JPS63139316A - Vertical illuminating device for dark field of microscope - Google Patents

Vertical illuminating device for dark field of microscope

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Publication number
JPS63139316A
JPS63139316A JP28722786A JP28722786A JPS63139316A JP S63139316 A JPS63139316 A JP S63139316A JP 28722786 A JP28722786 A JP 28722786A JP 28722786 A JP28722786 A JP 28722786A JP S63139316 A JPS63139316 A JP S63139316A
Authority
JP
Japan
Prior art keywords
ring
shaped
lens
mirror
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28722786A
Other languages
Japanese (ja)
Inventor
Kazuhiko Cho
和彦 長
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP28722786A priority Critical patent/JPS63139316A/en
Publication of JPS63139316A publication Critical patent/JPS63139316A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To eliminate the light quantity shortage in the vicinity of an observation field, and to improve the focusing performance by placing a ring-shaped parallel deflecting member for reducing the diameter of a ring-shaped parallel illuminating luminous flux, between a perforated mirror of a field illuminating device and a ring-shaped lens or a ring-shaped mirror. CONSTITUTION:An infinity correcting and observing optical system is applied to a microscope, an objective lens 6 is placed in the center part of its objective lens barrel 5, and in its peripheral part, a ring-shaped condensing lens 7 is placed. Also, on the lens 7, a perforated mirror 8 is placed, and an illuminating light from a light source 4 is deflected to the upper part of the lens 7. Moreover, by a light shielding cylinder 9 placed in the center hole of the mirror 8, mixing of a ring-shaped observing light into an observing optical path is prevented, and the generation of a flare is prevented by a diaphragm 10. Between this mirror 8 and the lens 7 a ring-shaped parallel deflecting part 15 is placed, and two reflecting surfaces 15a, 15b opposed in parallel to each other to said part are provided. In such a way, the diameter of a ring-shaped parallel illuminating optical flux is reduced, and the light quantity in the periphery of an observing field is compensated.

Description

【発明の詳細な説明】 〔産業上の利用分野] 本発明は、無限遠補正観察光学系を備えた顕微鏡の落射
暗視野照明装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an epi-dark field illumination device for a microscope equipped with an infinity corrected observation optical system.

〔従来の技術及び発明が解決しようとする問題点〕金属
顕微鏡の観察光学系は無限遠補正光学系にすべきである
ということは、周知の通りである。
[Prior Art and Problems to be Solved by the Invention] It is well known that the observation optical system of a metallurgical microscope should be an infinity correction optical system.

即ち、無限遠補正光学系を採用することにより、対物レ
ンズと結像レンズとの間の光束が平行光束になり、その
間にアタッチメントやハーフミラ−等を入れても、倍率
、結像性能共に影響が出ないという利点がある。
In other words, by adopting an infinity correction optical system, the light beam between the objective lens and the imaging lens becomes a parallel light beam, and even if an attachment or half mirror is inserted between them, it will not affect the magnification and imaging performance. It has the advantage of not coming out.

このように種々の利点を有する無限遠補正光学系ではあ
るが、対物レンズが解像性能の一層の向上のために冑N
 、 A、化が進められ、又特殊検鏡のために数多くの
アタッチメントを取り付ける必要が生じたために、観察
視野周辺の光量不足という問題が発生してきた。
Although the infinity correcting optical system has various advantages as described above, the objective lens is equipped with a helmet N in order to further improve the resolution performance.
, A. As the number of microscopes has increased, and it has become necessary to attach a large number of attachments for special microscopy, the problem of insufficient light around the observation field has arisen.

これを第4図の原理図に基づき説明すると、1は物体面
、2は対物レンズ、3は絞りであって、無限遠補正光学
系の場合、観察視野の中心を発した光線は4a、4b、
4cのように光軸Oと平行に進むが、観察視野の周辺を
発した光線は5a。
To explain this based on the principle diagram in Fig. 4, 1 is the object plane, 2 is the objective lens, and 3 is the diaphragm. In the case of an infinity correction optical system, the rays emitted from the center of the observation field are 4a and 4b. ,
4c, the rays travel parallel to the optical axis O, but the rays emitted from the periphery of the observation field are 5a.

