JPS63121431U - - Google Patents

Info

Publication number
JPS63121431U
JPS63121431U JP1294287U JP1294287U JPS63121431U JP S63121431 U JPS63121431 U JP S63121431U JP 1294287 U JP1294287 U JP 1294287U JP 1294287 U JP1294287 U JP 1294287U JP S63121431 U JPS63121431 U JP S63121431U
Authority
JP
Japan
Prior art keywords
thermocouple
tube
sic
vertical furnaces
protection tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1294287U
Other languages
English (en)
Other versions
JPH075631Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987012942U priority Critical patent/JPH075631Y2/ja
Publication of JPS63121431U publication Critical patent/JPS63121431U/ja
Application granted granted Critical
Publication of JPH075631Y2 publication Critical patent/JPH075631Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)

Description

【図面の簡単な説明】
第１図は本考案熱電対の取付け構造の一実施例
を示す簡略断面図、第２図ａ，ｂは本考案におけ
る熱電対の例を示す簡略断面図、第３図ａ，ｂは
それぞれ第２図ａ示の本考案における熱電対の使
用例を示す斜視図及びその簡略断面図、第４図は
従来熱電対の取付け構造の一例を示す簡略断面図
、第５図は第４図で使用する熱電対の一例を示す
断面図である。 ２……熱電対、６……均熱管、７……反応管、
１１……ヒータベース、１３……ＳｉＣ製保護管
、１４……Ｌ字型の熱電対固定金具。

Claims (1)

    【実用新案登録請求の範囲】
  1. 縦型炉に使用される熱電対において、熱電対２
    の保護管１３をＳｉＣ製とし、このＳｉＣ製保護
    管１３を使用した熱電対２を均熱管６と反応管７
    との間に挿入配置する縦型炉用熱電対の取付け構
    造。
JP1987012942U 1987-01-30 1987-01-30 縦型炉 Expired - Lifetime JPH075631Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987012942U JPH075631Y2 (ja) 1987-01-30 1987-01-30 縦型炉

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987012942U JPH075631Y2 (ja) 1987-01-30 1987-01-30 縦型炉

Publications (2)

Publication Number Publication Date
JPS63121431U true JPS63121431U (ja) 1988-08-05
JPH075631Y2 JPH075631Y2 (ja) 1995-02-08

Family

ID=30801542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987012942U Expired - Lifetime JPH075631Y2 (ja) 1987-01-30 1987-01-30 縦型炉

Country Status (1)

Country Link
JP (1) JPH075631Y2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002082524A1 (fr) * 2001-03-30 2002-10-17 Tokyo Electron Limited Dispositif de traitement thermique
JP2004311712A (ja) * 2003-04-07 2004-11-04 Hitachi Kokusai Electric Inc 基板処理装置
JP2012172871A (ja) * 2011-02-18 2012-09-10 Tokyo Electron Ltd 熱処理装置および熱処理装置の温度測定方法
TWI511203B (zh) * 2012-09-25 2015-12-01 Hitachi Int Electric Inc A substrate processing apparatus, a manufacturing method of a semiconductor device, and a temperature detection method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56110648U (ja) * 1980-01-29 1981-08-27
JPS5878424A (ja) * 1981-11-05 1983-05-12 Toshiba Ceramics Co Ltd 半導体拡散炉用マザ−ボ−ト
JPS61241916A (ja) * 1985-04-18 1986-10-28 Deisuko Saiyaa Japan:Kk 半導体熱処理装置
JPS62272525A (ja) * 1986-05-21 1987-11-26 Hitachi Ltd 熱処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56110648U (ja) * 1980-01-29 1981-08-27
JPS5878424A (ja) * 1981-11-05 1983-05-12 Toshiba Ceramics Co Ltd 半導体拡散炉用マザ−ボ−ト
JPS61241916A (ja) * 1985-04-18 1986-10-28 Deisuko Saiyaa Japan:Kk 半導体熱処理装置
JPS62272525A (ja) * 1986-05-21 1987-11-26 Hitachi Ltd 熱処理装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002082524A1 (fr) * 2001-03-30 2002-10-17 Tokyo Electron Limited Dispositif de traitement thermique
JP2004311712A (ja) * 2003-04-07 2004-11-04 Hitachi Kokusai Electric Inc 基板処理装置
JP2012172871A (ja) * 2011-02-18 2012-09-10 Tokyo Electron Ltd 熱処理装置および熱処理装置の温度測定方法
TWI511203B (zh) * 2012-09-25 2015-12-01 Hitachi Int Electric Inc A substrate processing apparatus, a manufacturing method of a semiconductor device, and a temperature detection method
TWI562240B (ja) * 2012-09-25 2016-12-11 Hitachi Int Electric Inc
US10418293B2 (en) 2012-09-25 2019-09-17 Kokusai Electric Corporation Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support
US11049742B2 (en) 2012-09-25 2021-06-29 Kokusai Electric Corporation Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support

Also Published As

Publication number Publication date
JPH075631Y2 (ja) 1995-02-08

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