JPS63109415A - Liquid crystal shutter array - Google Patents

Liquid crystal shutter array

Info

Publication number
JPS63109415A
JPS63109415A JP61255469A JP25546986A JPS63109415A JP S63109415 A JPS63109415 A JP S63109415A JP 61255469 A JP61255469 A JP 61255469A JP 25546986 A JP25546986 A JP 25546986A JP S63109415 A JPS63109415 A JP S63109415A
Authority
JP
Japan
Prior art keywords
liquid crystal
light
crystal shutter
shutter array
transparent substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61255469A
Other languages
Japanese (ja)
Inventor
Hisao Oishi
大石　尚生
Kazuhiko Yanagihara
柳原　和彦
Tadashi Miyagawa
正 宮川
Takeshi Nakamura
武司 中村
Kazuhiko Akimoto
一彦 秋元
Mitsuaki Shioji
光昭 塩路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Sharp Corp
Original Assignee
Sharp Corp
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp, Fuji Photo Film Co Ltd filed Critical Sharp Corp
Priority to JP61255469A priority Critical patent/JPS63109415A/en
Publication of JPS63109415A publication Critical patent/JPS63109415A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Abstract

PURPOSE:To record faithfully image light without using an optical system such as a 'Selfoc(R)' lens array by driving the titled liquid crystal shutter array so that light beams controlled at its ON/OFF by a liquid crystal part are shielded by a photomask through a thin transparent base and then outputted. CONSTITUTION:The liquid crystal shutter array 40 has orientation films 42A, 42B opposed to each other with a prescribed distance so that a space between the films 42A, 42B is filed with liquid crystal 41, a common electrode 43 consisting of a transparent material is formed on the orientation film 42B on the light incident side and a transparent base 45B consisting of glass or the like and a polarizing plate 44 are successively laminated on the outside of the electrode 43. On the other hand, pixel electrodes 44 consisting of a transparent material are embedded in the orientation film 42A on the light projecting side in accordance with picture elements and a transparent base 45A having thickness (d) thinner than that of the base 45B on the light incident side is formed on the outside of the film 42A. Light shielding photomasks 48 with size P are embedded in a polarizing plate 47 laminated on the outside of the base 45A so as to positionally correspond to the pixel electrodes 44. In the parallel light beams 1 radiated to the liquid crystal shutter array 40, light interference or the like based upon respective pixels can be reduced because of the thin transparent base 45A, so that an image of high quality can be obtained.

Description

【発明の詳細な説明】 （発明の技術分野） この発明は、例えば液晶光シャッタとして利用される液
晶デバイス、詳しくは液晶に印加する電圧の大きさ及び
／又は印加時間あるいは周波数を制御することにより、
透過あるいは反射する光量を変調するように構成されて
いる液晶を用いた液晶シャッタアレイの構造に関する。DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a liquid crystal device used as a liquid crystal light shutter, for example, by controlling the magnitude and/or application time or frequency of a voltage applied to a liquid crystal. ,
The present invention relates to the structure of a liquid crystal shutter array using liquid crystal configured to modulate the amount of transmitted or reflected light.

