JPS63137930A - Selective modification of surface - Google Patents
Selective modification of surfaceInfo
- Publication number
- JPS63137930A JPS63137930A JP28340086A JP28340086A JPS63137930A JP S63137930 A JPS63137930 A JP S63137930A JP 28340086 A JP28340086 A JP 28340086A JP 28340086 A JP28340086 A JP 28340086A JP S63137930 A JPS63137930 A JP S63137930A
- Authority
- JP
- Japan
- Prior art keywords
- light
- pas
- sulfide
- molded product
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004048 modification Effects 0.000 title claims description 8
- 238000012986 modification Methods 0.000 title claims description 8
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 229920000412 polyarylene Polymers 0.000 claims abstract description 10
- 230000001678 irradiating effect Effects 0.000 claims abstract description 7
- 238000009736 wetting Methods 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 32
- 229920001400 block copolymer Polymers 0.000 abstract description 10
- 238000007650 screen-printing Methods 0.000 abstract description 9
- ODPYDILFQYARBK-UHFFFAOYSA-N 7-thiabicyclo[4.1.0]hepta-1,3,5-triene Chemical compound C1=CC=C2SC2=C1 ODPYDILFQYARBK-UHFFFAOYSA-N 0.000 abstract description 5
- XWUCFAJNVTZRLE-UHFFFAOYSA-N 7-thiabicyclo[2.2.1]hepta-1,3,5-triene Chemical compound C1=C(S2)C=CC2=C1 XWUCFAJNVTZRLE-UHFFFAOYSA-N 0.000 abstract description 4
- -1 polyparaphenylene Polymers 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 229910001868 water Inorganic materials 0.000 description 5
- 239000011734 sodium Substances 0.000 description 4
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052979 sodium sulfide Inorganic materials 0.000 description 3
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- SOHCOYTZIXDCCO-UHFFFAOYSA-N 6-thiabicyclo[3.1.1]hepta-1(7),2,4-triene Chemical group C=1C2=CC=CC=1S2 SOHCOYTZIXDCCO-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920000265 Polyparaphenylene Polymers 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 229910010297 TiOS Inorganic materials 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052977 alkali metal sulfide Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 239000012765 fibrous filler Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 235000014380 magnesium carbonate Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の背景〕
産業上の利用分野
本発明は、ポリアリーレンスルフィド(以後、PASと
略記する)または同組成物からなる成形物(以後、PA
S成形物と略記する)に対して、0.1〜600nmの
光を照射することにより、その表面を選択的に改質して
親水性を向上させる方法に関する。Detailed Description of the Invention [Background of the Invention] Industrial Field of Application The present invention relates to polyarylene sulfide (hereinafter abbreviated as PAS) or molded articles made of the same composition (hereinafter abbreviated as PAS).
The present invention relates to a method of selectively modifying the surface of a (abbreviated as "S molded product") by irradiating it with light of 0.1 to 600 nm to improve its hydrophilicity.
本発明は、その−具体例において、成形物表面へのスク
リーン印刷の印刷性を向上させる方法に関する。In one embodiment, the present invention relates to a method for improving the printability of screen printing on the surface of a molded article.
従来の技術
PAS及び同組成物は、耐熱性、耐薬品性、難燃性、機
械的性質、電気的性質にすぐれた新しいエンジニアリン
グプラスチックとして、近年注目を集めている。BACKGROUND OF THE INVENTION PAS and its compositions have recently attracted attention as new engineering plastics with excellent heat resistance, chemical resistance, flame retardance, mechanical properties, and electrical properties.
PASの表面を改質して利用する技術としてはレーザー
(可視光より波長の長いエネルギーの強い熱線)を照射
して、表面の結晶性を変える技術(特開昭60−110
729号公報)、およびPASの表面を浸測性にする為
に1×108〜5×109ジユール/秒/c&の強いレ
ーザーを照射する技術(特開昭61−127867号公
報)等が開示されている。A technique for modifying and utilizing the surface of PAS is a technique to change the crystallinity of the surface by irradiating it with a laser (heat rays with a longer wavelength and more energy than visible light) (Japanese Unexamined Patent Publication No. 60-110).
