JPS63135845A - Light emission analyzer - Google Patents
Light emission analyzerInfo
- Publication number
- JPS63135845A JPS63135845A JP28179186A JP28179186A JPS63135845A JP S63135845 A JPS63135845 A JP S63135845A JP 28179186 A JP28179186 A JP 28179186A JP 28179186 A JP28179186 A JP 28179186A JP S63135845 A JPS63135845 A JP S63135845A
- Authority
- JP
- Japan
- Prior art keywords
- power
- high frequency
- plasma
- computer
- spectroscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 claims abstract description 15
- 238000012545 processing Methods 0.000 claims description 5
- 238000004458 analytical method Methods 0.000 claims description 3
- 238000004020 luminiscence type Methods 0.000 claims 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052786 argon Inorganic materials 0.000 abstract description 3
- 239000013078 crystal Substances 0.000 abstract description 3
- 239000007789 gas Substances 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000009616 inductively coupled plasma Methods 0.000 description 5
- 238000000295 emission spectrum Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001637 plasma atomic emission spectroscopy Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はプラズマ発光分析(ICP)を用いて。[Detailed description of the invention] [Industrial application field] The present invention uses plasma emission spectrometry (ICP).
金属中の元素量を発光スペクトル強度として分析する装
置に係り特にその発光する手段として用いる高周波電力
を自動設定することにより、測定操作の誤りをなくすの
に好適な発光スペクトル分析装置に
関する。The present invention relates to an apparatus for analyzing the amount of elements in metals as emission spectrum intensity, and particularly to an emission spectrum analyzer suitable for eliminating errors in measurement operations by automatically setting high frequency power used as a means for emitting light.
従来用いている誘導結合プラズマ発光用高周波電源を第
2図に示す。この方式はプラズマ発生用の高周波電源系
統が分光器1、制御用コンピュータ2及びデータ処理コ
ンピュータ3から完全に独立し、プラズマの点火、出力
電力の上下降は手動の点火スイッチ25と出力調整用可
変抵抗器18で行っていた。この方法ですと、分析すべ
き元素に適した電力を得るのに測定以前に必ず手動で電
力を点火できる位置まで上げてから点火操作をし、その
後に、測定に要する電力に設定する煩られしさを持って
いた0本発明は以上の欠点をなくすため全て自動操作で
、行うことを考えたものである。FIG. 2 shows a conventionally used high frequency power source for inductively coupled plasma light emission. In this method, the high-frequency power supply system for plasma generation is completely independent from the spectrometer 1, control computer 2, and data processing computer 3, and the ignition of the plasma and the rise and fall of the output power are controlled by a manual ignition switch 25 and a variable output adjustment. It was done with resistor 18. With this method, in order to obtain the appropriate power for the element to be analyzed, you have to manually raise the power to a point where it can be ignited before measurement, then operate the ignition, and then set it to the power required for measurement, which is a hassle. In order to eliminate the above-mentioned drawbacks, the present invention is designed to perform all operations automatically.
上記従来技術は装置の操作性上で分光器と高周波電力発
生装置とで、各々独立した操作及び条件設定を行ってい
たため、測定する時装置の使用者が必ず分析元素に合っ
た高周波電力に設定しなければならない、このため測値
の自動化に対して配慮がされておらず測定効率上に問題
があった6本発明の目的は上記問題点を解決するために
分光器と高周波電力発生装置の操作を一つの制御系で自
動化することにある。In the conventional technology mentioned above, the spectrometer and the high-frequency power generator were operated and set the conditions independently for the sake of operability of the device, so when making measurements, the user of the device always set the high-frequency power to match the analyzed element. For this reason, no consideration was given to automation of measurement values, and there was a problem in measurement efficiency.6 The purpose of the present invention is to solve the above problems by developing a spectrometer and a high-frequency power generator. The goal is to automate operations using one control system.
上記目的は高周波電力発生装置の入力電圧を制御用コン
ピュータで自動制御することによって、常にその出力を
監視しながら高分解能で上界及び下降させ、安全性を保
って、その時の測定元素の条件に適合した出力電力の設
定条件で分析ができることで測定効率の向上と操作性上
の簡易化が達成される。The above purpose is to automatically control the input voltage of the high-frequency power generator using a control computer, thereby constantly monitoring the output and raising and lowering the upper limit with high resolution, maintaining safety and adapting to the conditions of the element to be measured at that time. By being able to perform analysis under suitable output power settings, measurement efficiency is improved and operability is simplified.
本発明のICP発光分析装置は分光器と高周波電力発生
装置が一体となって一つの制御系の中で動作及び監視を
行い、更に自動化により、何らかの原因で高周波電力が
低下又は停止して、プラズマが消火した場合でも分光器
の測定を速やかに停止できるため測定及び操作上の誤り
やムダが防止できる。In the ICP emission spectrometer of the present invention, the spectrometer and the high-frequency power generator are integrated and operate and monitor within one control system, and furthermore, due to automation, if the high-frequency power decreases or stops for some reason, the plasma Even if a fire goes out, spectrometer measurements can be stopped immediately, which prevents errors and waste in measurements and operations.