（発明の技術的背景とその問題点） 従来より、液晶デバイスを例えばライン状に構成したシ
ャッタアレイによって、画像光を感光材料に記録する技
術が開発されている。第５図は、このような液晶シャッ
タアレイの構造及びその記録の様子を示している。すな
わち、画像信号に応じて制御される液晶シャッタアレイ
ＩＯには平行光１が照射され、液晶シャッタアレイｌＯ
で画像信号に応じてオン・オフ制御されて透過した光が
、セルフォックレンズアレイ２０で結像されて感光材料
３０に露光されるようになっている。液晶シャッタアレ
イｌＯは、液晶１１を充填して所定距１１１（例えば６
μ）に対向されている一対の配向［１２Ａ及び１２１１
を有しており、−方の配向１ｉ１２Ｂ内にはシャッタア
レイの画素を規定する透明材のピクセル電極１３が所定
のサイズ及び所定の間隔で埋設されており、他方の配向
膜１２Ａ内には、各ピクセル電極１３に対応する位置関
係で遮光用フォトマスク１７が埋設されており、更にそ
の外側には透明材のコモン電極１４が層設されている。(Technical Background of the Invention and Problems Thereof) Conventionally, a technique has been developed for recording image light on a photosensitive material using a shutter array in which liquid crystal devices are arranged in, for example, a line shape. FIG. 5 shows the structure of such a liquid crystal shutter array and its recording state. That is, the liquid crystal shutter array IO, which is controlled according to the image signal, is irradiated with parallel light 1, and the liquid crystal shutter array IO is
The transmitted light is controlled on and off according to the image signal, and the transmitted light is imaged by the SELFOC lens array 20 and exposed onto the photosensitive material 30. The liquid crystal shutter array 1O is filled with liquid crystal 11 and arranged at a predetermined distance 111 (for example, 6
A pair of orientations [12A and 1211
Pixel electrodes 13 made of transparent material defining pixels of the shutter array are embedded in the - orientation 1i12B at a predetermined size and at predetermined intervals, and in the other orientation film 12A, A light-shielding photomask 17 is buried in a positional relationship corresponding to each pixel electrode 13, and a common electrode 14 made of a transparent material is layered on the outside thereof.

又、配向膜１−２Ｂの外側にはガラス等で成る透明基板
１５Ｂが層設され、コモン電極１４Ｂの外側には上記透
明基板１５Ｂとほぼ同一の厚さを有する透明基板１５八
が層設され、これら透明基板１５Ａ及び１５Ｂの外側に
は更に偏光板１６Ａ及び１８Ｂがそれぞれ層設されてい
る。Further, a transparent substrate 15B made of glass or the like is layered on the outside of the alignment film 1-2B, and a transparent substrate 158 having approximately the same thickness as the transparent substrate 15B is layered on the outside of the common electrode 14B. Polarizing plates 16A and 18B are further layered on the outside of these transparent substrates 15A and 15B, respectively.

従って、液晶シャッタアレイｌＯに照射される平行光１
はピクセル電極１３を通過し、画素単位のフォトマスク
１７で遮光されて出力される。なお、第５図における平
行光１は、一般的には完全な平行光となっていないので
、説明のために入射角を極端に図示した例を示している
。Therefore, the parallel light 1 irradiated onto the liquid crystal shutter array lO
passes through the pixel electrode 13, is shielded from light by a photomask 17 for each pixel, and is output. Note that since the parallel light 1 in FIG. 5 is generally not completely parallel light, an example is shown in which the incident angle is extreme for the sake of explanation.

以上より、各ピクセル電極１３及びこれらに対向してい
るコモン電ｆｉ１４とを電気的に制御することによって
、その透過光を遮光制御することができる。液晶シャッ
タアレイｌＯのこのような画素毎のピクセル電極１３の
位置を通過した光は、セルフォックレンズアレイ２０で
結像されて感光材料３０に露光され、画像が光学的に記
録されることになる。As described above, by electrically controlling each pixel electrode 13 and the common electrode fi 14 facing thereto, the transmitted light can be controlled to be blocked. The light that has passed through the position of the pixel electrode 13 for each pixel of the liquid crystal shutter array IO is imaged by the SELFOC lens array 20 and exposed to the photosensitive material 30, so that an image is optically recorded. .

ところで、このような従来の液晶シャッタアレイによる
画像記録では、液晶シャッタアレイｌＯより出た光を結
像手段のセルフォックレンズアレイ２０等で集光しない
と、光の拡散度が大きくなって感光材料３０上で解像度
を十分に得ることができない。このため、セルフォック
レンズアレイ２０等を液晶シャッタアレイｌＯと感光材
料３０との間に介挿して記録を行なうようにしているが
、このために光学系が大きくなり、装置も大型化してし
まう欠点があった。By the way, in image recording using such a conventional liquid crystal shutter array, if the light emitted from the liquid crystal shutter array 1O is not focused by the SELFOC lens array 20 or the like of the imaging means, the degree of light diffusion increases and the photosensitive material 30, it is not possible to obtain sufficient resolution. For this reason, a SELFOC lens array 20 or the like is inserted between the liquid crystal shutter array lO and the photosensitive material 30 for recording, but this increases the size of the optical system and the device as well. was there.