No. 729), and a technique of irradiating a strong laser of 1 x 108 to 5 x 109 Joule/sec/c& to make the surface of PAS immersive (Japanese Patent Application Laid-Open No. 127867/1986). ing.
しかし、此等の方法は、表面改質効果はすぐれていると
しても、その為に必要な設備、エネルギー費用が高く、
またエネルギーの調節も難かしいという問題があった。However, although these methods have excellent surface modification effects, they require high equipment and energy costs;
Another problem was that it was difficult to adjust the energy.
製−負
本発明者らは、先にPAS成形物に対して選択的に化学
メッキを行う方法を提案した(特願昭60−28524
2号)。これは、光照射を受けたPASは、その表面が
メッキされ難いことに基ず〈発明であったが、此の表面
の改質を検討した結果、此の表面が、化学変化して親水
性が増加し、スクリーン印刷の印刷性が向上しているこ
とを発見して、本発明に到った。The present inventors previously proposed a method of selectively chemically plating PAS molded products (Japanese Patent Application No. 60-28524).
No. 2). This is based on the fact that the surface of PAS that has been irradiated with light is difficult to be plated (this was the invention), but as a result of studying the modification of this surface, it was found that this surface had undergone a chemical change and had become hydrophilic. The inventors have discovered that this increases the printability of screen printing, leading to the present invention.
すなわち、本発明によるポリアリーレンスルフィド成形
物の選択的表面改質法は、ポリアリーレンスルフィドま
たは同組成物からなる成形物に対して0.1〜600n
mの波長の光を照射することにより、上記成形物の光照
射部分の表面を選択的に改質して親水性を向上させるこ
と、を特徴とするものである。That is, the method for selective surface modification of a polyarylene sulfide molded product according to the present invention can be applied to a molded product made of polyarylene sulfide or the same composition with a surface modification of 0.1 to 600N.
The present invention is characterized in that by irradiating light with a wavelength of m, the surface of the light-irradiated portion of the molded article is selectively modified to improve its hydrophilicity.
効果
本発明によれば、従来のPAS成形物に対する表面の改
質方法では達成が困難であった、エネルギー消費も少く
しかも簡単な設備で、即ち安価で容易に表面の一部分を
選択的に改質することができる。Effects According to the present invention, it is possible to selectively modify a portion of the surface of a PAS molded product easily and inexpensively, using simple equipment and low energy consumption, which has been difficult to achieve with conventional surface modification methods for PAS molded products. can do.
従って、本発明は、たとえばスクリーン印刷に好適な手
段を提供するものである。Therefore, the present invention provides means suitable for screen printing, for example.
すなわち、PAS成形物に対してスクリーン印刷を行な
う際には、インクの密着性を確保する為に、クロム酸に
よるエツチング処理等前処理もしくはPAS成形物との
密着性を改良した特殊なインク等が必要である。しかも
、クロム酸によるエツチング処理によって成形物の一部
分だけを処理しようとすると、多くの工程が必要である
。これに対して本発明の方法を用いれば、ネガ型のマス
クもしくは、ネガ型にレジストを使う方法もしくは収束
した光を走査する方法によって、容易にがつ選択的に所
望部分の表面を改質して親水性を向上させることができ
、PAS成形物に対して、容易にスクリーン印刷を行な
うことができる。In other words, when screen printing a PAS molded product, in order to ensure ink adhesion, pretreatment such as etching treatment with chromic acid or special ink with improved adhesion to the PAS molded product is required. is necessary. Furthermore, if only a portion of the molded article is to be treated by etching with chromic acid, many steps are required. On the other hand, if the method of the present invention is used, the surface of the desired portion can be modified easily and selectively by using a negative mask, a method using a negative resist, or a method of scanning converged light. The hydrophilicity of the PAS molded product can be improved, and screen printing can be easily performed on the PAS molded product.
エネルギーレベルの低い特定波長の光によって、少なく
ともスクリーン印刷に必要な程度の親水性の向上が実現
しえことは思いがけなかったことといえよう。It is surprising that specific wavelengths of light with low energy levels can improve hydrophilicity, at least to the extent necessary for screen printing.
