JPS63135294A - Aluminum alloy substrate for lithographic plate and production thereof - Google Patents

Aluminum alloy substrate for lithographic plate and production thereof

Info

Publication number
JPS63135294A
JPS63135294A JP28259086A JP28259086A JPS63135294A JP S63135294 A JPS63135294 A JP S63135294A JP 28259086 A JP28259086 A JP 28259086A JP 28259086 A JP28259086 A JP 28259086A JP S63135294 A JPS63135294 A JP S63135294A
Authority
JP
Japan
Prior art keywords
less
aluminum alloy
plate
weight
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28259086A
Other languages
Japanese (ja)
Inventor
Satoru Shoji
了 東海林
Chozo Fujikura
藤倉 潮三
Kazunari Takizawa
滝沢 一成
Hirokazu Sakaki
榊 博和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Aluminum Co Ltd
Fujifilm Holdings Corp
Original Assignee
Furukawa Aluminum Co Ltd
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Aluminum Co Ltd, Fuji Photo Film Co Ltd filed Critical Furukawa Aluminum Co Ltd
Priority to JP28259086A priority Critical patent/JPS63135294A/en
Publication of JPS63135294A publication Critical patent/JPS63135294A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/04Printing plates or foils; Materials therefor metallic
    • B41N1/08Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/083Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers

Abstract

PURPOSE:To obtain a uniform electrolytic roughened surface with a little quantity of charge electricity and to improve a lithographic plate in plate wear and resistance to stains on non-image areas in printing, by using an aluminum alloy containing Fe, Mg, Sn, Si, and Cu in specific ratios with the content of simple Si less than a specific amount. CONSTITUTION:The composition of an aluminium alloy substrate for lithographic plate is determined as follows: 0.05-0.5% of Fe, 0.7-5% of Mg, 0.01-0.2% of Sn, 0.2% or less of Si, and 0.05% or less of Cu are contained, the remainder is made of Al and an unavoidable impurities, and simple Si is contained 0.012% or less. The impurities of 0.05% or less of Mn, 0.05% or less of Cr, and 0.05% or less of Zn contained in the aluminum alloy cause no particular problem. A uniform roughened surface can be formed by applying electrochemical surface- roughening treatment to the substrate with a little quantity of electricity. In addition, a lithographic plate making use of the substrate is superior in resistance to stains on non-printing areas in printing as well as in plate wear and strength.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は粗面化したアルミニウム合金板表面に陽極酸化
皮膜処理を施し、さらに感光性物質を塗布して形成され
る平版印刷版に使用される支持体にかかわるものであっ
て、電気化学的粗面化処理において少ない電気量で均一
な粗面か得られ、印刷中の非画像部の耐汚れ性がすぐれ
、さらに強度と耐刷力にすぐれる平板印刷版を与えるア
ルミニウム合金支持体とその製造方法に関するものであ
る。
Detailed Description of the Invention (Field of Industrial Application) The present invention is used for a lithographic printing plate formed by subjecting the surface of a roughened aluminum alloy plate to an anodic oxidation film treatment and further coating a photosensitive substance. It is related to supports that can be electrochemically roughened with a small amount of electricity, has excellent stain resistance in non-image areas during printing, and has excellent strength and printing durability. The present invention relates to an aluminum alloy support that provides an excellent lithographic printing plate and a method for manufacturing the same.

(従来の技術) 従来、平版印刷版としては、粗面化処理、陽極酸化皮膜
処理などの表面処理を施したアルミニウム板上に感光性
物質を塗布したものか用いられている。この中て最も広
く用いられているのは、予め感光性物質を塗布してすぐ
焼付けられる状態になっているいわゆる23版である。
(Prior Art) Conventionally, as a lithographic printing plate, an aluminum plate coated with a photosensitive substance has been used, which has been subjected to surface treatments such as roughening treatment and anodized coating treatment. The most widely used of these is the so-called 23 plate, which is coated with a photosensitive material in advance and is ready for printing immediately.

このような平版印刷版に画像露光、現像、水洗、ラッカ
ー盛り等の製版処理を施して印刷版か得られるが、この
現像処理による未溶解の感光層は画像部を形成し、感光
層が除去されてその下のアルミニウム表面か露出した部
分は親水性の為、水受容部となり、非画像部を形成する
A printing plate is obtained by subjecting such a lithographic printing plate to plate-making processes such as image exposure, development, water washing, and lacquer application, but the undissolved photosensitive layer due to this development process forms an image area, and the photosensitive layer is removed. The exposed portion of the aluminum surface underneath is hydrophilic, so it becomes a water receiving area and forms a non-image area.

かかる平版印刷版の支持体としては、一般に軽量て表面
処理性、加工性、耐食性に優れたアルミニウム板か使わ
れており、この目的に供される従来材としては、JIS
  1050(純度99.5重量%以上の純Al)、J
IS  1100 (Al−0,05〜0.20重量%
Cu合金)JIS  3003(A l −0,05〜
0.20重量%Cu−1,5重量%Mn合金)等の厚さ
0.1〜0.811mのアルミニウム合金板かある。こ
のアルミニウム合金板は表面を機械的方法、化学的方法
、電気化学的方法のいずれかの−、あるいは二以上組み
合わされた工程による粗面化法により粗面化し、その後
好ましくは陽極酸化処理を施して使用される。
As a support for such lithographic printing plates, aluminum plates are generally used, which are lightweight and have excellent surface treatment properties, workability, and corrosion resistance. Conventional materials used for this purpose include JIS
1050 (Pure Al with a purity of 99.5% by weight or more), J
IS 1100 (Al-0.05~0.20% by weight
Cu alloy) JIS 3003 (A l -0.05 ~
There are aluminum alloy plates having a thickness of 0.1 to 0.811 m, such as 0.20 wt% Cu-1,5 wt% Mn alloy). The surface of this aluminum alloy plate is roughened by a mechanical method, a chemical method, an electrochemical method, or a combination of two or more steps, and then preferably anodized. used.

具体的には特開昭48−49501号公報に記載されて
いる機械的粗面化処理、化学的エッチンク処理、陽極酸
化皮膜処理を順に施したアルミニウム平版印刷版、ある
いは特開昭51−61304号公報に記載されている化
学エツチング処理、陽極酸化皮膜処理を順に施したアル
ミニウム平版印刷版、特開昭54−146234号公報
に記載されている電気化学的処理、後処理、陽極酸化皮
膜処理を施したアルミニウム平版印刷版、特公昭48−
28123号公報に記載されている電気化学的処理、化
学的エツチング処理、陽極酸化皮膜処理を順に施したア
ルミニウム平版印刷版、特開昭54−63902号公報
に記載されている機械的粗面化処理、化学的エツチング
処理、電気化学的粗面化処理を順に施したアルミニウム
平版印刷版などが知られている。そしてこのような支持
体の上に塗布される感光層を適当に選ふことによりlO
万枚にも及ぶ印刷にも耐えるアルミニウム平版印刷版を
得ることか可能である。
Specifically, an aluminum lithographic printing plate subjected to mechanical roughening treatment, chemical etching treatment, and anodic oxide film treatment described in JP-A-48-49501, or JP-A-51-61304. Aluminum lithographic printing plates were subjected to chemical etching treatment and anodic oxide film treatment as described in the publication, and electrochemical treatment, post-treatment, and anodic oxide film treatment were performed as described in JP-A-54-146234. Aluminum lithographic printing plate, Special Publication 1977-
Aluminum lithographic printing plate subjected to electrochemical treatment, chemical etching treatment, and anodic oxide film treatment described in Japanese Patent Publication No. 28123, and mechanical roughening treatment described in Japanese Patent Application Laid-Open No. 54-63902. Aluminum lithographic printing plates are known which have been sequentially subjected to chemical etching treatment, electrochemical roughening treatment, and the like. By appropriately selecting the photosensitive layer coated on such a support, lO
It is possible to obtain an aluminum lithographic printing plate that can withstand printing of up to 10,000 sheets.

特にアルミニウム合金板に電気化学的粗面化処理を施す
場合は、耐刷力(耐刷性)、調子再現性、及び保水性の
良い平版印刷版が得られ、また粗面の形態の制御もしや
すく大量生産に向いているので、工業的に広〈実施され
ている。
In particular, when electrochemical surface roughening treatment is applied to aluminum alloy plates, lithographic printing plates with good printing durability, tone reproducibility, and water retention can be obtained, and the rough surface morphology can also be controlled. Because it is easy and suitable for mass production, it is widely used industrially.