以下本発明の一実施例を第1図により説明する。 An embodiment of the present invention will be described below with reference to FIG.
分光器1は各元素により合った光波長を分解するグレー
ティングと光信号を検知するホトマル及び増幅器をそな
え更にはアナログ信号をディジタル信号に変えてコンピ
ュータに転送する機能をもっている。まづ測定にあたっ
てデータ処理コンピュータ4はこれから測定する元素に
適合するプラズマを発光するため、制御用コンピュータ
2に信号を送る0次に2から入出力制御番20に電力設
定命令を発する。この命令を受信した20はD/A変換
器21の入力である。ディジタル量を増加しなから21
の出力のアナログ量を走査する。この信号は増幅器22
を通して、切換スイッチ19に入る。この時19をa側
(自動)に切換えておく、22の出力は電子可変減衰器
16に入る。一方水晶振動子17からは27.12M七
の高周波信号が16に入って、22からの信号の大きさ
によって増減し、その出力を励振増幅器15で増幅し、
電力増幅器14で電力に変換される。この電力は入射電
力検知器13と位相検出器12を通過してロードコイル
1oに供給される。このとき13で検出した入射電力が
増幅器23と16へ同時に入る。23の出力はA/D変
換器24に入力し、ディジタル信号に変わって20に入
力される。電力増幅器14の出力が約IKvに相当する
信号を20が検出したとき20から21に送るディジタ
ル信号の増分を停止し、2から再び20に点火命令を発
生し20は点火用スイッチ25をオンにレイブナイタ−
6から放電電流を発し、プラズマ発生部9を点火する。The spectrometer 1 is equipped with a grating that separates light wavelengths suitable for each element, a photomultiplier that detects optical signals, and an amplifier, and also has the function of converting an analog signal into a digital signal and transmitting it to a computer. First, in order to emit plasma suitable for the element to be measured, the data processing computer 4 issues a power setting command to the input/output control number 20 from the 0th order 2, which sends a signal to the control computer 2. 20, which receives this command, is the input of the D/A converter 21. Don't increase the amount of digital 21
Scan the analog quantity of the output. This signal is transmitted to the amplifier 22
and enters the selector switch 19. At this time, 19 is switched to the a side (automatic), and the output of 22 is input to the electronic variable attenuator 16. On the other hand, a high frequency signal of 27.12M7 enters 16 from crystal oscillator 17, increases or decreases depending on the magnitude of the signal from 22, and its output is amplified by excitation amplifier 15.
The power amplifier 14 converts the signal into electric power. This power passes through an incident power detector 13 and a phase detector 12 and is supplied to the load coil 1o. At this time, the incident power detected at 13 enters amplifiers 23 and 16 simultaneously. The output of 23 is input to an A/D converter 24, which converts it into a digital signal and inputs it to 20. When the output of the power amplifier 14 detects a signal corresponding to about IKv, the increment of the digital signal sent from 20 to 21 is stopped, 2 issues an ignition command to 20 again, and 20 turns on the ignition switch 25. rave nighter
6 emits a discharge current to ignite the plasma generating section 9.
点火したプラズマの光を受光し分光器1は2に点火確認
信号を送る0点火の成功を知った2は3で要求した測定
電力に20を更に制御させる動作に入る。一方位相検出
器12からの検出信号はモータ駆動器7に入力しモータ
8を駆動し可変コンデンサ11を制御し、11.10の
インピーダンスマツチングを自動的に行う、この時プラ
ズマ発生部9にはアルゴンガス5と測定用試料4が供給
されている。又切換スイッチ19をm側(手動)に切換
えておき出力調整用可変抵抗器18を手動で操作し電力
の調整を行えるようにもなっている1以上説明のように
本発明は元素ごとの測定表をコンピュータに作成するこ
とによりamm電電力制御用コンピュータから自動的に
元素に適合した電力設定ができるため、測定効率を上げ
ることと、測定誤りをなくす2つの特徴をそなえている
。Upon receiving the light of the ignited plasma, the spectrometer 1 sends an ignition confirmation signal to the spectrometer 2.0 Having learned that the ignition was successful, the spectrometer 1 enters into operation to further control the measured power 20 requested in step 3. On the other hand, the detection signal from the phase detector 12 is input to the motor driver 7, drives the motor 8, controls the variable capacitor 11, and automatically performs the impedance matching in 11.10. Argon gas 5 and measurement sample 4 are supplied. In addition, by switching the selector switch 19 to the m side (manual), you can manually operate the output adjustment variable resistor 18 to adjust the power. By creating a table on the computer, the amm electric power control computer can automatically set the power suitable for the element, which has two features: increasing measurement efficiency and eliminating measurement errors.