PAS成形物
PASおよび同組成物
本発明に用いられるポリアリーレンスルフィド(PAS
)は、式+Ar−8+の繰り返し単位を主要構成単位と
するホモポリマーまたはコポリマーである。この繰り返
し単位を主要構成単位とす結合または架橋結合を含むこ
ともてきる。PAS molded product PAS and the same composition Polyarylene sulfide (PAS) used in the present invention
) is a homopolymer or copolymer whose main constituent unit is a repeating unit of the formula +Ar-8+. This repeating unit may be used as a main structural unit and may include a bond or a crosslink.
好ましい。preferable.
特に好ましく用いられるPASとしては、ポリマーの三
構成単位としてp−フェニレンスルフィド単位−!へS
ν←S)を90モル%以」二全方するポリパラフェニレ
ンスルフィド(P P S)及びフェニレンスルフィド
ブロックコポリマーがあげられる。Particularly preferably used PAS includes p-phenylene sulfide units as the three structural units of the polymer. to S
Examples include polyparaphenylene sulfide (PPS) and phenylene sulfide block copolymers in which ν←S) is 90 mol% or more.
PPSは10モル26未満の他の共重合構成単位を含ん
でいてもよく、このような共重合体単位としてはメタフ
ェニレンスルフィド単位
ジフェニルエーテルスルフィド単位、
だし、三官能単位は1モル%以下が望ましい。PPS may contain less than 10 mol 26 of other copolymerized units, such as metaphenylene sulfide units, diphenyl ether sulfide units, and preferably 1 mol % or less of trifunctional units.
このようなPPSとしては、公知の方法によって合成さ
れたものを用いることができる。合成法としては、例え
ば、米国特許第3354129号明細書に開示されてい
る方法がある。この方法は、例えば、PPSを生成させ
る為にN−メチルピロリドン(NMP)中でp−ジクロ
ルベンゼンと硫化ソーダとを反応させる方法である。特
公昭52−12240号公報に記載されているように、
NMP中でのジクロルベンゼンと硫化ソーダとの反応時
に酢酸リチウムや酢酸ナトリウムのような有機酸のアル
カリ金属塩を共存させることによるより高分子量のPP
Sを得る方法も好適である。As such PPS, one synthesized by a known method can be used. Examples of the synthesis method include the method disclosed in US Pat. No. 3,354,129. This method is, for example, a method in which p-dichlorobenzene and sodium sulfide are reacted in N-methylpyrrolidone (NMP) to produce PPS. As stated in Japanese Patent Publication No. 52-12240,
Higher molecular weight PP by coexisting an alkali metal salt of an organic acid such as lithium acetate or sodium acetate during the reaction of dichlorobenzene and sodium sulfide in NMP.
A method for obtaining S is also suitable.
より高分子量のPPSを得る為に用いられる他の方法、
例えばNMP中での重合反応時に炭酸リチウムや水酸化
カルシウムなどのような無機塩を共存させる方法あるい
は共存H2O量、重合温度のコントロールによる方法(
特願昭59=126725号)等も用いられる。また、
重合仕上りのポリマーを粉末状態で酸素共存下(好まし
くは空気中)で融点以下の温度で加熱して溶融粘度を増
加させたものも用いることができる。Other methods used to obtain higher molecular weight PPS,
For example, a method in which an inorganic salt such as lithium carbonate or calcium hydroxide is allowed to coexist during the polymerization reaction in NMP, or a method in which the amount of coexisting H2O and the polymerization temperature are controlled (
Japanese Patent Application No. 126725 (1982) may also be used. Also,
It is also possible to use a powdered polymer prepared by heating it in the presence of oxygen (preferably in air) at a temperature below its melting point to increase its melt viscosity.
フェニレンスルフィドブロックコポリマーとしては、パ
ラフェニレンスルフィドとメタフェニレンスルフィドと
のブロックコポリマーが好適である。このブロックコポ
リマーは、繰返し単位(A)とから実質的になり、繰返
し単位(A)が平均20〜5000個結合したブロック
として分子鎖中に存在するブロックコポリマーであって
、繰返し単位(A)のモル分率(X)が0.50〜0.