又、液晶シャッタアレイｌＯの光出力側である透明基板
１５への厚さが、光入力側の透明基板１５１１の厚さと
ほぼ同一となっており、ピクセル電極１３及びコモン電
８ｉ１４で光の透過を制御されている画素毎の光が、透
明基板１５＾内でその進行に従って相互に拡散してしま
う等の不都合も有り、高品質の画像記録を行なうことが
できないといった問題もあった。Furthermore, the thickness of the transparent substrate 15 on the light output side of the liquid crystal shutter array IO is approximately the same as the thickness of the transparent substrate 1511 on the light input side, and the pixel electrode 13 and the common electrode 8i14 prevent light transmission. There are also disadvantages such as the controlled light of each pixel mutually diffusing as it progresses within the transparent substrate 15^, and there is also the problem that high quality image recording cannot be performed.

（発明の目的） この発明は上述のような事情からなされたものであり、
この発明の目的は、特別な光学系を用いることなく、液
晶シャッタアレイそのものでも高品質の画像記録を行な
うことができるようにした液晶シャッタアレイを提供す
ることにある。(Object of the invention) This invention was made under the above circumstances,
An object of the present invention is to provide a liquid crystal shutter array that can record high-quality images using the liquid crystal shutter array itself without using a special optical system.

（発明の概要） この発明は液晶シャッタアレイの構造に関するもので、
液晶を充填されて対向しており、−方がピクセル電極を
埋設されている１対の配向膜と、これら配向膜の他方側
に層設されているコモン電極と、このコモン電極の外側
に層設されている第１の透明基板と、この第１の透明基
板の外側に層設されている第１の偏光板と、前記一方の
配向膜に層設されると共に、前記第１の透明基板よりも
薄い第２の透明基板と、前記ピクセル電極に対応してフ
ォトマスクが埋設されていると共に、前記第２の透明基
板の外側に層設されている第２の偏光板とで成るもので
ある。(Summary of the Invention) This invention relates to the structure of a liquid crystal shutter array.
A pair of alignment films are filled with liquid crystal and face each other, and the - side has a pixel electrode embedded in it, a common electrode layered on the other side of these alignment films, and a layer on the outside of this common electrode. a first transparent substrate, a first polarizing plate layered on the outside of the first transparent substrate, a first polarizing plate layered on the one alignment film, and a first transparent substrate layered on the one alignment film; a second transparent substrate that is thinner than the second transparent substrate, and a second polarizing plate that has a photomask embedded therein corresponding to the pixel electrode and is layered on the outside of the second transparent substrate. be.

（発明の実施例）　　　。(Embodiments of the invention).

