JPS6267552A - 直径可変の真空シリンダ型焼付機 - Google Patents

直径可変の真空シリンダ型焼付機

Info

Publication number
JPS6267552A
JPS6267552A JP60206646A JP20664685A JPS6267552A JP S6267552 A JPS6267552 A JP S6267552A JP 60206646 A JP60206646 A JP 60206646A JP 20664685 A JP20664685 A JP 20664685A JP S6267552 A JPS6267552 A JP S6267552A
Authority
JP
Japan
Prior art keywords
flange members
pair
cylinder
photosensitive material
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60206646A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0254939B2 (enrdf_load_stackoverflow
Inventor
Toshiki Takemura
竹村 敏樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP60206646A priority Critical patent/JPS6267552A/ja
Publication of JPS6267552A publication Critical patent/JPS6267552A/ja
Publication of JPH0254939B2 publication Critical patent/JPH0254939B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/24Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60206646A 1985-09-20 1985-09-20 直径可変の真空シリンダ型焼付機 Granted JPS6267552A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60206646A JPS6267552A (ja) 1985-09-20 1985-09-20 直径可変の真空シリンダ型焼付機

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60206646A JPS6267552A (ja) 1985-09-20 1985-09-20 直径可変の真空シリンダ型焼付機

Publications (2)

Publication Number Publication Date
JPS6267552A true JPS6267552A (ja) 1987-03-27
JPH0254939B2 JPH0254939B2 (enrdf_load_stackoverflow) 1990-11-26

Family

ID=16526795

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60206646A Granted JPS6267552A (ja) 1985-09-20 1985-09-20 直径可変の真空シリンダ型焼付機

Country Status (1)

Country Link
JP (1) JPS6267552A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621605U (ja) * 1992-06-12 1994-03-22 本田工業株式会社 電気聴診器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621605U (ja) * 1992-06-12 1994-03-22 本田工業株式会社 電気聴診器

Also Published As

Publication number Publication date
JPH0254939B2 (enrdf_load_stackoverflow) 1990-11-26

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