98の範囲にあるものが好ましく用いられる。As the phenylene sulfide block copolymer, a block copolymer of paraphenylene sulfide and metaphenylene sulfide is suitable. This block copolymer is a block copolymer that is substantially composed of repeating units (A) and exists in the molecular chain as a block in which 20 to 5000 repeating units (A) are bonded on average. The mole fraction (X) is 0.50 to 0.
Those within the range of 98 are preferably used.
繰返し単位(A)と共にブロックコポリマーを構は90
〜100モル%、を占めることを意味し、この繰返し単
位以外の構成単位としては等の1種もしくは2種以上が
ある。The structure of the block copolymer with the repeating unit (A) is 90
100% by mole, and other structural units other than this repeating unit include one or more of the following.
このブロックコポリマーは、繰返し単位(A)ブロック
からなる限り、各ブロックの形成および両ブロックの結
合が可能な限り任意の方法によって製造することができ
る。例えば、特願昭59−134633号明細書に示さ
れた方法か用いられる。具体的な製造法としては、一方
のブロックを形成させてからそこで他方のブロックを形
成させて両ブロックの結合を同時に実現する方法、およ
び両ブロックをそれぞれ形成させておいてから結合せる
方法、を挙げることができる。このようにブロックの形
成および結合ならびにフェニレンスルフィド繰返し単位
の種類に配慮することを除けば、また必要に応じて行な
うべき改変を除けば、本発明に用いるブロックコポリマ
ーの製造法は従来のフェニレンスルフィドポリマーの製
造法と本質的には異ならないということができる。すな
わち、本発明ブロックポリマーの製造法は、アルカリ金
属硫化物とジハロ芳香族化合物(主としてp−およびm
−ジハロベンゼンからなる)との非プロトン性極性有機
溶媒(たとえばNMP)中での加熱による縮合(脱アル
カリ金属ハロゲン化物)からなるものである。なお、こ
のブロックコポリマーは、310℃/剪断速度200(
秒)−1の条件で測定した溶融粘度が1000〜50,
000ポイズの範囲にあることが望ましい。This block copolymer can be produced by any method that allows formation of each block and bonding of both blocks, as long as it consists of repeating unit (A) blocks. For example, the method disclosed in Japanese Patent Application No. 59-134633 may be used. Specific manufacturing methods include forming one block and then forming the other block to simultaneously realize the combination of both blocks, and forming both blocks separately and then combining them. can be mentioned. Apart from taking into consideration the formation and bonding of blocks and the type of phenylene sulfide repeating units as described above, and other than modifications to be made as necessary, the method for producing the block copolymer used in the present invention is similar to that of conventional phenylene sulfide polymers. It can be said that it is not essentially different from the manufacturing method of . That is, the method for producing the block polymer of the present invention uses an alkali metal sulfide and a dihaloaromatic compound (mainly p- and m-
- dihalobenzene) by heating in an aprotic polar organic solvent (for example NMP) (dealalkali metal halide). Note that this block copolymer has a temperature of 310°C/shear rate of 200 (
The melt viscosity measured under the conditions of -1 seconds) is 1000 to 50,
It is desirable that it be in the range of 000 poise.
PASは本質的には熱可塑性樹脂であり、従って本発明
に用いることのできるPASは熱可塑性樹脂に慣用され
ているところに従って種々の添加物を配合してPAS組
成物として使用することができる。具体的には、たとえ
ば、マイカ、T iOS t O2、Al2O3、Ca
CO3,2ゝ
カーボン黒、タルク、Ca S i O2、MgCO3
などの粉末状無機充填材あるいはガラス、炭素、黒鉛、
アラミドなどの材料からなる繊維状充填材などと溶解混
合して組成物とすることができる。PAS is essentially a thermoplastic resin, and therefore, the PAS that can be used in the present invention can be used as a PAS composition by blending various additives according to the methods commonly used for thermoplastic resins. Specifically, for example, mica, TiOS t O2, Al2O3, Ca
CO3,2ゝCarbon black, talc, Ca Si O2, MgCO3
Powdered inorganic fillers such as glass, carbon, graphite,
It can be dissolved and mixed with a fibrous filler made of a material such as aramid to form a composition.