第１図はこの発明の一実施例を示しており、液晶シャッ
タアレイ４０は、液晶４１を充填して所定距ｒｍ（例え
ば６μ）で対向している配向膜４２八及び４２Ｂを有し
ている。そして、光入力端の配向膜４２Ｂには透明材の
コモン電極４３が層設され、その外側にはガラス等の透
明材才斗で成る厚さ０．５〜１．０ｍｍ程度の透明基板
４５Ｂが層設され、更にその外側には偏光板４６が層設
されている。又、光出力側の配向膜４２Ａ内には透明材
のピクセル電極４４が画素に応じて埋設されており、こ
の配向膜４２Ａの外側にはガラス等の透明材料で成り、
光入力側の透明基板４５Ｂよりも薄い厚さｄの透明基板
４５＾が層設されている。このように、光出力側の透明
基板４５Ａの厚さｄは光入力側の透明基板４５［１より
も薄くなっている。そして、透明基板４５Ａの外側には
更に偏光板４７が層設されており、この偏光板４７内に
はピクセル電極４４と対応する位置関係で、サイズＰの
遮光用のフォトマスク４８が埋設されている。FIG. 1 shows an embodiment of the present invention, in which a liquid crystal shutter array 40 has alignment films 428 and 42B filled with liquid crystal 41 and facing each other at a predetermined distance rm (for example, 6 μ). . A common electrode 43 made of a transparent material is layered on the alignment film 42B at the light input end, and a transparent substrate 45B with a thickness of about 0.5 to 1.0 mm made of a transparent material such as glass is provided on the outside of the common electrode 43. A polarizing plate 46 is further layered on the outside thereof. Furthermore, pixel electrodes 44 made of a transparent material are embedded in the alignment film 42A on the light output side according to the pixels, and the outside of the alignment film 42A is made of a transparent material such as glass.
A transparent substrate 45^ having a thickness d thinner than the transparent substrate 45B on the light input side is layered. In this way, the thickness d of the transparent substrate 45A on the light output side is thinner than the transparent substrate 45[1 on the light input side. A polarizing plate 47 is further layered on the outside of the transparent substrate 45A, and a light-shielding photomask 48 of size P is embedded within this polarizing plate 47 in a positional relationship corresponding to the pixel electrode 44. There is.

なお、上述の実施例では光入力側の配向膜４２Ｂに接し
てコモン電極４３が設けられ、光出力側の配向膜４２八
内にビクセル電極４４が埋設された構造となっているが
、光入出力に対して逆の構造であっても良い。In the above embodiment, the common electrode 43 is provided in contact with the alignment film 42B on the light input side, and the pixel electrode 44 is embedded in the alignment film 428 on the light output side. The structure may be opposite to the output.

このような構造を有する液晶シャッタアレイ４０とする
ことにより、液晶シャッタアレイ４０に照射された平行
光ｌは、ピクセル電極４４で画像信号に応じてオン・オ
フ制御されても、薄い透明基板４５＾のために各ビクセ
ルにおける光の干渉等が少なくなり、はぼ制御されたま
まの状態で密着配置された感光材料３０に達するので、
画像に忠実な光が感光材料３０を露光するようになる。By providing the liquid crystal shutter array 40 with such a structure, even if the parallel light 1 irradiated onto the liquid crystal shutter array 40 is controlled on and off by the pixel electrode 44 according to the image signal, the thin transparent substrate 45^ Therefore, the interference of light in each pixel is reduced, and the light reaches the photosensitive material 30 that is closely placed in a controlled state.
The photosensitive material 30 is exposed to image-accurate light.

このため、その記録画像はピクセル電極４４のオン・オ
フ制御に応じた高品質な画像となる。Therefore, the recorded image becomes a high-quality image that corresponds to the on/off control of the pixel electrodes 44.

ここで、第１図では入力光１が完全な平行光であるとし
ているが、実際には第２図及び第３図に示すように傾斜
角θ。をもって入射される。空気中の光の屈折率がｎ。Here, in FIG. 1, it is assumed that the input light 1 is perfectly parallel light, but in reality, as shown in FIGS. 2 and 3, the angle of inclination θ is different. It is incident with . The refractive index of light in air is n.

