JPS63121435U - - Google Patents

Info

Publication number
JPS63121435U
JPS63121435U JP1150387U JP1150387U JPS63121435U JP S63121435 U JPS63121435 U JP S63121435U JP 1150387 U JP1150387 U JP 1150387U JP 1150387 U JP1150387 U JP 1150387U JP S63121435 U JPS63121435 U JP S63121435U
Authority
JP
Japan
Prior art keywords
stop valve
liquid
closed
storage section
filter part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1150387U
Other languages
Japanese (ja)
Other versions
JPH0356040Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987011503U priority Critical patent/JPH0356040Y2/ja
Publication of JPS63121435U publication Critical patent/JPS63121435U/ja
Application granted granted Critical
Publication of JPH0356040Y2 publication Critical patent/JPH0356040Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Nozzles (AREA)
  • Weting (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案に係る滴下装置の一実施例を示
す構成図、第２図は従来装置の構成図である。 １……容器（貯蔵部）、２……液体、３……配
管、４……ノズル、５……逆止弁、６……圧送部
、７……停止弁、８……サツクバツクバルブ、９
……フイルタ部、１０……ニードル弁、２２……
配管。 FIG. 1 is a block diagram showing an embodiment of a dropping device according to the present invention, and FIG. 2 is a block diagram of a conventional device. 1... Container (storage section), 2... Liquid, 3... Piping, 4... Nozzle, 5... Check valve, 6... Pressure feeding section, 7... Stop valve, 8... Suckback valve, 9
... Filter section, 10 ... Needle valve, 22 ...
Piping.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 滴下すべき液体を貯蔵する貯蔵部と、先端にノ
ズルが設けられ前記液体を移送するための配管と
、前記貯蔵部内の液体を配管に導くための圧送部
と、前記配管の途中に設けられ液体中の異物を除
去するフイルタ部と、このフイルタ部より下流側
配管中に設けられ滴下終了後閉鎖される停止弁お
よびこの停止弁より下流側配管中に設けられ該停
止弁の閉鎖直後動作することによりノズル側の液
体を停止弁側へ引き戻すための手段とを備えたこ
とを特徴とする滴下装置。 a storage section for storing the liquid to be dropped; a pipe provided with a nozzle at the tip for transferring the liquid; a pressure feeding section for guiding the liquid in the storage section to the pipe; A filter part for removing foreign matter inside, a stop valve provided in a piping downstream from this filter part and closed after completion of dripping, and a stop valve provided in a piping downstream from this stop valve and operated immediately after the stop valve is closed. A dripping device characterized by comprising: means for drawing liquid from a nozzle side back to a stop valve side.
JP1987011503U 1987-01-30 1987-01-30 Expired JPH0356040Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987011503U JPH0356040Y2 (en) 1987-01-30 1987-01-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987011503U JPH0356040Y2 (en) 1987-01-30 1987-01-30

Publications (2)

Publication Number Publication Date
JPS63121435U true JPS63121435U (en) 1988-08-05
JPH0356040Y2 JPH0356040Y2 (en) 1991-12-16

Family

ID=30798779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987011503U Expired JPH0356040Y2 (en) 1987-01-30 1987-01-30

Country Status (1)

Country Link
JP (1) JPH0356040Y2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08131909A (en) * 1994-11-04 1996-05-28 Dainippon Screen Mfg Co Ltd Feeder of treating liquid for substrate-treating device
JP2018066010A (en) * 2017-11-24 2018-04-26 三菱ケミカル株式会社 Method for producing polymer for semiconductor lithography

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60158734U (en) * 1984-03-29 1985-10-22 大日本スクリ−ン製造株式会社 Substrate surface treatment liquid supply device
JPS61198723A (en) * 1985-02-28 1986-09-03 Toshiba Corp Applicator for resist

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60158734U (en) * 1984-03-29 1985-10-22 大日本スクリ−ン製造株式会社 Substrate surface treatment liquid supply device
JPS61198723A (en) * 1985-02-28 1986-09-03 Toshiba Corp Applicator for resist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08131909A (en) * 1994-11-04 1996-05-28 Dainippon Screen Mfg Co Ltd Feeder of treating liquid for substrate-treating device
JP2018066010A (en) * 2017-11-24 2018-04-26 三菱ケミカル株式会社 Method for producing polymer for semiconductor lithography

Also Published As

Publication number Publication date
JPH0356040Y2 (en) 1991-12-16

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