従来、電気化学的粗面化処理に適するアルミニウム合金
板としては上記JIS  1050合金板のほか、■F
e0.35〜1重量%(以下、重量%を%と略記する)
、Si0.2%以下のアルミニウム合金を均質化処理後
、熱間圧延し、40〜80%の冷間圧延を行ったアルミ
ニウム合金板(特開昭55−28874号)、■Fe 
0.1〜1.0%、S i  0.02〜0.15%、
Cu 0.003%以下のアルミニウム合金板(特開昭
58−221254号)などか提案されており、その他
、Fe及びSiを所定量含有させたアルミニウム合金板
は特開昭58−42493号、同59−67349号に
開示されている。
Conventionally, in addition to the JIS 1050 alloy plate mentioned above, aluminum alloy plates suitable for electrochemical surface roughening treatment include ■F
e0.35 to 1% by weight (hereinafter, weight% is abbreviated as %)
, Aluminum alloy plate prepared by homogenizing an aluminum alloy containing 0.2% Si or less, followed by hot rolling and 40 to 80% cold rolling (Japanese Patent Application Laid-Open No. 55-28874), ■Fe
0.1-1.0%, Si 0.02-0.15%,
Aluminum alloy plates containing 0.003% or less of Cu (Japanese Patent Application Laid-open No. 58-221254) have been proposed, and aluminum alloy plates containing a predetermined amount of Fe and Si have been proposed in Japanese Patent Application Laid-Open No. 58-42493 and the same. No. 59-67349.

(発明か解決しようとする問題点) 上記従来の平版印刷版用アルミニウム合金板を用いれば
、電気化学的粗面化処理により均一粗面か()られる。
(Problems to be Solved by the Invention) When the above-mentioned conventional aluminum alloy plate for lithographic printing plates is used, a uniformly roughened surface can be obtained by electrochemical surface roughening treatment.

しかし近年の電力費の高騰に伴ない、電気化学的粗面化
処理時の投入電気量を低減して省エネルギー、省コスト
による製造を行う要望か出てきている。
However, with the rise in electricity costs in recent years, there has been a desire to reduce the amount of electricity input during electrochemical surface roughening treatment to save energy and cost.

しかるに上記の従来アルミニウム合金板ては投入電気量
を減じると粗面化か十分なされず未エツチング部分か残
存し、感光性物質との密着性が低下して、このためアル
ミニウム平版印刷版の耐刷力が劣化するという欠点があ
った。
However, when the amount of electricity applied to the above-mentioned conventional aluminum alloy plate is reduced, the surface is not sufficiently roughened and some unetched areas remain, reducing the adhesion with the photosensitive material, which reduces the printing life of the aluminum lithographic printing plate. The drawback was that the power deteriorated.

また、大部数(飲方部以上)の印刷を行う場合は従来の
アルミニウム合金支持体は、局部的な腐食により、親木
性か失なわれ、非画像部にインクか付着して印刷物に汚
れか発生するという問題があった。この局部的な腐食は
、本発明者らの検討によれば、アルミニウム合金板内部
に単体Siか存在すると陽極酸化処理により皮膜の健全
性か損なわれること、また単体Siとマトリクス(アル
ミニウム)との電位差のため局部電池反応か起こること
などに起因することか判明した。上記従来のJIS  
1050合金板などは通常の製造方法では単体Siが生
成しやすいため、特に大部数の印刷を行う場合非画像部
の汚れか発生する。
In addition, when printing a large number of copies (more than the number of copies), the conventional aluminum alloy support loses its parent property due to local corrosion, and ink adheres to the non-image area and stains the printed matter. There was a problem that something happened. This local corrosion is caused by the fact that the presence of elemental Si inside the aluminum alloy plate impairs the integrity of the film due to anodizing treatment, and that the presence of elemental Si inside the aluminum alloy plate impairs the integrity of the film, and that the relationship between elemental Si and matrix (aluminum) It turned out that this was caused by a local battery reaction occurring due to the potential difference. The above conventional JIS
In the case of 1050 alloy plates and the like, elemental Si is likely to be generated using normal manufacturing methods, so that stains may occur in non-image areas, especially when printing a large number of copies.

また、印刷技術の進歩に伴ない印刷速度か上昇した今日
、印刷機の版胴の両端に機械的に固定される印刷版に加
わる応力か増える傾向にある。そのため印刷版の引張強
度か不足する場合には、この固定部分か変形または破損
して印刷ずれ等の障害を起こし、印刷不能となる場合か
度々ある。従来のJIS  1050合金板では引張強
度が低いためこのような障害か発生しやすく、3003
合金板などは引張強度は十分であるが電解粗面化性か劣
り、非画像部の汚れも生じやすい欠点があった。
Furthermore, as printing speeds have increased with the advancement of printing technology, the stress applied to printing plates that are mechanically fixed to both ends of the plate cylinder of a printing press tends to increase. Therefore, if the tensile strength of the printing plate is insufficient, this fixed portion may be deformed or damaged, causing problems such as printing misalignment, and often making printing impossible. Conventional JIS 1050 alloy plates have low tensile strength and are prone to such failures, and 3003
Although alloy plates and the like have sufficient tensile strength, they have poor electrolytic surface roughening properties and have the drawback of easily staining non-image areas.

従って本発明の目的は電気化学的粗面化処理を少ない電
気量て行って均一な粗面を形成することかでき、印刷中
の非画像部の耐汚れ性かすぐれ、しかも耐刷力と強度に
すぐれる平版印刷版を与えるアルミニウム合金支持体を
提供することである。
Therefore, the object of the present invention is to be able to form a uniformly roughened surface by performing electrochemical surface roughening treatment with a small amount of electricity, to improve stain resistance of non-image areas during printing, and to improve printing durability and strength. An object of the present invention is to provide an aluminum alloy support that provides an excellent lithographic printing plate.

(問題点を解決するための手段) 本発明の上記目的はF e 0.05〜0.5%、Mg
0.7〜5%、S n 0.01〜0.2%、Si0.
2%以下、Cu、0.05%以下を含有し、残部Alと
不可避の不純物からなり、かつ、単体Siが0.012
%以下であることを特徴とする平版印刷版用アルミニウ
ム合金支持体により達成された。
(Means for Solving the Problems) The above object of the present invention is to reduce Fe 0.05 to 0.5%, Mg
0.7-5%, Sn 0.01-0.2%, Si0.
2% or less, Cu, 0.05% or less, the balance consists of Al and unavoidable impurities, and elemental Si is 0.012%
This was achieved by using an aluminum alloy support for lithographic printing plates, which is characterized in that it is less than %.

本発明において支持体の組成を上記のごとく限定したの
は下記の理由によるものである。
The reason why the composition of the support is limited as described above in the present invention is as follows.

Feはアルミニウム合金中で他の元素と結びつき、A交
−Fe系またはAl−Fe−Si系の共晶化合物を形成
する元素てあり、これらの共晶化合物は再結晶粒の微細
化に効果かあると共に、均一微細な電解粗面を形成する
効果があり、含有量が0.05%未満ては再結晶粒の微
細化、電解粗面化面の均一微細化効果か少なく、また0
、5%を越える含有量ては粗大化合物の形成により逆に
電解粗面化面が不均一となる。
Fe is an element that combines with other elements in aluminum alloys to form A-cross-Fe system or Al-Fe-Si system eutectic compounds, and these eutectic compounds are effective in refining recrystallized grains. If the content is less than 0.05%, the effect of refining recrystallized grains and uniformly refining the electrolytically roughened surface will be small, or 0.05%.
If the content exceeds 5%, the electrolytically roughened surface will become non-uniform due to the formation of coarse compounds.

Mgは、電気化学的粗面化処理に悪影響を及ぼさずに強
度を向上させる効果を有する。0.7%未満てはその効
果が十分てなく、5%を越えると強度か高くなりすぎ、
版胴に取付けにくくなるうえ、非画像部の耐汚れ性も劣
るようになる。
Mg has the effect of improving strength without adversely affecting electrochemical roughening treatment. If it is less than 0.7%, the effect is not sufficient, and if it exceeds 5%, the strength will be too high.
Not only will it be difficult to attach it to the plate cylinder, but the stain resistance of non-image areas will also be poor.