5b、5cのように光軸Oに対して斜めに進む。The light travels obliquely to the optical axis O as shown in 5b and 5c.

このため、途中に絞り3が存在すると、視野中心の光線
は全て通るが、視野周辺の光線はその多くが絞り3によ
ってケラれてしまうので、視野周辺に向うに従い像が暗
くなる、いわゆる周辺光量不足の状態となる。そして、
絞り3の位置が対物レンズ2から遠ざかるにつれてその
傾向が一層強まり(状la、bの比較)、又対物レンズ
2のN。
Therefore, if there is an aperture 3 in the middle, all the light rays from the center of the field of view will pass through, but most of the light rays at the periphery of the field of view will be vignetted by the aperture 3, so the image will become darker towards the periphery of the field of view, so-called peripheral illumination. There will be a shortage. and,
This tendency becomes stronger as the position of the aperture 3 moves away from the objective lens 2 (comparison of shapes la and b), and the N of the objective lens 2.

Δ、が大き(なってもその傾向は強まる。Even if Δ becomes large, this tendency will become stronger.

そこで、この問題の解決のために絞り径を大にして観察
光路を太くすれば良いが、下記に詳述する如くこの種従
来の落射暗視野照明装置においてはそれは極めて困難で
あった。
Therefore, in order to solve this problem, it is possible to increase the aperture diameter and make the observation optical path thicker, but as will be explained in detail below, it is extremely difficult to do so in this type of conventional epi-illumination dark-field illumination device.

第5図はこの種従来の落射暗視野照明装置の光学系を示
しており、5は対物レンズ鏡筒であって、その内部の中
心部には対物レンズ6が周辺部にはリング状集光レンズ
7が夫々配置されている。8はリング状集光レンズ7の
上方に配置されていて照明光を集光レンズ7の方へ偏向
させるリング状の穴あきミラー、9は対物レンズ5の上
方である穴あきミラー8の中心穴に配置されていて観察
光路内へリング状照明光の混入を防止している遮光筒、
10は遮光筒9内に設けられていて遮光筒9内でのフレ
アーの発生を防止している絞りである。
FIG. 5 shows the optical system of this type of conventional epi-illuminated dark-field illumination device, where 5 is an objective lens barrel, the objective lens 6 is located at the center of the barrel, and the ring-shaped condenser is located at the periphery. Lenses 7 are arranged respectively. 8 is a ring-shaped perforated mirror arranged above the ring-shaped condensing lens 7 and deflects the illumination light toward the condensing lens 7; 9 is the center hole of the perforated mirror 8 above the objective lens 5; a light-shielding tube that is placed in the observation optical path to prevent ring-shaped illumination light from entering the observation optical path;
Reference numeral 10 denotes a diaphragm that is provided within the light-shielding tube 9 and prevents flare from occurring within the light-shielding tube 9.

11.12.13は照明レンズ、14は光源である。そ
して、光源14を発した照明光は照明レンズ13.12
.11により平行光束となって穴あきミラー8に入射し
、穴あきミラー8で反射された後はリング状平行光束の
照明光となってリング状集光レンズ7に入射して物体面
1上に集光せしめられ、物体面lを発した光は代物レン
ズ6により平行光束となって遮光筒9内を通過し、図示
しない結像レンズに入射されるようになっている。
11, 12, and 13 are illumination lenses, and 14 is a light source. The illumination light emitted from the light source 14 is transmitted to the illumination lens 13.12.
.. 11, the illumination light becomes a parallel beam of light and enters the perforated mirror 8, and after being reflected by the perforated mirror 8, it becomes a ring-shaped parallel beam of illumination light that enters the ring-shaped condensing lens 7 and is directed onto the object surface 1. The condensed light emitted from the object plane l is converted into a parallel beam by the substitute lens 6, passes through the light-shielding tube 9, and is made incident on an imaging lens (not shown).

