ
とができる。すなわち、下記一般式%式%[111)
(式中、Xl、X2、Yl、Y2、R1、R2、R5、
R6は前記定義に同じ。)
で表わさ力、る一、3.3− トリメチルインドレニン
誘導体に下記一般式[IV]
A−Z−A ・・・・・・・・・
・・・・・〔■〕(式中、人はハロゲン原子を示し、2
は前記定義に同じ。)
で表わされるジハロゲン化物を反応させ、次いで下記一
般式〔■」訃よび〔v1]
N。The compound of the present invention can be produced, for example, as follows. That is, the following general formula % formula % [111) (wherein, Xl, X2, Yl, Y2, R1, R2, R5,
R6 is the same as defined above. ), Ru1, 3.3-trimethylindolenine derivative has the following general formula [IV] A-Z-A...
...[■] (In the formula, human represents a halogen atom, and 2
is the same as the above definition. ) is reacted with a dihalide represented by the following general formula [■] and [v1] N.
(式中、R3,1i、4、R7およびR1は前記定義に
同じ。)
で表わされる/−ニトロン−一一ナフトール訪尋体を反
応させることによって製造することができる。(In the formula, R3, 1i, 4, R7 and R1 are the same as defined above.) It can be produced by reacting a /-nitrone-11 naphthol interferomer represented by the following formula.
ジハロゲン化物によるアルキル化反応は熱溶媒するいは
クロロベンゼン、ジクロロベンゼンなどの芳香族系溶媒
などの非極性溶媒中、と0〜200℃の反応温度で実施
される。好ましくは無溶媒で73θ〜/J−0℃で円滑
に実施できる。The alkylation reaction using a dihalide is carried out in a hot solvent or a nonpolar solvent such as an aromatic solvent such as chlorobenzene or dichlorobenzene at a reaction temperature of 0 to 200°C. Preferably, it can be carried out smoothly at 73θ to /J-0°C without a solvent.
次いで、/−二トロンーーーナフトール誘導体との反応
は、ピペリジン、ピペラジン、モルホリン等の塩基性触
媒の存在下、メタノール、エタノール、グロパノール、
ブタノールなどのアルコール系溶媒、アセトン、メチル
エチルケトンなどのケトン系溶媒、ジクロロメタン、ト
リクロロエタンなどのハロゲン化炭化水lA系溶媒など
の極性又は非極性の溶媒中で、実施される。反応温度は
0−.200℃の範囲で実施される。好ましくは、エタ
ノール、メチルエチルケトン。アセトン中、ピペリジン
触媒の存在下41o〜/2θ℃で円滑に実施できる。Next, the reaction with the /-nitrone-naphthol derivative is carried out using methanol, ethanol, glopanol,
The reaction is carried out in a polar or non-polar solvent such as an alcohol solvent such as butanol, a ketone solvent such as acetone or methyl ethyl ketone, or a halogenated hydrocarbon IA solvent such as dichloromethane or trichloroethane. The reaction temperature was 0-. It is carried out at a temperature of 200°C. Preferably ethanol, methyl ethyl ketone. It can be carried out smoothly in acetone at 41°C to 2θ°C in the presence of a piperidine catalyst.
本発明の化合物は、例えば、次のようにしても製造する
ことができる。すなわち、下記一般式〔■〕
−12〜
■
2 ・・・・・・・曲〔■]〕竜
(式中、xl、)i’t、Yl、Y!、Z、 R1,R
”、)jff、 R11ハ前記定義に同じ。)
で表わされる化合物と前記一般式〔v〕、〔■〕O
(式中、犯、R4、R7、R8は前記定義に同じ。)で
表わされる/−ニトロソー一−2−ナフトール誘導体と
反応させイ)ことによってJR造することができる。The compound of the present invention can also be produced, for example, as follows. That is, the following general formula [■] -12 ~ ■ 2 ... Song [■]] Dragon (in the formula, xl,) i't, Yl, Y! ,Z, R1,R
”, )jff, R11 is the same as the above definition) and the compound represented by the general formula [v], [■]O (wherein, R4, R7, and R8 are the same as the above definition) JR can be produced by reacting with a /-nitroso-2-naphthol derivative a).