Snは、電気化学的粗面化処理において電解エツチング
速度を加速し、少電気量で適切な表面粗さを有する均一
微細な粗面を得るため添加する。Snは大部分は固溶し
一部Mg−3n系の微細な金属間化合物を形成する。こ
の固溶Snがエツチング速度を加速し、Mg−5n系の
微細金属間化合物かエツチングの均一性を向上させる効
果を有していると推定され、Sn添加量が0.01%未
満ではこのような効果が十分てなく、 0.2%を越え
ると単体Snとして存在するため、粗面の均一性をかえ
って害するようになる。
Sn is added in order to accelerate the electrolytic etching rate in the electrochemical surface roughening treatment and to obtain a uniform, finely roughened surface having an appropriate surface roughness with a small amount of electricity. Sn is mostly dissolved in solid solution and partially forms a fine intermetallic compound of Mg-3n type. It is estimated that this solid solution Sn has the effect of accelerating the etching rate and improving the uniformity of etching due to the Mg-5n-based fine intermetallic compound. However, if it exceeds 0.2%, Sn will exist as a simple substance, which will actually impair the uniformity of the rough surface.

Siは0.2%以下とする。Siは通常の不純物として
含まれ、 0.2%を越えると粗面の均一性が害されま
た、後述の単体Siの析出か起こりやすくなるため非画
像部の汚れも発生しやすい。
The content of Si is 0.2% or less. Si is contained as a normal impurity, and if it exceeds 0.2%, the uniformity of the rough surface is impaired, and the precipitation of elemental Si, which will be described later, is likely to occur, resulting in staining of non-image areas.

Cuを0.05%以下に限定したのは、不純物としてC
uか0.05%を越えると電気化学的粗面化処理によっ
て生成する四部(ピット)か粗大になりやすく非画像部
の耐汚れ性も低下するからである。
The reason why Cu is limited to 0.05% or less is because C is an impurity.
This is because if u exceeds 0.05%, the pits generated by electrochemical surface roughening treatment tend to become coarse and the stain resistance of non-image areas also deteriorates.

また、最終冷間圧延板中の単体Siの存在量を0.01
2%以下と限定したのは、単体Siは陽極酸化処理によ
り陽極酸化皮膜中に残存して皮膜欠陥を形成し、これが
印刷中に非画像部の汚れ発生の起点となり、しかも電解
粗面の均一性を害するためてあり、固溶していない単体
Siの存在量を0.012%以下に規制することにより
、非画像部の汚れが発生しにくい、印刷適性の極めて優
れた印刷版とすることかてきることを見出したものであ
る。
In addition, the amount of elemental Si in the final cold-rolled plate was set to 0.01
The reason for limiting the content to 2% or less is that elemental Si remains in the anodic oxide film after anodizing treatment and forms film defects, which become the starting point for staining in non-image areas during printing. By regulating the amount of elemental Si, which is present in non-solid solution and does not impair the properties, to 0.012% or less, it is possible to obtain a printing plate with extremely excellent printability that is less likely to cause stains in non-image areas. This is what I discovered.

本発明における平版印刷版用支持体を構成するアルミニ
ウム合金中に含まれる不純物としては、通常市販されて
いるAl地金に含まれる不純物程度てあれば本発明の目
的を損なうものてはない。
The object of the present invention will not be impaired if the impurities contained in the aluminum alloy constituting the lithographic printing plate support in the present invention are at the level of impurities contained in commercially available Al ingots.

即ちMn0.05%以下、Cr0.05%以下、ZnO
605%以下ならば特に問題はない。
That is, Mn 0.05% or less, Cr 0.05% or less, ZnO
There is no particular problem if it is 605% or less.

また、鋳塊の製造に際し、結晶微細化剤として通常使用
されているTi、BはTi0.05%以下、B 0.0
1%以下の添加であれば合金組織の均一微細化に有効で
ある。
In addition, when manufacturing ingots, Ti and B, which are usually used as crystal refining agents, contain less than 0.05% of Ti and 0.0% of B.
Addition of 1% or less is effective in making the alloy structure uniform and fine.

本発明の平版印刷版用アルミニウム合金支持体の製造は
、F e 0.05〜0.5%、Mg0.7〜5%、S
n0.旧〜0,2%、Si0.2%以下、CuO805
%以下、残部AIと不可避の不純物からなるアルミニウ
ム合金鋳塊を均熱処理した後、430°C以下の温度ま
て50°C/時以下の平均冷却速度て冷却するか、又は
350〜450°Cの温度で30分間以上保持してから
、熱間圧延又は熱間圧延後、冷間圧延と中間焼鈍を行い
、これに減面率50%以上の最終冷間圧延を加えること
により、単体Siを0.012%以下とする方法により
行うことかてきる。
The production of the aluminum alloy support for lithographic printing plates of the present invention includes Fe 0.05-0.5%, Mg 0.7-5%, S
n0. Old ~0.2%, Si0.2% or less, CuO805
% or less, the remainder AI and unavoidable impurities are soaked and then cooled to a temperature of 430°C or less at an average cooling rate of 50°C/hour or less, or 350 to 450°C. After holding at a temperature of 30 minutes or more, hot rolling or after hot rolling, cold rolling and intermediate annealing are performed, followed by final cold rolling with an area reduction rate of 50% or more. This can be done by controlling the content to 0.012% or less.

この平版印刷用支持体の製造において前記組成のアルミ
ニウム合金鋳塊を均熱処理して、不純物を固溶させると
ともにFeの一部を固溶させ、一部のFeの金属間化合
物を均一微細に分散させる。この灼熱処理は500〜6
20°Cの温度て3時間以上行うことが望ましい。次に
これを430°C以下の温度に達するまて50°C/時
以下の平均冷却速度で冷却するか、又は350〜450
°Cの温度て30分以上保持することにより鋳塊中に含
まれるSi原子をAl1−Fe−5i系の金属間化合物
として析出させ、続く工程での単体Si析出量を減じる
。また、このAl−Fe−3i系金金属化合物は、熱延
パス間ての再結晶の核として作用するため、再結晶粒微
細化効果を有し、ストリーク発生防止に極めて有効であ
る。このときSnの一部はMgと結びつきMg  Sn
系の微細金属間化合物として均一に析出するため、前述
のように電気化学的粗面化処理の均一性の向上効果かあ
る。
In manufacturing this lithographic printing support, an aluminum alloy ingot having the above composition is subjected to soaking treatment to dissolve impurities and a portion of Fe into a solid solution, and a portion of the intermetallic compound of Fe is uniformly and finely dispersed. let This scorching heat treatment is 500-6
It is desirable to carry out the treatment at a temperature of 20°C for 3 hours or more. This is then cooled at an average cooling rate of 50°C/hour or less until it reaches a temperature of 430°C or less, or
By holding the ingot at a temperature of 30 minutes or more, the Si atoms contained in the ingot are precipitated as an Al1-Fe-5i intermetallic compound, thereby reducing the amount of elemental Si precipitated in subsequent steps. Furthermore, since this Al-Fe-3i gold metal compound acts as a nucleus for recrystallization between hot rolling passes, it has the effect of refining recrystallized grains and is extremely effective in preventing the occurrence of streaks. At this time, a part of Sn combines with Mg and becomes Mg Sn
Since it precipitates uniformly as a fine intermetallic compound, it has the effect of improving the uniformity of electrochemical surface roughening treatment, as described above.

しかる後通常の方法て熱間圧延し、又は熱間圧延後冷間
圧延と中間焼鈍を行う。熱間圧延温度は450〜200
℃で行うのが適当である。熱間圧延開始温度か450°
Cを越えると、熱延パス間ての再結晶粒が1100p以
上と粗大になり、最終冷間圧延板にストリークが発生し
やすい。必要に応して行う熱間圧延後の中間焼鈍は35
0〜500°Cて2〜5時間あるいは連続焼鈍炉におい
て400〜550°Cて120秒以下行うことが望まし
い。
Thereafter, hot rolling is carried out in a conventional manner, or cold rolling and intermediate annealing are performed after hot rolling. Hot rolling temperature is 450-200
It is appropriate to carry out the test at ℃. Hot rolling start temperature 450°
When C is exceeded, the recrystallized grains between hot rolling passes become coarse, 1100p or more, and streaks are likely to occur in the final cold rolled sheet. Intermediate annealing after hot rolling, if necessary, is 35
It is preferable to perform the annealing at 0 to 500°C for 2 to 5 hours or in a continuous annealing furnace at 400 to 550°C for 120 seconds or less.