向、アタッチメントは上記平行光束の部分に挿入され、
これにより対物レンズ6と絞り10との間の距離が伸び
ると第4図の原理により観察視野周辺の光量不足が起こ
る。
direction, the attachment is inserted into the parallel beam part,
As a result, if the distance between the objective lens 6 and the diaphragm 10 increases, an insufficient amount of light will occur around the observation field of view based on the principle shown in FIG.

上記のように、従来の落射暗視野照明装置の光学系は、
観察光路内へのリング状照明光の混入を防止するために
リング状照明光路と観察光路を分離しているので、穴あ
きミラー8の内径で観察光路の11が制限されてしまい
、観察光路を太くすることは掻めて困難であった。
As mentioned above, the optical system of a conventional epi-illuminated darkfield illumination device is
Since the ring-shaped illumination optical path and the observation optical path are separated to prevent the ring-shaped illumination light from entering the observation optical path, the observation optical path 11 is restricted by the inner diameter of the perforated mirror 8, and the observation optical path is It was extremely difficult to make it thicker.

尚、観察視野周辺の光量不足という現象を避けるために
、有限遠補正光学系を採用するか、或は特公昭58−5
5483号公報に記載の装置のように対物レンズの後側
で照明光が交差するような構成にすることが考えられる
が、有限補正光学系を採用することは技術の逆行である
のみならず、アタッチメントの挿入により光路長が伸び
た時に倍率が狂ってしまうという問題があり、或は照明
光を交差させると様々な制限が生じ、性能を十分に発揮
させ得る設計が難しいという問題がある。
In order to avoid the phenomenon of insufficient light intensity around the observation field of view, it is necessary to adopt a finite distance correction optical system or to
It is conceivable to use a configuration in which the illumination light intersects behind the objective lens, as in the device described in Japanese Patent No. 5483, but adopting a finite correction optical system is not only a step backward in technology; There is a problem that the magnification becomes incorrect when the optical path length is increased by inserting an attachment, and various restrictions occur when the illumination light is crossed, making it difficult to design a device that can fully demonstrate its performance.

本発明は、上記問題点に鑑み、様々な利点を有する無限
遠補正光学系を観察光学系に採用することを前捉としつ
つ、対物レンズの高N、A。化や特殊検鏡のための数多
くのアタッチメントの取付けがあっても観察視野周辺の
光量不足を生じさせない落射暗視野照明装置を堤供する
ことを目的とする。
In view of the above-mentioned problems, the present invention employs an infinity correction optical system having various advantages as an observation optical system, while also reducing the high N and A of the objective lens. The object of the present invention is to provide an epi-illuminated dark-field illumination device that does not cause insufficient light intensity around the observation field even when a large number of attachments are installed for special microscopy or special microscopy.

〔問題点を解決するための手段及び作用〕本発明による
落射暗視野照明装置は、無限遠補正観察光学系を備えた
顕微鏡に適用され、対物レンズからの観察光束が通る中
心穴を備えた穴あきミラーにより、リング状平行照明光
束を対物レンズの周囲に配置されたリング状レンズ又は
リング状ミラーの方へ偏向するようにした落射暗視野照
明装置において、前記穴あきミラーと前記リング状レン
ズ又はリング状ミラーとの間に前記リング状平行照明光
束の径を縮小するリング状平行偏向部材を配置して、穴
あきミラーの中心穴を大径に構成し得るようにしたもの
である。
[Means and effects for solving the problem] The epi-illuminated dark field illumination device according to the present invention is applied to a microscope equipped with an infinity corrected observation optical system, and has a hole provided with a center hole through which the observation light beam from the objective lens passes. In an epi-illuminated dark-field illumination device in which a ring-shaped collimated illumination beam is deflected toward a ring-shaped lens or a ring-shaped mirror disposed around an objective lens by a perforated mirror, the perforated mirror and the ring-shaped lens or A ring-shaped parallel deflection member for reducing the diameter of the ring-shaped parallel illumination beam is disposed between the ring-shaped mirror and the center hole of the perforated mirror can be configured to have a large diameter.