反応は通常、メタノール、エタノール、プロパツール、
ブタノールなどのアルコール系溶媒、アセトン、メチル
エチルケトンなどのケトン系溶媒、ジクロロメタン、ト
リクロロエタンなどのハロゲン化炭止水素糸溶媒などの
極性又は非極性溶媒中で、実施される。反応温度は、0
〜200℃の範囲で実施され、好ましくは、4t。The reaction is usually carried out using methanol, ethanol, propatool,
It is carried out in polar or non-polar solvents such as alcoholic solvents such as butanol, ketonic solvents such as acetone, methyl ethyl ketone, and halogenated hydrocarbon solvents such as dichloromethane and trichloroethane. The reaction temperature is 0
It is carried out in the range of ~200°C, preferably 4t.
〜/2θ℃で円滑に実施てきる。It can be carried out smoothly at ~/2θ℃.
本発明の化合物は新規な色累であ如、フォトクロミズム
を示す化合物である。すなわち、本化合物は紫外線照射
により発色し、次に可視光を照射するか、あるーは20
℃以上に加熱すると元の無色の状態になシ、この変化を
くり返すことができる。The compound of the present invention is a compound that exhibits photochromism, such as a novel coloration. That is, this compound develops a color when irradiated with ultraviolet rays, and then irradiated with visible light.
When heated above ℃, it returns to its original colorless state, and this change can be repeated.
本発明の新規な化合物を溶解または分散した樹脂を含有
する感光層を基板上に有する感光材料は、公知の方法に
準じて得ることができる。A photosensitive material having a photosensitive layer on a substrate containing a resin in which the novel compound of the present invention is dissolved or dispersed can be obtained according to a known method.
本発明化合物を溶解又は分散する樹脂としてはポリエス
テル樹脂、ポリスチレン樹脂、ポリビニルブチ2−ル樹
脂、ポリ塩化ビニリデン、ポリ塩化ビニル、ポリメタク
リル酸メチル、ポリ酢酸ビニル、酢酸セルロース、エポ
キシ樹脂、フェノール樹脂等が挙げられ、用騒る溶媒と
しては、四塩化炭素、ベンゼン、シクロヘキサン、メチ
ルエチルケトン、テトラクロロエタン、トルエン、エタ
ノール、エチルセルソルフ等が挙げられる。Examples of the resin for dissolving or dispersing the compound of the present invention include polyester resin, polystyrene resin, polyvinyl butyl resin, polyvinylidene chloride, polyvinyl chloride, polymethyl methacrylate, polyvinyl acetate, cellulose acetate, epoxy resin, phenol resin, etc. Examples of solvents that can be used include carbon tetrachloride, benzene, cyclohexane, methyl ethyl ketone, tetrachloroethane, toluene, ethanol, and ethyl celluloph.
本発明化合物の使用割合としては、樹脂に対して3〜!
θチ、好1しくは!〜−θチである。The ratio of the compound of the present invention to be used is 3~!
θchi, preferably! 〜−θchi.
本発明化合物と樹脂以外の他の添加剤としては、感光材
料の安定化や耐光性を向上させる目的で、−i項酸素ク
エンチャ−として遷移金属キレート化合物(たとえはア
セチルアセトナートキレート、ビスフェニルジチオール
、サリチルアルデヒドオキシム、ビスジチオール−α−
ジケトン等)を含有せしめてもよい。Other additives other than the compound and resin of the present invention include transition metal chelate compounds (such as acetylacetonate chelate, bisphenyldithiol , salicylaldehyde oxime, bisdithiol-α-
diketone, etc.) may be included.
フィルムの形成方法としでは、ドクターグレード法、キ
ャスト法、スピナー法、浸漬法等の一般に行なわ1+る
塗布方法が用いられる。As a method for forming the film, commonly used coating methods such as a doctor grade method, a casting method, a spinner method, and a dipping method are used.