であり、透明基板４５八及び４５Ｂの光の屈折率が共に
ｎ、であるとし、ピクセル電極４４とフォトマスク４８
との位置のずれ関係が第２図のようになっていると、ピ
クセル電極４４を透過した光が隣接画素へ影響を及ぼさ
ないようにするためには、液晶４１への入射角θは 八°　　　　　　Ｐ−八 ｔａｎθ≦□−□　　　　　・・・・・・・・・（１）
ｄ　　　　　　　　　ｄ であることが必要である。この（１）式より入射角θは Ｐ−八 θ≦ｔａｎ−’□　　　　　・・・・・・・・・（２）
となる。また、光屈折率の関係より ｎ、−５ｉｎθｏ　−ｎｌ−ｓｉｎθ　　　　・・・・
・・・・・（３）が成り立ち、この（３）式よりｎ。・
１とするとｅ　−ｓｉ。−・ヱリニ　　　　　１００３
０１０１．（４）ｎｌ である。そして、上記（２）式及び（４）式より・・・
・・・・・・（５） が成り立ち、透明基板４５＾の厚さｄはの条件が必要と
なる。なお。透明基板４５Ａの厚さｄは上記（６）式を
満足すれば良いが、実際には製造上必要な厚さｄｌがあ
るので、この厚さｄｌよりは厚い必要がある。It is assumed that the refractive index of light of the transparent substrates 458 and 45B is n, and that the pixel electrode 44 and the photomask 48
If the positional shift relationship between the pixel electrode 44 and the pixel electrode 44 is as shown in FIG. P-8tanθ≦□−□ ・・・・・・・・・(1)
It is necessary that d d . From this formula (1), the incident angle θ is P-8θ≦tan-'□ ・・・・・・・・・(2)
becomes. Also, from the relationship of optical refractive index, n, -5inθo -nl-sinθ...
...(3) holds, and from this equation (3), n.・
If it is 1, then e-si. -・Elini 1003
0101. (4) nl. And from the above equations (2) and (4)...
(5) holds true, and the thickness d of the transparent substrate 45^ is required. In addition. The thickness d of the transparent substrate 45A only needs to satisfy the above equation (6), but since there is actually a thickness dl required for manufacturing, it needs to be thicker than this thickness dl.

液晶シャッタアレイ４０は、第４図（八）で示すように
ライン状の構造となっているものでも可能であり、又同
図（Ｂ）で示すような面状の構成となっているものでも
同様に構成することができる。又、上述の各実施例では
、ピクセル電極４４とフォトマスク４６の開口部とを１
対１に対応させて同一のサイズとしているが、フォトマ
スク４６のサイズをピクセル電極４４のサイズよりも小
さくすると、ビクセル電極極４４とフォトマスク４６の
位置合せが楽になり、製造時に有利となる。The liquid crystal shutter array 40 may have a linear structure as shown in FIG. 4(8), or may have a planar structure as shown in FIG. 4(B). It can be configured similarly. Furthermore, in each of the above-described embodiments, the pixel electrode 44 and the opening of the photomask 46 are
Although the size of the photomask 46 is made smaller than that of the pixel electrode 44, alignment of the vixel electrode 44 and the photomask 46 becomes easier, which is advantageous during manufacturing.

（発明の効果） 以上のよつにこの発明の液晶シャッタアレイによれば、
液晶部でオン・オフ制御された光が薄い透明基板を経て
、更にフォトマスクで遮光されて出力されるようになっ
ているので、隣接画素からの光の回り込みを防止でき、
液晶シャッタアレイに感光材料を密着させて記録するこ
とができ、セルフォックレンズアレイ等の光学系を用い
ることなく画像光を忠実に記録することができ、装置が
小型化となる利点がある。(Effects of the Invention) As described above, according to the liquid crystal shutter array of the present invention,
The light that is turned on and off in the liquid crystal section passes through a thin transparent substrate and is then output after being blocked by a photomask, which prevents light from going around from adjacent pixels.
It is possible to record by bringing the photosensitive material into close contact with the liquid crystal shutter array, and it is possible to faithfully record image light without using an optical system such as a SELFOC lens array, which has the advantage that the device can be made smaller.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はこの発明の一実施例を示す断面構造図、第２図
及び第３図はこの発明の詳細な説明するための図、第４
図（Ａ）はライン状の液晶シャッタアレイを説明するた
めの図、同図（Ｂ）は面状の液晶シャッタアレイの様子
を示す図、第５図は従来の液晶シャッタアレイの構造及
びその記録の様子を示す図である。 １・・・平行光、１０．４０・・・液晶シャッタアレイ
、１１．４１・・・液晶、１３．４４・・・ビクセル電
極、１４゜４３・・・コモン電極、１５＾、１５［１，
４５八、４５Ｂ・・・透明基板、１６八、１６Ｂ、４６
．４７・・・偏光板、２０・・・セルフォックレンズア
レイ、３０・・・感光材料。 出願人代理人　　安　形　雄　三 第　ｌ　図 （Ａ） （Ｂ） ＄４図 渠２図 第　３　図FIG. 1 is a cross-sectional structural diagram showing one embodiment of the present invention, FIGS. 2 and 3 are diagrams for explaining the invention in detail, and FIG.
Figure (A) is a diagram for explaining a line-shaped liquid crystal shutter array, Figure (B) is a diagram showing a planar liquid crystal shutter array, and Figure 5 is a diagram showing the structure of a conventional liquid crystal shutter array and its record. FIG. 1...Parallel light, 10.40...Liquid crystal shutter array, 11.41...Liquid crystal, 13.44...Vixel electrode, 14°43...Common electrode, 15^, 15[1,
458, 45B...Transparent substrate, 168, 16B, 46
．． 47... Polarizing plate, 20... SELFOC lens array, 30... Photosensitive material. Applicant's agent Yu Yasugata Figure 3 (A) (B) $4 Figure 2 Figure 3