このようにして得られた板は減面率か50%以上となる
よう最終冷間圧延される。この最終冷却圧延において金
属間化合物が分散し、結晶組織か均一となる。この減面
率か50%未満では金属間化合物の分散が不十分て結晶
組織か不均一となり、粗面化処理において均一な粗面が
得られない。
The plate thus obtained is finally cold-rolled to have an area reduction of 50% or more. In this final cooling rolling, intermetallic compounds are dispersed and the crystal structure becomes uniform. If the area reduction rate is less than 50%, the intermetallic compound will not be sufficiently dispersed, resulting in a non-uniform crystal structure, and a uniform roughened surface will not be obtained in the surface roughening treatment.

なお、この最終冷間圧延板に適度の延性を与えて疲労強
度を向上させるために、単体Siの析出が起こらない、
以下の条件てならば、調質焼鈍を施しても良い。調質焼
鈍は、通常のバッチ炉においては70〜180℃て30
分以上行うのが適当である。70°C以下または30分
未満ではあまり効果かなく、180°C以上では単体S
iの析出が起こり、非画像部の耐汚れ性を損なう。調質
焼鈍は、急速昇温・短時間加熱を特徴とする連続焼鈍炉
て行っても良く、この場合は150〜400℃て120
秒以下加熱するのか適当である。150°C未満ては効
果か不足し、400°Cを越えると板か軟化しすぎてし
まい、また120秒以上の加熱時間では生産性か悪くな
る。
In addition, in order to impart appropriate ductility to this final cold-rolled plate and improve fatigue strength, precipitation of elemental Si does not occur.
Temperature annealing may be performed under the following conditions. Temperature annealing is performed at 70 to 180°C at 30°C in a normal batch furnace.
It is appropriate to do this for more than a minute. It is not very effective at temperatures below 70°C or for less than 30 minutes, and at temperatures above 180°C, single S
i precipitation occurs, impairing the stain resistance of non-image areas. Temperature annealing may be performed in a continuous annealing furnace characterized by rapid temperature rise and short-time heating, in which case the temperature is 150 to 400°C and 120°C.
It is appropriate to heat it for less than a second. If the heating time is less than 150°C, the effect will be insufficient, if it exceeds 400°C, the plate will become too soft, and if the heating time is longer than 120 seconds, the productivity will be poor.

このようにして得られた冷間圧延板は、内部に存在する
単体Siか0.012%以下である。この冷間圧延板を
電気化学的粗面化処理すれば少ない電気量で均一な粗面
が得られる。この粗面化したアルミニウム合金板を支持
体として用い、印刷中の非画像部の耐汚れ性かすぐれ、
さらに強度及び耐刷力にすぐれる平版印刷版を得ること
かてきる。
The cold-rolled plate thus obtained contains 0.012% or less of elemental Si inside. If this cold-rolled plate is electrochemically roughened, a uniformly roughened surface can be obtained with a small amount of electricity. Using this roughened aluminum alloy plate as a support, it has excellent stain resistance in non-image areas during printing.
Furthermore, it is possible to obtain a lithographic printing plate with excellent strength and printing durability.

次に本発明の平版印刷版用アルミニウム合金支持体の表
面処理方法について詳細に説明する。
Next, the method for surface treatment of the aluminum alloy support for lithographic printing plates of the present invention will be explained in detail.

本発明のアルミニウム合金支持体を作成するための砂目
立て方法(粗面化処理方法)は塩酸又は硝酸電解液中て
電気化学的に砂目立てする電気化学的砂目立て法か好ま
しいか、アルミニウム表面を全屈ワイヤーでひっか〈ワ
イヤーブラシグレイン法、研摩法と研摩剤でアルミニウ
ム表面を砂目立てするポールグレイン法、ナイロンブラ
シと研摩剤で表面を砂目立てするブラシフレイン法のよ
うな機械的砂目立て法も用いることかでき、これらの砂
目立て方法を単独であるいは組み合わせて用いることも
てきる。
The graining method (surface roughening treatment method) for producing the aluminum alloy support of the present invention is preferably an electrochemical graining method in which the aluminum surface is grained electrochemically in a hydrochloric acid or nitric acid electrolyte. Mechanical graining methods such as the wire brush grain method, which uses a fully bent wire to grain the aluminum surface, the pole grain method, which grains the aluminum surface using a polishing method and an abrasive, and the brush grain method, which grains the surface with a nylon brush and abrasive. These graining methods can also be used alone or in combination.

このように砂目立て処理したアルミニウムは。Aluminum grained in this way.

必要により、酸又はアルカリにより化学的にエツチング
される。酸をエツチング剤として用いた場合は、微細構
造を破壊するのに非常に時間がかかり、工業的に本発明
を適用するに際しては不利であるか、アルカリをエツチ
ング剤として用いることにより改善できる。
If necessary, it is chemically etched with acid or alkali. When an acid is used as an etching agent, it takes a very long time to destroy the fine structure, which is disadvantageous when applying the present invention industrially, or it can be improved by using an alkali as an etching agent.

本発明において好適に用いられるアルカリ剤は、苛性ソ
ーダ、炭酸ソーダ、アルミン酸ソータ、メタ珪酸ソータ
、燐酸ソーダ、水酸化カリウム、水酸化リチウム等を用
い、濃度と温度の好ましい範囲はそれぞれ1〜50%、
20〜100℃であり、Alの溶解量が5〜20g/r
n’となるような条件か好ましい。
The alkaline agent suitably used in the present invention includes caustic soda, soda carbonate, aluminate sorter, metasilicate sorter, sodium phosphate, potassium hydroxide, lithium hydroxide, etc., and the preferred range of concentration and temperature is 1 to 50% for each. ,
The temperature is 20-100℃, and the amount of dissolved Al is 5-20g/r.
Preferably, the conditions are such that n'.

エツチングのあと表面に残留する汚れ(スマフト)を除
去するために酸洗いか行われる。用いられる酸は硝酸、
硫酸、リン酸、クロム酸、ふっ酩、はうふつ化水素酸等
が用いられる。特に電気化学的粗面化処理後のスマット
除去処理は、好ましくは特開昭33−12739号公報
に記載されているような50〜90’Cの温度の15〜
65重量%の硫酸と接触させる方法及び特公昭48−2
8123号公報に記載されているアルカリエツチングす
る方法である。
After etching, pickling is performed to remove any dirt (smuft) remaining on the surface. The acid used is nitric acid,
Sulfuric acid, phosphoric acid, chromic acid, sulfuric acid, hydrofluoric acid, etc. are used. In particular, the smut removal treatment after the electrochemical surface roughening treatment is preferably performed at a temperature of 50 to 90'C as described in JP-A-33-12739.
Method of contacting with 65% by weight sulfuric acid and Japanese Patent Publication No. 48-2
This is an alkali etching method described in Japanese Patent No. 8123.

以上のようにして処理されたアルミニウム板は平版印刷
版用支持体として使用することかできるが、さらに必要
に応して陽極酸化皮膜処理、化成処理などの処理を施す
ことが好ましい。
Although the aluminum plate treated as described above can be used as a support for a lithographic printing plate, it is preferable to further perform treatments such as anodization coating treatment and chemical conversion treatment as necessary.

陽極酸化処理はこの分野で従来より行われている方法で
行うことかてきる。具体的には、硫酸、リン酸、クロム
酸、シュウ酸、スルファミン酸、ベンゼンスルホン酸等
あるいはこれらの二種類以上を組み合わせて水溶液又は
非水溶液中てアルミニウムに直流または交流の電流を流
すとアルミニウム支持体表面に陽極酸化皮膜を形成する
ことかてきる。
The anodic oxidation treatment can be performed by a method conventionally used in this field. Specifically, when direct or alternating current is passed through aluminum in an aqueous or non-aqueous solution using sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid, etc. or a combination of two or more of these acids, aluminum is supported. It is possible to form an anodic oxide film on the body surface.

陽極酸化の処理条件は使用される電解液によって種々変
化するので一概には決定され得ないが、一般的には電解
液の濃度か1〜80%、液温5〜70℃、電流密度0.
5〜60アンペア/dm’、電圧1〜100v、電解時
間10〜Zoo秒の範囲か適当である。
The processing conditions for anodic oxidation vary depending on the electrolytic solution used, so they cannot be determined unconditionally, but generally the electrolytic solution concentration is 1 to 80%, the solution temperature is 5 to 70°C, and the current density is 0.
A range of 5 to 60 amperes/dm', a voltage of 1 to 100 V, and an electrolysis time of 10 to Zoo seconds is appropriate.