フィルムの厚さはθ、jllIP〜/、0IIIJ、、
好まし一15=
〈は!〜/θOμなである。The thickness of the film is θ,jllIP~/,0IIIJ,,
Desirable 15 = <Ha! ~/θOμ.
本発明における基板としては、透明または不透明のbず
れであってもよいが、基板を感光層の両側に設ける時は
、感光するために少なくとも片面は透明であることが必
要である。基板の材質としては、ガラス、プラスチック
、紙、板状もしくは箔状の金属およびこれらの複合体等
の支持体が用いられるが、種々の点からしてガラスおよ
びプラスチックが好まし騒。そのプラスチックとしては
、たとえば、アクリル樹脂、メタアクリル樹脂、酢酸ビ
ニル樹脂、塩化ビニル樹脂、ポリエチレン樹脂、ポリエ
チレン樹脂、ポリカーボネート樹脂、ポリサルホン樹脂
等があけられる。The substrate in the present invention may be transparent or opaque, but when the substrates are provided on both sides of the photosensitive layer, at least one side must be transparent in order to be exposed to light. As the material of the substrate, supports such as glass, plastic, paper, plate-shaped or foil-shaped metal, and composites thereof are used, but glass and plastic are preferable from various points of view. Examples of the plastic include acrylic resin, methacrylic resin, vinyl acetate resin, vinyl chloride resin, polyethylene resin, polyethylene resin, polycarbonate resin, and polysulfone resin.
以下、本発明を実施例によシ、更に具体的に説明するが
、本発明は以下の実施例に限定されるものではな−。Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the following Examples.
実施例/
下記構造式
で表わされる。2.!、! −)リメチルインドレニン
/j、り9および下記構造式
%式%
で表わされるジブロモブタンlθ、/Iの混合物を11
0℃でダ時間反応させ、室温まで冷却後エタノールaθ
0〆を加え、更に下記構造式で表わされる/−ニトロソ
−2−ナフトール/ 7.j #およびトリエチルアミ
ン/θ、/Iiを加え、窒素雰囲気下2時間還流下反応
させた。冷却後、クロロホルム抽出し、硫酸ナトリウム
で乾燥、溶媒留去し、力2ムクロマトグラフィ−(溶媒
ベンゼン)で分離・精製し、下記構造式で表わされる融
点2コ、t−,227℃のスピロナフトオキサジン系化
合物の無色結晶を得た。Example/ Represented by the following structural formula. 2. ! ,! -) Limethylindolenine /j, ri9 and dibromobutane lθ, /I represented by the following structural formula % formula % A mixture of 11
The reaction was carried out at 0°C for several hours, and after cooling to room temperature, ethanol aθ
0〆 and further represented by the following structural formula /-nitroso-2-naphthol/7. j # and triethylamine/θ,/Ii were added, and the mixture was allowed to react under reflux under a nitrogen atmosphere for 2 hours. After cooling, it was extracted with chloroform, dried over sodium sulfate, the solvent was distilled off, and separated and purified by chromatography (solvent: benzene) to obtain spironaphthate, which has a melting point of 2, t-, 227°C and is represented by the following structural formula. Colorless crystals of an oxazine compound were obtained.
物性値(マススペクトル)は下記の通シである。(測定
条件ニア0BV、、210℃)m/ e t /コ
(M+)
乙j7 (M”−/よ)
/70 (base peak)
本化合物ayを用b1熱可塑性ポリエステル樹脂/θI
(東洋紡社製バイロン−200)、溶媒メチルエチルケ
トン/θθlからなる溶液をポリエステルフィルム(ダ
イヤホイル社製、厚さ10θμ)バーコーター扁3を用
いて塗布し、7j”C,,70分乾燥した。得られた試
料は通常の状態では無色であるが、紫外線照射すると濃
度の高い青色(λ■la、X mにθイnm )に発色
した。The physical property values (mass spectrum) are as follows. (Measurement conditions near 0BV, 210℃) m/e t/co
(M+) Otsuj7 (M”-/yo) /70 (base peak) Using this compound ay b1 Thermoplastic polyester resin/θI
(Vylon-200, manufactured by Toyobo Co., Ltd.), a solution consisting of the solvent methyl ethyl ketone/θθl was applied using a bar coater plate 3 on a polyester film (manufactured by Diafoil Co., Ltd., thickness 10θμ), and dried for 70 minutes. The sample was colorless under normal conditions, but when irradiated with ultraviolet light, it developed a highly concentrated blue color (λ la, X m and θ inm).