Claims (3)

【特許請求の範囲】[Claims] （１）液晶を充填されて対向しており、一方がピクセル
電極を埋設されている１対の配向膜 と、これら配向膜の他方側に層設されているコモン電極
と、このコモン電極の外側に層設されている第１の透明
基板と、この第１の透明基板の外側に層設されている第
１の偏光板と、前記一方の配向膜に層設されると共に、
前記第１の透明基板よりも薄い第２の透明基板と、前記
ピクセル電極に対応してフォトマスクが埋設されている
と共に、前記第２の透明基板の外側に層設されている第
２の偏光板とで成ることを特徴とする液晶シャッタアレ
イ。(1) A pair of alignment films filled with liquid crystal and facing each other, one of which has a pixel electrode embedded in it, a common electrode layered on the other side of these alignment films, and the outside of this common electrode. a first transparent substrate layered on the first transparent substrate, a first polarizing plate layered on the outside of the first transparent substrate, and a first polarizing plate layered on the one alignment film;
a second transparent substrate thinner than the first transparent substrate; a photomask embedded therein corresponding to the pixel electrode; and second polarized light layered on the outside of the second transparent substrate. A liquid crystal shutter array characterized by comprising a plate. （２）前記ピクセル電極と前記フォトマスクとのサイズ
が１対１に対応している特許請求の範囲第１項に記載の
液晶シャッタアレイ。(2) The liquid crystal shutter array according to claim 1, wherein the sizes of the pixel electrode and the photomask correspond one to one. （３）前記フォトマスクのの開口部のサイズが前記ピク
セル電極のサイズよりも小さい特許請求の範囲第１項に
記載の液晶シャッタアレ イ。(3) The liquid crystal shutter array according to claim 1, wherein the size of the opening of the photomask is smaller than the size of the pixel electrode.
JP61255469A 1986-10-27 1986-10-27 Liquid crystal shutter array Pending JPS63109415A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61255469A JPS63109415A (en) 1986-10-27 1986-10-27 Liquid crystal shutter array

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61255469A JPS63109415A (en) 1986-10-27 1986-10-27 Liquid crystal shutter array

Publications (1)

Publication Number Publication Date
JPS63109415A true JPS63109415A (en) 1988-05-14

Family

ID=17279198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61255469A Pending JPS63109415A (en) 1986-10-27 1986-10-27 Liquid crystal shutter array

Country Status (1)

Country Link
JP (1) JPS63109415A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03118197A (en) * 1989-10-02 1991-05-20 Kyodo Printing Co Ltd Method for forming embossed pattern to card member

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03118197A (en) * 1989-10-02 1991-05-20 Kyodo Printing Co Ltd Method for forming embossed pattern to card member

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