これらの陽極酸化皮膜処理の内ても特に英国特許第1,
412,768号明細書に記載されている発明て使用さ
れている、硫酸中で高電流密度で陽極酸化する方法及び
米国特許第3,511,661号明細書に記載されてい
るリン酸を電解浴として陽極酸化する方法が好ましい。
Among these anodic oxide coating treatments, the British Patent No. 1,
No. 412,768, the invention uses a method of anodizing in sulfuric acid at high current density, and U.S. Pat. A method of anodizing as a bath is preferred.

陽極酸化されたアルミニウム板はさらに米国特許第2,
714,066号及び同第3,181゜461号の各明
細書に記載されているようにアルカリ金属シリケート、
例えば珪酸ナトリウムの水溶液て浸漬などの方法により
処理したり、米国特許第3,860,426号明細書に
記載されているように、水溶性金属塩(例えば酢酸亜鉛
など)を含む親木性セルロース(例えば、カルボキシメ
チルセルロースなど)の下塗り層を設けることもてきる
The anodized aluminum plate is further covered by U.S. Patent No. 2,
Alkali metal silicates, as described in the specifications of No. 714,066 and No. 3,181°461;
For example, woody cellulose containing water-soluble metal salts (such as zinc acetate) may be treated by methods such as immersion in an aqueous solution of sodium silicate, or as described in U.S. Pat. No. 3,860,426. A subbing layer (eg, carboxymethyl cellulose) may also be provided.

本発明による平版印刷版用支持体の上には、PS板の感
光層として従来より知られている感光層を設けて感光性
平板印刷板を得ることかでき。
A photosensitive layer conventionally known as a photosensitive layer of a PS plate can be provided on the support for a lithographic printing plate according to the present invention to obtain a photosensitive lithographic printing plate.

これを製版処理して得た平板印刷板は優れた性情を有し
ている。
The lithographic printing plate obtained by plate-making this material has excellent properties.

上記感光層の組成物としては次のようなものか含まれる
The composition of the photosensitive layer includes the following.

■ジアゾ樹脂とバインダーとからなる感光層米国特許第
2,063,631号及び同第1.667.415号の
各明細書に開示されているジアゾニウム塩とアルドール
やアセタールのような反応性カルボニル基を含有する有
a lit合剤との反応生成物であるジフェニルアミン
−p−ジアゾニウム塩とホルムアルデヒドとの縮合生成
物(所謂感光性ジアゾ樹脂)か好適に用いられる。この
他の有用な縮合ジアゾ化合物は特公昭49−48001
号、同49−45322号、同49−45323号の各
公報等に開示されている。
■Photosensitive layer consisting of diazo resin and binder Diazonium salt and reactive carbonyl group such as aldol or acetal disclosed in U.S. Patent Nos. 2,063,631 and 1,667,415 A condensation product (so-called photosensitive diazo resin) of diphenylamine-p-diazonium salt, which is a reaction product with an alit mixture containing formaldehyde, is preferably used. Other useful condensed diazo compounds are listed in Japanese Patent Publication No. 49-48001.
No. 49-45322, No. 49-45323, etc.

これらの型の感光性ジアゾ化合物は通常水溶性無機塩の
型で得られ、従って水溶蔽から塗布することかてきる。
These types of photosensitive diazo compounds are usually obtained in the form of water-soluble inorganic salts and can therefore be applied by aqueous coating.

又はこれらの水溶性ジアゾ化合物を特公昭47−116
7号公報に開示された方法により1個又はそれ以上のフ
ェノール性水酸基、スルホン酸基又はその両者を有する
芳香族又は脂肪族化合物と反応させ、その反応生成物で
ある実質的に水不溶性の感光性ジアゾ樹脂を使用するこ
ともてきる。また、特開昭56−121031号公報に
記載されているようにヘキサフルオロ燐#塩またはテト
ラフルオロ硼酸塩との反応生r&物として使用すること
もてきる。そのほか英国特許第1,312,925号明
細書に記載されているジアゾ樹脂も好ましい。
Or these water-soluble diazo compounds are
A substantially water-insoluble photosensitive product obtained by reacting with an aromatic or aliphatic compound having one or more phenolic hydroxyl groups, sulfonic acid groups, or both by the method disclosed in Publication No. 7 Polymeric diazo resins can also be used. It can also be used as a reaction product with hexafluorophosphorus #salt or tetrafluoroborate as described in JP-A-56-121031. In addition, diazo resins described in British Patent No. 1,312,925 are also preferred.

■0−キノンジアジド化合物からなる感光層特に好まし
い0−キノンジアジド化合物は〇−ナフトキノンシアシ
ト化合物であり例えば米国特許第2,766.118号
、同第2.767.092号、同第2,772,972
号、同第2,859,112号、同第2,907,66
5号、同第3,046,110号、同第3゜046.1
11号、同第3,046,115号、同J3 、046
 、118号、同第3,046.119号、同第3,0
46,120号、同第3.046,121号、同第、3
,046゜122号、同第3,046,123号、同第
3.061,430号、同第3,102,809号、同
第3,106,465号、同第3,635.709号、
同第3,647,443号の各明細書をはじめ多数の刊
行物に記されており、これらは好適に使用することかて
きる。
(2) Photosensitive layer made of 0-quinonediazide compound Particularly preferred 0-quinonediazide compounds are 〇-naphthoquinone cyasito compounds, such as U.S. Pat. No. 2,766.118, U.S. Pat. 972
No. 2,859,112, No. 2,907,66
No. 5, No. 3,046,110, No. 3゜046.1
No. 11, No. 3,046,115, J3, 046
, No. 118, No. 3,046.119, No. 3,0
No. 46,120, No. 3.046,121, No. 3
, 046゜122, 3,046,123, 3.061,430, 3,102,809, 3,106,465, 3,635.709 ,
It is described in many publications including the specification of the same No. 3,647,443, and these can be used suitably.

■アシド化合物とバインター(高分子化合物からなる感
光層) 例えば英国特許第1,235,281号、同第1,49
5,861号の各明細書及び特開昭51−32331号
公報、同51−36128号公報に記載されているアジ
ド化合物と水溶性またはアルカリ可溶性高分子化合物か
らなる組成物の他、特開昭50−5102号、同5〇−
84302号、同50−84303号、同53−129
84号の各公報に記されているアジド基を含むポリマー
とバインダーとしての高分子化合物からなる組成物が含
まれる。
■Acid compound and binder (photosensitive layer consisting of a polymer compound) For example, British Patent No. 1,235,281, British Patent No. 1,49
In addition to the compositions comprising an azide compound and a water-soluble or alkali-soluble polymer compound described in the specifications of No. 5,861 and JP-A-51-32331 and JP-A-51-36128, JP-A-Sho. No. 50-5102, 50-
No. 84302, No. 50-84303, No. 53-129
Included are compositions comprising a polymer containing an azide group and a polymer compound as a binder, as described in each publication of No. 84.

■その他の感光性樹脂層 例えば特開昭52−96696号公報に開示されている
ポリエステル化合物、英国特許第112.277号、同
第1,313,309号公報、同第1,341,004
号公報、同第1.377.747号等の各明細書に記載
のポリビニルシンナメート系樹脂、米国特許第4.07
2,528号及び同第4,072,527号の各明細書
などに記されている光重合型フォトポリマー組成物が含
まれる。支持体上に設けられる刊行層の量は、約0.1
〜約7g/rn’、好ましくはo、 5〜4g/rn’
の範囲である。
■Other photosensitive resin layers For example, polyester compounds disclosed in JP-A-52-96696, British Patent No. 112.277, British Patent No. 1,313,309, British Patent No. 1,341,004.
Polyvinyl cinnamate-based resins described in specifications such as No. 1, No. 1,377,747, and U.S. Patent No. 4.07
The photopolymerizable photopolymer compositions described in the specifications of No. 2,528 and No. 4,072,527 are included. The amount of publication layer provided on the support is approximately 0.1
~7 g/rn', preferably o, 5-4 g/rn'
is within the range of

PS板は画像露出されたのち、常法により現像を含む処
理によって樹脂画像か形成される。例えばジアゾ樹脂と
バインダーとからなる前記感光層■を有するPS板の場
合には画像漏出後、未露光部分の感光層か現像により除
去されて平板印刷板が得られる。また感光層■を有する
pS板の場合には画像露光後、アルカリ水溶液て現像す
ることにより露光部分か除去されて平板印刷板が得られ
る。
After the PS plate is exposed to an image, a resin image is formed by a conventional process including development. For example, in the case of a PS plate having the photosensitive layer (1) made of a diazo resin and a binder, after image leakage, the photosensitive layer in the unexposed area is removed by development to obtain a lithographic printing plate. In the case of a pS plate having a photosensitive layer (1), after image exposure, the exposed portion is removed by developing with an alkaline aqueous solution to obtain a lithographic printing plate.