次に、可視光を照射”するか、あるいは?θ℃以上に加
熱すZ)と元の無色の状態になった。この変化は〈シ返
し行なうことができた。Next, it returned to its original colorless state by irradiating it with visible light or heating it to temperatures above θ°C.This change could be reversed.
実施例コ
実施例/におけるジブロモブタン/ 0Jjiの代りに
ジブロモブタン?、グlを用い、他は実施例/と同様に
して下記化合物を得た。Dibromobutane in Example/Example/ Dibromobutane instead of 0Jji? The following compound was obtained in the same manner as in Example, except that the following compounds were used.
=19=
物性値(マススペクトル)は下記の通シである。(測定
条件ニアθeV、27θ℃)m/θ tsy (M”
)
639 (M”−#)
/7θ (ba、se peak)
本化合物を用い、実施例/と同様にポリエステルフィル
ムに枦布したところ、紫外線照射によフ磯色の青色(λ
ma、x−にOにnm )に発色した。次に可視光を照
射するか、ある囚は!θ℃以上に加熱すると元の無色の
状態になった。この変化はくり返し行なうことができた
。=19= The physical property values (mass spectrum) are as follows. (Measurement conditions near θeV, 27θ℃) m/θ tsy (M”
) 639 (M"-#) /7θ (ba, se peak) When this compound was applied to a polyester film in the same manner as in Example, it turned to a deep blue color (λ
ma, x- to O to nm). Next, some prisoners will be exposed to visible light! When heated above θ°C, it returned to its original colorless state. This change could be repeated.
実施例3
下記構造式
で表わされる化合物り一、θ!l z、−メチルエチル
ケトン/θθθ峠]解し1、下Hti構造式で表わされ
る化合物j ¥、A //を加え、還流下3時間反応さ
せた。室飾号で冷却し、溶媒を留去し、カラムクロマト
グラフィー(使用溶媒ベンゼン)で分離・梢製し、]ζ
配#4造式で表わされシ
るスピロナフトオキサジン系化合物を得た。Example 3 A compound represented by the following structural formula, θ! l z, -methyl ethyl ketone/θθθ pass] Then, a compound j ¥, A // represented by the following Hti structural formula was added, and the mixture was reacted under reflux for 3 hours. Cool in Murokashi, distill off the solvent, separate using column chromatography (using benzene as the solvent),
A spironaphthoxazine compound represented by formula #4 was obtained.
OH80H。OH80H.
物性値(マススペクトル)は下記の通ルである。(測定
条件ニア0θv、3θ0 ”C)m/θ 7.30
(M+)
7/j (M”−/j)
/70 (base peak)
本化合物ヲ用い、実施例/と同様にポリエステルフィル
ムに塗布したところ、紫外線照射によシ、蒙色の青色(
λIflaX ! 、g□jnm)に発色した。次に可
視光を照射するか、あるhは?θ℃以上に加熱すると元
の無色の状態になった。The physical property values (mass spectrum) are as follows. (Measurement conditions near 0θv, 3θ0”C) m/θ 7.30
(M+) 7/j (M"-/j) /70 (base peak) When this compound was applied to a polyester film in the same manner as in Example, it turned out to be a light brownish blue (
λIflaX! , g□jnm). Next, should we irradiate visible light? When heated above θ°C, it returned to its original colorless state.
この変化はくり返し行なうことができた。This change could be repeated.
