JPS63101459U - - Google Patents
Info
- Publication number
- JPS63101459U JPS63101459U JP19583186U JP19583186U JPS63101459U JP S63101459 U JPS63101459 U JP S63101459U JP 19583186 U JP19583186 U JP 19583186U JP 19583186 U JP19583186 U JP 19583186U JP S63101459 U JPS63101459 U JP S63101459U
- Authority
- JP
- Japan
- Prior art keywords
- anode target
- analytical
- ray tube
- cooling water
- back surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000498 cooling water Substances 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
Landscapes
- X-Ray Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19583186U JPS63101459U (enExample) | 1986-12-22 | 1986-12-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19583186U JPS63101459U (enExample) | 1986-12-22 | 1986-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63101459U true JPS63101459U (enExample) | 1988-07-01 |
Family
ID=31154083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19583186U Pending JPS63101459U (enExample) | 1986-12-22 | 1986-12-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63101459U (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03230460A (ja) * | 1990-02-02 | 1991-10-14 | Mitsubishi Electric Corp | Ｘ線発生装置用ターゲット |
| CN109817499A (zh) * | 2019-02-01 | 2019-05-28 | 中国科学院电子学研究所 | 高功率密度水冷阳极 |
-
1986
- 1986-12-22 JP JP19583186U patent/JPS63101459U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03230460A (ja) * | 1990-02-02 | 1991-10-14 | Mitsubishi Electric Corp | Ｘ線発生装置用ターゲット |
| CN109817499A (zh) * | 2019-02-01 | 2019-05-28 | 中国科学院电子学研究所 | 高功率密度水冷阳极 |