JPS6312344Y2 - - Google Patents

Description

[Detailed description of the invention] This invention is a guide for conveying photosensitive materials in an automatic processor;
In particular, it relates to those used in automatic developing machines for direct positive color photosensitive materials.

The uniformity of reversal exposure during the development of direct positive color photosensitive materials is a major variable in the finished quality.

However, among the guides conventionally used in the photosensitive material transport path of the reversal exposure section of automatic processors, the guide provided on the light source side for reversal exposure was a plate-shaped transparent guide, which caused scratches on the guide surface. This makes it difficult to achieve uniform exposure because sludge tends to adhere to the surface of the developer, scattering of the developer, or performing reverse exposure while still immersed in the developer.

Also, if rod-shaped guides are used on the left and right sides of the photosensitive material (positions off the screen), the photosensitive material may be conveyed in a meandering manner, and the shadows of the guide rods may appear unevenly on the exposure screen, or the photosensitive material may fall from the guides. The film came off, making uniform exposure and reliable transportation difficult.

The present invention has been devised in view of the above points.In the photosensitive material transport path of the exposure section of an automatic processor, a guide for transporting the photosensitive material on the exposure light source side is arranged parallel to the photosensitive material and The object of the present invention is to provide a linear guide which is arranged at a twisted position with respect to the direction, and which can be transported reliably while giving uniform exposure.

An embodiment of the present invention shown in the drawings will be described below.

Reference numeral 1 designates an inversion exposure section, in which a light source 3 for inversion exposure is provided deep inside a housing 2 with an open bottom, and a diffuser plate 4 is provided below.

Reference numeral 5 denotes a conveyance path for the photosensitive material 6 disposed below the reversal exposure section 1, in which there are upper and lower conveyance rollers 7, 7' and 8, 8', respectively, on the inlet and exit sides of the inversion exposure section. A flat guide 9 is provided between the rollers 7' and 8', that is, below the photosensitive material 6.

10 is a light source 3 for overlying the photosensitive material 6, that is, for reverse exposure;
It is a linear guide arranged on the side and has a symmetrical V shape so that the light source 3 uniformly exposes the photosensitive material 6, and its both ends are provided near the conveyance rollers 7 and 8, respectively. Guide support rods 11, 11'
is supported by

Next, to explain the above-mentioned operation, the photosensitive material 6 sent below the reversal exposure section 1 by the conveying rollers 7 and 7' is subjected to reversal exposure while being kept flat between the guides 10 and 9. After being uniformly exposed by the light source 3 and sent to the conveying rollers 8, 8', the reverse exposure is completed.

In the above embodiment, the linear guide 10 is V-shaped, but the present invention is not limited to this. If the flatness of the photosensitive material 6 is maintained and the time taken to pass through the guide is equal, A shape that allows uniform exposure at any point, such as a W-shape or an A guide is fine.

In particular, if a guide with a shape such as a V-shape, W-shape, or X-shape that expands in the direction of travel is used, the photosensitive material is conveyed while expanding, so meandering does not occur.

Furthermore, the present invention is not limited to automatic processors for direct positive color photosensitive materials, but can also be used in the exposure section of other automatic processors.

As described above, in the present invention, the guide on the light source side of the exposure section is linear and arranged so as to be parallel to the photosensitive material and twisted with respect to the transport direction.
Unlike plate-shaped transparent guides, there are no problems such as scratches on the guide surface or adhesion of sludge, and the photosensitive material is transported without meandering, maintaining its flatness, and the guide rod is clearly visible on the exposure screen. This is an extremely excellent idea in practical use, as it allows uniform exposure without uneven shadows or the photosensitive material coming off the guide.

[Brief explanation of the drawing]

The drawings show an embodiment of the present invention, in which Fig. 1 is a partial cross-sectional front view of the reversal exposure unit and the conveyance path, and Fig. 2
The figure is a plan view of the conveyance path. 1 is an inversion exposure unit, 2 is a housing, 3 is a light source for inversion exposure, 4 is a diffusion plate, 5 is a conveyance path, 6 is a photosensitive material, 7, 7', 8, and 8' are conveyance rollers, and 9 is a flat plate. The guide 10 is a linear guide.

Claims (1)

[Scope of utility model registration request] The exposure light source is located deep inside the housing with one end open.
A diffusion plate is placed on the opening side to form an exposed area,
A pair of conveyance rollers are disposed on the entrance side and the exit side of the exposure section opening, respectively, and the photosensitive material is gripped and conveyed by the conveyance rollers, and a pair of conveyance rollers are provided between the two conveyance rollers and for exposure of the photosensitive material. In the photosensitive material conveyance path of the exposure section of an automatic processor in which a guide for conveying the photosensitive material is arranged on the light source side, the guide for conveying the photosensitive material on the exposure light source side is parallel to the photosensitive material,
A photosensitive material transport guide for an automatic processor, characterized in that the guide is a linear guide arranged at a twisted position with respect to the transport direction.