現像処理後、印刷板は所望により適宜後処理か施される
After the development treatment, the printing plate is subjected to appropriate post-treatments as desired.

後処理において、最も関連のある処理は画像部分の強化
のためのバーニングである。バーニングについては、例
えば特開昭52−6205号、特開昭51−34001
号、特公昭55−28062号公報、特公開昭57−3
938号公報及び米国特許第4,191,570号明細
書などに記載されているが、基本的にはバーニングは温
度1.50〜350°Cの雰囲気中に現像済みの印刷板
を置き、版画の画像部分を焼結、硬化させることである
In post-processing, the most relevant process is burning for enhancement of image parts. Regarding burning, for example, JP-A-52-6205, JP-A-51-34001
No., Special Publication No. Sho 55-28062, Special Publication No. Sho 57-3
Although it is described in Japanese Patent No. 938 and US Pat. No. 4,191,570, burning is basically a process of placing a developed printing plate in an atmosphere with a temperature of 1.50 to 350°C. The image part of the image is sintered and hardened.

この場合、バーニングの前あるいは後に例えば硼酸や硼
!塩、アニオン性界面活性剤あるいは他の特定化学構造
式を有する化合物の水溶液を版画に供給させることか好
ましい。
In this case, before or after burning, for example, use boric acid or borium! It is preferred to provide the print with an aqueous solution of a salt, anionic surfactant or other compound having a specific chemical structure.

これにより、バーニングによる種々の弊害を防ぐことが
できる。バーニング温度は処理時間と共にバーニング効
果に関連し、処理時間3〜10分程度てあれば180℃
〜300℃の温度て行うことかてきる。
Thereby, various harmful effects caused by burning can be prevented. The burning temperature is related to the burning effect as well as the processing time, and if the processing time is about 3 to 10 minutes, it will be 180℃.
It can be carried out at a temperature of ~300°C.

(実施例) 以下、本発明を実施例に基いてさらに詳細に説明する。(Example) Hereinafter, the present invention will be explained in more detail based on Examples.

実施例1 第1表に示す組成のアルミニウム合金No、1〜No、
12を溶解鋳造し、両面を面削して厚さ350III1
1、長さ2000mmの鋳塊とし、これを560°Cの
温度て10時間均熱処理した。これを430°Cの温度
て1時間加熱保持してから430℃〜260℃の温度て
熱間圧延し板厚4.0m11とした後、さらに板厚0.
3mmまて冷間圧延(減面率92.5%)して、平版印
刷用アルミニウム合金板を製造した。
Example 1 Aluminum alloys No. 1 to No. 1 with the composition shown in Table 1
12 was melted and cast, and both sides were faceted to a thickness of 350III1.
1. An ingot with a length of 2000 mm was prepared and soaked at a temperature of 560°C for 10 hours. This was heated and held at a temperature of 430°C for 1 hour, then hot rolled at a temperature of 430°C to 260°C to a plate thickness of 4.0m11, and then further plated to a thickness of 0.
The aluminum alloy plate for lithographic printing was produced by cold rolling to a thickness of 3 mm (area reduction rate: 92.5%).

次にNo、1〜No、12のアルミニウム合金圧延板及
びNo、13(板厚0.30+amJIS1050−H
18アルミニウム合金)、No、14(板厚0−30m
mJISl100−H16アルミニウム合金)をハミス
トンと水の懸濁液中で回転ナイロンブラシて砂目立て処
理したのち、苛性ソーダ20%水溶液を用いてアルミニ
ウムの溶解量か5g/rn’となるようにエツチングし
た。流水て充分に洗ったのち25%硝酸水溶液て酸洗を
へ水洗して基板を用意した。
Next, No. 1 to No. 12 aluminum alloy rolled plates and No. 13 (plate thickness 0.30 + am JIS1050-H
18 aluminum alloy), No. 14 (plate thickness 0-30m
The aluminum alloy (JISl100-H16 aluminum alloy) was grained using a rotating nylon brush in a suspension of hamstone and water, and then etched using a 20% aqueous solution of caustic soda so that the amount of aluminum dissolved was 5 g/rn'. After thoroughly washing with running water, the substrate was prepared by washing with water after pickling with a 25% nitric acid aqueous solution.

このようにして得られた冷間圧延板は、内部に存在する
単体Siか0.012%以下てあり、電気化学的粗面化
処理において少ない電気量て均一な粗面か得られ、印刷
中の非画像部の耐汚れ性かすぐれ、さらに強度及び耐刷
力にすぐれる平版印刷版用支持体として好適なものであ
る。
The cold-rolled plate obtained in this way has less than 0.012% of elemental Si present inside, and a uniform roughened surface can be obtained with a small amount of electricity in electrochemical roughening treatment, and during printing. It is suitable as a support for lithographic printing plates because it has excellent stain resistance in non-image areas, as well as excellent strength and printing durability.

このようにして用意した基板を特開昭55−13799
3号公報に記載の方法に従って陽極時電圧10.4V、
陰極面電圧7.1vの非対称正弦波の交番波形電流を用
いて、陽極特電気量(Qa)と陰極時電気ff1(Qc
)の比Q c / Q aか0.45となるように、0
.7%硝酸水溶液中て種々の投入電気量で電解エツチン
グ(電気化学的粗面化処理)を行なった。ひきつづき1
5%硫酸の50°C水溶液に3分間浸漬して表面を清浄
化したのち20%の硫酸を主成分とする電解液中で浴温
30°Cて3g/rrfの酸化皮膜を設けた。
The substrate prepared in this way was
According to the method described in Publication No. 3, the voltage at the anode was 10.4 V,
Using an asymmetrical sinusoidal alternating waveform current with a cathode surface voltage of 7.1 V, the anode special electricity quantity (Qa) and cathode electricity ff1 (Qc
) so that the ratio Q c / Q a is 0.45.
.. Electrolytic etching (electrochemical surface roughening treatment) was performed in a 7% nitric acid aqueous solution with various amounts of electricity input. Continuation 1
After cleaning the surface by immersing it in a 50°C aqueous solution of 5% sulfuric acid for 3 minutes, an oxide film of 3 g/rrf was formed in an electrolytic solution containing 20% sulfuric acid as a main component at a bath temperature of 30°C.

このようにして作成した試料に下記の感光層を乾爆時の
塗布量か2.5g/rrr’となるように設けた。
The following photosensitive layer was provided on the thus prepared sample at a coating amount of 2.5 g/rrr' during dry explosion.

ナフトキノン−1,2−ジアジド−5−スルホニルクロ
リドとピロガロール、 アセトン樹脂とのエステル化合物 (米国特許3,635,709号明細書実施例に記載さ
れているもの)−−一−−0.75gクレゾールノボラ
ウク樹脂−−−−2,00gオイルフルー#603 (オリエント化学製)−−−−−−o、04gエチレン
シクロリトーーーー−一−16g2−メトキシエチルア
セテートー−12gかくして得られた感光性平版印刷版
を透明陽画に密着させて1mの距離からPsライト(東
芝メタルハライドランプMU2000−2−OL53K
Vの光源を有し、富士写真フィルム(株)より収光され
ているもの)て3o秒間露光を行った後、ケイ酸ナトリ
ウム5重量%水溶液に約1分間浸漬して現像し、水洗、
乾燥し試料No、1〜No。
Ester compound of naphthoquinone-1,2-diazido-5-sulfonyl chloride, pyrogallol, and acetone resin (as described in the Examples of U.S. Pat. No. 3,635,709) --1--0.75g cresol Novolauk resin - 2,00 g Oil Flu #603 (manufactured by Orient Chemical Co., Ltd.) - 04 g Ethylene cyclolito - 1-16 g 2-methoxyethyl acetate - 12 g Thus obtained Place the photosensitive lithographic printing plate in close contact with the transparent print and use the Ps light (Toshiba metal halide lamp MU2000-2-OL53K) from a distance of 1 m.
After exposure for 30 seconds with a V light source (light collected by Fuji Photo Film Co., Ltd.), the film was developed by immersing it in a 5% by weight sodium silicate aqueous solution for about 1 minute, washing with water,
Dried samples No. 1 to No.