実施例り
実施例/〜3に記載の方法に準じた方法によ如、前記一
般式mで示される下記の第1表に記載の種々のスピロナ
フトオキサジン系化合物を合成した。得られた化合物を
ポリエステルフィルム上に塗イ1i L、紫外線照射し
たところ各々第1表に示°を色調及びλmaxに発色し
た。次に可視光を照射するか、あるいは?θ℃以上に加
熱すると元の無色の状態になった。この変化はくり返し
て行なうことができた。Examples Various spironaphthoxazine compounds represented by the general formula m and listed in Table 1 below were synthesized by methods similar to those described in Examples/--3. When the obtained compound was coated on a polyester film and irradiated with ultraviolet rays, each color was developed to the color tone and λmax shown in Table 1. Next, irradiate visible light or? When heated above θ°C, it returned to its original colorless state. This change could be repeated.
第 / 衷
用
(発願の効果)
本発明のスピロナフトオキサジン系化合物はフォトクロ
ミック性を有し、全8績度訃よび着色状態の堅牢性に優
れて込るため損色でしかも発色・消色のくに返し安定性
が良好である。このスピロナフトオキサジン系化合物を
溶解あるいは分散した樹脂な言有する感光層を基板上に
有する感光桐材は、各種の記録・記憶材料、複写材料、
印刷感光体、調光I料、レーザー用感光材料、写真植字
用感光I料あるいは光学フィルター、マスキング用材料
、光量計、ディスプレイ用材料として使用することがで
きる。No. 1 / Application (Effects of the Application) The spironaphthoxazine compound of the present invention has photochromic properties and is excellent in color fastness and color fastness, so it is resistant to color loss and is resistant to color development and decolorization. Good stability over time. This photosensitive paulownia material, which has a photosensitive layer on a substrate made of a resin in which spironaphthoxazine compounds are dissolved or dispersed, can be used for various recording/memory materials, copying materials,
It can be used as a printed photoreceptor, a dimming I material, a photosensitive material for lasers, a photosensitive I material for photosetting, an optical filter, a masking material, a photometer, and a display material.
特許出願人 日産自動車株式会社
01か7名)
代 理 人 弁理士 長谷用 −
(ほか7名)
(自発)手続補正書
昭和64年7月77日
フ
2 発 明 ノ名称 スビロナメトオキサジン系化
合物及び該化合物を使用した感光材料
3 補正をする者
出願人 (39り)日産自動車株式会社(ほか1名)
4代理人〒10()
東京都千代III区丸の内二丁目5番2号(ほか 1
名)
5 補正の対象 明細書の「発明の詳細な説明」の欄
6補正の内容
(1)明細書第6頁末行の「製膜」を「成膜」と訂正す
る。Patent Applicant Nissan Motor Co., Ltd. 01 or 7) Agent Patent Attorney Hase - (and 7 others) (Voluntary) Procedural Amendment dated July 77, 1988 F2 Invention Name Subironamethoxazine Compound and photosensitive material using said compound 3 Person making the amendment Applicant (39ri) Nissan Motor Co., Ltd. (and 1 other person) 4 Agent 10 () 2-5-2 Marunouchi, Chiyo III-ku, Tokyo (and 1 other person)
5. Subject of amendment Contents of amendment in column 6 of "Detailed Description of the Invention" of the specification (1) "Film formation" at the end of page 6 of the specification is corrected to "film formation."
のアルキル基等のアルキル;Jirct〜、のアルキル
基等のアルキル鳥;」と訂正する。"alkyl such as an alkyl group; Jirct~, an alkyl group such as an alkyl group;" is corrected.
(3) 明細布筒3り真の第1表実施例人3?の化合
物を
(Cl42)t
と訂正する。(3) Table 1 Example Person 3 of Specification Cloth Tube 3 Rishin? Correct the compound as (Cl42)t.
(4) 明細書第4t1頁第1表実施例屑v3の後に
以下の実施例を追加する。(4) The following examples are added after Example V3 in Table 1, page 4t1 of the specification.