(実施例〕 以下、図示した実施例に基づき第5図に示した従来例と
の同一の部材には同一符号を付し、本発明の詳細な説明
する。
(Embodiment) Hereinafter, the present invention will be described in detail based on the illustrated embodiment, with the same reference numerals given to the same members as in the conventional example shown in FIG.

第1図は第1実施例を示しており、15は穴あきミラー
8とリング状集光レンズ7との間に配置されたリング状
プリズム等のリング状平行偏向部材であって、これは互
いに平行に向い合う円錐台側面形の二つの反射面15a
、15bを有し、それらは穴あきミラー8からのリング
状平行照明光束の径を縮小してリング状平行光束のまま
リング状集光レンズ7に入射せしめる作用を有している
FIG. 1 shows a first embodiment, in which reference numeral 15 denotes a ring-shaped parallel deflection member such as a ring-shaped prism placed between the perforated mirror 8 and the ring-shaped condensing lens 7. Two reflective surfaces 15a in the shape of truncated conical sides facing in parallel
, 15b, which have the function of reducing the diameter of the ring-shaped parallel illumination beam from the perforated mirror 8 and allowing the ring-shaped parallel illumination beam to enter the ring-shaped condenser lens 7 as it is.

従って、このように構成したことにより穴あきミラーの
中心穴を大径に構成し得るので、遮光筒9及び絞り10
の径を大きくして観察光路を太くすることができる。そ
の結果、対物レンズ6の高N。
Therefore, with this configuration, the center hole of the perforated mirror can be configured to have a large diameter, so that the light-shielding tube 9 and the aperture 10 can be
By increasing the diameter of the observation optical path, the observation optical path can be made thicker. As a result, the objective lens 6 has a high N.

A、化や対物レンズ6と絞り10との間に特殊検鏡のた
めの数多くのアタッチメントの取付けがあっても観察視
野周辺の光量不足は生じない、尚、リング状平行偏向部
材15は光学樹脂の射出成形により製造することができ
る。
A. Even if many attachments are installed between the objective lens 6 and the diaphragm 10 for special microscopy, there will be no shortage of light around the observation field.The ring-shaped parallel deflection member 15 is made of optical resin. It can be manufactured by injection molding.

第2図は第2実施例の光学系を示しており、これは第一
実施例の構成に加えて、リング状平行偏向部材15と同
一のリング状平行偏向部材16を逆向きに穴あきミラー
8の前側に配置して、穴あきミラー8に入射するリング
状平行照明光束の径を拡大するようにしたものである。
FIG. 2 shows the optical system of the second embodiment, which has the same structure as the first embodiment, but also includes a ring-shaped parallel deflection member 16 which is the same as the ring-shaped parallel deflection member 15, and a perforated mirror in the opposite direction. 8 to enlarge the diameter of the ring-shaped parallel illumination light beam incident on the perforated mirror 8.

従って、この構成によれば、照明レンズ11,12.1
3の径を小さくすることができる。
Therefore, according to this configuration, the illumination lenses 11, 12.1
3 can be made smaller.