14を作成した。14 was created.

このようにして作成した試料(印刷版)No、1〜No
、14の電解エツチング粗面の均一性、非画像部の耐汚
れ性、引張強度について試験を実施した。その結果を第
2表に示す。
Samples (printing plates) No. 1 to No. created in this way
, No. 14 was tested for the uniformity of the electrolytically etched rough surface, the stain resistance of the non-image area, and the tensile strength. The results are shown in Table 2.

(試験方法) (1)電解エツチング粗面の均一性 表面状態を走査型電子WJ微鏡にて観察し、ピットの均
一性を評価し優れたちの○印、部分的に不良エツチング
部のあるもの△印、不良エッチンク部の多いもの×印て
表わした。
(Test method) (1) Uniformity of the electrolytically etched rough surface The surface condition was observed using a scanning electronic WJ microscope, and the uniformity of pits was evaluated. Those with many defective etched areas are marked with △ and ×.

(2)非画像部の汚れ 陽極時投入電気量を200クーロン/dゴとした試料で
オフセット印刷機KORにて10万部印刷の後、非画像
部の汚れを評価し、優れたちの○印、良好なもの△印、
劣るもの×印で表わした。
(2) Contamination in non-image areas After printing 100,000 copies using an offset printing machine KOR using a sample with an anode input electricity amount of 200 coulombs/dgo, the contamination in non-image areas was evaluated, and an excellent mark was given. , Good ones marked △,
Inferior items are indicated with an x mark.

(3)#刷力 (2)と同様にlO万部の印刷を行なった後、印刷物の
鮮明さを評価し、かすれのまったくない鮮明なもの○印
、良好なちの△印、不鮮明なもの×印て表わし た。
(3) #Printing power After printing 10,000 copies in the same way as in (2), evaluate the sharpness of the printed matter: clear with no blurring (○), good (△), unclear (×) It was marked.

(4)引張強度 JIS  S号引張試験片を採取し、引張り試験を行な
い強度を測定した。
(4) Tensile Strength A JIS No. S tensile test piece was taken, and a tensile test was conducted to measure the strength.

なお、単体Si量は特開昭60−82642号記載の分
析方法により定量分析した。
The amount of elemental Si was quantitatively analyzed by the analysis method described in JP-A-60-82642.

第2表から明らかなように本発明方法により得られた印
刷用アルミニウム合金板No、1〜N0.7は何れも内
部に分布する単体Si量が 0.012%以下てあって
、従来JIS  1050−HlBや1100−HlB
よりも非画像部の耐汚れ性と引張強度かすぐれている。
As is clear from Table 2, all of the printing aluminum alloy plates No. 1 to No. 7 obtained by the method of the present invention have an internally distributed elemental Si content of 0.012% or less, which is higher than conventional JIS 1050. -HlB or 1100-HlB
It has better stain resistance and tensile strength in non-image areas.

しかもJIS  1050−HlBては均一な粗面か得
られるまで200クーロン/drn’の陽極時投入電気
量を要するのに対し、本発明方法により得られたNo、
1〜N007ては50〜75クーロン/drn’で均一
な粗面が得られ、%〜局の投入電気量で電解エツチング
による粗面化か可能であり、耐刷力も良好である。
Moreover, while JIS 1050-HlB requires an amount of electricity input at the time of anode of 200 coulombs/drn' to obtain a uniform rough surface, No.
1 to N007, a uniformly roughened surface can be obtained at 50 to 75 coulombs/drn', surface roughening can be performed by electrolytic etching with an input electricity amount of 100 to 100%, and printing durability is also good.

これに対しSnを添加しないNo、8ては非画像部の耐
汚れ性は良好であるか、均一な粗面が得られるまで多く
の投入電気量を要することがわかる。さらに合金組成が
本発明範囲からはずれるNo、9〜No、12ては、非
画像部の耐汚れ性、引張強度、粗面の均一性、耐刷力の
いずれかが劣る。
On the other hand, it can be seen that in No. 8, in which Sn was not added, the stain resistance of the non-image area was good, or a large amount of electricity was required to obtain a uniform rough surface. Furthermore, No. 9 to No. 12, in which the alloy composition is out of the range of the present invention, are poor in any of the stain resistance, tensile strength, rough surface uniformity, and printing durability of the non-image area.

実施例2 実施例1における第1表のNo、2の合金鋳塊を、55
0°Cの温度て8時間の均熱処理を行ない、これを第3
表に示す種々の冷却条件で冷却した後、板厚4.5■ま
で熱間圧延し、更に板厚2.0■mまで冷間圧延した後
、連続焼鈍炉により480 ’Cの温度て20秒間中間
焼鈍してから板厚0.3■まて冷間圧延して、印刷版用
アルミニウム合金板を製造した。
Example 2 The alloy ingot of No. 2 in Table 1 in Example 1 was 55
A soaking process was carried out for 8 hours at a temperature of 0°C, and this was
After cooling under various cooling conditions shown in the table, hot rolling to a thickness of 4.5 mm, further cold rolling to a thickness of 2.0 mm, and then annealing in a continuous annealing furnace at a temperature of 480'C for 20 minutes. After intermediate annealing for a second, the aluminum alloy plate was cold rolled to a thickness of 0.3 mm to produce an aluminum alloy plate for printing plates.

これらについて実施例1と同様に表面処理し、同一条件
で製版を行ない、試料No、15〜24を作成した。陽
極時投入電気量は75クーロン/drn’とした。
These were subjected to surface treatment in the same manner as in Example 1, and plate making was performed under the same conditions to create Samples Nos. 15 to 24. The amount of electricity input at the time of anode was 75 coulombs/drn'.

これ等の試料について実施例1と同様の試験を行ない、
その結果を第3表に示した。
The same test as in Example 1 was conducted on these samples,
The results are shown in Table 3.

第3表から明らかなように鋳塊を均熱処理した後、43
0°C以下の温度まて50°C/時以下の平均冷却速度
て冷却し、しかる後熱間圧延、冷間圧延、中間焼鈍、冷
却圧延した本発明による印刷版No、15〜19は内部
に分布する単体Si量が0.012%以下で、粗面の均
一性、非画像部の酎汚れ性か優れていることかわかる。
As is clear from Table 3, after soaking the ingot, 43
Printing plates No. 15 to 19 according to the present invention were cooled at a temperature of 0° C. or less at an average cooling rate of 50° C./hour or less, and then hot-rolled, cold-rolled, intermediate annealed, and cool-rolled. It can be seen that the amount of elemental Si distributed in the area is 0.012% or less, and the uniformity of the rough surface and the stain resistance of the non-image area are excellent.

これに対し、内部に分布する単体Si量か0.012%
を越える比較印刷版No、20〜24、即ち均熱処理後
の冷却条件が外れる印刷版用アルミニウム合金板では非
画像部の汚れが改善されないことかわかる。
On the other hand, the amount of elemental Si distributed inside is 0.012%.
It can be seen that stains in non-image areas are not improved in comparative printing plate Nos. 20 to 24, that is, in aluminum alloy plates for printing plates in which the cooling conditions after soaking treatment are out of range.

実施例3 実施例1における第1表のNO12の合金鋳塊を用い、
これを540°Cて8時間均熱処理した後、第4表に示
す条件て保持してから、板厚3.5■腸まで熱間圧延し
、しかる後板厚0.3msまて冷間圧延した。これに実
施例1と同様に表面処理を施して試料No、25〜33
を作成した。
Example 3 Using the alloy ingot of No. 12 in Table 1 in Example 1,
This was soaked at 540°C for 8 hours, held under the conditions shown in Table 4, hot rolled to a thickness of 3.5 mm, and then cold rolled to a thickness of 0.3 ms. did. This was subjected to surface treatment in the same manner as in Example 1, and samples No. 25 to 33 were obtained.
It was created.

これらについて実施例1と同様の試験を行ない、その結
果を第4表に示した。
The same tests as in Example 1 were conducted on these, and the results are shown in Table 4.