また、ポリイミド、ポリアミド、ポリエーテルエーテル
ケトン、ポリスルホン、ポリエーテルスルホン、ポリエ
ーテルイミド、ポリアリーレン、ポリフェニレンエーテ
ル、ポリカーボネート、ポリエチレンテレフタレート、
ポリブチレンテレフタレート、ポリアセタール、ポリプ
ロピレン、ポリエチレン、ABS、ポリ塩化ビニル、ポ
リメチルメタクリレ−小、ポリスチレン、ポリ弗化ビニ
リデン、ポリテトラフルオルエチレン、エトラフルオル
エチレンコポリマーなどとブレンドして組成物とするこ
ともできる。In addition, polyimide, polyamide, polyetheretherketone, polysulfone, polyethersulfone, polyetherimide, polyarylene, polyphenylene ether, polycarbonate, polyethylene terephthalate,
Blend with polybutylene terephthalate, polyacetal, polypropylene, polyethylene, ABS, polyvinyl chloride, polymethyl methacrylate, polystyrene, polyvinylidene fluoride, polytetrafluoroethylene, etrafluoroethylene copolymer, etc. to form a composition. You can also do that.
これらの充填材の他に、少量のカップリング材、抗酸化
材、着色料、光増感材、その他等も用いることができる
。In addition to these fillers, small amounts of coupling agents, antioxidants, colorants, photosensitizers, and the like may also be used.
成形物の製造
PASおよびPAS組成物は、それが属する熱可塑性樹
脂としての性質を利用して、その溶融ないし可塑状態を
経由する任意の方法によって成形物とすることができる
。Manufacture of Molded Articles PAS and PAS compositions can be made into molded articles by any method that takes advantage of their properties as thermoplastic resins and goes through their melting or plastic state.
成形物の形状は、採用した成形法によっであるいは成形
物に期待する用途によって定まる任意のものでありうる
。本発明方法がスクリーン印刷に必要な親水性を賦与す
るのに有効であることに着目すれば、成形物の形状はフ
ィルム、シートとその他のスクリーン印刷の対象となる
ものであることが好ましいということができよう。The shape of the molded product may be any shape determined by the molding method employed or the intended use of the molded product. Considering that the method of the present invention is effective in imparting hydrophilicity necessary for screen printing, it is preferable that the shape of the molded product is a film, sheet, or other object to be screen printed. You can do it.
表面改質
本発明の方法は、上記PAS成形物に対して、光を照射
することにより、光照射した部分の表面を選択的に改質
する方法である。Surface Modification The method of the present invention is a method of selectively modifying the surface of the irradiated portion by irradiating the PAS molded article with light.
本発明における照射する光は、0.1〜600nm、好
ましくは190〜43Qnm、の波長の光である。照射
時間は、上記PAS成形物と光源までの距離及び光源の
強度にもよるが、0.01秒未満では光照射効果が得ら
れにくく、1000時間超過では生産性が悪いので、0
.01秒以上1000時間以下であることが望ましい。The light to be irradiated in the present invention has a wavelength of 0.1 to 600 nm, preferably 190 to 43 Q nm. The irradiation time depends on the distance between the PAS molded product and the light source and the intensity of the light source, but if it is less than 0.01 seconds, it is difficult to obtain a light irradiation effect, and if it exceeds 1000 hours, productivity will be poor.
.. It is desirable that the time is 01 seconds or more and 1000 hours or less.
この際、光増感剤の添加により、あるいは照射雰囲気に
分子状酸素を共存ないし富化させることにより、照射時
間の短縮化及びそれに伴う生産性の向上かはかられるの
は言うまでもない。At this time, it goes without saying that by adding a photosensitizer or by coexisting or enriching the irradiation atmosphere with molecular oxygen, it is possible to shorten the irradiation time and thereby improve productivity.
親水性向上の程度は任意であるが、スクリーン印刷に必
要ないし望ましいレベルはぬれ指数が40dyne/c
m以上であることが望ましい。The degree of improvement in hydrophilicity is arbitrary, but the necessary or desirable level for screen printing is a wettability index of 40 dyne/c.