Claims (3)
、アルコキシアルキル基、シクロアルキル基、アリール
基を示し、X^1とX^2、Y^1とY^2は互いに結
合し環化していてもよい。Zは他の基もしくは原子を介
していてもよく、また置換されていてもよいアルキレン
基、置換されていてもよいアリーレン基を示し、R^1
、R^2、R^3、R^4、R^5、R^6、R^7、
R^8は水素原子、ハロゲン原子、アルキル基、アルコ
キシ基、アルコキシカルボニル基、アルコキシスルホニ
ル基、アルキルスルホニル基を示す。) で表わされるスピロナフトオキサジン系化合物。(1) General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼‥‥‥‥‥[I] (In the formula, X^1, It represents an alkyl group, a cycloalkyl group, or an aryl group, and X^1 and X^2, Y^1 and Y^2 may be bonded to each other and cyclized. Z may be connected through another group or atom. It often represents an optionally substituted alkylene group or an optionally substituted arylene group, and R^1
, R^2, R^3, R^4, R^5, R^6, R^7,
R^8 represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxysulfonyl group, or an alkylsulfonyl group. ) A spironaphthoxazine compound represented by
、Y^2がメチル基である特許請求の範囲第(1)項記
載のスピロナフトオキサジン系化合物。(2) X^1, X^2, Y^1 in general formula [I]
, Y^2 is a methyl group, the spironaphthoxazine compound according to claim (1).
、アルコキシアルキル基、シクロアルキル基、アリール
基を示し、X^1とX^2、Y^1とY^2は互いに結
合し、環化していてもよい。Zは他の基もしくは原子を
介しているかまたは置換されていてもよいアルキレン基
、置換されていてもよいアリーレン基を示し、R^1、
R^2、R^3、R^4、R^5、R^6、R^7、R
^8は水素原子、ハロゲン原子、アルキル基、アルコキ
シ基、アルコキシカルボニル基、アルコキシスルホニル
基、アルキルスルホニル基を示す。) で表わされるスピロナフトオキサジン系化合物を溶解ま
たは分散した樹脂を含有する感光層を基板上に有する感
光材料。(3) General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼‥‥‥‥‥[I] (In the formula, X^1, X^2, Y^1, Y^2 are alkyl groups, It represents an alkyl group, a cycloalkyl group, or an aryl group, and X^1 and X^2, Y^1 and Y^2 may be bonded to each other and may be cyclized.Is Z connected to another group or atom? or an optionally substituted alkylene group, an optionally substituted arylene group, R^1,
R^2, R^3, R^4, R^5, R^6, R^7, R
^8 represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxysulfonyl group, or an alkylsulfonyl group. ) A photosensitive material having, on a substrate, a photosensitive layer containing a resin in which a spironaphthoxazine compound represented by the following formula is dissolved or dispersed.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61160124A JPS6314786A (en) | 1986-07-08 | 1986-07-08 | Spironaphthoxazine based compound and photosensitive material using said compound |
DE8787904318T DE3774437D1 (en) | 1986-07-08 | 1987-07-03 | SPIROOXAZINE COMPOUNDS, PHOTO-SENSITIVE MATERIALS CONTAINING THEM AND METHOD FOR THE PRODUCTION THEREOF. |
EP19870904318 EP0321563B1 (en) | 1986-07-08 | 1987-07-03 | Spirooxazine compounds, photosensitive materials using them, and process for forming them |
PCT/JP1987/000464 WO1988000196A1 (en) | 1986-07-08 | 1987-07-03 | Spirooxazine compounds, photosensitive materials using them, and process for forming them |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61160124A JPS6314786A (en) | 1986-07-08 | 1986-07-08 | Spironaphthoxazine based compound and photosensitive material using said compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6314786A true JPS6314786A (en) | 1988-01-21 |
Family
ID=15708385
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61160124A Pending JPS6314786A (en) | 1986-07-08 | 1986-07-08 | Spironaphthoxazine based compound and photosensitive material using said compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6314786A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03271626A (en) * | 1990-03-20 | 1991-12-03 | Toshiba Corp | Microwave oven |
-
1986
- 1986-07-08 JP JP61160124A patent/JPS6314786A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03271626A (en) * | 1990-03-20 | 1991-12-03 | Toshiba Corp | Microwave oven |
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