従来技術では2つの装置を各々独立に操作して。 In the prior art, two devices are operated independently.
測定条件を設定しなければならなかったが1本発明によ
れば1つの装置から制御することで自動的にシステム全
体を効率良く運転できるため、装置に対し顧客の操作性
は簡略化し、特にプラズマ発生電力の設定条件の誤りも
防止できる効果もそなえている。However, according to the present invention, the entire system can be operated automatically and efficiently by controlling it from one device, which simplifies the customer's operability of the device, especially for plasma It also has the effect of preventing mistakes in the setting conditions for generated power.
第1図は本発明の一実施例であるICP発光スペクトル
分析装置の高周波プラズマの発生系統図、第2図は従来
のICP発光スペクトル分析装置の高周波プラズマの発
生系統図である。
1・・・分光器、2・・・制御用コンピュータ、3・・
・データ処理コンピュータ、4・・・試料、5・・・ア
ルゴンガス、6・・・イグナイター、7・・・モータ駆
動器、8・・・モータ、9・・・プラズマ発生部、10
・・・ロードコイル、11・・・可変コンデンサ、12
・・・位相検出器。
13・・・入射電力検出器、14・・・電力増幅器、1
5・・・励振増幅器、16・・・電子可変減衰器、17
・・・水晶振動子、18・・・出力調整用可変抵抗器、
19・・・切換スイッチ、20・・・入出力制御器、2
1・・・D/A変換器、22.23・・・増幅器、24
・・・A/D変換器、25・・・点火用スイッチ。FIG. 1 is a generation system diagram of high-frequency plasma in an ICP emission spectrum analyzer according to an embodiment of the present invention, and FIG. 2 is a generation system diagram of high-frequency plasma in a conventional ICP emission spectrum analyzer. 1... Spectrometer, 2... Control computer, 3...
- Data processing computer, 4... Sample, 5... Argon gas, 6... Igniter, 7... Motor driver, 8... Motor, 9... Plasma generation unit, 10
...Load coil, 11...Variable capacitor, 12
...Phase detector. 13... Incident power detector, 14... Power amplifier, 1
5... Excitation amplifier, 16... Electronic variable attenuator, 17
...Crystal resonator, 18...Variable resistor for output adjustment,
19... Selector switch, 20... Input/output controller, 2
1...D/A converter, 22.23...Amplifier, 24
... A/D converter, 25... Ignition switch.
Claims (1)
計算機から成る分析装置において、高周波の電力設定及
び点火動作と、分光器の動作を制御用計算機で自動操作
ができることを特徴とする発光分析装置。 2、特許請求の範囲第1項において、各元素ごとの測定
表をデータ処理計算機に作成し、測定時その表の分析元
素に適合した電力を自動的に設定できる機能をそなえた
ことを特徴とする発光分析装置。[Claims] 1. In an analysis device consisting of a spectrometer, a high-frequency power generator, and a control and data processing computer, the high-frequency power setting and ignition operation, as well as the operation of the spectrometer, can be automatically operated by the control computer. Features of the luminescence spectrometer. 2. Claim 1 is characterized by having a function of creating a measurement table for each element in a data processing computer and automatically setting power suitable for the analysis element in the table at the time of measurement. A luminescence spectrometer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61281791A JPH0781952B2 (en) | 1986-11-28 | 1986-11-28 | Optical emission analyzer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61281791A JPH0781952B2 (en) | 1986-11-28 | 1986-11-28 | Optical emission analyzer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63135845A true JPS63135845A (en) | 1988-06-08 |
JPH0781952B2 JPH0781952B2 (en) | 1995-09-06 |
Family
ID=17644026
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61281791A Expired - Lifetime JPH0781952B2 (en) | 1986-11-28 | 1986-11-28 | Optical emission analyzer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0781952B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007205897A (en) * | 2006-02-02 | 2007-08-16 | Shimadzu Corp | High-frequency power supply apparatus for icp |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58169051A (en) * | 1982-03-31 | 1983-10-05 | Shimadzu Corp | Power supply apparatus for inductive coupling plasma light source |
JPS6131944A (en) * | 1984-07-25 | 1986-02-14 | Hitachi Ltd | Emission spectrum analysis device |
-
1986
- 1986-11-28 JP JP61281791A patent/JPH0781952B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58169051A (en) * | 1982-03-31 | 1983-10-05 | Shimadzu Corp | Power supply apparatus for inductive coupling plasma light source |
JPS6131944A (en) * | 1984-07-25 | 1986-02-14 | Hitachi Ltd | Emission spectrum analysis device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007205897A (en) * | 2006-02-02 | 2007-08-16 | Shimadzu Corp | High-frequency power supply apparatus for icp |
Also Published As
Publication number | Publication date |
---|---|
JPH0781952B2 (en) | 1995-09-06 |
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