It is desirable that it is more than m.
実験例
下記の諸例は、本発明を具体的に説明するためのちので
ある。本発明は、その要旨を越えない限り、以下の実施
例に限定されるものではない。EXPERIMENTAL EXAMPLES The following examples are provided to specifically illustrate the present invention. The present invention is not limited to the following examples unless it exceeds the gist thereof.
合成実施例
10リツトルオートクレーブにN M P 4 、 5
kgと、46.02重量%のNa Sを含むN a
2 S・5HO1,696kg (Na 2 Sとし
て10モル)とを仕込み、N2雰囲気下に徐々に202
℃まで昇温しながら水683gSNMP417gおよび
0.31モルのH2Sを溜出させた。この場合、系中の
水の量は、N a 2 S 1モルあたり約1.33
モルである。130℃まで冷却後、バラジクロルベンゼ
ン(PDCB 1.439kg(P D CB /
N a 2 Sモル比1.01/1.00)とNMP
0.75kgとを加えて、210℃で10時間重合を
行なった。次いで、この重合スラリーに水466gをN
2で圧入しく全水量としてN a 2 S 1モルあ
たり4モルとなる)、260℃に昇温しで10時間重合
を続けた。冷却後、パール状ポリパラフェニレンスルフ
ィド(PPPS)をNMPSPPSオリゴマー等から篩
別した。次いで、脱イオン水でくり返し洗浄し、100
℃で3時間乾燥して、pppsを得た。このポリマーの
収率は88%であり、310℃/200秒−1での溶融
粘度は4000ポイズであった。Synthesis Example 10 NMP 4,5 in a liter autoclave
kg, and Na containing 46.02% by weight Na S
1,696 kg of 2S.5HO (10 mol as Na 2 S) was charged, and 202
683 g of water, 417 g of SNMP and 0.31 mol of H2S were distilled out while increasing the temperature to .degree. In this case, the amount of water in the system is approximately 1.33 per mole of Na 2 S.
It is a mole. After cooling to 130°C, baladichlorobenzene (PDCB 1.439 kg (PD CB /
Na2S molar ratio 1.01/1.00) and NMP
0.75 kg was added, and polymerization was carried out at 210° C. for 10 hours. Next, 466 g of water was added to this polymerization slurry with N.
The total amount of water was 4 mol per 1 mol of Na 2 S), the temperature was raised to 260° C., and polymerization was continued for 10 hours. After cooling, pearl-like polyparaphenylene sulfide (PPPS) was sieved from NMPSPPS oligomer and the like. It is then washed repeatedly with deionized water and
Drying at ℃ for 3 hours gave ppps. The yield of this polymer was 88% and the melt viscosity at 310° C./200 sec −1 was 4000 poise.
以上の方法によって得られたポリマーを、ポリマーAと
する。The polymer obtained by the above method is referred to as Polymer A.
実施例
上記ポリマーAを用いて、単軸押出機にて、厚示すグラ
フである。EXAMPLE This is a graph showing the thickness of the polymer A described above in a single screw extruder.
さ約150μのTダイシートを作成した。A T-die sheet with a thickness of approximately 150 μm was prepared.
上記Tダイシートの約半分をアルミニウムマスクでカバ
ーし、ウシオ電機■製450W高圧水銀燈UM−452
にて、光源からサンプルまでの距離28cmで0分〜4
時間照射した。その時の照射面及び非照射面のぬれ指数
を、JIS K6768のぬれ指数試験方法で測定し
た。Cover about half of the above T-die sheet with an aluminum mask, and use a 450W high-pressure mercury lamp UM-452 manufactured by Ushio Inc.
0 minutes to 4 minutes at a distance of 28 cm from the light source to the sample.
Irradiated for hours. The wettability index of the irradiated surface and the non-irradiated surface at that time was measured by the wettability index test method of JIS K6768.
得られた結果を図示すれば、添付図面の通りであった。The results obtained are as shown in the attached drawings.
図面から明らかに、光照射により、選択的に表面のぬれ
性が向上し、選択的に表面改質が行なわれたことがわか
った。It is clear from the drawings that the surface wettability was selectively improved by light irradiation, and the surface was selectively modified.