第3図は第3実施例の光学系を示しており、これは第2
実施例と同様な構成において、リング状平行偏向部材1
5の代りに、焦点が一致する二つの放物線回転体側面の
一部から成り且つ互いに向いあう二つの反射面17a、
17bを有するリング状平行偏向部材17を配置すると
共に、リング状平行偏向部材16の代りに、リング巾が
中心部に向って広い同種のリング状平行偏向部材18を
配置したものである。従って、リング状平行偏向部材1
7は二つの反射面17a、17bが平行偏向作用に加え
て集光作用も併せ持つので穴あきミラー8のリング巾を
広くすることができ、その結果照明レンズ11.12.
13を通ってくる平行照明光束の活用断面積が増えるの
で観察視野を明るくすることができる。又、リング状平
行偏向部材18のリング巾が中心部に向って広いので照
明レンズ11.12.13を通ってくる平行照明光束の
中心部寄りの光束を活用し得るようになり、その結果観
察視野を一層明るくすることができると共に、照明レン
ズ11,12.13の径も一層小さくすることができる
FIG. 3 shows the optical system of the third embodiment, which is similar to the second embodiment.
In a configuration similar to that of the embodiment, a ring-shaped parallel deflection member 1
5, two reflective surfaces 17a facing each other and consisting of parts of the side surfaces of two parabolic rotating bodies whose focal points coincide;
17b is disposed, and in place of the ring-shaped parallel deflection member 16, a similar ring-shaped parallel deflection member 18 whose ring width is wider toward the center is disposed. Therefore, the ring-shaped parallel deflection member 1
7, since the two reflecting surfaces 17a and 17b have a condensing function in addition to a parallel deflection function, the ring width of the perforated mirror 8 can be increased, and as a result, the illumination lenses 11, 12.
Since the effective cross-sectional area of the collimated illumination beam passing through 13 increases, the observation field can be brightened. Furthermore, since the ring width of the ring-shaped parallel deflection member 18 is wider toward the center, it becomes possible to utilize the light beam closer to the center of the parallel illumination light beam passing through the illumination lens 11, 12, 13, and as a result, the observation The field of view can be made even brighter, and the diameters of the illumination lenses 11, 12, 13 can also be made smaller.

尚、上記いずれの実施例においても、リング状集光レン
ズ7の代りに他のリング状レンズを用いても良いし、円
錐台側面形反射面を有するリング状ミラーを用いても良
い。
In any of the embodiments described above, other ring-shaped lenses may be used in place of the ring-shaped condensing lens 7, or a ring-shaped mirror having a truncated conical side surface-shaped reflective surface may be used.

〔発明の効果〕〔Effect of the invention〕

上述の如く、本発明による落射暗視野照明装置は、無限
遠補正光学系を観察光学系に採用することを前提としつ
つ、対物レンズの高N、A、化や特殊検鏡のための数多
くのアタッチメントの取付けがあっても1tlt察視野
周辺の光量不足を生じさせないという実用上重要な利点
を有している。
As mentioned above, the epi-illuminated dark-field illumination device according to the present invention is based on the premise that an infinity correction optical system is adopted as the observation optical system, and also has a number of features such as high N and A of the objective lens and special microscopy. It has a practically important advantage of not causing insufficient light amount around the 1tlt viewing field even if an attachment is attached.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による落射暗視野照明装置の第1実施例
の光学系を示す図、第2図及び第゛3図は夫々第2及び
第3実施例の光学系を示す図、第4図は無限遠補正観察
光学系におけるttU察視野周辺の光量不足の発生原理
を示す図、第5図は従来例の光学系を示す図である。 1・・・・物体面、5・・・・対物レンズ鏡筒、6・・
・・対物レンズ、7・・・、リング状集光レンズ、8・
・・・穴あきミラー、9・・・・遮光筒、10・・・・
絞り、11.12.13・・・・照明レンズ、14・・
・・光源、15.16.17.18・・・・リング状平
行偏向部材。 1PI 図 才2図 1F3図 1F4図 1−5図
FIG. 1 is a diagram showing the optical system of the first embodiment of the epi-illuminated dark field illumination device according to the present invention, FIGS. 2 and 3 are diagrams showing the optical system of the second and third embodiments, respectively, and FIG. This figure shows the principle of occurrence of insufficient light amount around the ttU observation field in the infinity corrected observation optical system, and FIG. 5 is a diagram showing a conventional optical system. 1...Object plane, 5...Objective lens barrel, 6...
...Objective lens, 7..., ring-shaped condensing lens, 8.
...Perforated mirror, 9...Shading tube, 10...
Aperture, 11.12.13...Illumination lens, 14...
...Light source, 15.16.17.18...Ring-shaped parallel deflection member. 1PI Illustration 2 Figure 1F3 Figure 1F4 Figure 1-5

Claims (4)