/″ 7/′ /′ 第4表から明らかなように、均熱処理後350〜450
’Cの温度て30分以上保持した本発明による印刷版N
o、25〜29はいずれも単体Si量か0.012%以
下て、粗面の均一性、非画像部の耐汚れ性か優れている
ことかわかる。
/''7/'/' As is clear from Table 4, after soaking treatment 350-450
Printing plate N according to the present invention kept at a temperature of 'C for more than 30 minutes
It can be seen that the amount of elemental Si in all samples 0 and 25 to 29 is 0.012% or less, which means that the uniformity of the rough surface and the stain resistance of the non-image area are excellent.

これに対し、均熱処理後の鋳塊保持条件か外れる比較印
刷版No、30〜33てはいずれも内部に分布する単体
Siが0.012%を越え、非画像部の汚れが改善され
ない。
On the other hand, in comparison printing plates Nos. 30 to 33, which do not meet the ingot retention conditions after soaking, the amount of elemental Si distributed inside exceeds 0.012%, and stains in non-image areas are not improved.

(発明の効果) このように本発明の平版印刷版用アルミニウム合金支持
体は、粗面化処理を行うに際し、少ない投入電気量ても
均一な電解粗面か得られるため省エネルギー、省コスト
効果か大きく、耐刷力、印刷中の非画像部の耐汚れ性も
優れ、かつ、強度にも優れているため、いずれの特性も
かねそなえた平版印刷版用支持体として顕著な効果を奏
するものである。
(Effects of the Invention) As described above, the aluminum alloy support for lithographic printing plates of the present invention can obtain a uniform electrolytically roughened surface even with a small amount of electricity when performing surface roughening treatment, so it is energy-saving and cost-saving effective. It is large, has excellent printing durability, excellent stain resistance in non-image areas during printing, and is also excellent in strength, so it has all of these characteristics and is extremely effective as a support for lithographic printing plates. be.

手続補正書(ハ)   5 昭和62年3月26日 特許庁長官 黒 1)明 雄 殿          
 71、事件の表示 昭和61年特許願第282590号 2、発明の名称 平版印刷版用アルミニウム合金支持体 およびその製造方法 3、補正をする者 事件との関係  特許出願人 住所 東京都千代田区丸の内2丁目6番1号名称 古河
アルミニウム工業株式会社 ミドリヤ第2ビル 7階 、補正命令の日付 昭和62年2月4日 (発送り:昭和62年2月24日) 、補正により増加する発明の数     0、補正の対
象 明細書の「発明の詳細な説明」の欄、補正の内容 明細書第2ページ第5行と6行の間に「3、発明の詳細
な説明」を挿入します。
Procedural amendment (c) 5 March 26, 1988 Commissioner of the Patent Office Kuro 1) Mr. Akio
71. Indication of the case 1985 Patent Application No. 282590 2. Name of the invention Aluminum alloy support for lithographic printing plates and its manufacturing method 3. Person making the amendment Relationship to the case Patent applicant address 2 Marunouchi, Chiyoda-ku, Tokyo Chome 6-1 Name: Furukawa Aluminum Industries Co., Ltd. Midoriya 2nd Building 7th floor; Date of amendment order: February 4, 1985 (shipped: February 24, 1988); Number of inventions increased by amendment: 0 , Target of amendment Insert "3. Detailed description of the invention" between lines 5 and 6 on page 2 of the description of the amendment, in the "Detailed description of the invention" column of the description.

Claims (2)

【特許請求の範囲】[Claims] (1)Fe0.05〜0.5重量%、Mg0.7〜5重
量%、Sn0.01〜0.2重量%、Si0.2重量%
以下、Cu0.05重量%以下を含有し、残部Alと不
可避の不純物からなり、かつ、単体Siが0.012重
量%以下であることを特徴とする平版印刷版用アルミニ
ウム合金支持体。
(1) Fe0.05-0.5% by weight, Mg0.7-5% by weight, Sn0.01-0.2% by weight, Si0.2% by weight
An aluminum alloy support for a lithographic printing plate, characterized in that the following contains 0.05% by weight or less of Cu, the remainder consisting of Al and unavoidable impurities, and 0.012% by weight or less of elemental Si.
(2)Fe0.05〜0.5重量%、Mg0.7〜5重
量%、Sn0.01〜0.2重量%、Si0.2重量%
以下、Cu0.05重量%以下、残部Alと不可避の不
純物からなるアルミニウム合金鋳塊を均熱処理した後4
30℃以下の温度まで50℃/時以下の平均冷却速度で
冷却するか、又は350〜450℃の温度で30分間以
上保持してから、熱間圧延又は熱間圧延後、冷間圧延と
中間焼鈍を行い、これに減面率50%以上の最終冷間圧
延を加えることにより、単体Siを0.012重量%以
下とすることを特徴とする平版印刷版用アルミニウム合
金支持体の製造方法。
(2) Fe0.05-0.5% by weight, Mg0.7-5% by weight, Sn0.01-0.2% by weight, Si0.2% by weight
Below, after soaking an aluminum alloy ingot consisting of Cu 0.05% by weight or less and the remainder Al and unavoidable impurities, 4
Cooling to a temperature of 30°C or less at an average cooling rate of 50°C/hour or less, or holding at a temperature of 350 to 450°C for 30 minutes or more, then hot rolling or after hot rolling, cold rolling and intermediate 1. A method for producing an aluminum alloy support for a lithographic printing plate, comprising annealing and final cold rolling with an area reduction of 50% or more to reduce elemental Si to 0.012% by weight or less.
JP28259086A 1986-11-27 1986-11-27 Aluminum alloy substrate for lithographic plate and production thereof Pending JPS63135294A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28259086A JPS63135294A (en) 1986-11-27 1986-11-27 Aluminum alloy substrate for lithographic plate and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28259086A JPS63135294A (en) 1986-11-27 1986-11-27 Aluminum alloy substrate for lithographic plate and production thereof

Publications (1)

Publication Number Publication Date
JPS63135294A true JPS63135294A (en) 1988-06-07

Family

ID=17654483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28259086A Pending JPS63135294A (en) 1986-11-27 1986-11-27 Aluminum alloy substrate for lithographic plate and production thereof

Country Status (1)

Country Link
JP (1) JPS63135294A (en)

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EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
WO2010038812A1 (en) 2008-09-30 2010-04-08 富士フイルム株式会社 Electrolytic treatment method and electrolytic treatment device
WO2010150810A1 (en) 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
WO2011078010A1 (en) 2009-12-25 2011-06-30 富士フイルム株式会社 Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element
WO2014045789A1 (en) * 2012-09-18 2014-03-27 富士フイルム株式会社 Lithographic printing plate support and lithographic printing plate original plate
CN103692795A (en) * 2013-11-14 2014-04-02 青海虎彩印刷有限公司 Independent type lithographic cold ironing process method
EP2192202B1 (en) 2008-11-21 2016-07-06 Hydro Aluminium Rolled Products GmbH Aluminium sheet for lithographic printing plate support having high resistance to bending cycles

Cited By (12)

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EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
WO2010038812A1 (en) 2008-09-30 2010-04-08 富士フイルム株式会社 Electrolytic treatment method and electrolytic treatment device
EP2192202B1 (en) 2008-11-21 2016-07-06 Hydro Aluminium Rolled Products GmbH Aluminium sheet for lithographic printing plate support having high resistance to bending cycles
US10927437B2 (en) 2008-11-21 2021-02-23 Hydro Aluminium Deutschland Gmbh Aluminium strip for lithographic printing plate supports with high flexural fatigue strength
EP2192202B2 (en) 2008-11-21 2022-01-12 Speira GmbH Aluminium sheet for lithographic printing plate support having high resistance to bending cycles
WO2010150810A1 (en) 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
WO2011078010A1 (en) 2009-12-25 2011-06-30 富士フイルム株式会社 Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element
WO2014045789A1 (en) * 2012-09-18 2014-03-27 富士フイルム株式会社 Lithographic printing plate support and lithographic printing plate original plate
CN104661828A (en) * 2012-09-18 2015-05-27 富士胶片株式会社 Lithographic printing plate support and lithographic printing plate original plate
CN103692795A (en) * 2013-11-14 2014-04-02 青海虎彩印刷有限公司 Independent type lithographic cold ironing process method
CN103692795B (en) * 2013-11-14 2016-04-13 青海虎彩印刷有限公司 A kind of free-standing lithographic plate cold foil technology method

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