なお、ウシオ電機製高圧水銀燈UM−452の代表波長
は302.2nm、313.2nm。Note that the representative wavelengths of the high-pressure mercury lamp UM-452 manufactured by Ushio Inc. are 302.2 nm and 313.2 nm.
334、lnm、365.0nm、404.7nm、4
35.8nms 546.1nm。334, lnm, 365.0nm, 404.7nm, 4
35.8nms 546.1nm.
577.0nm等であった。It was 577.0 nm, etc.
図面は、距離28cmから450W高圧水銀燈をPAS
シートに照射した場合のぬれ指数の変化を出願人代理人
佐 藤 −雄
手続補正書
昭和62年1 月n日The drawing shows a PAS 450W high pressure mercury lamp from a distance of 28cm.
The changes in the wettability index when the sheet is irradiated by the applicant's attorney, Sato-Osho, written amendment to the procedure, January n, 1985.
Claims (1)
成形物に対して0.1〜600nmの波長の光を照射す
ることにより、上記成形物の光照射部分の表面を選択的
に改質して親水性を向上させることを特徴とする、ポリ
アリーレンスルフィド成形物の選択的表面改質法。 2、照射する光の波長が190〜430nmである、特
許請求の範囲第1項記載の方法。 3、ぬれ指数が40(dyn/cm)以上になるまで光
を照射する、特許請求の範囲第1項または第2項記載の
方法。[Claims] 1. By irradiating a molded product made of polyarylene sulfide or the same composition with light having a wavelength of 0.1 to 600 nm, the surface of the light-irradiated portion of the molded product is selectively A method for selectively modifying the surface of a polyarylene sulfide molded product, which is characterized by improving hydrophilicity through modification. 2. The method according to claim 1, wherein the wavelength of the irradiated light is 190 to 430 nm. 3. The method according to claim 1 or 2, wherein light is irradiated until the wetting index becomes 40 (dyn/cm) or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61283400A JPH0764939B2 (en) | 1986-11-28 | 1986-11-28 | Selective surface modification method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61283400A JPH0764939B2 (en) | 1986-11-28 | 1986-11-28 | Selective surface modification method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63137930A true JPS63137930A (en) | 1988-06-09 |
JPH0764939B2 JPH0764939B2 (en) | 1995-07-12 |
Family
ID=17665030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61283400A Expired - Lifetime JPH0764939B2 (en) | 1986-11-28 | 1986-11-28 | Selective surface modification method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0764939B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991011485A1 (en) * | 1990-01-23 | 1991-08-08 | Japan As Represented By Director General Of Agency Of Industrial Science And Technology | Surface activation of thermoplastic resin molding |
WO1991011484A1 (en) * | 1990-01-23 | 1991-08-08 | Japan As Represented By Director General Of Agency Of Industrial Science And Technology | Surface activation of thermoplastic resin molding |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58213068A (en) * | 1982-06-03 | 1983-12-10 | Canon Inc | Recording liquid |
JPS6024957A (en) * | 1983-07-20 | 1985-02-07 | Seiko Epson Corp | Ink jet recording head and manufacture thereof |
-
1986
- 1986-11-28 JP JP61283400A patent/JPH0764939B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58213068A (en) * | 1982-06-03 | 1983-12-10 | Canon Inc | Recording liquid |
JPS6024957A (en) * | 1983-07-20 | 1985-02-07 | Seiko Epson Corp | Ink jet recording head and manufacture thereof |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991011485A1 (en) * | 1990-01-23 | 1991-08-08 | Japan As Represented By Director General Of Agency Of Industrial Science And Technology | Surface activation of thermoplastic resin molding |
WO1991011484A1 (en) * | 1990-01-23 | 1991-08-08 | Japan As Represented By Director General Of Agency Of Industrial Science And Technology | Surface activation of thermoplastic resin molding |
US5200122A (en) * | 1990-01-23 | 1993-04-06 | Japan as represented by Director Science and Technology | Surface activating method for thermoplastic resin molded articles |
Also Published As
Publication number | Publication date |
---|---|
JPH0764939B2 (en) | 1995-07-12 |
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