【特許請求の範囲】[Claims] (1)無限遠補正観察光学系を備えた顕微鏡に適用され
、対物レンズからの観察光束が通る中心穴を備えた穴あ
きミラーにより、リング状平行照明光束を対物レンズの
周囲に配置されたリング状レンズ又はリング状ミラーの
方へ偏向するようにした落射暗視野照明装置において、
前記穴あきミラーと前記リング状レンズ又はリング状ミ
ラーとの間に前記リング状平行照明光束の径を縮小する
リング状平行偏向部材を配置したことを特徴とする落射
暗視野照明装置。
(1) Applicable to a microscope equipped with an infinity-corrected observation optical system, a ring-shaped parallel illumination beam is arranged around the objective lens using a perforated mirror with a central hole through which the observation beam from the objective lens passes. In an epi-illuminated dark field illumination device that is deflected toward a shaped lens or a ring shaped mirror,
An epi-illumination dark-field illumination device characterized in that a ring-shaped parallel deflection member for reducing the diameter of the ring-shaped parallel illumination beam is disposed between the perforated mirror and the ring-shaped lens or ring-shaped mirror.
(2)穴あきミラーの前側に平行照明光束の径を拡大す
る他のリング状平行偏向部材を配置したことを特徴とす
る特許請求の範囲(1)に記載の落射暗視野照明装置。
(2) The epi-illumination dark-field illumination device according to claim (1), further comprising another ring-shaped parallel deflection member arranged in front of the perforated mirror to enlarge the diameter of the parallel illumination beam.
(3)穴あきミラーの前側に配置されたリング状平行偏
向部材のリング巾を中心部に向って広くしたことを特徴
とする特許請求の範囲(2)に記載の落射暗視野照明装
置。
(3) The epi-illumination dark-field illumination device according to claim (2), wherein the ring width of the ring-shaped parallel deflection member disposed in front of the perforated mirror is widened toward the center.
(4)リング状平行偏向部材が集光性も有していること
を特徴とする特許請求の範囲(1)乃至(3)のいずれ
かに記載の落射暗視野照明装置。
(4) The epi-illumination dark-field illumination device according to any one of claims (1) to (3), wherein the ring-shaped parallel deflection member also has light condensing properties.
JP28722786A 1986-12-02 1986-12-02 Vertical illuminating device for dark field of microscope Pending JPS63139316A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28722786A JPS63139316A (en) 1986-12-02 1986-12-02 Vertical illuminating device for dark field of microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28722786A JPS63139316A (en) 1986-12-02 1986-12-02 Vertical illuminating device for dark field of microscope

Publications (1)

Publication Number Publication Date
JPS63139316A true JPS63139316A (en) 1988-06-11

Family

ID=17714687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28722786A Pending JPS63139316A (en) 1986-12-02 1986-12-02 Vertical illuminating device for dark field of microscope

Country Status (1)

Country Link
JP (1) JPS63139316A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325231A (en) * 1991-03-22 1994-06-28 Olympus Optical Co., Ltd. Microscope illuminating apparatus
JP2002090643A (en) * 2000-09-12 2002-03-27 Sysmex Corp Optical element for zonal light formation and detector using the same
JP2002202459A (en) * 2000-12-28 2002-07-19 Yoshihiro Ota Dark visual field vertical illumination microscope
JP2011248216A (en) * 2010-05-28 2011-12-08 Olympus Corp Dark field optical system
EP3809141A4 (en) * 2018-06-13 2022-03-23 Hitachi, Ltd. Device for measuring speed of moving body, and elevator

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325231A (en) * 1991-03-22 1994-06-28 Olympus Optical Co., Ltd. Microscope illuminating apparatus
JP2002090643A (en) * 2000-09-12 2002-03-27 Sysmex Corp Optical element for zonal light formation and detector using the same
JP2002202459A (en) * 2000-12-28 2002-07-19 Yoshihiro Ota Dark visual field vertical illumination microscope
JP2011248216A (en) * 2010-05-28 2011-12-08 Olympus Corp Dark field optical system
EP3809141A4 (en) * 2018-06-13 2022-03-23 Hitachi, Ltd. Device for measuring speed of moving body, and elevator

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